JPS5545748A - Photosensitive polymer and its production - Google Patents

Photosensitive polymer and its production

Info

Publication number
JPS5545748A
JPS5545748A JP11921978A JP11921978A JPS5545748A JP S5545748 A JPS5545748 A JP S5545748A JP 11921978 A JP11921978 A JP 11921978A JP 11921978 A JP11921978 A JP 11921978A JP S5545748 A JPS5545748 A JP S5545748A
Authority
JP
Japan
Prior art keywords
photosensitive polymer
group
conh
coo
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11921978A
Other languages
Japanese (ja)
Other versions
JPS6234052B2 (en
Inventor
Fusaji Shoji
Kazunari Takemoto
Ataru Yokono
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11921978A priority Critical patent/JPS5545748A/en
Priority to DE7979901257T priority patent/DE2967162D1/en
Priority to PCT/JP1979/000246 priority patent/WO1980000706A1/en
Publication of JPS5545748A publication Critical patent/JPS5545748A/en
Priority to EP79901257A priority patent/EP0020773B1/en
Priority to US06/198,952 priority patent/US4321319A/en
Publication of JPS6234052B2 publication Critical patent/JPS6234052B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polyamides (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

NEW MATERIAL:Polymers of formula I (Ar is aromatic residue; R is photosensitive group; R6 is group of 4 or more carbon atoms; Y is CONH, COO; m is 1, 2; n is integral number).
USE: Photosensitive polymer, which is stable even when a sesitizer is added and relatively stable when stored at room temperature under light shielding. The adjustment of the stability is done by adding a stabilizer.
PREPARATION: The reaction between a diamine of formula II (Ar is aromatic residue; Y is CONH, COO; R is photosensitive group; m is 1, 2) and a tetracarboxylic dianhydride is conducted in an anhydrous organic polar solvent.
COPYRIGHT: (C)1980,JPO&Japio
JP11921978A 1978-09-29 1978-09-29 Photosensitive polymer and its production Granted JPS5545748A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP11921978A JPS5545748A (en) 1978-09-29 1978-09-29 Photosensitive polymer and its production
DE7979901257T DE2967162D1 (en) 1978-09-29 1979-09-26 Light-sensitive polymer composition
PCT/JP1979/000246 WO1980000706A1 (en) 1978-09-29 1979-09-26 Light-sensitive polymer composition
EP79901257A EP0020773B1 (en) 1978-09-29 1980-04-22 Light-sensitive polymer composition
US06/198,952 US4321319A (en) 1978-09-29 1980-05-22 Photosensitive compositions containing polyamides acid with photosensitive groups

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11921978A JPS5545748A (en) 1978-09-29 1978-09-29 Photosensitive polymer and its production

Publications (2)

Publication Number Publication Date
JPS5545748A true JPS5545748A (en) 1980-03-31
JPS6234052B2 JPS6234052B2 (en) 1987-07-24

Family

ID=14755896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11921978A Granted JPS5545748A (en) 1978-09-29 1978-09-29 Photosensitive polymer and its production

Country Status (1)

Country Link
JP (1) JPS5545748A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776017A (en) * 1980-09-03 1982-05-12 Du Pont Polymeric heat resistance photopolymerizing composition
US4507132A (en) * 1983-08-12 1985-03-26 Aisan Industry Co., Ltd. Fuel evaporation preventing device
JPS6173740A (en) * 1984-09-20 1986-04-15 Asahi Chem Ind Co Ltd Photosensitive composition
JPS61118423A (en) * 1984-11-14 1986-06-05 Asahi Chem Ind Co Ltd Photo-sensitive composition
JPS61254605A (en) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd Photosensitive composition
US4655189A (en) * 1984-03-31 1987-04-07 Toyota Jidosha Kabushiki Kaisha Device for processing fuel vapor
US4658796A (en) * 1983-03-09 1987-04-21 Aisan Industry Co., Ltd. System for preventing loss of fuel due to evaporation
JPS62127840A (en) * 1985-11-29 1987-06-10 Asahi Chem Ind Co Ltd Photosensitive composition
JPS6461746A (en) * 1987-09-02 1989-03-08 Hitachi Ltd Heat-resisting photosensitive polymer composition
JP4786104B2 (en) * 2000-01-24 2011-10-05 ロリク アーゲー Photoactive polyimide, polyamic acid or ester having a photocrosslinkable group in the side chain

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49115541A (en) * 1973-02-22 1974-11-05
JPS5140920A (en) * 1974-08-02 1976-04-06 Siemens Ag

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49115541A (en) * 1973-02-22 1974-11-05
JPS5140920A (en) * 1974-08-02 1976-04-06 Siemens Ag

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776017A (en) * 1980-09-03 1982-05-12 Du Pont Polymeric heat resistance photopolymerizing composition
JPH0233723B2 (en) * 1980-09-03 1990-07-30 Ii Ai Deyuhon De Nimoasu Ando Co
US4658796A (en) * 1983-03-09 1987-04-21 Aisan Industry Co., Ltd. System for preventing loss of fuel due to evaporation
US4507132A (en) * 1983-08-12 1985-03-26 Aisan Industry Co., Ltd. Fuel evaporation preventing device
US4655189A (en) * 1984-03-31 1987-04-07 Toyota Jidosha Kabushiki Kaisha Device for processing fuel vapor
JPS6173740A (en) * 1984-09-20 1986-04-15 Asahi Chem Ind Co Ltd Photosensitive composition
JPS61118423A (en) * 1984-11-14 1986-06-05 Asahi Chem Ind Co Ltd Photo-sensitive composition
JPS61254605A (en) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd Photosensitive composition
JPS62127840A (en) * 1985-11-29 1987-06-10 Asahi Chem Ind Co Ltd Photosensitive composition
JPS6461746A (en) * 1987-09-02 1989-03-08 Hitachi Ltd Heat-resisting photosensitive polymer composition
JP4786104B2 (en) * 2000-01-24 2011-10-05 ロリク アーゲー Photoactive polyimide, polyamic acid or ester having a photocrosslinkable group in the side chain

Also Published As

Publication number Publication date
JPS6234052B2 (en) 1987-07-24

Similar Documents

Publication Publication Date Title
JPS5545748A (en) Photosensitive polymer and its production
JPS57131227A (en) Photopolymer and its production
JPS57143329A (en) Photosensitive resin and its production
JPS5545747A (en) Photosensitive polymer and its production
JPS5645915A (en) Photosensitive polymer composition
JPS5624343A (en) Photosensitive heat resistant polymer composition
JPS5687046A (en) Sensitizer for organic photosensitive material
JPS5662821A (en) Production of condensate
JPS5632146A (en) Electrophotographic receptor
JPS5650934A (en) Heat-resistant prepreg
AU519287B2 (en) Imidazo(1,2-alpha) imidazole derivatives
JPS5424861A (en) Novel 1,2,3,4-tetrahydro-naphthalene derivatives
JPS5657826A (en) Polyether sulfone containing azido group and its preparation
JPS52125599A (en) Preparation of aromatic polyimide resins
ES469631A1 (en) Pyrole derivative process for preparing same and composition containing same
JPS55144027A (en) Production of polyamidic acid and polyimide copolymer
JPS552651A (en) Heterocyclic benzamide compound and its preparation
JPS52108495A (en) Preparation of polyimide resins
JPS5621131A (en) Sensitizer for organic photosensitive material
JPS55144050A (en) Aromatic polyamide film and production thereof
JPS5382898A (en) Solution forming heat resistant polymer
JPS5419948A (en) Chalcone compounds
JPS54106481A (en) Novel 2,3-dioxopiperazine derivative and its preparation
JPS53125457A (en) Flame-retardant styrene resin composition
JPS5436264A (en) Aromatic diamine