KR20140118248A - Substrate processing apparatus - Google Patents

Abstract

A substrate processing apparatus is disclosed. According to an embodiment of the present invention, the substrate processing apparatus comprises a plurality of processing chambers which carry out vapor deposition of a substrate; a transfer chamber provided between the processing chambers and forming a space to deliver a pattern forming member which forms vapor deposition pattern on a substrate to the processing chamber; and a pattern forming member returning unit provided inside the transfer chamber and carrying the pattern forming member to and from inside the processing chambers, which are provided on both sides of the transfer chamber, by expanding and contracting.

Description

[0001] SUBSTRATE PROCESSING APPARATUS [0002]

The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus capable of improving the transport efficiency of a pattern forming member used in a deposition process for a substrate.

Recently, as the display industry has rapidly developed in the semiconductor industry, flat panel displays (FPDs) have begun to emerge.

Flat panel displays (FPDs) are thinner and lighter image display devices than cathode ray tubes (CRTs), which were formerly used as displays in TVs and computer monitors, and are widely used in liquid crystal displays ), A plasma display panel (PDP), and an organic light emitting diode (OLED).

One of such flat display devices (FPD) includes an anode, a cathode, and organic films interposed between the anode and the cathode.

Here, the organic layers include at least a light emitting layer and may further include a hole injecting layer, a hole transporting layer, an electron transporting layer, and an electron injecting layer in addition to the light emitting layer.

In addition, an organic light emitting display (OLED) is a cemented carbide thin film display device that realizes a color image by self-emission of organic materials, and has been attracting attention as a next generation flat display because of its simple structure and high light efficiency.

In order to manufacture such an OLED, an inorganic material deposition process for forming a TFT (Thin Film Transistor) and a patterning process for patterning a light emitting layer are performed on a glass substrate, An organic material deposition process is performed.

In order to realize a full color in an organic light emitting display (OLED), a light emitting layer is patterned. As a patterning method, a direct patterning method using FMM (Fine Metal Mask) or a LITI (Laser Induced Thermal Imaging) Method, a method using a color filter, and the like.

Here, the direct patterning method using FMM (Fine Metal Mask) is a method in which a glass substrate, a patterning member (for example, a mask) patterned in a chamber, and a source for emitting a deposition material are sequentially , Thereby forming an organic material vapor deposition pattern on the glass substrate in accordance with the pattern of the pattern forming member.

In the direct patterning method using a fine metal mask (FMM), defects are generated in the glass substrate and the pattern forming member in the case of a large glass substrate. To solve this problem, a glass substrate is divided into a plurality of small A method of transferring and depositing along a pattern forming member has been attracting attention.

On the other hand, a direct patterning method using FMM (Fine Metal Mask) is a pattern forming member replacing operation for replacing a used pattern forming member with a new pattern forming member because the pattern forming member is contaminated with the deposition material when the deposition process is repeatedly performed Is required.

However, since the conventional pattern processing apparatus according to the related art is transferred in an in-line manner from a pattern forming member reservoir remote from the process chamber to the process chamber, the time required for replacing the pattern forming member becomes longer .

Particularly in the case of the conventional system, since the pattern forming member is transferred to the process chamber by using the substrate transfer unit for transferring the glass substrate, the replacement time for replacing the pattern forming member becomes longer.

Korean Patent Publication No. 10-2006-0097185 (Semes Co., Ltd.) 2006.09.14.

SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a substrate processing apparatus capable of improving the transport efficiency of a pattern forming member by providing a pattern forming member transport unit that extends and contracts in both directions.

According to an aspect of the present invention, there is provided a plasma processing apparatus comprising: a plurality of process chambers for performing a deposition process on a substrate; A transfer chamber provided between the plurality of process chambers, the transfer chamber forming a space for transferring a pattern forming member for forming a deposition pattern to the process chamber to the process chamber; And a pattern forming member which is provided inside the transfer chamber and which is extended and contracted to carry the pattern forming member into the process chamber provided on both sides of the transfer chamber or carry out the pattern forming member from the process chamber, A substrate processing apparatus including a unit can be provided.

Wherein the pattern formation member transportation unit includes a pattern formation member transportation portion on which the pattern formation member is mounted and which is extended and contracted to carry the pattern formation member into the process chamber or carry the pattern formation member out of the process chamber; And a conveyance driving unit connected to the pattern forming member conveying unit and capable of extending and contracting the patterned member conveying unit in both directions.

The pattern formation member transfer section may include: a pattern formation member supporter for supporting the pattern formation member; A multi-stage sliding portion connected to the pattern forming member supporting portion and stacked in multi-stages so as to be movable relative to each other and extended and contracted as they slide; And a support frame portion for supporting the multi-stage sliding portion.

Wherein the multi-stage sliding portion includes: a base plate connected to the support frame portion; At least one sliding plate stacked in multiple stages so as to be able to move relative to each other between the base plate and the pattern formation member support, and sliding at the same time; And a guide unit that is provided between the base plate and the at least one or more slide plates, and guides the relative movement of the at least one slide plate with respect to the base plate.

The guide portion may include an LM linear guide for guiding the at least one sliding plate in a horizontal direction.

The linear guide includes an LM guide rail disposed between the base plate and the at least one or more sliding plates, the LM guide rail extending in a direction in which the sliding plate slides; And an LM block provided between the base plate and the at least one sliding plate, the LM block being moved along the LM guide rail.

The pattern forming member returning unit may further include a plate supporting portion provided between the base plate and the at least one or more sliding plates, respectively, for supporting a lower portion of the sliding plate.

The plate support portion may include a cam follower disposed at both sides of the at least one or more sliding plates to prevent sagging of the at least one sliding plate when the at least one or more sliding plates slide at the same time .

The transport driving unit may include: a first driving motor provided in the support frame part, the at least one sliding plate being capable of sliding simultaneously in forward and reverse directions; A first pinion gear provided on the base plate and connected to the first driving motor and rotated; A first rack gear provided on a first sliding plate stacked on the base plate, the first rack gear engaged with the first pinion gear; A second rack gear provided on the base plate; A second pinion gear provided on the first sliding plate and engaged with the second rack gear as the first sliding plate slides; And a third rack gear provided on the second sliding plate stacked on the first sliding plate, the third rack gear being engaged with the second pinion gear.

And a pattern forming member transfer unit provided inside the transfer chamber for transferring the pattern forming member transfer unit.

The pattern forming member transfer unit may include: a transfer unit mounting portion on which the pattern forming member transfer unit is seated; And a transfer unit transfer unit provided inside the transfer chamber for transferring the transfer unit mounting unit adjacent to the other process chamber.

Wherein the transfer unit transfer section comprises: a transfer rail disposed inside the transfer chamber, the transfer rail being disposed in the transfer direction of the pattern formation member transfer unit; And a conveyance driving unit connected to the conveyance unit seating unit to allow the conveyance unit seating unit to be conveyed along the conveyance rail.

The conveyance driving unit includes: a screw disposed along the conveyance rail and coupled to the conveyance unit seating unit; And a second driving motor coupled to the screw to rotate the screw in forward and reverse directions.

Further comprising a pattern formation member replacement unit provided in the process chamber for replacing the pattern formation member carried into the process chamber, wherein the pattern formation member replacement unit holds the pattern formation member, And a replacement lifter for raising and lowering the pattern forming member in the process chamber and disposing the pattern forming member in the process chamber.

Wherein the replacement lifter further comprises: a replacement gripper holding the pattern formation member carried into the process chamber by the pattern formation member transportation unit; And a gripper lifting unit provided at an upper portion of the process chamber and lifting the replacement gripper.

The pattern forming member transfer unit may be disposed in parallel within the transfer chamber along the arrangement direction of the plurality of process chambers.

Embodiments of the present invention provide a pattern formation member transfer unit that is extended and retracted in both directions so that the pattern formation member can be carried into or out of a plurality of process chambers provided on both sides of the transfer chamber, The conveying efficiency of the forming member can be improved.

1 is a schematic view showing a substrate processing apparatus according to an embodiment of the present invention.
2 is a cross-sectional view schematically showing a substrate processing apparatus according to an embodiment of the present invention.
3 is a schematic view showing a gate valve according to an embodiment of the present invention.
4 is a cross-sectional view showing a pattern forming member carrying unit according to an embodiment of the present invention.
5 to 7 are views showing the operation state of the pattern forming member transfer unit according to the embodiment of the present invention.
8 is a plan view showing a pattern forming member transfer unit according to an embodiment of the present invention.
9 is a side view showing a patterned member transfer unit according to an embodiment of the present invention.

In order to fully understand the present invention, operational advantages of the present invention, and objects achieved by the practice of the present invention, reference should be made to the accompanying drawings and the accompanying drawings which illustrate preferred embodiments of the present invention.

Hereinafter, the present invention will be described in detail with reference to the preferred embodiments of the present invention with reference to the accompanying drawings. Like reference symbols in the drawings denote like elements.

The substrate to be described below includes a flat panel display substrate such as a liquid crystal display (LCD), a plasma display panel (PDP), and an organic light emitting diode (OLED), a solar cell substrate, or a semiconductor wafer substrate. However, in this embodiment, a glass substrate for OLED (Organic Light Emitting Diodes) will be simply referred to as a substrate.

The pattern forming member to be described below includes a mask (MASK) or the like for forming a deposition pattern for the substrate.

FIG. 1 is a schematic view of a substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a cross-sectional view schematically showing a substrate processing apparatus according to an embodiment of the present invention, and FIG. 4 is a cross-sectional view showing a patterning-member transferring unit according to an embodiment of the present invention, and Figs. 5 to 7 are cross-sectional views illustrating a patterning member according to an embodiment of the present invention, 8 is a plan view showing a pattern forming member transferring unit according to an embodiment of the present invention, and Fig. 9 is a side view showing a pattern forming member transferring unit according to an embodiment of the present invention to be.

1 to 7, a substrate processing apparatus according to an embodiment of the present invention includes a plurality of process chambers 100 for performing a deposition process on a substrate, a plurality of process chambers 100 provided between the plurality of process chambers 100 A transfer chamber 200 for forming a space for transferring a pattern forming member M for forming a deposition pattern on a substrate to the process chamber 100 and a transfer chamber 200 provided inside the transfer chamber 200, A pattern formation member transfer unit 300 for transferring the pattern formation member M into the process chamber 100 provided on both sides of the process chamber 100 or for taking out the pattern formation member M from the process chamber 100, And a pattern formation member replacement unit 500 provided in the chamber 100 for replacing the pattern formation member M transferred to the process chamber 100. [

The substrate processing apparatus according to an embodiment of the present invention may be configured such that a plurality of process chambers 100 are simultaneously connected to one transfer chamber 200 and a pattern forming member M is provided on both sides of the transfer chamber 200 The pattern forming member transfer unit 300 is provided in the transfer chamber 200 so as to be carried into the process chamber 100 or to allow the pattern forming member M to be taken out of the plurality of process chambers 100. [

Here, since the pattern forming member transfer unit 300 is elongated and contracted in both directions, the transfer efficiency of the pattern forming member M with respect to the process chamber 100 provided on both sides of the transfer chamber 200 can be improved.

Referring to FIGS. 1 and 2, in this embodiment, a plurality of process chambers 100 are provided, and each process chamber forms a space for performing a deposition process for a substrate in a vacuum state.

The process chamber 100 is isolated from the outside so that the deposition space can be maintained in a vacuum atmosphere as the deposition process proceeds.

In the process chamber 100, a substrate carrier (not shown) for transferring a substrate, a source (not shown) for supplying a deposition material, and a deposition unit City).

The substrate carrier can be attached to the substrate in an electrostatic chuck or a Gecko chuck manner and is moved within the process chamber 100.

The substrate carrier directs the deposition surface of the substrate to the pattern formation member (M) so that the deposition pattern is formed on the deposition surface of the substrate.

The conveyance of the substrate carrier can be variously applied, such as a linear motor method, a roller or a conveyor method.

The deposition unit is provided inside the process chamber 100, and a source for generating a deposition material is disposed and a pattern forming member M is provided on the top of the source.

The plurality of process chambers 100 are connected to one transfer chamber 200 at the same time. The transfer chamber 200 forms a space for transferring the substrates among the plurality of process chambers 100.

Further, the transfer chamber 200 forms a space for transferring the pattern forming member (M) for forming a deposition pattern to the process chamber (100).

The transfer chamber 200 is maintained in a vacuum atmosphere like the plurality of process chambers 100.

Therefore, a vacuum pump (not shown) is connected to one side of the transfer chamber 200 to maintain the inside of the transfer chamber 200 in a vacuum state.

A gate valve 210 is provided between the plurality of process chambers 100 and the transfer chamber 200, that is, between the plurality of process chambers 100 and the transfer chamber 200.

The gate valve 210 will be described with reference to FIG.

The gate valve 210 includes a valve chamber 210 disposed adjacent to the process chamber 100 and a slit S provided in the transfer chamber 200 and having an opening 211 through which the substrate or the pattern forming member M enters and exits A slit opening and closing part 213 for opening and closing the slit S and an ascending and descending cylinder 218 for supporting the slit opening and closing part 213 so as to move up and down within the valve chamber 212.

The valve chamber 212 forms its own vacuum space.

The opening 211 of the valve chamber 212 communicates with the slits provided in the process chamber 100 and the transfer chamber 200. When the opening 211 is opened, So that it can be carried into or taken out of the interior of the vehicle.

The slit opening and closing part 213 is provided with a valve blade 214 which is in close contact with the opening 211 and closes the opening 211 and a pressing cylinder 217 which moves the valve blade 214 toward the opening 211 And a valve block 216.

The gate valve 210 has two openings 211 corresponding to the slits S provided in the adjacent process chamber 100 and the transfer chamber 200, 211 so as to be in close contact with each other.

The pair of valve blades 214 are provided in such a size as to completely close the openings 211 so that the vacuum of the transfer chamber 200 and the adjacent process chamber 100 is not released to the valve blade 214 O-rings 215 are further combined.

A pressurizing cylinder 217 is provided at one side of the valve block 216 and the pressurizing cylinder 217 moves the valve blade 214 in the horizontal direction so that the valve blade 214 completely closes the opening 211 Pressurize.

The driving of the pressure cylinder 217 may be performed by hydraulic pressure or pneumatic pressure.

The lifting cylinder 218 is connected to the valve block 216.

When the slit S is closed, the ascending / descending cylinder 218 raises the valve block 216 until the valve blade 214 is located on the central axis of the opening 211, The valve block 216 is lowered. The ascending / descending cylinder 218 may be provided with a cylinder operated by hydraulic pressure or pneumatic pressure.

As described above, since the slit opening / closing part 213 is driven inside the valve chamber 212, particles can be generated by contact between the valve blade 214 and the valve chamber 212 as the valve is rotated.

If such particles are introduced into the process chamber 100 and the transfer chamber 200, the process may be adversely affected to seriously degrade the completeness of the process. Therefore, the inside of the valve chamber 212 is periodically cleaned, Should be removed.

4 to 7, the patterning member transfer unit 300 according to the present embodiment transfers the pattern forming member M into the process chamber 100 from the inside of the transfer chamber 200, And serves to take out the member M from the process chamber 100 to the transfer chamber 200.

The pattern formation member transfer unit 300 is configured to transfer the pattern formation member M into the process chamber 100 or to transfer the pattern formation member M from the process chamber 100, And a conveyance driving unit 370 connected to the pattern forming member conveying unit 310 and capable of extending and retracting the patterned member conveying unit in both directions.

The pattern forming member transfer section 310 transfers the pattern forming member M from the transfer chamber 200 to the process chamber 100 or transfers the pattern forming member M from the process chamber 100 to the transfer chamber 200 .

The pattern forming member carrying portion 310 is connected to the pattern forming member supporting portion 320 for supporting the pattern forming member M and the pattern forming member supporting portion 320 so that the pattern forming member supporting portion 320 is slidably stacked in multi- A plate supporting portion 350 provided between the base plate 331 and at least one or more sliding plates 333 for supporting a lower portion of the sliding plate 333, And a support frame part (340) for supporting the support part (330).

The pattern forming member M is seated on the upper surface of the pattern forming member supporting portion 320. [ The multistage sliding portion 330 is extended and retracted in a state in which the pattern forming member M is supported on the pattern forming member supporting portion 320 to support the pattern forming member M in the process chamber 100 and the transfer chamber 200 .

At this time, the multi-stage sliding portion 330 is extended and retracted in both directions so that the pattern forming member M can be carried in and out of the process chamber 100 provided at both sides of the transfer chamber 200.

Meanwhile, the support frame portion 340 supports the multi-stage sliding portion 330. Accordingly, the multi-stage sliding portion 330 is provided on the upper portion of the support frame portion 340, and the pattern forming member supporting portion 320 is provided on the multi-stage sliding portion 330 in order.

The multistage sliding portion 330 according to the present embodiment serves to relay the transfer of the pattern forming member M between the process chamber 100 and the transfer chamber 200.

The multi-stage sliding portion 330 includes a base plate 331 connected to the support frame portion 340, and a plurality of multi-stage sliding portions 330 stacked in a multi-stage manner between the base plate 331 and the pattern formation member support portion 320, At least one sliding plate 333 and at least one sliding plate 333 provided between the base plate 331 and the at least one sliding plate 333 and guiding the relative movement of the at least one sliding plate 333 with respect to the base plate 331 And a guide portion 335.

Referring to Figs. 4 to 7, the multi-step sliding portion 330 will be described as follows.

The base plate 331 is connected to an upper portion of the support frame portion 340 and the base plate 331 serves to support at least one or more of the sliding plate 333 and the pattern formation member support portion 320 from below.

The base plate 331 is fixed to the upper portion of the support frame portion 340 and at least one of the sliding plates 333 is moved relative to the base plate 331.

4, the at least one sliding plate 333 includes a first sliding plate 333a, a second sliding plate 333b, a third sliding plate 333c A plurality of sliding plates 333 such as a fourth sliding plate (not shown) may be formed depending on the elongation distance from the transfer chamber 200 to the inside of the process chamber 100 Can be sequentially stacked.

As described above, the at least one sliding plate 333 is stacked in a multi-stage manner so as to be movable relative to each other, is slid at the same time and is extended into the process chamber 100, or transferred into the transfer chamber 200 ).

Elongation and contraction of the at least one sliding plate 333 is performed by a conveyance drive unit 370, which will be described later.

The guide portion 335 guides the at least one sliding plate 333 to be movable relative to each other.

The guide portion 335 is provided between the base plate 331 and the at least one sliding plate 333. In this embodiment, at least one sliding plate 333 linearly moves linearly in the horizontal direction, (335) includes an LM linear guide (335) for guiding at least one or more sliding plates (333) in the horizontal direction.

Here, the linear guide 335 is provided between the base plate 331 and at least one or more sliding plates 333, respectively.

The first sliding plate 333a and the second sliding plate 333b and between the base plate 331 and the first sliding plate 333a and between the first sliding plate 333a and the second sliding plate 333b and between the second sliding plate 333b and the third sliding plate 333b, And a linear guide 335 is provided between the sliding plates 333c.

The linear guide 335 includes an LM guide rail 336 and a LM block 337 which are moved along the LM guide rail 336 in a direction in which the sliding plate 333 is slid.

A first LM guide rail 336a is installed on the upper portion of the base plate 331 and a first LM block 337a is installed on the lower portion of the first sliding plate 333a to be coupled with the first LM guide rail 336a do.

The second LM guide rail 336b is provided on the upper portion of the first sliding plate 333a and the second LM guide rail 336b is coupled to the lower portion of the second sliding plate 333b with the second LM guide rail 336b. (337b).

The third LM guide rail 336c is provided on the upper portion of the second sliding plate 333b and the third LM guide rail 336c is coupled to the lower portion of the third sliding plate 333c. 337c.

As described above, the linear guide 335 guides the horizontal sliding movement of the first to third sliding plates 333a, 333b, and 333c.

In addition, the plate supporter 350 serves to prevent the sliding plate 333 from sagging when at least one of the sliding plates 333 relatively moves in the horizontal direction, i.e., slides.

That is, the plate supporter 350 is provided between at least one or more sliding plates 333 to support the lower portion of the sliding plate 333.

In this embodiment, the plate support 350 includes a cam follower 350 that prevents sagging of at least one of the sliding plates 333 when at least one of the sliding plates 333 is slid and extended at the same time.

The cam followers 350 are disposed at both lower sides of at least one of the sliding plates 333 to support a lower portion of the at least one sliding plate 333.

The first to third sliding plates 333a, 333b and 333c are slid to the left as shown in FIG. 6 in a state in which the first to third sliding plates 333a, 333b and 333c are contracted, The first to third sliding plates 333a, 333b, and 333c slide in the right direction and extend as shown in Fig. 7, the cam followers 350 are moved in the first to third sliding plates 333a and 333b And 333c to support the lower portions of the first to third sliding plates 333a, 333b, and 333c.

That is, when the extension length of the first to third sliding plates 333a, 333b, 333c is increased, deflection occurs due to the weight of the first to third sliding plates 333a, 333b, 333c, 350 can support the lower portions of the first to third sliding plates 333a, 333b, 333c to prevent sagging due to its own weight.

Meanwhile, the multi-stage sliding portion 330 according to the present embodiment is bi-directionally extended and retracted by the transport driving portion 370.

4 to 7, the conveying drive unit 370 serves to provide a driving force that allows the at least one sliding plate 333 constituting the multi-stage sliding unit 330 to be extended and retracted in both directions.

Referring to FIGS. 6 and 7, the first to third sliding plates 333a, 333b, 333c are rotatably supported by a plurality of rack gears 375a, 375b, 375c, 375d, 375e and pinion gears 373a, 373b, 373c And are simultaneously slid while moving relative to each other.

The driving elements for simultaneously extending and contracting the first to third sliding plates 333a, 333b, and 333c by the carrier driving unit 370 will be described below.

4, a first drive motor 371 capable of forward and reverse rotation is provided on the support frame so that the first to third sliding plates 333a, 333b, and 333c are biased in the left or right direction . That is, the first to third sliding plates 333a, 333b, and 333c slide in the left or right direction as the first drive motor 371 rotates in the forward or reverse direction.

The base plate 331 is provided with a first pinion gear 373a connected to the first drive motor 371 and rotated. The first sliding plate 333a stacked on the base plate 331 is provided with a first rack gear 375a meshing with the first pinion gear 373a.

Since the rotational force of the first drive motor 371 is transmitted to the first pinion gear 373a and the first rack gear 375a is linearly moved in the left or right direction by the rotation of the first pinion gear 373a The first sliding plate 333a also linearly moves together with the first rack gear 375a in the left or right direction.

Further, a second rack gear 375b is provided at an upper portion of the base plate 331 so as to be spaced apart from the first pinion gear 373a by a predetermined distance. The first sliding plate 333a is provided with a second pinion gear 373b which is engaged with the second rack gear 375b and rotated. The second sliding plate 333b stacked on the first sliding plate 333a is provided with a third rack gear 375c engaged with the second pinion gear 373b.

As the first sliding plate 333a linearly moves, the second pinion gear 373b is engaged with the second rack gear 375b and rotated. The third rack gear 375c provided on the second sliding plate 333b is rotated in the same direction as the moving direction of the first sliding plate 333a by the rotation of the second pinion gear 373b, The second sliding plate 333b also linearly moves in the left or right direction together with the third rack gear 375c.

In the above-described manner, a fourth rack gear 375d is provided at an upper portion of the first sliding plate 333a so as to be spaced apart from the second pinion gear 373b by a predetermined distance. The second sliding plate 333b is provided with a third pinion gear 373c which is engaged with the fourth rack gear 375d and rotated. The third sliding plate 333c stacked on the second sliding plate 333b is provided with a fifth rack gear 375e meshed with the third pinion gear 373c.

As the second sliding plate 333b linearly moves, the third pinion gear 373c is engaged with the fourth rack gear 375d and rotated. The fifth rack gear 375e provided on the third sliding plate 333c is rotated in the same direction as the moving direction of the second sliding plate 333b by the rotation of the third pinion gear 373c, The third sliding plate 333c also linearly moves in the left or right direction together with the fifth rack gear 375e.

As described above, the first to third sliding plates 333a, 333b, and 333c according to the present embodiment simultaneously slide all the way to the left or right by forward and backward rotation of the first drive motor 371.

At this time, the third sliding plate 333c located at the uppermost position is moved by a distance obtained by multiplying the rotation amount (i.e., rotation distance) of the first drive motor 371 by three. That is, the moving distance of the sliding plate 333 located at the uppermost position is a distance obtained by multiplying the rotation amount of the first driving motor 371 by the number of the sliding plates 333.

On the other hand, the new pattern formation member M transferred into the process chamber 100 by the pattern formation member transportation unit 300 is replaced with the existing pattern formation member M by the pattern formation member replacement unit 500. That is, the pattern forming member M is provided in the evaporation portion provided on the upper portion of the source.

The pattern forming member replacement unit 500 is provided on the upper portion of the process chamber 100 and is disposed in the upper region of the vapor deposition unit.

2, the pattern forming member replacing unit 500 according to the present embodiment grasps the pattern forming member M and raises and lowers the pattern forming member M to form the pattern forming member M in the process chamber 100 And a replacement lifter 500 for installing and uninstalling the replacement lifter 500 in the main body.

The replacement lifter 500 includes a replacement gripper 510 for gripping the pattern forming member M brought into the process chamber 100 by the pattern forming member transfer unit 300 and a replacement gripper 510 for holding the pattern forming member M, And a gripper lifting unit 530 provided on the gripper 510 for lifting and lowering the replacement gripper 510.

The replacement gripper 510 grips the side surface portion of the pattern forming member M and is raised and lowered in the height direction of the process chamber 100 by the gripper elevating portion 530. The gripper lift portion 530 is supported on the upper outer wall of the process chamber 100.

The gripper lifting portion 530 can lift and lower the replacement gripper 510 by the LM method.

The gripper lift unit 530 includes an LM block (not shown) to which the replacement gripper 510 is coupled, an LM guide rail (not shown) to guide the movement of the LM block, a servo motor ).

The replacement gripper 510 is coupled to the LM block through a through hole (not shown) formed in the top wall of the process chamber 100 such that the through hole does not interfere with the vacuum state of the process chamber 100 The lifter lifter 500 is provided with an isolating member (not shown) for isolating the inside of the process chamber 100 from the through hole.

The isolation member may be bellows (not shown) for the lifter, the upper end of which surrounds the perforation hole and is joined to the upper inner wall of the process chamber 100 and the lower end thereof is coupled to one side of the replacement gripper 510.

The pattern forming member transfer unit 300 transfers the transfer member 200 to the transfer chamber 200 along the arrangement direction of the plurality of process chambers 100 in correspondence with the number of the process chambers 100 disposed on both sides of the transfer chamber 200. [ Are arranged in parallel within the chamber (200).

A plurality of the pattern forming member transfer units 300 are arranged in parallel in the transfer chamber 200 so that the pattern forming members M can be simultaneously carried into the plurality of process chambers 100 or a plurality of The pattern forming member M can be carried out from the process chamber 100 of the transfer chamber 200 to the transfer chamber 200.

As described above, the transport efficiency of the pattern forming member M can be increased.

8 and 9, a substrate processing apparatus according to an embodiment of the present invention includes a pattern forming member transfer unit 300 which is provided inside a transfer chamber 200 and transfers a pattern forming member transfer unit 300, (400).

The pattern forming member transferring unit 400 serves to transfer the pattern forming member transferring unit 300 in the transfer chamber 200. That is, the pattern forming member transfer unit 400 transfers the pattern forming member transfer unit 300 in the transfer chamber 200 from the gate valve 210 adjacent to one process chamber 100 to the other process chamber 100 Is horizontally conveyed to the adjacent gate valve (210).

The pattern forming member transferring unit 400 includes a transferring unit mounting portion 410 on which the pattern forming member transferring unit 300 is mounted and a transferring unit mounting portion 410 provided inside the transferring chamber 200, And a transfer unit transfer unit 430 for transferring the process unit adjacent to the process chamber 100.

The transfer unit mounting portion 410 is provided inside the transfer chamber 200, and the pattern forming member transfer unit 300 is seated. Specifically, the support frame portion 340 of the pattern forming member transfer unit 300 is seated on the transfer unit mounting portion 410.

The transfer unit receiving unit 410 is horizontally conveyed in the transfer chamber 200 by the transfer unit transfer unit 430.

The transfer unit transfer unit 430 includes a transfer rail 431 disposed inside the transfer chamber 200 and arranged in the transfer direction of the pattern forming member transfer unit 300 and a transfer unit 431 connected to the transfer unit mounting unit 410, And a conveyance driving unit 433 for allowing the unit seating unit 410 to be conveyed along the conveyance rail 431.

For example, when the transfer chamber 200 is formed in a rectangular duct shape elongated in the longitudinal direction, the transfer rail 431 is arranged long in the transfer length direction.

The conveyance unit seating portion 410 is linearly reciprocated along the conveyance rail 431 while the lower portion is coupled to the conveyance rail 431. The conveyance driving portion 433 is moved And provides a driving force for linearly reciprocating along the rails 431.

The conveyance drive unit 433 includes a screw 434 disposed along the conveyance rail 431 and coupled to the conveyance unit seating unit 410 and a screw 434 coupled to the screw 434 to rotate the screw 434 in the forward and reverse directions And a second drive motor 435 for driving the second drive motor 435.

That is, the conveying unit mounting portion 410 linearly reciprocates along the conveying rail 431 by the rotation of the screw 434 which rotates in conjunction with the forward and reverse rotation of the second driving motor 435.

The operation of the substrate processing apparatus according to an embodiment of the present invention will now be described.

The substrate processing apparatus according to the present embodiment replaces the pattern forming member M contaminated with the deposition material with a new pattern forming member M after a predetermined number of deposition processes.

First, the pattern forming member M, which is provided in the process chamber 100 and is contaminated with the deposition material, is uninstalled. To this end, the replacement lifter 500 is operated.

The replacement lifter 500 descends the replacement gripper 510 to grasp the contaminated pattern forming member M and then raises the replacement gripper 510 to uninstall the contaminated pattern forming member M .

Next, the patterning-member transferring unit 300 is operated to collect the contaminated pattern forming member M. [

The pattern forming member supporting portion 320 is drawn into the interior of the process chamber 100 by the sliding movement of the multi-stage sliding portion 330 of the pattern forming member transfer unit 300.

The replacement lifter 500 loads the contaminated pattern forming member M on the pattern forming member supporting portion 320 and the pattern forming member supporting portion 320 moves the process chamber 100 in the direction of the transfer chamber 200.

The contaminated pattern forming member M is carried out of the transfer chamber 200 by a separate transfer means.

Then, a new pattern forming member M is loaded on the pattern forming member supporting portion 320. [

The pattern forming member supporting portion 320 is drawn into the process chamber 100 from the transfer chamber 200 by the sliding movement of the multi-stage sliding portion 330 of the pattern forming member transfer unit 300.

The replacement lifter 500 descends the replacement gripper 510 and grasps the pattern forming member M loaded on the pattern forming member supporting portion 320. The pattern forming member supporting portion 320 supports the multi- 330 to the transfer chamber 200 from the process chamber 100. [

Then, the replacement lifter 500 lowers the replacement gripper 510 to install the pattern formation member M held on the deposition unit (not shown).

The pattern formation member transfer unit 300 may be replaced with a transfer chamber 200 having a plurality of transfer chambers 200. The transfer chamber 200 may be replaced by a plurality of transfer chambers 200, So that the pattern forming member M can be transferred to the inside of the process chamber 100 provided at both sides.

The size of the transfer chamber 200 can be reduced, the replacement time of the pattern forming member M can be shortened, and the productivity can be improved. Further, since the pattern forming member transfer unit 300 is slidable in both directions, have.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Accordingly, such modifications or variations are intended to fall within the scope of the appended claims.

M: pattern forming member 100: process chamber
200: transfer chamber 300: pattern forming member transfer unit
310: pattern forming member return section 320: pattern forming member supporting section
330: Multistage sliding portion 331: Base plate
333: Sliding plate 335: Guide part
340: support frame part 350: plate support part
370: a conveyance drive unit 371: a first drive motor
373a: first pinion gear 373b: second pinion gear
373c: third pinion gear 375a: first rack gear
375b: second rack gear 375c: third rack gear
375d: fourth rack gear 375e: fifth rack gear
400: pattern forming member transfer unit 410: transfer unit mounting part
430: transfer unit transferring unit 500: pattern forming member replacement unit

Claims (16)

A plurality of process chambers for performing a deposition process on the substrate;
A transfer chamber provided between the plurality of process chambers, the transfer chamber forming a space for transferring a pattern forming member for forming a deposition pattern to the process chamber to the process chamber; And
And a pattern formation member transfer unit which is provided inside the transfer chamber and which extends and contracts to transfer the pattern formation member into the process chamber provided on both sides of the transfer chamber or to transfer the pattern formation member from the process chamber, And the substrate processing apparatus. The method according to claim 1,
The pattern forming member transferring unit may comprise:
A pattern formation member transfer section on which the pattern formation member is mounted and which is extended and contracted to carry the pattern formation member into the process chamber or to carry the pattern formation member out of the process chamber; And
And a conveyance driving unit connected to the pattern forming member conveying unit and capable of extending and retracting the patterned member conveying unit in both directions. 3. The method of claim 2,
The pattern forming member returning unit may comprise:
A pattern forming member supporting portion for supporting the pattern forming member;
A multi-stage sliding portion connected to the pattern forming member supporting portion and stacked in multi-stages so as to be movable relative to each other and extended and contracted as they slide; And
And a support frame portion for supporting the multi-stage sliding portion. The method of claim 3,
Wherein the multi-
A base plate connected to the support frame portion;
At least one sliding plate stacked in multiple stages so as to be able to move relative to each other between the base plate and the pattern formation member support, and sliding at the same time; And
And a guide portion provided between the base plate and the at least one or more sliding plates for guiding the relative movement of the at least one sliding plate with respect to the base plate. 5. The method of claim 4,
The guide portion
And a linear guide of an LM type for guiding the at least one sliding plate in a horizontal direction. 6. The method of claim 5,
The linear guide
An LM guide rail provided between the base plate and the at least one or more sliding plates, the LM guide rail being disposed long in a direction in which the sliding plate slides; And
And an LM block disposed between the base plate and the at least one sliding plate, the LM block being moved along the LM guide rail. 5. The method of claim 4,
The pattern forming member returning unit may comprise:
Further comprising a plate support portion provided between the base plate and the at least one or more sliding plates, respectively, for supporting a lower portion of the sliding plate. 8. The method of claim 7,
The plate support portion
And a cam follower disposed at both sides of at least one of the at least one sliding plate to prevent sagging of the at least one sliding plate when the at least one or more sliding plates slide at the same time. 5. The method of claim 4,
The conveyance drive unit,
A first driving motor provided on the support frame part and capable of rotating forward and backward so that the at least one sliding plate is slidable at the same time;
A first pinion gear provided on the base plate and connected to the first driving motor and rotated;
A first rack gear provided on a first sliding plate stacked on the base plate, the first rack gear engaged with the first pinion gear;
A second rack gear provided on the base plate;
A second pinion gear provided on the first sliding plate and engaged with the second rack gear as the first sliding plate slides; And
And a third rack gear provided on a second sliding plate stacked on the first sliding plate, the third rack gear being engaged with the second pinion gear. The method according to claim 1,
Further comprising a pattern forming member transferring unit provided inside the transfer chamber for transferring the pattern forming member transferring unit. 11. The method of claim 10,
Wherein the pattern forming member transfer unit comprises:
A carrying unit seating portion on which the pattern forming member carrying unit is seated; And
And a transfer unit transferring unit provided inside the transfer chamber for transferring the transferring unit placing unit adjacent to the other process chamber. 12. The method of claim 11,
The transfer unit transfer unit
A transfer rail disposed inside the transfer chamber, the transfer rail being disposed in a transfer direction of the pattern forming member transfer unit; And
And a conveyance driving unit connected to the conveyance unit seating unit to allow the conveyance unit seating unit to be conveyed along the conveyance rail. 13. The method of claim 12,
The feed drive unit
A screw disposed along the conveying rail and coupled to the conveying unit seating portion; And
And a second drive motor coupled to the screw to rotate the screw in forward and reverse directions. The method according to claim 1,
Further comprising a pattern formation member replacement unit provided in the process chamber for replacing the pattern formation member carried into the process chamber,
Wherein the pattern forming member replacement unit comprises:
And a replacing lifter for holding the pattern forming member and raising and lowering the pattern forming member to install and uninstall the pattern forming member in the process chamber. 15. The method of claim 14,
The replacement lifter includes:
A replacement gripper for holding the pattern formation member carried into the process chamber by the pattern formation member transportation unit; And
And a gripper lifting portion provided at an upper portion of the process chamber to lift and lower the replacement gripper. The method according to claim 1,
The pattern forming member transferring unit may comprise:
Wherein a plurality of said plurality of process chambers are arranged in said transfer chamber along said plurality of process chamber arrangement directions.

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