JPS5546552A - Method of positioning electron beam - Google Patents

Method of positioning electron beam

Info

Publication number
JPS5546552A
JPS5546552A JP12017378A JP12017378A JPS5546552A JP S5546552 A JPS5546552 A JP S5546552A JP 12017378 A JP12017378 A JP 12017378A JP 12017378 A JP12017378 A JP 12017378A JP S5546552 A JPS5546552 A JP S5546552A
Authority
JP
Japan
Prior art keywords
positioning mark
projected
positioning
area
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12017378A
Other languages
Japanese (ja)
Inventor
Susumu Funayama
Tadashi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12017378A priority Critical patent/JPS5546552A/en
Publication of JPS5546552A publication Critical patent/JPS5546552A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To detect the location of a positioning mark from the amount of electrons induced per the occupying area of the positioning mark in an area where electron beam is projected. CONSTITUTION:Positioning mark 21 is formed in a square of one side W with V- shaped grooves formed in parallel with the respective sides. Rectangular beam 22 having smaller one side than W is so projected as to partially superimpose the mark 21 to thereby detect reflected electron signal. Then, the beam 22 is moved at predetermined distance D=W in parallel to thereby obtain the reflected electron signal. When the positioning mark areas in the area where electron beam is projected are different, there obtain different detected signal levels. In case that the size of the beam and the distance between projecting points A and B are set, the positions where the signal levels become equal and the central position of the positioning marks can be calculated. Thus, when at least four beams are projected along X and Ydirection, the potition of the positioning mark can be accurately calculated.
JP12017378A 1978-09-28 1978-09-28 Method of positioning electron beam Pending JPS5546552A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12017378A JPS5546552A (en) 1978-09-28 1978-09-28 Method of positioning electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12017378A JPS5546552A (en) 1978-09-28 1978-09-28 Method of positioning electron beam

Publications (1)

Publication Number Publication Date
JPS5546552A true JPS5546552A (en) 1980-04-01

Family

ID=14779722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12017378A Pending JPS5546552A (en) 1978-09-28 1978-09-28 Method of positioning electron beam

Country Status (1)

Country Link
JP (1) JPS5546552A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5784021U (en) * 1980-11-11 1982-05-24
JPS5785232A (en) * 1980-11-17 1982-05-27 Fujitsu Ltd Positional matching
JPS57119672U (en) * 1981-01-21 1982-07-24
JPS5885532A (en) * 1981-11-02 1983-05-21 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Method of positioning via electron beam
JPS6010725A (en) * 1983-06-30 1985-01-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション System for arraying scanning beam in pattern

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5784021U (en) * 1980-11-11 1982-05-24
JPH0237044Y2 (en) * 1980-11-11 1990-10-08
JPS5785232A (en) * 1980-11-17 1982-05-27 Fujitsu Ltd Positional matching
JPS57119672U (en) * 1981-01-21 1982-07-24
JPS5885532A (en) * 1981-11-02 1983-05-21 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Method of positioning via electron beam
JPS6010725A (en) * 1983-06-30 1985-01-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション System for arraying scanning beam in pattern

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