JPS6418002A - Measuring apparatus - Google Patents

Measuring apparatus

Info

Publication number
JPS6418002A
JPS6418002A JP62175239A JP17523987A JPS6418002A JP S6418002 A JPS6418002 A JP S6418002A JP 62175239 A JP62175239 A JP 62175239A JP 17523987 A JP17523987 A JP 17523987A JP S6418002 A JPS6418002 A JP S6418002A
Authority
JP
Japan
Prior art keywords
fluctuation
wind
measured
inteferometers
windward
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62175239A
Other languages
Japanese (ja)
Other versions
JPH07117371B2 (en
Inventor
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62175239A priority Critical patent/JPH07117371B2/en
Publication of JPS6418002A publication Critical patent/JPS6418002A/en
Publication of JPH07117371B2 publication Critical patent/JPH07117371B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a more correct measured value free from the effect of fluctuation in refractive index, by enabling a reduction in the fluctuation of refractive index in air while a fluctuation component alone of a laser interferometer is allowed to be monitored. CONSTITUTION:A temperature-stabilized air is sent at almost a uniform speed to laser beams 4X and 4Y reciprocating with respect to mobile mirrors MX and MY from a fan FN to reduce fluctuation in measurement with inteferometers 5X and 5Y. Moreover, a relationship between an optical system and the direction of wind is so set that windward and lee parts of the beams 4X and 4Y are always the same with respect to the direction of wind to always cause hourly changes in the fluctuation of outputs of the interferometers 5X and 5Y from the windward to lee side. Thus, as a hourly rate of change in measure values can be found immediately and wind speed is almost constant, a fluctuation component alone of measured values of the inteferometers 5X and 5Y can be measured without time delay. Change in the fluctuation is compensated for by the correction of the measured values by the size of the fluctuation component.
JP62175239A 1987-07-14 1987-07-14 measuring device Expired - Lifetime JPH07117371B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62175239A JPH07117371B2 (en) 1987-07-14 1987-07-14 measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62175239A JPH07117371B2 (en) 1987-07-14 1987-07-14 measuring device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP32148596A Division JP2888215B2 (en) 1996-12-02 1996-12-02 Exposure apparatus and measurement method

Publications (2)

Publication Number Publication Date
JPS6418002A true JPS6418002A (en) 1989-01-20
JPH07117371B2 JPH07117371B2 (en) 1995-12-18

Family

ID=15992693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62175239A Expired - Lifetime JPH07117371B2 (en) 1987-07-14 1987-07-14 measuring device

Country Status (1)

Country Link
JP (1) JPH07117371B2 (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02101207U (en) * 1989-01-30 1990-08-13
JPH0517115A (en) * 1991-07-10 1993-01-26 Matsushita Electric Ind Co Ltd Production of graphite
EP0838728A2 (en) * 1996-10-24 1998-04-29 Nikon Corporation Precision stage interferometer system with air duct
WO2002101804A1 (en) * 2001-06-11 2002-12-19 Nikon Corporation Exposure device, device manufacturing method, and temperature stabilization flow passage device
USRE38798E1 (en) 1992-10-22 2005-09-20 Nikon Corporation Projection exposure apparatus
JP2006505778A (en) * 2002-11-04 2006-02-16 ザイゴ　コーポレーション Correction for refractive index perturbations in the interferometer path
JP2006510199A (en) * 2002-12-12 2006-03-23 ザイゴ　コーポレーション In-process correction of stage mirror distortion during photolithographic exposure cycles
JP2008072100A (en) * 2006-08-25 2008-03-27 Asml Netherlands Bv Lithography equipment and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7728951B2 (en) * 2005-09-29 2010-06-01 Asml Netherlands B.V. Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55135904A (en) * 1979-04-10 1980-10-23 Toyo Electric Mfg Co Ltd Digital operation control method
JPS60225005A (en) * 1984-04-24 1985-11-09 Tokyo Erekutoron Kk Correction system for positioning apparatus utilizing laser beam

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55135904A (en) * 1979-04-10 1980-10-23 Toyo Electric Mfg Co Ltd Digital operation control method
JPS60225005A (en) * 1984-04-24 1985-11-09 Tokyo Erekutoron Kk Correction system for positioning apparatus utilizing laser beam

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02101207U (en) * 1989-01-30 1990-08-13
JPH0517115A (en) * 1991-07-10 1993-01-26 Matsushita Electric Ind Co Ltd Production of graphite
USRE38798E1 (en) 1992-10-22 2005-09-20 Nikon Corporation Projection exposure apparatus
USRE39083E1 (en) 1992-10-22 2006-05-02 Nikon Corporation Projection exposure apparatus
EP0838728A2 (en) * 1996-10-24 1998-04-29 Nikon Corporation Precision stage interferometer system with air duct
US5870197A (en) * 1996-10-24 1999-02-09 Nikon Corporation Precision stage interferometer system with local single air duct
EP0838728A3 (en) * 1996-10-24 1999-05-06 Nikon Corporation Precision stage interferometer system with air duct
WO2002101804A1 (en) * 2001-06-11 2002-12-19 Nikon Corporation Exposure device, device manufacturing method, and temperature stabilization flow passage device
JP2006505778A (en) * 2002-11-04 2006-02-16 ザイゴ　コーポレーション Correction for refractive index perturbations in the interferometer path
JP2006510199A (en) * 2002-12-12 2006-03-23 ザイゴ　コーポレーション In-process correction of stage mirror distortion during photolithographic exposure cycles
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2008072100A (en) * 2006-08-25 2008-03-27 Asml Netherlands Bv Lithography equipment and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JPH07117371B2 (en) 1995-12-18

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