JP2002271039A - Multilayer board and its machining method - Google Patents

Multilayer board and its machining method

Info

Publication number
JP2002271039A
JP2002271039A JP2001070442A JP2001070442A JP2002271039A JP 2002271039 A JP2002271039 A JP 2002271039A JP 2001070442 A JP2001070442 A JP 2001070442A JP 2001070442 A JP2001070442 A JP 2001070442A JP 2002271039 A JP2002271039 A JP 2002271039A
Authority
JP
Japan
Prior art keywords
layer
laser beam
insulating layer
laser
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001070442A
Other languages
Japanese (ja)
Inventor
Masayuki Kono
公志 河野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001070442A priority Critical patent/JP2002271039A/en
Publication of JP2002271039A publication Critical patent/JP2002271039A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a multilayer printed board in which an insulating layer only can be eliminated when machining is performed by using a laser beam. SOLUTION: The multilayer board is provided with a first and second metal layers 2, 3 which are electrically connected with electronic components to be mounted, and an insulating layer 1 which is formed between the first and second metal layers 2 and 3 and isolates them from each other. A reflecting layer for reflecting the laser beam which is cast in order to form a hole in the insulating layer 1 is formed between the insulating layer 1 and the first metal layer 2 or the second metal layer 3.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、多層基板及びその
加工方法に関し、特に、レーザ光によって加工される多
層基板及びその加工方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer substrate and a method for processing the same, and more particularly, to a multilayer substrate processed by a laser beam and a method for processing the same.

【0002】[0002]

【従来の技術】従来、図7に示すように内層銅箔103
を挟むように形成されている樹脂などからなる各絶縁層
101を被覆する各銅箔102を有する多層プリント基
板は、ドリルなどを用いて一方の銅箔102に穴を空け
て内層銅箔103などと外部の電子部品とがはんだなど
の導電体によって電気的に接続できるようにされてい
た。
2. Description of the Related Art Conventionally, as shown in FIG.
The multilayer printed circuit board having each copper foil 102 covering each insulating layer 101 made of resin or the like formed so as to sandwich the inner copper foil 103 by drilling a hole in one copper foil 102 using a drill or the like And an external electronic component can be electrically connected by a conductor such as solder.

【0003】また、図8に示すような絶縁層101を挟
んで形成された各銅箔102の表面に感光性樹脂などの
絶縁層109が形成された多層プリント基板は、ホトリ
ソ法などにより絶縁層109に穴が設けられており、銅
箔102と外部の電子部品とがはんだなどの導電体によ
って電気的に接続できるようにされていた。
A multilayer printed circuit board having an insulating layer 109 made of a photosensitive resin or the like formed on the surface of each copper foil 102 formed with an insulating layer 101 interposed therebetween as shown in FIG. A hole is provided in 109 so that the copper foil 102 and an external electronic component can be electrically connected by a conductor such as solder.

【0004】さらに、銅箔102などに空ける穴の小径
化、高精度化のために、図9,図10に示すように、図
7,図8のいずれのタイプの多層プリント基板に対して
も、炭酸ガスレーザなどのレーザ光108を用いて穴を
設けられることもあった。
Further, as shown in FIGS. 9 and 10, in order to reduce the diameter of holes to be drilled in the copper foil 102 and the like and to increase the precision, as shown in FIGS. In some cases, holes are formed using a laser beam 108 such as a carbon dioxide gas laser.

【0005】[0005]

【発明が解決しようとする課題】しかし、炭酸ガスレー
ザなどを用いて多層プリント基板に穴を設けると、その
炭酸ガスレーザから出射されたレーザ光のパワーが大き
い場合には、絶縁層と共に内層の銅箔の一部が除去さ
れ、一方、レーザ光のパワーが小さい場合には、絶縁層
が充分の除去されない場合がある。そのため、導電層を
形成するためのメッキ工程において、メッキ不要の原因
や電気的な接続の信頼性が低下する場合があった。
However, when a hole is formed in a multilayer printed circuit board using a carbon dioxide laser or the like, if the power of the laser light emitted from the carbon dioxide laser is large, the copper foil of the inner layer is formed together with the insulating layer. When the power of the laser beam is small, the insulating layer may not be sufficiently removed. Therefore, in the plating process for forming the conductive layer, there may be a case where plating is unnecessary and reliability of electrical connection is reduced.

【0006】そこで、本発明は、レーザ光によって加工
する際に絶縁層だけを除去できるような多層プリント基
板を提供することを課題とする。
Accordingly, an object of the present invention is to provide a multilayer printed circuit board capable of removing only an insulating layer when processing with a laser beam.

【0007】[0007]

【課題を解決するための手段】上記課題を解決するため
に、本発明は、搭載される電子部品と電気的接続される
第1及び第2金属層と、前記第1及び第2金属層間に形
成され該第1及び第2金属層を絶縁する絶縁層とを備え
た多層基板において、前記絶縁層と前記第1又は第2金
属層との間に該絶縁層に穴を設けるために照射するレー
ザ光を反射する反射層を形成することを特徴とする。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides first and second metal layers electrically connected to electronic components to be mounted, and between the first and second metal layers. Irradiation for providing a hole in the insulating layer between the insulating layer and the first or second metal layer in a multilayer substrate having an insulating layer formed and insulating the first and second metal layers. It is characterized in that a reflection layer for reflecting laser light is formed.

【0008】また、本発明の多層基板の加工方法は、上
記多層基板の絶縁層に第1レーザ光を照射し、前記第1
レーザ光によって前記絶縁層下の金属層上に残った残渣
層に該第1レーザ光と光軸が一致する第2レーザ光を照
射することを特徴とする。
Further, in the method for processing a multilayer substrate according to the present invention, the insulating layer of the multilayer substrate is irradiated with a first laser beam.
A second laser beam whose optical axis coincides with the first laser beam is irradiated to a residue layer remaining on the metal layer below the insulating layer by the laser beam.

【0009】[0009]

【発明の実施の形態】以下、本発明の実施形態について
図面を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0010】図1は、本発明の実施形態の多層プリント
基板に係る加工装置の構成を示す概念図である。図1に
は、互いに波長の異なる第1,第2照射手段であるレー
ザ発振機10,20と、レーザ発振機10,20から出
射されたレーザ光の進行方向を変えるミラー30,40
と、ミラー30,40によって進行方向が変えられた各
レーザ光を多層プリント基板7に集める集光レンズ5
0,60と、多層プリント基板7を載置するテーブル8
0とを示している。
FIG. 1 is a conceptual diagram showing a configuration of a processing apparatus for a multilayer printed circuit board according to an embodiment of the present invention. FIG. 1 shows laser oscillators 10 and 20 as first and second irradiation means having different wavelengths from each other, and mirrors 30 and 40 for changing the traveling direction of laser light emitted from the laser oscillators 10 and 20.
And a condensing lens 5 for collecting each laser beam whose traveling direction has been changed by the mirrors 30 and 40 on the multilayer printed circuit board 7.
0, 60 and a table 8 on which the multilayer printed circuit board 7 is placed
0 is shown.

【0011】図2は、本発明の実施形態の多層プリント
基板7の断面図である。図2には、図示しない電子部品
と電気的に接続される内層銅箔3と、レーザ光を反射す
る反射層である金属薄膜9と、エポキシ系樹脂であるポ
リマーなどからなる絶縁層1と、外層銅箔2と、導電層
形成用の穴11とを示している。
FIG. 2 is a sectional view of the multilayer printed circuit board 7 according to the embodiment of the present invention. FIG. 2 shows an inner copper foil 3 electrically connected to an electronic component (not shown), a metal thin film 9 that is a reflection layer that reflects laser light, an insulating layer 1 made of a polymer that is an epoxy resin, and the like. The outer copper foil 2 and the hole 11 for forming a conductive layer are shown.

【0012】図3〜図6は、図2に示す多層プリント基
板の製造工程図である。図3〜図6を用いて図2に示す
多層プリント基板の製造工程について説明する。
FIG. 3 to FIG. 6 are manufacturing process diagrams of the multilayer printed circuit board shown in FIG. The manufacturing process of the multilayer printed circuit board shown in FIG. 2 will be described with reference to FIGS.

【0013】まず、図3に示すように、たとえば18μ
mの厚さの内層銅箔3上に、アルミニウムやロジュウム
などの金属薄膜9を、たとえば1μmの厚さで形成す
る。この際、金属薄膜9は、蒸着法、メッキ法、ディピ
ング法等のいずれの手法によって形成してもよい。
First, as shown in FIG.
On the inner copper foil 3 having a thickness of m, a metal thin film 9 such as aluminum or rhodium is formed with a thickness of, for example, 1 μm. At this time, the metal thin film 9 may be formed by any method such as an evaporation method, a plating method, and a dipping method.

【0014】つづいて、図4に示すように、金属薄膜9
にたとえば0.1mmの厚さのアルミニウムなどからな
る粘着性を有するシート状の絶縁層1を貼付し、さらに
絶縁層1にたとえば18μmの厚さの外層銅箔2を形成
する。
Subsequently, as shown in FIG.
Then, an adhesive sheet-like insulating layer 1 made of aluminum or the like having a thickness of, for example, 0.1 mm is adhered thereto.

【0015】つぎに、外層銅箔2が上側になるように多
層プリント基板7をテーブル80に載置した状態で、テ
ーブル80を移動させて、レーザ発振機10,20から
それぞれ出射されるレーザ光の照射位置を調整する。そ
れから、レーザ発振機10のYAG(ヤグ)レーザから
たとえばレーザ出力1.5W、パルス幅50μsで第3
高調波を使用して、大気中で30ショット、レーザ光6
を出射する。
Next, with the multilayer printed circuit board 7 placed on the table 80 such that the outer copper foil 2 is on the upper side, the table 80 is moved and the laser light emitted from the laser oscillators 10 and 20 respectively. Adjust the irradiation position of. Then, for example, a laser output of 1.5 W and a pulse width of 50 μs from the YAG (yag) laser of
Using harmonics, 30 shots in air, laser light 6
Is emitted.

【0016】出射されたレーザ光6は、ミラー30によ
って進行方向がたとえば90度変えられる。進行方向が
変えられたレーザ光6は、集光レンズ50に入射する。
集光レンズ50に入射したレーザ光6は、図5に示すよ
うに、テーブル80上の多層プリント基板7の外層銅箔
2及び絶縁層1に照射される。
The traveling direction of the emitted laser light 6 is changed by, for example, 90 degrees by the mirror 30. The laser beam 6 whose traveling direction has been changed enters the condenser lens 50.
The laser beam 6 incident on the condenser lens 50 irradiates the outer copper foil 2 and the insulating layer 1 of the multilayer printed circuit board 7 on the table 80 as shown in FIG.

【0017】すると、外層銅箔2及び絶縁層1は、レー
ザ光6により除去されるが、同時に、図6に示すよう
に、絶縁層1の樹脂が熱により炭化して金属薄膜9上に
樹脂の炭素層111が残る。炭素層111は、多層プリ
ント基板に電子部品などを取り付ける際に、はんだなど
の導電体と内層銅箔3との接触面積を減少させるので、
除去が必要である。
Then, the outer layer copper foil 2 and the insulating layer 1 are removed by the laser beam 6, but at the same time, as shown in FIG. Carbon layer 111 remains. The carbon layer 111 reduces the contact area between a conductor such as solder and the inner copper foil 3 when attaching an electronic component or the like to the multilayer printed circuit board.
Removal is required.

【0018】そこで、つづいてレーザ発振機20のエキ
シマレーザ(KrF248nm)から10mj、300
Hz、3ショットで可視レーザ光6を出射する。する
と、可視レーザ光6は、ミラー40によって進行方向が
たとえば90度変えられる。進行方向が変えられた可視
レーザ光6は、集光レンズ60に入射する。集光レンズ
60に入射した可視レーザ光6はテーブル80上の多層
プリント基板7の金属薄膜9上に残った炭素層111に
照射される。すると、炭素層111は、可視レーザ光6
により除去され、導電層形成用の穴11がたとえば直径
がφ0.05mmの大きさで形成される。
Then, the excimer laser (KrF 248 nm) of the laser oscillator 20 is used for 10 mj, 300 mJ.
The visible laser light 6 is emitted at 3 Hz and 3 shots. Then, the traveling direction of the visible laser light 6 is changed by, for example, 90 degrees by the mirror 40. The visible laser light 6 whose traveling direction has been changed enters the condenser lens 60. The visible laser light 6 incident on the condenser lens 60 is applied to the carbon layer 111 remaining on the metal thin film 9 of the multilayer printed circuit board 7 on the table 80. Then, the carbon layer 111 becomes visible laser light 6
The hole 11 for forming the conductive layer is formed with a diameter of, for example, 0.05 mm.

【0019】以上、図1に示す加工装置を用いて、図2
に示す多層プリント基板を製造する手法について説明し
たが、製造手順は上記の例に限定されず、たとえばレー
ザ発振機10,20から同時にそれぞれレーザ光を照射
するようにしてもよい。
As described above, using the processing apparatus shown in FIG.
Has been described above, but the manufacturing procedure is not limited to the above example, and laser beams may be simultaneously emitted from the laser oscillators 10 and 20, for example.

【0020】また、本実施形態では、金属薄膜9にアル
ミニウムやロジュウムを用いる場合を例に説明したが、
金属薄膜9は、レーザ光の反射率が高く、吸収係数が小
さいものであれば、上記材料に限定されるものではなく
用いることができる。またレーザ光の波長よっても反射
率等は変わるので、レーザ源によっても金属薄膜9に用
いることができる材料は変わる。
In this embodiment, the case where aluminum or rhodium is used for the metal thin film 9 has been described as an example.
The metal thin film 9 is not limited to the above materials and can be used as long as it has a high laser light reflectance and a small absorption coefficient. Further, since the reflectance and the like change depending on the wavelength of the laser light, the material that can be used for the metal thin film 9 also changes depending on the laser source.

【0021】たとえばレーザ発振器1に、比較的波長の
長いCO2レーザを備える場合には、金属薄膜9には、
金、銀、銅、ニッケル、鉄、クロムなど種々の材料を適
用することができる。また、金属薄膜9の厚さや、レー
ザ光の強度、総照射量によっても適用可能な材料は変わ
るが、金属薄膜9は、多層プリント基板が厚くならない
ようにするためには可能な限り薄い方がよいので、反射
率が80%以上の材料を用いるのが好ましい。
For example, when the laser oscillator 1 is provided with a CO 2 laser having a relatively long wavelength, the metal thin film 9 includes
Various materials such as gold, silver, copper, nickel, iron, and chromium can be used. The applicable material varies depending on the thickness of the metal thin film 9, the intensity of the laser beam, and the total irradiation amount, but the metal thin film 9 should be as thin as possible in order to keep the multilayer printed circuit board from becoming thick. For this reason, it is preferable to use a material having a reflectance of 80% or more.

【0022】[0022]

【発明の効果】以上、説明したように、本発明は、絶縁
層と第1又は第2金属層との間に絶縁層に穴を設けるた
めに照射するレーザ光を反射する反射層を形成するの
で、レーザ光のパワーを大きくしても、レーザ光によっ
て内層金属層が除去されず、絶縁層だけを除去すること
ができる。
As described above, according to the present invention, a reflection layer is formed between an insulating layer and the first or second metal layer to reflect a laser beam irradiated to form a hole in the insulating layer. Therefore, even if the power of the laser beam is increased, the inner metal layer is not removed by the laser beam, and only the insulating layer can be removed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態の多層プリント基板に係る加
工装置の構成を示す概念図である。
FIG. 1 is a conceptual diagram showing a configuration of a processing apparatus for a multilayer printed board according to an embodiment of the present invention.

【図2】本発明の実施形態の多層プリント基板7の断面
図である。
FIG. 2 is a sectional view of a multilayer printed circuit board 7 according to the embodiment of the present invention.

【図3】図2に示す多層プリント基板の製造工程図であ
る。
FIG. 3 is a manufacturing process diagram of the multilayer printed circuit board shown in FIG. 2;

【図4】図2に示す多層プリント基板の製造工程図であ
る。
FIG. 4 is a manufacturing process diagram of the multilayer printed circuit board shown in FIG. 2;

【図5】図2に示す多層プリント基板の製造工程図であ
る。
FIG. 5 is a manufacturing process diagram of the multilayer printed circuit board shown in FIG. 2;

【図6】図2に示す多層プリント基板の製造工程図であ
る。
FIG. 6 is a manufacturing process diagram of the multilayer printed circuit board shown in FIG. 2;

【図7】従来技術の多層プリント基板の断面図である。FIG. 7 is a sectional view of a conventional multilayer printed circuit board.

【図8】従来技術の多層プリント基板の断面図である。FIG. 8 is a sectional view of a conventional multilayer printed circuit board.

【図9】従来技術の多層プリント基板の断面図である。FIG. 9 is a cross-sectional view of a conventional multilayer printed circuit board.

【図10】従来技術の多層プリント基板の断面図であ
る。
FIG. 10 is a sectional view of a conventional multilayer printed circuit board.

【符号の説明】[Explanation of symbols]

1 絶縁層 2 外層銅箔 3 内層銅箔 6 レーザ光 7 多層プリント基板 9 金属薄膜 11 導電層形成用の穴 10,20 レーザ発振機 30,40 ミラー 50,60 集光レンズ 80 テーブル DESCRIPTION OF SYMBOLS 1 Insulating layer 2 Outer layer copper foil 3 Inner layer copper foil 6 Laser beam 7 Multilayer printed circuit board 9 Metal thin film 11 Hole for forming conductive layer 10, 20 Laser oscillator 30, 40 Mirror 50, 60 Condenser lens 80 Table

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // B23K 101:42 B23K 101:42 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // B23K 101: 42 B23K 101: 42

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 搭載される電子部品とそれぞれ電気的接
続される第1及び第2金属層と、前記第1及び第2金属
層間に形成され該第1及び第2金属層を絶縁する絶縁層
とを備えた多層基板において、 前記絶縁層と前記第1又は第2金属層との間に該絶縁層
に穴を設けるために照射するレーザ光を反射する反射層
を形成することを特徴とする多層基板。
1. A first and second metal layer electrically connected to a mounted electronic component, respectively, and an insulating layer formed between the first and second metal layers to insulate the first and second metal layers. Wherein a reflective layer is formed between the insulating layer and the first or second metal layer, the reflective layer reflecting a laser beam applied to form a hole in the insulating layer. Multi-layer board.
【請求項2】 前記反射層は金、銀、銅、鉄、アルミニ
ウム又はロジュウムであり、前記レーザ光はヤグレーザ
光であることを特徴とする請求項1記載の多層基板。
2. The multilayer substrate according to claim 1, wherein said reflection layer is made of gold, silver, copper, iron, aluminum or rhodium, and said laser light is a yag laser light.
【請求項3】 前記反射層は金、銀、銅、鉄、ニッケ
ル、アルミニウム、ロジュウム又はクロムであり、前記
レーザ光はCO2レーザ光であることを特徴とする請求
項1記載の多層基板。
3. The multilayer substrate according to claim 1, wherein the reflection layer is made of gold, silver, copper, iron, nickel, aluminum, rhodium or chromium, and the laser light is a CO 2 laser light.
【請求項4】 前記反射層は、蒸着法、メッキ法又はデ
ィピング法によって形成することを特徴とする請求項1
から3のいずれか1項記載の多層基板。
4. The method according to claim 1, wherein the reflection layer is formed by a vapor deposition method, a plating method, or a dipping method.
The multilayer substrate according to any one of claims 1 to 3, wherein
【請求項5】 請求項1から4のいずれか1項記載の多
層基板の絶縁層に第1レーザ光を照射し、 前記第1レーザ光によって前記絶縁層下の金属層上に残
った残渣層に該第1レーザ光と光軸が一致する第2レー
ザ光を照射することを特徴とする多層基板の加工方法。
5. A residue layer remaining on a metal layer below the insulating layer by irradiating the insulating layer of the multilayer substrate according to claim 1 with a first laser beam, and the first laser beam. Irradiating a second laser beam whose optical axis coincides with the first laser beam.
【請求項6】 前記第2レーザ光は、紫外線レーザ光で
あることを特徴とする請求項5記載の多層基板の加工方
法。
6. The method according to claim 5, wherein the second laser beam is an ultraviolet laser beam.
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