JPS5539692A - Scanning method of electron beam - Google Patents
Scanning method of electron beamInfo
- Publication number
- JPS5539692A JPS5539692A JP11426778A JP11426778A JPS5539692A JP S5539692 A JPS5539692 A JP S5539692A JP 11426778 A JP11426778 A JP 11426778A JP 11426778 A JP11426778 A JP 11426778A JP S5539692 A JPS5539692 A JP S5539692A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electron beam
- starting point
- scanning starting
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To scan with an electron beam a limited section of a substrate for use in producing a super-LSI, by staggering a scanning starting point backwardly with respect to the scanning direction by a distance corresponding to the time by which the supply of an electric current is delayed, or without irradiating an electron beam initially up to a proper scanning starting point, whereby a uniformly exposed substrate can be obtained.
CONSTITUTION: An Si substrate having an oxide film thereon is coated with a resist, and this limited section is scanned with an electron beam. At this time, a scanning starting point is staggered backwardly with respect to the scanning direction by a distance a corresponding to the time by which the supply of an electric current is delayed so that an electron beam is not irradiated initially up to a proper scanning starting point. This prevents that portion of the substrate which is close to the scanning starting point from being swollen owing to no over-exposure at the mentioned portion of the substrate. Namely, the substrate is uniformly exposed so that it has no over-exposed portions.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11426778A JPS5539692A (en) | 1978-09-14 | 1978-09-14 | Scanning method of electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11426778A JPS5539692A (en) | 1978-09-14 | 1978-09-14 | Scanning method of electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5539692A true JPS5539692A (en) | 1980-03-19 |
Family
ID=14633517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11426778A Pending JPS5539692A (en) | 1978-09-14 | 1978-09-14 | Scanning method of electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5539692A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5753938A (en) * | 1980-09-17 | 1982-03-31 | Toshiba Corp | Electron beam exposure apparatus |
JPS57161900U (en) * | 1981-04-03 | 1982-10-12 | ||
JP2002110514A (en) * | 2000-09-28 | 2002-04-12 | Advantest Corp | Electron beam aligner, exposure method and semiconductor device manufacturing method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52113683A (en) * | 1976-03-19 | 1977-09-22 | Nec Corp | Electron beam stabilizing time control circuit |
JPS5324790A (en) * | 1976-08-20 | 1978-03-07 | Hitachi Ltd | Semiconductor device |
JPS53125697A (en) * | 1977-04-11 | 1978-11-02 | Nippon Electron Optics Lab | Electron ray exposing method |
-
1978
- 1978-09-14 JP JP11426778A patent/JPS5539692A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52113683A (en) * | 1976-03-19 | 1977-09-22 | Nec Corp | Electron beam stabilizing time control circuit |
JPS5324790A (en) * | 1976-08-20 | 1978-03-07 | Hitachi Ltd | Semiconductor device |
JPS53125697A (en) * | 1977-04-11 | 1978-11-02 | Nippon Electron Optics Lab | Electron ray exposing method |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5753938A (en) * | 1980-09-17 | 1982-03-31 | Toshiba Corp | Electron beam exposure apparatus |
JPS631743B2 (en) * | 1980-09-17 | 1988-01-13 | Tokyo Shibaura Electric Co | |
JPS57161900U (en) * | 1981-04-03 | 1982-10-12 | ||
JP2002110514A (en) * | 2000-09-28 | 2002-04-12 | Advantest Corp | Electron beam aligner, exposure method and semiconductor device manufacturing method |
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