JPH11342484A - Device and method for detecting reflection light from processing face in laser processing - Google Patents

Device and method for detecting reflection light from processing face in laser processing

Info

Publication number
JPH11342484A
JPH11342484A JP10148917A JP14891798A JPH11342484A JP H11342484 A JPH11342484 A JP H11342484A JP 10148917 A JP10148917 A JP 10148917A JP 14891798 A JP14891798 A JP 14891798A JP H11342484 A JPH11342484 A JP H11342484A
Authority
JP
Japan
Prior art keywords
workpiece
laser
light
processing
laser processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10148917A
Other languages
Japanese (ja)
Inventor
Kazuhiro Hirata
一弘 平田
Kazumasa Shudo
和正 首藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP10148917A priority Critical patent/JPH11342484A/en
Publication of JPH11342484A publication Critical patent/JPH11342484A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a reflection light detecting device for automatically detecting the completion of piercing with a laser light. SOLUTION: A detector 12 is provided to directly detect a reflection light from a workpiece 11 held by a laser processing device. It is detected that a hole is formed on an insulation layer from the difference of the reflectance of a insulation layer 13 and that of a conductive layer 14. Since an optical system does not exist between the workpiece and the detector, the light other than the reflection light is not erroneously detected.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、レーザ加工におけ
る加工面の反射光検出装置及び方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and a method for detecting reflected light from a processing surface in laser processing.

【0002】[0002]

【従来の技術】高密度多層プリント基板の製造において
は、積層された配線パターンの層間接続を行うため、配
線パターン間に配された絶縁樹脂に、インナーバイアや
ブラインドバイアといった穴(ビア(バイア)ホール)
を形成する必要がある。
2. Description of the Related Art In the manufacture of high-density multilayer printed circuit boards, holes (vias) such as inner vias and blind vias are formed in insulating resin disposed between wiring patterns in order to make interlayer connections between laminated wiring patterns. hole)
Need to be formed.

【0003】ビアホールの形成は、以前は機械式ドリル
や露光方式(ホトリソグラフィ技術)によって行われて
いたが、最近では、さらなる高密度化の要求に答えるた
め、より小径のビアホール形成が可能な、レーザ光を用
いる技術が利用されるようになって来ている。
[0003] In the past, via holes were formed by a mechanical drill or an exposure method (photolithography technology), but recently, in order to meet the demand for higher density, a via hole having a smaller diameter can be formed. Techniques using laser light have been used.

【0004】レーザを用いた穴あけ加工では、レーザ発
振器からのレーザ光を、光学系を介して加工台上の被加
工物(多層プリント基板)に照射して、被加工物の一部
を蒸発させる(レーザアブレーション)。つまり、被加
工物にパルス状のレーザ光を数回照射することにより、
被加工物には、所定深さの穴が形成される。通常、穴の
形成は、絶縁樹脂中に埋め込まれた銅ランド(導電層)
の一部を露出させるため行う。
In drilling using a laser, a workpiece (multilayer printed circuit board) on a processing table is irradiated with a laser beam from a laser oscillator via an optical system to partially evaporate the workpiece. (Laser ablation). In other words, by irradiating the workpiece with pulsed laser light several times,
A hole having a predetermined depth is formed in the workpiece. Usually, the hole is formed by a copper land (conductive layer) embedded in the insulating resin.
This is done to expose a part of.

【0005】[0005]

【発明が解決しようとする課題】従来のレーザ穴あけ加
工装置では、レーザ光は、光学系によって適宜集光され
ており、その集光率によって単位面積当たりの光強度
(パワー)が異なる。また、被加工物に照射されるレー
ザ光の径によっても、形成される穴の深さに差が生じ
る。更に、被加工物の材質によっても、1ショットのレ
ーザ光により形成される穴の深さが異なる。そこで、被
加工物に照射するレーザ光のショット数は、被加工物の
材質、形成しようとする穴の径及び深さ等に基づいて決
定される。例えば、レーザ光の径を100μm程度とし
た場合、被加工物である絶縁樹脂に照射すると、一ショ
ット当たり、深さ20〜30μmの穴を形成することが
できるとする。この場合、厚み60〜100μmの絶縁
樹脂に、下層の配線パターンに到達する穴を形成するに
は、2〜5ショット程度のレーザ光照射が必要になる。
In a conventional laser drilling apparatus, laser light is appropriately focused by an optical system, and the light intensity (power) per unit area varies depending on the light focusing rate. Further, the depth of the hole to be formed also varies depending on the diameter of the laser beam applied to the workpiece. Further, the depth of the hole formed by one shot of laser light also differs depending on the material of the workpiece. Therefore, the number of shots of the laser beam applied to the workpiece is determined based on the material of the workpiece, the diameter and depth of the hole to be formed, and the like. For example, when the diameter of a laser beam is about 100 μm, it is assumed that a hole having a depth of 20 to 30 μm can be formed per shot by irradiating an insulating resin which is a workpiece. In this case, laser light irradiation of about 2 to 5 shots is required to form a hole reaching the lower wiring pattern in the insulating resin having a thickness of 60 to 100 μm.

【0006】このように、従来のレーザ穴あけ加工装置
では、予め、被加工物と同一素材の試料に対してレーザ
光照射を行い、1ショット当たりの加工深さを測定し、
被加工物の加工に要するレーザ光の照射ショット数を計
算する。そして、その計算結果に基づいて被加工物に対
する加工を行っている。
As described above, in the conventional laser drilling apparatus, a sample of the same material as the workpiece is irradiated with laser light in advance, and the processing depth per shot is measured.
The number of laser light irradiation shots required for processing the workpiece is calculated. Then, the workpiece is processed based on the calculation result.

【0007】しかしながら、この方法では、何らかの原
因によりレーザ発振器が不安定になり、レーザ光の光強
度に変動が生じたり、あるいはレーザ発振しなかったり
した場合(ミスショット)や、絶縁層の厚みが均一でな
い場合には、予め設定されたショット数では、下層の導
電層が露出しないという問題点がある。
However, according to this method, the laser oscillator becomes unstable for some reason, the light intensity of the laser beam fluctuates, or the laser does not oscillate (misshot), or the thickness of the insulating layer is increased. If the number of shots is not uniform, there is a problem that the lower conductive layer is not exposed with a predetermined number of shots.

【0008】本発明は、下層の導電層が穴内に露出した
ことを検出することによって、穴あけ加工が完了したこ
とを自動検出する反射光検出装置を提供することを目的
とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a reflected light detecting device which automatically detects that drilling has been completed by detecting that a lower conductive layer is exposed in a hole.

【0009】[0009]

【課題を解決するための手段】本発明によれば、レーザ
光を被加工物に照射して、該被加工物に穴を空けるレー
ザ加工の際に使用され、前記被加工物によって反射され
る前記レーザ光を直接検出する光検出器を有することを
特徴とするレーザ加工における加工面の反射光検出装置
が得られる。
According to the present invention, a laser beam is applied to a workpiece to be used in laser processing for making a hole in the workpiece, and is reflected by the workpiece. An apparatus for detecting reflected light of a processed surface in laser processing, comprising a photodetector for directly detecting the laser light, is obtained.

【0010】また、本発明によれば、レーザ光を被加工
物に照射して、該被加工物に穴を空けるレーザ加工の際
に、前記被加工物によって反射される前記レーザ光を検
出するレーザ加工における加工面の反射光検出方法にお
いて、前記被加工物からの反射光を直接光検出器で検出
するようにしたことを特徴とするレーザ加工における加
工面の反射光検出方法が得られる。
According to the present invention, a laser beam is irradiated on a workpiece to detect a laser beam reflected by the workpiece during laser processing for making a hole in the workpiece. In the method of detecting reflected light of a processing surface in laser processing, a method of detecting reflected light of a processed surface in laser processing, wherein reflected light from the workpiece is directly detected by a photodetector, is obtained.

【0011】[0011]

【発明の実施の形態】以下、図面を参照して、本発明の
実施の形態について説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0012】図1(a)及び(b)に本発明の一実施の
形態を示す。この反射光検出装置は、レーザ加工装置
(図示せず)とともに使用され、レーザ加工装置に保持
される被加工物11における加工点からの反射光(散乱
光)を検出するディテクタ12を有している。被加工物
11とディテクタ12との間には、光学系は全く配置さ
れておらず、被加工物11からの反射光が直接ディテク
タ12に入射するようにしてある。このように、被加工
物からの反射光が直接ディテクタ12に入射するように
したことにより、反射光以外の光を検出してしまう可能
性を無くすことができる。つまり、誤検出を防ぐことが
できる。
FIGS. 1A and 1B show an embodiment of the present invention. This reflected light detection device is used together with a laser processing device (not shown), and has a detector 12 that detects reflected light (scattered light) from a processing point on a workpiece 11 held by the laser processing device. I have. No optical system is arranged between the workpiece 11 and the detector 12, and the reflected light from the workpiece 11 is directly incident on the detector 12. As described above, by making the reflected light from the workpiece directly enter the detector 12, the possibility of detecting light other than the reflected light can be eliminated. That is, erroneous detection can be prevented.

【0013】レーザ加工装置のレーザ発振器から出射し
たレーザ光は、その光学系を通して被加工物11に照射
される。被加工物11は、絶縁層13の下に導電層を有
している。そして、レーザの照射により、絶縁層13で
は、アブレーションが発生し、図1(a)から(b)へ
と穴が形成されていく。このとき、被加工物に照射され
たレーザ光は、被加工物11の表面で反射される。ディ
テクタ12は、その被加工物の表面で反射されたレーザ
光を検出する。
The laser beam emitted from the laser oscillator of the laser processing apparatus is irradiated on the workpiece 11 through the optical system. The workpiece 11 has a conductive layer below the insulating layer 13. Then, by laser irradiation, ablation occurs in the insulating layer 13 and holes are formed from FIG. 1A to FIG. 1B. At this time, the laser beam applied to the workpiece is reflected on the surface of the workpiece 11. The detector 12 detects the laser light reflected on the surface of the workpiece.

【0014】絶縁層13は、レーザ光に対する反射率が
低い(吸収率が高い)。これに対して導電層14は、レ
ーザ光に対する反射率が高い。従って、この違いを、デ
ィテクタ12によって検出することにより、レーザ光に
よる穴あけ加工の完了を検出することができる。つま
り、図1(b)に示すように、絶縁層13が部分的に完
全に除去され(穴が形成され)、下層の導電層14が露
出した場合には、反射光の光強度は急激に増大する。こ
れをディテクタで検出することにより、レーザ加工の完
了を判断することができる。
The insulating layer 13 has a low reflectance (high absorptance) with respect to laser light. On the other hand, the conductive layer 14 has a high reflectance to laser light. Therefore, by detecting this difference by the detector 12, it is possible to detect the completion of the drilling by the laser beam. That is, as shown in FIG. 1B, when the insulating layer 13 is partially completely removed (a hole is formed) and the underlying conductive layer 14 is exposed, the light intensity of the reflected light sharply increases. Increase. By detecting this with the detector, the completion of the laser processing can be determined.

【0015】なお、ディテクタ12は、検出した光の強
さを示す信号を出力するものであっても良いし、所定の
レベル以上の光を検出した場合にのみ出力信号を出力す
るものであっても良い。いずれにしても、ディテクタ1
2の出力は、レーザ加工装置の制御装置へ入力され、レ
ーザ発振器の制御に利用される。
The detector 12 may output a signal indicating the intensity of the detected light, or may output an output signal only when light having a predetermined level or more is detected. Is also good. In any case, detector 1
The output of 2 is input to the control device of the laser processing device and used for controlling the laser oscillator.

【0016】以上のようにして、本実施の形態による反
射光検出装置では、レーザ加工による穴形成の完了を検
出することができる。
As described above, the reflected light detecting device according to the present embodiment can detect completion of hole formation by laser processing.

【0017】なお、上記実施の形態では、導電層上に形
成された絶縁層に穴を形成する場合について説明した
が、同様にして、絶縁層にスルーホールを形成する場合
等にも使用できる。
In the above embodiment, the case where holes are formed in the insulating layer formed on the conductive layer has been described. However, the present invention can also be used in the case where through holes are formed in the insulating layer.

【0018】[0018]

【発明の効果】本発明によれば、レーザ加工装置により
加工される被加工物の表面からの反射光を直接検出する
ディテクタを用いることにより、誤検出が無く、精度よ
くレーザ加工の終了を検出できる反射光検出装置を得る
ことができる。
According to the present invention, the end of laser processing can be accurately detected without erroneous detection by using a detector that directly detects reflected light from the surface of a workpiece processed by a laser processing apparatus. A reflected light detection device that can be obtained can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)及び(b)は、本発明の一実施の形態を
示す図である。
FIGS. 1A and 1B are diagrams showing an embodiment of the present invention. FIG.

【符号の説明】[Explanation of symbols]

11 被加工物 12 ディテクタ 13 絶縁層 14 導電層 DESCRIPTION OF SYMBOLS 11 Workpiece 12 Detector 13 Insulating layer 14 Conductive layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 レーザ光を被加工物に照射して、該被加
工物に穴を空けるレーザ加工の際に使用され、前記被加
工物によって反射される前記レーザ光を直接検出する光
検出器を有することを特徴とするレーザ加工における加
工面の反射光検出装置。
1. A photodetector for irradiating a laser beam to a workpiece to make a hole in the workpiece and directly detecting the laser beam reflected by the workpiece. A reflected light detection device for a processed surface in laser processing, comprising:
【請求項2】 レーザ光を被加工物に照射して、該被加
工物に穴を空けるレーザ加工の際に、前記被加工物によ
って反射される前記レーザ光を検出するレーザ加工にお
ける加工面の反射光検出方法において、前記被加工物か
らの反射光を直接光検出器で検出するようにしたことを
特徴とするレーザ加工における加工面の反射光検出方
法。
2. A laser processing method comprising: irradiating a laser beam on a workpiece to form a hole in the workpiece; and detecting a laser beam reflected by the workpiece during laser processing. In the reflected light detection method, the reflected light from the workpiece is directly detected by a photodetector, and the reflected light is detected on a processed surface in laser processing.
JP10148917A 1998-05-29 1998-05-29 Device and method for detecting reflection light from processing face in laser processing Pending JPH11342484A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10148917A JPH11342484A (en) 1998-05-29 1998-05-29 Device and method for detecting reflection light from processing face in laser processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10148917A JPH11342484A (en) 1998-05-29 1998-05-29 Device and method for detecting reflection light from processing face in laser processing

Publications (1)

Publication Number Publication Date
JPH11342484A true JPH11342484A (en) 1999-12-14

Family

ID=15463557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10148917A Pending JPH11342484A (en) 1998-05-29 1998-05-29 Device and method for detecting reflection light from processing face in laser processing

Country Status (1)

Country Link
JP (1) JPH11342484A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003340585A (en) * 2002-05-27 2003-12-02 Matsushita Electric Works Ltd Method for monitoring laser welding
WO2022146580A1 (en) * 2020-12-30 2022-07-07 Electro Scientific Industries, Inc. Laser processing apparatus, methods of operating the same, and methods of processing workpieces using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003340585A (en) * 2002-05-27 2003-12-02 Matsushita Electric Works Ltd Method for monitoring laser welding
WO2022146580A1 (en) * 2020-12-30 2022-07-07 Electro Scientific Industries, Inc. Laser processing apparatus, methods of operating the same, and methods of processing workpieces using the same

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