JPS55125631A - Coating of photoresist - Google Patents

Coating of photoresist

Info

Publication number
JPS55125631A
JPS55125631A JP3395179A JP3395179A JPS55125631A JP S55125631 A JPS55125631 A JP S55125631A JP 3395179 A JP3395179 A JP 3395179A JP 3395179 A JP3395179 A JP 3395179A JP S55125631 A JPS55125631 A JP S55125631A
Authority
JP
Japan
Prior art keywords
film
group
photoresist
aid
coupling agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3395179A
Other languages
Japanese (ja)
Inventor
Akira Amano
Takayuki Konuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP3395179A priority Critical patent/JPS55125631A/en
Publication of JPS55125631A publication Critical patent/JPS55125631A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces

Abstract

PURPOSE:To apply an even photoresist film on a film having a stepped portion by ingeniously utilizing characteristics of a silane coupling agent. CONSTITUTION:A silane coupling agent combines with an inorganic material with an aid of a reactive group such as methoxy group and silanol group in the silane structure and with an organic polymer with an aid of a functional group such as vinyl group, amino group and epoxy group. Thus, it plays on intermediary role between the inorganic and organic materials. For example, a coat film 8 of gamma- glycidoxypropyltrimethoxysilane adequetely adheres to the insulator film 4 such as SiO2, a metal film 5 and an Si surface thereby preventing the tearing of the film even with a stepped portion 6 exceeding 1mum. The coating of this film with a photoresist assures even thickness of the film with a better adhesivity between the film 7 and the film 8 thereby forming a fine pattern.
JP3395179A 1979-03-23 1979-03-23 Coating of photoresist Pending JPS55125631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3395179A JPS55125631A (en) 1979-03-23 1979-03-23 Coating of photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3395179A JPS55125631A (en) 1979-03-23 1979-03-23 Coating of photoresist

Publications (1)

Publication Number Publication Date
JPS55125631A true JPS55125631A (en) 1980-09-27

Family

ID=12400801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3395179A Pending JPS55125631A (en) 1979-03-23 1979-03-23 Coating of photoresist

Country Status (1)

Country Link
JP (1) JPS55125631A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6125141A (en) * 1984-07-16 1986-02-04 Tokyo Denshi Kagaku Kabushiki Mask forming material
US5081005A (en) * 1989-03-24 1992-01-14 The Boeing Company Method for reducing chemical interaction between copper features and photosensitive dielectric compositions
WO2016006190A1 (en) * 2014-07-08 2016-01-14 Canon Kabushiki Kaisha Adhesion layer composition, method for forming film by nanoimprinting, methods for manufacturing optical component, circuit board and electronic apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6125141A (en) * 1984-07-16 1986-02-04 Tokyo Denshi Kagaku Kabushiki Mask forming material
US5081005A (en) * 1989-03-24 1992-01-14 The Boeing Company Method for reducing chemical interaction between copper features and photosensitive dielectric compositions
WO2016006190A1 (en) * 2014-07-08 2016-01-14 Canon Kabushiki Kaisha Adhesion layer composition, method for forming film by nanoimprinting, methods for manufacturing optical component, circuit board and electronic apparatus
US10073341B2 (en) 2014-07-08 2018-09-11 Canon Kabushiki Kaisha Adhesion layer composition, method for forming film by nanoimprinting, methods for manufacturing optical component, circuit board and electronic apparatus

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