JPH10138318A - Production of multilayered extrusion polyimide film - Google Patents

Production of multilayered extrusion polyimide film

Info

Publication number
JPH10138318A
JPH10138318A JP8336478A JP33647896A JPH10138318A JP H10138318 A JPH10138318 A JP H10138318A JP 8336478 A JP8336478 A JP 8336478A JP 33647896 A JP33647896 A JP 33647896A JP H10138318 A JPH10138318 A JP H10138318A
Authority
JP
Japan
Prior art keywords
polyimide
solution
polyamic acid
polyimide film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8336478A
Other languages
Japanese (ja)
Inventor
Takeyuki Matsubara
健之 松原
Toshinori Hosoma
敏徳 細馬
Kazuhiko Yoshioka
和彦 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP8336478A priority Critical patent/JPH10138318A/en
Publication of JPH10138318A publication Critical patent/JPH10138318A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036Multilayers with layers of different types

Landscapes

  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Laminated Bodies (AREA)
  • Moulding By Coating Moulds (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To perform the lamination with metal foil under a relatively gentle condition by using a polyamic acid soln. forming substrate polyimide having an imide unit represented by specific formula and using a soln. of polyimide having a specific compsn. composed of an imide unit represented by a specific formula or a precursor thereof. SOLUTION: An a polyamic acid soln. for a substrate layer, a polyamic acid soln. forming substrate polyimide having an imide unit represented by formula I is used. As a soln. of polyimide for a thin layer or a precursor thereof, a soln. of polyimide consisting of imide units A, B represented by formulae II, III (wherein R is a tetravalent aromatic residue and R' is a divalent aromatic or aliphatic residue) and characterized by that A is 80-100mol% and B is 20-0mol%) or a precursor thereof is used. These solns. are extruded to a support to form a solvent-containing multilayered extrudate which is, in turn, heated and dried to be imidated to obtain a multilayered polyimide film low in the coefficient of thermal and linear expansion.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、多層押出しポリ
イミドフィルムの製法に関するものであり、特に低熱線
膨張性のポリイミドフィルムを与える3,3’,4,
4’−ビフェニルテトラカルボン酸二無水物とパラフェ
ニレンジアミンとを必須成分とする基体ポリイミド層の
片面または両面に特定のポリイミド層が多層押出し流延
製膜成形法により積層されてなる多層押出しポリイミド
フィルムの製法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a multilayer extruded polyimide film, and more particularly to a method for producing a polyimide film having a low linear thermal expansion.
A multilayer extruded polyimide film comprising a specific polyimide layer laminated on one or both sides of a base polyimide layer containing 4'-biphenyltetracarboxylic dianhydride and paraphenylenediamine as essential components by a multilayer extrusion casting method. It relates to the manufacturing method.

【0002】[0002]

【従来の技術】カメラ、パソコン、液晶ディスプレイな
どの電子機器類への用途として芳香族ポリイミドフィル
ムは広く使用されている。芳香族ポリイミドフィルムを
フレキシブルプリント板(FPC)やテ−プ・オ−トメ
イティッド・ボンディング(TAB)などの基板材料と
して使用するためには、エポキシ樹脂などの接着剤を用
いて銅箔を張り合わせる方法が採用されている。
2. Description of the Related Art Aromatic polyimide films are widely used for electronic devices such as cameras, personal computers, and liquid crystal displays. In order to use an aromatic polyimide film as a substrate material for a flexible printed board (FPC) or a tape-automated bonding (TAB), a copper foil is laminated using an adhesive such as an epoxy resin. The method has been adopted.

【0003】芳香族ポリイミドフィルムは耐熱性、機械
的強度、電気的特性などが優れているが、接着剤の耐熱
性等が劣るため、本来のポリイミドの特性を損なうこと
が指摘されている。このような問題を解決するために、
接着剤を使用しないでポリイミドフィルムに銅を電気メ
ッキしたり、銅箔にポリアミック酸溶液を塗布し、乾
燥、イミド化したり、熱可塑性のポリイミドを熱圧着さ
せたオ−ルポリイミド基材も開発されている。
It has been pointed out that aromatic polyimide films are excellent in heat resistance, mechanical strength, electrical properties and the like, but are inferior in properties of polyimide due to poor heat resistance of adhesives. To solve such a problem,
An all-polyimide substrate has been developed in which copper is electroplated on a polyimide film without using an adhesive, a polyamic acid solution is applied to a copper foil, dried and imidized, or a thermoplastic polyimide is thermocompressed. ing.

【0004】また、ポリイミドフィルムと金属箔との間
にポリイミド接着剤をサンドイッチ状に接合させたポリ
イミドラミネ−トおよびその製法が知られている(米国
特許第4543295号)。しかし、このポリイミドラ
ミネ−トおよびその製法は、3,3’,4,4’−ビフ
ェニルテトラカルボン酸とパラフェニレンジアミンとを
必須成分とするポリイミドフィルムについては金属箔と
の剥離強度が小さく使用できないという問題がある。
Further, a polyimide laminate in which a polyimide adhesive is sandwiched between a polyimide film and a metal foil and a method for producing the same are known (US Pat. No. 4,543,295). However, this polyimide laminate and its production method cannot be used for a polyimide film containing 3,3 ', 4,4'-biphenyltetracarboxylic acid and paraphenylenediamine as essential components because the peel strength from the metal foil is small. There is a problem.

【0005】さらに、多層の芳香族ポリイミドフィルム
や金属箔積層ポリイミドフィルムおよびその製法が知ら
れている(特開平3−180343号、特開平4−33
847号、特開平4−33848号)。しかし、これら
の方法では金属箔と多層ポリイミドフィルムとの積層
に、エポキシ系の接着剤を必要としたり直接接着するた
めには比較的高温、高圧を必要とする。
Further, a multilayer aromatic polyimide film, a metal foil laminated polyimide film and a method for producing the same are known (Japanese Patent Application Laid-Open Nos. 3-180343 and 4-33).
847, JP-A-4-33848). However, these methods require an epoxy-based adhesive or a relatively high temperature and a high pressure to directly bond the metal foil and the multilayer polyimide film to each other.

【0006】[0006]

【発明が解決しようとする課題】この発明の目的は、比
較的緩和な条件で金属箔と積層でき、しかも熱線膨張係
数の小さい多層ポリイミドフィルムの製法を提供するこ
とである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a multilayer polyimide film which can be laminated with a metal foil under relatively mild conditions and has a small coefficient of linear thermal expansion.

【0007】[0007]

【課題を解決するための手段】すなわち、この発明は、
基体層用のポリアミック酸溶液と薄層用のポリイミドま
たはその前駆体の溶液とを二層または三層の押出し成形
用ダイスを有する押出し成形機と溶液流延製膜装置とを
組み合わせた多層押出し流延製膜成形法によって多層押
出しポリイミドフィルムを製造する方法において、基体
層用のポリアミック酸溶液として下記式のイミド単位を
有する基体ポリイミド(X)を与えるポリアミック酸溶
液を使用し、
That is, the present invention provides:
Multilayer extrusion flow combining a polyamic acid solution for the base layer and a solution of polyimide or its precursor for the thin layer with an extruder having two or three layers of extrusion dies and a solution casting film forming apparatus In a method for producing a multilayer extruded polyimide film by a cast film forming method, a polyamic acid solution giving a substrate polyimide (X) having an imide unit of the following formula is used as a polyamic acid solution for a substrate layer,

【化3】 薄層用のポリイミドまたはその前駆体の溶液として下記
のイミド単位(A)および(B)からなり、
Embedded image As a solution of polyimide or a precursor thereof for a thin layer, the imide unit comprises the following imide units (A) and (B),

【化4】 〔式(B)において、Rは4価の芳香族残基を、R’は
2価の芳香族または脂肪族残基を表す。〕 (A)が80〜100モル%、(B)が20〜0モル%
であるポリイミド(Y)またはその前駆体の溶液を使用
し、支持体上に押出した溶媒を含む多層押し出し物を加
熱して乾燥およびイミド化することを特徴とする熱線膨
張係数が5×10-6−30×10-6cm/cm/℃であ
る多層押出しポリイミドフィルムの製法に関する。
Embedded image [In the formula (B), R represents a tetravalent aromatic residue, and R ′ represents a divalent aromatic or aliphatic residue. (A) is 80 to 100 mol%, and (B) is 20 to 0 mol%.
A multi-layer extrudate containing a solvent extruded on a support is heated and dried and imidized using a solution of polyimide (Y) or a precursor thereof, which has a coefficient of linear thermal expansion of 5 × 10 − The present invention relates to a method for producing a multilayer extruded polyimide film having a temperature of 6-30 × 10 −6 cm / cm / ° C.

【0008】この発明における基体ポリイミド(X)
は、3,3’,4,4’−ビフェニルテトラカルボン酸
二無水物(以下単にs−BPDAと略記することもあ
る。)とパラフェニレンジアミン(以下単にPPDと略
記することもある。)と場合によりさらに4,4’−ジ
アミノジフェニルエ−テル(以下単にDADEと略記す
ることもある。)とから製造される。PPD/DADE
(モル比)は100/0〜70/30であることが必要
である。基体ポリイミド(X)の合成は、最終的に各成
分の割合が前記範囲内であればランダム重合、ブロック
重合、あるいはあらかじめ2種類のポリアミック酸を合
成しておき両ポリアミック酸溶液を混合後反応条件下で
混合する、いずれの方法によっても達成される。各成分
の割合を前記範囲内にすることによって、最終的に得ら
れるフレキシブルな多層押出しポリイミドフィルムが優
れた特性、特に熱線膨張係数が小さく、良好な耐熱性、
機械的物性、電気的物性を示す。
The base polyimide (X) according to the present invention
Are 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (hereinafter sometimes abbreviated simply as s-BPDA) and paraphenylenediamine (hereinafter sometimes simply abbreviated as PPD). In some cases, it is further produced from 4,4′-diaminodiphenyl ether (hereinafter may be simply abbreviated as DADE). PPD / DADE
(Molar ratio) needs to be 100/0 to 70/30. In the synthesis of the base polyimide (X), if the proportion of each component is finally within the above range, random polymerization, block polymerization, or synthesis of two kinds of polyamic acids in advance, mixing of both polyamic acid solutions, and reaction conditions This is achieved by any of the methods of mixing below. By setting the proportion of each component within the above range, the finally obtained flexible multilayer extruded polyimide film has excellent properties, particularly a small coefficient of linear thermal expansion, good heat resistance,
Shows mechanical and electrical properties.

【0009】前記各成分を使用し、ジアミン成分とテト
ラカルボン酸二無水物の略等モル量を、有機溶媒中で反
応させてポリアミック酸の溶液(均一な溶液状態が保た
れていれば一部がイミド化されていてもよい)とする。
前記ポリイミド(X)の物性を損なわない種類と量の他
の芳香族テトラカルボン酸二無水物、例えばピロメリッ
ト酸二無水物等、芳香族ジアミン、例えば4,4’−ジ
アミノジフェニルメタン等を使用してもよい。
Using each of the above components, a substantially equimolar amount of a diamine component and a tetracarboxylic dianhydride are reacted in an organic solvent to form a solution of a polyamic acid (partly if a uniform solution state is maintained). May be imidized).
Using other types and amounts of aromatic tetracarboxylic dianhydrides such as pyromellitic dianhydride, aromatic diamines such as 4,4'-diaminodiphenylmethane etc. which do not impair the physical properties of the polyimide (X) You may.

【0010】この発明におけるポリイミド(Y)は、
1,3−ビス(4−アミノフェノキシ)ベンゼン(以下
単に、TPE−Rと略記することもある)と、2,3,
3’,4’−ビフェニルテトラカルボン酸二無水物(以
下単に、a−BPDAと略記することもある)成分と、
場合により他のテトラカルボン酸二無水物およびジアミ
ン成分とから製造される。前記の各成分を使用し、好適
にはテトラカルボン酸二無水物を過剰の条件下、もしく
はジカルボン酸無水物でジアミン末端を封止する条件下
で有機溶媒中で反応させてポリアミック酸の溶液(均一
な溶液状態が保たれていれば一部がイミド化されていて
もよい)とする。
In the present invention, the polyimide (Y) is
1,3-bis (4-aminophenoxy) benzene (hereinafter sometimes abbreviated simply as TPE-R), 2,3,
A 3 ′, 4′-biphenyltetracarboxylic dianhydride (hereinafter sometimes simply referred to as a-BPDA) component;
It is optionally produced from other tetracarboxylic dianhydrides and diamine components. Using each of the above components, preferably, a tetraamic dianhydride is reacted in an organic solvent under excess conditions or under conditions in which diamine terminals are blocked with a dicarboxylic anhydride, and a solution of a polyamic acid ( Some may be imidized as long as a uniform solution state is maintained).

【0011】前記のポリイミド(Y)は、2,3,
3’,4’−ビフェニルテトラカルボン酸二無水物と
1,3−ビス(4−アミノフェノキシ)ベンゼンと、さ
らに場合により他のテトラカルボン酸二無水物および他
のジアミンとを、有機溶媒中、約100℃以下、特に2
0〜60℃の温度で反応させてポリアミック酸の溶液と
し、このポリアミック酸の溶液をド−プ液として使用
し、そのド−プ液の薄膜を形成し、その薄膜から溶媒を
蒸発させ除去すると共にポリアミック酸をイミド環化す
ることにより製造することができる。
The polyimide (Y) is 2,3,
3 ′, 4′-biphenyltetracarboxylic dianhydride, 1,3-bis (4-aminophenoxy) benzene, and optionally another tetracarboxylic dianhydride and another diamine in an organic solvent, About 100 ° C or less, especially 2
The solution is reacted at a temperature of 0 to 60 ° C. to form a solution of polyamic acid, and the solution of polyamic acid is used as a dope solution, a thin film of the dope solution is formed, and the solvent is evaporated from the thin film and removed. Together with the imide cyclization of a polyamic acid.

【0012】また、前述のようにして製造したポリアミ
ック酸の溶液を150〜250℃に加熱するか、または
イミド化剤を添加して150℃以下、特に15〜50℃
の温度で反応させて、イミド環化した後溶媒を蒸発させ
る、もしくは貧溶媒中に析出させて粉末とした後、該粉
末を有機溶液に溶解してポリイミド(Y)の有機溶媒溶
液を得ることができる。
Further, the solution of the polyamic acid prepared as described above is heated to 150 to 250 ° C. or 150 ° C. or less, particularly 15 to 50 ° C. by adding an imidizing agent.
And then evaporating the solvent after imide cyclization, or precipitating in a poor solvent to form a powder, and dissolving the powder in an organic solution to obtain an organic solvent solution of polyimide (Y). Can be.

【0013】この発明でポリイミド(Y)に使用するこ
とができるテトラカルボン酸二無水物としては、2,
3,3’,4’−ビフェニルテトラカルボン酸二無水物
が最も好ましいが、その20モル%以下、好ましくは1
0モル%以下が他の芳香族テトラカルボン酸二無水物
(前記式中、R基を含むテトラカルボン酸二無水物)、
例えば、ピロメリット酸二無水物、3,3’,4,4’
−ベンゾフェノンテトラカルボン酸二無水物、3,
3’,4,4’−ビフェニルテトラカルボン酸二無水
物、2,2−ビス(3、4−ジカルボキシフェニル)プ
ロパン二無水物、ビス(3,4−ジカルボキシフェニ
ル)エ−テル二無水物、ビス(3,4−ジカルボキシフ
ェニル)スルホン二無水物あるいは2,3,6,7−ナ
フタレンテトラカルボン酸二無水物など、好適には3,
3’,4,4’−ビフェニルテトラカルボン酸二無水物
によって置き換えられてもよい。
The tetracarboxylic dianhydride which can be used for the polyimide (Y) in the present invention includes 2,2
Most preferred is 3,3 ′, 4′-biphenyltetracarboxylic dianhydride, but not more than 20 mol%, preferably 1%.
0% by mole or less of another aromatic tetracarboxylic dianhydride (in the above formula, a tetracarboxylic dianhydride containing an R group),
For example, pyromellitic dianhydride, 3,3 ', 4,4'
-Benzophenonetetracarboxylic dianhydride, 3,
3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride , Bis (3,4-dicarboxyphenyl) sulfone dianhydride or 2,3,6,7-naphthalenetetracarboxylic dianhydride.
It may be replaced by 3 ', 4,4'-biphenyltetracarboxylic dianhydride.

【0014】この発明でポリイミド(Y)に使用するこ
とができるジアミンとしては、1,3−ビス(4−アミ
ノフェノキシ)ベンゼンが最も好ましいが、好ましくは
その20モル%以下、特に10モル%以下が他のジアミ
ン(前記式中R’基を含むジアミン)、例えば、4,
4’−ジアミノジフェニルエ−テル、4,4’−ジアミ
ノジフェニルスルフィド、4,4’−ジアミノベンゾフ
ェノン、4,4’−ジアミノジフェニルメタン、2,2
−ビス(4−アミノフェニル)プロパン、1,4−ビス
(4−アミノフェノキシ)ベンゼン、4,4’−ビス
(4−アミノフェニル)ジフェニルエ−テル、4,4’
−ビス(4−アミノフェニル)ジフェニルスルホン、
4,4’−ビス(4−アミノフェニル)ジフェニルスル
フィド、4,4’−ビス(4−アミノフェニル)ジフェ
ニルメタン、4,4’−ビス(4−アミノフェノキシ)
ジフェニルエ−テル、4,4’−ビス(4−アミノフェ
ノキシ)ジフェニルスルホン、4,4’−ビス(4−ア
ミノフェノキシ)ジフェニルスルフィド、4,4’−ビ
ス(4−アミノフェノキシ)ジフェニルメタン、2,2
−ビス〔4−(アミノフェノキシ)フェニル〕プロパ
ン、2,2−ビス〔4−(4−アミノフェノキシ)フェ
ニル〕ヘキサフルオロプロパンなどの複数のベンゼン環
を有する柔軟な芳香族ジアミン、1,4−ジアミノブタ
ン、1,6−ジアミノヘキサン、1,8−ジアミノオク
タン、1,10−ジアミノデカン、1,12−ジアミノ
ドデカンなどの脂肪族ジアミン、キシレンジアミンなど
のジアミンによって置き換えられてもよい。複数のベン
ゼン環を有する柔軟な芳香族ジアミンの使用割合は全ジ
アミンに対して20モル%以下、特に10モル%以下で
あることが好ましい。また、脂肪族ジアミンの使用割合
は全ジアミンに対して20モル%以下であることが好ま
しい。この割合を越すとポリイミド(Y)の耐熱性が低
下する。
As the diamine which can be used for the polyimide (Y) in the present invention, 1,3-bis (4-aminophenoxy) benzene is most preferable, but preferably 20 mol% or less, particularly 10 mol% or less. Is another diamine (diamine containing an R ′ group in the above formula), for example, 4,
4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminobenzophenone, 4,4'-diaminodiphenylmethane, 2,2
-Bis (4-aminophenyl) propane, 1,4-bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenyl) diphenyl ether, 4,4 '
-Bis (4-aminophenyl) diphenyl sulfone,
4,4'-bis (4-aminophenyl) diphenyl sulfide, 4,4'-bis (4-aminophenyl) diphenylmethane, 4,4'-bis (4-aminophenoxy)
Diphenyl ether, 4,4'-bis (4-aminophenoxy) diphenyl sulfone, 4,4'-bis (4-aminophenoxy) diphenyl sulfide, 4,4'-bis (4-aminophenoxy) diphenylmethane, , 2
Flexible aromatic diamines having a plurality of benzene rings, such as -bis [4- (aminophenoxy) phenyl] propane and 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane; It may be replaced by an aliphatic diamine such as diaminobutane, 1,6-diaminohexane, 1,8-diaminooctane, 1,10-diaminodecane, 1,12-diaminododecane, or a diamine such as xylenediamine. The use ratio of the flexible aromatic diamine having a plurality of benzene rings is preferably 20 mol% or less, particularly preferably 10 mol% or less based on the total diamine. Further, the use ratio of the aliphatic diamine is preferably 20 mol% or less based on the total diamine. Exceeding this ratio lowers the heat resistance of the polyimide (Y).

【0015】この発明において、好適にはポリイミド
(Y)のアミン末端を封止するためのジカルボン酸無水
物、例えば、無水フタル酸およびその置換体、ヘキサヒ
ドロ無水フタル酸およびその置換体、無水コハク酸およ
びその置換体など、特に、無水フタル酸を使用すること
ができる。
In the present invention, a dicarboxylic acid anhydride for blocking the amine terminal of the polyimide (Y), for example, phthalic anhydride and its substitution, hexahydrophthalic anhydride and its substitution, succinic anhydride In particular, phthalic anhydride can be used.

【0016】この発明におけるポリイミド(Y)を得る
ためには、前記の有機溶媒中、ジアミン(アミノ基のモ
ル数として)の使用量が酸無水物の全モル数(テトラ酸
二無水物とジカルボン酸無水物の酸無水物基としての総
モルとして)に対する比として、好ましくは0.92〜
1.0、特に0.98〜1.0、そのなかでも特に0.
99〜1.0であり、ジカルボン酸無水物の使用量がテ
トラカルボン酸二無水物の酸無水物基モル量に対する比
として、好ましくは0.05以下、特に0.0001〜
0.02であるような割合の各成分を反応させることが
好ましい。
In order to obtain the polyimide (Y) in the present invention, the amount of the diamine (as the number of moles of amino group) in the above-mentioned organic solvent is the total number of moles of the acid anhydride (tetraacid dianhydride and dicarboxylic acid). (Total moles of acid anhydride groups as acid anhydride groups)
1.0, especially 0.98 to 1.0, and especially 0.0.
99 to 1.0, and the amount of the dicarboxylic anhydride to be used is preferably 0.05 or less, more preferably 0.0001 to less, as the ratio to the molar amount of the acid anhydride group of the tetracarboxylic dianhydride.
It is preferable to react each component at a ratio of 0.02.

【0017】前記のジアミンおよびジカルボン酸無水物
の使用割合が前記の範囲外であると、得られるポリアミ
ック酸、従ってポリイミド(Y)の分子量が小さく、フ
ィルムの強度および剥離強度の低下をもたらす。また、
特にジアミン成分過剰の条件では、ポリアミック酸の環
化イミド化あるいは溶媒の除去の際に劣化などを生じ、
フィルムの物性低下および剥離強度の低下をもたらす。
これらのゲル化を制限する目的でリン系安定剤、例えば
亜リン酸トリフェニル、リン酸トリフェニル等をポリア
ミック酸重合時に固形分(ポリマ−)濃度に対して0.
01〜1%の範囲で添加することができる。
If the use ratio of the diamine and dicarboxylic anhydride is out of the above range, the molecular weight of the obtained polyamic acid, that is, polyimide (Y) is small, and the strength of the film and the peel strength are lowered. Also,
In particular, under the condition of an excess of the diamine component, cyclization imidization of the polyamic acid or deterioration occurs when the solvent is removed, and the like.
This results in a decrease in physical properties of the film and a decrease in peel strength.
For the purpose of restricting the gelation, a phosphorus-based stabilizer such as triphenyl phosphite, triphenyl phosphate or the like is added at a concentration of 0.2 to the solid content (polymer) concentration at the time of polyamic acid polymerization.
It can be added in the range of 01 to 1%.

【0018】前記のポリアミック酸製造に使用する有機
溶媒は、ポリイミド(X)およびポリイミド(Y)のい
ずれに対しても、N−メチル−2−ピロリドン、N,N
−ジメチルホルムアミド、N,N−ジメチルアセトアミ
ド、N,N−ジエチルアセトアミド、ジメチルスルホキ
シド、ヘキサメチルホスホルアミド、N−メチルカプロ
ラクタム、クレゾ−ル類などが挙げられる。これらの有
機溶媒は単独で用いてもよく、2種以上を併用してもよ
い。
The organic solvent used for the production of the polyamic acid is N-methyl-2-pyrrolidone, N, N
-Dimethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, dimethylsulfoxide, hexamethylphosphoramide, N-methylcaprolactam, cresols and the like. These organic solvents may be used alone or in combination of two or more.

【0019】この発明における多層ポリイミドフィルム
の製造においては、例えば上記の基体ポリイミド(X)
のポリアミック酸溶液(透明粘調な溶液)と薄層用のポ
リイミド(Y)またはその前駆体の溶液を共押出して、
これをステンレス鏡面、ベルト面等の支持体面上に流延
塗布し、100〜200℃で半硬化状態またはそれ以前
の乾燥状態とすることが好ましい。200℃を越えた高
い温度で流延フィルムを処理すると、多層ポリイミドフ
ィルムの製造において、接着性の低下などの欠陥を来す
傾向にある。この半硬化状態またはそれ以前の状態と
は、加熱および/または化学イミド化によって一部ゲル
化した自己支持性の状態にあるか、またはその直前の段
階で自己支持性を有する状態を意味する。
In the production of the multilayer polyimide film according to the present invention, for example, the base polyimide (X)
Co-extrusion of a polyamic acid solution (a transparent viscous solution) and a solution of a polyimide (Y) or a precursor thereof for a thin layer,
It is preferably applied by casting onto a support such as a stainless steel mirror surface or a belt surface, and is preferably in a semi-cured state at 100 to 200 ° C. or a dried state before that. Treating a cast film at a high temperature exceeding 200 ° C. tends to cause defects such as a decrease in adhesiveness in the production of a multilayer polyimide film. The semi-cured state or a state before the semi-cured state means a self-supporting state which is partially gelled by heating and / or chemical imidization, or has a self-supporting state immediately before.

【0020】この発明において、基体ポリイミド(X)
を与えるポリアミック酸の溶液と、ポリイミド(Y)を
与えるポリアミック酸の溶液あるいはポリイミドの溶液
との共押出しは、、例えば特開平3−180343号公
報に記載の共押出法によって、各々二層あるいは三層の
押出し成形用ダイスに供給し、支持体上にキャストして
おこなうことができる。この発明においてポリイミド
(X)を与える押出し物層の片面または両面に、ポリイ
ミド(Y)を与えるポリアミック酸の溶液あるいはポリ
イミド溶液を積層して多層フィルム状物を形成して乾燥
後、ポリイミド(Y)のガラス転移温度(Tg)以上で
劣化が生じる温度以下の温度、好適には360℃以下の
温度、特に好適には310〜360℃の温度(表面温度
計で測定した表面温度)まで加熱して(好適にはこの温
度で1〜60分間加熱して)乾燥およびイミド化して多
層押出しポリイミドフィルムを製造することができる。
In the present invention, the substrate polyimide (X)
The coextrusion of a solution of a polyamic acid to give a polyimide and a solution of a polyamic acid or a solution of a polyimide to give a polyimide (Y) is carried out, for example, by a coextrusion method described in JP-A-3-180343. The layer can be supplied to a die for extrusion molding and cast on a support. In the present invention, a polyamic acid solution or a polyimide solution that provides the polyimide (Y) is laminated on one or both surfaces of the extruded material layer that provides the polyimide (X) to form a multi-layered film, and after drying, the polyimide (Y) The glass is heated to a temperature below the temperature at which deterioration occurs at or above the glass transition temperature (Tg), preferably 360 ° C. or less, particularly preferably 310 ° C. to 360 ° C. (surface temperature measured by a surface thermometer). It can be dried (preferably heated at this temperature for 1-60 minutes) and imidized to produce a multilayer extruded polyimide film.

【0021】この発明において、基体ポリイミド(X)
のフィルム(層)の厚さは15〜150μmであること
が好ましい。15μm未満では作成した多層ポリイミド
フィルムの機械的強度、寸法安定性に問題が生じる。ま
た150μmより厚くなると溶媒の除去、イミド化に難
点が生じる。また、この発明において、柔軟なポリイミ
ド(Y)層の厚さは2−30μm、特に2〜10μmが
好ましい。2μm未満では接着性能が低下し、10μm
を超えても使用可能であるがとくに効果はなく、むしろ
金属箔積層体の耐熱性が低下する。基体ポリイミド
(X)のフィルム(層)の厚さは全体の多層フィルムの
70%以上であることが好ましい。この割合より小さい
と作成した多層フィルムの熱線膨張係数が大きくなり、
機械的強度、寸法安定性などの問題が発生する。
In the present invention, the substrate polyimide (X)
The film (layer) preferably has a thickness of 15 to 150 μm. When the thickness is less than 15 μm, problems occur in mechanical strength and dimensional stability of the formed multilayer polyimide film. On the other hand, when the thickness is more than 150 μm, there are difficulties in removing the solvent and imidizing. In the present invention, the thickness of the flexible polyimide (Y) layer is preferably 2 to 30 μm, particularly preferably 2 to 10 μm. If it is less than 2 μm, the adhesive performance is reduced, and
Although it can be used even if it exceeds, there is no particular effect, but rather the heat resistance of the metal foil laminate decreases. The thickness of the film (layer) of the base polyimide (X) is preferably 70% or more of the entire multilayer film. If it is smaller than this ratio, the coefficient of linear thermal expansion of the multilayer film created will increase,
Problems such as mechanical strength and dimensional stability occur.

【0022】この発明においては、ポリイミド(X)と
ポリイミド(Y)との特定の組合せを選択することによ
って、比較的低温度でキュアを行うことができるため、
ポリイミド(Y)の劣化を来すことなく、多層ポリイミ
ドフィルムのイミド化、乾燥を完了させることができ、
これにより熱線膨張係数が5×10-6−30×10-6
m/cm/℃、好ましくは10×10-6−25×10-6
cm/cm/℃であり、しかも緩和な条件で同種あるい
は金属箔、セラミックスなどの異種の基材と接着して接
着強度の大きい積層体を得ることができるのである。
In the present invention, curing can be performed at a relatively low temperature by selecting a specific combination of polyimide (X) and polyimide (Y).
The imidization and drying of the multilayer polyimide film can be completed without causing degradation of the polyimide (Y),
As a result, the coefficient of linear thermal expansion is 5 × 10 −6 −30 × 10 −6 c
m / cm / ° C., preferably 10 × 10 −6 −25 × 10 −6
It is possible to obtain a laminate having high adhesion strength by adhering to the same kind or different kinds of base materials such as metal foil and ceramic under mild conditions.

【0023】この発明の方法によって製造される多層押
出しポリミドフィルムは、ポリイミド(Y)層の片面あ
るいは両面に、基材、例えば金属箔を直接あるいはエポ
キシ樹脂、ポリエ−テルイミド、ポリアミド等の接着剤
を設けた後重ね合わせて積層する。直接積層する場合に
は好適には280〜330℃の温度、1〜100kgf
/cm2 、特に30−80kgf/cm2 の圧力、1秒
〜30分間加熱・加圧すればよい。また、前記の条件で
多層ポリイミドフィルムと金属箔とを熱ロ−ルを使用す
る連続的なホットメルト法により製造することもでき
る。
The multilayer extruded polyimide film produced by the method of the present invention is prepared by directly applying a base material, for example, a metal foil or an adhesive such as epoxy resin, polyetherimide, polyamide, etc., to one or both surfaces of the polyimide (Y) layer. After being provided, they are overlaid and laminated. In the case of direct lamination, the temperature is preferably 280 to 330 ° C., and 1 to 100 kgf.
/ Cm 2 , particularly 30-80 kgf / cm 2 , for 1 second to 30 minutes. Further, under the above conditions, the multilayer polyimide film and the metal foil can be produced by a continuous hot melt method using a heat roll.

【0024】この発明の方法によって製造される多層押
出しポリイミドフィルムを使用すると、他の接着剤を使
用せずに積層体の剥離強度が大きく、また前記の他の接
着剤を併用する場合には他の接着剤の層を薄くすること
が可能である。このため、積層体は熱や圧力に対して形
状変化が少なくなり、微細加工に適用可能となる。
When the multilayer extruded polyimide film produced by the method of the present invention is used, the peel strength of the laminate is increased without using another adhesive, and when the above-mentioned other adhesive is used in combination, the other It is possible to make the adhesive layer thinner. For this reason, the laminate has less change in shape with respect to heat and pressure, and can be applied to fine processing.

【0025】前記のこの発明の方法によって製造される
多層ポリイミドフィルムは、熱融着型ポリイミドフィル
ムであり、FPC、多層FPC、多層プリント配線板、
金属ベ−ス基板、ボンディングシ−ト、LOCテ−プ、
耐熱電線、面状発熱体に使用できる。
The multilayer polyimide film produced by the method of the present invention is a heat-fusible polyimide film, and may be an FPC, a multilayer FPC, a multilayer printed wiring board,
Metal base substrate, bonding sheet, LOC tape,
Can be used for heat-resistant wires and sheet heating elements.

【0026】これらの用途によっては、前記の多層ポリ
イミドフィルムである熱融着型ポリイミドフィルムのい
ずれかのポリイミド層に熱伝導性、融電率等を改善する
フィラ−、例えば窒化アルミ、窒化珪素等の窒素化合
物、SiO2 等の金属酸化物等を添加してもよい。
Depending on these applications, a filler for improving the thermal conductivity, the fusion rate, etc., on any of the polyimide layers of the above-mentioned heat-fusible polyimide film, which is a multilayer polyimide film, such as aluminum nitride, silicon nitride, etc. And a metal oxide such as SiO 2 may be added.

【0027】前記の積層体に使用される金属箔として
は、銅、アルミニウム、金、合金の箔など各種金属箔が
挙げられるが、好適には圧延銅、電解銅などがあげられ
る。金属箔の厚さは特に制限はないが、10〜60μm
が好ましい。
Examples of the metal foil used for the laminate include various metal foils such as copper, aluminum, gold, and alloy foils, preferably rolled copper and electrolytic copper. The thickness of the metal foil is not particularly limited, but is 10 to 60 μm.
Is preferred.

【0028】[0028]

【実施例】以下、この発明を実施例および比較例により
さらに詳細に説明する。以下の各例において、ポリイミ
ドフィルムの物性評価および銅箔との積層体の剥離強度
は以下の方法に従って測定した。 熱線膨張係数:20−200℃、5℃/分で測定(M
D)、×ppm/℃ 引張り強さ:ASTM D882(MD)、Kgf/m
2 伸び:ASTM D882(MD)、% 引張り弾性率:ASTM D882(MD)、Kgf/
mm2 加熱収縮率:JIS C2318、% 絶縁破壊強さ:ASTM D149、KV/25μ 10%苛性ソ−ダ中での耐薬品性:25℃で5日間保持
後の弾性率保持率を測定した。 積層体の剥離強度:350℃に保った熱プレスを用い、
電解銅箔(厚み35μm)をポリイミドフィルムと重
ね、5分間予熱後、60Kgf/cm2 の圧力で1分間
プレスを行い、銅箔積層体を得た。この積層体につい
て,50mm/分でT−剥離強度を測定した。
The present invention will be described below in more detail with reference to examples and comparative examples. In each of the following examples, the evaluation of the physical properties of the polyimide film and the peel strength of the laminate with the copper foil were measured according to the following methods. Coefficient of linear thermal expansion: measured at 20-200 ° C, 5 ° C / min (M
D), × ppm / ° C. Tensile strength: ASTM D882 (MD), Kgf / m
m 2 elongation: ASTM D882 (MD),% Tensile modulus: ASTM D882 (MD), Kgf /
mm 2 Heat shrinkage: JIS C2318,% Dielectric breakdown strength: ASTM D149, KV / 25μ Chemical resistance in 10% caustic soda: The elastic modulus retention after 5 days at 25 ° C. was measured. Peel strength of laminate: Using a hot press maintained at 350 ° C.
An electrolytic copper foil (thickness: 35 μm) was superimposed on the polyimide film, and after preheating for 5 minutes, pressed at a pressure of 60 kgf / cm 2 for 1 minute to obtain a copper foil laminate. This laminate was measured for T-peel strength at 50 mm / min.

【0029】基体ポリイミド(X)製造用ド−プの合成
例1 攪拌機、窒素導入管を備えた反応容器に、N−メチル−
2−ピロリドンを加え、さらに、パラフェニレンジアミ
ン(PPD)と3,3’,4,4’−ビフェニルテトラ
カルボン酸二無水物(s−BPDA)とを1000:9
98のモル比でモノマ−濃度が18%(重量%、以下同
じ)になるように加えた。添加終了後50℃を保ったま
ま3時間反応を続けた。得られたポリアミック酸溶液は
褐色粘調液体であり、25℃における溶液粘度は約15
00ポイズであった。この溶液(ド−プ)をX−1と称
する。
Synthesis Example 1 of Dope for Production of Substrate Polyimide (X) A reaction vessel equipped with a stirrer and a nitrogen inlet tube was charged with N-methyl-
2-Pyrrolidone was added, and paraphenylenediamine (PPD) and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (s-BPDA) were further added at 1000: 9.
At a molar ratio of 98, the monomer concentration was 18% (% by weight, the same applies hereinafter). After completion of the addition, the reaction was continued for 3 hours while maintaining the temperature at 50 ° C. The obtained polyamic acid solution is a brown viscous liquid, and the solution viscosity at 25 ° C. is about 15
It was 00 poise. This solution (dope) is called X-1.

【0030】基体ポリイミド(X)製造用ド−プの合成
例2 攪拌機、窒素導入管を備えた反応容器に、N,N−ジメ
チルアセトアミド(DMAC)を加え、さらに、パラフ
ェニレンジアミン(PPD)と4,4’−ジアミノジフ
ェニルエ−テルと3,3’,4,4’−ビフェニルテト
ラカルボン酸二無水物(s−BPDA)とを850:1
50:998のモル比でモノマ−濃度が18%(重量
%、以下同じ)になるように加えた。添加終了後50℃
を保ったまま3時間反応を続けた。得られたポリアミッ
ク酸溶液は褐色粘調液体であり、25℃における溶液粘
度は約1500ポイズであった。この溶液(ド−プ)を
X−2と称する。
Synthesis Example 2 of Dope for Producing Substrate Polyimide (X) N, N-dimethylacetamide (DMAC) was added to a reaction vessel equipped with a stirrer and a nitrogen inlet tube, and paraphenylenediamine (PPD) was added. 4,4'-diaminodiphenyl ether and 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (s-BPDA) were mixed at 850: 1.
It was added so that the monomer concentration became 18% (weight%, the same applies hereinafter) at a molar ratio of 50: 998. 50 ° C after completion of addition
The reaction was continued for 3 hours while maintaining the temperature. The obtained polyamic acid solution was a brown viscous liquid, and the solution viscosity at 25 ° C. was about 1500 poise. This solution (dope) is called X-2.

【0031】薄層用ポリイミド(Y)製造用ド−プの合
成−1 攪拌機、、窒素導入管を備えた反応容器に、N−メチル
−2−ピロリドンを加え、さらに、1,3−ビス(4−
アミノフェノキシ)ベンゼン(TPE−R)と2,3,
3’,4’−ビフェニルテトラカルボン酸二無水物(a
−BPDA)と無水フタル酸とを1000:995:1
0のモル比でモノマ−濃度が22%になるように、また
トリフェニルホスフェ−トをモノマ−重量に対して0.
1%加えた。添加終了後25℃を保ったまま1時間反応
を続けた。このポリアミック酸溶液にトルエンをN−メ
チル−2−ピロリドンに対して10%加えるとともに、
反応温度を190℃に昇温し、生成する水をトルエンと
共に留去しながら5時間反応し、黄赤色粘調ポリイミド
溶液を得た。25℃における溶液粘度は約500ポイズ
であった。この溶液(ド−プ)をY−1と称する。
Synthesis of Dope for Production of Polyimide (Y) for Thin Layer-1 N-methyl-2-pyrrolidone was added to a reaction vessel equipped with a stirrer and a nitrogen inlet tube, and furthermore, 1,3-bis ( 4-
Aminophenoxy) benzene (TPE-R) and 2,3
3 ', 4'-biphenyltetracarboxylic dianhydride (a
-BPDA) and phthalic anhydride at 1000: 995: 1
At a molar ratio of 0, the monomer concentration is 22% and triphenyl phosphate is added at a ratio of 0.2 to the monomer weight.
1% was added. After completion of the addition, the reaction was continued for 1 hour while maintaining the temperature at 25 ° C. To this polyamic acid solution was added 10% of toluene with respect to N-methyl-2-pyrrolidone,
The reaction temperature was raised to 190 ° C., and the reaction was carried out for 5 hours while distilling off generated water together with toluene to obtain a yellow-red viscous polyimide solution. The solution viscosity at 25 ° C. was about 500 poise. This solution (dope) is referred to as Y-1.

【0032】薄層用ポリイミド(Y)製造用ド−プの合
成−2 攪拌機、、窒素導入管を備えた反応容器に、N,N−ジ
メチルアセトアミド(DMAC)を加え、さらに、1,
3−ビス(4−アミノフェノキシ)ベンゼン(TPE−
R)と2,3,3’,4’−ビフェニルテトラカルボン
酸二無水物(a−BPDA)と無水フタル酸とを100
0:995:10のモル比でモノマ−濃度が22%にな
るように、またトリフェニルホスフェ−トをモノマ−重
量に対して0.1%加えた。添加終了後25℃にて5時
間反応を続け、淡黄褐色粘調なポリアミック酸溶液を得
た。25℃における溶液粘度は約2000ポイズであっ
た。この溶液(ド−プ)をY−2と称する。
Synthesis of Dope for Production of Polyimide (Y) for Thin Layer-2 N, N-dimethylacetamide (DMAC) was added to a reaction vessel equipped with a stirrer and a nitrogen inlet tube.
3-bis (4-aminophenoxy) benzene (TPE-
R), 2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride (a-BPDA) and phthalic anhydride in 100 parts
At a molar ratio of 0: 995: 10, the monomer concentration was 22%, and triphenyl phosphate was added at 0.1% based on the weight of the monomer. After completion of the addition, the reaction was continued at 25 ° C. for 5 hours to obtain a light yellow-brown viscous polyamic acid solution. The solution viscosity at 25 ° C. was about 2000 poise. This solution (dope) is referred to as Y-2.

【0033】ポリイミド(Y)製造用ド−プの合成−3 攪拌機、、窒素導入管を備えた反応容器に、N,N−ジ
メチルアセトアミド(DMAC)を加え、さらに、1,
3−ビス(4−アミノフェノキシ)ベンゼン(TPE−
R)と2,3,3’,4’−ビフェニルテトラカルボン
酸二無水物(a−BPDA)とを1000:1002の
モル比でモノマ−濃度が22%になるように、またトリ
フェニルホスフェ−トをモノマ−重量に対して0.1%
加えた。添加終了後25℃にて4時間反応を続け、淡褐
色透明粘調なポリアミック酸溶液を得た。25℃におけ
る溶液粘度は約1500ポイズであった。この溶液(ド
−プ)をY−3と称する。
Synthesis of Dope for Production of Polyimide (Y) -3 N, N-dimethylacetamide (DMAC) was added to a reaction vessel equipped with a stirrer and a nitrogen inlet tube.
3-bis (4-aminophenoxy) benzene (TPE-
R) and 2,3,3 ', 4'-biphenyltetracarboxylic dianhydride (a-BPDA) in a molar ratio of 1000: 1002 so that the monomer concentration becomes 22%, and triphenylphosphonate is used. 0.1% by weight of monomer
added. After the addition was completed, the reaction was continued at 25 ° C. for 4 hours to obtain a light brown transparent viscous polyamic acid solution. The solution viscosity at 25 ° C. was about 1500 poise. This solution (dope) is referred to as Y-3.

【0034】[0034]

【実施例1】三層押出し成形用ダイス(マルチマニホ−
ルド型ダイス)を設けた製膜装置を使用し、前記ポリア
ミック酸溶液を三層押出ダイスから金属製支持体上に流
延し、140℃の熱風で連続的に乾燥し、固化フィルム
を形成した。この固化フィルムを支持体から剥離した後
加熱炉で200℃から310℃まで徐々に昇温して溶媒
の除去、イミド化を行い長尺状の三層押出しポリイミド
フィルムを製造した。この三層押出しポリイミドフィル
ムの物性評価結果および銅箔と直接積層した積層体の剥
離強度を表1に示す。
Example 1 Three-layer extrusion die (multi-manifold
The polyamic acid solution was cast from a three-layer extrusion die onto a metal support using a film forming apparatus equipped with a metal mold (a die), and dried continuously with hot air at 140 ° C. to form a solidified film. . After the solidified film was peeled from the support, the temperature was gradually raised from 200 ° C. to 310 ° C. in a heating furnace to remove the solvent and imidize to produce a long three-layer extruded polyimide film. Table 1 shows the evaluation results of the physical properties of the three-layer extruded polyimide film and the peel strength of the laminate directly laminated with the copper foil.

【0035】実施例2−7、比較例1−3 実施例1ど同様の装置を使用して、表1に示す種類の多
層ポリイミドフィルム、またはポリイミドフィルムを表
1に示す条件で製造した。得られたポリイミドフィルム
の物性、および銅箔と直接積層した積層体の剥離強度を
表1に示す。
Example 2-7, Comparative Example 1-3 Using the same apparatus as in Example 1, a multilayer polyimide film or a polyimide film of the type shown in Table 1 was produced under the conditions shown in Table 1. Table 1 shows the physical properties of the obtained polyimide film and the peel strength of the laminate directly laminated with the copper foil.

【0036】[0036]

【表1】 [Table 1]

【0037】実施例8、比較例4 各実施例で製造された多層ポリイミドフィルムを使用
し、エポキシ樹脂層を設けた後、銅箔と積層した積層体
の剥離強度を以下に示す。 使用した多層ポリイミドフィルムの構成と各層の厚み NO.1:Y−3/X−2/Y−3(4/25/4μm) NO.2:Y−3/X−1/Y−3(4/25/4μm) NO.3:Y−3/X−1/Y−3(4/50/4μm) NO.4:Y−3/X−1/ − (4/50/0μm) NO.5: − /X−1/ − (0/25/0μm) NO.6: − /X−1/ − (0/50/0μm)
Example 8 and Comparative Example 4 Using the multilayer polyimide film produced in each example, after providing an epoxy resin layer, the peel strength of a laminate laminated with a copper foil is shown below. Structure of used multilayer polyimide film and thickness of each layer NO. 1: Y-3 / X-2 / Y-3 (4/25/4 μm) NO. 2: Y-3 / X-1 / Y-3 (4/25/4 μm) NO. 3: Y-3 / X-1 / Y-3 (4/50/4 μm) NO. 4: Y-3 / X-1 /-(4/50/0 m) NO. 5: − / X−1 / − (0/25/0 μm) NO. 6: − / X−1 / − (0/50/0 μm)

【0038】使用したエポキシ系接着剤:東レ株式会社
TE−5701 厚み20−25μm 接着方法:銅箔(35μm)にエポキシ系接着剤(TE
−5701)を薄く塗布し、130℃、15分乾燥し、
この上に多層ポリイミドフィルムをエポキシ層とY層と
が重なるように重ね、180℃、6.5kg/cm2
5分プレスし、さらに180℃で1時間加熱処理した。
Epoxy adhesive used: Toray Industries, Inc. TE-5701, thickness: 20-25 μm Adhesion method: An epoxy adhesive (TE) was applied to a copper foil (35 μm).
-5701), and dried at 130 ° C. for 15 minutes.
On top of this, a multilayer polyimide film is overlaid so that the epoxy layer and the Y layer overlap, and 180 ° C., 6.5 kg / cm 2 ,
It was pressed for 5 minutes and further heat-treated at 180 ° C. for 1 hour.

【0039】剥離強度(T−剥離強度) NO.1:1.9kg/cm NO.2:2.0kg/cm以上(フィルムが切れる) NO.3:1.2kg/cm NO.4:1.1kg/cm NO.5:0.2kg/cm NO.6:0.3kg/cm なお、確認したところでは、90°剥離強度とT−剥離
強度との値に実質的に差が認められなかった。
Peel strength (T-peel strength) 1: 1.9 kg / cm NO. 2: 2.0 kg / cm or more (film breaks) NO. 3: 1.2 kg / cm NO. 4: 1.1 kg / cm NO. 5: 0.2 kg / cm NO. 6: 0.3 kg / cm It was confirmed that there was substantially no difference between the 90 ° peel strength and the T-peel strength.

【0040】[0040]

【発明の効果】この発明によれば、比較的緩和な条件で
金属箔と積層でき、しかも低熱線膨張の3,3’,4,
4’−ビフェニルテトラカルボン酸二無水物とパラフェ
ニレンジアミンとを必須成分とする基体ポリイミド層と
柔軟な熱融着性ポリイミドが大きな剥離強度で積層した
多層ポリイミドフィルムを製造することができる。
According to the present invention, the metal foil can be laminated on the metal foil under relatively mild conditions, and the low thermal expansion of 3,3 ', 4,4.
It is possible to produce a multilayer polyimide film in which a base polyimide layer containing 4'-biphenyltetracarboxylic dianhydride and paraphenylenediamine as essential components and a flexible heat-fusible polyimide are laminated with a large peel strength.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C08L 79/08 C08L 79/08 Z // B29K 79:00 B29L 9:00 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI C08L 79/08 C08L 79/08 Z // B29K 79:00 B29L 9:00

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基体層用のポリアミック酸溶液と薄層用
のポリイミドまたはその前駆体の溶液とを二層または三
層の押出し成形用ダイスを有する押出し成形機と溶液流
延製膜装置とを組み合わせた多層押出し流延製膜成形法
によって多層押出しポリイミドフィルムを製造する方法
において、基体層用のポリアミック酸溶液として下記式
のイミド単位を有する基体ポリイミド(X)を与えるポ
リアミック酸溶液を使用し、 【化1】 薄層用のポリイミドまたはその前駆体の溶液として下記
のイミド単位(A)および(B)からなり、 【化2】 〔式(B)において、Rは4価の芳香族残基を、R’は
2価の芳香族または脂肪族残基を表す。〕 (A)が80〜100モル%、(B)が20〜0モル%
であるポリイミド(Y)またはその前駆体の溶液を使用
し、 支持体上に押出した溶媒を含む多層押し出し物を加熱し
て乾燥およびイミド化することを特徴とする熱線膨張係
数が5×10-6−30×10-6cm/cm/℃である多
層押出しポリイミドフィルムの製法。
1. An extruder having a two- or three-layer die for extruding a polyamic acid solution for a base layer and a solution of polyimide or a precursor thereof for a thin layer, and a solution casting film forming apparatus. In a method for producing a multilayer extruded polyimide film by a combined multilayer extrusion casting film forming method, a polyamic acid solution that gives a substrate polyimide (X) having an imide unit of the following formula is used as a polyamic acid solution for a substrate layer, Embedded image A solution of polyimide or a precursor thereof for a thin layer comprises the following imide units (A) and (B): [In the formula (B), R represents a tetravalent aromatic residue, and R ′ represents a divalent aromatic or aliphatic residue. (A) is 80 to 100 mol%, and (B) is 20 to 0 mol%.
A multi-layer extrudate containing a solvent extruded on a support is heated and dried and imidated using a solution of polyimide (Y) or a precursor thereof, which has a coefficient of linear thermal expansion of 5 × 10 6 -30 × 10 -6 cm / cm / ℃ a method of multilayer extrusion polyimide film.
【請求項2】 乾燥およびイミド化をポリイミド(Y)
のガラス転移温度以上でかつ劣化温度以下の温度まで加
熱する請求項1記載の多層押出しポリイミドフィルムの
製法。
2. Drying and imidizing polyimide (Y)
The method for producing a multilayer extruded polyimide film according to claim 1, wherein the heating is performed to a temperature not lower than the glass transition temperature and not higher than the deterioration temperature.
JP8336478A 1996-09-13 1996-12-17 Production of multilayered extrusion polyimide film Pending JPH10138318A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8336478A JPH10138318A (en) 1996-09-13 1996-12-17 Production of multilayered extrusion polyimide film

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP24287796 1996-09-13
JP8-242877 1996-09-13
JP8336478A JPH10138318A (en) 1996-09-13 1996-12-17 Production of multilayered extrusion polyimide film

Publications (1)

Publication Number Publication Date
JPH10138318A true JPH10138318A (en) 1998-05-26

Family

ID=26535960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8336478A Pending JPH10138318A (en) 1996-09-13 1996-12-17 Production of multilayered extrusion polyimide film

Country Status (1)

Country Link
JP (1) JPH10138318A (en)

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