KR100576819B1 - Process data management system for semiconductor processing equipment - Google Patents

Abstract

The present invention relates to a process data management system of a semiconductor processing equipment used in a semiconductor manufacturing line. More particularly, the result data of the process condition inspection of the semiconductor processing equipment, which is carried out at regular intervals, is not managed manually by a worker. The present invention relates to a process data management system of a semiconductor process facility which is replaced by the control of a server and the control of peripheral devices.

As the data management of the process condition inspection, which was manually performed, is replaced by the semiconductor process data management system according to the present invention, it is unnecessary to prepare a control chart for managing the process condition inspection data, reducing the excessive work of the operator, and before the process proceeds. As the data of the inspection is computerized, it is easy to search and process the engineer's data, and it is easy to derive the abnormal equipment, so that the quick action is possible. At the same time, it is possible to check whether or not the process can be input, so that a quick process input is made.

Control server, database server, host server

Description

Process data management system for semiconductor processing equipment

1 is a block diagram of a system in accordance with a preferred embodiment of the present invention.

2 is a schematic conceptual diagram of an automatic repetition process according to a preferred embodiment of the present invention.

3 is a flow chart of an automatic iteration process according to a preferred embodiment of the present invention.

4 is a flow chart of a real time process according to a preferred embodiment of the present invention.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a process data management system for semiconductor processing equipment used in a semiconductor manufacturing line. More particularly, the present invention relates to a process of data processing of process condition inspection of semiconductor processing equipment, which is performed at regular intervals, without the manual operation of an operator. The present invention relates to a process data management system of a semiconductor process facility which is replaced by control of a server and management by a process of peripheral devices thereof.

In the semiconductor industry, which is rapidly developing, various semiconductor equipment development and manufacturing technologies are being developed to integrate more and more semiconductor devices per unit area.

In order to produce a finished semiconductor product, the pure silicon, which is the parent material of the semiconductor product, is purified to produce a wafer, and a wafer processing process of integrating semiconductor elements on the wafer is performed. After electrical die sorting, the chip assembly on the wafer must be cut and packaged to be applied to printed circuit boards.

Before proceeding with this complex series of processes, each semiconductor processing facility is inspected for process conditions that are tested to ensure that the process is in good condition.

When the process condition inspection results are in a state suitable for the process input, the wafer to be processed is put into the semiconductor processing equipment which has been inspected, and the wafer to be processed is prohibited unless it is suitable for the process.

This process condition inspection includes all the semiconductor process equipment inspections and individual inspections according to the characteristics of each equipment and is carried out at regular intervals such as once a day or three times a day.

An example of a process condition check common to all semiconductor process facilities is a particle check. An example of individual process condition checks according to the characteristics of each semiconductor process facility is a depo-rate check. ), Etch-rate check, removed-rate check, and the like.

However, the process of inspecting the process conditions and managing the data is a cliché that is not suitable for the cutting edge of semiconductor lines.

 Before the operator progresses the wafer for process condition inspection, all measurements are performed at the measurement facility and all the measured values are recorded in the data management sheet, and the wafer which has been measured before is transferred to the process progress facility for processing. When the wafer process is completed, the operator post-measures the processed wafer and records the obtained measured value in the data management sheet, while the operator directly calculates the difference between the measured values before and after the result. It was determined whether the process was possible by checking whether the reference value was satisfied.

As a result, since the amount of change in data indicating whether the process can be performed is not managed by statistical process control (SPC), minute changes due to abnormal causes of facilities and lots are not easily detected, The management of process condition data leads to an overload of workers due to the repetitive work of the same work flow, and the computational mistakes that occur during the process of calculating the difference between measured values before and after the operator make the process condition inspection meaningless. Results in.

An object of the present invention is to replace the management of the process data of the process equipment in the semiconductor manufacturing line from the manual management of the operator to the management by the computer system.

The object of the present invention will be described in more detail in the configuration and operation of the present invention to be described later.

The process data management system of the semiconductor processing equipment according to the present invention is composed of a control server, a process equipment, a measurement equipment, an operator interface, a facility controller, a client server, a database server, and a host server. Interconnected to transmit data bidirectionally by a predetermined protocol. The control server is connected to the operator interface and recognizes the last step. Then, the automatic repetition process is executed, which returns to the initial step.The operator interface is connected to the facility controller that controls the process facility and the measurement facility to process the command data transmitted from the control server. Transfer to equipment and measuring equipment.

In addition, the data in the system is transmitted, stored and computed in real time to enable retrieval and processing of data in the operator interface and client server in real time, which is managed by a statistical process control program at the host server.

The construction and operation of the preferred embodiment according to the present invention will become more apparent from the following detailed description and the accompanying drawings.

Preferred embodiments according to the present invention are the process equipment 27, the measurement equipment 29, the equipment controller 25, the operator interface 20, the control server 30, the client server 10, the database as shown in FIG. The server 40 is configured to include a host server 50 and a network 100.

Specifically, the process facility 27 is a facility for carrying out a predetermined process, a loading unit (not shown) for loading a wafer, an unloading unit (not shown) for unloading, a process progressing unit for performing a predetermined process (not shown). Is connected to the facility controller 25.

The measurement facility 29 is a facility in which inspection for determining whether the process progress conditions of the process facility 27 is normal is connected to the facility controller 25 in the same manner as the process facility 27.

The facility controller 25 includes an operator interface 20, a process facility 27, an operator interface 20, and a measurement facility 29, which will be described later, for transmitting a command transmitted to the process facility 27 and the measurement facility 29. It is arranged to connect between.

The operator interface 20 is disposed between the network 100 and the facility controller 25 so as to transmit a command transmitted from the control server 30 to the facility controller 25. In addition, the operator interface 20 is configured with a display unit (not shown) for displaying the command data transmitted from the control server 30 so that the operator can recognize the process. A data manipulation unit (not shown) in which simple data manipulation is performed is provided.

The control server 30 is connected to the operator interface 20 and the database server 40 by the network 100, and provides a control command for controlling the process facility 27 and the measurement facility 29 by the operator interface 20. Measurement data transmitted through the operator interface 20 is transmitted to the database server 40 via the control server 30.

The database server 40 is connected to the control server 30 through the network 100 to store data transmitted from the control server 30, and is connected to the host server 50 through the network 100 to control the data. A data storage unit (not shown) configured to transmit data stored in the server 30 is stored.

The host server 50 is connected to the control server 30, the operator interface 20, and the client server 10 through the network 100 to be bidirectional data transmission.

The operation of the embodiment having the above-described configuration will be described with reference to FIGS. 2 to 4.

Fig. 2 shows an automatic repetition process of returning to the first step after recognizing the last step after proceeding from step 1 to step N designated as the last step. (Where N is an arbitrary natural number.)

The conceptual diagram of FIG. 2 will be described in detail with the flowchart of FIG. 3.

First, the control server 30 proceeds to the step designated as the first step and stores the measurement data (S2).

Specifically, when the control server 30 transmits a command signal for the first step to the operator interface 20 through the network 100, the operator interface 20 transmits a command signal to the connected facility controller 25.

When the facility controller processes the transmitted command signal and transmits the command signal to the process facility 27 or the measurement facility 29, the facility facility 27 or the measurement facility 29 performs a predetermined process or measurement and installs the resulting data. The controller 25 and the operator interface 20 are transferred to the control server 30, and the control server 30 recognizes that the first step is completed.

The result data transmitted to the control server 30 is transferred to the database server 40 and temporarily stored.

The automatic repetition process then checks whether a step designated as the next step exists (S4).

If there is no designated next step, the process recognizes the last step (S16) and returns to the first step. If there is a step designated as the next step, the process proceeds to the next step (S6).

In step S6, the process of completing the subsequent steps is also performed in the same flow as in the case of the first step, and similarly to the first step, the received result data is transferred to the database server 40 and temporarily stored.

The automatic repetition process checks again whether there is a step designated as a subsequent step (S8), and if there is no designated next step, recognizes whether it is the last step (S16) and returns to the first step. Transition to step 3 progression.

Through this process, the automatic repeating process proceeds to the Nth step, and as a result, the data is transmitted to the database server 40 and temporarily stored. (S10)

Again, it is checked whether a step designated as a subsequent step exists (S12), and if the designated subsequent step exists, the automatic repeating process proceeds to the next step designated as a subsequent step of the Nth step, and then the resultant data is transferred to the database server 40. In step S14, the process of checking whether the next step designated as the next step exists is repeated until the next designated step does not exist.

The automatic repetition process recognizes as the last step (S16) and returns to the first step when there is no longer the specified subsequent step.

 The control server 30 performing this automatic repetition process transmits the process condition data generated during the process condition inspection process to the host server 50 in real time, and performs statistical process management (SPC) operating in the host server 50. control) to be managed by a program.

In addition, the control server 30 judges the process condition inspection process as a series of repetitive flows, and when recognizing the designated last step, the control server 30 can feed back to the first step again, and thus proceeds with an iterative and regular monitoring step. It is possible to do

Therefore, when such data is processed by the real-time processing flow chart of FIG. 4, the host server 50 calculates the data and feeds it back in real time, and the feed-back data is provided by the operator interface 20 and the client server 10. It is provided in real time, allowing workers and engineers to search and process data about process equipment in real time.

FIG. 4 is a flowchart illustrating processing of data in real time for each step of FIG. 3 in the preferred embodiment of FIG. 1.

The operator inputs initial value data measured by the measurement facility 20 to the operator interface 20. (S30)

The operator inputs the late value data measured by the measurement facility 20 to the operator interface 20. (S32)

The control server 30 compares the data transmitted in real time in step S44 below with the reference value information transmitted from the host server 50 in step S50 (S34).

As a result of the comparison in step S34, if the data transmitted in step S44 exceeds the reference value, the process shifts to the first step again, and if it does not exceed the reference value, the process proceeds to the next step (S36).

If the run is normally input, it ends. (S38)

The data input in step S30 is transmitted to the control server 30 in real time through the network 100, and the control server 30 transmits and stores the transmitted initial value data to the database server 40 again (S40). )

The data input in step S32 is transmitted to the control server 40 in real time through the network 100, and the control server 30 transmits and stores the transmitted late value data to the database server 40 again. S42)

Data stored and collected in the database server 40 in steps S40 and S42 are transmitted to the control server 30 in real time.

Data stored in the database server 40 in step S44 is transmitted to the host server 50 in real time (S46).

The host server 50 stores the data transmitted in step S46 and calculates and processes the data transmitted by the statistical process management program.

The host server 50 always transmits reference value information to the control server 30 in real time, and provides reference value information for the comparison of the above step S34.

By the real-time processing process, the process check lots and the data of the process facility 10 are rapidly fed back to the operator interface 20 to see if the reference value is exceeded, so that the process can be quickly responded, and the client server 10 can access the network 100. Since it is connected to the host server 50 by contacting the host server 50 in which data is transmitted, stored, and calculated in real time, the data is searched and processed in real time.

Next, when a plurality of initial values and late values occur by repeatedly measuring before and after the process, a method of deducing and calculating the result value most recently checked by the host server 50 will be described. Here, the subtraction operation is an operation that calculates the difference value by subtracting the late value from the initial value, and the facility is designated to proceed with the normal process only when the difference value falls within the specified reference value.

As mentioned above, if there are multiple before and after checks, the first case with multiple prechecks, the second case with multiple postchecks, and the third case with multiple pre and postchecks. Can be classified.

<First case>

Assuming that the previous check value is X and the post check value is Y, the previous check value is X1, X2 ,, Xn according to the measurement order. Where Xn is the most recently measured value among a number of previous check values, and the post check value is Y, the subtraction operation value is obtained by the following equation (n is an arbitrary natural number).

Subtraction value = ± (Xn-Y)

<Second case>

A method for calculating when a large number of post check values occurs due to repeated measurement, wherein the pre check value is X, the post check value exists up to Y1, Y2, ,, Yn according to the measurement order, and a plurality of Yn post checks are performed. When it is the most recently measured value, the subtraction value is obtained by the following equation (n is an arbitrary natural number).

Subtraction value = ± (X-Yn)

<Third case>

This is a method of calculating when a large number of before and after check values are generated by repeated measurement.The previous check value exists up to X1, X2, ,, Xn according to the measurement order, and Xn is the most recently measured value. When the check value exists after Y1, Y2, ,, Yn according to the measuring order and Yn is the most recently measured value, the subtraction operation value is obtained by using Equation 3 below (n is an arbitrary natural number). .)

Subtraction value = ± (Xn-Yn)

As mentioned above, when there are a large number of targets for the subtraction operation, the accuracy of the process condition check is improved by selecting a reasonable target according to the measurement time sequence.

Meanwhile, a method of determining the order of the check values used in the above-described subtraction operation is as follows.

In FIG. 4, when an operator inputs a check value, a plurality of input check values are transmitted to the host server 50 through the database server 40 in real time, and the host server 50 is transmitted together with the plurality of check values. Recognizing each measurement time, the check value having the most recent measurement time is determined as a subtractor and a subtractor of the above subtraction operation.

In the preferred embodiment of FIG. 1 which performs such a complex algorithm, the process condition check process is judged as a series of repetitive flows by an automatic repetition process of the control server 30, and the first step is recognized again by recognizing the designated last step Since it is possible to feed back, it is possible to proceed with an iterative and regular monitoring step.

The computerized data is transmitted to the host server 50 in real time by processing the process condition data generated during the process condition inspection process to be managed by statistical process control (SPC) operating in the host server 50. Statistical process control links minute changes in the data to cause traces for accidental causes and abnormal causes by scattering data from the past data. As a result of the trace traces, the process facility 10 is concerned with process improvement. Receive clear information.

In addition, the real-time process of FIG. 4 provides a process for processing the data processed in the preferred embodiment of FIG. 1 in real time, so that data relating to the process conditions of the process facility 10 can be quickly fed back to the operator interface 20. The client server 10 is connected to the host server 50 by a network, so that the data is transmitted and stored in real time, and the host server 50 stores the data again after calculating the data. When contacted, data retrieval and processing takes place.

The process data management system of the semiconductor processing equipment according to the present invention can obtain various effects of various aspects as follows.

First, by computerizing the flow of work that the operator directly inputs and calculates in the control chart, the excessive amount of work of the worker is reduced, and the accuracy of process condition inspection can be improved by eliminating the calculation mistakes that occurred in the process of the worker's calculation.

Second, the data management and calculation of the pre-process inspection conducted by the operator is replaced by the automatic repetition process, so it is easy to identify the minute changes caused by the abnormal causes of the facilities and lots.

Third, as the result data of the process condition inspection is managed by statistical process control, computerization of data is performed, so that the trace of accidental causes and abnormal causes can be easily traced by scattering the data with minute changes of the data. As a result, the process equipment receives clear information about process improvements.

Fourth, since the operator can confirm whether the process can be input at the same time as the late data input by the process to be updated in real time, it is possible to process the process quickly.

Fifth, when a plurality of data of process condition inspection occurs, reliable process condition inspection is performed by an algorithm that accurately selects and computes the most recent data.

Sixth, data transmitted and stored in real time to the host server can be retrieved and processed by the client server.

Claims (3)

Process equipment for performing a predetermined process; A measurement facility for performing a measurement process; A facility controller connected to the process facility and the measurement facility to transmit a command signal; An operator interface connected between the facility controller and the network to transmit a command signal to the facility controller and display the fed back data; A database server connected to the network and storing data transferred; A control server connected to the operator interface and the database server through the network and initially generating command signals for the process facility and the measurement facility to the operator interface; And A host server connected to the components through the network and collecting and storing all data necessary for process progress; Consists of, After proceeding with the first step and storing the measured data, check whether there is a step designated as the next step, and proceed with the subsequent step and save the measured data repeatedly so that the last step if there is no step designated as the next step Process data management system of a semiconductor process equipment, characterized in that for performing the automatic repetitive process to move to the first step to recognize. The method of claim 1, The host server receives and temporarily stores data stored in the control server after being transmitted to the database server in real time, and compares the data with a reference value of a process condition check stored in the host server. If the value is not exceeded, the comparison result is transmitted to the operator interface to indicate that the process equipment that has undergone the process condition inspection can be normally processed. If the comparison result with the reference value exceeds the reference value, the comparison is made to the operator interface. A process data management system for a semiconductor process facility, characterized in that for transmitting a result value to display that the process of the process condition check should be restarted. The method of claim 2, When there are a plurality of data of the same step among the data retransmitted from the database server to the host server, the host server selects the data finally measured according to the measurement order of the data as the data required for the subtraction operation And a subtractor and a subtractor of the subtraction operation required for comparison with the conditional inspection reference value.

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