KR101660303B1

KR101660303B1 - Method for making for label sticker

Info

Publication number: KR101660303B1
Application number: KR1020150173017A
Authority: KR
Inventors: 조성재
Original assignee: 조성재
Priority date: 2015-12-07
Filing date: 2015-12-07
Publication date: 2016-09-27

Abstract

The present invention relates to a method for producing a label using a gradation method and, more specifically, to a method for producing label using a gradation method which shows elegance due to light and shade of a pattern for moving a light portion to a dark portion and can check authenticity with respect to a relevant product by preventing forging, using a gradation method in a process of forming a pattern of a label.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a label manufacturing method using a gradient technique,

The present invention relates to a method of forming a pattern of a label by using a gradation technique so as to gradually transfer the pattern from a light part to a dark part, And a label manufacturing method using the gradation technique.

In general, labels consist of letters, numbers, patterns, etc. to provide various information such as company's logo, trademark and so on, so that they are attached to various products.

Such labels are used on products including securities, passports, ID cards, cards, watches, hats, bags, cosmetics and household appliances.

On the other hand, an adhesive is applied to the bottom surface of the release paper, and a pattern is formed on the upper surface by letters, numbers, patterns, drawings, or the like, or a lens layer is formed on the upper surface of the pattern.

The designed pattern is printed on the release paper mainly by silk printing.

The silk printing may use a method of inducing visual illusion by making the background of the pattern different from the base painted with the dye or pigment and the brightness or saturation of the image, or by making the background or the image composed of fine and complex patterns or symbols .

However, in the conventional silk printing method, a label produced by printing using conventional dyes or pigments is merely a representation of two-dimensional image, and is easily discolored due to ultraviolet rays of dyes or pigments, and pattern printing is easy, There is a problem that can be done.

Recently, with the development of office automation equipment, the resolution of high-resolution color copiers and color printers has been improved, and problems such as falsification of banknotes, securities, passports, ID cards, cards, etc. have been used frequently .

With the rapid development of color copiers and color printers that are high-resolution computer peripherals, and the development of counterfeiting technologies by professional counterfeiters, counterfeiting can not be fundamentally prevented by simply printing patterns.

However, such an authenticated printed matter is most commonly used because it is simple to manufacture and use, but recently it has been disadvantageous that forgery and falsification can be facilitated due to development of printing technology.

Korean Patent Application No. 10 - 2013 - 7028237 "Certification Label"

In order to solve the above problems, it is an object of the present invention to form a pattern using a gradation technique without printing a pattern by silk printing as in the prior art, thereby preventing forgery and producing a beautiful image.

Therefore, the present invention aims to prevent forgery, alteration or reproduction of a product or document by attaching it to commercial products or documents which are highly likely to be copied.

According to an aspect of the present invention, there is provided a method of designing a pattern on a wafer, the method comprising: designing a pattern with a different number of patterns to be formed at the same area or different distances between patterns; ). When the pattern is filled in the etched pattern, the portion where the number of patterns is dense is expressed in darkness (dark) and the portion in which the number of patterns is not dense is treated to be lighter (thinner) than the dense portion. And a method of manufacturing a label using the method.

As described above, according to the present invention, the label manufacturing method is designed such that the number of patterns is different in the same area or the distance between the patterns is different, and then the pattern is etched by a plasma method, And then patterned in the first and second regions are alternately covered in turn by the mask, and then etched by a plasma method so that the depth and width of the patterns formed in the first and second regions are different from each other, When the pigment is filled by the pattern, the gradation technique which expresses the color or the shade of the pattern located in the first and second areas so as to be gradually shifted from the bright part to the dark part is used to prevent the pattern from being falsified and to produce a beautiful effect .

Therefore, the present invention has the effect of preventing forgery, alteration or duplication of a product or document by attaching it to commercial products or documents which are highly likely to be duplicated.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flow chart showing a method of manufacturing a label according to the present invention; FIG.
FIG. 2 is a flowchart showing another embodiment of a method of manufacturing a label according to the present invention. FIG.
3 is a plan view showing a pattern layer in the method of the present invention for producing a label.
Fig. 4 is a plan view showing a part of the label manufacturing method of Fig. 2; Fig.
5 is a plan view showing another embodiment of the method for manufacturing a label according to the present invention.
6 is a sectional view showing the label of the present invention.
7 is a photograph showing an embodiment of the label of the present invention.
8 is a photograph showing an embodiment of the present invention label.

In order to achieve the above objects and effects, the present invention will be described in detail with reference to the accompanying drawings.

The present invention label 1 is attached to various products including money, banknotes, securities, passports, identification cards, cards, clocks, hats, bags, clothes, bottles and electronic products, Of course, in order to prevent forgery, the pattern (3) is expressed as a farmhouse so as to gradually move from the bright part to the dark part by using a gradation technique.

On the other hand, the label 1 of the present invention comprises a pattern layer 2 on which a pattern 3 is formed on the top surface of a release paper, a focal length layer on the top surface of the pattern layer 2, and a lens layer on the top surface of the focal length layer.

First Embodiment

3 is a plan view showing a pattern layer in a method of manufacturing a label according to an embodiment of the present invention, and FIG. 6 is a sectional view showing the label of the present invention.

In order to form the pattern 3 in the process of manufacturing the label 1, the number of patterns 3 may be different in the same area when the pattern 3 is designed on the wafer 7, And the pattern 3 is designed.

The designed pattern 3 is etched by a plasma method to form grooves inward.

The etched pattern 2 is filled with a pigment.

Then, in the pattern 2 filled with the pigment, the number of the pattern 2 is large and the densely packed portion is expressed in darkness (dark), and the portion where the number of the pattern 3 is small and the dense portion is thinner than the dense portion do.

In addition, in another embodiment, the portions where the distances from the patterns 3 are arranged close to each other are darkened (dark), and when the distances between the patterns 3 are more distant than the portions between the patterns 3, And it is possible to produce a beautiful appearance visually.

Second Embodiment

Straight lines in the margins excluding the pattern (3) in the portion where the pattern (3) is closely packed or the distance between the patterns (3) is close. An auxiliary pattern 8 representing a shape including curves and dots is irregularly arranged and etched, and the pigment is filled to darken the pattern 3 to enhance the shade.

Third Embodiment

FIG. 2 is a flowchart showing another embodiment of the label manufacturing method of the present invention, and FIG. 4 is a plan view showing a part of the label manufacturing method of FIG.

The pattern layer 2 is divided into 1 and 2 regions 4 and 5 when the pattern 3 is designed on the wafer 7.

The first and second masks 6 and 6 'are prepared so as to cover the first and second regions 4 and 5 and then pattern 3 is formed on the first and second regions 4 and 5, do.

The pattern 3 of the first region 4 is etched by the plasma method after the second region 5 is covered with the second mask 6 'and the exposed region is exposed by the second mask 6' The pattern 3 of the second region 5 is not etched.

The pattern 3 of the etched first region 4 is filled with a pigment.

The second mask 6 'is removed from the second region 5 and then the first mask 6 is covered with the first region 4 to protect the etched pattern 3 in the first region 4 .

The pattern 3 is etched in the second region 5 in a depth and width deeper and wider than the pattern 3 etched in the first region 4 by the plasma method.

The pattern 2 etched in the second region 5 is filled with pigment and then the first mask 6 is separated from the first region 4 and then the first and second regions 6 and 6 ' Creep to remove the pigment on the remainder except the etched pattern (3).

The depth of the etched pattern 3 of the second region 5 is greater than that of the first region 4 and the width of the etched pattern 3 is wider than that of the first region 4 to fill the pattern 3 in the first region 4, (3) located in the first region (2) and the second region (5).

Fourth Embodiment

The present invention is straightforward in the margins except for the etched pattern (3) in the second region (5). The pattern 3 formed in the second region 5 may be darker by filling the pigment after the auxiliary patterns 8 including the curved line and the point are irregularly arranged and etched.

Then, it is expressed as darker and darker part than the first area (4) and can not be visually confirmed.

The patterns 3 to be etched in the first and second regions 4 and 5 may have different numbers of patterns 3 to be formed in the same area or different distances between the patterns 3.

Then, the densely packed portion of the pattern 3 filled with the pigment 3 has a large number of patterns 3, and the portion of the dense packed portion is darkened (dark) do.

In addition, in another embodiment, portions where the distances from the patterns 3 are arranged close to each other are darkened (dark), and when the distances between the patterns 3 are more distant than that between the adjacent portions, And it is possible to produce a beautiful appearance visually.

FIG. 7 is a photograph showing an embodiment of the present invention label, and FIG. 8 is a photograph showing an embodiment of the present invention label.

The label of the present invention is such that the pattern layer is divided into the first and second regions, and then the pattern is etched so as to be gradually transferred from the bright portion to the dark portion.

1: label 2: pattern layer
3: Pattern 4: First area
5: second region 6, 6 ': first and second masks
7: Wafer 8: Auxiliary pattern

Claims

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In a label manufacturing method,
Dividing the pattern layer into one or two regions when designing the pattern on the wafer; Wow
Preparing first and second masks for covering the first and second regions, respectively, and performing exposure processing; Wow
Designing patterns in the first and second regions, respectively; Wow
Etching the second region by a plasma method while exposing the second region to a second mask, and then patterning the first region by a plasma method; Wow
Filling the pattern of the etched first region with a pigment; Wow
Removing a second mask in the second region; Wow
Covering the first mask to expose the first region; Wow
Etching the pattern in the second region with a different depth and width than the pattern etched in the first region by a plasma method; Wow
Filling the etched pattern in the second region with a pigment; Wow
Separating the first mask in the first region and then creasing the first and second regions; Wow
The pattern is more deeply deeper and wider than the etched pattern of the second region than the first region, so that the pigment is filled more and the pattern located in the second region in the pattern located in the first region gradually Wherein the labeling is performed so as to be shifted.

3. The method of claim 2, wherein a straight line is drawn in the margin except for the etched pattern in the second region. Wherein a pattern formed in the second area is darkened by filling the pigment after irregularly arranging and etching the auxiliary pattern including the curved line and the dot.

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The method according to any one of claims 2 and 3, wherein patterns to be etched in the first and second regions have different numbers of patterns to be formed in the same area, or distances between patterns are different from each other Label manufacturing method.