JPS5545747A - Photosensitive polymer and its production - Google Patents

Photosensitive polymer and its production

Info

Publication number
JPS5545747A
JPS5545747A JP11921878A JP11921878A JPS5545747A JP S5545747 A JPS5545747 A JP S5545747A JP 11921878 A JP11921878 A JP 11921878A JP 11921878 A JP11921878 A JP 11921878A JP S5545747 A JPS5545747 A JP S5545747A
Authority
JP
Japan
Prior art keywords
photosensitive
group
diamine
formula
aromatic residue
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11921878A
Other languages
Japanese (ja)
Other versions
JPS6345412B2 (en
Inventor
Fusaji Shoji
Kazunari Takemoto
Ataru Yokono
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11921878A priority Critical patent/JPS5545747A/en
Priority to DE7979901257T priority patent/DE2967162D1/en
Priority to PCT/JP1979/000246 priority patent/WO1980000706A1/en
Publication of JPS5545747A publication Critical patent/JPS5545747A/en
Priority to EP79901257A priority patent/EP0020773B1/en
Priority to US06/198,952 priority patent/US4321319A/en
Publication of JPS6345412B2 publication Critical patent/JPS6345412B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyamides (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

NEW MATERIAL:Polymers of formula I (Ar is aromatic residue; Y is COO, CONH; R is photosensitive group; R4 is tetrafunctional group of 4 or more carbon atoms; R2 is difunctional aliphatic hydrocarbyl group, aromatic residue; m is 1, 2; n is integral number).
USE: Photosensitive polymer, which is stable even when a sensitizer is added, relatively stable when stored under light shielding at room temperature. The adjustment of the stability is done by adding a stabilizer.
PREPARATION: The reaction between a mixture consisting of 95W5% of a diamine having photosensitive groups of formula II and 5W95% of diamine with no photosensitive groups and a tetracarboxylic acid dianhydride is effected in an anhydrous organic polar solvent.
COPYRIGHT: (C)1980,JPO&Japio
JP11921878A 1978-09-29 1978-09-29 Photosensitive polymer and its production Granted JPS5545747A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP11921878A JPS5545747A (en) 1978-09-29 1978-09-29 Photosensitive polymer and its production
DE7979901257T DE2967162D1 (en) 1978-09-29 1979-09-26 Light-sensitive polymer composition
PCT/JP1979/000246 WO1980000706A1 (en) 1978-09-29 1979-09-26 Light-sensitive polymer composition
EP79901257A EP0020773B1 (en) 1978-09-29 1980-04-22 Light-sensitive polymer composition
US06/198,952 US4321319A (en) 1978-09-29 1980-05-22 Photosensitive compositions containing polyamides acid with photosensitive groups

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11921878A JPS5545747A (en) 1978-09-29 1978-09-29 Photosensitive polymer and its production

Publications (2)

Publication Number Publication Date
JPS5545747A true JPS5545747A (en) 1980-03-31
JPS6345412B2 JPS6345412B2 (en) 1988-09-09

Family

ID=14755871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11921878A Granted JPS5545747A (en) 1978-09-29 1978-09-29 Photosensitive polymer and its production

Country Status (1)

Country Link
JP (1) JPS5545747A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59220730A (en) * 1983-05-30 1984-12-12 Ube Ind Ltd Photosensitive polyimide soluble in organic solvent
JPS59220729A (en) * 1983-05-30 1984-12-12 Ube Ind Ltd Photosensitive polyimide soluble in organic solvent
JPS6159334A (en) * 1984-08-30 1986-03-26 Ube Ind Ltd Photosensitive polyimide composition soluble to organic solvent
JP2008203641A (en) * 2007-02-21 2008-09-04 Jsr Corp Method for manufacturing diamine compound with cinnamoyl group

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49115541A (en) * 1973-02-22 1974-11-05
JPS5140920A (en) * 1974-08-02 1976-04-06 Siemens Ag

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49115541A (en) * 1973-02-22 1974-11-05
JPS5140920A (en) * 1974-08-02 1976-04-06 Siemens Ag

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59220730A (en) * 1983-05-30 1984-12-12 Ube Ind Ltd Photosensitive polyimide soluble in organic solvent
JPS59220729A (en) * 1983-05-30 1984-12-12 Ube Ind Ltd Photosensitive polyimide soluble in organic solvent
JPH0526187B2 (en) * 1983-05-30 1993-04-15 Ube Industries
JPH0526186B2 (en) * 1983-05-30 1993-04-15 Ube Industries
JPS6159334A (en) * 1984-08-30 1986-03-26 Ube Ind Ltd Photosensitive polyimide composition soluble to organic solvent
JPH0531132B2 (en) * 1984-08-30 1993-05-11 Ube Industries
JP2008203641A (en) * 2007-02-21 2008-09-04 Jsr Corp Method for manufacturing diamine compound with cinnamoyl group
JP4544432B2 (en) * 2007-02-21 2010-09-15 Ｊｓｒ株式会社 Method for producing diamine compound having cinnamoyl group

Also Published As

Publication number Publication date
JPS6345412B2 (en) 1988-09-09

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