JPS5732653A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5732653A JPS5732653A JP10734380A JP10734380A JPS5732653A JP S5732653 A JPS5732653 A JP S5732653A JP 10734380 A JP10734380 A JP 10734380A JP 10734380 A JP10734380 A JP 10734380A JP S5732653 A JPS5732653 A JP S5732653A
- Authority
- JP
- Japan
- Prior art keywords
- photoresists
- layer
- contact hole
- shaped
- contracted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To facilitate positioning, and to improve the degree of integration by a method wherein a photoresist pattern used for forming a lower layer wiring layer is contracted, and insulating layer shaped on the pattern is removed and a contact hole is molded. CONSTITUTION:A metallic layer in Al, etc. formed on an Si substrate 1 through an SiO2 layer 16 is etched by employing the photoresists 13, 14' and the wiring layers 2, 3, 4 are shaped, the photoresists are developed additionally and the width is contracted, the whole surface is coated with the SiO2 film 18, the photoresists are removed, the SiO2 film on the photoresists is removed, the contact hole is shaped and an upper layer wiring layer is formed on the contact hole. Accordingly, the degree of integration is improved because the contact hole can easily be positioned and formed accurately.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10734380A JPS5732653A (en) | 1980-08-05 | 1980-08-05 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10734380A JPS5732653A (en) | 1980-08-05 | 1980-08-05 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5732653A true JPS5732653A (en) | 1982-02-22 |
Family
ID=14456639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10734380A Pending JPS5732653A (en) | 1980-08-05 | 1980-08-05 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5732653A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63234533A (en) * | 1987-03-24 | 1988-09-29 | Agency Of Ind Science & Technol | Formation of josephson junction element |
JPH01206046A (en) * | 1988-02-12 | 1989-08-18 | Dainippon Printing Co Ltd | Forming device for uneven pattern on platelike substrate |
-
1980
- 1980-08-05 JP JP10734380A patent/JPS5732653A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63234533A (en) * | 1987-03-24 | 1988-09-29 | Agency Of Ind Science & Technol | Formation of josephson junction element |
JPH01206046A (en) * | 1988-02-12 | 1989-08-18 | Dainippon Printing Co Ltd | Forming device for uneven pattern on platelike substrate |
JPH0515548B2 (en) * | 1988-02-12 | 1993-03-01 | Dainippon Printing Co Ltd |
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