JPH10200239A - Formation of transfer sheet and pattern - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for forming a transfer sheet and a pattern which is suited for formation of such a pattern of high accuracy as an electrode layer, a dielectric layer and a barrier layer in a process for manufacturing a plasma display panel, an image display device, a thermal head and an integrated circuit, etc., and in which manufacturing time is shortened, yield is improved, surface smoothness is excellent, film thickness is uniform, and distribution accuracy is excellent. SOLUTION: In this transfer sheet, a recessed-shaped pattern part 12 on a base film 11 in which a recessed-shaped pattern is formed on one surface is filled with an ink layer 13 comprising at a least inorganic component of glass frit and resin a component removed by baking. And a second ink layer may be laminated on the recessed-shaped pattern filled with the ink layer, and further a third ink layer may be laminated on the second ink layer. And in this method for forming the pattern, the transfer sheet is laminated on a to-be-transferred body from the ink layer side to transfer the recessed-shaped pattern onto the recessed-shaped pattern, and then the to-be-transferred body having the recessed-shaped pattern is baked.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode layer and a dielectric layer in a plasma display panel (hereinafter, PDP), a field emission display (FED), a liquid crystal display (LCD), a fluorescent display, a hybrid integrated circuit, and the like. The present invention relates to a transfer sheet and a pattern forming method suitable for forming a high-precision pattern such as a barrier layer.

[0002]

2. Description of the Related Art Conventionally, as a method of forming a pattern of this kind, a conductor or an ink for an insulator is applied in a pattern by screen printing on a substrate such as glass or ceramics and then adhered to the substrate through a firing step. A method for forming a thick film pattern is known. In this method, for example, in order to form a thin line having a line width of 100 μm and a height of 100 μm, the overprinting is repeated a plurality of times.

[0003] However, the method of forming a pattern by pattern printing many times by screen printing is the first method.
In addition, the expansion and contraction of the screen used for printing is inevitable,
Actually, since various patterns are almost always formed by being overlapped, misalignment with other patterns is likely to occur. Secondly, since the screen is used for the plate, pattern distortion occurs. Third, it is difficult to form a fine pattern easily. Third, since the pattern forming material causes a backflow to the screen plate, wiping is required every time, and automation is difficult. Fourth, it can be formed by a screen printing method. The pattern dimension is limited to a width of about 100 μm, and the shape is the ratio of the half width to the bottom width (half width / bottom width, where the half width is the pattern at half the height of the pattern forming layer). Is about 0.5, for example, in the case of a barrier layer in a PDP that needs to be applied to a thickness of about 150 to 200 μm in a dry state,
Since the bottom area must be large, a fine pattern cannot be formed, and it cannot be formed at once,
Lamination is performed while sequentially performing alignment, but there is a problem that it is difficult to improve the positional accuracy. In addition, due to the fluidity of the ink, the hem spreads out, a thick film pattern with a high aspect ratio cannot be formed, and since it is an open system, it is difficult to control conditions such as prevention of foreign matter from being mixed. At present, it takes a lot of time.

As another method, a pattern forming layer is formed on a substrate by screen printing a number of times by solid printing, then a sand blast mask is formed on the pattern forming layer with a photosensitive resist, and then an abrasive is applied. A so-called sand blast method of performing patterning of a pattern forming layer by spraying is known.

However, also in the method of forming a pattern using the sandblasting method, when the pattern forming layer is formed by screen printing, the overprinting process takes a long time and the condition management is difficult because of the open system. There is a problem. Further, it is necessary to perform patterning after repeating application and drying for each pattern layer to be formed, which leads to a problem that equipment costs are increased and a space for those devices is increased.

[0006]

A first object of the present invention is to provide an image display device such as a PDP or a liquid crystal, a thermal head,
An object of the present invention is to provide a transfer sheet suitable for forming a fine pattern such as an electrode, a resistor, and a barrier in an integrated circuit or the like.

A second object of the present invention is to provide a pattern forming method capable of shortening the manufacturing time and improving the yield, having excellent surface smoothness, having a uniform film thickness and good distribution accuracy. is there.

[0008]

A first transfer sheet according to the present invention comprises, in a concave portion of a base film having a concave pattern formed on one surface thereof, at least an inorganic component composed of glass frit and a resin component removed by firing. Characterized by being filled with an ink layer consisting of

The first transfer sheet is a transfer sheet for producing a plasma display panel, and the ink layer is an electrode forming layer.

A conductive ink layer comprising at least an inorganic component composed of glass frit and a resin component removed by firing, or a dark conductive ink layer containing a dark pigment in the conductive ink layer; Alternatively, it is characterized by comprising a laminate of the conductive ink layer and the dark conductive ink layer.

The first transfer sheet is a transfer sheet for producing a plasma display panel, and the ink layer is a barrier forming layer.

The barrier-forming layer in the first transfer sheet is a white ink layer or a dark ink layer, or a white ink layer and a dark ink layer, each of which comprises at least an inorganic component made of glass frit and a resin component removed by firing. Characterized by being laminated.

[0013] The second transfer sheet of the present invention has a first ink comprising at least an inorganic component composed of glass frit and a resin component removed by firing in a concave portion of a base film having a concave pattern formed on one surface. The first ink layer was filled, and the second ink layer consisting of at least the inorganic component consisting of glass frit and the resin component removed by firing was laminated on the concave pattern filled with the first ink layer. Features.

The second transfer sheet is a transfer sheet for producing a plasma display panel, wherein the first ink layer is an electrode forming layer and the second ink layer is a base forming layer.

[0015] The second transfer sheet is a transfer sheet for producing a plasma display panel, wherein the first ink layer is a barrier forming layer, and the second ink layer is a dielectric forming layer.

[0016] The barrier-forming layer in the second transfer sheet is a white ink layer or a dark ink layer, or a white ink layer and a dark ink layer, each of which comprises at least an inorganic component made of glass frit and a resin component removed by firing. Characterized by being laminated.

The third transfer sheet of the present invention has a first ink comprising at least an inorganic component composed of glass frit and a resin component removed by firing in a concave portion of a base film having a concave pattern formed on one surface. While the layer is filled, a second ink layer made of at least an inorganic component made of glass frit and a resin component removed by firing is laminated on the concave pattern filled with the first ink layer, On the second ink layer, a third
Wherein the ink layers are laminated.

The third transfer sheet is a transfer sheet for producing a plasma display panel, and the first ink layer is a white ink layer or a dark ink layer comprising at least an inorganic component composed of glass frit and a resin component removed by firing. Or a barrier forming layer formed by laminating a white ink layer and a dark ink layer, the second ink layer is a dielectric forming layer, and the third ink layer is an electrode forming layer.

According to the first pattern forming method of the present invention, a concave portion of a base film having a concave pattern formed on one surface is filled with an ink layer composed of at least an inorganic component composed of glass frit and a resin component removed by firing. The obtained transfer sheet is laminated on the transfer object from the ink layer side, the ink layer is transferred to the transfer object, and the transfer object on which the ink layer has been transferred is baked.

According to a second pattern forming method of the present invention, a first pattern comprising at least an inorganic component composed of glass frit and a resin component removed by firing is provided in a concave portion of a base film having a concave pattern formed on one surface. A transfer sheet in which an ink layer is filled and a second ink layer comprising at least an inorganic component made of glass frit and a resin component removed by firing is laminated on the concave pattern, is coated from the second ink layer side. The method is characterized in that the first and second ink layers are simultaneously transferred by lamination on a transfer member, and the transfer member on which the first and second ink layers have been transferred is baked.

According to a third pattern forming method of the present invention, in a concave portion of a base film having a concave pattern formed on one surface, a first component comprising at least an inorganic component composed of glass frit and a resin component removed by firing. While the ink layer is filled, a second ink layer made of at least an inorganic component made of glass frit and a resin component removed by firing is laminated on the concave pattern, and a second ink layer made of a resin component removed by firing is further formed on the second ink layer. The transfer sheet on which the third ink layer is laminated is laminated on the transfer object from the third ink layer side, and the first to third ink layers are simultaneously transferred.
The method is characterized in that the object to which the third ink layer has been transferred is baked.

The above pattern forming method is a plasma display panel forming method, wherein the object to be transferred is a plasma display panel substrate, and the ink layer pattern is a plasma display panel member pattern.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The transfer sheet and the pattern forming method of the present invention will be described below by taking PDP production as an example. The AC type PDP is, for example, as shown in FIG.
Two glass substrates 1 and 2 are arranged in parallel and opposed to each other, and both are held at a fixed interval by a cell barrier 3 provided in parallel with each other on a glass substrate 2 serving as a back plate. I have. On the back side of the glass substrate 1 serving as the front plate, a composite electrode composed of a transparent electrode 4 serving as a discharge sustaining electrode and a metal electrode 5 serving as a bus electrode is formed in parallel with each other. A layer 6 is formed, and a protective layer (MgO layer) is further formed thereon. In addition, address electrodes 8 are formed on the front side of the glass substrate 2 serving as the back plate and between the cell barriers 3 so as to be perpendicular to the composite electrode with the address electrodes 8 formed in parallel with each other. A fluorescent screen 9 is provided so as to cover the wall surface and the cell bottom.

Further, as shown in FIG. 15, after a base layer 10 is formed on a glass substrate 2 serving as a back plate, an address electrode 8, a dielectric layer 6 ', a cell barrier 3, and a phosphor surface 9 are sequentially provided. In some cases.

The AC type PDP is of a surface discharge type, and has a structure in which an AC voltage is applied between the composite electrodes on the front plate to discharge by an electric field leaking into the space. In this case, since the alternating current is applied, the direction of the electric field changes according to the frequency. Then, the phosphor 9 is caused to emit light by the ultraviolet rays generated by the discharge, and the light transmitted through the front plate can be visually recognized by an observer. It should be noted that the DC type PDP is different in that the electrodes have a structure not covered with a dielectric layer, but the discharge phenomenon is the same.

FIG. 1 is a sectional view of a base film on which a concave pattern is formed, FIG. 2 is a sectional view of a first transfer sheet of the present invention, and FIGS. 3 and 4 are sectional views of the present invention. FIG. 3 is a diagram for explaining a first pattern forming method. In the figure, reference numeral 11 denotes a base film, 12 denotes a concave pattern, 13 denotes an ink layer, and 14 denotes an object to be transferred.

The base film 11 is required not to be affected by the solvent in the ink layer and not to be contracted and stretched by the heat treatment during the process. Examples of the polymer material include polyethylene terephthalate and 1,4-polycyclohexyl. Silylene methylene terephthalate, polyethylene naphthalate, polyphenylene sulfide, polystyrene, polypropylene, polysulfone, aramid,
Polycarbonate, polyvinyl alcohol, cellophane,
Cellulose derivatives such as cellulose acetate, polyethylene,
Films and sheets such as polyvinyl chloride, nylon, polyimide, and ionomer; metal and alloy sheets such as aluminum, copper, and invar materials (36Ni-Fe alloy and 42Ni-Fe alloy); and glass and inorganic materials. A ceramic sheet or a composite sheet of these may be used. In particular, when a composite sheet is used as a composite sheet, a laminated sheet composed of a polymer film and a ceramic sheet or a metal sheet having a small thermal deformation is flexible, has high mechanical strength,
This is preferable because a sheet having small thermal deformation can be obtained. Also,
A porous film that allows gas to pass but not liquid (ink component) may be used. In this case, the concave portion of the concave pattern is filled with a pattern forming material, and the base film is transferred to the transfer target. By sending air from the back side of the substrate, the releasability of the filled pattern forming material can be improved, and the transferability of the ink layer can be improved. The film thickness of the base film is 10 μm to 500 μm.
μm, preferably 20 μm to 300 μm.

The concave pattern 12 has a shape corresponding to an electrode, a barrier pattern, and the like produced by using the first transfer sheet of the present invention. Although the shape of the concave portion in the concave pattern may be a square cross section, FIG.
As shown in the figure, the base film is preferably formed to have a trapezoidal cross section with the long side as the long side, so that transferability can be improved. The depth of the concave portion is 5 μm to 50 μm when the concave pattern is an electrode pattern, 100 μm to 200 μm when a barrier pattern is used, and 5 μm to 50 μm when a base pattern is used. Is about 5 μm to 50 μm.

The method of forming the concave pattern is as follows (1)
After filling the intaglio or roll intaglio with a curable resin, for example, ionizing radiation-curable resin, ionizing radiation-degradable resin, thermosetting resin, etc., or an ink composed of a thermoplastic resin, the ink is transferred to a base film to form a concave shape. How to form a pattern,
(2) A method in which an ink composed of an ionizing radiation-curable resin (negative type) and an ionizing radiation-disintegrating resin (positive type) is solid-coated on a base film, and then a concave pattern is formed by photolithography. (3) The base film Examples thereof include a method of forming the surface of the film itself by embossing or etching, and a method of molding a polymer film so as to have a concave pattern on the surface.

Examples of the ionizing radiation curable resin include an ultraviolet ray or an electron beam curable resin, and a prepolymer, an oligomer and / or a monomer having a polymerizable unsaturated bond or an epoxy group in a molecule are appropriately mixed. Compositions can be used.

Examples of the prepolymer and oligomer include unsaturated polyesters such as condensates of unsaturated dicarboxylic acids and polyhydric alcohols, epoxy resins, polyester methacrylates, polyether methacrylates, polyol methacrylates, polyglycidyl methacrylates, and chloromethylated polynaphthyl. Methacrylates such as methacrylate, acrylates such as polyester acrylate, polyether acrylate, and polyol acrylate, and others, chloromethylated polystyrene, chlorinated polymethylstyrene, iodinated polystyrene, polymethacrylate-maleic acid copolymer, polyglycidyl methacrylate- Ethyl acrylate copolymer, glycidyl methacrylate-styrene copolymer, epoxidized polybutadiene, polydiallyl phthalate , Partially chlorinated polyvinyl toluene, chloromethylated polydiphenylsiloxane and the like.

Examples of the monomer include a compound having at least one polymerizable carbon-carbon unsaturated bond. For example, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxyethylene glycol acrylate, cyclohexyl acrylate,
Dicyclopentanyl acrylate, dicyclopentenyl acrylate, 2-ethylhexyl acrylate, glycerol acrylate, glycidyl acrylate, 2-
Hydroxyethyl acrylate, 2-hydroxypropyl acrylate, isobonyl acrylate, isodexyl acrylate, isooctyl acrylate, lauryl acrylate, 2-methoxyethyl acrylate, methoxyethylene glycol acrylate, phenoxyethyl acrylate, stearyl acrylate, ethylene glycol diacrylate, diethylene glycol Diacrylate, 1,4-butanediol diacrylate,
1,5-pentanediol diacrylate, 1,6-hexanediol diacrylate, 1,3-propanediol diacrylate, 1,4-cyclohexanediol diacrylate, 2,2-dimethylolpropane diacrylate, glycerol diacrylate, Tripropylene glycol diacrylate, glycerol triacrylate, trimethylolpropane triacrylate, polyoxyethylated trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, triethylene glycol diacrylate, polyoxypropyl trimethylolpropane triacrylate , Butylene glycol diacrylate, 1,2,4-butanetriol triacrylate, 2,2 4-trimethyl-1,3-pentanediol diacrylate, diallyl fumarate, 1,1
0-decanediol dimethyl acrylate, dipentaerythritol hexaacrylate, and the above acrylate compound changed to a methacrylate compound, γ-methacryloxypropyltrimethoxysilane, 1-vinyl-2-
One or a mixture of two or more such as pyrrolidone is mentioned.

In particular, in the case of an ultraviolet curable type, benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamino) benzophenone, and 4,4-bis (diethylamino) are used as photoinitiators in the composition. Benzophenone, α-aminoacetophenone, 4,4-dichlorobenzophenone, 4-benzoyl-4-methyldiphenylketone, dibenzylketone, fluorenone, 2,2-
Diethoxyacetophenone, 2,2-dimethoxy-2-
Phenylacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyldimethylketal, benzylmethoxyethylacetal , Benzoin methyl ether, benzoin butyl ether, anthraquinone, 2-tert-butylanthraquinone,
2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzsuberone, methyleneanthrone, 4-azidobenzylacetophenone, 2,6-bis (p-azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene)
-4-methylcyclohexanone, 2-phenyl-1,2
-Butadione-2- (o-methoxycarbonyl) oxime, 1-phenyl-propanedione-2- (o-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, -Phenyl-3-ethoxy-propanetrione-
2- (o-benzoyl) oxime, Michler's ketone, 2
-Methyl- [4- (methylthio) phenyl] -2-morpholino-1-propane, naphthalenesulfonyl chloride, quinoline sulfonyl chloride, n-phenylthioacridone, 4,4-azobisisobutyronitrile,
Photoreducing dyes such as diphenyl disulfide, benzothiazole disulfide, triphenylphosphine, camphorquinone, carbon tetrabromide, tribromophenyl sulfone, benzoyl peroxide, eosin, and methylene blue and reducing agents such as ascorbic acid and triethanolamine A combination or the like, and one or more of these photoinitiators are added in combination.

As the ionizing radiation-degradable resin, similarly to the above-mentioned ionizing radiation-curable resin, after being cured by irradiation with ionizing radiation, for example, the irradiation amount is 1 × 10 ⁻³ C / cm.
^{2. When} irradiated with ionizing radiation having an accelerating voltage of 10 kV to 30 kV, the main chain of the polymer is cut, and the solubility in a developing solution is increased.

Examples of such an ionizing radiation-disintegrating resin include monomers such as methyl methacrylate, methyl isopropenyl ketone, tetrafluoropropyl methacrylate, hexafluorobutyl methacrylate, trichloroethyl methacrylate, and trichloroethyl-α-chloroacrylate. Benzophenone, methyl o-benzoyl benzoate and the like, and the above-mentioned photoinitiator as a photoinitiator. Further, a positive resist using a naphthoquinonediazide compound as a photosensitive agent and a cresol novolak resin as a binder may be used.

Further, as the thermosetting resin, phenol
Formalin resin, urea / formalin resin, melamine / formalin resin, phenol / furfural resin, furfural / acetone resin, furfuryl alcohol resin, xylene / formaldehyde resin, ketone / formaldehyde resin, alkyd resin, phenolic resin, urethane resin, urea resin, It is composed of an epoxy resin, a furfural resin, a melamine resin, an unsaturated polyester resin, a triallyl cyanurate resin, an acrolein resin, an allyl resin, a thermosetting silicone resin, a copolymer resin thereof, a mixed resin and the like, and is made into an ink.

Further, a thermoplastic resin may be used as a material for forming the concave pattern 12, for example, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl acrylate.
Propyl methacrylate, isopropyl acrylate,
Isopropyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, tert-butyl acrylate, tert-butyl methacrylate, n
-Pentyl acrylate, n-pentyl methacrylate, n-hexyl acrylate, n-hexyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, n-octyl acrylate,
n-octyl methacrylate, n-decyl acrylate, n-decyl methacrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, styrene, α-methylstyrene, N-vinyl-2-
Examples thereof include polymers or copolymers of one or more kinds such as pyrrolidone, cellulose derivatives such as ethylcellulose, and polybutene derivatives.

Further, a shape memory resin may be used.
The shape stability of the concave pattern can be excellent.

For the purpose of improving the transferability of the concave pattern from the intaglio, a release layer may be provided on the intaglio surface, and a release agent may be kneaded in the intaglio pattern forming material. Examples of the release agent include waxes such as polyethylene wax, amide wax, Teflon powder, silicone wax, carnauba wax, acrylic wax, paraffin wax, fluorine-based resin, melamine-based resin, polyolefin resin, and ionizing radiation-curable polyfunctional acrylate. Examples include resins, polyester resins, epoxy resins, amino-modified, epoxy-modified, OH-modified, COOH-modified, catalyst-curable, photocurable, and thermosetting silicone oils or silicone resins. When a release layer is formed, the thickness is 1 to 100 μm.

When the release agent is kneaded in the concave pattern forming material, the amount of the release agent is 0.01% by weight or less in the concave pattern forming material.
The content is preferably about 10% by weight.

When a thermoplastic resin is used as the material for forming the concave pattern, a release agent may be contained in the same manner. However, by adding a foaming agent and, if necessary, a foaming accelerator or a foaming inhibitor, The releasability and transferability of the concave pattern from the intaglio plate can be improved by utilizing the shrinkage effect when the concave pattern is cooled.

Examples of such a foaming agent include nitropentamethylenetetramine, diazoaminobenzene, azobisisobutyronitrile, azodicarbamide which decomposes at a high temperature to generate gases such as oxygen, carbon dioxide and nitrogen. Decomposition-type foaming agents, foams such as microballoons in which low-boiling liquids such as butane and pentane are microencapsulated with resins such as polyvinylidene chloride and polyacrylonitrile, and foams in which these microballoons are foamed in advance . Particularly preferred foaming agents are those which can be foamed at a relatively low temperature. For example, various grades of microballoons available from Matsumoto Yushi Seiyaku Co., Ltd. are preferred. The content of the foaming agent or the foam may be set so that the foaming ratio of the layer containing the bubbles is in the range of about 1.5 to 20 times.

The foaming conditions include the softening point of the heat-foamable resin layer made of a thermoplastic resin, plasticity and fluidity during softening, the foaming temperature of the foaming agent to be used, a foaming accelerator added as necessary, or a foaming inhibitor. And the like, and the mixing ratio thereof, and also the cell structure and shape of the foam.
With respect to parts by weight, azodicarbonamide is added as a foaming agent in an amount of 0.1 to 20 parts by weight, and a carboxylate mainly composed of lead, zinc, or the like as a foaming accelerator, and trimellitic anhydride as a foaming inhibitor. It is preferable to use a heating temperature of 180 ° C. to 210 ° C. for 1 to 3 minutes. As a heating method, a method such as hot air blowing, infrared irradiation, or dielectric heating is used.

The releasability of the concave pattern from the intaglio plate may be appropriately set in consideration of the adhesiveness to the base film. For example, when the concave pattern forming material is an ionizing radiation curable resin, a thermosetting resin, or a thermoplastic resin, it is necessary to transfer only the ink layer 13 to the transfer object 14, as described later. It is preferable that the concave pattern has adhesiveness to the film, and an adhesive layer may be provided on the base film. When the concave pattern forming material is an ionizing radiation disintegrating resin, since the concave pattern 12 is transferred to the transfer object 14 together with the ink layer 13, the peeling method, the curing method, and the like are appropriately set. Therefore, it is preferable to balance the three properties of the releasability of the concave pattern from the intaglio plate, the adhesiveness to the base film, and the releasability from the base film at the time of transfer to the transfer target.

The intaglio plate may be filled with the pattern forming material by a doctor blade method, a roll coating method, an air press or vacuuming method, or by a squeegee, a doctor, a soaked dip, etc.
A method of removing an excess by film wiping, an air knife, or the like may be used. In any of these systems, temperature control for the purpose of improving the coating speed by reducing the viscosity and ultrasonic treatment for the purpose of defoaming can be used in combination.

Next, referring to FIG. 5, as an example of a method for forming the concave pattern 12, a base intaglio is formed on a roll intaglio using a curable resin such as an ionizing radiation curable resin, an ionizing radiation degradable resin, and a thermosetting resin. A method for forming a concave pattern will be described.

In the figure, 11 is a base film, 12 is a concave pattern, 33 is a roll intaglio, 34 is a concave, 35 is a resin supply device, 36 is a curable resin, 37 is a curing device, 39 is a release roll, and 40 is a coating roll. Section 44, feed roll,
Reference numeral 5 denotes a feed-side feed roll, 47 denotes a convention sweater roll, and 48 denotes a paper discharge take-up roll.

The concave pattern forming apparatus is composed of a paper feed take-up roll 44 for supplying the base film 11, a paper feed side feed roll 45, a conveyor roll 47, and a paper discharge take-up roll 48. The coating unit 40 applies a pressing roll 32 for pressing the base film 11, a roll intaglio 33 in which a concave portion 34 is engraved, and a curable resin 36 (an uncured liquid at this time) to the roll intaglio 33. It comprises a resin supply device 35 for processing, a curing device 37 for curing and solidifying the liquid curable resin 36 filled in the concave portion 34 of the roll intaglio, and a peeling roll 39.

In the coating section 40, the base film 11 is pressed by the pressing roll 32, and the base film 11 is pressed.
Is in close contact with the plate surface of the roll intaglio 33 via a curable resin 36 applied by a resin supply device at a position between the pressing roll 32 and the peeling roll 39. Then, the feed speed of the base film 11 and the roll intaglio 33 are controlled by a driving device (not shown) driven by an electric motor or the like.
And the curable resin 36 filled in the concave portion 34 of the roll intaglio between the roll intaglio 33 and the base film 11 in close contact with the roll intaglio 33 remains intact. The film is cured by a curing device 37 and solidified to adhere to the base film.
Is peeled from the roll intaglio 33 to form the concave pattern 12 on the base film.

The pressing roll 32 is used for the base film 11.
As long as it can be pressed against the plate surface of the roll intaglio,
The thickness is about 0 to 300 mm, which is obtained by coating a metal shaft core with silicone rubber, natural rubber, or the like.

The curing device 37 can be appropriately selected according to the type of the curable resin, and includes a device for irradiating radiation having energy quanta for crosslinking and polymerizing the curable resin among electromagnetic waves or charged particle beams. be able to.
Examples of such radiation that can be industrially used include infrared rays, visible light, ultraviolet rays, and electron beams. In addition, electromagnetic waves such as microwaves and X-rays can also be used. In addition, 3 in the figure
Reference numeral 8 denotes a reflecting mirror for efficiently irradiating radiation emitted from the radiation source to the roll intaglio. Further, two curing devices 37 are provided for one roll intaglio, and the sources S ₁ and S ₂ of these two curing devices have an angle S connecting the center O of the roll intaglio. ₁ OS ₂ is set in an angle range of 70 to 110 °, preferably 90 °.

The roll intaglio 33 may be provided with a predetermined concave portion 34 by a method such as electronic engraving, etching, mill pressing, electroforming, or the like. The material of the roll intaglio is copper, iron, or the like, whose surface is plated with chromium. Metals, ceramics such as glass and quartz, and synthetic resins such as acrylic and silicone resins are used. Further, a sheet in which a pattern is formed on the sheet with an ionizing radiation curable resin or the like may be wound around a roll with the pattern surface as an outer surface. Although the size of the roll intaglio is not particularly limited, it is usually about 150 to 1000 mm in diameter and about 300 to 2000 mm in line width. Further, as the base film, one that does not hinder the radiation from reaching the curable resin upon curing is preferable.

As a method of forming a concave pattern on a base film, in addition to the above-described method using an intaglio or an intaglio roll, a photolithography using an ionizing radiation-curable resin or an ionizing radiation-disintegrating resin is used. May be.

When an ionizing radiation-curable resin is used, an ink comprising the ionizing radiation-curable resin is solid-coated on a base film, the exposed portion is cured using a photomask, and then the unexposed portion is cured. By developing and removing the portion, a concave pattern can be formed on the base film. When an ionizing radiation-disintegrating resin is used, an ink composed of the ionizing radiation-disintegrating resin is solid-applied on the base film, and the entire surface is cured by exposure. , Or by irradiating an electron beam in a concave pattern to cut the main chain of the cured resin in the exposed portion to make it soluble in a developing solution, and remove it by development to form a concave pattern.

Next, as shown in FIG. 2, an ink layer 13 is filled in the concave portion 12 of the intaglio or intaglio roll in which the concave pattern is formed. Note that the transfer sheet of the present invention may not be in the form of a flat plate but may be in a state of being wound up in a roll shape.

When the ink layer 13 is used for a resistor layer or a barrier layer such as a base forming layer or a dielectric forming layer, the ink layer 13 is composed of at least an inorganic component having a glass frit and a resin component removed by firing. .

The glass frit has a softening point of 3
At 50 ° C. to 650 ° C., the coefficient of thermal expansion α ₃₀₀ is 60 × 10 ⁻⁷
/ ° C to 100 × 10 ^-7 / ° C. If the softening point of the glass frit exceeds 650 ° C., it is necessary to increase the firing temperature, and depending on the lamination object, it is not preferable because it is thermally deformed. It is not preferable because glass frit is fused and voids and the like are generated in the layer. When the coefficient of thermal expansion is out of the range of 60 × 10 ⁻⁷ / ° C. to 100 × 10 ⁻⁷ / ° C., the difference from the coefficient of thermal expansion of the glass substrate is large,
It is not preferable because distortion occurs.

As the inorganic component, two or more kinds of inorganic powders and inorganic pigments may be used in addition to the glass frit. The inorganic powder is an aggregate, and is added as needed. The inorganic powder is intended to prevent casting during firing and to improve the compactness, and has a softening point higher than that of the glass frit, such as aluminum oxide, boron oxide, silica, titanium oxide, magnesium oxide, and oxide. Inorganic powders such as calcium, strontium oxide, barium oxide, and calcium carbonate can be used, and examples thereof include those having an average particle size of 0.1 μm to 20 μm. The inorganic powder may be used in an amount of 0 to 30 parts by weight based on 100 parts by weight of the glass frit.

Inorganic pigments are added as necessary to reduce external light reflection and improve practical contrast, and when darkening, they are used as fire-resistant dark pigments. , Co-Cr-Fe, Co-Mn-
Fe, Co-Fe-Mn-Al, Co-Ni-Cr-F
e, Co-Ni-Mn-Cr-Fe, Co-Ni-Al
-Cr-Fe, Co-Mn-Al-Cr-Fe-Si and the like. Examples of the fire-resistant white pigment include titanium oxide, aluminum oxide, silica, and calcium carbonate. The inorganic pigment may be contained in an amount of 0 to 30 parts by weight based on 100 parts by weight of the glass frit.

The resin component removed by firing is contained as a binder for the inorganic component and for the purpose of improving transferability, and is preferably a thermoplastic resin. As the thermoplastic resin, the thermoplastic resin described in the concave pattern forming material described above can be used, and preferably, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n
-Propyl acrylate, n-propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, n-butyl methacrylate, n-butyl acrylate, sec-butyl acrylate, sec-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, tert-butyl acrylate, te
Preferred are polymers or copolymers of one or more of rt-butyl methacrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, 2-ethylhexyl methacrylate, 2-ethylhexyl acrylate, ethyl cellulose, and polybutene derivatives. As the binder, an alkali-developable photosensitive resin or a curable resin described when forming the above-described concave pattern may be used as long as it can be removed by firing.

The proportion of the inorganic component to the resin component is 3 to 50 parts by weight, preferably 5 to 30 parts by weight, based on 100 parts by weight of the inorganic component.
When the amount of the resin component is less than 3 parts by weight, a problem arises in that the pattern shape retention is poor and the production of PDP or the like is hindered. On the other hand, if the amount exceeds 50 parts by weight, carbon remains in the film after sintering, and the quality is undesirably deteriorated.
If necessary, a plasticizer, a thickener, a dispersant, an anti-settling agent, an antifoaming agent, a release agent, a leveling agent and the like are added.

The plasticizer is added for the purpose of improving the transferability and the fluidity of the ink. For example, normal alkyl phthalates such as dimethyl phthalate, dibutyl phthalate and di-n-octyl phthalate, and di-2-ethylhexyl phthalate are used. Phthalic acid esters such as diisodecyl phthalate, butyl benzyl phthalate, diisononyl phthalate, ethyl phthalethyl glycolate and butyl phthalyl butyl glycolate, tri-2-ethylhexyl trimellitate, tri-n-alkyl trimellitate, triiso Trimellitate esters such as nonyl trimellitate and triisodecyl trimellitate, dimethyl adipate, dibutyl adipate, di-2-ethylhexyl adipate, diisodecyl adipate, dibutyl diglycol adipate , Di-2-ethylhexyl acetate, dimethyl sebacate, dibutyl sebacate, di-2-ethylhexyl sebacate, di-2-ethylhexyl malate, acetyl-tri- (2-ethylhexyl) citrate, acetyl-tri-n-butyl Aliphatic dibasic acid esters such as citrate and acetyl tributyl citrate, glycol derivatives such as polyethylene glycol benzoate, triethylene glycol di- (2-ethylhexoate) and polyglycol ether;
Glycerol derivatives such as glycerol triacetate and glycerol diacetyl monolaurate; polyesters composed of sebacic acid, adipic acid, azelaic acid, phthalic acid, etc .; low molecular weight polyethers having a molecular weight of 300 to 3,000; low molecular weight poly-α-styrene , The same low molecular weight polystyrene, trimethyl phosphate, triethyl phosphate, tributyl phosphate, tri-2-ethylhexyl phosphate, tributoxyethyl phosphate, triphenyl phosphate, tricresyl phosphate, trixylenyl phosphate, cresyl diphenyl phosphate, xylendiphenyl Phosphate,
Orthophosphates such as 2-ethylhexyldiphenyl phosphate, ricinoleates such as methylacetyl ricinoleate, poly-1,3-butanediol adipate, polyester epoxidized esters such as epoxidized soybean oil, glycerin triacetate, Acetates such as 2-ethylhexyl acetate are exemplified.

The thickener is added as needed for the purpose of increasing the viscosity of the ink, and known ones can be used. Examples thereof include hydroxyethyl cellulose, methyl cellulose, carboxymethyl cellulose, sodium alginate, casein and the like. , Sodium caseinate, xanthan gum, polyvinyl alcohol, modified polyether urethane, polyacrylates, polymethacrylates, monmotalonite, aluminum stearate, zinc stearate, aluminum octylate, water-added castor oil, castor oil ester, fatty acid Amide, polyethylene oxide, dextrin fatty acid ester, dibenzylidene sorbitol, vegetable oil-based polymerized oil, surface-treated calcium carbonate, organic bentonite, silica, titania, zirconia, Fine powder such as alumina and the like.

The dispersant and anti-settling agent are intended to improve the dispersibility and anti-settling property of the inorganic component, and include, for example, a phosphate ester type, a silicone type, a castor oil ester type and various interface lubricants. Examples of the defoaming agent include, for example, silicone type, acrylic type, various interfacial lubricating agents, etc., and examples of the release agent include silicone type, fluorine oil type, paraffin type, fatty acid type, fatty acid ester type, castor oil. Examples include a system, a wax, and a compound type, and examples of the leveling agent include a fluorine-based, silicone-based, and various interfacial lubricating agents, each of which is added in an appropriate amount.

The above-mentioned ink materials include anions such as methanol, ethanol, isopropanol, acetone, methyl ethyl ketone, toluene, xylene, cyclohexanone, methylene chloride, 3-methoxybutyl acetate, ethylene glycol monoalkyl ethers, ethylene glycol alkyl ether acetate. , Diethylene glycol monoalkyl ethers, diethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl ethers, propylene glycol monoalkyl ether acetates, dipropylene glycol monoalkyl ethers, dipropylene glycol monoalkyl ether acetates, α- or β
-An ink is obtained by dissolving or dispersing in terpenes such as terpionaire. Further, a non-sol type ink which does not use such a solvent may be used.

When the ink layer is for forming an electrode, it is composed of at least an inorganic component made of glass frit, a resin component removed by firing, and a conductive powder.

As the inorganic component, the glass frit, the inorganic powder, and the inorganic pigment described in the section of the ink layer such as the barrier layer described above can be used. The inorganic powder is preferably from 0 to 10 parts by weight based on 100 parts by weight of the glass frit.

As the resin component, the resins described in the section of the ink layer such as the barrier layer described above can be used, and the content of the resin component removed by firing in the ink for forming an electrode forming layer is 3 to 3. 60% by weight, preferably 5 to 30% by weight
It is.

Examples of the conductive powder include metal powders such as gold, silver, copper, nickel, and aluminum. Spherical metal powder having an average particle diameter of 0.1 μm to 5 μm is preferable. The ratio of the conductive powder and the glass frit used is as follows.
The glass frit is 2 to 20 parts by weight with respect to 0 parts by weight.

Further, a plasticizer, a dispersant, an anti-settling agent, an antifoaming agent, a release agent and a leveling agent may be added to the ink for forming an electrode forming layer, if necessary. Those described in the section for forming a layer or the like can be used.
In order to form an ink for forming an electrode forming layer, the above constituent materials are mixed with a solvent, if necessary, in the same manner as described in the section for forming a dielectric layer and the like, and kneaded by a roll mill, a bead mill, or the like. To form an ink-like coating liquid, or kneaded with a pole mill or the like to obtain a slurry-like coating liquid. As a method for filling the concave pattern 12 with the above-described ink, the filling method described when the above-described concave pattern 12 is formed is similarly employed.

The ink layer in the concave pattern is
It may have a laminated structure of a plurality of layers with different pigments.
For example, as a pattern for a barrier forming layer, a dark ink layer is first laminated on the bottom of the concave pattern, and then a white ink layer is laminated on the dark ink layer, and the filling is made up of two layers, a dark ink layer and a white ink layer. It may have a structure. Further, a three-layer structure in which a transparent ink layer is firstly laminated on the bottom of the concave pattern, and then a dark ink layer and a white ink layer are sequentially laminated may be adopted. When the ink layer in the concave pattern is transferred to the transfer target, the barrier layer is formed as a multilayer structure in which a dark layer is stacked on a white layer when viewed from the PDP substrate side. Can be.
As a result, the observation side becomes dark at the barrier.
The contrast in DP is improved.

Further, as a pattern for forming an electrode, a conductive ink layer may be provided at the bottom of the concave pattern, and then a dark ink layer may be laminated on the conductive layer to similarly form a laminated structure. Also in this case, since the observation side becomes dark, the contrast in the PDP is improved, which is the same as the barrier forming layer. The dark-colored ink layer may be a non-conductive ink layer composed of a glass frit, an inorganic powder, a dark-colored inorganic pigment, and a resin component removed by baking, as in the case of the barrier-forming layer ink described above, but is preferably used. A conductive ink layer containing a conductive powder in place of the inorganic powder may be used, and the dark pigment described in the section of the ink layer such as the barrier forming layer or the like is used in an amount of 2 parts by weight to 100 parts by weight of the glass frit. 700 parts by weight may be contained.

For the purpose of improving the transferability of the ink layer 13, a release layer may be provided on the surface of the concave pattern 12.
A release agent may be kneaded in the forming material.

Examples of the release agent include waxes such as polyethylene wax, amide wax, Teflon powder, silicone wax, carnauba wax, acrylic wax, paraffin wax, fluorine resin, melamine resin, polyolefin resin, ionizing radiation curable type. Polyfunctional acrylate resin, polyester resin, epoxy resin, amino-modified, epoxy-modified, OH-modified, COOH-modified, catalyst-curable, light-curable, heat-curable silicone oils or silicone resins are exemplified.
2, or 0.01% by weight to 10% by weight in the ink layer 13. When a release layer is provided on the surface of the concave pattern, the thickness of the release layer is 0.1 to 50 μm, preferably 1 to 10 μm.

As a method for improving the transferability, the shrinkage of the ink layer during cooling may be used. It is possible to improve the releasability and transferability by giving a difference between the contraction rate of the concave pattern forming material during cooling and that of the ink layer material, increasing the temperature of the ink layer during filling and cooling during transfer. it can. When the ink layer is made of a thermoplastic resin, the foaming agent or foam described above for forming the concave pattern is added in the same manner, so that the shrinkage upon cooling can be utilized, and the releasability is excellent.

When the ink layer 13 is of a non-sol type which does not use a solvent, for example, when the ink layer 13 is a barrier forming layer, a dielectric forming layer, etc., a glass frit, an inorganic powder or an inorganic pigment is used. , A solid powder composed of organic components,
Alternatively, only an inorganic component powder such as a glass frit, or a conductive metal powder or a powder made of a glass frit as an electrode forming layer is wetted or powdered as appropriate in the concave pattern of the base film. It may be filled by pressing with a mold or pressing with a method such as vacuuming.

In the case of such a non-sol type, for the purpose of improving transferability, it is preferable to incorporate a release agent into the concave pattern or to perform a release treatment on the surface of the concave pattern. Further, the ink layer may be extruded from the concave pattern by being pressed from the back of the base film and transferred. However, when transferring, the ink layer is heated to a temperature (yield point) at which the glass frit component in the ink layer partially softens. The transfer may be performed by utilizing the shrinkage action of the ink layer. Further, the concave pattern may be formed from an ionizing radiation-degradable resin, transferred to an object to be transferred together with the ink layer, irradiated with ionizing radiation to make the developer soluble, and removed by development. May be removed by firing.

Next, the first pattern forming method of the present invention will be described. When the concave pattern 12 is made of an ionizing radiation curable resin, a thermosetting resin, or a thermoplastic resin, only the ink layer 13 is transferred from the concave pattern 12.

FIGS. 3 and 4 show a case where only the ink layer 13 is transferred. The base film 11 filled with the ink layer 13 is laminated on the transfer member 14 from the ink layer 13 side. , Base film 11
, Only the ink layer 13 is transferred.

When the concave pattern 12 is made of an ionizing radiation-degradable resin, as shown in FIG.
The ink film 13 and the ink layer 13 are both transferred onto the transfer object 14, and only the base film 11 having no concave pattern 12 is peeled off. The transfer object 14 to which both the concave pattern 12 and the ink layer 13 have been transferred can be dissolved and removed because the concave pattern becomes soluble in a developing solution when irradiated with ionizing radiation.
Only 3 can be left on the transfer object.

Examples of the method for pressing the transfer sheet and the transfer object include a flat press, a roll press, an adsorption porous roll press, and an arc press. In the flat press, the press plate is in a flat plate shape, alignment can be easily performed, and the same applies to the arc press. The roll press is for transferring the ink layer 13 by pressing the transfer sheet and the transfer object separated from the back surface of the transfer sheet while rotating the roll, and peeling the base film (transfer sheet) after the transfer. Although the workability is excellent, the transfer sheet is elongated, and there is difficulty in aligning the patterns. In the transfer, mutual positional accuracy is important, for example, as in the case of the barrier pattern on the transfer sheet and the electrode pattern on the transfer object.

On the other hand, the adsorptive porous roll press is excellent in that workability and elongation of the transfer sheet can be prevented. The adsorption porous roll press has an adsorption area for adsorbing the transfer sheet from the back surface by making the roll porous, so that the adsorption and desorption can be switched in a partial portion, and the transfer sheet is rotated while rotating the porous roll. When the transfer sheet and the transfer object separated from the back surface are pressed to transfer the ink layer 13 and the base film is peeled after the transfer, the transfer sheet can be pressed in a sucked state. It can be cut (untensioned), can prevent pattern elongation, and is excellent in workability. Also, in order to completely cut the tension in the transfer sheet, the transfer sheet is cut to the size of the transfer object, and transferred by a flat press or an arc press.
It may be so-called “sheet sheet transfer”. Further, in order to completely cut the tension in the transfer sheet, a metal film may be attached to the back surface of the transfer sheet. According to this method, the above-mentioned problems in the roll press and the like can be solved, and the transfer sheet can be made endless, and workability can be improved. If the metal film is adhered to the back surface of the transfer sheet, the concave pattern can be formed on the base film with high positional accuracy even when a concave pattern is formed on the transfer sheet.

When the resin component in the ink layer is a thermoplastic resin at the time of transfer, means such as a hot roll and a hot press may be incorporated in the above-described transfer method, and the ink may be heated and pressed to transfer only the ink layer. . In the case of an ionizing radiation-curable resin, an ionizing radiation-disintegrating resin, or a thermosetting resin, a means for irradiating ionizing radiation such as ultraviolet light, infrared light, laser light, or an electron beam may be appropriately incorporated. Further, it may be cured after the transfer.

In the transfer, for the purpose of improving the transferability, the ink layer may be subjected to a solvent treatment to give the ink layer tackiness, that is, so-called “wet transfer”. Good.

The transferred object 14 is a glass substrate or elementary glass having an underlayer when the pattern is an electrode layer in a PDP member, and has or has an underlayer when the pattern is a barrier layer in a PDP member. And an electrode layer alone or an electrode layer and a dielectric layer sequentially laminated on a glass substrate which is not used.

In pattern transfer using the first transfer sheet, the filling operation and the transfer operation may be repeated a plurality of times with the same pattern in order to obtain a desired film thickness.

The pattern forming method using the first transfer sheet according to the present invention is particularly suitable for forming a high-definition pattern such as an electrode layer and a barrier layer, and can shorten the manufacturing time and improve the yield. Can be done. In addition, a pattern having excellent surface smoothness, uniform film thickness, and good distribution accuracy can be obtained.

After the ink layer is transferred to the transfer object in a pattern, the organic components in the ink layer are vaporized, decomposed and volatilized at a firing temperature of 350 ° C. to 650 ° C., so that the inorganic powder is formed by the molten glass frit. Are densely bonded, and are fired to form an electrode layer, a barrier layer, a base layer, a dielectric layer, and the like.

Next, the second transfer sheet of the present invention will be described. FIG. 7 is a sectional view of the second transfer sheet of the present invention, and FIGS. 8 and 9 are views for explaining the second pattern forming method of the present invention. In the figure, 13 'is the first
The ink layer 15 is a second ink layer, which is shown in FIGS.
The same reference numerals indicate the same contents.

The second transfer sheet of the present invention has a first pattern comprising at least an inorganic component composed of glass frit and a resin component removed by firing in a concave portion of a base film 11 having a concave pattern 12 formed on one surface. Of the first ink layer 13 '.
A second ink layer 15 comprising at least an inorganic component made of glass frit and a resin component removed by firing
Are laminated.

In the case of a transfer sheet for producing a PDP, (1) the first ink layer is an electrode forming layer, the second ink layer is a base forming layer, (2) the first ink layer is a barrier forming layer, and the second ink layer is a barrier forming layer. The first ink layer and the second ink layer can be simultaneously transferred to the transfer object 14 by using the ink layer as a dielectric forming layer. The material for forming each layer is the same as that described in the first transfer sheet. In the case of the barrier forming layer, as described above, when a dark ink layer is used as a filling layer for the concave pattern, the contrast in the PDP can be similarly increased.

The second ink layer 15 is laminated on the concave pattern 12 filled with the first ink layer in a shape corresponding to the respective patterns of the underlayer and the dielectric layer. The second ink layer is applied by screen printing or the like on the concave pattern 12 in which the first ink layer is filled in the concave portion, and for example, the first ink layer which is a barrier forming layer is filled in the concave pattern. In this case, when the drying treatment is performed, volume shrinkage occurs, and a gap is generated. According to this method, the gap can be replenished with the dielectric forming material, and the barrier forming layer can be more accurately manufactured. The second ink layer is formed by transfer on the concave pattern 12 in which the first ink layer is filled in the concave portion by using a transfer sheet prepared by applying the second ink layer on another film. May be. The second ink layer may be patterned using an ink composed of a photosensitive resin such as an ionizing radiation-curable resin or an ionizing radiation-degradable resin. For example, an ink composed of an alkali-developable photosensitive resin may be used. It may be formed by solid-applying, exposing and developing a pattern through a photomask, and developing.

When the second ink layer is a base forming layer, its thickness is 5 μm to 50 μm, and when it is a dielectric forming layer, its thickness is 5 μm to 50 μm.

The second pattern forming method of the present invention comprises the following steps:
And the first ink layer and the second ink layer are simultaneously transferred onto the transfer object. The transfer method is the same as the first pattern forming method described above. The same is true.

In order to improve the transferability to the transfer target,
An adhesive layer may be provided on the second ink layer as needed. Examples of the adhesive include a thermoplastic resin that can be removed by the above-described firing, or a resin obtained by adding a plasticizer or a reactive monomer to the thermoplastic resin. After the transfer, similarly to the case where the first transfer sheet is used, it is baked to form a PDP.

When the ink layer is filled in the concave pattern, at the stage of drying and solidification, the filling surface is lower than the base film surface due to shrinkage, and transferability is deteriorated. This phenomenon is remarkable when the ink layer is a thick barrier-forming layer, but according to the second transfer method and the pattern forming method of the present invention, the ink layer is provided on the concave pattern, so There is an advantage that the contact area becomes large, and the transfer property becomes easy.

When the second transfer sheet is used, a plurality of layers can be formed by transfer at the same time, so that workability is excellent and alignment between layers can be performed at the stage of the transfer sheet. High PDP can be achieved.

Next, the third transfer sheet of the present invention will be described. FIG. 10 is a cross-sectional view of the third transfer sheet of the present invention, and FIGS. 11 and 12 are views for explaining the third pattern forming method of the present invention. In the figure, reference numeral 16 denotes a third ink layer, and the same reference numerals as those in FIGS. 2, 3 and 7 denote the same contents.

In the third transfer sheet of the present invention, a concave portion of the base film 11 having the concave pattern 12 formed on one surface has a first portion comprising at least an inorganic component made of glass frit and a resin component removed by firing. Is filled with the first ink layer 1 '.
On the concave pattern 12 filled with 3 ', a second ink layer 15 made of at least an inorganic component made of glass frit and a resin component removed by firing is laminated, and further on the second ink layer 15 The third ink layer 16 has a laminated structure.

In the case of a transfer sheet for producing a PDP, the first ink layer is a barrier forming layer, the second ink layer is a dielectric forming layer,
The third ink layer is used as an electrode forming layer, and the first to third ink layers can be simultaneously transferred to the transfer object 14.

The material for forming each layer is the first material described above.
But the second and third ink layers are formed on the concave pattern 12 filled with the first ink layer, and on the respective patterns of the dielectric layer and the electrode forming layer. The layers are sequentially stacked in an appropriate shape.

The second and third ink layers may be sequentially laminated by screen printing on the concave pattern 12 filled with the first ink layer, or may be sequentially formed by transfer. Further, the second and third ink layers may be formed using a photosensitive resin such as an ionizing radiation-curable resin or an ionizing radiation-degradable resin. In this case, after solid coating, a photomask is formed. It is formed by exposing and developing in the form of a pattern.

When the third ink layer is used as an electrode forming layer, first, the first ink layer is used as a barrier forming layer.
After the second ink layer is formed as a dielectric forming layer, an electrode forming coating solution composed of an alkali-developable photosensitive resin is solid-applied, and the electrode pattern is formed by exposing and developing through a photomask. Good. Further, as shown in FIG. 13, the first ink layer 13 is formed as a barrier forming layer composed of a dark ink layer, the second ink layer 15 is formed as a dielectric forming layer, and then the third ink layer 16 is formed. An electrode forming coating solution composed of an alkali developing type photosensitive resin is solid-coated, and exposed and exposed from the base film 11 side using a photomask 17.
When developed, the dark ink layer becomes a mask, and FIG.
As shown in (c), the electrode pattern 16 can be formed. This method is preferable because alignment of the barrier pattern and the electrode pattern can be accurately performed. Second
When the ink layer is a dielectric forming layer, its thickness is 5 μm.
m to 50 m, and when the third ink layer is an electrode forming layer, the film thickness is 5 m to 50 m.

After forming the third ink layer as an electrode forming layer in an electrode pattern, if necessary, a base forming layer may be laminated on the electrode pattern with a film thickness of 5 μm to 50 μm.

The third pattern forming method of the present invention comprises the third
Are superimposed on the transfer object 14, and the first to third
Is transferred onto the transfer object at the same time, and the transfer method is the same as the above-described first pattern forming method. Further, the adhesive layer described above may be provided on the third ink layer or the underlayer forming layer as needed for the purpose of improving the transferability to the transfer target.

After the transfer to the transfer member, the transfer member is baked and the PDP is transferred in the same manner as when the first transfer sheet is used.
It is said.

According to the third transfer sheet and the pattern forming method of the present invention, as in the case of the second transfer sheet, excellent transferability can be obtained, and a plurality of ink layers can be transferred simultaneously. It is excellent in workability. Also, since alignment between the layers can be performed at the stage of the transfer sheet, a PDP with high positional accuracy can be obtained.

A protective film may be attached to the surface of each ink layer in the first to third transfer sheets of the present invention, if necessary, for the purpose of preventing scratches, preventing dust from being mixed, preventing blocking, and the like. .

Examples of the protective film include polyethylene terephthalate film, 1,4-polycyclohexylene dimethylene terephthalate film, polyethylene naphthalate film, polyphenylene sulfide film,
Polystyrene film, polypropylene film, polysulfone film, aramid film, polycarbonate film, polyvinyl alcohol film, cellophane, cellulose derivative film such as cellulose acetate, polyethylene film, polyvinyl chloride film, nylon film, polyimide film, ionomer film, etc. Has a film thickness of 1 μm to
It is 400 μm, preferably 4.5 μm to 200 μm.

The ink may be filled in the recesses of the base film and, if necessary, the protective film may be laminated, and then the sheet may be wound once. Alternatively, the base film may be cut to a required length, and then the ink may be cut. And may be used for transfer. Hereinafter, the present invention will be described in detail with reference to examples.

[0111]

【Example】

(Example 1) (Formation of base film) UV curable ink (DKF-90, manufactured by Nippon Kayaku Co., Ltd.)
1) was loaded into the apparatus shown in FIG. 5, and a polyethylene terephthalate film (thickness: 75 μm) was used as a base film. The source was irradiated with ultraviolet light (600 mJ /
cm ² ) and a pitch of 200 μm and a line width of 70 μm on the base film at a rotation speed of the intaglio roll of 5 m / min.
An electrode pattern recess having a depth of 20 μm and a depth of 20 μm was formed as shown in FIG.

Next, composition: silver powder (average particle size: 1 μm) 80 parts by weight Glass frit: main component: PbO, SiO ₂ , B ₂ O ₃ (alkali-free) average particle size 1 μm, softening point 500 ° C 5 parts by weight Thermal expansion coefficient α ₃₀₀ = 75 × 10 ^-7 / ° C Polybutene (200N manufactured by NOF Corporation) 8 parts by weight Polybutene (5N manufactured by NOF Corporation) 2 parts by weight were mixed and dispersed using three rolls to prepare an electrode forming layer forming ink, and the ink was applied to the base film having the concave portions obtained above by a doctor method, and the concave portions were formed. Then, a polyethylene film was laminated to form a first transfer sheet of the present invention.

After the polyethylene film of the transfer sheet was peeled off, an auto-cut laminator (manufactured by Asahi Kasei Corporation)
Using a model ACL-9100), the substrate was laminated on a glass substrate with an underlayer under a transfer condition of a substrate preheating temperature of 80 ° C. and a ramylol temperature of 100 ° C. Next, the base film was peeled off, and the ink layer was transferred.
By baking at 0 ° C., a patterned electrode layer was formed. The line width of the electrode layer after firing was 65 μm, and the film thickness was 7 ± 2 μm.

Example 2 In Example 1, the shape of the concave pattern in the base film was such that the barrier layer pattern had a pitch of 250 μm, a bottom width of 70 μm, and a ceiling width of 100 μm.
A recess having a thickness of 180 μm and a depth of 180 μm was formed.

Composition: Glass frit @ MB-008, manufactured by Matsunami Glass Industry Co., Ltd.) 65 parts by weight α-alumina RA-40 (Iwatani Chemical Industry) 10 parts by weight Dipiroxide Black # 9510 (manufactured by Dainichi Seika Kogyo Co., Ltd.) 10 parts by weight n-butyl methacrylate / 2-hydroxyethyl methacrylate copolymer (8/2) 8 parts by weight Polyoxyethylene Trimethylol propane triacrylate 8 parts by weight Silicone resin (X-24-8300 manufactured by Shin-Etsu Chemical Co., Ltd.) 1 part by weight Photoinitiator (Irgacure 369 manufactured by Ciba Geigy)・ ・ ・ ・ 3 parts by weight ・ Propylene glycol monomethyl ether ・ ・ ・ ・ 10 parts by weight ・ isopropyl alcohol ・ ・ ・ ・ 10 parts by weight Mixed dispersion treatment using a bead mill using Kubizu to prepare an ink for barrier layer formation.

The ink was filled into the concave portion on the base film having the concave portion obtained above with a doctor by using a doctor, and
After drying at 100 ° C. for 5 minutes, a polyethylene film was laminated to form a first transfer sheet of the present invention. After peeling off the polyethylene film of the transfer sheet,
Auto cut laminator (Asahi Kasei Corporation, Model AC
L-9100) using a substrate preheat temperature of 80 ° C.
Under the transfer condition of the lami roll temperature of 100 ° C.,
Lamination was performed on a glass substrate on which a dielectric layer was sequentially provided.
Next, the base film was peeled off and fired at 570 ° C. The ceiling width of the fired barrier layer is 50 μm, the bottom width is 80 μm,
The film thickness was 120 ± 10 m.

Example 3 In Example 1, the shape of the concave pattern in the base film was such that the barrier layer pattern had a pitch of 250 μm, a bottom width of 70 μm, and a ceiling width of 100 μm.
A recess having a thickness of 180 μm and a depth of 180 μm was formed.

(Barrier forming material composed of dark ink) Composition Glass frit (main component PbO, SiO ₂ , B ₂ O ₃ , non-alkali) 53 parts by weight α-alumina RA-40 (Iwatani Chemical Industry) 12 parts by weight Dipoxide black # 9510 (manufactured by Dainichi Seika Kogyo Co., Ltd.) 8 parts by weight Thermal expansion coefficient of the above inorganic component mixture (30 to 300 ° C.) 74 × 10 ⁷ , softening point 580 ° C. n-butyl methacrylate / 2-hydroxyethyl methacrylate copolymer (7/3) 5 parts by weight bis (2-ethylhexyl) phthalate 3 parts by weight Dibutyl phthalate 5 parts by weight Propylene glycol monomethyl ether 10 parts by weight N-methyl-2-pyrrolidone 10 parts by weight Mixed and dispersed using a bead mill was used to prepare a dark barrier layer forming ink.

(Barrier forming material composed of white ink) Composition: glass frit (main component: PbO, SiO ₂ , B ₂ O ₃ , non-alkali) 53 parts by weight α-alumina RA-40 (Iwatani Chemical Industry Co., Ltd.) 12 parts by weight Titanium oxide 8 parts by weight Thermal expansion coefficient (30 to 300 ° C.) 72 × 10 ⁷ , softening point 575 ° C. of the above-mentioned inorganic component mixture n-butyl methacrylate / 2 -Hydroxyethyl methacrylate copolymer (7/3) 5 parts by weight Bis (2-ethylhexyl) phthalate 3 parts by weight Dibutyl phthalate 5 parts by weight Propylene glycol monomethyl ether ··· 10 parts by weight · N-methyl-2-pyrrolidone ··· 10 parts by weight using a bead mill using ceramic beads to perform mixing and dispersion treatment; Color barrier layer forming ink was prepared.

In the recess on the base film obtained above,
First, a white ink is applied to the dark ink layer by a doctor, and the white ink layer is filled with the white ink layer on the dark ink layer, and dried at 150 ° C. for 30 minutes. After that, a polyethylene film was laminated to form a first transfer sheet of the present invention. After the polyethylene film of the transfer sheet was peeled off, the substrate was preheated to 8 using an auto cut laminator (model ACL-9100, manufactured by Asahi Kasei Corporation).
Under a transfer condition of 0 ° C. and a lami roll temperature of 100 ° C., the substrate was laminated on a glass substrate on which an underlayer, an electrode layer, and a dielectric layer were sequentially provided. Next, the base film was peeled off and fired at 570 ° C. 50 μm ceiling width and 80 μm bottom width of fired barrier layer
m and the film thickness were 120 ± 10 m. When a PDP was assembled using this fired product, the PDP was excellent in contrast.

Example 4 (Formation of Base Film) A UV curable ink (Seika Beam XD-808, manufactured by Dainichi Seika Kogyo Co., Ltd.) was loaded into the apparatus shown in FIG. 5, and a polyethylene terephthalate film was prepared. (Thickness 100
μm) was used as a base film. The radiation source was ultraviolet irradiation (160 W / cm ² ), and a barrier layer pattern was formed on the base film at a rotation speed of the intaglio roll of 5 m / min.
Pitch 250μm, bottom width 70μm, ceiling width 100μm,
A recess having a depth of 180 μm was formed as shown in FIG.

In the recess on the base film obtained above,
First, the dark ink described in Example 3 was applied to the dark ink layer with a film thickness of 40 μm and the white ink described in Example 3 by a doctor, and a white ink layer was laminated on the dark ink layer. Fill the layer, 150 ° C,
Dry for 30 minutes.

(Dielectric forming layer) Composition Glass frit (main components Bi ₂ O ₃ , ZnO, B ₂ O ₃ , alkali-free, average particle diameter 3 μm) 70 parts by weight α-alumina RA-40 (Iwatani Chemical Industry) 7 parts by weight Titanium oxide 3 parts by weight Thermal expansion coefficient (30-300 ° C) 81 × 10 ⁷ , softening point 580 ° C n- Butyl methacrylate / 2-hydroxyethyl methacrylate copolymer (7/3) 13 parts by weight Dibutyl phthalate 7 parts by weight Propylene glycol monomethyl ether 20 parts by weight using ceramic beads The resulting mixture was mixed and dispersed using a bead mill to prepare a dielectric layer forming ink.

This dielectric layer forming ink was applied to the dielectric layer pattern by screen printing as shown in FIG. 7 on the concave pattern in which the barrier forming ink layer was filled in the concave portion on the base film obtained above. 150 ° C,
After drying for 30 minutes and laminating a 20 μm-thick dielectric forming layer, a polyethylene film was laminated to form a second transfer sheet of the present invention. The barrier forming layer was covered with the dielectric forming layer ink and had an excellent shape. After peeling off the polyethylene film of the transfer sheet,
Auto cut laminator (Asahi Kasei Corporation, Model AC
L-9100) using a substrate preheat temperature of 80 ° C.
The laminate was laminated on a glass substrate on which a base layer and an electrode layer were sequentially provided under a transfer condition at a ramirole temperature of 100 ° C. Next, the base film was peeled off and fired at 570 ° C. The thickness of the dielectric layer after firing is 10 μm, and the ceiling width of the barrier layer is 50 μm.
μm, the bottom width was 80 μm, and the film thickness was 120 ± 10 m.

(Example 5) (Ink composition for electrode formation) Silver powder (average particle size 2 μm) 70 parts by weight Glass frit (average particle size 1 μm, no alkali, softening point 550 ° C., coefficient of thermal expansion) (30-300 ° C.) 73 × 10 ⁷ ) 5 parts by weight n-butyl methacrylate / 2-hydroxyethyl methacrylate copolymer (7/3) 12 parts by weight dibutyl phthalate · 5 parts by weight · propylene glycol monomethyl ether ··· 15 parts by weight were mixed and dispersed using a bead mill using ceramic beads to prepare an electrode forming ink.

After the polyethylene film in the transfer sheet obtained in Example 4 was peeled off, the electrode forming ink was applied on the dielectric forming layer in an electrode pattern by screen printing, and dried at 150 ° C. for 30 minutes. Then, an electrode forming layer having a film thickness of 20 μm was laminated, and then a polyethylene film was laminated.
Was formed. After peeling off the polyethylene film of the transfer sheet, a glass substrate provided with a base layer under the transfer conditions of a substrate preheat temperature of 80 ° C. and a lami roll temperature of 100 ° C. using an auto cut laminator (model Asahi Kasei Corporation, model ACL-9100). Laminated on top. Next, the base film was peeled off and fired at 570 ° C.
The thickness of the electrode after firing is 10 μm, and the thickness of the dielectric layer is 10
μm, the ceiling width of the barrier layer is 50 μm, the bottom width is 80 μm,
The film thickness was 120 ± 10 m.

Example 6 (Composition of Ink for Forming Photosensitive Electrode) Silver powder (spherical, average particle size 1 μm) 70 parts by weight Glass frit (average particle size 1 μm, no alkali, softening point 550 ° C.) , Coefficient of thermal expansion (30 to 300 ° C.) 73 × 10 ⁷ ) 5 parts by weight Photosensitive resin component 18 parts by weight (Breakdown) Alkali developable polymer (methyl methacrylate / methacrylic acid copolymer) And containing 7 mol% of a double bond in its side chain, acid value 100 mg KOH / g) 50 parts by weight ethylene oxide-modified trimethylolpropane triacrylate 30 parts by weight Photoinitiator (Cirva Geigy, Irgacure 369) ... 3 parts by weight-Propylene glycol monomethyl ether ... ... 15 parts by weight using ceramic beads Using a bead mill was mixed dispersion treatment to prepare a photosensitive electrode forming ink.

After the polyethylene film on the transfer sheet obtained in Example 4 was peeled off,
Apply the photosensitive electrode forming ink by doctor method,
The dry film thickness was 20 μm. The obtained laminated sheet was irradiated with ultraviolet light (200 mJ / cm) from the base film side.
² ) After that, the electrode forming layer was developed with a 0.2% aqueous solution of sodium carbonate to remove unexposed portions. The barrier formation layer served as a mask, and the electrode formation layer could be formed with high positional accuracy between the barrier formation layers. After drying, a polyethylene film was stuck on the electrode forming layer to form a third transfer sheet of the present invention shown in FIG.

After the polyethylene film of the transfer sheet was peeled off, an auto-cut laminator (manufactured by Asahi Kasei Corporation)
Using a model ACL-9100), the substrate was laminated on a glass substrate provided with an underlayer under transfer conditions of a substrate preheating temperature of 80 ° C. and a ramirole temperature of 100 ° C. Next, the base film was peeled off and fired at 570 ° C. The thickness of the electrode after firing is 10 μm, the thickness of the dielectric layer is 10 μm, and
The barrier layer has a ceiling width of 50 μm, a bottom width of 80 μm, and a film thickness of 12 μm.
It was 0 ± 10 m.

(Example 7) (Ink for forming undercoat layer) Composition: Glass frit (main component: PbO, SiO ₂ , B ₂ O ₃ (non-alkali), thermal expansion coefficient (30 to 300 ° C.) 82 × 10 ⁷ , softening point 575 ° C.) 65 parts by weight α-alumina RA-40 (Iwatani Chemical Industry) 11 parts by weight Copper oxide (CuO) 4 parts by weight n- Butyl methacrylate / 2-hydroxyethyl methacrylate copolymer (8/2) 11 parts by weight Benzyl butyl phthalate 3 parts by weight Dibutyl phthalate 3 parts by weight Propylene glycol monomethyl ether 20 parts by weight were mixed and dispersed using a bead mill using ceramic beads to prepare a base forming ink.

After the polyethylene film in the transfer sheet obtained in Example 6 was peeled off, the base forming ink was applied on the electrode forming layer by screen printing in the form of a base pattern to form a base film having a dry film thickness of 20 μm. Was formed, and a polyethylene film was adhered.

After the polyethylene film of the transfer sheet was peeled off, an auto cut laminator (manufactured by Asahi Kasei Corporation)
Using a model ACL-9100), the substrate was laminated on a glass substrate under the transfer conditions of a substrate preheating temperature of 80 ° C. and a ramylol temperature of 100 ° C. Next, the base film was peeled off and fired at 570 ° C. The thickness of the underlayer after firing is 10
μm, the thickness of the electrode is 10 μm, and the thickness of the dielectric layer is 10 μm.
m, the ceiling width of the barrier layer was 50 μm, the bottom width was 80 μm, and the film thickness was 120 ± 10 m. By this method, an underlayer, an electrode layer, a dielectric layer, and a barrier layer could be simultaneously formed on a glass substrate with high positional accuracy.

[0133]

The transfer sheet of the present invention can be used as an electrode layer in PDPs, image displays, thermal heads, integrated circuits, etc.
This is suitable for use in a system in which a dielectric layer and a barrier layer are formed by using a transfer sheet separately prepared, so that the manufacturing time can be reduced and the yield can be improved. Further, since the pattern is formed by transfer, it is possible to form a layer having excellent surface smoothness, a uniform film thickness and good distribution accuracy. Further, since only the pattern portion can be transferred, the use of materials can be reduced, and the cost can be reduced.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a cross section of a base film having a concave pattern formed thereon.

FIG. 2 is a view for explaining a first transfer sheet of the present invention in a cross section thereof.

FIG. 3 is a view for explaining a first pattern forming method of the present invention.

FIG. 4 is a view for explaining a state in which a pattern is transferred to a transfer target using a first transfer sheet of the present invention.

FIG. 5 is a view for explaining a method of forming a concave pattern on a base film using an intaglio roll.

FIG. 6 is a view for explaining a transfer method when an ionizing radiation-degradable resin is used as a concave pattern forming material.

FIG. 7 is a view for explaining a second transfer sheet of the present invention in cross section.

FIG. 8 is a view for explaining a second pattern forming method of the present invention.

FIG. 9 is a view for explaining a state in which a pattern is transferred to a transfer target using a second transfer sheet of the present invention.

FIG. 10 is a view for explaining a third transfer sheet of the present invention in cross section.

FIG. 11 is a view for explaining a third pattern forming method of the present invention.

FIG. 12 is a view for explaining a state in which a pattern has been transferred to an object to be transferred using a third transfer sheet of the present invention.

FIG. 13 is a diagram for explaining an example of a method for producing a third transfer sheet of the present invention.

FIG. 14 is a diagram for explaining an AC type plasma display panel.

FIG. 15 is a diagram for explaining another example of the AC type plasma display panel.

[Explanation of symbols]

1 is a front plate, 2 is a back plate, 3 is a cell barrier, 4 is a sustain electrode, 5 is a bus electrode, 6, 6 'are dielectric layers, and 7 is MgO.
Layer, 8 an address electrode, 9 a phosphor layer, 10 an underlayer,
11 is a base film, 12 is a concave pattern portion, 13 is an ink layer, 13 'is a first ink layer, 14 is a transfer object,
15 is a second ink layer, 16 is a third ink layer, 33 is a roll intaglio, 34 is a recess, 35 is a resin supply device, 36 is a curable resin, 37 is a curing device, 39 is a release roll, 40
Denotes a coating unit, 44 denotes a paper feed take-up roll, 45 denotes a feed-side feed roll, 47 denotes a convention sweater roll, and 48 denotes a paper discharge take-up roll.

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Yasunori Kuruma 1-1-1 Ichigaya Kagacho, Shinjuku-ku, Tokyo Inside Dai Nippon Printing Co., Ltd.

Claims (15)

[Claims] 1. A transfer characterized in that a concave portion of a base film having a concave pattern formed on one surface is filled with an ink layer composed of at least an inorganic component made of glass frit and a resin component removed by firing. Sheet. 2. The transfer sheet according to claim 1, wherein the transfer sheet is a transfer sheet for producing a plasma display panel, and the ink layer is an electrode forming layer. 3. An electroconductive ink layer in which an electrode forming layer comprises at least an inorganic component made of glass frit and a resin component removed by firing, or a dark conductive ink layer containing a dark pigment in the conductive ink. The transfer sheet according to claim 2, wherein the transfer sheet comprises a laminate of the conductive ink layer and the dark conductive ink layer. 4. The transfer sheet according to claim 1, wherein the transfer sheet is a transfer sheet for producing a plasma display panel, and the ink layer is a barrier forming layer. 5. The barrier forming layer comprises a white ink layer or a dark color ink layer composed of at least an inorganic component composed of glass frit and a resin component removed by firing, or a laminate of a white ink layer and a dark color ink layer. 5. The transfer sheet according to claim 4, wherein: 6. A concave portion of a base film having a concave pattern formed on one surface is filled with a first ink layer comprising at least an inorganic component made of glass frit and a resin component removed by firing. A transfer sheet, wherein a second ink layer made of at least an inorganic component made of glass frit and a resin component removed by firing is laminated on the concave pattern filled with the first ink layer. 7. The transfer according to claim 6, wherein the transfer sheet is a transfer sheet for producing a plasma display panel, wherein the first ink layer is an electrode forming layer, and the second ink layer is a base forming layer. Sheet. 8. The transfer sheet according to claim 6, wherein the transfer sheet is a transfer sheet for producing a plasma display panel, wherein the first ink layer is a barrier forming layer, and the second ink layer is a dielectric forming layer. Transfer sheet. 9. The barrier forming layer comprises a white ink layer or a dark ink layer, or a laminate of a white ink layer and a dark ink layer, comprising at least an inorganic component composed of glass frit and a resin component removed by firing. 9. The transfer sheet according to claim 8, wherein: 10. A first ink layer comprising at least an inorganic component composed of glass frit and a resin component removed by firing is filled in a concave portion of a base film having a concave pattern formed on one surface thereof. First
A second ink layer made of at least an inorganic component made of glass frit and a resin component removed by firing is laminated on the concave pattern filled with the ink layer, and a third ink layer is made on the second ink layer. A transfer sheet, wherein the ink layers of the above are laminated. 11. A transfer sheet for producing a plasma display panel, wherein the first ink layer is a white ink layer or a dark ink layer comprising at least an inorganic component composed of glass frit and a resin component removed by firing. The method according to claim 10, wherein the barrier layer is formed by laminating a white ink layer and a dark ink layer, the second ink layer is a dielectric layer, and the third ink layer is an electrode layer. Transfer sheet. 12. A transfer sheet in which a concave portion of a base film having a concave pattern formed on one surface is filled with an ink layer composed of at least an inorganic component composed of glass frit and a resin component removed by firing. A pattern forming method, comprising: laminating an ink layer to a transfer object by laminating the ink layer onto the transfer object from the side; and baking the transfer object onto which the ink layer has been transferred. 13. A concave portion of a base film having a concave pattern formed on one surface thereof is filled with a first ink layer composed of at least an inorganic component made of glass frit and a resin component removed by firing. A transfer sheet in which an inorganic component composed of at least glass frit and a second ink layer composed of a resin component removed by firing are laminated on the pattern, the first and second ink layers are laminated on a transfer object from the second ink layer side. A pattern forming method, comprising: simultaneously transferring a second ink layer; and baking the transfer member onto which the first and second ink layers have been transferred. 14. A concave portion of a base film having a concave pattern formed on one surface thereof is filled with a first ink layer comprising at least an inorganic component made of glass frit and a resin component removed by firing, and A transfer sheet in which a second ink layer made of at least an inorganic component made of glass frit and a resin component removed by firing is laminated on the concave pattern, and a third ink layer is further laminated on the second ink layer. Is laminated on the transfer object from the third ink layer side, and the first to third ink layers are simultaneously transferred, and the transfer object on which the first to third ink layers are transferred is fired. A pattern forming method characterized by the above-mentioned. 15. The method according to claim 12, wherein the pattern forming method is a plasma display panel forming method, wherein the object to be transferred is a plasma display panel substrate, and the ink layer pattern is a plasma display panel member pattern. Item 15. The pattern forming method according to Item 14.