KR960016636B1 - Color filter making method for liquid crystal display elements - Google Patents

Color filter making method for liquid crystal display elements Download PDF

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Publication number
KR960016636B1
KR960016636B1 KR1019930012558A KR930012558A KR960016636B1 KR 960016636 B1 KR960016636 B1 KR 960016636B1 KR 1019930012558 A KR1019930012558 A KR 1019930012558A KR 930012558 A KR930012558 A KR 930012558A KR 960016636 B1 KR960016636 B1 KR 960016636B1
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South Korea
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color filter
liquid crystal
crystal display
black matrix
green
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KR1019930012558A
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Korean (ko)
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KR950003880A (en
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이기인
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엘지전자 주식회사
구자홍
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)

Abstract

depositing a dyeing layer(12) on the surface of a glass substrate(11); depositing a polymide(PI)(13) on the region except one of the red(R), green(G), blue(B) pixel and a black matrix(10) on the dyeing layer(12); dyeing a color required on the region where the polymide(PI) is not deposited; and dyeing the red(R), green(G), blue(B) pixel and the black matrix(10) by repeating the processes after the polymide deposition process.

Description

액정 표시 소자용 컬러 필터 제조 방법Manufacturing method of color filter for liquid crystal display element

제1도는 종래 컬러 필터의 단면도.1 is a cross-sectional view of a conventional color filter.

제2도는 종래 컬러 필터 제조 방법에 의한 공정 흐름도.2 is a process flow chart according to a conventional color filter manufacturing method.

제3도는 본 발명에 의한 액정 표시 소자용 컬러 필터의 단면도.3 is a cross-sectional view of a color filter for a liquid crystal display device according to the present invention.

제4도는 본 발명 액정 표시 소자용 컬러 필터 제조 방법의 공정 흐름도.4 is a process flowchart of the color filter manufacturing method for a liquid crystal display device of the present invention.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

10 : 블랙 매트릭스11 : 유리 기판10 black matrix 11: glass substrate

12 : 염색층13 : 고분자막.12: dyed layer 13: polymer membrane.

본 발명은 컬러 필터 제조 방법에 관한 것으로, 특히 컬러 필터의 제조공정을 단축하고 컬러 필터의 평탄성을 향상시키며 제조원가를 절감하는 액정 표시 소자용 컬러 필터 제조 방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter manufacturing method, and more particularly, to a method for manufacturing a color filter for a liquid crystal display device, which shortens the manufacturing process of the color filter, improves flatness of the color filter, and reduces manufacturing cost.

종래 컬러 필터는 제1도에 도시되는 바와 같이, 유리 기판(1) 위에 격자상으로 증착되는 블랙 매트릭스층(2)과, 상기 블랙 매트릭스층(2) 위에 도포된 적색(R), 녹색(G), 청색(B) 색재로 이루어졌다.The conventional color filter is a black matrix layer 2 deposited in a lattice form on the glass substrate 1, as shown in Figure 1, and the red (R), green (G) applied on the black matrix layer 2 ), And a blue (B) colorant.

이러한 종래 컬러 필터의 제조 방법은 제2도에 도시되는 바와같이, 유리 기판(1) 표면에 크롬층(Cr)과 감광막(P/R1)을 도포하고(가), 필요한 부분만 마스크(3)로 가리고 자외선(U/V)에 노광하며(나), 현상(다) 및 에칭하고(라) 박리하며(마) 블랙 매트릭스층(2)을 제작하는 단계와 ; 상기 블랙 매트릭스층(2) 위에 가염성 감광막(P/R1)을 도포하고(바), 필요한 부분만 마스크(3)로 가리고 자외선(UV)에 노광(사), 염색층 패턴을 형성하는 현상(아) 및 적색(R), 녹색(G), 청색(B)을 각각 도포하여(자) 컬럼 필터를 제작하는(차)단계로 이루어졌다.In the conventional method of manufacturing a color filter, as shown in FIG. 2, a chromium layer Cr and a photoresist film P / R1 are coated on the surface of the glass substrate 1, and only necessary portions of the mask 3 are applied. (B) exposing to UV light (U / V), developing (de) and etching (e) peeling (e) to produce a black matrix layer (2); Phosphorous photosensitive film P / R1 is coated on the black matrix layer 2 (bar), and only the necessary part is covered by the mask 3, and the exposure (UV) to UV (UV) and the formation of a dye layer pattern ( H) and red (R), green (G), and blue (B) were applied to form a column filter.

그러나, 이러한 종래 컬러 필터 제조 방법은, 공정이 복잡하여 컬러 필터 제조시간이 길어지며 일정 화소만 노광할 수 있는 별도의 마스크가 필요하므로 컬러 필터의 제조원가가 상승하고 컬러 필터 제조후 각 화소가 블랙 매트릭스층에 겹쳐지므로 평탄도가 떨어지게 되는 문제점이 있었다.However, such a conventional color filter manufacturing method requires a separate mask that can expose only a predetermined pixel because the process is complicated, and the color filter manufacturing time is long, and the manufacturing cost of the color filter is increased and each pixel is black matrix after the color filter is manufactured. There was a problem that the flatness is lowered because it overlaps the layer.

본 발명의 목적은 상기와 같은 종래의 문제점을 해결하기 위한 것으로, 컬러 필터의 제조공정을 단축하고 컬러 필터의 평탄성을 향상시켜며 제조원가를 절감시키는 액정 표시 소자용 컬러 필터 제조 방법을 제공하는데 있다.SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a color filter for a liquid crystal display device which shortens the manufacturing process of the color filter, improves flatness of the color filter, and reduces manufacturing cost.

이하 본 발명의 방법적 구성을 상세하 설명하면 다음과 같다.Hereinafter, the method configuration of the present invention will be described in detail.

본 발명 액정 표시 소자용 컬러 필터 제조 방법은 제3도와 제4도에 도시되는 바와 같이, 유리 기판(11) 표면에 염색층(12)을 도포하는 공정(가)과, 상기 염색층(12) 위에 적색(R), 녹색(G), 청색(B) 색재 및 블랙매트릭스(10)에 필요한 부분을 제외한 부분을 고분자(PI : polyimide)(13)막으로 도포하는 공정(나)과, 상기 고분자막(13)으로 도포되지 않는 부분에 화소에 요구되는 색재를 염색하는 공정(다)과, 이미 도포된 고분자막(13)을 박리한(라) 후 상기 과정을 반복하여 적색(R), 녹색(G), 청색(B) 색재 및 블랙매트릭스(10)를 염색하는 공정(마)으로 이루어짐을 그 기술적 방법상의 특징으로 한다.In the method of manufacturing a color filter for a liquid crystal display device according to the present invention, as shown in FIG. 3 and FIG. 4, a process of applying the dye layer 12 to the surface of the glass substrate 11 (a) and the dye layer 12 A step (b) of applying a portion of the red (R), green (G), blue (B) colorant and the black matrix (10) except for the portion necessary for the polymer (PI) (13) film, and the polymer film Dyeing the color material required for the pixel on the portion not coated with (13), and peeling the already applied polymer film 13 (d), and then repeating the above process (red), green (G). ), A process of dyeing the blue (B) colorant and the black matrix 10 (e) is characterized by its technical method.

상기 염색층(12)은 흡수층을 가지는 재질로 형성하도록 한다.The dye layer 12 is formed of a material having an absorbing layer.

상기 적색(R), 녹색(G), 청색(B) 색재 및 블랙 매트릭스(10)를 염색하기 위해 고분자막(13)을 이용한다.The polymer film 13 is used to dye the red (R), green (G), blue (B) colorant and the black matrix 10.

이러한 액정 표시 소자용 컬러 필터 제조 방법은 최조 염색층(12)을 도포시 최대한 평탄하게 하여야 하며, 이 최초 염색층(12)에 고분자막(13)등을 이용한 한개의 색재가 염색되어야 할 부분만 남기고 나머지 부분을 고분자막(13)으로 도포한다. 그러면 고분자막(13)이 도포되지 않은 부분에 색재물질을 염색층(12)에 흡수시키고, 이것을 나머지 색재와 블랙 매트릭스(10) 등에도 동일하게 반복한다. 즉, 최초 염색층(12)이 평탄하게 된 상태에서 색재만 흡수시킴으로 평탄효과를 가져올 수 있다.The method of manufacturing a color filter for a liquid crystal display device should be as flat as possible when applying the latest dye layer 12, leaving only the portion where one colorant using the polymer film 13 is to be dyed in the first dye layer 12. The remaining part is applied to the polymer film 13. Then, the color material is absorbed into the dye layer 12 in the portion where the polymer film 13 is not applied, and the same is repeated for the remaining color material and the black matrix 10 and the like. That is, by absorbing only the color material in a state where the initial dye layer 12 is flat, it may bring a flat effect.

이와 같이 본 발명에 의해 제조되는 액정 표시 소자용 컬러 필터는 제3도에 도시되는 바와 같이, 유리기판(11) 표면에 도포된 염색층(12)에 일정한 간격을 가지고 격자상으로 염색된 블랙 매트릭스(10)와 ; 상기 블랙 매트릭스(10) 사이에 염색된 적색(R), 녹색(G), 청색(B) 색재의 형성됨을 특징으로 한다.As described above, the color filter for the liquid crystal display device manufactured according to the present invention has a black matrix dyed in a lattice form at regular intervals on the dye layer 12 applied to the surface of the glass substrate 11. (10) and; It is characterized in that the red (R), green (G), blue (B) colorant is formed between the black matrix (10).

이상에서 살펴 본 바와같이, 본 발명 액정 표시 소자용 컬러 필터 제조 방법은 공정이 간단하여 컬러 필터 제조시간이 짧고, 감광막을 노광하기 위한 마스크를 제작하여 사용할 필요가 없으므로 자연히 공정 및 제조원가가 절감되며 컬러 필터 제조후 각 색재가 블랙 매트릭스에 겹쳐지지 않으므로 평탄도를 향상시켜줄 수 있는 유용한 것이다.As described above, the method of manufacturing a color filter for a liquid crystal display device of the present invention has a simple process, and thus a color filter manufacturing time is short. Since the color material does not overlap the black matrix after the filter is manufactured, it is useful to improve the flatness.

Claims (2)

유리 기판 표면에 염색층을 도포하는 공정과, 상기 염색층 위에 적색, 녹색, 청색 화소와 블랙 매트릭스 중 어느 하나의 영역을 제외한 부분을 고분자막으로 도포하는 공정과, 상기 고분자막으로 도포되지 않은 부분에 요구되는 색재를 염색하는 공정과, 이미 도포된 고분자막을 박리한 후 상기 고분자 도포 공정 이하의 과정을 반복하여 적색, 녹색, 청색 색재 및 블랙 매트릭스를 염색하는 공정으로 이루어짐을 특징으로 하는 액정 표시 소자용 컬러 필터 제조 방법.Applying a dye layer on the surface of the glass substrate, applying a polymer film to the dye layer except for one of red, green, blue pixels and a black matrix, and a portion not coated with the polymer film. A color for a liquid crystal display device comprising a process of dyeing a color material to be used, and a process of dyeing a red, green, blue color material and a black matrix by peeling a polymer film that has already been applied, and then repeating the following process. Filter manufacturing method. 제1항에 있어서, 상기 염색층은 흡수성을 가지는 재질로 형성함을 특징으로 하는 액정 표시 소자용 컬러 필터 제조 방법.The color filter manufacturing method of claim 1, wherein the dye layer is formed of a material having absorbency.
KR1019930012558A 1993-07-05 1993-07-05 Color filter making method for liquid crystal display elements KR960016636B1 (en)

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KR960016636B1 true KR960016636B1 (en) 1996-12-16

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