JPS5793346A - Production of photomask plate - Google Patents

Production of photomask plate

Info

Publication number
JPS5793346A
JPS5793346A JP17040080A JP17040080A JPS5793346A JP S5793346 A JPS5793346 A JP S5793346A JP 17040080 A JP17040080 A JP 17040080A JP 17040080 A JP17040080 A JP 17040080A JP S5793346 A JPS5793346 A JP S5793346A
Authority
JP
Japan
Prior art keywords
laser light
metallic
chamber
plate
irregularities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17040080A
Other languages
Japanese (ja)
Inventor
Katsuyuki Arii
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17040080A priority Critical patent/JPS5793346A/en
Publication of JPS5793346A publication Critical patent/JPS5793346A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain metallic layers of uniform film thickness easily by supplying raw material gases contg. org. gases into a gas chamber using a substrate transparent to UV light for a part of a wall surface material, and shifting the irradiation position of UV laser light successively. CONSTITUTION:A window of quartz glass 2 is provided on one surface of a chamber 1 formed of stainless steel. For example, the raw material gas consisting in diluting 4 torr dimethyl cadimum with He to atmospheric pressure is fed through a lead-in port 4 into the chamber. UV laser light 6 is irradiated to the glass plate 2 by the rotation of a mirror, and is focused to the inner side surface of the plate 2 through a lens 8 for UV, whereby Cd is deposited. Since the pattern of a photomask is formed directly, the number of steps is made less than of a conventional method of patterning a metallic plate after depositing the same. When irregularities are produced in the metallic layer, the thin parts permit good transmission of the laser light and increase the deposition of the metallic material, thereby correcting the irregularities in the thickness.
JP17040080A 1980-12-03 1980-12-03 Production of photomask plate Pending JPS5793346A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17040080A JPS5793346A (en) 1980-12-03 1980-12-03 Production of photomask plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17040080A JPS5793346A (en) 1980-12-03 1980-12-03 Production of photomask plate

Publications (1)

Publication Number Publication Date
JPS5793346A true JPS5793346A (en) 1982-06-10

Family

ID=15904218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17040080A Pending JPS5793346A (en) 1980-12-03 1980-12-03 Production of photomask plate

Country Status (1)

Country Link
JP (1) JPS5793346A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59105320A (en) * 1982-12-08 1984-06-18 Sanyo Electric Co Ltd Correcting method of photo-mask fault and defect
JPS60196942A (en) * 1984-03-21 1985-10-05 Hitachi Ltd Photomask defect correcting process
JPS60245135A (en) * 1984-05-18 1985-12-04 Matsushita Electric Ind Co Ltd Correcting method for photomask
JPS6114640A (en) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド Method and apparatus for correcting defect of photo mask
JPS6336249A (en) * 1986-07-31 1988-02-16 Nec Corp Photomask correcting system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59105320A (en) * 1982-12-08 1984-06-18 Sanyo Electric Co Ltd Correcting method of photo-mask fault and defect
JPS60196942A (en) * 1984-03-21 1985-10-05 Hitachi Ltd Photomask defect correcting process
JPS60245135A (en) * 1984-05-18 1985-12-04 Matsushita Electric Ind Co Ltd Correcting method for photomask
JPS6114640A (en) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド Method and apparatus for correcting defect of photo mask
JPS6336249A (en) * 1986-07-31 1988-02-16 Nec Corp Photomask correcting system

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