JPS57200569A - Apparatus for treating surface with gas decomposed by light - Google Patents
Apparatus for treating surface with gas decomposed by lightInfo
- Publication number
- JPS57200569A JPS57200569A JP8658781A JP8658781A JPS57200569A JP S57200569 A JPS57200569 A JP S57200569A JP 8658781 A JP8658781 A JP 8658781A JP 8658781 A JP8658781 A JP 8658781A JP S57200569 A JPS57200569 A JP S57200569A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chamber
- pressure
- radicals
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To enable a surface treatment to be highly precisely worked without damaging the substrate surface, by decomposing an etching gas by a light, and jetting the resulting radicals onto the substrate in a sample chamber wherein a low pressure is kept.
CONSTITUTION: An etching gas is introduced from an introducing section 11 into a pre-chamber 12 where it is decomposed by a light beam 16 into radicals which are then introduced via a slit 13 into the treatment chamber 14. The pressure in the pre-chamber 12 is kept at about 2 Torr, whereas the pressure in the treatment chamber 14 is kept at about 6×10-4 Torr by an exhaustion system 15. In the treatment chamber 14, the substrate 18 is moved in a direction normal to the path of the radicals by a conveyor 17 with the distance between the slit 13 and the substrate 18 being about 20mm. As the pressure in the pre-chamber 12 is relatively high whereas the pressure in the treatment chamber 14 is low, the produced radicals are jetted through the slit 13 against the substrate 18 to etch the whole surface of the substrate 18 moved horizontally.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8658781A JPS57200569A (en) | 1981-06-05 | 1981-06-05 | Apparatus for treating surface with gas decomposed by light |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8658781A JPS57200569A (en) | 1981-06-05 | 1981-06-05 | Apparatus for treating surface with gas decomposed by light |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57200569A true JPS57200569A (en) | 1982-12-08 |
Family
ID=13891136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8658781A Pending JPS57200569A (en) | 1981-06-05 | 1981-06-05 | Apparatus for treating surface with gas decomposed by light |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57200569A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5819479A (en) * | 1981-07-29 | 1983-02-04 | Matsushita Electric Ind Co Ltd | Method and device for etching |
US5534107A (en) * | 1994-06-14 | 1996-07-09 | Fsi International | UV-enhanced dry stripping of silicon nitride films |
US5580421A (en) * | 1994-06-14 | 1996-12-03 | Fsi International | Apparatus for surface conditioning |
US5716495A (en) * | 1994-06-14 | 1998-02-10 | Fsi International | Cleaning method |
US6015503A (en) * | 1994-06-14 | 2000-01-18 | Fsi International, Inc. | Method and apparatus for surface conditioning |
US6124211A (en) * | 1994-06-14 | 2000-09-26 | Fsi International, Inc. | Cleaning method |
US6663792B2 (en) | 1997-10-21 | 2003-12-16 | Fsi International, Inc. | Equipment for UV wafer heating and photochemistry |
-
1981
- 1981-06-05 JP JP8658781A patent/JPS57200569A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5819479A (en) * | 1981-07-29 | 1983-02-04 | Matsushita Electric Ind Co Ltd | Method and device for etching |
US5534107A (en) * | 1994-06-14 | 1996-07-09 | Fsi International | UV-enhanced dry stripping of silicon nitride films |
US5580421A (en) * | 1994-06-14 | 1996-12-03 | Fsi International | Apparatus for surface conditioning |
US5716495A (en) * | 1994-06-14 | 1998-02-10 | Fsi International | Cleaning method |
US6015503A (en) * | 1994-06-14 | 2000-01-18 | Fsi International, Inc. | Method and apparatus for surface conditioning |
US6124211A (en) * | 1994-06-14 | 2000-09-26 | Fsi International, Inc. | Cleaning method |
US6663792B2 (en) | 1997-10-21 | 2003-12-16 | Fsi International, Inc. | Equipment for UV wafer heating and photochemistry |
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