JPS5741637A - Microstep tablet - Google Patents

Microstep tablet

Info

Publication number
JPS5741637A
JPS5741637A JP11731280A JP11731280A JPS5741637A JP S5741637 A JPS5741637 A JP S5741637A JP 11731280 A JP11731280 A JP 11731280A JP 11731280 A JP11731280 A JP 11731280A JP S5741637 A JPS5741637 A JP S5741637A
Authority
JP
Japan
Prior art keywords
patterns
silicon
electron beams
resist
inorg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11731280A
Other languages
Japanese (ja)
Other versions
JPH0225500B2 (en
Inventor
Tatsuya Ikeuchi
Tomihiro Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP11731280A priority Critical patent/JPS5741637A/en
Publication of JPS5741637A publication Critical patent/JPS5741637A/en
Publication of JPH0225500B2 publication Critical patent/JPH0225500B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/02—Sensitometric processes, e.g. determining sensitivity, colour sensitivity, gradation, graininess, density; Making sensitometric wedges

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To simultaneously measure the resolution and photosensitive characteristics of a photosensitive material by using a silicon-base inorg. resist having sensitivity to electron beams. CONSTITUTION:On a transparent substrate 11 a film of a silicon-base inorg. resist contg. a mixture of silicon with silicon oxide is formed. This resist film is irradiated with electron beams through plural sets of patterns 12 by means of an electron beam irradiator while varying the quantity of irradiation every set. Each set of patterns 12 are composed of patterns having different widths and lengths. Next, the substrate is chemically etched to convert the parts irradiated with electron beams into patterns. As a result, each set of paterns remain as films having various thicknesses according to the quantity of irradiation.
JP11731280A 1980-08-26 1980-08-26 Microstep tablet Granted JPS5741637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11731280A JPS5741637A (en) 1980-08-26 1980-08-26 Microstep tablet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11731280A JPS5741637A (en) 1980-08-26 1980-08-26 Microstep tablet

Publications (2)

Publication Number Publication Date
JPS5741637A true JPS5741637A (en) 1982-03-08
JPH0225500B2 JPH0225500B2 (en) 1990-06-04

Family

ID=14708628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11731280A Granted JPS5741637A (en) 1980-08-26 1980-08-26 Microstep tablet

Country Status (1)

Country Link
JP (1) JPS5741637A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6366934A (en) * 1986-04-10 1988-03-25 Nec Corp Manufacture of semiconductor integrated circuit device using check pattern
JPH07122549A (en) * 1988-07-20 1995-05-12 Applied Materials Inc Method and apparatus for convergence of radiant energy beam as well as target for beam convergence

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0676068U (en) * 1993-03-31 1994-10-25 オグラ金属株式会社 Kerosene tank

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5365720A (en) * 1976-11-22 1978-06-12 Fuji Photo Film Co Ltd Step tablets
JPS5396674A (en) * 1977-02-03 1978-08-24 Mitsubishi Electric Corp Photo mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5365720A (en) * 1976-11-22 1978-06-12 Fuji Photo Film Co Ltd Step tablets
JPS5396674A (en) * 1977-02-03 1978-08-24 Mitsubishi Electric Corp Photo mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6366934A (en) * 1986-04-10 1988-03-25 Nec Corp Manufacture of semiconductor integrated circuit device using check pattern
JPH07122549A (en) * 1988-07-20 1995-05-12 Applied Materials Inc Method and apparatus for convergence of radiant energy beam as well as target for beam convergence

Also Published As

Publication number Publication date
JPH0225500B2 (en) 1990-06-04

Similar Documents

Publication Publication Date Title
ES461275A1 (en) Color display tube, method of manufacturing such a display tube having a shadow mask, and reproduction mask for use in such a method
JPS52143776A (en) Electron beam exposure apparatus
JPS5630129A (en) Manufacture of photomask
JPS5741637A (en) Microstep tablet
JPS57106128A (en) Forming method for pattern
JPS5381116A (en) Radiation sensitive polymer and its working method
JPS5772327A (en) Formation of resist pattern
JPS5621328A (en) Method of making pattern
JPS55165631A (en) Manufacture of semiconductor device
JPS5556629A (en) Pattern forming method
JPS5277671A (en) Method and equipment of masking
JPS5388728A (en) Method of forming pattern
JPS5339060A (en) Lot number marking method to wafers
JPS5619045A (en) Electron beam sensitive inorganic resist
JPS5596952A (en) Production of photomask
JPS5354974A (en) Electron beam exposure system
JPS5555528A (en) Mask aligner
JPS5656630A (en) Manufacture of semiconductor element
JPS53120276A (en) Electron beam exposure method
JPS5712522A (en) Forming method of pattern
JPS5745261A (en) Forming method for pattern
JPS5452473A (en) Forming method for coating for fine pattern
JPS5568626A (en) Pattern formation
JPS5635137A (en) Photomask
JPS57115832A (en) Resist pattern formation for fine processing