SG10202005801XA - Detection apparatus, exposure apparatus, and article manufacturing method - Google Patents
Detection apparatus, exposure apparatus, and article manufacturing methodInfo
- Publication number
- SG10202005801XA SG10202005801XA SG10202005801XA SG10202005801XA SG10202005801XA SG 10202005801X A SG10202005801X A SG 10202005801XA SG 10202005801X A SG10202005801X A SG 10202005801XA SG 10202005801X A SG10202005801X A SG 10202005801XA SG 10202005801X A SG10202005801X A SG 10202005801XA
- Authority
- SG
- Singapore
- Prior art keywords
- article manufacturing
- exposure apparatus
- detection apparatus
- detection
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019123134A JP7328809B2 (en) | 2019-07-01 | 2019-07-01 | DETECTION DEVICE, EXPOSURE DEVICE, AND ARTICLE MANUFACTURING METHOD |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202005801XA true SG10202005801XA (en) | 2021-02-25 |
Family
ID=73918910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202005801XA SG10202005801XA (en) | 2019-07-01 | 2020-06-18 | Detection apparatus, exposure apparatus, and article manufacturing method |
Country Status (6)
Country | Link |
---|---|
US (1) | US11079692B2 (en) |
JP (1) | JP7328809B2 (en) |
KR (1) | KR20210003045A (en) |
CN (1) | CN112180696A (en) |
SG (1) | SG10202005801XA (en) |
TW (1) | TWI781419B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7173891B2 (en) * | 2019-02-14 | 2022-11-16 | キヤノン株式会社 | Measuring device, exposure device, and article manufacturing method |
JP2022117091A (en) * | 2021-01-29 | 2022-08-10 | キヤノン株式会社 | Measurement device, lithography device, and article manufacturing method |
TWI801012B (en) * | 2021-10-26 | 2023-05-01 | 財團法人工業技術研究院 | Inspection method and inspection platform for lithography |
CN114756002A (en) * | 2022-04-08 | 2022-07-15 | 苏州威达智电子科技有限公司 | Multifunctional detection equipment adopting microcontroller and control system thereof |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3209190B2 (en) * | 1991-07-10 | 2001-09-17 | 株式会社ニコン | Exposure method |
US5654553A (en) * | 1993-06-10 | 1997-08-05 | Nikon Corporation | Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate |
JP2005175400A (en) * | 2003-12-15 | 2005-06-30 | Canon Inc | Aligner |
JP2006310683A (en) * | 2005-05-02 | 2006-11-09 | Nikon Corp | Method for adjustment |
TWI655517B (en) * | 2006-08-31 | 2019-04-01 | 日商尼康股份有限公司 | Exposure apparatus and method, and component manufacturing method |
KR101604564B1 (en) | 2006-09-01 | 2016-03-17 | 가부시키가이샤 니콘 | Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method |
JP5120691B2 (en) | 2007-08-24 | 2013-01-16 | 株式会社ニコン | Mark detection method and apparatus, exposure method and apparatus, and device manufacturing method |
JP2009054736A (en) | 2007-08-24 | 2009-03-12 | Nikon Corp | Mark detecting method and equipment, position controlling method and equipment, exposing method and equipment, and device manufacturing method |
JP5494755B2 (en) * | 2012-08-03 | 2014-05-21 | 株式会社ニコン | Mark detection method and apparatus, position control method and apparatus, exposure method and apparatus, and device manufacturing method |
JP6462993B2 (en) * | 2014-04-02 | 2019-01-30 | キヤノン株式会社 | Exposure apparatus and article manufacturing method |
CN105527795B (en) * | 2014-09-28 | 2018-09-18 | 上海微电子装备(集团)股份有限公司 | Exposure device and defocus tilt error compensation method |
JP6207671B1 (en) * | 2016-06-01 | 2017-10-04 | キヤノン株式会社 | Pattern forming apparatus, substrate arranging method, and article manufacturing method |
JP2017215556A (en) | 2016-06-02 | 2017-12-07 | 株式会社ニコン | Mark detection device, exposure apparatus, method for producing device, and method for detecting mark |
-
2019
- 2019-07-01 JP JP2019123134A patent/JP7328809B2/en active Active
-
2020
- 2020-06-18 SG SG10202005801XA patent/SG10202005801XA/en unknown
- 2020-06-22 TW TW109121143A patent/TWI781419B/en active
- 2020-06-23 KR KR1020200076259A patent/KR20210003045A/en not_active Application Discontinuation
- 2020-06-29 US US16/914,976 patent/US11079692B2/en active Active
- 2020-07-01 CN CN202010622439.3A patent/CN112180696A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TW202102949A (en) | 2021-01-16 |
TWI781419B (en) | 2022-10-21 |
JP7328809B2 (en) | 2023-08-17 |
KR20210003045A (en) | 2021-01-11 |
CN112180696A (en) | 2021-01-05 |
US20210003930A1 (en) | 2021-01-07 |
JP2021009230A (en) | 2021-01-28 |
US11079692B2 (en) | 2021-08-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL278006B (en) | Metrology methods, metrology apparatus and device manufacturing method | |
IL277846A (en) | Method of determining a characteristic of a structure, and metrology apparatus | |
IL253833A0 (en) | Metrology methods, metrology apparatus and device manufacturing method | |
IL256818A (en) | Inspection apparatus, inspection method and manufacturing method | |
IL256816B (en) | Metrology methods, radiation source, metrology apparatus and device manufacturing method | |
SG10202005801XA (en) | Detection apparatus, exposure apparatus, and article manufacturing method | |
EP3418726A4 (en) | Defect detection apparatus, defect detection method, and program | |
EP3369683A4 (en) | Item transfer apparatus, item inspection apparatus, item transfer method, and item inspection method | |
EP3486638A4 (en) | Inspection method, inspection/notification method, manufacturing method including inspection method, inspection apparatus, and manufacturing apparatus | |
SG10201911998QA (en) | Substrate processing method and substrate processing apparatus | |
GB2584500B (en) | Manufacturing method and apparatus | |
SG10201700942WA (en) | Lithography apparatus and article manufacturing method | |
SG11202106468QA (en) | Information processing apparatus, information processing method, and program | |
GB2575755B (en) | Evaluation program, evaluation method, and information processing apparatus | |
GB2553891B (en) | Radiation detecting apparatus, radiation detecting system, and manufacturing method for radiation detecting apparatus | |
EP3774327A4 (en) | Apparatus and method for forming an article | |
GB201917734D0 (en) | Method, substrate and apparatus | |
EP3591601A4 (en) | Article evaluation method and apparatus | |
SG10201604147RA (en) | Imprint apparatus, imprint method, and article manufacturing method | |
IL273001A (en) | Metrology method and apparatus | |
SG10202108848QA (en) | Event processing method and apparatus | |
GB201902986D0 (en) | Manufacturing apparatus and method | |
GB201700170D0 (en) | Manufacturing method and apparatus | |
EP3567961A4 (en) | Indication method, processing method, and apparatus | |
SG10202004559TA (en) | Exposure apparatus and article manufacturing method |