JPH08204333A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH08204333A
JPH08204333A JP1405495A JP1405495A JPH08204333A JP H08204333 A JPH08204333 A JP H08204333A JP 1405495 A JP1405495 A JP 1405495A JP 1405495 A JP1405495 A JP 1405495A JP H08204333 A JPH08204333 A JP H08204333A
Authority
JP
Japan
Prior art keywords
conductive
positive pattern
metal
base material
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1405495A
Other languages
Japanese (ja)
Other versions
JP3655336B2 (en
Inventor
Hiroaki Koizumi
裕昭 小泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1405495A priority Critical patent/JP3655336B2/en
Publication of JPH08204333A publication Critical patent/JPH08204333A/en
Application granted granted Critical
Publication of JP3655336B2 publication Critical patent/JP3655336B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE: To wire and mount in high density by laminating and integrating an insulating sheet with a final conductive metal positive pattern, and then selectively removing a first conductive metal positive pattern by etching. CONSTITUTION: After a metal film is formed on a conductive base material surface, a photosensitive insulating film 3 is laminated. Then, after the film 3 is patterned, a plated solder layer 4 is formed on the metal film, a copper layer 5 is further precipitated to form a first positive pattern 6. Again, a photosensitive insulating film 3' is laminated, a through hole pattern 7 is formed, a photosensitive insulating film 3" is laminated, and negatively patterned. Then, it is electrically copper-plated to form a second positive pattern. Thereafter, after the insulating sheet is laminated and integrated, the conductive base material and the metal layer are removed to obtain a printed wiring board in which the pattern 6 having the solder layer 4 on the surface is buried in the insulator layer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は印刷配線板の製造方法に
係り、特に配線層間を貫通型の導体部で接続する構成を
備え、かつ高密度な配線および実装が可能な信頼性の高
い印刷配線板を、歩留まり良好に製造し得る方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a highly reliable printing which has a structure in which wiring layers are connected by a penetrating conductor portion and enables high-density wiring and mounting. The present invention relates to a method of manufacturing a wiring board with a good yield.

【0002】[0002]

【従来の技術】両面型印刷配線板もしくは多層型印刷配
線板においては、両面導電パターンなどの配線層間の電
気的な接続を、次のようにして行っている。すなわち、
両面型印刷配線板の場合は、先ず、両面銅箔張り基板の
所定位置に穴明け加工(穿設加工)を施し、穿設した穴
の内壁面を含め、全面に化学メッキ処理を施す。その
後、さらに電気メッキ処理を施し、穴の内壁面の金属層
を厚くして信頼性を高め、配線層間の電気的な接続を行
っている。
2. Description of the Related Art In a double-sided printed wiring board or a multi-layered printed wiring board, electrical connection between wiring layers such as double-sided conductive patterns is made as follows. That is,
In the case of a double-sided printed wiring board, first, a perforation process (perforation process) is performed on a predetermined position of a double-sided copper foil-clad substrate, and a chemical plating process is performed on the entire surface including the inner wall surface of the perforated hole. After that, electroplating is further performed to increase the reliability by thickening the metal layer on the inner wall surface of the hole, and electrical connection between the wiring layers is performed.

【0003】また、多層印刷配線板の場合は、基板両面
に張られた銅箔をそれぞれパターニングした後、そのパ
ターニング面上に絶縁シート(たとえばプリプレグ)を
介して銅箔を積層,配置する。次いで、加熱加圧を施し
て一体化した後、前述の両面型印刷配線板のときと同様
に、穴明け加工およびメッキ処理による配線層間の電気
的な接続、表面銅箔についてのパターニングにより多層
型印刷配線板を得ている。なお、より配線層の多い多層
型印刷配線板の場合は、中間に介挿させる両面型印刷配
線板数を増やす方式で製造できる。
In the case of a multilayer printed wiring board, the copper foils stretched on both sides of the substrate are each patterned, and then the copper foils are laminated and arranged on the patterned surface via an insulating sheet (eg, prepreg). Then, after applying heat and pressure to integrate them, similar to the case of the above-mentioned double-sided printed wiring board, electrical connection between wiring layers by drilling and plating, patterning of the surface copper foil, and multilayer type Got a printed wiring board. In the case of a multilayer printed wiring board having more wiring layers, it can be manufactured by a method of increasing the number of double-sided printed wiring boards inserted in the middle.

【0004】前記印刷配線板の製造方法において、配線
層間の電気的な接続をメッキ方法によらず行う方法とし
て、両面銅箔張り基板の所定位置に穴明けし、この穴内
に導電性ペーストを印刷法などにより流し込み、穴内に
流し込んだ導電性ペーストの樹脂分を硬化させて、配線
層間を電気的に接続する方法も行われている。
In the method of manufacturing a printed wiring board, as a method for electrically connecting wiring layers without using a plating method, a double-sided copper foil-clad substrate is punched at a predetermined position, and a conductive paste is printed in the hole. There is also a method in which the resin component of the conductive paste poured into the holes is cured by a method or the like to electrically connect the wiring layers.

【0005】[0005]

【発明が解決しようとする課題】ところで、電子機器類
の高性能化やコンパクト化などの要求に対応して、印刷
配線板においても、信頼性の高い高密度配線、もしくは
微細な配線が求められている。つまり、配線回路もしく
は実装回路装置の高機能化は、印刷配線板の高配線密度
化もしくは微細な配線化が前提になるとともに、回路機
能の信頼性を容易に確保し得ることが重要である。さら
に具体的に言及すると、たとえば微細な配線間が所要の
絶縁性を保持し得るていどに確実に離隔していること、
実装する電子部品の端子が印刷配線板の接続パッドに、
隣接する接続部との短絡を起こさずに電気的な接続が達
成されることなどが望まれる。
By the way, in response to demands for higher performance and compactness of electronic devices, printed wiring boards are required to have highly reliable high-density wiring or fine wiring. ing. That is, in order to improve the functionality of the wiring circuit or the mounting circuit device, it is important to increase the wiring density or fine wiring of the printed wiring board, and it is important to easily ensure the reliability of the circuit function. More specifically, for example, fine wires are surely separated from each other as long as the required insulation can be maintained,
The terminals of the electronic components to be mounted are connected to the connection pads of the printed wiring board.
It is desired that an electrical connection be achieved without causing a short circuit with an adjacent connecting portion.

【0006】しかしながら、銅箔張り基板を素材とし、
前記銅箔をフォトリソグラフィもしくはフォトエッチン
グで配線パターニングする手段を含む印刷配線板の製造
方法の場合は、次ぎのような不都合な問題がある。すな
わち、両面型もしくは多層配線型のいずれの場合も、最
外層の配線パターン形成面に、いわゆる保護膜として、
ソルダーレジスト層を印刷形成し、信号パターン面を被
覆する構成を採っている。ここで、この種の印刷配線板
を、その印刷配線板面に所要の電子部品を搭載・実装し
て、実装回路装置の形成に使用する場合は、前記電子部
品の入出力端子が接続される接続用パッドを選択的に露
出させておく必要がある。そして、この接続用パッド
は、通常肉盛りなどによって、前記ソルダーレジスト層
面から突出させた形態を採っている。つまり、接続用パ
ッドが微細で、かつ狭ピッチ化した場合、それらの接続
用パッドを相互に絶縁離隔する形に、ソルダーレジスト
層を印刷形成することが困難のため、肉盛りなどで突出
させた構造を採っている。
However, using a copper foil-clad substrate as a material,
In the case of a method for manufacturing a printed wiring board including means for patterning the wiring of the copper foil by photolithography or photoetching, there are the following inconvenient problems. That is, in either case of the double-sided type or the multilayer wiring type, as a so-called protective film on the outermost wiring pattern forming surface,
The solder resist layer is formed by printing to cover the signal pattern surface. Here, when this type of printed wiring board is used for forming a mounted circuit device by mounting and mounting required electronic components on the surface of the printed wiring board, the input / output terminals of the electronic components are connected. The connection pads need to be selectively exposed. The connecting pad usually has a form protruding from the surface of the solder resist layer by padding or the like. In other words, when the connecting pads are fine and have a narrow pitch, it is difficult to print the solder resist layer in such a manner that the connecting pads are insulated from each other. The structure is adopted.

【0007】このように、印刷配線板面の接続用パッド
が、絶縁層(ソルダーレジスト層)面から突出している
と、この時点では、隣接する接続用パッド相互の絶縁離
隔を確保し得るが、この接続用パッドに電子部品の入出
力端子を対応させて、半田付けなどによって電気的およ
び機械的な接続を行ったとき、隣接する接続用パッド同
士間で、いわゆる半田ブリッジが発生し易いという問題
がある。そして、この半田ブリッジ発生の問題は、接続
用パッドが微細化し、あるいは狭ピッチ化した場合、さ
らに顕著となるので、高密度配線化もしくは高密度実装
化の動向のうえで、由々しい問題を提起することにな
る。
Thus, if the connection pads on the printed wiring board surface project from the insulating layer (solder resist layer) surface, at this point, an insulation separation between adjacent connection pads can be secured. The problem that a so-called solder bridge is likely to occur between adjacent connecting pads when the input / output terminals of electronic parts are made to correspond to these connecting pads and electrical and mechanical connection is made by soldering or the like. There is. And, the problem of the solder bridge generation becomes more remarkable when the connection pads are made finer or the pitch is made narrower, so that a serious problem occurs in the trend of high-density wiring or high-density mounting. Will be raised.

【0008】本発明は上記事情に対処してなされたもの
で、簡易なプロセスで、信頼性の高い高密度の配線およ
び実装が可能な印刷配線板の製造方法の提供を目的とす
る。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for manufacturing a printed wiring board capable of highly reliable and high-density wiring and mounting by a simple process.

【0009】[0009]

【課題を解決するための手段】請求項1の発明は、導電
性基材の少なくとも一主面に金属膜を被着形成する工程
と、前記金属膜面上に第1の電気絶縁性のネガパターン
ニングする工程と、前記導電性基材を一方の電極として
めっき処理を行い金属膜の露出面に第1の導電性金属お
よび第1の導電性金属とは異種の第2の導電性金属のポ
ジパターンを順次積層して形成する工程と、前記第2の
導電性金属のポジパターン形成面に、第2の導電性金属
のポジパターンに接続する接続孔を備えた第2の電気絶
縁性のネガパターンニングする工程と、前記第2の電気
絶縁性ポジパターン面に導電性層を形成する工程と、前
記導電性基材を一方の電極としてめっき処理を行い導電
性層面に第3の導電性金属のポジパターンを形成する工
程と、前記最終の導電性金属のポジパターン形成面に絶
縁性シート層を積層・一体化した後、導電性基材および
金属膜を除去する工程と,前記金属膜の除去で露出した
第1の導電性金属ポジパターンを選択的にエッチング除
去する工程とを具備して成ることを特徴とする印刷配線
板の製造方法である。
According to a first aspect of the present invention, there is provided a step of depositing a metal film on at least one main surface of a conductive base material, and a first electrically insulating negative film on the metal film surface. A patterning step and a plating process using the conductive base material as one of the electrodes are performed to form a first conductive metal and a second conductive metal different from the first conductive metal on the exposed surface of the metal film. A step of sequentially stacking and forming positive patterns, and a second electrically insulating layer having a connection hole for connecting to the positive pattern of the second conductive metal on the positive pattern forming surface of the second conductive metal. A step of performing negative patterning, a step of forming a conductive layer on the second electrically insulating positive pattern surface, a plating treatment using the conductive base material as one electrode, and a third conductive layer on the conductive layer surface. A step of forming a positive metal pattern, and A step of removing the conductive base material and the metal film after laminating and integrating the insulating sheet layer on the positive pattern forming surface of the conductive metal, and the first conductive metal positive pattern exposed by the removal of the metal film. And a step of selectively removing by etching.

【0010】請求項2の発明は、導電性基材の少なくと
も一主面に、金属膜を被着形成する工程と、前記金属膜
面上に第1の電気絶縁性のネガパターンニングする工程
と、前記導電性基材を一方の電極としてめっき処理を行
い金属膜の露出面に半田金属および第1の導電性金属の
ポジパターンを順次積層して形成する工程と、前記第1
の導電性金属のポジパターン形成面に、第1の導電性金
属のポジパターンに接続する接続孔を備えた第2の電気
絶縁性のネガパターンニングする工程と、前記第2の電
気絶縁性のポジパターン面に第1の導電性層を形成する
工程と、前記導電性基材を一方の電極としてめっき処理
を行い、第1の導電性層面に第2の導電性金属のポジパ
ターンを形成する工程と、前記第2の導電性金属のポジ
パターン形成面に、第2の導電性金属のポジパターンに
接続する接続孔を備えた第3の電気絶縁性のネガパター
ンニングする工程と、前記第3の電気絶縁性のポジパタ
ーン面に第2の導電性層を形成する工程と、前記導電性
基材を一方の電極としてめっき処理を行い、第2の導電
性層面に第3の導電性金属のポジパターンを形成する工
程と、前記最終の導電性金属のポジパターン形成面に絶
縁体層を積層・一体化した後、導電性基材および金属膜
を除去する工程とを具備して成ることを特徴とする印刷
配線板の製造方法である。
According to a second aspect of the present invention, a step of depositing a metal film on at least one main surface of the conductive base material, and a step of forming a first electrically insulating negative pattern on the metal film surface. Forming a positive pattern of a solder metal and a first conductive metal on the exposed surface of the metal film by sequentially plating the conductive base material as one of the electrodes;
A step of forming a second electrically insulating negative pattern having a connection hole connected to the positive pattern of the first conductive metal on the surface of the positive pattern of the conductive metal, A step of forming a first conductive layer on the positive pattern surface, and a plating treatment using the conductive base material as one electrode to form a positive pattern of a second conductive metal on the first conductive layer surface. A third electrically insulating negative patterning step in which a contact hole for connecting to the positive pattern of the second conductive metal is provided on a surface of the second conductive metal positive pattern forming surface; Forming a second conductive layer on the electrically insulative positive pattern surface of No. 3, and performing plating treatment using the conductive base material as one electrode, and forming a third conductive metal on the second conductive layer surface. The step of forming a positive pattern of A method for manufacturing a printed wiring board, comprising: a step of removing an electrically conductive base material and a metal film after laminating and integrating an insulating layer on a positive pattern forming surface of an electrically conductive metal. .

【0011】請求項3の発明は、請求項1もしくは請求
項2記載の導電性基材として、離型性良好な導電性基材
を用い、かつ剥離除去することを特徴とする印刷配線板
の製造方法である。
According to a third aspect of the present invention, there is provided a printed wiring board characterized in that, as the conductive base material according to the first or second aspect, a conductive base material having a good releasability is used and is peeled and removed. It is a manufacturing method.

【0012】請求項4の発明は、導電性基材の少なくと
も一主面に、金属膜を被着形成する工程と、前記金属膜
面上に第1の電気絶縁性のネガパターンニングする工程
と、前記導電性基材を一方の電極としてめっき処理を行
い金属膜の露出面に第1の導電性金属および第1の導電
性金属とは異種の第2の導電性金属のポジパターンを順
次積層して形成する工程と、前記第2の導電性金属のポ
ジパターン形成面に、第2の導電性金属のポジパターン
に接続する接続孔を備えた第2の電気絶縁性のネガパタ
ーンニングする工程と、前記第2の電気絶縁性のポジパ
ターン面に第2の導電性層を形成する工程と、前記導電
性基材を一方の電極としてめっき処理を行い、第2の導
電性層面に第3の導電性金属のポジパターンを形成する
工程と、前記第2の導電性金属のポジパターン面に、所
要の接続用バンブを形成する工程と、前記接続用バンブ
を形成面に絶縁性シート層を介して、他の配線板要素の
配線パターン面を対向して配置・積層し一体化する工程
と、前記導電性基材および金属膜を剥離除去する工程と
を具備して成ることを特徴とする印刷配線板の製造方法
である。
According to a fourth aspect of the present invention, a step of depositing a metal film on at least one main surface of the conductive base material, and a step of forming a first electrically insulating negative pattern on the metal film surface. , The conductive base material is used as one electrode for plating, and a positive pattern of a first conductive metal and a second conductive metal different from the first conductive metal is sequentially laminated on the exposed surface of the metal film. And a step of forming a second electrically insulating negative pattern in which a connection hole for connecting to the positive pattern of the second conductive metal is provided in the positive pattern formation surface of the second conductive metal. And a step of forming a second conductive layer on the second electrically insulating positive pattern surface, a plating process is performed using the conductive base material as one electrode, and a third conductive layer is formed on the second conductive layer surface. Forming a positive pattern of a conductive metal of A step of forming a required connecting bump on the positive pattern surface of the conductive metal, and a wiring pattern surface of another wiring board element is arranged to face the connecting bump forming surface via an insulating sheet layer. A method for manufacturing a printed wiring board, comprising a step of laminating and integrating and a step of peeling and removing the conductive base material and the metal film.

【0013】請求項5の発明は、導電性基材の少なくと
も一主面に、金属膜を被着形成する工程と、前記金属膜
面上に第1の電気絶縁性のネガパターンニングする工程
と、前記導電性基材を一方の電極としてめっき処理を行
い金属膜の露出面に半田金属および第1の導電性金属の
ポジパターンを順次積層して形成する工程と、前記第1
の導電性金属のポジパターン形成面に、第1の導電性金
属のポジパターンに接続する接続孔を備えた第2の電気
絶縁性のネガパターンニングする工程と、前記第2の電
気絶縁性のポジパターン面に第1の導電性層を形成する
工程と、前記導電性基材を一方の電極としてめっき処理
を行い第1の導電性層面に第2の導電性金属のポジパタ
ーンを形成する工程と、前記第2の導電性金属のポジパ
ターン形成面に、第2の導電性金属のポジパターンに接
続する接続孔を備えた第3の電気絶縁性のネガパターン
ニングする工程と、前記第3の電気絶縁性のポジパター
ン面に第2の導電性層を形成する工程と、前記導電性金
属層を一方の電極としてめっき処理を行い第2の導電性
層面に第3の導電性金属のポジパターンを形成する工程
と、前記導電性金属のポジパターン面に、所要の接続用
バンブを形成する工程と、前記接続用バンブを形成面に
絶縁性シート層を介して、他の配線板要素の配線パター
ン面を対向して配置・積層し一体化する工程と、前記導
電性基材および金属膜を剥離除去する工程とを具備して
成ることを特徴とする印刷配線板の製造方法である。
According to a fifth aspect of the present invention, a step of depositing a metal film on at least one main surface of the conductive base material, and a step of forming a first electrically insulating negative pattern on the metal film surface. Forming a positive pattern of a solder metal and a first conductive metal on the exposed surface of the metal film by sequentially plating the conductive base material as one of the electrodes;
A step of forming a second electrically insulating negative pattern having a connection hole connected to the positive pattern of the first conductive metal on the surface of the positive pattern of the conductive metal, A step of forming a first conductive layer on the positive pattern surface, and a step of performing a plating process using the conductive base material as one electrode to form a positive pattern of a second conductive metal on the surface of the first conductive layer. And a third electrically insulating negative patterning step in which a contact hole for connecting to the positive pattern of the second conductive metal is provided on the surface of the second conductive metal positive pattern forming surface. Forming a second conductive layer on the electrically insulative positive pattern surface, and performing a plating process using the conductive metal layer as one electrode to form a positive electrode of the third conductive metal on the second conductive layer surface. A step of forming a pattern, and the conductive gold Forming a desired connection bump on the positive pattern surface of, and arranging and laminating the wiring pattern surface of another wiring board element facing each other through the insulating sheet layer on the connection bump forming surface. A method of manufacturing a printed wiring board, comprising a step of integrating and a step of peeling and removing the conductive base material and the metal film.

【0014】請求項6の発明は、請求項4もしくは請求
項5記載の導電性基材として、離型性良好な導電性基材
を用い、かつ剥離除去することを特徴とする印刷配線板
の製造方法である。
According to a sixth aspect of the present invention, there is provided a printed wiring board characterized in that, as the conductive base material according to the fourth or fifth aspect, a conductive base material having a good releasability is used and peeled off. It is a manufacturing method.

【0015】本発明において、導電性基材としては、た
とえばステンレス鋼板,表面処理したステンレス鋼板な
ど良好な離型性(剥離性)を有する薄板、あるいは銅
板,もしくは表面処理した銅板などの導電性金属板が挙
げられる。つまり、導電性基材は、電気めっき処理の過
程で一方の電極を兼ねる支持体として機能するもので、
最終的には剥離除去もしくはエッチング除去される。し
たがって、導電性基材は、このような機能・役割を考慮
して、剥離除去して再使用する場合は、変形・破損など
起こし難いやや厚めのものを、またエッチング除去する
場合は、支持体としての機能を呈する程度の薄板を、そ
れぞれ選択することが好ましい。また、前記導電性基材
面に形成する金属膜は、その金属膜上に積層・形成する
多層配線層を、導電性基材面側と分離する機能・役割か
らして、いわゆる剥離性もしくはエッチング除去し易い
金属、たとえばCu,Ni,ソルダーなどが選択される。
In the present invention, as the conductive base material, for example, a stainless steel plate, a surface-treated stainless steel plate or other thin plate having good releasability (separability), or a conductive metal such as a copper plate or a surface-treated copper plate. There is a board. In other words, the conductive base material functions as a support that also serves as one of the electrodes during the electroplating process,
Finally, peeling removal or etching removal is performed. Therefore, in consideration of such functions and roles, the conductive substrate should be a slightly thicker one that is hard to cause deformation or damage when it is peeled off and reused, or a support when it is removed by etching. It is preferable to select a thin plate having such a function as described above. In addition, the metal film formed on the surface of the conductive base material has a function or role of separating the multilayer wiring layer laminated / formed on the metal film from the side of the conductive base material. A metal that is easy to remove, such as Cu, Ni, or solder, is selected.

【0016】本発明において、前記導電性基材上の金属
膜面などに、ポジパターンを電気メッキによって形成す
る際、ネガパターンを形成する各電気絶縁性のネガパタ
ーン形成材としは、たとえばシリコーン樹脂,フッ素樹
脂,エポキシ樹脂,ポリカーボネート樹脂,ポリスルホ
ン樹脂,ポリエステル樹脂,フェノキシ樹脂,フェノー
ル樹脂,ポリイミド樹脂、もしくはこれらの樹脂を主成
分として感光性を付与したものなどが挙げられる。そし
て、ネガパターンの形成は、たとえば樹脂層を塗布形成
し、選択的な露光・現像を施す手段、樹脂層を塗布・硬
化後、選択的な紫外線照射によって分解除去する手段、
あるいはネガパターン樹脂層を印刷法などによって選択
的に被着させる手段が挙げられる。また、このネガパタ
ーンマスクは、加圧一体化によって、印刷配線板を構成
する絶縁体として機能させる。
In the present invention, when a positive pattern is formed on the surface of a metal film on the conductive substrate by electroplating, the electrically insulating negative pattern forming material for forming a negative pattern is, for example, a silicone resin. , Fluororesin, epoxy resin, polycarbonate resin, polysulfone resin, polyester resin, phenoxy resin, phenol resin, polyimide resin, or those obtained by imparting photosensitivity with these resins as main components. Then, the negative pattern is formed by, for example, applying a resin layer and performing selective exposure / development, applying and curing the resin layer, and then selectively decomposing and removing by ultraviolet irradiation,
Alternatively, a means for selectively depositing the negative pattern resin layer by a printing method or the like may be used. Further, this negative pattern mask is made to function as an insulator constituting a printed wiring board by pressure integration.

【0017】本発明において、電気絶縁性のネガパター
ンマスクを形成した導電性基材を一方の電極とし、その
導電性基材面に設けた金属膜の露出面(ポジパターン形
成面)にメッキする第1の金属,第2の金属および第3
の金属としては、たとえば銅,銀,金,半田,ニッケ
ル,錫,クロムなどの金属、もしくは半田−銅,錫−
銅,金−銅,ニッケル−銅,金−ニッケル−銅,パラジ
ウム−ニッケル−銅,白金−ニッケル−銅などの複合系
などが挙げられる。このポジパターンの電気メッキによ
る形成に当たっては、最終的に導電性基材や金属膜をエ
ッチング除去する場合、金属膜に対する選択的なエッチ
ング性を有する金属層を下地として、また、第1の金属
層もエッチング除去する場合は、第2の金属層に対する
選択的なエッチング性を考慮して、それぞれ予めメッキ
形成する。なお、金やニッケル層を第1もしくは第2の
金属層として設けた場合は、ポジパターンの露出面がこ
れらの金属層で被覆された態様を採るため、ポジパター
ンの安定化や半田付け性などの向上も図られる。
In the present invention, the conductive base material on which the electrically insulating negative pattern mask is formed is used as one electrode, and the exposed surface (positive pattern formation surface) of the metal film provided on the conductive base material surface is plated. First metal, second metal and third
Examples of the metal include copper, silver, gold, solder, nickel, tin, chromium, and other metals, or solder-copper, tin-
Examples include composite systems of copper, gold-copper, nickel-copper, gold-nickel-copper, palladium-nickel-copper, platinum-nickel-copper, and the like. In forming the positive pattern by electroplating, when the conductive substrate or the metal film is finally removed by etching, a metal layer having a selective etching property with respect to the metal film is used as a base, and the first metal layer is used. In the case of removing by etching as well, in consideration of the selective etching property with respect to the second metal layer, plating is performed in advance. When a gold or nickel layer is provided as the first or second metal layer, the exposed surface of the positive pattern is covered with these metal layers, so that the positive pattern is stabilized and solderability is improved. Can be improved.

【0018】さらに、本発明において、各絶縁性のネガ
パターンに対し、ポジパターンに配線回路部をめっき法
で形成するに当たっての下地層として機能する導電性層
の形成は、たとえばスパッタ法や無電解めっき法などで
行われる。そして、この導電性層は、所定領域に電気的
に絶縁離隔した形態で選択的に形成されているならば、
その態様はとくに限定されない。
Further, in the present invention, for each insulating negative pattern, the conductive layer which functions as a base layer in forming the wiring circuit portion on the positive pattern by the plating method is formed, for example, by the sputtering method or the electroless method. It is performed by a plating method or the like. Then, if the conductive layer is selectively formed in a predetermined region in a form of being electrically insulated and separated,
The aspect is not particularly limited.

【0019】本発明において、ポジパターン面の所定位
置に形設される導体バンプ(導体バンプ群)は、たとえ
ば銀,金,銅,半田粉などの導電性粉末、これらの合金
粉末もしくは複合(混合)金属粉末と、たとえばポリカ
ーボネート樹脂,ポリスルホン樹脂,ポリエステル樹
脂,エポキシ樹脂,メラミン樹脂,フェノキシ樹脂,フ
ェノール樹脂,ポリイミド樹脂などのバインダー成分と
を混合して調製された導電性組成物で構成される。そし
て、前記バンプ群の形設は、導電性組成物で形成する場
合、たとえば比較的厚いメタルマスクを用いた印刷法に
より、アスペクト比の高い導体バンプを形成でき、その
導体バンプ群の高さは一般的に、50〜 300μm 程度が望
ましい。なお、バンプ群を導電性組成物で形成する場合
は、メッキ法などの手段で行う場合に較べて、さらに工
程など簡略化し得るので、低コスト化の点で有効であ
る。
In the present invention, the conductor bumps (conductor bump group) formed at predetermined positions on the positive pattern surface are, for example, conductive powders such as silver, gold, copper, solder powders, alloy powders or composite powders (mixtures) thereof. ) A conductive composition prepared by mixing metal powder with a binder component such as polycarbonate resin, polysulfone resin, polyester resin, epoxy resin, melamine resin, phenoxy resin, phenol resin, or polyimide resin. When forming the bump group with a conductive composition, a conductor bump having a high aspect ratio can be formed by, for example, a printing method using a relatively thick metal mask, and the height of the conductor bump group is Generally, about 50 to 300 μm is desirable. When the bump group is formed of a conductive composition, the process can be further simplified as compared with the case where it is performed by a method such as a plating method, which is effective in terms of cost reduction.

【0020】本発明において、導体バンプの先端部が貫
挿圧入され、貫通型の導体部(電気的な接続部)が構成
される絶縁性プリプレグとしては、たとえばポリカーボ
ネート樹脂,ポリスルホン樹脂,熱可塑性ポリイミド樹
脂,ポリエーテルイミド樹脂,4フッ化ポリエチレン樹
脂,4フッ化エチレン樹脂,6フッ化ポリプロピレン樹
脂,ポリエーテルエーテルケトン樹脂などのシート類、
あるいはガラスクロスやマット、有機合成繊維布やマッ
ト、あるいは紙などの補強材と組み合わせて成るシート
が挙げられる。その他、ブタジェンゴム,ブチルゴム,
天然ゴム,ネオプレンゴム,シリコーンゴムなどの生ゴ
ムのシート類も使用し得る。
In the present invention, examples of the insulating prepreg in which the tip end portions of the conductor bumps are press-fitted to form the through-type conductor portion (electrical connection portion) are, for example, polycarbonate resin, polysulfone resin, thermoplastic polyimide. Sheets of resin, polyetherimide resin, tetrafluoropolyethylene resin, tetrafluoroethylene resin, hexafluoropolypropylene resin, polyetheretherketone resin, etc.
Alternatively, a sheet formed by combining with a reinforcing material such as glass cloth or mat, organic synthetic fiber cloth or mat, or paper can be used. Others, butadiene rubber, butyl rubber,
Sheets of raw rubber such as natural rubber, neoprene rubber and silicone rubber may also be used.

【0021】[0021]

【作用】請求項1の発明では、いわゆる電気めっきで所
要の配線がパターンニングされるので、配線密度の高い
微細な配線パターンを容易に形成し得るばかりでなく、
導電性基材側の金属膜を除去した面では、たとえば接続
用パッドが相互に確実に絶縁離隔され、かつその絶縁層
に対して凹面を成しているため、半田の流出しによる隣
接する接続用パッド間の半田ブリッジの発生も容易に回
避し得る印刷配線板が得られる。
According to the first aspect of the invention, since the required wiring is patterned by so-called electroplating, not only a fine wiring pattern having a high wiring density can be easily formed, but also
On the surface from which the metal film on the side of the conductive base material has been removed, for example, the connection pads are reliably insulated and separated from each other, and a concave surface is formed with respect to the insulation layer. A printed wiring board can be obtained in which the occurrence of solder bridges between pads for use can be easily avoided.

【0022】請求項2の発明では、主面の接続用パッド
面に既に半田層が形成され、かつこの半田層は絶縁体層
に埋め込まれ、平坦面を形成した構成を成している印刷
配線板が得られる。つまり、微細な接続用パッドであっ
ても、あるいは狭ピッチ間隔であっても、確実に相互が
区画され、かつ半田の流出が抑制された構成を採った印
刷配線板が容易に得られる。
According to the second aspect of the present invention, a printed wiring has a structure in which a solder layer has already been formed on the connection pad surface of the main surface, and this solder layer is embedded in an insulating layer to form a flat surface. A board is obtained. That is, it is possible to easily obtain a printed wiring board having a structure in which the pads are finely divided from each other and the solder is prevented from flowing out even if the pads are fine connection pads or at a narrow pitch.

【0023】請求項3の発明では、前記請求項1および
請求項2において、製造工程の簡略化が図られる。
According to the invention of claim 3, in the above-mentioned claim 1 and claim 2, the manufacturing process is simplified.

【0024】請求項4〜6の発明では、前記請求項1〜
請求項3の作用に加えて、より多層化した印刷配線板
が、より簡略化された工程で容易に得られる。
According to the inventions of claims 4 to 6, the claims 1 to
In addition to the effect of the third aspect, a multilayer printed wiring board can be easily obtained in a more simplified process.

【0025】[0025]

【実施例】以下図1〜図15をそれぞれ参照して、本発明
の実施例を説明する。
EXAMPLES Examples of the present invention will be described below with reference to FIGS.

【0026】実施例1 図1〜図14は本実施例の実施態様を模式的に示したもの
である。
Example 1 FIGS. 1 to 14 schematically show an embodiment of this example.

【0027】先ず、導電性基材1として、たとえば厚さ
1mmの導電性ステンレス鋼板を用意し、図1に断面的に
示すごとく、この導電性ステンレス鋼板1面に、電気メ
ッキもしくはスパッタによって厚さ 2〜 3μm 程度のCu
金属膜2を形成した後、図2に断面的に示すごとく、厚
さ50μm 程度の感光性絶縁フィルム3を張り合わせた。
ここで、感光性絶縁フィルム3を張り合わせる代わり
に、感光性樹脂層を塗布形成してもよい。
First, as the conductive substrate 1, for example, the thickness is
Prepare a 1 mm conductive stainless steel plate, and as shown in the cross-section in Fig. 1, coat one surface of this conductive stainless steel plate by electroplating or sputtering to a Cu thickness of about 2 to 3 µm.
After forming the metal film 2, a photosensitive insulating film 3 having a thickness of about 50 μm was laminated as shown in a sectional view in FIG.
Here, instead of sticking the photosensitive insulating film 3, a photosensitive resin layer may be formed by coating.

【0028】次いで、前記感光性絶縁フィルム3につい
て、選択的な露光・現像処理を施して、図3に断面的に
示すようにパターニングを行った。その後、前記導電性
ステンレス鋼板1を、一方の電極として半田メッキ液中
に浸漬し、 1.8〜 2.5 A/dm2 程度の電流を流して電気
メッキ処理を行って、図4に断面的に示すごとく、露出
していた金属膜2面上にめっき半田層4を形成してか
ら、さらに高速硫酸銅メッキ液中に浸漬し、20 A/dm2
程度の電流を流して電気メッキ処理を行って、図5に断
面的に示すごとく、前記めっき半田層4上(配線パター
ン形成領域)に、選択的に厚さ35μm の銅層5を析出さ
せて第1のポジパターン6を形成した。
Next, the photosensitive insulating film 3 was subjected to selective exposure / development treatment and patterned as shown in a sectional view in FIG. Then, the conductive stainless steel plate 1 is immersed in a solder plating solution as one of the electrodes, and an electric current of about 1.8 to 2.5 A / dm 2 is applied to perform electroplating treatment, as shown in a sectional view in FIG. After forming the plating solder layer 4 on the exposed metal film 2 surface, further immersing in the high-speed copper sulfate plating solution, 20 A / dm 2
An electric current is applied by applying a current of about 30 μm to selectively deposit a copper layer 5 having a thickness of 35 μm on the plated solder layer 4 (wiring pattern forming region) as shown in a sectional view of FIG. The first positive pattern 6 was formed.

【0029】前記第1のポジパターン6形成面に、再び
厚さ35μm 程度の感光性絶縁フィルム3′を張り合わ
せ、図6に断面的に示すように、第1のポジパターン6
に接続するスルホールパターン7を形成し、このスルホ
ールパターン7部を電気めっき処理によって銅で埋め込
んだ。前記スルホールパターン7部銅で埋め込んだ後、
厚さ35μm 程度の感光性絶縁フィルム3″を張り合わ
せ、選択的な露光・現像処理を施して、図7に断面的に
示すごとく、ネガパターニングを行った。その後、前記
絶縁性ネガパターニング3″面に、図8に断面的に示す
ごとく、たとえばNiOx から成る導電性層8をスパッタ
法で形成し、ポジパターン面の導電性層8′をめっき核
として、前記と同様の条件で電気銅めっき処理を行い、
図9に断面的に示すごとく、第2のポジパターン6′を
形成した。
A photosensitive insulating film 3'having a thickness of about 35 .mu.m is attached again to the surface on which the first positive pattern 6 is formed, and as shown in a sectional view of FIG.
A through hole pattern 7 connected to the above was formed, and this through hole pattern 7 portion was filled with copper by electroplating. After embedding the through hole pattern 7 parts with copper,
A photosensitive insulating film 3 ″ having a thickness of about 35 μm was laminated, and a selective exposure / development process was performed to perform negative patterning as shown in a sectional view in FIG. As shown in a sectional view in FIG. 8, a conductive layer 8 made of NiO x , for example, is formed by a sputtering method, and the conductive layer 8 ′ on the positive pattern surface is used as a plating nucleus to perform electrolytic copper plating under the same conditions as described above. Do the processing
As shown in a sectional view in FIG. 9, a second positive pattern 6'is formed.

【0030】次いで、前記第2のポジパターン6′形成
面に残存している導電性層8を、図10に断面的に示す選
択的にソフトエッチングによって除去してから、2のポ
ジパターン6′形成面に、図11に断面的に示すごとく、
絶縁性のフィルム(絶縁性シート)9を積層・一体化す
る。なお、配線層数を多くする場合は、絶縁性シート9
の積層・一体化に先だって、前記図6〜図10に図示した
工程を適宜繰り返せばよい。このように、最終のポジパ
ターン面を絶縁性シート9の積層・一体化で被覆した
後、前記導電性基材1を剥離し、金属層2をソフトエッ
チング除去するか、あるいは導電性基材1および金属層
2を順次剥離・除去することにより、図12に断面的に示
すごとく、表面に半田層4を有する第1のポジパターン
6が、絶縁体層2に平坦面を成して埋め込まれた印刷配
線板が得られた。
Then, the conductive layer 8 remaining on the surface on which the second positive pattern 6'is formed is removed by selective soft etching shown in cross section in FIG. On the forming surface, as shown in cross section in FIG. 11,
An insulating film (insulating sheet) 9 is laminated and integrated. When increasing the number of wiring layers, the insulating sheet 9
Prior to stacking and unifying, the steps shown in FIGS. 6 to 10 may be appropriately repeated. In this way, after the final positive pattern surface is covered by laminating and integrating the insulating sheet 9, the conductive base material 1 is peeled off and the metal layer 2 is removed by soft etching, or the conductive base material 1 is removed. By sequentially peeling and removing the metal layer 2 and the metal layer 2, the first positive pattern 6 having the solder layer 4 on the surface is embedded in the insulator layer 2 to form a flat surface, as shown in a sectional view in FIG. A printed wiring board was obtained.

【0031】なお、前記製造方法において、製造工程の
途中で内層配線を形成する場合は、その間に形成する絶
縁体層にダミーのスルホールパターンを設け、金属層2
を介して導電性基材1と電気的に接続させる構成を採っ
てもよい。
In the above manufacturing method, when the inner layer wiring is formed during the manufacturing process, dummy through-hole patterns are provided in the insulating layer formed between the inner layer wiring and the metal layer 2
You may employ | adopt the structure electrically connected with the electroconductive base material 1 via.

【0032】また、前記印刷配線板の製造工程で、たと
えば第2のポジパターン6′を形成した段階で、その第
2のポジパターン6′面に、たとえばエポキシ樹脂をバ
インダーとして成る銀系の導電性ペーストを印刷し、こ
の印刷された導電性ペーストが乾燥後、同一マスクを用
い同一位置に再度印刷する方法を繰り返し、たとえば18
0℃のオーブンで加熱・硬化させて、図13に断面的に示
すごとく、高さ 0.3mm,底面径0.35mm 程度の円錐型の
導体パンブ10を形成(形設)した。
In the process of manufacturing the printed wiring board, for example, when the second positive pattern 6'is formed, a silver-based conductive material such as an epoxy resin is used as a binder on the surface of the second positive pattern 6 '. The conductive paste is printed, and after this printed conductive paste is dried, the method of printing again at the same position using the same mask is repeated.
By heating and curing in an oven at 0 ° C., a conical conductor bump 10 having a height of 0.3 mm and a bottom diameter of about 0.35 mm was formed (shaped) as shown in a sectional view in FIG.

【0033】このように導体パンブ10を形成した印刷配
線板素材11を、たとえばエポキシ樹脂系のプリプレグ層
12を介して、図14に断面的に示すごとく、互いに導体パ
ンブ10を対応させて積層し、加圧一体化した。この加圧
一体化の過程で、前記導体パンブ10の先端側はそれぞれ
プリプレグ層12に圧入された、相互の先端部がいわゆる
塑性変形して、電気的に信頼性の高い配線層間の接続を
形成していた。
The printed wiring board material 11 on which the conductor bumps 10 are thus formed is used, for example, as an epoxy resin-based prepreg layer.
As shown in a cross-sectional view in FIG. 14, the conductor bumps 10 were laminated via the layers 12 so as to correspond to each other, and integrated under pressure. In the process of pressurizing and integrating, the tip ends of the conductor bumps 10 are press-fitted into the prepreg layers 12, respectively, so that the tip portions of each other are so-called plastically deformed to form an electrically reliable connection between wiring layers. Was.

【0034】上記でそれぞれ製造した構成の印刷配線板
においては、表面の接続用パッドが75/75mm,ピッチ間
隔0.15mmの場合でも、隣接する接続用パッド同士の絶縁
は十分に確保されており、また、電子部品の入出力端子
を半田付け接続したときも、半田ブリッジの発生は認め
られず、信頼性の高い実装が可能であった。
In the printed wiring boards constructed as described above, the insulation between adjacent connection pads is sufficiently ensured even when the connection pads on the surface are 75/75 mm and the pitch interval is 0.15 mm. Further, even when the input / output terminals of the electronic component were connected by soldering, no solder bridge was observed, and highly reliable mounting was possible.

【0035】実施例2 図1〜図15は本実施例の実施態様を模式的に示したもの
である。基本的には、実施例1の場合と共通するので、
前記図1〜図14を援用する。
Example 2 FIGS. 1 to 15 schematically show an embodiment of this example. Basically, since it is common to the case of the first embodiment,
The above-mentioned FIGS. 1 to 14 are incorporated.

【0036】先ず、導電性基材1として、たとえば厚さ
1mmの導電性ステンレス鋼板を用意し、図1に断面的に
示すごとく、この導電性ステンレス鋼板1面に、電気メ
ッキもしくはスパッタによって厚さ 2〜 3μm 程度のCu
金属膜2を形成した後、図2に断面的に示すごとく、厚
さ50μm 程度の感光性絶縁フィルム3を張り合わせた。
ここで、感光性絶縁フィルム3を張り合わせる代わり
に、感光性樹脂層を塗布形成してもよい。
First, as the conductive base material 1, for example, the thickness is
Prepare a 1 mm conductive stainless steel plate, and as shown in the cross-section in Fig. 1, coat one surface of this conductive stainless steel plate by electroplating or sputtering to a Cu thickness of about 2 to 3 µm.
After forming the metal film 2, a photosensitive insulating film 3 having a thickness of about 50 μm was laminated as shown in a sectional view in FIG.
Here, instead of sticking the photosensitive insulating film 3, a photosensitive resin layer may be formed by coating.

【0037】次いで、前記感光性絶縁フィルム3につい
て、選択的な露光・現像処理を施して、図3に断面的に
示すようにネガパターニングを行った。その後、前記導
電性ステンレス鋼板1を、一方の電極としてNiメッキ液
中に浸漬し、 2.5〜 3.0 A/dm2 程度の電流を流して電
気メッキ処理を行って、図4に断面的に示すごとく、露
出していた金属膜2面上にNi層4′を形成してから、さ
らに高速硫酸銅メッキ液中に浸漬し、20 A/dm2 程度の
電流を流して電気メッキ処理を行って、図5に断面的に
示すごとく、前記Ni層4′上(配線パターン形成領域)
に、選択的に厚さ35μm の銅層5を析出させて第1のポ
ジパターン6を形成した。ここで、Ni層4′は、銅層5
に対して選択的なエッチングが可能な金属が選ばれる。
Next, the photosensitive insulating film 3 was subjected to selective exposure / development treatment, and negative patterning was performed as shown in a sectional view in FIG. Then, the electroconductive stainless steel plate 1 was immersed in a Ni plating solution as one electrode, and an electric current of about 2.5 to 3.0 A / dm 2 was applied to perform electroplating, as shown in a sectional view in FIG. After forming the Ni layer 4'on the exposed metal film 2 surface, it is further immersed in a high-speed copper sulfate plating solution, and an electric current of about 20 A / dm 2 is applied to perform electroplating treatment. As shown in cross section in FIG. 5, on the Ni layer 4 '(wiring pattern forming region)
Then, a copper layer 5 having a thickness of 35 μm was selectively deposited to form a first positive pattern 6. Here, the Ni layer 4'is the copper layer 5
A metal that can be selectively etched is selected.

【0038】前記第1のポジパターン6形成面に、再び
厚さ35μm 程度の感光性絶縁フィルム3′を張り合わ
せ、図6に断面的に示すように、第1のポジパターン6
に接続するスルホールパターン7を形成し、このスルホ
ールパターン7部を電気めっき処理によって銅で埋め込
んだ。前記スルホールパターン7部銅で埋め込んだ後、
厚さ35μm 程度の感光性絶縁フィルム3″を張り合わ
せ、選択的な露光・現像処理を施して、図7に断面的に
示すごとく、絶縁性のネガパターニングを行った。その
後、前記絶縁性ネガパターニング3″面に、図8に断面
的に示すごとく、たとえば NiOx から成る導電性層8を
スパッタ法で形成し、ポジパターン面の導電性層8′を
めっき核として、前記と同様の条件で電気銅めっき処理
を行い、図9に断面的に示すごとく、第2のポジパター
ン6′を形成した。
On the surface on which the first positive pattern 6 is formed, a photosensitive insulating film 3'having a thickness of about 35 μm is attached again, and as shown in a sectional view in FIG. 6, the first positive pattern 6 is formed.
A through hole pattern 7 connected to the above was formed, and this through hole pattern 7 portion was filled with copper by electroplating. After embedding the through hole pattern 7 parts with copper,
A photosensitive insulating film 3 ″ having a thickness of about 35 μm was laminated, and selective exposure / development processing was performed to perform negative insulating patterning as shown in a sectional view in FIG. As shown in a sectional view in FIG. 8, a conductive layer 8 made of NiO x , for example, is formed on the 3 ″ surface by a sputtering method, and the conductive layer 8 ′ on the positive pattern surface is used as a plating nucleus under the same conditions as described above. Electrolytic copper plating was performed to form a second positive pattern 6'as shown in a sectional view in FIG.

【0039】次いで、前記第2のポジパターン6′形成
面に残存している導電性層8を、図10に断面的に示す選
択的にソフトエッチングによって除去してから、第2の
ポジパターン6′形成面に、図11に断面的に示すごと
く、絶縁性のフィルム(絶縁性シート)9を積層・一体
化する。なお、配線層数を多くする場合は、絶縁性シー
ト9の積層・一体化に先だって、前記図6〜図10に図示
した工程を適宜繰り返せばよい。このように、最終のポ
ジパターン面を絶縁性シート9の積層・一体化で被覆し
た後、前記導電性基材1を剥離し、金属層2をソフトエ
ッチング除去するか、あるいは導電性基材1および金属
層2を順次剥離・除去する。このようにして、第1のポ
ジパターン6のNi層4′を露出させた後、Ni層4′を選
択的にエッチング除去すると、図15に断面的に示すごと
く、表面が絶縁体層2面よりも凹設化し、いわば絶縁体
層2によってダムが設けられた形態の第1のポジパター
ン6を有する印刷配線板が得られた。
Then, the conductive layer 8 remaining on the surface on which the second positive pattern 6'is formed is removed by selective soft etching shown in cross section in FIG. An insulating film (insulating sheet) 9 is laminated and integrated on the formation surface, as shown in a sectional view in FIG. When the number of wiring layers is increased, the steps shown in FIGS. 6 to 10 may be appropriately repeated prior to stacking and integrating the insulating sheets 9. In this way, after the final positive pattern surface is covered by laminating and integrating the insulating sheet 9, the conductive base material 1 is peeled off and the metal layer 2 is removed by soft etching, or the conductive base material 1 is removed. Then, the metal layer 2 is sequentially peeled and removed. In this way, after the Ni layer 4'of the first positive pattern 6 is exposed and the Ni layer 4'is selectively removed by etching, as shown in a sectional view in FIG. A printed wiring board having a first positive pattern 6 in which the insulating layer 2 is provided with a dam and the dam is provided, so to speak, is obtained.

【0040】なお、前記製造方法において、製造工程の
途中で内層配線を形成する場合は、その間に形成する絶
縁体層にダミーのスルホールパターンを設け、金属層2
を介して導電性基材1と電気的に接続させる構成を採っ
てもよい。また、金属層2をソフトエッチング除去する
とき、Ni層4′も同時に選択エッチング除去してもよ
い。
In the manufacturing method, when the inner layer wiring is formed in the middle of the manufacturing process, dummy through-hole patterns are provided in the insulating layer formed between them to form the metal layer 2
You may employ | adopt the structure electrically connected with the electroconductive base material 1 via. Further, when the metal layer 2 is removed by soft etching, the Ni layer 4'may be removed by selective etching at the same time.

【0041】また、前記印刷配線板の製造工程で、たと
えば第2のポジパターン6′を形成した段階で、その第
2のポジパターン6′面に、たとえばエポキシ樹脂をバ
インダーとして成る銀系の導電性ペーストを印刷し、こ
の印刷された導電性ペーストが乾燥後、同一マスクを用
い同一位置に再度印刷する方法を繰り返し、たとえば18
0℃のオーブンで加熱・硬化させて、図13に断面的に示
すごとく、高さ 0.3mm,底面径0.35mm 程度の円錐型の
導体パンブ10を形成(形設)した。
In the process of manufacturing the printed wiring board, for example, at the stage where the second positive pattern 6'is formed, the surface of the second positive pattern 6'is made of silver-based conductive material such as epoxy resin as a binder. The conductive paste is printed, and after this printed conductive paste is dried, the method of printing again at the same position using the same mask is repeated.
By heating and curing in an oven at 0 ° C., a conical conductor bump 10 having a height of 0.3 mm and a bottom diameter of about 0.35 mm was formed (shaped) as shown in a sectional view in FIG.

【0042】このように導体パンブ10を形成した印刷配
線板素材11を、たとえばエポキシ樹脂系のプリプレグ層
12を介して、互いに導体パンブ10を対応させて積層し、
加圧一体化した。この加圧一体化の過程で、前記導体パ
ンブ10の先端側はそれぞれプリプレグ層12に圧入され
た、相互の先端部がいわゆる塑性変形して、電気的に信
頼性の高い配線層間の接続を形成していた。
The printed wiring board material 11 on which the conductor bumps 10 are formed in this manner is used, for example, as an epoxy resin prepreg layer.
Through 12, the conductor bumps 10 are laminated so as to correspond to each other,
Pressure integrated. In the process of pressurizing and integrating, the tip ends of the conductor bumps 10 are press-fitted into the prepreg layers 12, respectively, so that the tip portions of each other are so-called plastically deformed to form an electrically reliable connection between wiring layers. Was.

【0043】上記でそれぞれ製造した構成の印刷配線板
においては、表面の接続用パッドが75/75mm,ピッチ間
隔0.15mmの場合でも、隣接する接続用パッド同士の絶縁
は十分に確保されており、また、電子部品の入出力端子
を半田付け接続したときも、半田ブリッジの発生は認め
られず、信頼性の高い実装が可能であった。
In the printed wiring boards having the configurations respectively manufactured above, even if the connection pads on the surface are 75/75 mm and the pitch interval is 0.15 mm, insulation between adjacent connection pads is sufficiently ensured, Further, even when the input / output terminals of the electronic component were connected by soldering, no solder bridge was observed, and highly reliable mounting was possible.

【0044】上記では、実施例として代表例を説明した
が、本発明はこれらの実施例に限定されるものでなく、
本発明の趣旨を逸脱しない範囲でいろいろの変形を採り
得る。すなわち、導電性基材、金属層,絶縁性ネガパタ
ーン形成材,ポジパターン形成金属などは、前記実施例
に例示したもの以外の組み合わせなど採っても同様の成
果が得られる。
Although representative examples have been described above as examples, the present invention is not limited to these examples.
Various modifications can be made without departing from the spirit of the present invention. That is, the same result can be obtained even if the conductive base material, the metal layer, the insulating negative pattern forming material, the positive pattern forming metal, and the like are combined other than those exemplified in the above-mentioned embodiment.

【0045】[0045]

【発明の効果】上記説明から分かるように、本発明によ
れば、接続用パッド面に電子部品の入出力端子を半田付
けするとき、平面方向への半田流出が抑制・防止される
ため、半田ブリッジなどの発生が全面的に回避される印
刷配線板を容易に得ることが可能である。換言すると、
接続用パッドなど相互の絶縁が確実に確保される一方、
実質的に半田付け部がダム化され、平面方向への流出が
防止されていることに伴って、信頼性の高い実装回路装
置の構成に適する印刷配線板を簡略な手段で得ることが
可能となる。
As can be seen from the above description, according to the present invention, when the input / output terminals of the electronic component are soldered to the connection pad surface, solder outflow in the plane direction is suppressed / prevented. It is possible to easily obtain a printed wiring board in which the occurrence of bridges and the like is wholly avoided. In other words,
While ensuring mutual insulation such as connection pads,
Since the soldering part is substantially dammed and the outflow in the planar direction is prevented, it is possible to obtain a printed wiring board suitable for a highly reliable mounting circuit device configuration by simple means. Become.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る製造方法の実施態様を模式的に示
すもので,導電性基材面に金属層を形成した状態の断面
図。
FIG. 1 schematically shows an embodiment of a manufacturing method according to the present invention, and is a cross-sectional view of a state in which a metal layer is formed on the surface of a conductive base material.

【図2】本発明に係る製造方法の実施態様を模式的に示
すもので、金属層面に第1の絶縁性フィルム層を張り合
わせた状態の断面図。
FIG. 2 schematically shows an embodiment of a manufacturing method according to the present invention, and is a cross-sectional view of a state in which a first insulating film layer is attached to a metal layer surface.

【図3】本発明に係る製造方法の実施態様を模式的に示
すもので,第1の絶縁性ネガパターニングした状態の断
面図。
FIG. 3 schematically shows an embodiment of a manufacturing method according to the present invention, and is a cross-sectional view showing a state in which a first insulating negative pattern is formed.

【図4】本発明に係る製造方法の実施態様を模式的に示
すもので、金属層面にめっき半田層を形成した状態の断
面図。
FIG. 4 schematically shows an embodiment of a manufacturing method according to the present invention, and is a cross-sectional view of a state in which a plated solder layer is formed on a metal layer surface.

【図5】本発明に係る製造方法の実施態様を模式的に示
すもので、めっき半田層面に第1のポジパターンを形成
した状態の断面図。
FIG. 5 schematically shows an embodiment of a manufacturing method according to the present invention, and is a cross-sectional view of a state in which a first positive pattern is formed on the plated solder layer surface.

【図6】本発明に係る製造方法の実施態様を模式的に示
すもので、第1のポジパターン形成面にスルホールパタ
ーンを形成する絶縁縁性フィルム層を張り合わせた状態
の断面図。
FIG. 6 schematically shows an embodiment of a manufacturing method according to the present invention, and is a cross-sectional view of a state in which an insulating edging film layer forming a through-hole pattern is stuck to a first positive pattern forming surface.

【図7】本発明に係る製造方法の実施態様を模式的に示
すもので,スルホールパターンを形成面に第2の絶縁縁
性フィルム層を形成してネガパターニングした状態の断
面図。
FIG. 7 schematically shows an embodiment of the manufacturing method according to the present invention, and is a cross-sectional view of a state in which a second insulating edging film layer is formed on a surface on which a through hole pattern is formed and negative patterning is performed.

【図8】本発明に係る製造方法の実施態様を模式的に示
すもので,第2の絶縁縁性フィルムのネガパターニング
面に導電性層を形成した状態を示す断面図。
FIG. 8 is a cross-sectional view schematically showing an embodiment of the manufacturing method according to the present invention, showing a state in which a conductive layer is formed on the negative patterned surface of the second insulating edging film.

【図9】本発明に係る製造方法の実施態様を模式的に示
すもので,第2の絶縁縁性フィルムのポジパターン上の
導電性層面に第2のポジパターンを形成した状態の断面
図。
FIG. 9 is a cross-sectional view schematically showing an embodiment of the manufacturing method according to the present invention, in a state in which a second positive pattern is formed on the conductive layer surface on the positive pattern of the second insulating edge film.

【図10】本発明に係る製造方法の実施態様を模式的に
示すもので、第2の絶縁縁性フィルムのポジパターン上
の導電性層を除去した状態の断面図。
FIG. 10 schematically shows an embodiment of the manufacturing method according to the present invention, and is a cross-sectional view showing a state where the conductive layer on the positive pattern of the second insulating edging film is removed.

【図11】本発明に係る製造方法の実施態様を模式的に
示すもので、第2のポジパターン形成面に絶縁性シート
を積層・一体化した状態の断面図。
FIG. 11 schematically shows an embodiment of the manufacturing method according to the present invention, and is a cross-sectional view of a state in which an insulating sheet is laminated and integrated on the second positive pattern forming surface.

【図12】本発明に係る製造方法の実施態様を模式的に
示すもので、導電性基材および金属膜を除去した状態の
断面図。
FIG. 12 is a cross-sectional view schematically showing the embodiment of the manufacturing method according to the present invention, in a state where the conductive base material and the metal film are removed.

【図13】本発明に係る製造方法の他の実施態様を模式
的に示すもので、第2のポジパターン面に導電バンプを
形成した状態の断面図。
FIG. 13 is a cross-sectional view schematically showing another embodiment of the manufacturing method according to the present invention, in which conductive bumps are formed on the second positive pattern surface.

【図14】本発明に係る製造方法のさらに他の実施態様
を模式的に示すもので、導電性基材および金属膜を除去
した状態の断面図。
FIG. 14 is a sectional view schematically showing still another embodiment of the manufacturing method according to the present invention, in a state where the conductive base material and the metal film are removed.

【図15】本発明に係る製造方法のさらに他の実施態様
を模式的に示すもので、第2のポジパターン面に形成し
た導電バンプを絶縁性プリプレグ層を介して対向させ、
積層・一体化した状態の断面図。
FIG. 15 schematically shows still another embodiment of the manufacturing method according to the present invention, in which conductive bumps formed on the second positive pattern surface are opposed to each other via an insulating prepreg layer,
Sectional drawing in the state of being laminated and integrated.

【符号の説明】[Explanation of symbols]

1……導電性基材 2……金属膜 3,3′,
3″……絶縁性シート層 4……めっき半田層
4′……めっき金属層 5……銅めっき層
6,6′……ポジパターン 7……スルホールパタ
ーン 8,8′……導電性層 9……絶縁性シ
ート 10……導電バンプ
1 ... Conductive substrate 2 ... Metal film 3, 3 ',
3 ″ ... Insulating sheet layer 4 ... Plating solder layer
4 '... plated metal layer 5 ... copper plated layer
6,6 '... Positive pattern 7 ... Through hole pattern 8,8' ... Conductive layer 9 ... Insulating sheet 10 ... Conductive bump

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 導電性基材の少なくとも一主面に金属膜
を被着形成する工程と、 前記金属膜面上に第1の電気絶縁性のネガパターンニン
グする工程と、 前記導電性基材を一方の電極としてめっき処理を行い金
属膜の露出面に第1の導電性金属および第1の導電性金
属とは異種の第2の導電性金属のポジパターンを順次積
層して形成する工程と、 前記第2の導電性金属のポジパターン形成面に、第2の
導電性金属のポジパターンに接続する接続孔を備えた第
2の電気絶縁性のネガパターンニングする工程と、 前記第2の電気絶縁性ポジパターン面に導電性層を設け
る工程と、 前記導電性基材を一方の電極としてめっき処理を行い、
前記導電性層面に第3の導電性金属のポジパターンを形
成する工程と、 前記最終の導電性金属のポジパターン形成面に絶縁性シ
ート層を積層・一体化した後、導電性基材および金属膜
を除去する工程と,前記金属膜の除去で露出した第1の
導電性金属ポジパターンを選択的にエッチング除去する
工程とを具備して成ることを特徴とする印刷配線板の製
造方法。
1. A step of depositing a metal film on at least one main surface of a conductive base material, a step of forming a first electrically insulating negative pattern on the metal film surface, and the conductive base material. Plating as one of the electrodes and sequentially forming a positive pattern of the first conductive metal and a second conductive metal different from the first conductive metal on the exposed surface of the metal film. A second electrically insulating negative patterning step of providing a connection hole connected to the positive pattern of the second conductive metal on the positive pattern formation surface of the second conductive metal; A step of providing a conductive layer on the electrically insulating positive pattern surface, and performing a plating treatment with the conductive base material as one electrode,
A step of forming a positive pattern of a third conductive metal on the surface of the conductive layer; and a step of stacking and integrating an insulating sheet layer on the surface of the final positive pattern of the conductive metal, and then forming a conductive base material and a metal. A method of manufacturing a printed wiring board, comprising: a step of removing a film; and a step of selectively etching away the first conductive metal positive pattern exposed by the removal of the metal film.
【請求項2】 導電性基材の少なくとも一主面に、金属
膜を被着形成する工程と、 前記金属膜面上に第1の電気絶縁性のネガパターンニン
グする工程と、 前記導電性基材を一方の電極としてめっき処理を行い金
属膜の露出面に半田金属および第1の導電性金属のポジ
パターンを順次積層して形成する工程と、 前記第1の導電性金属のポジパターン形成面に、第1の
導電性金属のポジパターンに接続する接続孔を備えた第
2の電気絶縁性のネガパターンニングする工程と、 前記第2の電気絶縁性ポジパターン面に第1の導電性層
を設ける工程と、 前記導電性基材を一方の電極としてめっき処理を行い、
前記第1の導電性層面に第2の導電性金属のポジパター
ンを形成する工程と、 前記第2の導電性金属のポジパターン形成面に、第2の
導電性金属のポジパターンに接続する接続孔を備えた第
3の電気絶縁性のネガパターンニングする工程と、 前記第2の電気絶縁性ポジパターン面に第2の導電性層
を設ける工程と、 前記導電性基材を一方の電極としてめっき処理を行い前
記第2の導電性層面に第3の導電性金属のポジパターン
を形成する工程と、 前記最終の導電性金属のポジパターン形成面に絶縁性シ
ート層を積層・一体化した後、導電性基材および金属膜
を除去する工程とを具備して成ることを特徴とする印刷
配線板の製造方法。
2. A step of depositing a metal film on at least one main surface of a conductive base material, a step of performing a first electrically insulating negative patterning on the metal film surface, and the conductive group. A step of forming a positive pattern of a solder metal and a first conductive metal on the exposed surface of the metal film by plating using the material as one electrode, and a positive pattern formation surface of the first conductive metal. A second electrically insulating negative patterning step of providing a connection hole for connecting to the positive pattern of the first electrically conductive metal, and a first electrically conductive layer on the surface of the second electrically insulative positive pattern. And a step of performing a plating process using the conductive substrate as one electrode,
Forming a positive pattern of a second conductive metal on the surface of the first conductive layer; and connecting to a positive pattern of the second conductive metal on a surface of the positive pattern of the second conductive metal. A step of forming a third electrically insulating negative pattern having holes, a step of providing a second electrically conductive layer on the surface of the second electrically insulative positive pattern, and the electrically conductive substrate as one electrode A step of performing a plating treatment to form a positive pattern of a third conductive metal on the surface of the second conductive layer, and laminating and integrating an insulating sheet layer on the surface of the final positive pattern of the conductive metal And a step of removing the conductive base material and the metal film.
【請求項3】 請求項1もしくは請求項2記載の導電性
基材として、離型性良好な導電性基材を用い、かつ剥離
除去することを特徴とする印刷配線板の製造方法。
3. A method for producing a printed wiring board, which comprises using a conductive base material having good releasability as the conductive base material according to claim 1 or 2, and peeling and removing the conductive base material.
【請求項4】 導電性基材の少なくとも一主面に、金属
膜を被着形成する工程と、 前記金属膜面上に第1の電気絶縁性のネガパターンニン
グする工程と、 前記導電性基材を一方の電極としてめっき処理を行い金
属膜の露出面に第1の導電性金属および第1の導電性金
属とは異種の第2の導電性金属のポジパターンを順次積
層して形成する工程と、 前記第2の導電性金属のポジパターン形成面に、第2の
導電性金属のポジパターンに接続する接続孔を備えた第
2の電気絶縁性のネガパターンニングする工程と、 前記第2の電気絶縁性ポジパターン面に第1の導電性層
を設ける工程と、 前記導電性基材を一方の電極としてめっき処理を行い、
前記第1の導電性層面に第2の導電性金属のポジパター
ンを形成する工程と、 前記第2の導電性金属のポジパターン面に、所要の接続
用バンブを形成する工程と、 前記接続用バンブを形成面に絶縁性シート層を介して、
他の配線板要素の配線パターン面を対向して配置・積層
し一体化する工程と、 前記導電性基材および金属膜を剥離除去する工程とを具
備して成ることを特徴とする印刷配線板の製造方法。
4. A step of depositing a metal film on at least one main surface of a conductive base material, a step of performing a first electrically insulating negative patterning on the metal film surface, and the conductive group. A step of performing a plating process using the material as one electrode to sequentially form a positive pattern of a first conductive metal and a second conductive metal different from the first conductive metal on the exposed surface of the metal film. And a second electrically insulating negative patterning step, in which a contact hole for connecting to the positive pattern of the second conductive metal is provided on the positive pattern formation surface of the second conductive metal, A step of providing a first conductive layer on the electrically insulating positive pattern surface of, and a plating process using the conductive base material as one electrode,
Forming a positive pattern of a second conductive metal on the surface of the first conductive layer; forming a required connection bump on the positive pattern surface of the second conductive metal; Through the insulating sheet layer on the bump forming surface,
A printed wiring board comprising: a step of arranging and laminating the wiring pattern surfaces of other wiring board elements so as to face each other and integrating them; and a step of peeling and removing the conductive base material and the metal film. Manufacturing method.
【請求項5】 導電性基材の少なくとも一主面に、金属
膜を被着形成する工程と、 前記金属膜面上に第1の電気絶縁性のネガパターンニン
グする工程と、 前記導電性基材を一方の電極としてめっき処理を行い金
属膜の露出面に半田金属および第1の導電性金属のポジ
パターンを順次積層して形成する工程と、 前記第1の導電性金属のポジパターン形成面に、第1の
導電性金属のポジパターンに接続する接続孔を備えた第
2の電気絶縁性のネガパターンニングする工程と、 前記第2の電気絶縁性ポジパターン面に第1の導電性層
を設ける工程と、 前記導電性基材を一方の電極としてめっき処理を行い、
前記第1の導電性層面に第2の導電性金属のポジパター
ンを形成する工程と、 前記第2の導電性金属のポジパターン形成面に、第2の
導電性金属のポジパターンに接続する接続孔を備えた第
3の電気絶縁性のネガパターンニングする工程と、 前記第3の電気絶縁性ポジパターン面に第2の導電性層
を設ける工程と、 前記導電性基材を一方の電極としてめっき処理を行い、
前記第2の導電性層面に第3の導電性金属のポジパター
ンを形成する工程と、 最終の導電性金属のポジパターン面に、所要の接続用バ
ンブを形成する工程と、 前記接続用バンブを形成面に
絶縁性シート層を介して、他の配線板要素の配線パター
ン面を対向して配置・積層し一体化する工程と、 前記導電性基材および金属膜を剥離除去する工程とを具
備して成ることを特徴とする印刷配線板の製造方法。
5. A step of depositing a metal film on at least one main surface of a conductive base material, a step of performing a first electrically insulating negative patterning on the metal film surface, and the conductive group. A step of forming a positive pattern of a solder metal and a first conductive metal on the exposed surface of the metal film by plating using the material as one electrode, and a positive pattern formation surface of the first conductive metal. A second electrically insulating negative patterning step of providing a connection hole for connecting to the positive pattern of the first electrically conductive metal, and a first electrically conductive layer on the surface of the second electrically insulative positive pattern. And a step of performing a plating process using the conductive substrate as one electrode,
Forming a positive pattern of a second conductive metal on the surface of the first conductive layer; and connecting to a positive pattern of the second conductive metal on a surface of the positive pattern of the second conductive metal. A step of forming a third electrically insulating negative pattern having holes, a step of providing a second electrically conductive layer on the surface of the third electrically insulative positive pattern, and the electrically conductive substrate as one electrode Plating treatment,
A step of forming a positive pattern of a third conductive metal on the surface of the second conductive layer; a step of forming a required connection bump on the final positive pattern surface of the conductive metal; and a step of forming the connection bump. And a step of arranging and laminating the wiring pattern surfaces of other wiring board elements so as to face each other with an insulating sheet layer interposed therebetween on the formation surface, and a step of peeling and removing the conductive base material and the metal film. A method of manufacturing a printed wiring board, comprising:
【請求項6】 請求項4もしくは請求項5記載の導電性
基材として、離型性良好な導電性基材を用い、かつ剥離
除去することを特徴とする印刷配線板の製造方法。
6. A method for producing a printed wiring board, which comprises using a conductive base material having a good mold releasability as the conductive base material according to claim 4 or 5, and peeling and removing the conductive base material.
JP1405495A 1995-01-31 1995-01-31 Printed wiring board manufacturing method and printed wiring board Expired - Fee Related JP3655336B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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US6074728A (en) * 1996-09-11 2000-06-13 Samsung Aerospace Industries, Ltd. Multi-layered circuit substrate
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US6576848B1 (en) * 1996-11-22 2003-06-10 International Business Machines Corporation Integrated circuit chip wiring structure with crossover capability and method of manufacturing the same
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US7189302B2 (en) 2003-11-06 2007-03-13 Lg Electronics Inc. Multi-layer printed circuit board and fabricating method thereof
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JP4549693B2 (en) * 2004-02-27 2010-09-22 日本特殊陶業株式会社 Wiring board manufacturing method
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JP2005243990A (en) * 2004-02-27 2005-09-08 Ngk Spark Plug Co Ltd Method for manufacturing wiring board
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JP2008192878A (en) * 2007-02-06 2008-08-21 Shinko Electric Ind Co Ltd Multilayer wiring substrate, and manufacturing method thereof
KR100925666B1 (en) * 2007-12-18 2009-11-10 대덕전자 주식회사 Method of fabricating solder bump for flip chip technology
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JP2010118633A (en) * 2008-11-12 2010-05-27 Samsung Electro-Mechanics Co Ltd Printed circuit board having buried solder bump and manufacturing method therefor
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US8039762B2 (en) 2008-11-12 2011-10-18 Samsung Electro-Mechanics Co., Ltd. Printed circuit board having a buried solder bump and a circuit layer flush with an insulating layer
US9021690B2 (en) 2008-11-12 2015-05-05 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing printed circuit board having buried solder bump
JP2011181740A (en) * 2010-03-02 2011-09-15 Nitto Denko Corp Wiring circuit structure and method of manufacturing semiconductor device using the same

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