JPS63175027A - Novel polyimide resin and production thereof - Google Patents

Novel polyimide resin and production thereof

Info

Publication number
JPS63175027A
JPS63175027A JP678987A JP678987A JPS63175027A JP S63175027 A JPS63175027 A JP S63175027A JP 678987 A JP678987 A JP 678987A JP 678987 A JP678987 A JP 678987A JP S63175027 A JPS63175027 A JP S63175027A
Authority
JP
Japan
Prior art keywords
polyamic acid
polyimide
film
formula
acid solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP678987A
Other languages
Japanese (ja)
Other versions
JP2603927B2 (en
Inventor
Renichi Akahori
廉一 赤堀
Hidenori Kawai
川井 秀紀
Kosaku Nagano
広作 永野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
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Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP62006789A priority Critical patent/JP2603927B2/en
Publication of JPS63175027A publication Critical patent/JPS63175027A/en
Application granted granted Critical
Publication of JP2603927B2 publication Critical patent/JP2603927B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PURPOSE:To obtain the titled novel resin having excellent thermal dimensional stability and mechanical properties, by separately dissolving two specific kinds of polyamic acids in organic solvents, mixing the solutions, forming a film from the mixture and drying and imidating the film. CONSTITUTION:Polyamic acids of formula I (m is positive integer) and formula II (n is positive integer) are separately dissolved in polar organic solvents at a concentration of 5-40wt.%. Both solutions are mixed together at a molar ratio (I:II) of 20:80-80:20 and the mixture is cast or coated to form a film. The film is dried and, at the same time, the polyamic acids are imidated by thermal or chemical dehydrative cyclization to obtain the objective resin.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、耐熱性樹脂として知られる新規なポリイミド
樹脂とその製造法に関する。詳しくは、極めて優れた熱
的寸法安定性と、優れた機械的緒特性とを併せ持つポリ
イミド樹脂とその製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a novel polyimide resin known as a heat-resistant resin and a method for producing the same. Specifically, the present invention relates to a polyimide resin having both extremely excellent thermal dimensional stability and excellent mechanical properties, and a method for producing the same.

(従来の技術) 従来、ポリイミド樹脂は高度の耐熱性、耐薬品性、電気
的特性、機械的特性、その他優れた品持性を有している
ことか知られており、例えば、特公昭3B−10999
に見られるような、4,4′−ジアミノジフェニルエー
テルとピロメリット酸2無水物からなるポリイミド樹脂
からなるポリイミド膜は、従来から広く使用されており
、伸度等の機械的緒特性に優れているが、一般に線膨張
係数が大きく、熱的寸法安定性が悪いことか知られてい
る。一方、バラフェニレンジアミンとピロメリット酸2
無水物からなるポリイミド樹脂を使用して得られるポリ
イミド膜は、線膨張係数か小さく熱的寸法安定性に優れ
るものの、非常に脆弱であり、フィルムとしての実用性
に欠け、実際に工業的に使用てきないという欠点を有し
ていた。
(Prior art) It has been known that polyimide resins have high heat resistance, chemical resistance, electrical properties, mechanical properties, and other excellent properties. -10999
Polyimide membranes made of polyimide resins made of 4,4'-diaminodiphenyl ether and pyromellitic dianhydride, as seen in , have been widely used and have excellent mechanical properties such as elongation. However, it is known that it generally has a large coefficient of linear expansion and poor thermal dimensional stability. On the other hand, rose phenylene diamine and pyromellitic acid 2
Although polyimide films obtained using polyimide resins made of anhydrides have a small coefficient of linear expansion and excellent thermal dimensional stability, they are extremely brittle and lack practical use as films, making them difficult to actually use industrially. It had the disadvantage that it could not be used.

一方、近年にiす、より優れた熱的寸法安定性を何し、
しかも伸度等の機械的特性に優れたポリイミド樹脂に対
する要求か高まってきており、この目的で種々の検討が
行われている。例えば、特開昭61−264028 、
特開昭61−241325 、特開昭61−18182
8、特開昭81−158025 、特開昭58−185
[i24等では熱的寸法安定性を改良する目的で、例え
ばバラフェニレンジアミンやジメチルベンジジンやピロ
メリット酸二無水物などの剛直な分子を用い史には伸度
等の機械的特性を改良する目的で4.4゛−ジアミノジ
フェニルエーテルやベンゾフェノンテトラカルボン酸二
無水物やビフェニルテトラカルボン酸二無水物等のソフ
トセグメントを用い、何れもこれらの共重合によるポリ
イミドを生成し」−記[]的を達成しようとするもので
ある。 しかしながら、!−記の共重合性を用いる改良
手法では、例えばジメチルベンジジンやベンゾフェノン
テトラカルボン酸二無水物等を用いたポリイミド樹脂で
は、その耐熱性が阻害される欠点があり、またビフェニ
ルテトラカルボン酸二無水物等を用いたポリイミド樹脂
では、引っ張り試験による降伏点が発現し応力歪が生じ
るなどの問題がある。
On the other hand, in recent years, what has been achieved with better thermal dimensional stability?
Moreover, there is an increasing demand for polyimide resins having excellent mechanical properties such as elongation, and various studies are being conducted for this purpose. For example, JP-A No. 61-264028,
JP-A-61-241325, JP-A-61-18182
8, JP-A-81-158025, JP-A-58-185
[In i24, for example, rigid molecules such as phenylenediamine, dimethylbenzidine, and pyromellitic dianhydride are used for the purpose of improving thermal dimensional stability, and in some cases, the purpose is to improve mechanical properties such as elongation. 4. Using soft segments such as 4-diaminodiphenyl ether, benzophenonetetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride, polyimides were produced by copolymerization of these, and the objective described in [] was achieved. This is what I am trying to do. however,! - In the improved method using copolymerizability, for example, polyimide resins using dimethylbenzidine, benzophenonetetracarboxylic dianhydride, etc. have the disadvantage that their heat resistance is inhibited, and biphenyltetracarboxylic dianhydride Polyimide resins using such materials have problems such as a yield point occurring in a tensile test and stress distortion occurring.

更には、こうした共重合方法によれば、1分子内のモノ
マ一単位の配列が不規則となり、これをコントロールす
ることは極めて困難となる。この結果、生成するポリイ
ミド樹脂の性能は極めて不安定なものとなるという欠点
を有していた。
Furthermore, according to such a copolymerization method, the arrangement of monomer units within one molecule becomes irregular, which is extremely difficult to control. As a result, the performance of the polyimide resin produced is extremely unstable.

(発明が解決しようとする問題点) 従来ひろく使用されているポリイミド樹脂は線膨張係数
が約3×10″S℃−1と大きく、熱的寸法安定性が悪
く、金属などと積層した場合にいわゆる反りやカールを
生ずる等の問題点を自゛シていた。
(Problems to be solved by the invention) Polyimide resins that have been widely used in the past have a large coefficient of linear expansion of about 3 x 10''S°C-1, have poor thermal dimensional stability, and when laminated with metal etc. This eliminates problems such as so-called warping and curling.

これに対して、線膨張係数を金属に近づけるため種々の
試みが為されているが、いずれも得られるポリイミド膜
は機械的強度や耐熱性や耐薬品性に問題を生じ、更には
ポリイミドの前駆体であるポリアミド酸の重合に於て、
その分子構造を規制できず得られるポリイミド樹脂の性
能は不安定なものであった。
In response, various attempts have been made to bring the coefficient of linear expansion closer to that of metals, but the polyimide films obtained in all cases have problems with mechanical strength, heat resistance, and chemical resistance. In the polymerization of polyamic acid, which is
The performance of the resulting polyimide resin was unstable because its molecular structure could not be controlled.

(問題点を解決するための手段) 1−記問題点を解決するため本発明者らは鋭意検討の結
果−主として一般式 で表される反復711位からなるポリイミド(A)と、
+:として一般式 り式中、nは正の整数] で表される反復111位からなるポリイミド(13)と
が反復1i位のモル比で(A)  :(B)が20:8
0から80’: 20までの割合で存在するポリイミド
樹脂を見いたした。このポリイミド樹脂は小さい線膨張
係数とすぐれた機械的強度を有している。
(Means for Solving the Problems) 1- As a result of intensive studies by the present inventors in order to solve the above problems, polyimide (A) mainly consisting of repeating position 711 represented by the general formula,
+: in the general formula, n is a positive integer] Polyimide (13) consisting of repeating position 111 represented by
Polyimide resins present in ratios from 0 to 80':20 were found. This polyimide resin has a small coefficient of linear expansion and excellent mechanical strength.

このポリイミド樹脂の構成について詳しく説明すると、
ポリイミド(A)とポリイミド(1’3)とを反1(単
位のモル比で(A)  =(13)が20 : 80か
ら80:20までの割合で、好ましくは30ニア0から
80 : 20までの割合で存在することが望ましい。
To explain in detail the composition of this polyimide resin,
Polyimide (A) and polyimide (1'3) are mixed in a molar ratio of 20:80 to 80:20, preferably 30:0 to 80:20. It is desirable that the proportion of

ポリイミド(A)かモル比で80%以上の割合で存在す
ることも11J能であるか、古られるポリイミド膜は熱
的寸法安定性の敗訴効果が小さく、一方ポリイミド(B
)がモル比で80%以−にの割合で存在することもII
J能であるが、得られるポリイミド膜は脆弱であり実質
1−フィルムとしての形態を成さないからである。また
、ポリイミド(A)及び(13)の繰り返し数、即ちm
、nの大きさは161等規制されるものではない。但し
、ポリイミドの大きい機械的強度が必要な場合には後述
する原料となるポリアミド酸の段階でポリアミド酸(A
o)とポリアミド酸(Bo)のiri Q ’l’均分
均分合量合体(Ao)と(Bo)の混合1ILkkを考
慮して加重平均した値が2万以1−1さらには10万以
1−が好ましい。
If polyimide (A) is present in a molar ratio of 80% or more, aging polyimide films have a small negative effect on thermal dimensional stability, while polyimide (B)
) is present in a molar ratio of 80% or more.
This is because, although the polyimide film obtained is fragile, it does not substantially take the form of a 1-film. In addition, the number of repeats of polyimide (A) and (13), that is, m
, n is not restricted to 161, etc. However, if high mechanical strength of polyimide is required, polyamic acid (A
o) and polyamic acid (Bo) iri Q 'l' equal proportion The weighted average value considering the mixture 1ILkk of the combination (Ao) and (Bo) is 20,000 or more 1-1 or even 100,000 The following 1- is preferable.

次にこのポリイミド樹脂の製造方法について説明すると
、芳香族テトラカルボン酸二無水物としてピロメリット
酸二無水物を用い、芳香族ジアミン成分として4,4°
−ジアミノジフェニルエーテルを用いて、これら二成分
を実質」〕等モル使用し、何機極性溶媒中で0〜100
°C1好ましくは5〜80°C1更に好ましくは5〜5
0’Cの温度で重合してポリアミド酸(八°)を得る。
Next, to explain the manufacturing method of this polyimide resin, pyromellitic dianhydride is used as the aromatic tetracarboxylic dianhydride, and 4,4° is used as the aromatic diamine component.
-Using diaminodiphenyl ether, these two components are used in substantially equimolar amounts, and the number of molecules is 0 to 100 in a polar solvent.
°C1 preferably 5-80 °C1 more preferably 5-5
Polyamic acid (8°) is obtained by polymerization at a temperature of 0'C.

一方向様にして、芳香族テトラカルボン酸二無水物とし
てピロメリット酸二無水物を用い、芳香族ジアミン成分
としてパラフェニレンジアミンを用いて、これら二成分
を実質上等モル使用し、を機極性溶媒中で0〜100℃
、好ましくは5〜80℃、更に好ましくは5〜50℃の
温度で重合してポリアミド酸(Bo)を得る。
In one direction, pyromellitic dianhydride is used as the aromatic tetracarboxylic dianhydride, paraphenylene diamine is used as the aromatic diamine component, and these two components are used in substantially equal moles, and the polarity is 0-100℃ in solvent
, preferably at a temperature of 5 to 80°C, more preferably 5 to 50°C, to obtain polyamic acid (Bo).

ポリアミド酸(Ao)又はポリアミド酸(Bo)を得る
に際し、芳香族テトラカルボン酸二無水物としてピロメ
リット酸二無水物を単独で使用するのが本発明の効果を
得るのに最も望ましいが、例えば、3.3“、4.4”
−ビフェニルテトラカルボン酸二無水物、3.3’、4
,4゛−ベンゾフェノンテトラカルボン酸二無水物、ナ
フタレン−1,2,5゜6−二無水物などの四塩基酸無
水物の使用も可能である・。ピロメリット酸二無水物以
外の酸無水物は本発明の目的、効果が達成される限り任
意の口を使用できるが11合体(Ao)あるいは(l’
)中の全酸無水物成分に対し10モル%以下、好ましく
は5モル%以下、さらに好ましくは3%以下が適当であ
る。また、ポリアミド酸(Ao)を得るに際し、ジアミ
ン成分として4,4−ジアミノジフェニルエーテルを1
%独で使用するのが最も9!ましく、ポリアミド酸(B
o)を得るに際し、ジアミン成分としてパラフェニレン
ジアミンを単独で使用するのが最も望ましいが、ポリア
ミド酸(Ao)又はポリアミド酸(Bo)のいずれを得
るに際しても、一般式、H2N−R−NH2 (式中、Rは二価の有機Iに ) で表されるジアミン化合物、例えば、4,4−ビス(4
−アミノフェノキシ)ビフェニル、4,4−ジアミノジ
フェニルスルホン、3,3°−ジアミノジフェニルスル
ホン、ビス[4−(4−アミノフェノキン)フェニルコ
スルホン、ビス[4−(3−アミノフェノキシ)フェニ
ル]スルホン、ビス[4−(2−アミノフェノキシ)フ
ェニル]スルホン、1.4−ビス(4−アミノフェノキ
シ)ベンゼン、1,3−ビス(4−アミノフェノキシ)
ベンゼン、■、3−ビス(3−アミノフェノキシ)ベン
ゼン、1.4−ビス(4−アミノフェニル)ベンゼン、
ビス[4−(4−アミノフェノキシ)フェニル]エーテ
ル、4,4°−ジアミノジフェニルメタン、ビス(3−
エチル−4−アミノフェニル)メタン、ビス(3−メチ
ル−4−アミノフェニル)メタン、ビス(3−クロロ−
4−アミノフェニル)メタン、3.3’−ジアミノジフ
ェニルスルホン、4.4’−ジアミノジフェニルスルホ
ン、3.3°−ジメトキシ−4,4°−ジアミノジフェ
ニル、3,3゛−ジメチル−4,4°−ジアミノビフェ
ニル、3,3°−ジクロロ−4,4゛−ジアミノビフェ
ニル、2,2°、5,5°−テトラクロロ−4,4゛−
ジアミノビフェニル、3.3’−ジカルボキシ−4,4
゛−ジアミノビフェニル、3,3°−ジヒドロキシ−4
,4゛−ジアミノビフェニル、4,4゛−ジアミノジフ
ェニルエーテル、4 、4’−ジアミノジフェニルスル
フィド、3,3°−ジアミノジフェニルエーテル、3,
4°−ジアミノジフェニルエーテル、4,4°−ジアミ
ノジフェニルメタン、4.4゜−ジアミノビフェニル、
4.4°−ジアミノオクタフルオロビフェニル、2.4
−ジアミノトルエン、パラフェニレンジアミン、メタフ
ェニレンジアミン、2.2−ビス[4−(4−アミノフ
ェノキシ)フェニル]プロパン、2.2−ビス[4−(
4−アミノフェノキシ)フェニル]へキサフルオロプロ
パン、2,2−ビス(4−アミノフェニル)プロパン、
2.2−ビス(4−アミノフェニル)へキサフルオロプ
ロパン、2.2−ビス(3−ヒドロキシ−4−アミノフ
ェニル)プロパン、2.2−ビス(3−ヒドロキシ−4
−アミノフェニル)へキサフルオロプロパン、9,9−
ビス(4−アミノフェニル)−IO−ヒドロ−アントラ
セン、オルトトリジンスルホンや3,3°、4 、4’
−ビフェニルテトラアミン、3,3°、4,4°−テト
ラアミノジフェニルエーテル等のテトラミン類の一部使
用も可能である。4,4゛−ジアミノジフェニルエーテ
ルやパラフェニレンジアミン以外の多価アミンは本発明
の目的効果か達成される限り任意の量を使用できるが重
合体(Ao)あるいは(Bo)中の全アミン成分に対し
10モル%以下、好ましくは5モル以上、さらに好まし
くは3モル%以下の使用が適当である。
When obtaining polyamic acid (Ao) or polyamic acid (Bo), it is most desirable to use pyromellitic dianhydride alone as the aromatic tetracarboxylic dianhydride in order to obtain the effects of the present invention, but for example, , 3.3", 4.4"
-Biphenyltetracarboxylic dianhydride, 3.3', 4
It is also possible to use tetrabasic acid anhydrides such as , 4'-benzophenone tetracarboxylic dianhydride, and naphthalene-1,2,5'6-dianhydride. Any acid anhydride other than pyromellitic dianhydride can be used as long as the purpose and effect of the present invention are achieved.
10 mol % or less, preferably 5 mol % or less, more preferably 3 mol % or less based on the total acid anhydride components in ). In addition, when obtaining polyamic acid (Ao), 1 4,4-diaminodiphenyl ether is added as a diamine component.
9 is most commonly used in Germany! Indeed, polyamic acid (B
When obtaining o), it is most desirable to use paraphenylene diamine alone as the diamine component, but when obtaining either polyamic acid (Ao) or polyamic acid (Bo), the general formula, H2N-R-NH2 ( In the formula, R is a divalent organic I and a diamine compound represented by ), for example, 4,4-bis(4
-aminophenoxy)biphenyl, 4,4-diaminodiphenylsulfone, 3,3°-diaminodiphenylsulfone, bis[4-(4-aminophenoquine)phenylcosulfone, bis[4-(3-aminophenoxy)phenyl] Sulfone, bis[4-(2-aminophenoxy)phenyl]sulfone, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)
Benzene, ■, 3-bis(3-aminophenoxy)benzene, 1,4-bis(4-aminophenyl)benzene,
Bis[4-(4-aminophenoxy)phenyl]ether, 4,4°-diaminodiphenylmethane, bis(3-
Ethyl-4-aminophenyl)methane, bis(3-methyl-4-aminophenyl)methane, bis(3-chloro-
4-aminophenyl)methane, 3,3'-diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfone, 3.3'-dimethoxy-4,4'-diaminodiphenyl, 3,3'-dimethyl-4,4 °-diaminobiphenyl, 3,3°-dichloro-4,4′-diaminobiphenyl, 2,2°,5,5°-tetrachloro-4,4′-
Diaminobiphenyl, 3,3'-dicarboxy-4,4
゛-diaminobiphenyl, 3,3°-dihydroxy-4
, 4'-diaminodiphenyl, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl ether, 3,
4°-diaminodiphenyl ether, 4,4°-diaminodiphenylmethane, 4.4°-diaminobiphenyl,
4.4°-Diaminooctafluorobiphenyl, 2.4
-diaminotoluene, paraphenylenediamine, metaphenylenediamine, 2.2-bis[4-(4-aminophenoxy)phenyl]propane, 2.2-bis[4-(
4-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis(4-aminophenyl)propane,
2.2-bis(4-aminophenyl)hexafluoropropane, 2.2-bis(3-hydroxy-4-aminophenyl)propane, 2.2-bis(3-hydroxy-4
-aminophenyl)hexafluoropropane, 9,9-
Bis(4-aminophenyl)-IO-hydro-anthracene, orthotolidine sulfone and 3,3°,4,4'
It is also possible to use some of the tetramines, such as -biphenyltetraamine, 3,3°, 4,4°-tetraaminodiphenyl ether. Polyvalent amines other than 4,4'-diaminodiphenyl ether and para-phenylene diamine can be used in any amount as long as the desired effect of the present invention is achieved, but based on the total amine components in the polymer (Ao) or (Bo). It is appropriate to use 10 mol % or less, preferably 5 mol % or more, and more preferably 3 mol % or less.

ここでポリアミド酸(八°)及びポリアミド酸(13°
)の生成反応に使用される宵機極性溶媒としては、例え
ば、ジメチルスルホキシド、ジエチルスルホキシドなど
のスルホキシド系溶媒、N、N−ジメチルホルムアミド
、N、N−ジエチルホルムアミドなどのホルムアミド系
溶媒、N、N−ジメチルアセトアミド、N、N−ジエチ
ルアセトアミドなどのアセトアミド系溶媒、N−メチル
−2−ピロリドン、N−ビニル−2−ピロリドンなどの
ピロリドン系溶媒、フェノール、0−1l−1またはp
−クレゾール、キシレノール、ハロゲン化フェノール、
カテコールなどのフェノール系溶媒、あるいはヘキサメ
チルホスホルアミド、γ−ブチロラクトンなどを挙げる
ことができ、これらを単独または混合物として用いるの
が望ましいが、史にはキンレン、トルエンのような芳香
族炭化水素の一部使用も可能である。また、ポリアミド
酸(Ao)及びポリアミド酸(Bo)は各々前記の6機
極性溶媒中に5〜40屯は%、好ましくは5〜30屯瓜
%、更に好ましくは5〜25市瓜%溶解されているのが
取り扱いの面からも望ましい。
Here, polyamic acid (8°) and polyamic acid (13°
Examples of the polar solvent used in the production reaction include sulfoxide-based solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamide-based solvents such as N,N-dimethylformamide, N,N-diethylformamide, and N,N-dimethylformamide. - Acetamide solvents such as dimethylacetamide, N,N-diethylacetamide, pyrrolidone solvents such as N-methyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, phenol, 0-1l-1 or p
-cresol, xylenol, halogenated phenol,
Examples include phenolic solvents such as catechol, hexamethylphosphoramide, γ-butyrolactone, etc., and it is desirable to use these alone or as a mixture; Partial use is also possible. Further, polyamic acid (Ao) and polyamic acid (Bo) are each dissolved in the above-mentioned 6-unit polar solvent by 5 to 40 ton%, preferably 5 to 30 ton%, more preferably 5 to 25 ton%. It is desirable from the viewpoint of handling.

ポリアミド酸(A”)が角゛機極性溶媒中に溶解されて
いるポリアミド酸溶液とポリアミド酸(Bo)が9機極
性溶媒中に溶解されているポリアミド酸溶液とを反復単
位のモル比で(A’) : (Bo)が20 : 80
から80:20までの割合で、好ましくは30ニア0か
ら80+20までの割合で混合し、本発明のポリイミド
樹脂を得るための前駆体であるポリアミド酸組成物の溶
液を得る事ができる。このポリアミド酸溶液を混合する
方法としては、特に制約を受けるものではない。ついで
、この前駆体であるポリアミド酸組成物の溶液から熱的
あるいは化学的に脱水閉環(イミド化)することにより
本発明のポリイミド樹脂を得ることができる。
A polyamic acid solution in which polyamic acid (A") is dissolved in a polar polar solvent and a polyamic acid solution in which a polyamic acid (Bo) is dissolved in a polar solvent in a repeating unit molar ratio ( A'): (Bo) is 20: 80
to 80:20, preferably 30:0 to 80+20, to obtain a solution of the polyamic acid composition which is a precursor for obtaining the polyimide resin of the present invention. There are no particular restrictions on the method of mixing this polyamic acid solution. Next, the polyimide resin of the present invention can be obtained by thermally or chemically dehydrating and ring-closing (imidizing) the solution of the polyamic acid composition as a precursor.

先ず熱的に脱水閉環(イミド化)する方法について説明
すると、上記ポリアミド酸組成物の溶液をドラム或はエ
ンドレスベルト−Fに流延または塗布して膜状と成し、
その膜を150°C以下の)晶度で約3Q〜90分間乾
燥し、自己支持性の膜を得る。次いで、これを支持体よ
り引き剥し端部を固定した後、約100〜500℃まで
徐々に加熱し、冷却後これより取り外しポリイミド樹脂
を得る。
First, to explain the method of thermally dehydrating and ring-closing (imidization), a solution of the polyamic acid composition is cast or coated on a drum or endless belt-F to form a film,
The membrane is dried at crystallinity below 150° C. for about 3Q to 90 minutes to obtain a self-supporting membrane. Next, this is peeled off from the support, the ends are fixed, and then gradually heated to about 100 to 500°C, and after cooling, removed to obtain a polyimide resin.

次ぎに化学的に脱水閉環(イミド化)する方法について
説明すると、」−記ポリアミド酸組成物の溶液に化学は
論以にの脱水剤と触媒量の第3級アミン頌を加え、これ
をドラム或はエンドレスベルト1−に流延または塗布し
て膜状と成し、その膜を150℃以下の温度で約5〜3
0分間乾燥し、自己支持性の膜を得る。次いで、これを
支持体より引き剥し端部を固定した後、約100〜50
0℃まで徐々に加熱し、冷却後これにより取り外しポリ
イミド樹脂を得る。この時に用いる脱水剤としては、例
えば脂肪族酸無水物、芳香族酸無水物等が挙げられる。
Next, to explain the method of chemically dehydrating and ring-closing (imidization), add the dehydrating agent described above and a catalytic amount of tertiary amine to the solution of the polyamic acid composition mentioned above, and pour this into a drum. Alternatively, the endless belt 1- is cast or coated to form a film, and the film is heated at a temperature of 150°C or less for about 5 to 30 minutes.
Dry for 0 minutes to obtain a self-supporting membrane. Next, after peeling it off from the support and fixing the end, it was
It is gradually heated to 0° C., and after cooling, it is removed to obtain a polyimide resin. Examples of the dehydrating agent used at this time include aliphatic acid anhydrides and aromatic acid anhydrides.

また触媒としては、例えばトリエチルアミン等の脂肪族
第3級アミン類、ジメチルアニリン等の芳香族第3級ア
ミン類、ピリジン、ピコリン、イソキノリン等のi(索
環式第3級アミン頌などが挙げられる。
Examples of catalysts include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as dimethylaniline, and cyclic tertiary amines such as pyridine, picoline, and isoquinoline. .

(実施例) 以下、実施例により本発明を具体的に説明するが、本発
明はこれら実施例のみに限定されるものではない。
(Examples) Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited only to these Examples.

比較例 1〜3 500ml四ツロフラスコに4,4°−ジアミノジフェ
ニルエーテル21.549を採取し、それぞれ845.
009.245.009.95.00 gのN、N−ジ
メチルアセトアミドを加え溶解した。他方、100m1
ナスフラスコにピロメリット酸二無水物23.46 ’
;iを採取し、前記4,4°−ジアミノジフェニルエー
テル溶液中に固形状で添加した。さらに、この100+
nlナスフラスコ中の壁面に付着残存するピロメリット
酸二無水物を1’0.00 gのN 、 +’J−ジメ
チルアセトアミドで反応系(四ツ目フラスコ)内へ流し
入れた。史に引き続き1時間積はんを続けおのおの5.
15.30重量%のポリアミド酸溶液を得た。反応温度
は5−10℃に保った。但し以」−の操作でピロメリッ
ト酸二無水物の取り扱い及び反応系内は乾燥窒素気流下
に置いた。
Comparative Examples 1 to 3 21.549 of 4,4°-diaminodiphenyl ether was collected in a 500 ml four-way flask, and 845.9.
009.245.009.95.00 g of N,N-dimethylacetamide was added and dissolved. On the other hand, 100m1
Pyromellitic dianhydride 23.46' in an eggplant flask
;i was collected and added in solid form to the 4,4°-diaminodiphenyl ether solution. Furthermore, this 100+
The pyromellitic dianhydride remaining attached to the wall of the nl round bottom flask was poured into the reaction system (four-eye flask) with 1'0.00 g of N, +'J-dimethylacetamide. Continuing from the history, we continued to accumulate for 1 hour and each 5.
A 15.30% by weight polyamic acid solution was obtained. The reaction temperature was kept at 5-10°C. However, in the following procedure, the handling of pyromellitic dianhydride and the inside of the reaction system were placed under a stream of dry nitrogen.

次にこれらのポリアミド酸溶液をガラス板状に流延塗布
し約100°Cにて約60分間乾燥後、ポリアミド酸塗
膜をガラス板より剥し、その塗膜を支持枠に固定し、そ
の後約100℃で約30分間、約200℃で約60分間
、約300℃で約60分間加熱し、脱水閉環乾燥後15
から25ミクロンのポリイミド膜を得た。これらのフィ
ルムは以下の性質を示した。
Next, these polyamic acid solutions were cast onto a glass plate, dried at about 100°C for about 60 minutes, the polyamic acid coating was peeled off from the glass plate, the coating was fixed on a support frame, and then about Heated at 100°C for about 30 minutes, at about 200°C for about 60 minutes, and at about 300°C for about 60 minutes, and after dehydration and ring closure drying,
A 25 micron polyimide film was obtained from the above. These films exhibited the following properties.

線膨張係1B (at  200℃)  3.5X 1
O−5(cm/ca+/’C)伸度         
 85.7% 比較例 4〜6 500+nl四ツロフラスコにパラフェニレンジアミン
14.919を採取し、それぞれ845.00g、24
5.00g、95.009のN、N−ジメチルアセトア
ミドを加え溶解し、比較例1〜3の方法に従い30.0
99のピロメリット酸二無水物を反応させ各々5.15
.30!fiu%のポリアミド酸溶液を得た。但し、最
終の壁面に母管残存するピロメリット酸二無水物はto
、oo gのN、N−ジメチルアセトアミドで反応系(
四ツ目フラスコ)内へ流し入れた。
Linear expansion coefficient 1B (at 200℃) 3.5X 1
O-5 (cm/ca+/'C) elongation
85.7% Comparative Examples 4 to 6 14.919 paraphenylenediamine was collected in a 500+nl four-way flask, and 845.00 g and 24
5.00 g, 95.009 N,N-dimethylacetamide was added and dissolved, and 30.0 g was added according to the method of Comparative Examples 1 to 3.
99 pyromellitic dianhydrides were reacted to give 5.15% each
.. 30! A polyamic acid solution of fiu% was obtained. However, the pyromellitic dianhydride remaining on the final wall surface of the mother tube is to
,oog of N,N-dimethylacetamide in the reaction system (
into a four-eye flask).

次に比較例1〜3の方法に従い、これらのポリアミド酸
溶液よりポリイミド膜を得たが、これらのフィルムは脆
弱でありその性質を測定することはできなかった。
Next, polyimide films were obtained from these polyamic acid solutions according to the methods of Comparative Examples 1 to 3, but these films were so fragile that their properties could not be measured.

実施例1 500ml四ツロフラスコに、↓と較例2の方法に従い
得られる15市は5ポリアミド酸溶液158.729を
採取し、更に比較例5の方法に従い得られる15市W9
6ポリアミド酸溶液41.289を混入し、乾燥窒素気
流下5〜10℃で約10分聞役はんした。次に比較例1
の方法に従い、この15重量%ポリアミド酸混合溶液よ
りポリイミド膜を得た。
Example 1 158.729 of the polyamic acid solution obtained according to the method of Comparative Example 2 was collected in a 500 ml four-way flask, and 158.729 W9 of the 15 W9 obtained according to the method of Comparative Example 5 was collected.
6 polyamic acid solution was added thereto, and the mixture was stirred at 5 to 10° C. for about 10 minutes under a stream of dry nitrogen. Next, Comparative Example 1
A polyimide film was obtained from this 15% by weight polyamic acid mixed solution according to the method described in the following.

二のフィルムは以下の性質を示した。The second film showed the following properties.

線膨張係数(at 200℃) 1.72X10’  
(cm/c+n/”C)伸度         32,
8% 実施例2 5001四ツロフラスコに比較例2の方法に従い得られ
る15重鑓%ポリアミド酸溶液112.35gを採取し
、更に比較例5の方法に従いi′4られる1 5 屯歇
96ボリアミド酸溶液87.859を混入し、乾燥窒素
気流下5〜10℃分間撹はんした。次に比較例1〜3の
方法に従い、この15重二%ポリアミド酸混合溶岐より
ポリイミド膜を得た。このフィルムは以下の性質を示し
た。
Linear expansion coefficient (at 200℃) 1.72X10'
(cm/c+n/”C) Elongation 32,
8% Example 2 112.35 g of the 15% polyamic acid solution obtained according to the method of Comparative Example 2 was collected in a 5001 four-piece flask, and the 15% polyamic acid solution was further prepared according to the method of Comparative Example 5. 87.859 was mixed in and stirred for 5 to 10°C under a stream of dry nitrogen. Next, according to the method of Comparative Examples 1 to 3, a polyimide film was obtained from this 15% polyamic acid mixture. This film exhibited the following properties.

線膨張係数(at 200°C) 0.[i9X IQ
−5(cm/cm/’C)伸反         14
.796 実施例3 500ml四ツ目フラスコに、比較例1の方法に従い得
られる5重量%ポリアミド酸溶液176.98gを採取
し、史に比較例6の方法に従い得られる30屯量96ポ
リアミド酸溶液23.02 gを混入し、乾燥窒素気流
下5〜10℃で約10分聞役はんした。次に比較例1〜
3の方法に従い、このポリアミド酸混合溶液よりポリイ
ミド膜を得た。このフィルムはJJドのf/lE質を示
した。
Coefficient of linear expansion (at 200°C) 0. [i9X IQ
-5 (cm/cm/'C) stretch 14
.. 796 Example 3 176.98 g of the 5% by weight polyamic acid solution obtained according to the method of Comparative Example 1 was collected in a 500 ml four-eye flask, and 30 tons of the 96 polyamic acid solution obtained according to the method of Comparative Example 6 was added to the 500 ml four-eye flask. 0.02 g was mixed in and stirred for about 10 minutes at 5 to 10°C under a stream of dry nitrogen. Next, Comparative Example 1~
A polyimide film was obtained from this polyamic acid mixed solution according to method 3. This film exhibited f/lE quality of JJ.

線膨張係数(at 200°C) 0.G9x 10’
  (am/c+n/’C)伸度         1
4.7% 実施例4 500m1四ツロフラスコに、比較例3の方法に従い得
られる30重口96ボリアミド酸溶液35.219を採
取し、更に比較例4の方法に従い得られる5mm%ポリ
アミド酸溶液IG4.79gを混入し、乾燥窒素気流下
5〜10°Cで約10分聞役はんした。
Coefficient of linear expansion (at 200°C) 0. G9x 10'
(am/c+n/'C) Elongation 1
4.7% Example 4 A 35.219% polyamic acid solution obtained according to the method of Comparative Example 3 was collected in a 500 ml four-walled flask, and a 5 mm% polyamic acid solution IG4. 79 g was mixed in, and the mixture was incubated at 5 to 10° C. for about 10 minutes under a stream of dry nitrogen.

次に比較例1〜3のノブ法に従い、このポリアミド酸混
合溶液によりポリイミド膜を得た。このフィルムは以下
の性質を示した。
Next, according to the Knob method of Comparative Examples 1 to 3, a polyimide film was obtained using this polyamic acid mixed solution. This film exhibited the following properties.

0!膨張係数(at 200℃) 0.69x [0−
5(cm/c+n/℃)伸度         14.
796 実施例5 500ml四ツ目フラスコに、比較例1の方法に従い得
られる15重口96ボリアミド酸溶液59.877を採
取し、更に比較例2の方法に従い得られる15屯量96
ポリアミド酸溶液140.137を混入し、乾燥窒素気
流下5〜10°Cて約10分聞役はんした。次に比較例
1〜3の方法に従い、この15!J′i瓜06ポリアミ
ト酸混合溶液よりポリイミド膜をiすた。このフィルム
は以下の性質を/Jクシた。
0! Expansion coefficient (at 200℃) 0.69x [0-
5 (cm/c+n/℃) Elongation 14.
796 Example 5 Into a 500 ml four-eye flask, 59.877 tons of the 15-tonne 96-volume polyamic acid solution obtained according to the method of Comparative Example 1 was collected, and 96 tons of the 15-tonne solution obtained according to the method of Comparative Example 2 was further collected.
Polyamic acid solution 140.137 was mixed therein and allowed to stand at 5 to 10°C for about 10 minutes under a stream of dry nitrogen. Next, according to the methods of Comparative Examples 1 to 3, this 15! A polyimide film was removed from the J′i Melon 06 polyamic acid mixed solution. This film had the following properties.

線11g へ係5J (at 20口゛C) 0.23
X 1O−5(cm/cm/’C)伸度       
  5.096 実施例6 500m1四ツ目フラスコに、比較例1の方法に従い得
られる1 5 I = 96ポリアミド酸溶液59.8
77を採取し、更に比較例2の方法に従い得られる15
重口06ボリアミド酸溶液140.13gを混入し、乾
燥室素気jf+ε下5〜10°Cで約10分聞役はんし
た。次にここに35.009の無水酢酸と5.009の
ピリジンを加え、この溶液をガラス板状に流延塗布し約
80°Cにて約10分間乾燥後、この自己支持性塗膜を
ガラス板より剥し、その塗膜を支持枠に固定し、その後
約100°Cで約30分間、約200°Cで約60分間
、約300℃で約60分間IJII fi:Wし、乾燥
後15から25ミクロンのポリイミド膜を得た。このフ
ィルムは以下の性質を示した。
To wire 11g 5J (at 20 mouths C) 0.23
X 1O-5 (cm/cm/'C) Elongation
5.096 Example 6 A 15 I = 96 polyamic acid solution obtained according to the method of Comparative Example 1 was placed in a 500 ml four-eye flask, 59.8
77 was collected, and further 15 obtained according to the method of Comparative Example 2
140.13 g of heavy weight 06 polyamic acid solution was mixed therein, and the mixture was allowed to stand for about 10 minutes at 5 to 10° C. in a drying room under an atmosphere of jf+ε. Next, 35.009 acetic anhydride and 5.009 pyridine were added, and this solution was cast onto a glass plate and dried at about 80°C for about 10 minutes. Peel it off from the board, fix the coating on a support frame, then heat it at about 100°C for about 30 minutes, about 200°C for about 60 minutes, and at about 300°C for about 60 minutes, and after drying it A 25 micron polyimide film was obtained. This film exhibited the following properties.

線膨張係数(at 200°C) 0.23X 10’
  (cm/cm/’C)仲庶         7.
596 実施例7 500m1四ツ【コフラスコに、比較例3の方法に従い
得られる30重口96ボリアミド酸溶液35.219を
採取し、更に比較例4の方法に従い得られる5重も)0
6ポリアミド酸溶液IG4.799を混入し、乾燥窒素
気流ド5〜10℃で約10分聞役はんした。
Linear expansion coefficient (at 200°C) 0.23X 10'
(cm/cm/'C) Nakajo 7.
596 Example 7 Four 500 m1 [30-weight 96-weight polyamide acid solution obtained according to the method of Comparative Example 3 35.219 was collected in a coffin flask, and also 5-weight polyamide acid solution obtained according to the method of Comparative Example 4]0
6 polyamic acid solution IG4.799 was mixed therein, and the mixture was stirred for about 10 minutes at 5 to 10°C in a dry nitrogen stream.

次にここに35.00 gの無水酢酸と5.00gのピ
リジンを揃え、この溶液をガラス板状に流延塗布し約8
0°Cにて約10分間乾燥後、この自己支持性塗膜をガ
ラス板より剥し、その塗膜を支持枠に固定し、その後約
100℃で約30分11(1、約2(1)0℃で約60
分間、約300℃で約60分間加熱し、乾燥後15から
25ミクロンのポリイミド膜をjすた。このフィルムは
以下の性質を示した。
Next, prepare 35.00 g of acetic anhydride and 5.00 g of pyridine, and cast this solution onto a glass plate to form a coating of approximately 8.0 g.
After drying at 0°C for about 10 minutes, this self-supporting coating film was peeled off from the glass plate, the coating film was fixed on a support frame, and then dried at about 100°C for about 30 minutes11 (1, about 2 (1) Approximately 60 at 0℃
After heating at about 300° C. for about 60 minutes and drying, a 15 to 25 micron polyimide film was removed. This film exhibited the following properties.

線膨張係数(at 200℃) O,[i9X 101
0−5(/em/’C)伸度         19,
5°6 比較例1〜3及び実施例1〜7の結果を表1にまとめて
示す ポリアミド酸 ポリアミド酸 線膨張係数   伸度モ
ル比    溶液濃度  (at 200°c)(%)
(A):(B)   (重量%)   (am/cm/
’C)比較例1 100 :0 5.0 3.49 X
l0−5 85.7比較例2  +00 :0 15.
0 3.49 Xl0−5 85.7比較例3 100
 :Oao、o  3.49 Xl0−5 85.7実
施例1  75  :2515.0 1.72XIO−
’  32.8実施例2  50 : 5015.0 
0.69 X 10’  14.7実施例3  50 
:50 7.9 0.69 xlO−514,7実施例
4  50 :50 9.4 0.+39 xlO’ 
 14.7実施例5  25 : 7515.0 0.
23 x 10’   5.0実施例6  25 : 
75 f5.0 0123 XIO″57.5実施例7
  50 :5o  9.4 0.G9 XLO−’ 
 19.5(発明の効果) 本発明のポリイミド樹脂より得られるポリイミド膜は公
知のポリイミド膜より線膨張係数が小さく、熱的−・J
法安定性に優れており、史には公知の線膨張係数を小さ
く改良したポリイミド膜が有し得なかった柔軟性と耐熱
性と加工性とを併せ持つと言う効果ををする。
Coefficient of linear expansion (at 200°C) O, [i9X 101
0-5(/em/'C) Elongation 19,
5°6 The results of Comparative Examples 1 to 3 and Examples 1 to 7 are summarized in Table 1 Polyamic acid Polyamic acid Linear expansion coefficient Elongation molar ratio Solution concentration (at 200°C) (%)
(A):(B) (weight%) (am/cm/
'C) Comparative example 1 100:0 5.0 3.49 X
l0-5 85.7 Comparative Example 2 +00 :0 15.
0 3.49 Xl0-5 85.7 Comparative example 3 100
:Oao, o 3.49 Xl0-5 85.7 Example 1 75 :2515.0 1.72XIO-
'32.8 Example 2 50: 5015.0
0.69 X 10' 14.7 Example 3 50
:50 7.9 0.69 xlO-514,7 Example 4 50 :50 9.4 0. +39 xlO'
14.7 Example 5 25: 7515.0 0.
23 x 10' 5.0 Example 6 25:
75 f5.0 0123 XIO″57.5 Example 7
50:5o 9.4 0. G9 XLO-'
19.5 (Effects of the Invention) The polyimide film obtained from the polyimide resin of the present invention has a smaller linear expansion coefficient than known polyimide films, and has a thermal
It has excellent legal stability, and has the effect of combining flexibility, heat resistance, and processability, which previously known polyimide films with improved coefficients of linear expansion have not been able to have.

また、特には従来の共重合法による改質では、なし得な
かったポリイミド1分子中の繰り返し単位の構造を制御
することにより、生成するポリイミド膜の性能を一定の
ものにすることができる。
Furthermore, by controlling the structure of repeating units in one molecule of polyimide, which has not been possible with modification by conventional copolymerization methods, the performance of the resulting polyimide film can be made constant.

Claims (2)

【特許請求の範囲】[Claims] (1)主として一般式 ▲数式、化学式、表等があります▼ [式中、mは正の整数] で表される反復単位からなるポリイミド(A)と、主と
して一般式 ▲数式、化学式、表等があります▼ [式中、nは正の整数] で表される反復単位からなるポリイミド(B)とが反復
単位のモル比で(A):(B)が20:80から80:
20までの割合で存在するポリイミド樹脂。
(1) Mainly general formula ▲ Numerical formulas, chemical formulas, tables, etc. ▼ [In the formula, m is a positive integer] Polyimide (A) consisting of a repeating unit represented by ▼ [In the formula, n is a positive integer] Polyimide (B) consisting of repeating units represented by (A):(B) has a molar ratio of 20:80 to 80:
Polyimide resin present in proportions up to 20.
(2)主として一般式 ▲数式、化学式、表等があります▼ [式中、mは正の整数] で表される反復単位からなるポリアミド酸(A′)が有
機極性溶媒中に5〜40重量%溶解されているポリアミ
ド酸溶液、及び主として一般式 ▲数式、化学式、表等があります▼ [式中、nは正の整数] で表される反復単位からなるポリアミド酸(B′)が有
機極性溶媒中に5〜40重量%溶解されているポリアミ
ド酸溶液を反復単位のモル比で(A′):(B′)が2
0:80から80:20までの割合となるよう混合して
なるポリアミド酸溶液を流延又は塗布して膜状と為し、
その膜を乾燥すると共に該ポリアミド酸を熱的或は化学
的に脱水閉環(イミド化)してポリイミドを生成するこ
とを特徴とするポリイミド樹脂の製造方法。
(2) There are mainly general formulas ▲ mathematical formulas, chemical formulas, tables, etc. ▼ [In the formula, m is a positive integer] Polyamic acid (A') consisting of repeating units represented by 5 to 40% by weight in an organic polar solvent % dissolved polyamic acid solution, and mainly the general formula ▲ mathematical formula, chemical formula, table, etc. A polyamic acid solution having 5 to 40% by weight dissolved in a solvent is prepared in a molar ratio of repeating units (A'):(B') of 2.
A polyamic acid solution mixed in a ratio of 0:80 to 80:20 is cast or coated to form a film,
A method for producing a polyimide resin, which comprises drying the film and thermally or chemically dehydrating and ring-closing (imidizing) the polyamic acid to produce polyimide.
JP62006789A 1987-01-14 1987-01-14 Manufacturing method of new polyimide resin Expired - Lifetime JP2603927B2 (en)

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JP2603927B2 JP2603927B2 (en) 1997-04-23

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63205321A (en) * 1987-02-20 1988-08-24 Mitsubishi Electric Corp Polyimide resin composition
JPS6416833A (en) * 1987-07-10 1989-01-20 Kanegafuchi Chemical Ind Polyamic acid copolymer, polyimide copolymer therefrom and production thereof
JPS6416834A (en) * 1987-07-10 1989-01-20 Kanegafuchi Chemical Ind Polyamic acid copolymer, polyimide copolymer therefrom and production thereof
EP0483376A1 (en) * 1990-05-21 1992-05-06 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Polyimide resin film

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60210894A (en) * 1984-04-04 1985-10-23 日立化成工業株式会社 Method of producing substrate for flexible printed circuit board
JPS60210629A (en) * 1984-04-04 1985-10-23 Hitachi Chem Co Ltd Production of polyimide molding
JPS626790A (en) * 1985-07-02 1987-01-13 Mitsubishi Electric Corp Laser beam machining head
JPS6257916A (en) * 1985-09-09 1987-03-13 Toray Ind Inc Copolyimide yarn
JPS6296561A (en) * 1985-10-24 1987-05-06 Idemitsu Kosan Co Ltd Resin composition and production thereof
JPS62161831A (en) * 1986-01-10 1987-07-17 Toray Ind Inc Production of polyimide block copolymer
JPS62174230A (en) * 1986-01-29 1987-07-31 Sumitomo Bakelite Co Ltd Production of heat-resistant resin
JPS62253621A (en) * 1986-04-28 1987-11-05 Hitachi Ltd Polyimide resin

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60210894A (en) * 1984-04-04 1985-10-23 日立化成工業株式会社 Method of producing substrate for flexible printed circuit board
JPS60210629A (en) * 1984-04-04 1985-10-23 Hitachi Chem Co Ltd Production of polyimide molding
JPS626790A (en) * 1985-07-02 1987-01-13 Mitsubishi Electric Corp Laser beam machining head
JPS6257916A (en) * 1985-09-09 1987-03-13 Toray Ind Inc Copolyimide yarn
JPS6296561A (en) * 1985-10-24 1987-05-06 Idemitsu Kosan Co Ltd Resin composition and production thereof
JPS62161831A (en) * 1986-01-10 1987-07-17 Toray Ind Inc Production of polyimide block copolymer
JPS62174230A (en) * 1986-01-29 1987-07-31 Sumitomo Bakelite Co Ltd Production of heat-resistant resin
JPS62253621A (en) * 1986-04-28 1987-11-05 Hitachi Ltd Polyimide resin

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63205321A (en) * 1987-02-20 1988-08-24 Mitsubishi Electric Corp Polyimide resin composition
JPS6416833A (en) * 1987-07-10 1989-01-20 Kanegafuchi Chemical Ind Polyamic acid copolymer, polyimide copolymer therefrom and production thereof
JPS6416834A (en) * 1987-07-10 1989-01-20 Kanegafuchi Chemical Ind Polyamic acid copolymer, polyimide copolymer therefrom and production thereof
EP0483376A1 (en) * 1990-05-21 1992-05-06 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Polyimide resin film

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