KR100280702B1 - How to manufacture a black mattress of color filters - Google Patents

Abstract

The present invention partitions each cell into a plurality of areas on a chromium-coated substrate, fabricates a mask corresponding to each partitioned area, loads a mask corresponding to the partitioned area of each cell, and uniformly pitches the substrate. The present invention relates to a method of manufacturing a black mattress of a color filter which moves at intervals and sequentially exposes the area to form a black mattress.

Description

How to manufacture a black mattress of color filters

The present invention relates to a method of manufacturing a black mattress of a color filter, and more particularly, to a method of manufacturing a black mattress of a color filter, the method of which is improved to be capable of split exposure.

Usually, the method of manufacturing the color filter for color liquid crystal displays includes a dyeing method, a dispersion method, the printing method, the electrodeposition method, and the interference film method.

Dyeing color filter is a method most commonly used at present, by applying a dye substrate on a substrate, using a photo mask exposed and developed to obtain a pattern, and dyeing the pattern to produce a red, green, blue color filter layer.

A dispersion method is a method of apply | coating and patterning the base material colored with dye or a pigment on a base material, and there are two methods, a case where a colored base material has photosensitivity, and a colored base material does not have photosensitivity.

The printing method is a method of forming a color filter layer by applying red, green, and blue inks to a printing plate and printing it. The process is simple, but the precision of the color filter layer is lowered and there are many difficulties in controlling the film thickness.

The electrodeposition method is characterized by patterning a conductive film on a substrate after deposition, and electrophoretically installing a colored layer on the conductive film. The color filter layer has excellent smoothness, but is difficult to automate during electrodeposition. there is a problem.

The interference film method is a multilayer structure of an inorganic material by vapor deposition, and has good heat resistance and light resistance, but is used for special applications in terms of mass production and cost.

1 shows the basic structure of such a color filter 10.

Referring to the drawings, the color filter 10 is provided with a glass substrate 11, the black mattress 12 is formed on the glass substrate 11. Red (13a), green (13b), blue (13c) color filter layer is formed between the black mattress (12). In addition, a protective layer 14 is coated on the black mattress 12 and the color filter layers of red, green, and blue 13a, 13b, and 13c to protect it, and a transparent electrode layer 15 thereon. This structure is laminated sequentially.

The color filter 10 having such a structure requires a process of exposing and developing using a photomask when forming the black mattress 12. At this time, as the size of the glass substrate 11 increases, the formation of the collective black mattress 12 by the front exposure method becomes difficult due to thermal expansion or warpage of the photo mask. For this reason, the black mattress 12 produces the distortion phenomenon which deviates by several micrometers or more from a desired position.

Moreover, in the exposure method by the whole surface exposure method, the space | interval between the board | substrate 11 and a photo mask will be about 50-200 micrometers, and a foreign material and a photoresist float will invade between them. Therefore, contamination of the photo mask inevitably occurs. Accordingly, in the exposure step, the photo mask must be cleaned to remove such foreign matters. In addition, since a large size photo mask is used, a manufacturing cost is high in the exposure process.

The present invention has been made to solve the above problems, an object of the present invention is to provide a method for manufacturing a black mattress of the color filter to improve the exposure method to easily form a black mattress of the color filter.

1 is a cross-sectional view schematically showing a substrate on which a conventional color filter layer is formed,

2A to 2F are cross-sectional views illustrating a process of manufacturing a substrate on which a color filter layer employed in FIG. 1 is formed,

3A to 3G are cross-sectional views illustrating a process of manufacturing a black mattress according to the present invention.

<Brief description of symbols for the main parts of the drawings>

10. Color filters 11,21. Board

12,22. Black mattress 13a, 23a. Red color filter layer

13b, 23b. Green color filter layer 13c, 23c. Blue color filter layer

14,24. Protective layer 15,25. Transparent electrode layer

22a. Materials for the formation of black mattresses

23. Material for forming a red color filter layer

31. First area 32. Second area

33. Third area 34. Fourth area

35. Fifth Area 36. Sixth Area

In order to achieve the above object, a method of manufacturing a black mattress of a color filter according to an aspect of the present invention comprises the steps of: providing a substrate coated with chromium; Partitioning each cell formed on the substrate into a plurality of regions; Manufacturing a mask for exposing the divided regions; Coating a photo resist on the substrate; Loading a mask corresponding to the partitioned region of each cell, and sequentially exposing the substrate to the region by moving the substrate at constant pitch intervals along the X and Y axes; Developing the substrate on which the exposure is completed; And etching the substrate and removing the residual photoresist to complete the black mattress.

Hereinafter, a method of manufacturing a black mattress of a color filter according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

2A to 2F illustrate step by step a method of manufacturing a color filter according to the present invention. Here, the same reference numerals as in the above-described drawings indicate the same members having the same function.

Referring to the drawings, the color filter is provided with a glass substrate 21 (FIG. 2A), and a black mattress forming material 22a such as chrome metal is coated on the glass substrate 21 (FIG. 2B). Next, a black mattress 22 is formed on the glass substrate 21 through a photolithography process (FIG. 2C).

After the black mattress 22 is formed, the red color filter layer forming material 23 is applied on the black mattress pattern layer 22 (FIG. 2D), and the photomask is exposed and developed only in a specific area by using a photo mask. The color filter layer 23a is formed (FIG. 2E).

Subsequently, the above process is repeated using the material for forming the green color filter layer and the material for forming the blue color filter layer, and the respective green color filter layers 23b and the blue color filter layers 23c in the specific area on the black mattress 22 are repeated. To form (FIG. 2F).

After the red, green, and blue color filter layers 23a, 23b, and 23c are completed, a protective layer is formed on the black mattress 22 and the color filter layers 23a, 23b, and 23c, as shown in FIG. The 24 and the transparent electrode layer 25 are laminated successively.

In order to form the black mattress 22, a process of exposing and developing using a photo mask is required.

3A to 3G illustrate step by step forming the black mattress 22 on the substrate 21 employed in FIG. 2. In this case, the substrate 21 is an example showing a case in which at least one cell in which the black mattress 22 is to be formed is provided.

Referring to the drawings, the color filter is provided with a substrate 21 coated with a material for forming a black mattress, such as chrome (FIG. 3A). Each cell on which the black mattress is to be formed is set on the substrate 21 by dividing the cells into a plurality of areas, and a mask corresponding to each of the set areas is manufactured. The photoresist is coated on the substrate 21.

The first mask 31 corresponding to the first region 31 of each cell is loaded, and the substrate 21 is moved at pitch intervals along the X and Y axes so that the first region 31 is aligned with the first mask. Are exposed sequentially (3b).

After the first region 31 of each cell is exposed, a second mask, that is, a mask corresponding to the second region 32, is set to the second region 32 adjacent to the first region 31. Is loaded, and the substrate 21 is adjusted at a pitch interval to be exposed to the second region 32 of each cell (3c).

As such, as illustrated in FIGS. 3D to 3F, the third mask, the fourth mask, and the fifth mask corresponding to the third region 33, the fourth region 34, and the fifth region 35 of each cell. Is repeatedly loaded, and the substrate 21 is moved at pitch intervals in the X and Y axes to expose each of the regions 33, 34 and 35.

Subsequently, the sixth mask corresponding to the sixth region 36, which is the last region of each cell to be exposed, is loaded and exposed on the substrate 21 (FIG. 3G).

Thus, each cell to form the black mattress 22 is divided into a plurality of regions, and after exposure is completed using a mask corresponding to each region, the substrate is developed to form the desired black mattress 22. .

The substrate 21 on which the developed black mattress 22 is completed is etched using an etchant having a constant concentration and temperature, for example, a chromium etchant, to selectively remove the oxide film.

When the etching is completed, the photoresist film on the surface of the substrate 21 is removed. That is, the remaining photoresist film is removed using an alkaline solution that is a stripper to finally complete the black mattress 22.

As described above, the method for manufacturing the black mattress of the color filter of the present invention is to perform the divided exposure when forming the black mattress, thereby minimizing the deformation of the total length due to thermal expansion or warpage of the mask, the divided The use of a mask makes it possible to reduce manufacturing costs and eliminate the risk of contamination and breakage of the mask.

Although the present invention has been described with reference to one embodiment shown in the drawings, this is merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (1)

Providing a substrate coated with chromium; Partitioning each cell formed on the substrate into a plurality of regions; Manufacturing a mask for exposing the divided regions; Coating a photo resist on the substrate; Loading a mask corresponding to the partitioned region of each cell, and sequentially exposing the substrate to the region by moving the substrate at constant pitch intervals along the X and Y axes; Developing the substrate on which the exposure is completed; And Etching the substrate and peeling off the residual photoresist to complete the black mattress.