JPH11191377A - Barrier of plasma display panel and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a high-quality barrier fine and excellent in dimensional precision which is never jumped by the peeling of the end part by setting the bottom width of the end part larger than the bottom width other than the end part. SOLUTION: The bottom part of a pattern consisting of a barrier material is adhered to a substrate surface, and the bottom width of the end part is set larger than the bottom width other than the end part, whereby the adhesive area of the bottom end part of the pattern consisting of the barrier material with the substrate surface can be increased. Therefore, the pattern consisting of the barrier material is resistant to the stress accompanying the construction by burning of an organic material in the baking thereof, so that the peeling by jump of a barrier end part can be prevented. When the pattern consisting of the barrier material is baked, the barrier is contracted, compared with that before baking by the burning of the organic material, but the form before baking is held, and substantially similar to the form of the resulting barrier. This pattern preferably consists of a resin pattern with a bottom width of the barrier end part smaller than the bottom width other than the barrier end part which is obtained by exposing a photosensitive resin composition layer formed on a substrate in a pattern form followed by development.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrier for a plasma display panel used as a display device of character information and video information in a computer terminal, a wall-mounted television, and a ticket vending machine, and a method of manufacturing the same.

[0002]

2. Description of the Related Art Plasma display panels (hereinafter referred to as P
DP) is a barrier (barrier rib) and a phosphor inside two insulating plates (hereinafter abbreviated as a glass plate), a front plate on which a transparent electrode is formed, and a back plate on which a data electrode and an insulating film are formed. Is formed. The barrier forms a cell structure that maintains a certain space between the transparent electrode group and the data electrode group that are orthogonal to each other, and is filled with a rare gas such as Ne or Xe.
The intersection of the transparent electrode and the data electrode is discharged by the applied voltage,
Pixels that emit light from the phosphor are formed to display an image. The barrier has a function of preventing erroneous discharge between cells and obtaining a constant discharge section by its height, width, and pattern gap.

In recent years, there has been a trend toward larger displays and finer pixels (eg, a screen size of 40 inches or more and a barrier width of 100 μm or less and a height of 100 μm or more). A photolithographic method using a photosensitive material widely used for formation has been vigorously studied because it can form a large-sized and miniaturized panel barrier with high accuracy. For example, Japanese Patent Application Laid-Open No. Hei 5-2
In Japanese Patent No. 34514, a resin pattern is formed by laminating a photosensitive film on a substrate, exposing the film through a predetermined pattern mask, and then removing an unexposed portion by development.
Embedding the barrier material between the resin pattern and the resin pattern,
A method of forming a barrier by peeling and removing the resin pattern with an alkali peeling liquid after drying has been proposed, and this method is particularly described as an additive method.

However, using the above-described photolithographic method, a fine barrier (aspect ratio ≧ 1.2, barrier width ≦ 1) having a particularly large aspect ratio (a large ratio between height and width) is used.
In the case of forming a panel, the end portion of the barrier peels off and jumps up by a length of about several hundred μm due to the shrinkage stress at the time of firing of the barrier. There were problems such as contamination of pixels. To solve the above problems, as disclosed in JP-A-6-150828 and JP-A-6-150832, a barrier material having a different bending point has a multi-layer structure, or the shape of the end portion has a stepped structure, so that the shape during firing can be reduced. A method of reducing the shrinkage stress and taking a countermeasure has been studied, but is not always satisfactory.

[0005]

SUMMARY OF THE INVENTION An object of the present invention is to provide a barrier for a high-quality plasma display panel which is fine and has excellent dimensional accuracy without jumping due to peeling of an end portion. The second aspect of the present invention provides a method of manufacturing a barrier of a plasma display panel, which can manufacture a barrier of a plasma display panel without jumping due to peeling of an end portion. According to a third aspect of the present invention, there is provided a method of manufacturing a barrier of a plasma display panel, which is capable of manufacturing a fine and high-quality barrier of a high-quality plasma display panel having excellent dimensional accuracy without a jump due to peeling of an end portion with a high yield. Things. According to a fourth aspect of the present invention, there is provided a method of manufacturing a barrier of a plasma display panel, which is capable of manufacturing a finer barrier of high quality and excellent in dimensional accuracy without a jump due to peeling of an end portion and with good yield. Is what you do. According to a fifth aspect of the present invention, there is provided a method of manufacturing a barrier of a plasma display panel, which is capable of easily manufacturing a finer barrier of a high-quality plasma display panel excellent in dimensional accuracy and without swelling due to peeling of an edge, with good yield. Is provided.

[0006]

SUMMARY OF THE INVENTION The present invention includes a bottom width A ₀ of the end about the barrier of the bottom width B ₀ is larger than the plasma display panel in the portion other than the end. Further, the present invention, the bottom width of the end portion and firing the pattern bottom width A ₁ of the end portion formed on the substrate is made of a bottom width B ₁ is larger than the barrier material in the portion other than the end The present invention relates to a method for manufacturing a barrier of a plasma display panel in which A ₀ is larger than a bottom width B ₀ of a portion other than an end portion.

Further, according to the present invention, a resin pattern is formed on a substrate in which a bottom width A ₂ of a portion corresponding to the end of the barrier is smaller than a bottom width B _{2 of} a portion corresponding to a portion other than the end of the barrier, after is embedded, the barrier material in the gap between the resin patterns and the resin pattern, by removing the resin pattern, a bottom width B ₁ is larger than the barrier material of the bottom width a ₁ is a portion other than the end portions of the substrate The present invention relates to a method for manufacturing a barrier for a plasma display panel as described above, which forms a pattern comprising: Further, the present invention exposes the photosensitive resin composition layer formed on the substrate in a pattern and developed, a bottom width A ₂ of the portion corresponding to the end portions of the barrier on a substrate of the barrier end preparation of the plasma display panel of the barrier forming the bottom width B ₂ is smaller than the resin patterns in the portion corresponding to the portion other than the part related. In addition, the present invention relates to an exposure amount a to the photosensitive resin composition layer to be a resin pattern corresponding to the edge of the barrier, and a photosensitive resin composition to be a resin pattern corresponding to a portion other than the edge of the barrier. By setting the ratio (exposure amount a / exposure amount b) to the exposure amount b of the material layer to 0.1 to 0.8, the bottom width A of the resin pattern corresponding to the end of the barrier is obtained.
_The present invention relates to a method for manufacturing a barrier for a plasma display panel, wherein ₂ is smaller than a bottom width B2 of a resin pattern corresponding to a portion other than an end of the barrier.

[0008]

Barrier plasma display panel of the embodiment of the present invention is, for example, the bottom width A ₁ of the end portion formed on the substrate is made of a bottom width B ₁ is larger than the barrier material in the portion other than the end pattern Can be produced by firing. Examples of the substrate include a ceramic plate, a plastic plate, and a glass plate having a thickness of about 0.5 to 5 mm.
On this substrate, a dielectric layer, an electrode, a protective layer and the like may be provided.

[0009] be larger than the bottom width B ₁ of the bottom portion is adhered to the substrate surface, portions other than the end portion of the bottom width A ₁ of the end portion of the pattern made of the above-mentioned barrier material (A _1> B ₁₎
This makes it possible to increase the bonding area of the bottom end portion of the pattern made of the barrier material with the substrate surface at the bottom, so that the pattern made of the barrier material can withstand the stress caused by shrinkage due to burning of the organic material and the like when firing. It is possible to prevent the barrier end from peeling off due to a jump or the like. When a pattern made of a barrier material is fired, the organic material or the like is burned out and shrunk before firing to form a barrier. However, the shape before firing is preserved and is substantially similar to the obtained barrier shape (formed of the barrier material). The shape of the bottom portion of the pattern adhered to the substrate does not change before and after firing because the bottom portion is in close contact with the substrate, and the height and the width of the portion excluding the bottom portion are mainly reduced.)

[0010] The end of the barrier of the plasma display panel is a portion not used as a display area (usually, no pixel made of a phosphor is formed there), whereas the portion other than the end of the barrier is made of a phosphor. This is a portion where pixels are formed and used as a display area (pixels made of a phosphor are formed there). For example, if the barrier of the plasma display panel to be formed is a stripe-type barrier, the length of the end portion of the pattern made of the barrier material (the longitudinal direction of the stripe) is preferably 20 μm to 3 mm, and more preferably 50 μm to 3 μm. More preferably, it is 2 mm.
If the length is less than 20 μm, the effect of preventing peeling due to a jump or the like tends to be insufficient, and if it exceeds 3 mm, the display area tends to be narrow. When a pattern made of a barrier material having an end portion length (the longitudinal direction of the stripe) of 20 μm to 3 mm is fired, the end portion length becomes approximately 20 μm to 3 μm.
A 3 mm barrier is obtained.

The ratio (B ₁ / Z ₁ ) between the bottom width B ₁ of the portion other than the end portion of the pattern formed of the barrier material formed on the substrate and the width Z ₁ of the top portion other than the end portion is B ₁ / Z _1. Securing space,
It is preferably from 1.0 to 2.0, more preferably from 1.1 to 1.9, from the viewpoint of the strength of the barrier and the like. Prevention of the end of the pattern made of the barrier material formed on the substrate is the bottom width A ₁ of its ends it is essential to be greater than the bottom width B ₁ of the portion other than the end portion, peeling by such jumping In order to further improve the effect, the ratio (A ₁ / Y ₁ ) of the bottom width A ₁ at the end to the top width Y ₁ at the end is 2.1.
When the ratio is less than 2.1, the above-mentioned effect tends to be insufficiently improved.
If it exceeds 300, it tends to be difficult to form a pattern made of a barrier material. Here, if the value of the bottom width A ₁ at the end is not constant but has a range, the maximum value within the range is calculated as the bottom width A 1.
_Set to ₁ .

The shape of a pattern made of a barrier material having B ₁ / Z ₁ of 1.0 to 2.0 and A ₁ / Y ₁ of 2.1 to 4.0 is as follows.
The barrier obtained by firing this is also substantially preserved, and the ratio (B / Z) of the bottom width B of the portion other than the end portion of the obtained barrier to the top width Z of the portion other than the end portion is approximately 1. 0 to 2.0, the ratio of the bottom width A at the end to the width Y at the top of the end (A /
Y) is approximately 2.1 to 4.0 (see FIG. 1). Further, in order to further improve the effect of preventing the peeling of the edge, the A of the pattern made of the barrier material formed on the substrate is used.
In order to increase the ₁ / Y _1, a width Y ₁ of the top end,
Can be made smaller than the width Z ₁ of the uppermost portion other than the end portion, the shape of the pattern made of the barrier material did so also saved approximately barrier smell after firing (see Figure 2).
The shape of the side surface of the barrier of the plasma display panel of the present invention is, for example, a dent-like shape as shown in the AA ′ cross section and the BB ′ cross section in FIGS. 1 and 2. The shape is not limited, and may be a swelling shape, a linear shape, an S-shape, or the like.

In the manufacture of the barrier of the plasma display panel according to the present invention, the height of the barrier to be formed is 80 μm.
In the case of m or more, the effect can be more exhibited, which is preferable.

The barrier material used in the present invention contains an inorganic material and a resin binder as essential components, and may further contain, if necessary, an organic solvent, a pigment, a dye, a leveling agent, an adhesion improver, a dispersant, and the like. Including. The inorganic material is composed of a low-melting glass powder, an inorganic filler used as needed, and the like. The composition of the low-melting glass powder is PbO
—SiO ₂ —B ₂ O ₃ , PbO—SiO ₂ , PbO—B
₂ O ₃ and ZnO—B ₂ O ₃ are exemplified. The softening point of the low-melting glass powder is 350 to 1000 ° C, and the particle size is 0.1 to
It is desirable that the thickness be 5 μm from the viewpoint of the working point and the strength of the barrier. The inorganic filler optionally used includes Zr
SiO _4, Cu-Cr-based oxide, CuCrO _4, alumina, titanium oxide, zinc oxide, barium oxide, potassium oxide, sodium oxide, calcium oxide, zirconium oxide, cadmium oxide, copper oxide, magnesium oxide, manganese oxide, bismuth oxide And the like.

The resin binder may be a known resin without any particular limitation, and is preferably a non-curable resin (a resin which is not cured by dimerization or polymerization by heat or light).
Such a resin is a resin having no functional group (such as a vinyl group, a hydroxyl group, or an epoxy group) that is polymerized by heat or light to be crosslinked and cured, such as an acrylic ester of acrylic acid and methacrylic acid. And a vinyl monomer copolymerizable with these as a main component, if necessary. Specifically, there is a product obtained by copolymerizing butyl methacrylate or ethyl methacrylate as a main component with a small amount of methacrylic acid or lauryl methacrylate. The amount of the resin binder used is preferably 3 to 30 parts by weight based on 100 parts by weight of the inorganic material. If it is less than 3 parts by weight, it does not function as a binder and the barrier material tends to collapse. On the other hand, if the amount exceeds 30 parts by weight, the flowability becomes excessive in the melting stage before the thermal decomposition and disappearance in the step of thermally decomposing and eliminating the organic matter in the barrier material by firing, and the shape of the barrier material tends to be deformed.

[0016] It bottom width A ₁ of the end portion on the substrate to form a pattern of the bottom width B ₁ is larger than the barrier material in the portion other than the ends, for example, screen printing using a paste of the barrier material It can be performed by applying divisional coating or multi-coating using one or more screen plates having different positions of openings, meshes of openings, etc. by the method, but the substrate is excellent in productivity, fineness, dimensional accuracy, etc. forms the bottom width B ₂ is smaller than the resin pattern portion bottom width a ₂ of the portion corresponding to the end portion of the barrier above corresponds to the portion other than the end portion of the barrier, the barrier in the gap between the resin patterns and resin pattern after is embedded, the material, by removing the resin pattern, it is preferable to form the pattern bottom width a ₁ of the end portion on the substrate is made of a bottom width B ₁ is larger than the barrier material in the portion other than the end.

Here, in order to achieve better productivity, fineness, dimensional accuracy, etc., the photosensitive resin composition layer formed on the substrate is exposed in a pattern and developed, whereby the substrate is exposed to light. it is preferable to form a bottom width B ₂ is smaller than the resin pattern portion bottom width a ₂ of the portion corresponding to the end portion of the barrier corresponds to a portion other than the end portion of the barrier. At this time, the bottom width A of the resin pattern corresponding to the end of the barrier
_2, to be smaller than the bottom width B ₂ of the resin pattern corresponding to a portion other than the end portion of the barrier, and the exposure amount a of the photosensitive resin composition layer to be a resin pattern corresponding to the end portion of the barrier The ratio (exposure amount a / exposure amount b) to the exposure amount b to the photosensitive resin composition layer to be a resin pattern corresponding to a portion other than the end of the barrier is 0.1 to 0.8. Can be performed more easily.

For example, when a stripe-shaped resin pattern is used, the amount of exposure a to the photosensitive resin composition layer that should become the resin pattern corresponding to the edge is relatively reduced so that the resin corresponding to the edge can be reduced. By lowering the degree of photocuring at the bottom (substrate side) of the photosensitive resin composition layer to be a pattern than at the top of the photosensitive resin composition layer to be a resin pattern corresponding to the end, thereby reducing developer insolubility. After the development, a striped resin pattern whose bottom is thinner than the top can be obtained. The cross-sectional shape perpendicular to the longitudinal direction of the portion corresponding to the end of the stripe-shaped resin pattern formed on the substrate in this manner is an inverted trapezoid. When the exposure amount ratio (exposure amount a / exposure amount b) is less than 0.1, the photocuring degree of the portion given the exposure amount a is too small to be dissolved in the developing solution to form a resin pattern. Tends to be difficult, while if it exceeds 0.8, the bottom width A ₁
And not out differences in bottom width B _1, it tends to be difficult to reduce the bottom width A ₁ from the bottom width B _1.

As a method of forming a photosensitive resin composition layer on a substrate, the photosensitive resin composition is applied directly on the substrate,
There is a method of drying if necessary, a method of providing a photosensitive film (also referred to as a photosensitive element) by transferring a photosensitive resin layer of the photosensitive film onto a substrate using a laminator, and the like. From the viewpoint that the thickness (height) of the resin pattern can be increased, the latter method using a photosensitive film is preferable. The photosensitive film has a support film and a photosensitive resin layer.For example, a photosensitive resin composition is applied on a support film such as a polyethylene terephthalate film, and dried if necessary. Manufactured by forming layers. Usually, since the photosensitive resin composition layer is uncured, flexible and tacky, a protective film such as a polyethylene film is stuck on this layer to prevent external damage,
Prevents foreign matter from adhering. The thickness of the photosensitive resin composition layer in the photosensitive film is not particularly limited, but is preferably 1 from the viewpoint of easily increasing the thickness of the resin pattern to be formed.
The thickness is preferably 5 μm or more, and the upper limit is about 250 μm.

The photosensitive resin composition is not particularly limited and known ones can be used. Examples thereof include a negative photosensitive resin composition and a positive photosensitive resin composition. As the positive photosensitive resin composition, for example, 1,2
A photo-soluble group-forming composition using a naphthoquinonediazide compound, an o-nitrobenzyl-based compound, or the like; and a photoacid generation / acid decomposition type composition using an onium salt or the like. The negative photosensitive resin composition is suitable for forming a relatively thick resin pattern having a thickness of 50 μm or more. For example, (a) an ethylenically unsaturated compound, (b) a carboxyl group-containing film-imparting polymer, and A photopolymerizable composition containing (c) a photopolymerization initiator as an essential component, and if necessary, (d) a dye or pigment, (e) other additives, and (f) an organic solvent. No.

The photosensitive resin composition layer formed on the substrate using the photosensitive resin composition as described above is exposed in a pattern by, for example, irradiating an actinic ray through a phototool having a predetermined pattern. After being heated accordingly, the photosensitive resin composition layer is selectively removed by development to form a plurality of resin patterns on the substrate.

The photo tool (also referred to as a negative mask) for actual production except for an experimental one usually has a light transmitting portion (a resin to be formed when a negative photosensitive resin composition layer is used). This is the area corresponding to the pattern)
Here, the light transmittance of the photosensitive resin composition layer to be a resin pattern corresponding to the edge of the barrier and the amount of exposure a to the portion other than the edge of the barrier are determined. When the ratio (exposure amount a / exposure amount b) to the exposure amount b to the photosensitive resin composition layer to be a resin pattern to be formed is 0.1 to 0.8, the light transmission portion particularly Either use a photo tool whose light transmittance is selectively adjusted in the light transmitting portion, or place a light transmittance of 10 above or below a normal photo tool in which the light transmittance of the light transmitting portion is constant. Up to 80% of the material may be provided, such as a film having an appropriate thickness, such as polyethylene, polypropylene, polyethylene terephthalate, polyester, polyvinyl chloride, cellulose triacetate, or polyimide; Metal oxides having a light shielding property to the above,
What applied or vapor-deposited the metal salt in the shape of a fine spot is mentioned.

The developing method is not particularly limited, and examples thereof include wet development and dry development. In the case of wet development, a developer corresponding to the photosensitive resin composition is used.
Examples of the developer include a weak alkaline dilute aqueous solution such as sodium carbonate and potassium carbonate, and examples of the development method include an immersion method and a spray method. Further, the resin pattern formed on the substrate after the development may be heated and / or exposed for the purpose of improving strength, solvent resistance and the like.

A barrier material is buried in a gap between a plurality of resin patterns on the substrate thus formed by using a screen, a squeegee or the like, and dried (usually at 50 to 180 ° C. for 10 to 120 minutes). The barrier material on the resin pattern or the gap between the resin patterns is removed by polishing or the like in accordance with
Next, the resin pattern is removed. The resin pattern can be removed by various methods. For example, when the removal of the resin pattern is performed using a stripping solution, the stripping solution to be used includes a 1 to 10% by weight aqueous solution of sodium hydroxide or potassium hydroxide. . When the concentration is less than 1% by weight, the effect of peeling is small, so that the peeling time tends to take too long. When the concentration exceeds 10% by weight, the barrier material tends to be attacked. The temperature of the stripping solution is not particularly limited, and conditions for suitably stripping the resin pattern may be appropriately set. As the stripping method, any of the immersion method and the spray method is suitable, and the two methods are used in combination. You may.

After removing the resin pattern, organic substances such as resin are removed from the pattern of the barrier material remaining on the substrate,
A pattern made of a barrier material is fired for the purpose of improving strength, gas impermeability, and the like. The temperature and time of this firing are 35
0 to 580 ° C for about 1 to 20 hours. The thickness (height) of the barrier on the substrate thus manufactured is 50 to 2
The width is about 50 μm, and the bottom width is about 20 to 180 μm for a stripe type or lattice type barrier.

[0026]

The present invention will be described below with reference to examples. Example 1 A 41% by weight solution of methyl methacrylate / ethyl acrylate / methacrylic acid copolymer (copolymer composition weight ratio 53/30/17, weight average molecular weight 100,000) in methyl cellosolve / toluene (weight ratio 8/2). 134 g (solid content 55 g),
2,2-bis [4- (methacryloxypentaethoxy)
Phenyl] propane 34 g, γ-chloro-β-hydroxypropyl-β′-methacryloyloxyethyl-o-
11 g of phthalate, 0.1 g of 2,2'-methylenebis (4-ethyl-6-t-butylphenol), 1.2 g of tribromomethylphenylsulfone, silicone leveling agent (trade name: SH-193, manufactured by Toray Silicon Co., Ltd.)
0.04 g, 1-7-bis (9-acridinyl) heptane 0.2 g, benzyl methyl ketal 3 g, leuco crystal violet 1.0 g, malachite green 0.1 g
A solution of the photosensitive resin composition was obtained by mixing 05 g, toluene 7 g, methyl ethyl ketone 13 g and methanol 3 g.

This photosensitive resin composition solution was uniformly applied on a polyethylene terephthalate film having a thickness of 20 μm, and dried with a hot air convection dryer at 110 ° C. for 10 minutes to obtain a photosensitive film. The thickness of the dried photosensitive resin composition layer was 50 μm.

Next, the obtained photosensitive film was laminated three times on a 3.0 mm-thick glass plate to form a 150 μm-thick photosensitive resin composition layer on the glass plate.
Lamination was performed under the conditions of a laminating roll temperature of 130 ° C., a roll pressure of 4.0 kgf / cm ² , and a speed of 0.5 m / min.

Next, the light transmittance (320 to 390 n) of a thin film silver salt formed on a polyethylene terephthalate film.
m) is about 20%, a negative mask having a predetermined pattern and a polyethylene terephthalate film on the photosensitive resin composition layer are covered so that a portion corresponding to an end 1 mm width of the resin pattern to be formed is covered. The film was exposed at 80 mJ / cm ² with a 3 kW high-pressure mercury lamp (HMW-590, manufactured by Oak Manufacturing Co., Ltd., exposure main wavelength: 365 nm), and heated at 80 ° C. for 10 minutes after 1 minute.

Next, the polyethylene terephthalate film was peeled off, spray-developed with a 1% by weight aqueous solution of sodium carbonate at 30 ° C., washed with water and drained. Furthermore, after drying at 80 ° C. for 10 minutes, 2000 mJ using a 7 kW metal halide lamp (HMW-680, manufactured by Oak Manufacturing Co., Ltd.).
/ cm ² , and a striped resin pattern (pattern size 310 × 410 mm ² , line /
After forming a space = 150 μm / 70 μm, thickness 150 μm), a paste-like barrier material is
It was applied in a solid state by a screen printer having a mesh screen plate. Here, the paste-like barrier material is an acrylic copolymer resin (composition weight ratio: n-butyl methacrylate / 98/2 methacrylic acid, weight average molecular weight: 100,000, solid content: 35% by weight, solvent: 51 parts by weight of toluene / xylene (1/1 weight ratio), low melting point glass (PbO.B ₂ O ₃ .SiO ₂ , NEC Glass Co., Ltd.)
Methyl Naphthalene was added to a mixture of 50 parts by weight of GA-9), 50 parts by weight of alumina powder, and 2 parts by weight of γ-methacryloxytrimethoxysilane to obtain a viscosity of 7
The one adjusted to 0 poise was used.

One minute after embedding the paste-like barrier material, vacuum defoaming was performed at 5 Torr or less for 3 minutes using a vacuum defoaming machine, followed by drying at 80 ° C. for 30 minutes. This cycle of embedding, depressurization and drying was repeated twice. Next, after heating at 160 ° C. for 45 minutes, unnecessary paste adhering to the resin pattern surface was polished and removed using a water-resistant sandpaper (counters # 400 to # 1000) until the resin pattern surface was exposed. Then, at 40 ° C, 5
After immersion in a 15 wt% aqueous sodium hydroxide solution for 15 minutes, 55 ° C
The resin pattern was peeled off by immersion in warm water for 3 minutes to form a pattern made of a barrier material. The dimensions of the resulting pattern of the barrier material are shown in Table 1 below.

Next, the pattern made of the barrier material was fired in air using a muffle furnace to obtain a barrier. The firing conditions were as follows: the temperature was raised from room temperature to 380 ° C. at a rate of 3 ° C./min, held at 380 ° C. for 30 minutes, and further raised to 550 ° C. at a rate of 5 ° C./min. After holding for a minute,
It was allowed to cool naturally to room temperature. The dimensions of the resulting barrier are shown in Table 2 below.

Comparative Example 1 A 3 kW high-pressure mercury lamp (HMW-590, manufactured by Oak Manufacturing Co., Ltd., main exposure wavelength: 365 nm) was exposed at 80 mJ / cm ² by placing a negative mask of a predetermined pattern on a polyethylene terephthalate film. In other words, in Comparative Example 1, a barrier film was formed in the same manner as in Example 1 except that a film in which a thin film silver salt was formed on a polyethylene terephthalate film and the light transmittance (320 to 390 nm) was about 20% was not used. Patterns and barriers made of materials were obtained, and their dimensions are shown in Tables 1 and 2 below, respectively.

[0034]

[Table 1]

[0035]

[Table 2]

In the first embodiment in which the bottom width of the end portion of the pattern made of the barrier material is larger than the bottom width of the portion other than the end portion, the barrier obtained by sintering the pattern has a fine shape with no exfoliation at the end portion. On the other hand, in Comparative Example 1 in which the bottom width of the end portion of the pattern made of the barrier material was the same as the bottom width of the portion other than the end portion, the barrier obtained by firing this was As a result, peeling of the end portions occurred, and this was not practical.

[0037]

According to the first aspect of the present invention, the barrier of the plasma display panel is of high quality, which is fine and has excellent dimensional accuracy, which does not jump up due to peeling of the edge. According to the method for manufacturing a barrier of a plasma display panel according to the second aspect, it is possible to manufacture a barrier of a plasma display panel that does not jump up due to peeling of an edge. According to the method for manufacturing a barrier of a plasma display panel according to the third aspect, it is possible to manufacture a barrier of a high-quality plasma display panel which is fine, has excellent dimensional accuracy and does not jump up due to peeling of an edge, with a high yield. According to the method for manufacturing a barrier of a plasma display panel according to the fourth aspect, it is possible to manufacture a barrier of a high-quality plasma display panel which is finer and has excellent dimensional accuracy without jumping due to peeling of an end portion with a high yield. . The method of manufacturing a barrier for a plasma display panel according to claim 5, wherein a barrier of a high-quality plasma display panel with finer dimensions and excellent dimensional accuracy, which does not jump up due to peeling of an edge, can be easily manufactured with a high yield. It is.

[Brief description of the drawings]

FIG. 1 is a structural diagram of an example of an end of a barrier according to the present invention.

FIG. 2 is a structural view of another example of the end of the barrier according to the present invention.

Continued on the front page (72) Inventor Yasuo Katsuya 4-3-1, Higashicho, Hitachi, Ibaraki Pref. Hitachi Chemical Co., Ltd. Yamazaki Plant (72) Inventor Tetsuya Sudo 4-3-1, Higashicho, Hitachi, Ibaraki Hitachi (72) Inventor Yuzo Igarashi 4-3-1-1, Higashicho, Hitachi City, Ibaraki Prefecture Inside Yamazaki Factory, Hitachi Chemical Co., Ltd.

Claims (5)

[Claims] 1. A bottom width A ₀ of the end of the bottom width B ₀ is larger than the plasma display panel in the portion other than the end barriers. Wherein the bottom width A of the end bottom width A ₁ of the end portion formed on the substrate and firing a pattern of the bottom width B ₁ is larger than the barrier material in the portion other than the end
_A method of manufacturing a barrier for a plasma display panel, wherein _{0 is} larger than a bottom width B ₀ of a portion other than an end. Wherein forming a bottom width B ₂ is smaller than the resin pattern portion bottom width A ₂ of the portion corresponding to the end portions of the barrier on the substrate corresponding to portions other than the end portion of the barrier, and the resin pattern after is embedded, the barrier material in a gap between the resin patterns, by removing the resin pattern, the pattern bottom width a ₁ of the end portion on the substrate is made of a bottom width B ₁ is larger than the barrier material in the portion other than the end The method for manufacturing a barrier of a plasma display panel according to claim 2, wherein the barrier is formed. 4. exposing a photosensitive resin composition layer formed on the substrate in a pattern and developed, the ends of the bottom width A ₂ barriers portions corresponding to the ends of the barriers on the substrate preparation of barriers as claimed in claim 3, wherein forming the bottom width B ₂ is smaller than the resin patterns in the portion corresponding to the portion other than the. 5. The amount of exposure a to the photosensitive resin composition layer to be a resin pattern corresponding to the edge of the barrier, and the photosensitive resin composition to be a resin pattern corresponding to a portion other than the edge of the barrier. Ratio with exposure amount b to layer (exposure amount a / exposure amount b)
The by 0.1 to 0.8, wherein the bottom width A ₂ of the resin pattern corresponding to the end portion of the barrier were smaller than the bottom width B ₂ of the resin pattern corresponding to a portion other than the end portion of the barrier Item 5. The method for producing a barrier for a plasma display panel according to Item 4.