KR100749283B1 - Reflective film for CRT panel - Google Patents

Abstract

The present invention relates to a reflective film for a CRT panel, by applying a release agent on a polyester film and depositing aluminum adjusted to an appropriate thickness thereon, and applying an adhesive layer to transfer the aluminum film to a CRT panel with a phosphor formed by a transfer device. In this case, as the reflective film, the brightness of the metal deposition layer is improved, and the formation of the metal reflective film for the conventional CRT panel is improved by the deposition by the deposition method, which can shorten the process and the processing time and reduce the defective rate, thereby reducing the CRT panel. The effect of remarkably improving the productivity can be obtained.

Description

Reflective film for CRT panel {Reflective film for CRT panel}             

1 is a cross-sectional view of a reflective film for a CRT panel according to the present invention.

* Detailed description of the main symbols in the drawings *

11-base film 12-release layer

13-metal deposition layer 14-adhesive layer

The present invention relates to a reflective film for a CRT panel, and more particularly, to improve the formation of the metal reflective film of the CRT panel by deposition in a conventional batch type so that the metal reflective film can be formed on the film to be carried out by transfer. It relates to a reflective film for a CRT panel.

In the formation of a CRT screen, the conventional technique of forming a reflective film on the back of the phosphor forms a black matrix on the glass of the panel, followed by red, green, and blue phosphors. The films are formed through the processes of coating, drying, exposure and development, respectively. Then, to smooth the reflective film, a thin resin layer such as PVA or acrylic is applied and dried, and each panel is deposited by a batch method, and the organic materials are burned by decomposition at a temperature of 450 ° C. or higher, and the graphite component, phosphor and The screen of the panel was completed, leaving only the aluminum reflective film.

However, when using such a conventional technology, the aluminum layer is heavily diffused and lacks in brightness, and should be subjected to a primer treatment and a process for forming micropores in aluminum, and to be deposited in a batch manner, so that the process time and cost There are many disadvantages, such as a lot of defects occur.

Accordingly, the present inventors have developed a film that can be transferred by forming a metal reflecting film on the film, while trying to solve the problem of forming the metal reflecting film of the conventional CRT panel by depositing by a batch type. Was done.

Accordingly, it is an object of the present invention to provide a transfer film for a CRT panel which can simplify the manufacturing process of the CRT panel by forming a transfer film having a reflective film and transferring the reflective film to form a reflective film of the CRT panel by a batch type.

CRT panel transfer film of the present invention for achieving the above object is a structure in which a base film, a release layer, a metal deposition layer and an adhesive layer are sequentially stacked, the metal deposition layer of the optical density (Optical Density) of 4-5 It is formed in a thickness and is characterized in that the amount of the 111 surface of the crystal structure of the metal is more than 30%.

The present invention will be described in more detail as follows.

The structure of the CRT panel reflective film of the present invention is as shown in FIG.

The base film 11 is a film for coating processing, and mostly uses a polyester film.

The release layer 12 assists in forming the aluminum deposition layer and ultimately releases the base film and the deposition layer. As the release layer resin, a methyl methacrylate-based acrylic resin which is decomposed at a temperature of 400 ° C. or higher is used. When the film is transferred by adding about 3 to 8% of SiO ₂ particles, the fine particles may be formed by the bending of the phosphor and the bending of the particles. A hole could be formed. If the amount of particles exceeds 8%, the number of micropores becomes too large, resulting in a decrease in brightness after the completion of the product. If the amount of particles is less than 3%, the number of pores is small, and the decomposition of organic substances in the adhesive and phosphor layers is decomposed at 400 ° C. or higher. The gas is not discharged smoothly, resulting in swelling of the reflective film. It is preferable that the thickness of a mold release layer is 1-2 micrometers.

Meanwhile, the metal deposition layer 13 is formed by depositing a metal such as aluminum to express metal gloss. Specifically, the metal deposition layer 13 is formed by depositing aluminum in a high vacuum on a release layer. The metal deposition layer thus formed has an optical density of 4 to 5, and it is appropriate that 111 surfaces of the metal crystal structures are 30% or more, preferably 50% or more with respect to 200 surfaces.                     

If the optical density of the metal deposition layer is less than 4, the luminance value is lowered. If the optical density of the metal deposition layer is greater than 5, there is a problem in that the followability during transfer is insufficient. In addition, when the amount of the 111 surface of the metal crystal structure is less than 30%, there is a problem that the luminance value is lowered.

When the adhesive layer 14 is formed on the above metal deposition layer, the adhesive layer is a normal acrylic resin, and may be formed by applying with an appropriate thickness.

The reflective film having the above structure can be transferred at a temperature of 150 to 180 ° C. of the transfer roll and a heating temperature of 45 to 70 ° C. of the panel.

As described above, using SiO ₂ in the release layer induces micropores in the metal deposition layer, and improves the brightness by appropriately adjusting the optical density of the metal deposition layer and the crystal structure of the metal, thereby reducing the CRT panel manufacturing process and process time. And defects can be reduced, thereby improving productivity in manufacturing CRT panels.

Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited by the Examples.

Example 1

95.5% by weight of polymethylmethacrylate-based acrylic resin and 4.5% by weight of SiO ₂ were diluted in a mixed solvent of methyl ethyl ketone and toluene on a 25 μm-thick polyester film and coated to a thickness of 1.5 μm and dried at 100 ° C. for a suitable time. To form a release layer. SiO ₂ used at this time has a secondary particle diameter of 0.1 to 2 m.

After the release layer was formed, aluminum was deposited thereon to a thickness of 4.5 by using a vacuum evaporator to form a metal layer. At this time, the amount of 111 faces in the metal crystal was 55%. The optical density was measured using TR927 (manufactured by Macbeth), and the metal crystal structure was measured by measuring the half width of the optical X-ray.

A CRT panel reflective film was prepared by forming an adhesive layer with a thickness of 2 μm using an acrylic resin having an appropriate glass transition temperature on the metal layer.

Example 2

A reflective film for a CRT panel was manufactured in the same manner as in Example 1, except that the content of SiO _{2 in} the release layer composition was 7 wt% and the polymethyl methacrylate acrylic resin was 93 wt%.

Example 3

A reflective film for a CRT panel was manufactured in the same manner as in Example 1, except that a metal deposition layer was deposited at a thickness of 5 optical density.

Example 4

A reflective film for a CRT panel was manufactured in the same manner as in Example 1, except that the ratio of 111 of the crystal plane of the metal deposition layer was 80%.

Comparative Example 1

A reflective film for a CRT panel was prepared in the same manner as in Example 1 except that the content of SiO _{2 in} the release layer composition was 9% by weight, and 91% by weight of the polymethyl methacrylate-based acrylic resin.

Comparative Example 2

Prepared in the same manner as in Example 1, except that the metal deposition layer was deposited to a thickness of 3 optical density.

Comparative Example 3

Manufactured in the same manner as in Example 1, except that 111 of the crystal planes of the metal deposition layer was 25%.

The conditions of Examples 1 to 4 and Comparative Examples 1 to 3 are summarized in Table 1 below.

Example Comparative Example One 2 3 4 One 2 3 Release layer Particle Content (%) 4.5 7 4.5 4.5 9 4.5 4.5 Metal deposition layer Optical density 4.5 4.5 5 4.5 4.5 3 4.5 Crystal aspect ratio (p. 111) 55 55 55 80 55 55 20

For the CRT panel reflective film prepared according to Examples 1 to 4 and Comparative Examples 1 to 3, the transferability and luminance were measured by the following method, and the results are shown in Table 1 below.

1) Transcription

When the pressure of the laminator was 5 kg / cm 2, the temperature of the roll to be transferred and the temperature of the panel were measured.

2) luminance

The reflective film was evaluated after transfer and decomposition sintering at 450 ° C. for 30 minutes.                     

Example Comparative Example One 2 3 4 One 2 3 Transcription Roll temperature (℃) 150 150 150 150 150 150 150 Panel temperature (℃) 45 45 45 45 45 45 45 Luminance 29.5 29.2 30.0 30.5 28.7 28.0 28.2

As described above in detail, according to the present invention, aluminum is deposited to apply a release agent on a polyester film, and the thickness is appropriately adjusted thereon to improve brightness, and an adhesive layer is applied to form an aluminum film with a phosphor formed by a transfer device. In the case of the transfer to the CRT panel, the formation of the metal reflecting film for the conventional CRT panel is improved by the deposition formed by the deposition method, which can shorten the process and the process time, and reduce the defective rate, thereby significantly improving the productivity of the CRT panel. Can be.

Claims (2)

A base film, a release layer, a metal deposition layer and an adhesive layer for expressing a metal gloss are sequentially laminated, the metal deposition layer is formed with a thickness of 4 to 5 optical density and the amount of 111 surfaces of the metal crystal structure Reflective film for CRT panels, 30% or more. According to claim 1, wherein the release layer is a methyl methacrylate acrylic resin having a glass transition temperature of 85 to 110 ℃, containing 3 to 8% of SiO ₂ particles, the secondary particle diameter of the particles is 0.1 to 2㎛. Reflective film for CRT panel.

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