JPH11186315A - Wire-bonding device and manufacture of semiconductor device using thereof - Google Patents

Wire-bonding device and manufacture of semiconductor device using thereof

Info

Publication number
JPH11186315A
JPH11186315A JP35050797A JP35050797A JPH11186315A JP H11186315 A JPH11186315 A JP H11186315A JP 35050797 A JP35050797 A JP 35050797A JP 35050797 A JP35050797 A JP 35050797A JP H11186315 A JPH11186315 A JP H11186315A
Authority
JP
Japan
Prior art keywords
wire
bonding
inclined surface
capillary
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP35050797A
Other languages
Japanese (ja)
Inventor
Soichi Nagano
宗一 長野
Tsuguhiko Hirano
次彦 平野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Semiconductor Package and Test Solutions Co Ltd
Original Assignee
Hitachi Hokkai Semiconductor Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Hokkai Semiconductor Ltd, Hitachi Ltd filed Critical Hitachi Hokkai Semiconductor Ltd
Priority to JP35050797A priority Critical patent/JPH11186315A/en
Publication of JPH11186315A publication Critical patent/JPH11186315A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/783Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301Capillary
    • H01L2224/78302Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a wire-bonding technique, wherein the diameter of the ball to be formed at the tip part of a bonding wire for the capillary used in narrow pitch bonding, can be made small. SOLUTION: A capillary 9 is formed, in such a manner that a depth (h) of its wire lead-out hole 9b and a diameter H of a wire lead-out hole 9b are equal, or the diameter H of the wire lead out hole 9b is made larger than the depth (h) of the depth of the wire lead-out hole 9b. Also, the first inclined surface 9f, where a through-hole 9a is formed, and the second inclined surface 9g, ranging from the first inclined surface 9f to the wire lead out hole 9g are provided inside the capillary 9, and an angle θ2 of the second inclined surface 9g is formed larger than an angle θ1 of the first inclined surface 9f. In addition, the inclination angle of the inner surface of a chamfer part 9c is to be formed in two stages, and an angle θ3 of an inclined surface 9d of the wire lead-out hole is made smaller than an angle θ4 of a tip side inclined surface 9e.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体装置の組立加
工におけるワイヤボンディング技術に関するものであ
り、特に半導体チップ上の電極が狭ピッチ化している半
導体装置の製造におけるワイヤボンディング工程に適用
して有効な技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wire bonding technique for assembling a semiconductor device, and more particularly to a wire bonding process which is effective when applied to a wire bonding process in the manufacture of a semiconductor device in which electrodes on a semiconductor chip are narrowed. It is about technology.

【0002】[0002]

【従来の技術】外部に導出した外部接続用端子(以下、
外部導出用リードと称する)を有する半導体装置におい
て、半導体チップ上の電極パッドと外部導出用リードと
を電気的に接続する手段として、金や銅、アルミニウム
等からなるボンディングワイヤを用いて電気的接続を行
うワイヤボンディング法、特に金ワイヤを用いる場合は
ネイルヘッド・ボンディング法が多く用いられている。
ネイルヘッドボンディング法は一般に、 (1)ボンディングワイヤを筒状のキャピラリと呼ばれ
るボンディングツールに通し、ボンディングワイヤ先端
を放電トーチで溶融してボールを形成する (2)ボールを半導体チップ上の電極パッド(第1ボン
ディング点)にキャピラリ先端部で押圧力及び超音波振
動を印加しながら接合させる (3)キャピラリが半導体チップに対してXY及びZ軸
方向に相対的に移動し、キャピラリ先端部で外部導出用
リード上(第2ボンディング点)にボンディングワイヤ
を接合させる (4)クランパでボンディングワイヤを挟み込みながら
ボンディングワイヤを上昇させて、第2ボンディング点
の接合部からボンディングワイヤを切り離すという方法
で行われる。
2. Description of the Related Art External connection terminals (hereinafter referred to as "outside terminals").
In a semiconductor device having an external lead-out), as a means for electrically connecting an electrode pad on a semiconductor chip and the external lead-out, an electrical connection is made using a bonding wire made of gold, copper, aluminum or the like. In particular, when a gold wire is used, a nail head bonding method is often used.
The nail head bonding method generally involves (1) passing a bonding wire through a cylindrical bonding tool called a capillary, and melting the tip of the bonding wire with a discharge torch to form a ball. (2) attaching the ball to an electrode pad on a semiconductor chip ( (1) The capillary moves relatively to the semiconductor chip in the XY and Z-axis directions and is led out at the capillary tip portion while applying a pressing force and ultrasonic vibration to the capillary tip portion at the first bonding point). (4) The bonding wire is lifted while sandwiching the bonding wire with a clamper, and the bonding wire is separated from the bonding portion at the second bonding point.

【0003】尚、ワイヤボンディング技術に関しては、
例えば「VLSIパッケージング技術(下)」(日経B
P社発行)第22頁乃至第30頁に記載されている。
[0003] Regarding the wire bonding technology,
For example, "VLSI Packaging Technology (2)" (Nikkei B
It is described on pages 22 to 30.

【0004】[0004]

【発明が解決しようとする課題】一般にキャピラリ先端
部の形状は第1ボンディング点である半導体チップ上の
電極パッドにボールを押圧するチャンファ部のチャンフ
ァ角度及びチャンファ径、ボンディングワイヤが挿通、
或いはボール首部と接触するワイヤ導出口、更にボンデ
ィングワイヤをキャピラリ先端部に挿通する貫通孔で形
成されている。
Generally, the shape of the tip of the capillary is such that a chamfer angle and a chamfer diameter of a chamfer portion for pressing a ball to an electrode pad on a semiconductor chip, which is a first bonding point, and a bonding wire are inserted.
Alternatively, it is formed with a wire outlet that comes into contact with the ball neck, and a through-hole that allows a bonding wire to pass through the tip of the capillary.

【0005】ところが、近年の半導体チップ上の電極パ
ッドの狭ピッチ化に対応して、電極パッドに接合させる
ボール径を小径化する必要がある。このボール径の小径
化を可能とするために、前述したキャピラリの先端部を
細くし、ワイヤ導出口等の寸法を縮小しなければならな
い。ところがこのようなキャピラリを用いてワイヤボン
ディングすると以下のようなボンディング不良が発生す
ることを見い出した。
However, it is necessary to reduce the diameter of the ball to be bonded to the electrode pad in response to the recent trend of narrowing the pitch of the electrode pad on the semiconductor chip. In order to make the ball diameter smaller, it is necessary to make the tip of the above-mentioned capillary thinner and to reduce the dimensions of the wire outlet and the like. However, it has been found that the following bonding failure occurs when wire bonding is performed using such a capillary.

【0006】(1)第2ボンディング点、すなわち外部
導出用リード側のボンディング点にボンディングワイヤ
を押圧し、ボンディングワイヤを切り離す際に、第2ボ
ンディング点のテールボンド部の圧接強度が小さく、
又、テールボンド部で圧接しているボンディングワイヤ
の厚さが小さいため、キャピラリ上昇時に切り離した後
のワイヤ先端部(以下テールワイヤと称する)の形成不
良が発生する。これによって、次に放電トーチによって
形成すべきボールが形成できず、ボンディングワイヤが
キャピラリから抜けてしまうという所謂断線不良が発生
する。
(1) When the bonding wire is pressed to the second bonding point, that is, the bonding point on the lead-out lead side, and the bonding wire is cut off, the pressure bonding strength of the tail bonding portion at the second bonding point is small.
In addition, since the thickness of the bonding wire pressed at the tail bond portion is small, formation failure of a wire tip (hereinafter referred to as a tail wire) after separation at the time of raising the capillary occurs. As a result, a ball to be formed next by the discharge torch cannot be formed, and a so-called disconnection failure occurs in which the bonding wire comes off the capillary.

【0007】(2)第1ボンディング点、すなわち半導
体チップ上の電極パッドにボールを押圧して接合させた
後、第2ボンディング点である外部導出用リード側のボ
ンディング点に移動する際に、ボンディングワイヤがキ
ャピラリから繰り出されるが、その際、ボンディングワ
イヤとキャピラリ貫通孔の接触抵抗が大きく、第1、第
2ボンディングを接続するワイヤループの形状不良が発
生する。
(2) After the ball is pressed and bonded to the first bonding point, that is, the electrode pad on the semiconductor chip, the bonding is performed when moving to the bonding point on the external lead-out side, which is the second bonding point. The wire is fed out of the capillary. At this time, the contact resistance between the bonding wire and the capillary through-hole is large, and the wire loop connecting the first and second bondings has a poor shape.

【0008】(3)第2ボンディング点である外部導出
用リード側にボンディングワイヤを押圧する際、テール
ワイヤの折れ曲がり量が大きく、又、折れ曲がり量のバ
ラツキが生ずる。ボールの形成はテールワイヤ近接部に
設けられた放電トーチとテールワイヤに導通するボンデ
ィングワイヤ間に電圧を加え、テールワイヤと放電トー
チ間で発生する電気放電で行う。しかし前述したテール
ワイヤ曲がりの問題は、電気放電で形成するボールの径
や形状のバラツキといった形成不良を発生させる。
(3) When the bonding wire is pressed against the external lead-out side, which is the second bonding point, the tail wire has a large amount of bending and a variation in the amount of bending occurs. The ball is formed by applying a voltage between a discharge torch provided in the vicinity of the tail wire and a bonding wire conducting to the tail wire, and performing an electric discharge generated between the tail wire and the discharge torch. However, the above-described problem of tail wire bending causes defective formation such as variation in diameter and shape of a ball formed by electric discharge.

【0009】本発明の目的は、狭ピッチボンディングで
使用するキャピラリにおいて、ボンディングワイヤ先端
部に形成するボールの小径化を可能とするワイヤボンデ
ィング技術を提供するものである。
An object of the present invention is to provide a wire bonding technique which enables a ball formed at the tip of a bonding wire to be reduced in diameter in a capillary used for narrow pitch bonding.

【0010】本発明の他の目的は、ボンディングワイヤ
がキャピラリ内を挿通する際、ボンディングワイヤとキ
ャピラリとの接触抵抗を低減させ、第1、第2ボンディ
ングを接続するワイヤループのルーピング性の向上が達
成できうるワイヤボンディング技術を提供するものであ
る。
Another object of the present invention is to reduce the contact resistance between the bonding wire and the capillary when the bonding wire passes through the capillary, and to improve the looping property of the wire loop connecting the first and second bondings. It provides a wire bonding technique that can be achieved.

【0011】本発明のその他の目的は、狭ピッチボンデ
ィングで使用するキャピラリにおいて、第1ボンディン
グ点に接合させるボールの小径化を可能とし、テールワ
イヤ及びボールの形成を安定化させるためのワイヤボン
ディング技術を提供するものである。
Another object of the present invention is to provide a capillary used for narrow pitch bonding, a wire bonding technique for making it possible to reduce the diameter of a ball to be bonded to a first bonding point and to stabilize the formation of a tail wire and a ball. Is provided.

【0012】[0012]

【課題を解決するための手段】本願において開示される
発明のうち代表的なものの概要を簡単に説明すれば、次
のとおりである。すなわち、半導体チップに設けられた
電極パッドと外部導出用リードとを電気的に接続するボ
ンディングワイヤを挿通する貫通孔及びその先端部に前
記貫通孔の径より小径のワイヤ導出口を有し、該ワイヤ
導出口の周囲には前記ボンディングワイヤを前記電極パ
ッド及び前記外部導出用リードに接合させるためのチャ
ンファ部で構成されたキャピラリを用いたワイヤボンデ
ィング技術において、前記キャピラリのワイヤ導出口の
奥行きの長さと前記ワイヤ導出口の径とが等しいかまた
は前記ワイヤ導出口の径がワイヤ導出口の奥行きの長さ
より大きく形成するものである。又、前記キャピラリ内
部に前記貫通孔を形成する第一の傾斜面及び該第一の傾
斜面から前記ワイヤ導出口にかけての第二の傾斜面を設
け、前記第二の傾斜面のなす角度が、前記第一の傾斜面
のなす角度より大きく形成するものである。更に、前記
チャンファ部の内面の傾斜角度を2段階とし、前記チャ
ンファ部のワイヤ導出口側傾斜面がなす角度を、前記チ
ャンファ部の先端側傾斜面がなす角度よりも小さくする
ものである。
The following is a brief description of an outline of typical inventions disclosed in the present application. That is, the semiconductor device has a through hole through which a bonding wire for electrically connecting an electrode pad provided on the semiconductor chip and an external lead is inserted, and a wire outlet having a diameter smaller than the diameter of the through hole at a tip end thereof. In a wire bonding technique using a capillary formed of a chamfer for joining the bonding wire to the electrode pad and the lead for external lead-out around the wire lead-out port, the depth of the wire lead-out port of the capillary is long. And the diameter of the wire outlet is equal to or greater than the depth of the wire outlet. Further, a first inclined surface forming the through hole inside the capillary and a second inclined surface extending from the first inclined surface to the wire outlet are provided, and an angle formed by the second inclined surface is It is formed to be larger than the angle formed by the first inclined surface. Further, the inclination angle of the inner surface of the chamfer portion is set to two stages, and the angle formed by the wire outlet side inclined surface of the chamfer portion is made smaller than the angle formed by the tip side inclined surface of the chamfer portion.

【0013】[0013]

【発明の実施の形態】以下、本発明の一実施例を図面に
従い説明する。図1にワイヤボンディング装置の概略を
示す。ワイヤボンディング装置1は、主に処理前の試
料、すなわちリードフレーム等の搭載基板を送り出すロ
ーダ2、処理済みの試料を受け取るアンローダ3、装置
をコントロールする制御部4、モニター5、結線用のボ
ンディングワイヤをボンディングするボンディングヘッ
ド6、ボンディング試料をセットするボンディングステ
ージ7等から構成される。ワイヤボンディング処理は、
半導体チップがマウントされたリードフレームをボンデ
ィングステージ7にセットし、ボンディングステージ7
とボンディングヘッド6とをX方向、Y方向、Z方向に
相対的に移動させることにより行われる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. FIG. 1 schematically shows a wire bonding apparatus. The wire bonding apparatus 1 mainly includes a loader 2 for sending out a sample before processing, that is, a mounting substrate such as a lead frame, an unloader 3 for receiving a processed sample, a control unit 4 for controlling the apparatus, a monitor 5, a bonding wire for connection. And a bonding stage 7 for setting a bonding sample. The wire bonding process
The lead frame on which the semiconductor chip is mounted is set on the bonding stage 7, and the bonding stage 7
And the bonding head 6 are relatively moved in the X, Y, and Z directions.

【0014】図2にボンディングヘッド6の斜視図を示
す。ボンディングヘッド6には、主に、半導体チップの
電極パッドと外部導出リードとを電気的に接続するため
の金あるいは銅からなるボンディングワイヤ12を通
し、先端部でボンディングワイヤ12に対し、押圧力及
び超音波振動等の外力を印加することにより、電極パッ
ド、外部導出リードにボンディングワイヤ12を接合す
るキャピラリ9と、キャピラリ9を固定し、押圧力及び
超音波振動をキャピラリ9を通して、ボンディングワイ
ヤ12に伝達するホーン8、ボンディングワイヤ12を
クランプするクランパ10、ボンディングワイヤ12の
先端に放電することによりボールを形成する放電トーチ
11とで構成されている。
FIG. 2 is a perspective view of the bonding head 6. A bonding wire 12 mainly made of gold or copper for electrically connecting an electrode pad of the semiconductor chip and an external lead is passed through the bonding head 6, and a pressing force and a pressing force are applied to the bonding wire 12 at the tip. By applying an external force such as ultrasonic vibration, the capillary 9 for bonding the bonding wire 12 to the electrode pad and the external lead, and the capillary 9 are fixed, and the pressing force and the ultrasonic vibration are applied to the bonding wire 12 through the capillary 9. It comprises a horn 8 for transmitting, a clamper 10 for clamping the bonding wire 12, and a discharge torch 11 for forming a ball by discharging to the tip of the bonding wire 12.

【0015】本発明では、キャピラリ9の内部及び先端
部をボンディングワイヤ形状にあわせた最適な圧着をす
ることができる形状としている。図4にその形状的特徴
を示す。キャピラリ9はその中心軸にボンディングワイ
ヤ12を挿通する貫通孔9a、その先端部に貫通口9a
の径より小径のワイヤ導出口9bが形成されている。ワ
イヤ導出口9bの周囲にはボンディングワイヤ12を電
極パッド14又は外部導出用リード15aに圧接せしめ
て接合するためのチャンファ部9cで構成され、ワイヤ
導出口9bの奥行きの長さhとワイヤ導出口9bの径H
とを、H≧hという関係で形成している。この様な形状
にすることにより、ボンディングワイヤ12とキャピラ
リとの接触面積を小さくできるため、接触抵抗を低減さ
せ、ボンディングワイヤ12のルーピングの安定化を図
ることができる。また、キャピラリ内部には貫通孔9a
を形成する第一の傾斜面9f及び第一の傾斜面9dから
ワイヤ導出口9bにかけての第二の傾斜面9gを設け、
第二の傾斜面9gのなす角度θ2が、第一の傾斜面9f
のなす角度θ1より大きくなるように形成している。こ
の場合、第一の傾斜面9fのなす角度θ1は1°から1
0°、第二の傾斜面9gの角度θ2は10°から20°
程度が好ましい。このような形状に形成することによ
り、キャピラリ9内部のスペースを大きくとることがで
き、キャピラリ9に挿通されたボンディングワイヤ12
を、第1ボンディング点、すなわち電極パッド14への
接続から第2ボンディング点、すなわち外部接続用リー
ド15aに接続するまでの繰り出し(以下ルーピングと
称する)において、ボンディングワイヤ12のキャピラ
リ9内での曲がり半径を大きく確保することができる。
従って、ボンディングワイヤ12とキャピラリ9の貫通
孔9aで生じる接触抵抗を小さくすることができる。ま
た、第二の傾斜面9gの角度θ2を設けたことにより、
キャピラリ先端幅THが小型化する場合、キャピラリ先
端部の機械強度を確保できる。本発明ではまた、キャピ
ラリ9の先端部、すなわちチャンファ部9cの内面のな
す傾斜角度を2段階とし、チャンファ部9cのワイヤ導
出口側傾斜面9dがなす角度θ3を先端側傾斜面9eが
なす角度θ4よりも小さくしている。この場合、ワイヤ
導出口側傾斜面9dがなす角度θ3は90°〜120
°、先端側傾斜面9eがなす角度θ4は60°〜100
°が好ましい。このような形状により、第2ボンディン
グ点におけるテールボンド部のボンディングワイヤの厚
さを厚く形成する。更に、ワイヤ導出口側傾斜面9dの
ボンディングワイヤの圧接面に垂直方向から投影した長
さL1と、先端側傾斜面9eをボンディングワイヤの圧
接面に垂直方向から投影した長さL2との比率を1:3
から3:1とすることで、半導体チップ13の電極パッ
ド14に接続するボール12aの大きさを上記の比率を
任意に変えることでコントロールできる。
In the present invention, the inside and the tip of the capillary 9 are shaped so as to be able to perform the optimal crimping according to the bonding wire shape. FIG. 4 shows the shape characteristics. The capillary 9 has a through hole 9a at its center axis through which the bonding wire 12 is inserted, and a through hole 9a at its tip.
A wire outlet 9b having a diameter smaller than the diameter of the wire is formed. Around the wire outlet 9b, a chamfer portion 9c for bonding the bonding wire 12 to the electrode pad 14 or the external lead 15a by pressing the bonding wire 12 is formed. The depth h of the wire outlet 9b and the wire outlet 9b are formed. 9b diameter H
Are formed in a relationship of H ≧ h. With such a shape, the contact area between the bonding wire 12 and the capillary can be reduced, so that the contact resistance can be reduced and the looping of the bonding wire 12 can be stabilized. Also, a through hole 9a is provided inside the capillary.
And a second inclined surface 9g extending from the first inclined surface 9f and the first inclined surface 9d to the wire outlet 9b.
The angle θ2 formed by the second inclined surface 9g is equal to the first inclined surface 9f.
Is formed so as to be larger than the angle θ1 formed. In this case, the angle θ1 formed by the first inclined surface 9f is from 1 ° to 1 °.
0 °, the angle θ2 of the second inclined surface 9g is 10 ° to 20 °
The degree is preferred. By forming such a shape, the space inside the capillary 9 can be increased, and the bonding wire 12 inserted through the capillary 9 can be formed.
At the first bonding point, that is, the connection from the electrode pad 14 to the second bonding point, that is, the connection to the external connection lead 15 a (hereinafter referred to as looping), the bending of the bonding wire 12 in the capillary 9. A large radius can be secured.
Therefore, the contact resistance generated between the bonding wire 12 and the through hole 9a of the capillary 9 can be reduced. Also, by providing the angle θ2 of the second inclined surface 9g,
In the case where the capillary tip width TH is reduced, mechanical strength of the capillary tip can be ensured. In the present invention, the tip end portion of the capillary 9, that is, the inclination angle formed by the inner surface of the chamfer portion 9c is made into two stages, and the angle θ3 formed by the wire outlet side inclined surface 9d of the chamfer portion 9c is formed by the tip side inclined surface 9e It is smaller than θ4. In this case, the angle θ3 formed by the wire outlet side inclined surface 9d is 90 ° to 120 °.
°, the angle θ4 formed by the tip-side inclined surface 9e is 60 ° to 100 °.
° is preferred. With such a shape, the thickness of the bonding wire at the tail bond portion at the second bonding point is formed thick. Further, the ratio of the length L1 of the wire outlet opening side inclined surface 9d projected from the vertical direction to the pressure contact surface of the bonding wire to the length L2 of the distal end inclined surface 9e projected from the vertical direction to the pressure contact surface of the bonding wire is defined as the ratio. 1: 3
By setting the ratio to 3: 1, the size of the ball 12a connected to the electrode pad 14 of the semiconductor chip 13 can be controlled by arbitrarily changing the above ratio.

【0016】以下、本発明のワイヤボンディング方法に
ついて、図3及び図5乃至図7を用いて説明する。ま
ず、キャピラリ9先端部から繰り出されたボンディング
ワイヤ12の先端に、放電トーチ11によってボール1
2aを形成する。この場合、ワイヤ導出口側傾斜面9d
のボンディングワイヤの圧接面に垂直方向から投影した
長さL1と、先端側傾斜面9eをボンディングワイヤの
圧接面に垂直方向から投影した長さL2との比率を1:
3から3:1としているので、半導体チップ13の電極
パッド14に接続するボール12aの大きさを、上記の
範囲内でL1とL2との比率を任意に変えることでコン
トロールできる。
Hereinafter, the wire bonding method of the present invention will be described with reference to FIG. 3 and FIGS. First, the ball 1 is attached to the tip of the bonding wire 12 drawn out from the tip of the capillary 9 by the discharge torch 11.
2a is formed. In this case, the wire outlet side inclined surface 9d
The ratio of the length L1 projected from the perpendicular direction to the pressure contact surface of the bonding wire to the length L2 projected from the perpendicular direction to the pressure contact surface of the bonding wire 9e is 1:
Since the ratio is 3 to 3: 1, the size of the ball 12a connected to the electrode pad 14 of the semiconductor chip 13 can be controlled by arbitrarily changing the ratio between L1 and L2 within the above range.

【0017】次に、キャピラリ9を降下させて、図5に
示すようにボール12aをリードフレーム15等の半導
体チップ搭載基板に搭載された半導体チップ13の電極
パッド14にボール12aを押圧及び超音波振動(例え
ば超音波周波数60KHz程度)を印加し、ボール12
aを第1ボンド点、すなわち電極パッド14に接合させ
る。この際、ボール12aはキャピラリ9の押圧力によ
りある程度潰れるが、印加する超音波周波数を増加させ
ることにより、エネルギーが効率良く伝わるため、ボー
ルの潰れ幅を小さくすることができる。ボールの潰れ幅
を小さくする場合の超音波周波数は例えば100KHz
以上が好ましい。
Next, the capillary 9 is lowered, and as shown in FIG. 5, the ball 12a is pressed against the electrode pad 14 of the semiconductor chip 13 mounted on the semiconductor chip mounting substrate such as the lead frame 15 and the ultrasonic wave is applied. Vibration (for example, an ultrasonic frequency of about 60 KHz) is applied to the ball 12
a is bonded to the first bond point, that is, the electrode pad 14. At this time, the ball 12a is crushed to some extent by the pressing force of the capillary 9, but the energy is transmitted efficiently by increasing the applied ultrasonic frequency, so that the crushing width of the ball can be reduced. The ultrasonic frequency for reducing the crush width of the ball is, for example, 100 KHz.
The above is preferred.

【0018】次に、ボール12aを第1ボンディング点
である電極パッド14に接合させたままの状態でキャピ
ラリ9をX方向、Y方向、Z方向へ半導体チップ搭載基
板15と相対的に移動させて、第2ボンディング点、す
なわち外部導出用リード15aにボンディングワイヤ1
2を接合させる。この際、キャピラリ9の、ワイヤ導出
口9bの奥行きの長さhとワイヤ導出口9bの径Hと
を、H≧hという関係で形成していることから、ボンデ
ィングワイヤ12とキャピラリとの接触面積を小さくで
きるため、キャピラリ9が移動する際の接触抵抗を低減
させ、ボンディングワイヤ12のルーピングの安定化を
図ることができる。また、キャピラリ内部には貫通孔9
aを形成する第一の傾斜面9f及び第一の傾斜面9fか
らワイヤ導出口9bにかけての第二の傾斜面9gを設
け、第二の傾斜面9gのなす角度θ2が、第一の傾斜面
9fのなす角度θ1より大きく形成し貫通孔9aのスペ
ースを大きくとっているので、ルーピングにおいて、図
6に示すように、ボンディングワイヤ12のキャピラリ
9内での曲がり半径rを大きく確保することができる。
従って、ボンディングワイヤ12とキャピラリ9の貫通
孔9aで生じる接触抵抗を小さくすることができる。
Next, the capillary 9 is moved relative to the semiconductor chip mounting substrate 15 in the X, Y, and Z directions while the ball 12a remains bonded to the electrode pad 14, which is the first bonding point. , The second bonding point, that is, the bonding wire 1
2 are joined. At this time, since the depth h of the wire outlet 9b and the diameter H of the wire outlet 9b of the capillary 9 are formed in a relationship of H ≧ h, the contact area between the bonding wire 12 and the capillary is formed. Therefore, the contact resistance when the capillary 9 moves can be reduced, and the looping of the bonding wire 12 can be stabilized. Also, a through hole 9 is provided inside the capillary.
a of the first inclined surface 9f and the second inclined surface 9g extending from the first inclined surface 9f to the wire outlet 9b, and the angle θ2 formed by the second inclined surface 9g is equal to the first inclined surface 9g. Since the angle θ1 is larger than the angle θ1 and the space of the through hole 9a is large, a large bending radius r of the bonding wire 12 in the capillary 9 can be secured in the looping as shown in FIG. .
Therefore, the contact resistance generated between the bonding wire 12 and the through hole 9a of the capillary 9 can be reduced.

【0019】外部導出用リード15aにボンディングワ
イヤ12を接合させる際は、図7に示すように、チャン
ファ部9cの内面のなす傾斜角度を2段階とし、チャン
ファ部9cのワイヤ導出口側傾斜面9dがなす角度θ3
を先端側傾斜面9eがなす角度θ4よりも小さくしてい
るので、第2ボンディング点におけるテールボンド部の
ボンディングワイヤの厚さtを厚く形成することができ
る。これにより、ボンディングワイヤ12を外部導出用
リード15aから切り離した後で、テールワイヤにボー
ルを確実に形成することができ、ボールが形成できずに
ワイヤがキャピラリから抜けてしまうという所謂テール
ワイヤ断線不良が解消される。
When bonding the bonding wire 12 to the external lead 15a, as shown in FIG. 7, the inner surface of the chamfer portion 9c has two inclination angles, and the inclined surface 9d of the chamfer portion 9c at the wire outlet opening side. Angle θ3
Is smaller than the angle θ4 formed by the front-end-side inclined surface 9e, so that the thickness t of the bonding wire at the tail bonding portion at the second bonding point can be increased. As a result, after the bonding wire 12 is separated from the external lead-out lead 15a, the ball can be reliably formed on the tail wire, and the ball cannot be formed and the wire comes off from the capillary, so-called tail wire disconnection defect. Is eliminated.

【0020】最後にボンディングワイヤ12をクランパ
10でクランプさせたままキャピラリ9及びボンディン
グワイヤ12を上昇させてボンディングワイヤ12を接
合部から切り離すことにより、ボール12aを形成する
前のテールワイヤ12bを形成する。この際、貫通孔9
aのスペースを大きくとっていることによりボンディン
グワイヤ12のキャピラリ9内での曲がり半径rを大き
く確保しているので、テールワイヤの折れ曲がり量を小
さくできる。従って、次に放電トーチで形成するボール
の形状及び大きさが安定する。以上で1サイクルのワイ
ヤボンディング動作が終了し、これらの動作を、電気的
接続を行うべきピン数分繰り返し、ワイヤボンディング
工程が終了する。その後封止、切断・成形、エージン
グ、マーク、選別等の工程を経て、半導体装置が完成す
る。
Finally, while the bonding wire 12 is clamped by the clamper 10, the capillary 9 and the bonding wire 12 are raised to separate the bonding wire 12 from the bonding portion, thereby forming the tail wire 12b before forming the ball 12a. . At this time, the through holes 9
Since the bending radius “r” of the bonding wire 12 in the capillary 9 is increased by increasing the space “a”, the bending amount of the tail wire can be reduced. Therefore, the shape and size of the ball formed by the discharge torch are stabilized. Thus, one cycle of the wire bonding operation is completed. These operations are repeated for the number of pins to be electrically connected, and the wire bonding process is completed. Thereafter, the semiconductor device is completed through processes such as sealing, cutting / molding, aging, marking, and sorting.

【0021】[0021]

【発明の効果】本願において開示される発明のうち代表
的なものによって得られる効果を簡単に説明すれば、下
記の通りである。
The effects obtained by typical ones of the inventions disclosed in the present application will be briefly described as follows.

【0022】(1)キャピラリのワイヤ導出口の奥行き
の長さとワイヤ導出口の径とを、H≧hという関係で形
成していることから、ボンディングワイヤとキャピラリ
との接触面積を小さくできるため、キャピラリが移動す
る際の接触抵抗を低減させ、ボンディングワイヤのルー
ピングの安定化を図ることができる。
(1) Since the depth of the wire outlet of the capillary and the diameter of the wire outlet are formed in a relationship of H ≧ h, the contact area between the bonding wire and the capillary can be reduced. The contact resistance when the capillary moves can be reduced, and the looping of the bonding wire can be stabilized.

【0023】(2)キャピラリ内部に貫通孔を形成する
第一の傾斜面及び第一の傾斜面からワイヤ導出口にかけ
ての第二の傾斜面を設け、第二の傾斜面のなす角度が第
一の傾斜面のなす角度より大きく形成されていることか
ら、貫通孔のスペースを大きくとっているので、ルーピ
ングにおいてボンディングワイヤのキャピラリ内での曲
がり半径を大きく確保することができる。従って、ボン
ディングワイヤとキャピラリの貫通孔で生じる接触抵抗
を小さくすることができる。また、ボンディングワイヤ
のキャピラリ9内での曲がり半径rを大きく確保できる
ので、テールワイヤの折れ曲がり量を小さくできる。従
って、次に放電トーチで形成するボールの形状及び大き
さが安定する。
(2) A first inclined surface forming a through-hole inside the capillary and a second inclined surface extending from the first inclined surface to the wire outlet are provided, and the angle formed by the second inclined surface is first. Since the angle is larger than the angle formed by the inclined surface, the space for the through hole is increased, so that a large bending radius of the bonding wire in the capillary can be ensured in looping. Therefore, the contact resistance generated between the bonding wire and the through hole of the capillary can be reduced. Further, since the bending radius r of the bonding wire in the capillary 9 can be ensured to be large, the amount of bending of the tail wire can be reduced. Therefore, the shape and size of the ball formed by the discharge torch are stabilized.

【0024】(3)チャンファ部の内面のなす傾斜角度
を2段階とし、チャンファ部のワイヤ導出口側傾斜面が
なす角度を先端側傾斜面がなす角度よりも大きくしてい
るので、第2ボンディング点におけるテールボンド部の
ボンディングワイヤの厚さを厚く形成することができ
る。これにより、ボンディングワイヤを外部導出用リー
ドから切り離した後で、テールワイヤにボールを確実に
形成することができ、ボールが形成できずにワイヤがキ
ャピラリから抜けてしまうという所謂テールワイヤ断線
不良が解消される。
(3) Since the inclination angle formed by the inner surface of the chamfer portion is made into two steps, and the angle formed by the inclined surface on the wire outlet opening side of the chamfer portion is made larger than the angle formed by the tip side inclined surface, the second bonding is performed. The thickness of the bonding wire at the tail bond portion at the point can be formed thick. As a result, the ball can be reliably formed on the tail wire after the bonding wire is cut off from the lead-out lead, and the so-called tail wire disconnection failure in which the ball cannot be formed and the wire comes off from the capillary is solved. Is done.

【図面の簡単な説明】[Brief description of the drawings]

【図1】ワイヤボンディング装置の概略図である。FIG. 1 is a schematic diagram of a wire bonding apparatus.

【図2】ワイヤボンディング装置におけるボンディング
ヘッドの斜視図である。
FIG. 2 is a perspective view of a bonding head in the wire bonding apparatus.

【図3】ワイヤボンディング動作を示す図である。FIG. 3 is a diagram showing a wire bonding operation.

【図4】本発明に用いられるキャピラリ先端部の形状的
特徴を示す断面図である。
FIG. 4 is a cross-sectional view showing a shape characteristic of a tip portion of a capillary used in the present invention.

【図5】本発明のキャピラリを用いてボールを電極パッ
ドに接合した状態を示す図である。
FIG. 5 is a diagram showing a state in which a ball is bonded to an electrode pad using the capillary of the present invention.

【図6】本発明のキャピラリがルーピングを行う際のボ
ンディングワイヤの状態を示す図である。
FIG. 6 is a diagram illustrating a state of a bonding wire when the capillary of the present invention performs looping.

【図7】本発明のキャピラリを用いてボンディングワイ
ヤを外部接続用リードに接合した状態を示す図である。
FIG. 7 is a diagram showing a state in which a bonding wire is joined to an external connection lead using the capillary of the present invention.

【符号の説明】[Explanation of symbols]

1……ワイヤボンディング装置、2……ローダ、3……
アンローダ、4……制御部、5……モニター、6……ボ
ンディングヘッド、7……ボンディングステージ、8…
…ホーン、9……キャピラリ、9a……貫通孔、9b…
…ワイヤ導出口、9c……チャンファ部、9d……ワイ
ヤ導出口側傾斜面、9e……先端側傾斜面、9f……第
一の傾斜面、9g……第二の傾斜面、10……クラン
パ、11……放電トーチ、12……ボンディングワイ
ヤ、12a……ボール、12b……テールワイヤ、13
……半導体チップ、14……電極パッド、15……半導
体チップ搭載基板、15a……外部導出用リード
1 ... wire bonding device, 2 ... loader, 3 ...
Unloader, 4 Control unit, 5 Monitor, 6 Bonding head, 7 Bonding stage, 8
... Horn, 9 ... Capillary, 9a ... Through-hole, 9b ...
... wire outlet 9c ... chamfer part 9d ... wire outlet side inclined surface 9e ... tip side inclined surface 9f ... first inclined surface 9g ... second inclined surface 10 ... Clamper, 11 discharge torch, 12 bonding wire, 12a ball, 12b tail wire, 13
... Semiconductor chip, 14 ... Electrode pad, 15 ... Semiconductor chip mounting board, 15a ... External lead

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】半導体チップに設けられた電極パッドと外
部導出用リードとを電気的に接続するボンディングワイ
ヤを挿通する貫通孔及びその先端部に前記貫通孔の径よ
り小径のワイヤ導出口を有し、該ワイヤ導出口の周囲に
は前記ボンディングワイヤを前記電極パッド及び前記外
部導出用リードに接合させるためのチャンファ部で構成
されたキャピラリを有するワイヤボンディング装置であ
って、前記ワイヤ導出口の奥行きの長さと前記ワイヤ導
出口の径とが等しいか又は前記ワイヤ導出口の径がワイ
ヤ導出口の奥行きの長さより大きく形成されていること
を特徴とするワイヤボンディング装置。
1. A through hole through which a bonding wire for electrically connecting an electrode pad provided on a semiconductor chip and an external lead is inserted, and a wire outlet having a diameter smaller than the diameter of the through hole at a tip end thereof. A wire bonding apparatus having a capillary formed around a chamfer for joining the bonding wire to the electrode pad and the lead for external lead-out around the wire lead-out opening, wherein a depth of the wire lead-out opening is The wire bonding apparatus is characterized in that the length of the wire outlet is equal to the length of the wire outlet or the diameter of the wire outlet is larger than the depth of the wire outlet.
【請求項2】半導体チップに設けられた電極パッドと外
部導出用リードとを電気的に接続するボンディングワイ
ヤを挿通する貫通孔及びその先端部に前記貫通口の径よ
り小径のワイヤ導出口を有し、該ワイヤ導出口の周囲に
は前記ボンディングワイヤを前記電極パッド又は前記外
部導出用リードに圧接せしめて接続するためのチャンフ
ァ部で構成されたキャピラリを有するワイヤボンディン
グ装置であって、前記キャピラリ内部には貫通孔を形成
する第一の傾斜面及び該第一の傾斜面から前記ワイヤ導
出口にかけての第二の傾斜面を設け、前記第二の傾斜面
のなす角度が、前記第一の傾斜面のなす角度より大きく
形成されていることを特徴とするワイヤボンディング装
置。
2. A through hole through which a bonding wire for electrically connecting an electrode pad provided on a semiconductor chip and an external lead is inserted, and a wire outlet having a diameter smaller than the diameter of the through hole at a tip end thereof. A wire bonding apparatus having a capillary formed around a chamfer for connecting the bonding wire to the electrode pad or the external lead-out lead by pressing the bonding wire around the wire lead-out opening; A first inclined surface forming a through hole and a second inclined surface extending from the first inclined surface to the wire outlet are provided, and the angle formed by the second inclined surface is the first inclined surface. A wire bonding apparatus characterized in that the wire bonding apparatus is formed so as to be larger than the angle between the surfaces.
【請求項3】前記第一の傾斜面のなす角度は1°から1
0°、前記第二の傾斜面のなす角度は10°から20°
に形成されていることを特徴とする請求項2記載のワイ
ヤボンディング装置。
3. An angle formed by the first inclined surface is from 1 ° to 1 °.
0 °, the angle between the second inclined surface is 10 ° to 20 °
3. The wire bonding apparatus according to claim 2, wherein the wire bonding apparatus is formed with a wire.
【請求項4】半導体チップに設けられた電極パッドと外
部導出用リードとを電気的に接続するボンディングワイ
ヤを挿通する貫通孔及びその先端部に前記貫通孔の径よ
り小径のワイヤ導出口を有し、該ワイヤ導出口の周囲に
は前記ボンディングワイヤを前記電極パッド又は前記外
部導出用リードに圧接せしめて接続するためのチャンフ
ァ部で構成されたキャピラリをを有するワイヤボンディ
ング装置であって、前記チャンファ部の内面の傾斜角度
を2段階とし、前記チャンファ部のワイヤ導出口側傾斜
面がなす角度を、前記チャンファ部の先端側傾斜面がな
す角度よりも小さくしたことを特徴するワイヤボンディ
ング装置。
4. A through hole through which a bonding wire for electrically connecting an electrode pad provided on a semiconductor chip and an external lead is inserted, and a wire outlet smaller in diameter than the through hole at a tip end thereof. A wire bonding apparatus having a capillary formed around a chamfer portion around the wire lead-out opening for connecting the bonding wire to the electrode pad or the external lead-out lead by pressing. A wire bonding apparatus characterized in that the inclination angle of the inner surface of the section is made into two stages, and the angle formed by the inclined surface on the wire outlet side of the chamfer section is made smaller than the angle formed by the inclined surface on the tip side of the chamfer section.
【請求項5】前記チャンファ部の先端側傾斜面がなす角
度は60°から100°、前記チャンファ部のワイヤ導
出口側傾斜面がなす角度は90°から120°であるこ
とを特徴とする請求項4記載のワイヤボンディング装
置。
5. An angle formed by the inclined surface on the distal end side of the chamfer portion is from 60 ° to 100 °, and an angle formed by the inclined surface on the wire outlet opening side of the chamfer portion is from 90 ° to 120 °. Item 5. The wire bonding apparatus according to Item 4.
【請求項6】前記チャンファー部ワイヤ導出口側傾斜面
を前記ボンディングワイヤの圧接面に垂直方向から投影
した長さと、前記チャンファ部の先端側傾斜面を前記ボ
ンディングワイヤの圧接面に垂直方向から投影した長さ
との比率を1:3から3:1としたことを特徴とする請
求項4又は5記載のワイヤボンディング装置。
6. A length of the chamfer portion wire outlet opening side inclined surface projected from a direction perpendicular to the pressure contact surface of the bonding wire, and a tip side inclined surface of the chamfer portion is projected from a direction perpendicular to the pressure contact surface of the bonding wire. 6. The wire bonding apparatus according to claim 4, wherein a ratio of the length to the projected length is from 1: 3 to 3: 1.
【請求項7】請求項1乃至6記載のワイヤボンディング
装置のいずれか1項を用いた半導体装置の製造方法。
7. A method for manufacturing a semiconductor device using any one of the wire bonding apparatuses according to claim 1.
JP35050797A 1997-12-19 1997-12-19 Wire-bonding device and manufacture of semiconductor device using thereof Pending JPH11186315A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35050797A JPH11186315A (en) 1997-12-19 1997-12-19 Wire-bonding device and manufacture of semiconductor device using thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35050797A JPH11186315A (en) 1997-12-19 1997-12-19 Wire-bonding device and manufacture of semiconductor device using thereof

Publications (1)

Publication Number Publication Date
JPH11186315A true JPH11186315A (en) 1999-07-09

Family

ID=18410970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35050797A Pending JPH11186315A (en) 1997-12-19 1997-12-19 Wire-bonding device and manufacture of semiconductor device using thereof

Country Status (1)

Country Link
JP (1) JPH11186315A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6715658B2 (en) * 2001-07-17 2004-04-06 Kulicke & Soffa Investments, Inc. Ultra fine pitch capillary
WO2005018864A3 (en) * 2003-08-12 2005-04-28 Kulicke & Soffa Investments Capillary with contained inner chamfer
US7124927B2 (en) 1999-02-25 2006-10-24 Reiber Steven F Flip chip bonding tool and ball placement capillary
US7389905B2 (en) 1999-02-25 2008-06-24 Reiber Steven F Flip chip bonding tool tip
CN102779768A (en) * 2011-05-13 2012-11-14 瑞萨电子株式会社 Semiconductor device and a manufacturing method thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7124927B2 (en) 1999-02-25 2006-10-24 Reiber Steven F Flip chip bonding tool and ball placement capillary
US7389905B2 (en) 1999-02-25 2008-06-24 Reiber Steven F Flip chip bonding tool tip
US6715658B2 (en) * 2001-07-17 2004-04-06 Kulicke & Soffa Investments, Inc. Ultra fine pitch capillary
US6910612B2 (en) 2001-07-17 2005-06-28 Kulicke & Soffa Investments, Inc. Capillary with contained inner chamfer
US7004369B2 (en) 2001-07-17 2006-02-28 Kulicke & Soffa Investments, Inc. Capillary with contained inner chamfer
WO2005018864A3 (en) * 2003-08-12 2005-04-28 Kulicke & Soffa Investments Capillary with contained inner chamfer
CN102779768A (en) * 2011-05-13 2012-11-14 瑞萨电子株式会社 Semiconductor device and a manufacturing method thereof
JP2012238814A (en) * 2011-05-13 2012-12-06 Renesas Electronics Corp Semiconductor device and manufacturing method therefor
US9230937B2 (en) 2011-05-13 2016-01-05 Renesas Electronics Corporation Semiconductor device and a manufacturing method thereof

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