KR100428967B1 - Cathode ray tube and method for manufacturing the same including steps of depositing first and second compounds and grounding copper tape - Google Patents

Cathode ray tube and method for manufacturing the same including steps of depositing first and second compounds and grounding copper tape Download PDF

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KR100428967B1
KR100428967B1 KR1019960066929A KR19960066929A KR100428967B1 KR 100428967 B1 KR100428967 B1 KR 100428967B1 KR 1019960066929 A KR1019960066929 A KR 1019960066929A KR 19960066929 A KR19960066929 A KR 19960066929A KR 100428967 B1 KR100428967 B1 KR 100428967B1
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South Korea
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metal
ray tube
cathode ray
transparent conductive
composition
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KR1019960066929A
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KR19980048359A (en
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이종혁
전윤호
조윤형
박종환
장동식
이정진
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삼성에스디아이 주식회사
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86Vessels; Containers; Vacuum locks
    • H01J29/867Means associated with the outside of the vessel for shielding, e.g. magnetic shields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/863Passive shielding means associated with the vessel
    • H01J2229/8636Electromagnetic shielding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/88Coatings
    • H01J2229/882Coatings having particular electrical resistive or conductive properties

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE: A cathode ray tube and a method for manufacturing the same are provided to effectively shield electromagnetic waves by forming a low resistant transparent conductive film on a panel and controlling material and length of a grounding tape. CONSTITUTION: A method for manufacturing a cathode ray tube comprises a step of depositing a first compound on a panel(31) of a cathode ray tube, wherein the first compound contains transparent conductive particle selected from a group composed of tin containing indium oxide, indium oxide titanium, tin oxide, titanium oxide, antimony oxide, and a solvent; a step of forming a transparent conductive film by depositing a second compound on the resultant structure, wherein the second compound contains metal alkoxide(M1(OR)4), metal(M2) micro particle or metal salt containing metal micro particle, catalyst and solvent, and drying and heat treating the resultant structure; and a step of grounding a copper tape(35) between a band(34) and the panel of cathode ray tube where the transparent conductive film is formed.

Description

음극선관 및 그 제조방법Cathode ray tube and its manufacturing method

본 발명은 음극선관 및 그 제조방법에 관한 것으로서, 상세하기로는 전자파 차단 효과가 매우 우수한 전자파 차폐막을 갖는 음극선관과 이를 저렴한 제조비용으로 제조하는 방법에 관한 것이다.The present invention relates to a cathode ray tube and a method for manufacturing the same, and more particularly, to a cathode ray tube having an electromagnetic wave shielding film having excellent electromagnetic wave blocking effect and a method of manufacturing the same at a low manufacturing cost.

통상적으로 칼라 음극선관은 도 1에 도시된 바와 같이 내면에 형광막(11)이 형성된 패널(10), 이 패널(10)의 내부에 형광막 (11)과 소정간격 이격되도록 설치되며 섀도우마스크(12)와 이를 지지하는 프레임(13)으로 이루어진 섀도우마스크 프레임 조립체 (14), 및 상기 패널(10)과 봉착되는 것으로 그 네크부(15)에 전자총 (16)가 봉입되고 그 콘부(19)에 편향요오크(17)가 설치된 펀넬(18)을 구비하여 구성된다.Typically, the color cathode ray tube is a panel 10 in which the fluorescent film 11 is formed on an inner surface thereof, as shown in FIG. 1, and is installed to be spaced apart from the fluorescent film 11 by a predetermined distance inside the panel 10. 12) and a shadow mask frame assembly 14 composed of a frame 13 supporting the same, and an electron gun 16 enclosed in the neck portion 15 and enclosed in the neck portion 15 so as to be sealed to the panel 10. It is comprised with the funnel 18 in which the deflection yoke 17 was provided.

이와 같이 구성된 칼라 음극선관은 상기 네크부(15)에 장착된 전자총(16)으로부터 방출된 전자빔이 편향요오크(17)에 의해 선택적으로 편향되어 색선별기능을 가지는 섀도우마스크(12)의 전자빔 통과공을 통과하여 형광막(11)의 각 형광점에 랜딩됨으로써 화상을 형성하게 된다.The color cathode ray tube configured as described above passes the electron beam of the shadow mask 12 having the color discrimination function by selectively deflecting the electron beam emitted from the electron gun 16 mounted on the neck portion 15 by the deflection yoke 17. It passes through the ball and lands at each fluorescent point of the fluorescent film 11 to form an image.

그런데 영상을 재생하기 위한 상기 패널 (12)의 스크린면은 매끄러운 유리면으로 되어 있어 주위로부터 입사되는 광이 정반사되므로 형광막 (13)의 발광에 의해 형성된 화면의 휘도가 상대적으로 저하되는 현상이 나타나게 된다. 즉, 외광이 패널의 외면에 입사되면 패널의 외표면에 외광에 의한 잔상이 형성되므로 재생된 화면과 잔상이 중첩되어 휘도 및 화면의 해상도가 저하되는 것이다.However, since the screen surface of the panel 12 for reproducing the image is a smooth glass surface and the light incident from the surroundings is specularly reflected, the phenomenon that the luminance of the screen formed by the emission of the fluorescent film 13 is relatively lowered appears. . That is, when external light is incident on the outer surface of the panel, afterimages are generated on the outer surface of the panel by the external light, so that the reproduced screen and the afterimage overlap and the luminance and the resolution of the screen are reduced.

또한 상기 패널 (10)의 외표면에는 전자빔 즉, 빔전류가 충돌되므로 음극선관의 동작중이나 동작후 전하가 축적된다. 이에 따라 패널의 외표면에는 먼지 등이 부착될 뿐만 아니라, 작동자가 이에 접촉시 전기적 쇼크를 받을 수 있게 되므로 대전방지를 위한 특별한 조치를 필요로 한다. 따라서 음극선관 패널 (10)상에는 대전방지막을 형성하는 것이 통상적이다.In addition, since the electron beam, that is, the beam current collides with the outer surface of the panel 10, charges are accumulated during and after the operation of the cathode ray tube. Accordingly, not only dust, etc. are attached to the outer surface of the panel, but also an electric shock when the operator comes in contact with it, so that special measures for antistatic are required. Therefore, it is common to form an antistatic film on the cathode ray tube panel 10.

한편, 최근 모니터 등의 기기에서 나오는 전자파가 인체에 매우 유해한 영향을 미친다는 사실이 보고된 이래, 전자파에 대한 규제가 점차 강화되고 있는 추세이다. 즉 모니터에서 발생하는 전자파를 스웨덴 사무노동조합 (the swedish confederation of professional employees : 이하 TCO)에서 정한 규격으로 규제하고 있다. 따라서 TCO 규제에 대응할 수 있는 음극선관을 얻기 위하여 전자파를 줄이는 방법에 대한 연구가 활발히 진행되고 있다.Meanwhile, since it has been reported that electromagnetic waves emitted from devices such as monitors have a very harmful effect on the human body, regulations on electromagnetic waves are gradually being tightened. In other words, the electromagnetic waves generated by the monitor are regulated by the standard set by the Swedish Confederation of Professional Employees (TCO). Therefore, researches are being actively conducted to reduce the electromagnetic waves in order to obtain cathode ray tubes that can respond to TCO regulations.

전자파를 줄이는 하나의 방법으로서, 음극선관 패널 표면상에 소정 저항값을 갖는 투명도전막을 형성하는 방법이 있다.As one method of reducing electromagnetic waves, there is a method of forming a transparent conductive film having a predetermined resistance value on the surface of the cathode ray tube panel.

상기 투명도전막은 일반적으로 스퍼터링법, 증착법, 이온빔법 등을 이용하여 제조된다. 이러한 방법에 따라 형성된 투명도전막은 그 제반특성이 전반적으로 우수한 편이지만, 제조공정중 진공장치 등과 같은 고가의 설비를 필요로 하므로 제조단가가 비싸고, 400℃ 이상의 고온에서 소성해야 한다. 따라서 이 방법에 따라 제조된 투명도전막은 200℃ 정도의 낮은 온도에서 소성해야 하고 저렴한 제조비용을 요구하는 표시장치 특히 음극선관의 전자파 차폐막으로 적용하기에는 실질상 적합하지 않다.The transparent conductive film is generally manufactured using a sputtering method, a vapor deposition method, an ion beam method, or the like. The transparent conductive film formed according to this method is generally excellent in its general characteristics, but it requires expensive equipment such as a vacuum device during the manufacturing process, which is expensive to manufacture and must be fired at a high temperature of 400 ° C. or higher. Therefore, the transparent conductive film prepared according to this method is practically unsuitable for application as an electromagnetic shielding film of a display device, especially a cathode ray tube, which needs to be fired at a temperature as low as 200 ° C. and requires a low manufacturing cost.

전자파를 줄이는 다른 방법으로서, 모니터 회로에 전자파를 감소시키는 역펄스회로를 별도로 설치하는 방법이 있다. 그런데 이 방법은 다음과 같은 문제점이 있다.Another method of reducing electromagnetic waves is to separately install a reverse pulse circuit for reducing electromagnetic waves in the monitor circuit. However, this method has the following problems.

첫째, 역펄스회로를 설치하는 제조공정이 한 단계 추가되므로 제조공정이 늘어나고 이로 인하여 제조단가가 상승된다.First, since the manufacturing process for installing the reverse pulse circuit is added by one step, the manufacturing process increases, thereby increasing the manufacturing cost.

둘째, 모니터마다 회로가 약간씩 달라서 전자파 차폐력이 일정하지 못하다.Second, because the circuits are slightly different for each monitor, electromagnetic shielding power is not constant.

모니터에서 발생하는 전자파는 일반적으로 음극선관 패널 표면의 저항과, 이 패널 표면과 밴드 사이를 접지하는 물질(접지 테이프)의 종류, 상기 접지 테이프의 길이 등에 따라 그 발생량이 달라진다.The amount of electromagnetic waves generated by the monitor generally varies depending on the resistance of the cathode ray tube panel surface, the kind of material (ground tape) grounding the panel surface and the band, and the length of the ground tape.

이에 본 발명자들은 많은 연구 끝에 상기 인자들을 적절히 조절하여 저렴한 처리비용으로 전자파 차폐력이 우수한 음극선관을 제조하기에 이르렀다.Accordingly, the present inventors have made a lot of research to produce a cathode ray tube having excellent electromagnetic shielding power at a low processing cost by appropriately adjusting the above factors.

본 발명이 이루고자 하는 기술적 과제는 패널상에 저저항인 투명도전막을 형성하고 접지 테이프 재료 및 길이를 제어함으로써 전자파를 효과적으로 차단할 수 있는 음극선관의 제조방법을 제공하는 것이다.SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a method of manufacturing a cathode ray tube that can effectively block electromagnetic waves by forming a transparent conductive film having a low resistance on a panel and controlling grounding material and length.

본 발명이 이루고자 하는 다른 기술적 과제는 상기 방법에 따라 형성된 음극선관을 제공하는 것이다.Another technical object of the present invention is to provide a cathode ray tube formed according to the above method.

도 1은 일반적인 음극선관의 구조를 나타낸 도면이고,1 is a view showing the structure of a typical cathode ray tube,

도 2는 본 발명에 따른 투명도전막의 구조를 개략적으로 나타낸 도면이고,2 is a view schematically showing the structure of a transparent conductive film according to the present invention,

도 3은 접지 테이프가 부착된 상태의 음극선관의 구조를 개략적으로 나타낸 도면이다.3 is a view schematically showing the structure of a cathode ray tube with a ground tape attached thereto.

<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>

10, 21, 31...패널 12... 섀도우마스크10, 21, 31 ... Panel 12 ... Shadow Mask

13... 프레임 14... 섀도우마스크 프레임 조립체13 ... frame 14 ... shadow mask frame assembly

15... 네크부 16... 전자총15 ... Neck 16. Gun

17... 편향요오크 18... 펀넬17 ... deflection yoke 18 ... funnel

19... 콘부 22... 투명 도전성 입자19 ... cone part 22 ... transparent conductive particles

23... 금속 알콕사이드의 가수분해 산물(금속 산화물)23 Hydrolysis Products of Metal Alkoxides (Metal Oxides)

24... 금속 미립자24 ... metal particles

32... 패널의 무효화면 33... 패널의 유효화면32 ... Panel invalid screen 33 ... Panel valid screen

34... 밴드(band) 35... 접지 테이프34 ... band 35 ... ground tape

본 발명의 첫번째 과제는 (a) 음극선관의 패널 상부에 투명도전성 입자 및 용매를 포함하는 제1조성물을 도포하는 단계; (b) 상기 결과물상에 금속 알콕사이드(M1(OR)4), 금속(M2) 미립자 또는 이 금속 미립자를 포함하고 있는 금속염(M2X), 촉매 및 용매를 함유하는 제2조성물을 도포 및 건조한 다음, 열처리하여 투명도전막을 형성하는 단계; 및 (c) 투명도전막이 형성된 음극선관 패널과 밴드사이에 구리 테이프를 접지하는 단계를 포함하는 것을 특징으로 하는 음극선관의 제조방법을 제공함으로써 이루어진다.The first object of the present invention is the step of (a) applying a first composition comprising a transparent conductive particles and a solvent on top of the panel of the cathode ray tube; (b) Applying a second composition containing a metal alkoxide (M 1 (OR) 4 ), metal (M 2 ) fine particles or metal salt (M 2 X) containing the metal fine particles, a catalyst and a solvent on the resultant product. And drying, followed by heat treatment to form a transparent conductive film; And (c) grounding the copper tape between the cathode ray tube panel and the band on which the transparent conductive film is formed.

본 발명의 두번째 과제는 상기 방법에 따라 제조된 것을 특징으로 하는 음극선관에 의하여 이루어진다.The second object of the present invention is made by a cathode ray tube, characterized in that manufactured according to the above method.

본 발명은 패널 표면에 형성하는 투명도전막의 저항을 최소화하는 동시에 패널과 밴드를 접지하는 접지 테이프 재료 및 길이를 최적화하여 TCO 규격을 만족시키는 음극선관을 얻고자 하는 것이다.The present invention is to obtain a cathode ray tube satisfying the TCO standard by optimizing the grounding tape material and the length of grounding the panel and the band while minimizing the resistance of the transparent conductive film formed on the panel surface.

이하, 본 발명에 따른 음극선관의 제조방법을 설명하기로 한다.Hereinafter, a method of manufacturing a cathode ray tube according to the present invention will be described.

먼저, 음극선관 패널상에 투명도전성 입자 및 용매를 포함하는 제1조성물을 도포한다. 이 때 패널상에 상기 조성물을 균일하게 도포하기 위하여 음극선관을 소정 회전수로 회전시키는 것이 좋다. 그리고 이후 건조단계를 실시하거나 또는 이러한 건조과정을 생략하여도 무방하다.First, a first composition containing transparent conductive particles and a solvent is coated on a cathode ray tube panel. At this time, it is preferable to rotate the cathode ray tube at a predetermined rotation speed in order to uniformly apply the composition on the panel. Then, the drying step may be performed or the drying process may be omitted.

여기에서 투명도전성 입자로는 주석함유 산화인듐, 산화인듐티탄, 산화주석, 산화티탄, 산화안티몬 등의 금속 산화물을 사용하며, 투명도전성 입자의 입경은 음극선관의 휘도 및 해상도 저하를 방지하기 위하여 50 내지 150nm인 것이 적당하며, 특히 분산된 투명도전성 입자의 제조와 도포공정의 안정성을 고려해 볼 때 50 내지120nm가 바람직하다.Here, as the transparent conductive particles, metal oxides such as tin-containing indium oxide, indium titanium oxide, tin oxide, titanium oxide, and antimony oxide are used, and the particle size of the transparent conductive particles is 50 in order to prevent deterioration of the brightness and resolution of the cathode ray tube. It is suitably in the range from 150 nm to 150 nm, and in particular, in consideration of the production of dispersed transparent conductive particles and the stability of the coating process, 50 to 120 nm is preferable.

용매로는 알콜, 케톤, 에스테르 등의 유기용매 또는 순수 등을 사용한다. 여기에서 상기 용매에 대한 투명성 미립자의 농도는 0.5 내지 5.0중량%인 것이 바람직한데, 이 범위의 농도일 때 도포성이 우수하기 때문이다.As a solvent, organic solvents, such as alcohol, a ketone, ester, or pure water are used. Herein, the concentration of the transparent fine particles with respect to the solvent is preferably 0.5 to 5.0% by weight, because the coating property is excellent when the concentration is in this range.

이어서, 금속 알콕사이드(M1(OR)4), 금속(M2) 미립자 또는 이 금속 미립자를 포함하고 있는 금속염(M2X), 촉매 및 용매를 함유하는 제2조성물을 제조한다. 상기 제2조성물에는 환원제가 더 포함되기도 한다. 이 때 환원제로는 NaBH4, SnCl2, 글리콜류 및 케톤류중에서 선택되며, 함량은 금속 알콕사이드를 기준으로 하여 1×10-4내지 8×10-2몰%이다.Subsequently, a second composition containing a metal alkoxide (M 1 (OR) 4 ), metal (M 2 ) fine particles or metal salt (M 2 X) containing the metal fine particles, a catalyst and a solvent is prepared. The second composition may further include a reducing agent. In this case, the reducing agent is selected from NaBH 4 , SnCl 2 , glycols, and ketones, and the content is 1 × 10 −4 to 8 × 10 −2 mol% based on the metal alkoxide.

상기 제2조성물을 제1조성물이 도포된 패널상에 도포한 다음, 160 내지 300℃, 바람직하기로는 180 내지 200℃에서 30 내지 60분동안 열처리한다. 그리고 나서 이를 소성하면 음극선관 패널상에 도 2에 도시된 바와 같은 투명도전막이 형성된다.The second composition is applied onto a panel coated with the first composition, and then heat-treated at 160 to 300 ° C., preferably at 180 to 200 ° C. for 30 to 60 minutes. Then, by firing, a transparent conductive film as shown in FIG. 2 is formed on the cathode ray tube panel.

여기에서 (21)은 패널, (22)는 투명 도전성 입자, (23)은 금속 알콕사이드의 가수분해 산물 (금속 산화물), (24)는 금속 미립자를 각각 나타내며, 이 도면으로부터 투명 도전성 입자 (22)간의 공극에는 금속 미립자 (24)가 존재하고 있음을 알 수 있다. 그 결과 이러한 투명도전막은 도전성이 매우 우수하다.In this case, reference numeral 21 denotes a panel, reference numeral 22 denotes transparent conductive particles, reference numeral 23 denotes a hydrolysis product (metal oxide) of a metal alkoxide, and reference numeral 24 denotes metal fine particles. It can be seen that the metal fine particles 24 are present in the gaps between the livers. As a result, such a transparent conductive film is very excellent in conductivity.

상기 금속 알콕사이드는 (M1(OR)4)로는 Si(OR)4, Ti(OR)4, Sn(OR)4및Zr(OR)4(여기에서, R은 탄소수 1 내지 4의 알킬기임)중에서 선택된 하나를 사용하며, 그 중에서 실리콘 알콕사이드가 가장 바람직하다. 실리콘 알콕사이드의 예로는 테트라메틸 실리케이트, 테트라에틸 실리케이트, 테트라프로필 실리케이트, 테트라부틸 실리케이트 및 그들의 중합체 또는 각각의 알킬트리알콕시 실란을 사용할 수 있다. 이 때 용매에 대한 실리콘 알콕사이드의 농도는 0.5 내지 5.0중량%가 바람직하다.The metal alkoxide is Si (OR) 4 , Ti (OR) 4 , Sn (OR) 4 and Zr (OR) 4 as (M 1 (OR) 4 ), wherein R is an alkyl group having 1 to 4 carbon atoms. One selected from among them is used, and silicon alkoxide is most preferred. As examples of the silicon alkoxide, tetramethyl silicate, tetraethyl silicate, tetrapropyl silicate, tetrabutyl silicate and their polymers or respective alkyltrialkoxy silanes can be used. At this time, the concentration of the silicon alkoxide to the solvent is preferably 0.5 to 5.0% by weight.

금속(M2) 미립자는 Ag, Au, Pt, Cu, Ni, Pb, Co, Rh, Ru 및 Sn으로 이루어진 군으로부터 선택된 금속을 사용하며, 그중에서도 공기중의 산소에 대하여 안정한 Au, Ag 및 Pt이 바람직하다.Metal (M 2 ) fine particles use a metal selected from the group consisting of Ag, Au, Pt, Cu, Ni, Pb, Co, Rh, Ru and Sn, among which Au, Ag and Pt are stable to oxygen in the air. desirable.

상기 금속 미립자의 입경은 5 내지 90nm인 것이 적합하다. 만약 금속 미립자의 입경이 5nm 미만이면 도전성이 충분치 않고 입경이 90nm를 초과하면 투명성이 저하되어 바람직하지 못하다.It is suitable that the particle diameter of the said metal fine particle is 5-90 nm. If the particle size of the metal fine particles is less than 5 nm, the conductivity is insufficient, and if the particle size exceeds 90 nm, the transparency is lowered, which is not preferable.

금속염(M2X)으로는 금속 염화물, 질산염, 술폰산염 등을 사용하는데, 물, 알콜, 케톤, 에스테르 등의 용매에 잘 용해되는 것이라면 모두 사용가능하며 특별히 제한되지 않는다.As metal salts (M 2 X), metal chlorides, nitrates, sulfonates, and the like are used, and any solvents such as water, alcohols, ketones, and esters can be used and are not particularly limited.

상기 금속 미립자 (M2)와 금속 알콕사이드(M1(OR)4)의 금속(M1)간의 혼합몰비 또는 금속염(M2X)의 금속(M2)과 금속 알콕사이드(M1(OR)4)의 금속(M1)간의 혼합 몰비는 0.01:1 내지 0.2:1가 바람직하다. 만약 상기 금속(M2)과 금속(M1)간의 몰비가0.01:1 미만이면 도전성 향상 효과가 미비하고, 상기 금속(M2)과 금속(M1)간의 몰비가 0.2:1를 초과하면 투명성이 현저히 저하되고 막강도가 저하되어 실용성이 없다.The mixed molar ratio between the metal fine particles (M 2 ) and the metal alkoxide (M 1 (OR) 4 ) or the metal (M 1 ) of the metal salt (M 2 X) of the metal (M 2 ) and the metal alkoxide (M 1 (OR) 4 ) ), The mixing molar ratio between the metals (M 1 ) is preferably 0.01: 1 to 0.2: 1. If the molar ratio between the metal (M 2 ) and the metal (M 1 ) is less than 0.01: 1, the effect of improving conductivity is insufficient, and when the molar ratio between the metal (M 2 ) and the metal (M 1 ) exceeds 0.2: 1, transparency This is considerably lowered, the film strength is lowered and there is no practical use.

상기 촉매는 금속 알콕사이드의 가수분해반응을 촉진시키는 역할을 하는 것으로서, 염산, 질산 등과 같은 산(acid)이 사용된다. 이 때 촉매의 함량은 금속 알콕사이드를 기준으로 하여 0.01 내지 0.04몰%이다.The catalyst serves to promote the hydrolysis reaction of the metal alkoxide, and an acid such as hydrochloric acid, nitric acid or the like is used. At this time, the content of the catalyst is 0.01 to 0.04 mol% based on the metal alkoxide.

그 외표면상에 투명도전막이 형성되어 있는 패널과 밴드사이에 구리 테이프를 접지한다. 이러한 접지상태는 도 3에 도시되어 있다.The copper tape is grounded between the panel and the band on which the transparent conductive film is formed on the outer surface. This ground state is shown in FIG.

이를 참조하면, 음극선관 패널 (31)의 유효화면 (33)과 무효화면 (32)상에 투명도전막(미도시)이 형성되어 있다. 그리고 상기 투명도전막과 밴드 (34)간에 구리 테이프 (35)로 접지되어 있다.Referring to this, a transparent conductive film (not shown) is formed on the effective screen 33 and the invalid screen 32 of the cathode ray tube panel 31. The copper tape 35 is grounded between the transparent conductive film and the band 34.

상기 접지 테이프의 길이 (ℓ) 는 투명도전막의 저항에 따라 적절히 조절한다. 즉, 투명도전막의 저항이 소정값보다 커지면 접지 테이프의 길이를 길게 하고, 저항이 낮아 도전성이 좋으면 접지 테이프의 길이를 짧게 하여도 무방하다.The length l of the ground tape is appropriately adjusted according to the resistance of the transparent conductive film. In other words, if the resistance of the transparent conductive film is larger than the predetermined value, the length of the grounding tape may be increased. If the resistance is low and the conductivity is good, the length of the grounding tape may be shortened.

TCD에서는 하기 표 1에서와 같이 전기장과 자기장에 대하여 밴드 Ⅰ (BAND Ⅰ: 5Hz∼2kHz), 밴드 Ⅱ (BAND Ⅱ: 2∼400kHz)로 구분하여 그 규격을 마련해 놓고 있다. 이 때 전자파는 모니터로부터 약 30cm 떨어진 위치에서 측정하였다.In the TCD, as shown in Table 1 below, the electric field and the magnetic field are divided into band I (BAND I: 5 Hz to 2 kHz) and band II (BAND II: 2 to 400 kHz). At this time, the electromagnetic wave was measured about 30cm away from the monitor.

[표 1]TABLE 1

그러나 본 발명에 따르면 타영역뿐만 아니라 상기 영역에서의 전자파 차폐 효과가 매우 우수하다.However, according to the present invention, the shielding effect of the electromagnetic waves is very excellent not only in other areas but also in the above areas.

이상기 항목가운데, 전자파 차폐가 가장 어려운 영역은 전기장의 밴드 Ⅱ 영역이다. 하, 본 발명을 실시예를 들어 상세히 설명하기로 하되, 본 발명이 반드시 이에 한정되는 것은 아니다.Among the items described above, the most difficult area for electromagnetic shielding is the band II region of the electric field. Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not necessarily limited thereto.

<실시예 1><Example 1>

약 80nm의 평균입경을 갖는 주석이 도핑된 산화인듐미립자 (이하 ITO) 1.5g을 메탄올 20g, 에탄올 67.5g 및 n-부탄올 10g의 혼합용매에 분산시켜 제1조성물(도포액 A라 칭함)을 제조하였다.1.5 g of tin-doped indium oxide fine particles (hereinafter referred to as ITO) having an average particle diameter of about 80 nm was dispersed in a mixed solvent of 20 g of methanol, 67.5 g of ethanol, and 10 g of n-butanol to prepare a first composition (coating solution A). It was.

테트라에틸 오르토실리케이트(tetraethyl orthosilicate) 4.5g을 메탄올 30g, 에탄올 50g, n-부탄올 12g 및 순수 4g의 혼합용매와 혼합하고, 여기에 질산0.6g 및 질산은(AgNO3) 0.3g을 첨가하고 실온에서 약 24시간동안 교반하여 제2조성물(도포액 B라 칭함)을 준비하였다.4.5 g of tetraethyl orthosilicate is mixed with a mixed solvent of 30 g of methanol, 50 g of ethanol, 12 g of n-butanol and 4 g of pure water, to which 0.6 g of nitric acid and 0.3 g of silver nitrate (AgNO 3 ) are added and at room temperature Stirred for 24 hours to prepare a second composition (coating solution B).

깨끗하게 세정된 17모니터용 브라운관을 약 90rpm으로 회전하면서 상기 도포액 A 50㏄를 붓고 유리기판의 회전속도를 약 150rpm으로 상승시켰다. 그리고 나서, 도포액 B 60㏄를 붓고 도포액 A와 동일한 방법으로 도포하였다. 이어서, 상기 결과물을 건조한 다음, 200℃에서 약 1시간동안 소성하여 투명도전막을 형성하였다.While rotating the cathode-ray tube for the clean washing monitor 17 to about 90rpm poured into the coating solution A was raised 50㏄ the rotation speed of the glass substrate at about 150rpm. Then, 60 ml of coating liquid B was poured and applied in the same manner as coating liquid A. Subsequently, the resultant was dried and then fired at 200 ° C. for about 1 hour to form a transparent conductive film.

투명도전막이 형성된 음극선관에 있어서, 패널의 무효화면과 밴드면을 구리테이프로 접지하여 모니터를 제작하였다.In the cathode ray tube in which the transparent conductive film was formed, the monitor was manufactured by grounding the invalid screen and the band surface of the panel with copper tape.

<실시예 2><Example 2>

약 80nm의 입경을 갖는 주석이 도핑된 산화인듐미립자 (이하 ITO) 3.0g을 메탄올 20g, 에탄올 67.5g 및 n-부탄올 10g의 혼합용매에 분산시켜 제1조성물(도포액 A라 칭함)을 제조하였다.3.0 g of tin-doped indium oxide fine particles (hereinafter referred to as ITO) having a particle size of about 80 nm was dispersed in a mixed solvent of 20 g of methanol, 67.5 g of ethanol, and 10 g of n-butanol to prepare a first composition (coating solution A). .

테트라에틸 오르토실리케이트(tetraethyl orthosilicate) 4.5g을 메탄올 30g, 에탄올 30g, n-부탄올 12g 및 순수 4g의 혼합용매와 혼합하고, 여기에 질산 0.5g 및 클로로금산(chlorocauric acid: HAuCl4·4H2O) 0.2g을 첨가하고 실온에서 약 30시간동안 교반하여 제2조성물(도포액 B라 칭함)을 준비하였다.4.5 g of tetraethyl orthosilicate is mixed with a mixed solvent of 30 g of methanol, 30 g of ethanol, 12 g of n-butanol, and 4 g of pure water, to which 0.5 g of nitric acid and chlorocauric acid (HAuCl 4 · 4H 2 O) are added. 0.2 g was added and stirred at room temperature for about 30 hours to prepare a second composition (coating solution B).

깨끗하게 세정된 17모니터용 브라운관을 약 90rpm으로 회전하면서 상기 도포액 A 50㏄를 붓고 유리기판의 회전속도를 약 150rpm으로 상승시켰다. 그리고 나서, 도포액 B 60㏄를 붓고 도포액 A와 동일한 방법으로 도포하였다. 이어서, 상기 결과물을 건조한 다음, 250℃에서 약 1시간동안 소성하여 투명도전막을 형성하였다.While rotating the cathode-ray tube for the clean washing monitor 17 to about 90rpm poured into the coating solution A was raised 50㏄ the rotation speed of the glass substrate at about 150rpm. Then, 60 ml of coating liquid B was poured and applied in the same manner as coating liquid A. Subsequently, the resultant was dried and then fired at 250 ° C. for about 1 hour to form a transparent conductive film.

투명도전막이 형성된 음극선관에 있어서, 패널의 무효화면과 밴드면을 구리테이프로 접지하여 모니터를 제작하였다.In the cathode ray tube in which the transparent conductive film was formed, the monitor was manufactured by grounding the invalid screen and the band surface of the panel with copper tape.

<실시예 3><Example 3>

도포액 A의 조성 및 그 제조방법이 다른 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하였다.It carried out according to the method similar to Example 1 except the composition of the coating liquid A and its manufacturing method are different.

약 80nm의 입경을 갖는 주석이 도핑된 산화인듐미립자 (이하 ITO) 1.g을 메탄올 20g, 에탄올 67.5g 및 n-부탄올 10g의 혼합용매에 분산시켜 제1조성물(도포액 A라 칭함)을 제조하였다.1.g of tin-doped indium oxide fine particles (hereinafter referred to as ITO) having a particle size of about 80 nm was dispersed in a mixed solvent of 20 g of methanol, 67.5 g of ethanol, and 10 g of n-butanol to prepare a first composition (coating solution A). It was.

<실시예 4><Example 4>

도포액 B의 조성에서 질산은을 첨가하지 않은 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하였다.The same procedure as in Example 1 was carried out except that silver nitrate was not added in the composition of the coating solution B.

<실시예 5>Example 5

도포액 B 제조시, 환원제인 NaBH40.001g이 더 부가된 조성물을 사용한 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하였다.The coating solution B was prepared in the same manner as in Example 1, except that 0.001 g of NaBH 4 , a reducing agent, was further added.

<비교예 1-5><Comparative Example 1-5>

접지 테이프로서 구리 테이프대신 알루미늄 테이프를 사용한 것을 제외하고는 실시예 1-5과 동일한 방법에 따라 실시하였다.The same procedure as in Example 1-5 was carried out except that aluminum tape was used instead of copper tape as the ground tape.

<비교예 6>Comparative Example 6

도포액 B 제조시, 질산은을 0.036g 사용한 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하였다.The coating solution B was prepared in the same manner as in Example 1, except that 0.036 g of silver nitrate was used.

<비교예 7>Comparative Example 7

도포액 B 제조시. 질산은을 0.73g 사용한 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하였다.At the time of preparation of Coating Liquid B. The same procedure as in Example 1 was conducted except that 0.73 g of silver nitrate was used.

상기 실시예 1-5 및 비교예 1-7에 따라 제조된 음극선관에 있어서, 패널의 표면저항과 전계파 발생도를 측정하였고, 그 결과를 하기 표 2에 나타내었다. 이 때 전자파는 모니터로부터 30cm 떨어진 위치에서 콤비노바(COMBINOVA)사 EFM 200으로 밴드 Ⅱ 영역을 측정하였다.In the cathode ray tube manufactured according to Example 1-5 and Comparative Example 1-7, the surface resistance and the electric field generation of the panel were measured, and the results are shown in Table 2 below. At this time, the electromagnetic wave was measured in the band II region by COMBINOVA EFM 200 at a position 30 cm away from the monitor.

[표 2]TABLE 2

상기 표 2에서 알 수 있는 바와 같이, 실시예 1-5에 따라 제조된 음극선관은 표면저항이 작고 전계파 발생도가 작게 나타났다.As can be seen in Table 2, the cathode ray tube manufactured according to Example 1-5 showed a small surface resistance and a small field generation rate.

한편, 접지 테이프로서 알루미늄 테이프를 사용한 비교예 1-5에 따라 제조된음극선관은 접지 테이프로서 구리 테이프를 사용한 실시예 1-5의 경우보다 전자파 발생도가 큰 것으로 볼 때 구리 테이프가 알루미늄 테이프보다 접지 효과가 우수하다는 알 수 있었다. 그리고 비교예 6-7에 따라 제조된 음극선관은 그 표면저항이 불량하였고, 전계파 발생도는 1.50 내지 2.15 V/m이었다.On the other hand, the cathode ray tube manufactured according to Comparative Example 1-5 using aluminum tape as the grounding tape had a higher electromagnetic wave generation rate than that of Example 1-5 using copper tape as the grounding tape. It was found that the grounding effect is excellent. In addition, the cathode ray tube manufactured according to Comparative Example 6-7 had poor surface resistance, and the electric field generation frequency was 1.50 to 2.15 V / m.

본 발명에 따르면, 스퍼터링 장치 등과 같은 고가장비를 사용하지 않고서도 저렴한 제조비용으로 전자파를 TCO 규격 이하로 차폐할 수 있는 음극선관을 제조할 수 있게 된다.According to the present invention, it is possible to manufacture a cathode ray tube capable of shielding electromagnetic waves below the TCO standard at a low manufacturing cost without using expensive equipment such as a sputtering apparatus.

Claims (14)

(a) 음극선관의 패널 상부에 주석함유 산화인듐, 산화인듐티탄, 산화주석, 산화티탄, 산화안티몬중에서 선택된 투명도전성 입자 및 용매를 포함하는 제1조성물을 도포하는 단계;(a) applying a first composition comprising a transparent conductive particle selected from tin-containing indium oxide, indium titanium oxide, tin oxide, titanium oxide, and antimony oxide and a solvent on the panel of the cathode ray tube; (b) 상기 결과물상에 금속 알콕사이드(M1(OR)4), 금속(M2) 미립자 또는 이 금속 미립자를 포함하고 있는 금속염(M2X), 촉매 및 용매를 함유하는 제2조성물을 도포 및 건조한 다음, 열처리하여 투명도전막을 형성하는 단계; 및(b) Applying a second composition containing a metal alkoxide (M 1 (OR) 4 ), metal (M 2 ) fine particles or metal salt (M 2 X) containing the metal fine particles, a catalyst and a solvent on the resultant product. And drying, followed by heat treatment to form a transparent conductive film; And (c) 투명도전막이 형성된 음극선관 패널과 밴드사이에 구리 테이프를 접지하는 단계를 포함하며,(c) grounding the copper tape between the cathode ray tube panel and the band on which the transparent conductive film is formed; 상기 제2조성물의 금속알콕사이드(M1(OR)4)가 Si(OR)4, Ti(OR)4, Sn(OR)4 및 Zr(OR)4(여기에서, R은 탄소수 1 내지 4의 알킬기임)으로 이루어진 군으로부터 선택되고,The metal alkoxide (M 1 (OR) 4 ) of the second composition is Si (OR) 4 , Ti (OR) 4 , Sn (OR) 4 and Zr (OR) 4 , wherein R is 1 to 4 carbon atoms. Alkyl group), 상기 제2조성물의 금속(M2), 미립자가 은(Ag), 금(Au), 백금(Pt), 구리(Cu), 니켈(Ni), 납(Pb), 코발트(Co), 로듐(Rh), 루테늄(Ru) 및 주석(Sn)으로 이루어진 군으로부터 선택되고,The metal (M 2 ) and the fine particles of the second composition are silver (Ag), gold (Au), platinum (Pt), copper (Cu), nickel (Ni), lead (Pb), cobalt (Co), and rhodium ( Rh), ruthenium (Ru) and tin (Sn), 상기 제2조성물의 금속염(M2X)이 은(Ag), 금(Au), 백금(Pt), 구리(Cu), 니켈 (Ni), 납(Pb), 코발트(Co), 로듐(Rh), 루테늄(Ru) 및 주석(Sn)으로 이루어진 군으로부터 선택된 금속 염화물, 질산염 및 술폰산염으로 이루어진 군으로부터 선택되는 것을 특징으로 하는 음극선관의 제조방법.The metal salt of the second composition (M 2 X) is silver (Ag), gold (Au), platinum (Pt), copper (Cu), nickel (Ni), lead (Pb), cobalt (Co), rhodium (Rh) ), A ruthenium (Ru) and tin (Sn), a method for producing a cathode ray tube, characterized in that it is selected from the group consisting of metal chlorides, nitrates and sulfonates. 제1항에 있어서, 상기 제2조성물에 NaBH4, SnCl2, 글리콜류 및 케톤류로 이루어진 군으로부터 선택된 환원제가 더 포함되는 것을 특징으로 하는 음극선관의 제조방법.The method of claim 1, wherein the second composition further comprises a reducing agent selected from the group consisting of NaBH 4 , SnCl 2 , glycols and ketones. 제2항에 있어서, 상기 환원제의 함량이 금속 알콕사이드를 기준으로 하여 1×10-4내지 8×10-2몰%인 것을 특징으로 하는 음극선관의 제조방법.The method of claim 2, wherein the content of the reducing agent is 1 × 10 -4 to 8 × 10 -2 mol% based on the metal alkoxide. 제1항에 있어서, 상기 (b)단계에서 열처리가 160 내지 300℃에서 실시되는 것을 특징으로 하는 음극선관의 제조방법.The method of claim 1, wherein the heat treatment is carried out at 160 to 300 ℃ in step (b). 제1항에 있어서, 상기 제1조성물에서 투명도전성 입자의 입경이 5 내지 120nm인 것을 특징으로 하는 음극선관의 제조방법.The cathode ray tube manufacturing method according to claim 1, wherein a particle diameter of the transparent conductive particles in the first composition is 5 to 120 nm. 제1항에 있어서, 상기 금속 미립자 (M2)와 금속 알콕사이드(M1(OR)4)의 금속 (M1)간의 혼합몰비 또는 금속염(M2X)의 금속(M2)과 금속 알콕사이드(M1(OR)4)의 금속(M1)간의 몰비가 0.01:1 내지 0.2:1인 것을 특징으로 하는 음극선관의 제조방법.2. The mixed molar ratio between the metal fine particles (M 2 ) and the metal alkoxide (M 1 (OR) 4 ) or the metal (M 1 ) of the metal salt (M 2 X) of the metal (M 2 ) and the metal alkoxide ( A method for producing a cathode ray tube, characterized in that the molar ratio between the metal (M 1 ) of M 1 (OR) 4 ) is 0.01: 1 to 0.2: 1. 제1항에 있어서, 상기 금속(M2) 미립자의 입경이 5 내지 90 nm인 것을 특징으로 하는 음극선관의 제조방법.The cathode ray tube manufacturing method according to claim 1, wherein the metal (M 2 ) fine particles have a particle diameter of 5 to 90 nm. 제1항에 있어서, 상기 (a) 단계에서 제1조성물을 도포한 다음, 건조공정을 거치는 것을 특징으로 하는 음극선관의 제조방법.The method of manufacturing a cathode ray tube according to claim 1, wherein after applying the first composition in the step (a), a drying process is performed. 제1항에 있어서, 상기 (a) 단계에서 용매에 대한 투명도전성 입자의 농도는 0.5 내지 5.0중량%인 것을 특징으로 하는 음극선관의 제조방법.The method of claim 1, wherein the concentration of the transparent conductive particles to the solvent in the step (a) is a method for producing a cathode ray tube, characterized in that 0.5 to 5.0% by weight. 제1항에 있어서, 상기 (b) 단계에서 용매에 대한 금속 알콕사이드의 농도는 0.5 내지 5.0중량%인 것을 특징으로 하는 음극선관의 제조방법.The method of claim 1, wherein the concentration of the metal alkoxide to the solvent in the step (b) is 0.5 to 5.0% by weight manufacturing method of a cathode ray tube. 제1항에 있어서, 상기 제2조성물의 금속염(M2X)이 금속 염화물, 질산염 및 술폰산염으로 이루어진 군으로부터 선택되는 것을 특징으로 하는 음극선관의 제조방법.The method according to claim 1, wherein the metal salt (M 2 X) of the second composition is selected from the group consisting of metal chlorides, nitrates and sulfonates. 제1항에 있어서, 상기 촉매가 염산 및 질산으로 이루어진 군으로부터 선택된산(acid)인 것을 특징으로 하는 음극선관의 제조방법.The method of manufacturing a cathode ray tube according to claim 1, wherein the catalyst is an acid selected from the group consisting of hydrochloric acid and nitric acid. 제1항에 있어서, 상기 촉매의 함량이 금속 알콕사이드를 기준으로 하여 0.01 내지 0.04몰%인 것을 특징으로 하는 음극선관의 제조방법.The method of claim 1, wherein the content of the catalyst is 0.01 to 0.04 mol% based on the metal alkoxide. 제1항 2항, 3항, 4항, 5항 내지 제13항중 어느 한 항에 따라 제조된 것을 특징으로 하는 음극선관.Claims 1, 2, 3, 4, 5 to 13, characterized in that the cathode ray tube manufactured according to any one of claims.
KR1019960066929A 1996-12-17 1996-12-17 Cathode ray tube and method for manufacturing the same including steps of depositing first and second compounds and grounding copper tape KR100428967B1 (en)

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JPH04282539A (en) * 1991-03-11 1992-10-07 Hitachi Ltd Method for forming reflection-charge preventing film
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