JPH07275780A - Rotary cup type treating device - Google Patents

Rotary cup type treating device

Info

Publication number
JPH07275780A
JPH07275780A JP6944494A JP6944494A JPH07275780A JP H07275780 A JPH07275780 A JP H07275780A JP 6944494 A JP6944494 A JP 6944494A JP 6944494 A JP6944494 A JP 6944494A JP H07275780 A JPH07275780 A JP H07275780A
Authority
JP
Japan
Prior art keywords
inner cup
cup
space
evacuating
exhaust passage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6944494A
Other languages
Japanese (ja)
Other versions
JP2756639B2 (en
Inventor
Hirohito Sago
宏仁 佐合
Hideya Kobari
英也 小針
Yasuji Ueda
康爾 上田
Hidenori Miyamoto
英典 宮本
Ryuzo Takatsuki
龍三 高月
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Tatsumo KK
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Tatsumo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd, Tatsumo KK filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP6944494A priority Critical patent/JP2756639B2/en
Publication of JPH07275780A publication Critical patent/JPH07275780A/en
Application granted granted Critical
Publication of JP2756639B2 publication Critical patent/JP2756639B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To keep uniform the pressure distribution in an inner cup and the coating film of a material to be treated by dividing an evacuating pass of an outer cup into a buffer space of large capacity connecting to an evacuating device and a communicative space connecting it and a space in the inner cup. CONSTITUTION:After a chuck 10 in which a material to be treated is set on the upper surface is lowered and engaged with an inner cup 3, liquid is dropped onto the upper surface of the material to be treated, and also an outer cup 2 and the inner cup 3 are closed by cover bodies 26, 27 respectively. Because at this time, an evacuating pass 20 is normally evacuated, the inner cup 3 is also evacuated through a liquid discharge and evacuating hole 22. Since the liquid discharge and evacuating hole 22 is not opened to a buffer space S1 to which an evacuating hole 23 is opened but opened to a communicative space S2 of small volume, however, the inner cup 3 is uniformly evacuated, not influenced by the evacuating hole 23. After that, the inner cup 3 and the chuck 10 each are rotated to uniformly diffuse liquid by centrifugal force.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体素子用のウェーハ
や液晶パネル用のガラス基板等の被処理物表面に対する
被膜形成用液の塗布工程等に使用する装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus used in a step of applying a film forming liquid to the surface of an object to be processed such as a wafer for a semiconductor element or a glass substrate for a liquid crystal panel.

【0002】[0002]

【従来の技術】半導体素子用のウェーハや液晶パネル用
のガラス基板に塗布液を塗布する装置として、固定した
カップ内にスピンナーチャックを臨ませ、スピンナーチ
ャックに被処理物を固着し、スピンナーチャックと一体
的に被処理物を回転せしめ、この回転によって発生する
遠心力で被処理物表面に滴下した液体を均一に被処理物
表面に拡散する構造のものが知られている。
2. Description of the Related Art As a device for applying a coating liquid to a wafer for semiconductor devices or a glass substrate for liquid crystal panels, a spinner chuck is exposed in a fixed cup, and an object to be processed is fixed to the spinner chuck to form a spinner chuck. There is known a structure in which the object to be processed is rotated integrally and the liquid dropped on the surface of the object to be processed is uniformly diffused by the centrifugal force generated by this rotation.

【0003】しかしながら、上述した処理装置にあって
はカップが固定で、スピンナーチャックが回転するた
め、カップ内に乱流が生じ、均一な塗布が困難で微細な
塵が付着し歩留まり低下を招く。
However, in the above-mentioned processing apparatus, since the cup is fixed and the spinner chuck rotates, turbulent flow occurs in the cup, uniform coating is difficult, and fine dust adheres to lower the yield.

【0004】そこで、塗布雰囲気に乱流を起こさない装
置として特開平3−293056号公報に回転カップ式
の処理装置が提案されている。この処理装置は固定され
たアウターカップ内にインナーカップを配置し、このイ
ンナーカップ内に被処理物をセットするとともにインナ
ーカップの上面開口を蓋体で閉塞した状態でインナーカ
ップを回転せしめることで、遠心力でインナーカップ内
を減圧し塗布液中に溶存している気体を除去するととも
に遠心力で塗布液を被処理物表面に均一に拡散するよう
にしたものである。
Therefore, as a device that does not cause a turbulent flow in the coating atmosphere, Japanese Patent Laid-Open No. 293056/1993 proposes a rotary cup type processing device. In this processing apparatus, the inner cup is arranged in the fixed outer cup, the object to be processed is set in the inner cup, and the inner cup is rotated by closing the upper opening of the inner cup with the lid, The inner cup is decompressed by centrifugal force to remove the gas dissolved in the coating liquid, and the coating liquid is uniformly dispersed on the surface of the object to be treated by centrifugal force.

【0005】また、インナーカップを回転せしめてイン
ナーカップ内を減圧するのを助長すべく、アウターカッ
プにはインナーカップの外周に沿った環状の排気通路を
形成し、この排気通路に真空ポンプ等につながる排気口
を形成し、常時排気通路内を減圧している。
Further, in order to help rotate the inner cup and reduce the pressure inside the inner cup, an annular exhaust passage is formed in the outer cup along the outer periphery of the inner cup, and a vacuum pump or the like is formed in the exhaust passage. The connected exhaust port is formed to constantly reduce the pressure in the exhaust passage.

【0006】[0006]

【発明が解決しようとする課題】前記した回転カップ式
処理装置にあっては、インナーカップ内に被処理物をセ
ットし、被処理物表面に塗布液を滴下し、この後蓋体で
インナーカップとアウターカップの上面開口を閉じ、次
いでインナーカップを回転する手順となる。一方、アウ
ターカップの排気通路は常時排気されている。その結
果、蓋体でインナーカップとアウターカップの上面開口
を閉じた時点でインナーカップ内はインナーカップに形
成した排液兼排気孔を介して減圧されることになるが、
排気通路に形成される排気口は1箇所であるので、排気
口に近い部分が強く吸引され、塗布等の処理開始時にイ
ンナーカップ内の圧力分布が不均一になり、膜厚の均一
化に悪影響を及ぼす。特に回転開始直前における被処理
分の排気口に近い部分と他の部分とには膜厚に顕著な差
が生じる。
In the rotary cup type processing apparatus described above, the object to be processed is set in the inner cup, the coating liquid is dropped on the surface of the object to be processed, and then the inner cup is closed with the lid. Then, the upper opening of the outer cup is closed, and then the inner cup is rotated. On the other hand, the exhaust passage of the outer cup is always exhausted. As a result, when the lid closes the upper openings of the inner cup and the outer cup, the inside of the inner cup is depressurized through the drainage / exhaust hole formed in the inner cup.
Since there is only one exhaust port formed in the exhaust passage, the portion close to the exhaust port is strongly sucked, and the pressure distribution inside the inner cup becomes uneven at the start of processing such as coating, which adversely affects the uniformity of the film thickness. Exert. In particular, there is a significant difference in film thickness between the portion near the exhaust port and the other portion immediately before the start of rotation.

【0007】また、インナーカップの回転を停止した場
合、アウターカップの排気通路内の圧力はインナーカッ
プ内の圧力よりも高いため、排気通路内の気体が瞬時に
インナーカップ内に逆流し、インナーカップ内に脈動が
発生する。この脈動は、まだ溶媒を含んだ状態の被処理
物表面の塗膜に作用し、前記同様塗膜に悪影響を及ぼ
す。
Further, when the rotation of the inner cup is stopped, the pressure in the exhaust passage of the outer cup is higher than the pressure in the inner cup, so that the gas in the exhaust passage instantaneously flows back into the inner cup, Pulsation occurs inside. The pulsation acts on the coating film on the surface of the object to be treated which still contains the solvent, and adversely affects the coating film as described above.

【0008】[0008]

【課題を解決するための手段】上記課題を解決すべく本
発明は、モータにて回転せしめられるインナーカップの
外側にベースに固定されるアウターカップを配置し、こ
のアウターカップにインナーカップの外周に沿った環状
の排気通路を形成した回転カップ式処理装置において、
前記排気通路を隔壁によって排気装置につながる大容積
のバッファ空間と、このバッファ空間と前記インナーカ
ップ内空間とをつなぐ小容積の連通空間とに区画した。
ここで、前記排気通路の対向する2箇所に排気口を形成
することが可能である。
In order to solve the above-mentioned problems, the present invention has an outer cup fixed to a base on the outside of an inner cup rotated by a motor, and the outer cup is provided on the outer circumference of the inner cup. In a rotary cup type processing device having an annular exhaust passage along
The exhaust passage is partitioned into a large-capacity buffer space connected to the exhaust device by a partition wall and a small-volume communication space that connects the buffer space and the inner cup inner space.
Here, it is possible to form exhaust ports at two opposing positions of the exhaust passage.

【0009】[0009]

【作用】インナーカップ及びアウターカップの蓋体を閉
じた場合でも、インナーカップ内は小容積の連通空間を
介してバッファ空間に引かれ、またインナーカップの回
転を停止せしめた場合には、バッファ空間の気体は小容
積の連通空間を介して徐々にインナーカップ内に流入す
る。
[Function] Even when the lids of the inner cup and the outer cup are closed, the inside of the inner cup is pulled into the buffer space through the small-volume communication space, and when the rotation of the inner cup is stopped, the buffer space is stopped. The gas gradually flows into the inner cup through the small-volume communication space.

【0010】[0010]

【実施例】以下に本発明の実施例を添付図面に基づいて
説明する。ここで、図1は本発明に係る回転カップ式処
理装置の縦断面図、図2は同回転カップ式処理装置の要
部拡大断面図、図3は排気通路を示す平断面図、図4は
排気通路の別実施例を示す平断面図である。
Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, FIG. 1 is a vertical sectional view of a rotary cup type processing apparatus according to the present invention, FIG. 2 is an enlarged sectional view of a main part of the rotary cup type processing apparatus, FIG. 3 is a plane sectional view showing an exhaust passage, and FIG. It is a plane sectional view showing another example of an exhaust passage.

【0011】回転カップ式処理装置はベース1上に環状
のアウターカップ2を固定し、このアウターカップ2内
側にインナーカップ3を配置し、このインナーカップ3
の筒状軸部4をベアリング5を介してベース1に回転自
在に支承するとともに筒状軸部4の下端にプーリ6を嵌
着し、このプーリ6とモータ7の回転軸に嵌着したプー
リ8との間にタイミングべルト9を張設することでイン
ナーカップ3を回転せしめるようにしている。
In the rotary cup type processing apparatus, an annular outer cup 2 is fixed on a base 1, an inner cup 3 is arranged inside the outer cup 2, and the inner cup 3
The cylindrical shaft portion 4 is rotatably supported by the base 1 via the bearing 5, and the pulley 6 is fitted to the lower end of the cylindrical shaft portion 4, and the pulley 6 and the rotary shaft of the motor 7 are fitted to the pulley. The inner cup 3 is rotated by tensioning the timing belt 9 between the inner cup 3 and the timing belt 9.

【0012】前記インナーカップ3の中央に形成された
開口にはチャック10が配設されている。このチャック
10からは筒状軸部4内を貫通して下方に軸11が垂下
し、この軸11の下端部をシリンダユニット12によっ
て上下動する昇降体13に結合している。
A chuck 10 is arranged in an opening formed in the center of the inner cup 3. A shaft 11 hangs downward from the chuck 10 while penetrating through the tubular shaft portion 4, and a lower end portion of the shaft 11 is coupled to a vertically moving body 13 which is vertically moved by a cylinder unit 12.

【0013】而して、昇降体13が上昇するとチャック
10はインナーカップ3底面よりも上昇し、この上昇し
た位置でチャック10上面に半導体ウェーハ等の被処理
物Wがセットされ、また昇降体13が下降することでチ
ャック10も下降し、チャック10の上面とインナーカ
ップ3底面とが略面一となる。この面一となった状態で
チャック10はインナーカップ3と凹凸係合し、インナ
ーカップ3の回転がチャック10に伝達される。
When the lifting body 13 rises, the chuck 10 rises above the bottom surface of the inner cup 3, and the workpiece W such as a semiconductor wafer is set on the upper surface of the chuck 10 at this raised position. Is lowered, the chuck 10 is also lowered, and the upper surface of the chuck 10 and the bottom surface of the inner cup 3 are substantially flush with each other. In this flush state, the chuck 10 engages with the inner cup 3 in a concavo-convex manner, and the rotation of the inner cup 3 is transmitted to the chuck 10.

【0014】また、前記昇降体13にはブラケットを介
して横置きシリンダユニット14が取り付けられ、この
シリンダユニット14のロッドに固着したストッパ15
を前記軸11の大径部16に形成した穴に挿入すること
で、チャック10が所定の回転位置で停止せしめられ
る。
A horizontal cylinder unit 14 is attached to the elevating body 13 via a bracket, and a stopper 15 fixed to a rod of the cylinder unit 14 is provided.
Is inserted into the hole formed in the large-diameter portion 16 of the shaft 11, so that the chuck 10 is stopped at a predetermined rotation position.

【0015】一方、アウターカップ2には環状をなす排
気通路20が形成されている。この排気通路20は隔壁
21にて大容積のバッファ空間S1と小容積の連通空間
S2とに区画され、連通空間S2にはインナーカップ3
の排液兼排気孔22が開口し、バッファ空間S1には真
空ポンプ等につながる排気口23が開口している。ここ
で、排気口23は排気通路20の接線方向に伸び、且つ
排気口23の縁部23aは丸みをもった曲面として乱流
が生じない形状としている。
On the other hand, the outer cup 2 is provided with an annular exhaust passage 20. The exhaust passage 20 is partitioned by a partition wall 21 into a large-capacity buffer space S1 and a small-volume communication space S2, and the communication space S2 has an inner cup 3 therein.
The drainage / exhaust hole 22 is opened, and an exhaust port 23 connected to a vacuum pump is opened in the buffer space S1. Here, the exhaust port 23 extends in the tangential direction of the exhaust passage 20, and the edge portion 23a of the exhaust port 23 has a rounded curved surface so that turbulent flow does not occur.

【0016】また、アウターカップ2及びインナーカッ
プ3の上方には任意の動きが可能なアーム24を配置
し、このアーム24先端にブロック25を介してアウタ
ーカップ用蓋体26を支持し、またアウターカップ用蓋
体26にインナーカップ用蓋体27を落し蓋形式で支持
し、さらにインナーカップ用蓋体27の下面に整流板2
8を取り付け、前記ブロック25には洗浄液供給通路2
9を形成し、インナーカップ用蓋体27と整流板28と
の間には隙間30を形成している。
An arm 24 capable of arbitrary movement is arranged above the outer cup 2 and the inner cup 3, and an outer cup lid 26 is supported at the tip of the arm 24 via a block 25. The inner cup lid 27 is dropped onto the cup lid 26 to support the inner cup lid 27, and the rectifying plate 2 is provided on the lower surface of the inner cup lid 27.
8 is attached to the block 25, and the cleaning liquid supply passage 2 is attached to the block 25.
9 is formed, and a gap 30 is formed between the inner cup lid 27 and the current plate 28.

【0017】ここで、インナーカップ3内の洗浄はイン
ナーカップ用蓋体27を閉じた状態で、洗浄液供給通路
29及び隙間30を介してインナーカップ3内に洗浄液
を供給しつつインナーカップ3を回転することで行う。
Here, for cleaning the inner cup 3, the inner cup 3 is rotated while supplying the cleaning liquid into the inner cup 3 through the cleaning liquid supply passage 29 and the gap 30 with the inner cup lid 27 closed. By doing.

【0018】以上において、被処理物Wの表面に塗布液
を塗布するには、アウターカップ2及びインナーカップ
3の蓋体26,27を外した状態で、チャック10をイ
ンナーカップ3よりも上昇させ、この状態で被処理物W
をチャック10上面にセットし、吸引固着し、更にチャ
ック10を下降させてインナーカップ3と凹凸係合さ
せ、次いで、被処理物W上面中央に液体を滴下し、蓋体
26,27でアウターカップ2及びインナーカップ3の
上面開口を閉じる。
In order to apply the coating liquid to the surface of the object W to be processed, the chuck 10 is raised above the inner cup 3 with the lids 26 and 27 of the outer cup 2 and the inner cup 3 removed. , The object to be processed W in this state
Is set on the upper surface of the chuck 10 and suction-fixed, and further the chuck 10 is lowered to engage the inner cup 3 with the concave and convex portions, and then the liquid is dripped on the center of the upper surface of the object W to be processed, and the outer cups 26 and 27 are used. 2 and the top openings of the inner cup 3 are closed.

【0019】この時点で、排気通路20内は常時吸引さ
れているので、インナーカップ3内も排液兼排気孔22
を介して吸引されることになるが、排液兼排気孔22は
排気口23が開口しているバッファ空間S1に直接開口
しておらず小容積の連通空間S2に開口しているので、
排気口23の影響を受けずインナーカップ3内は均一に
減圧される。
At this time, since the inside of the exhaust passage 20 is constantly sucked, the inside of the inner cup 3 also serves as the drainage / exhaust hole 22.
However, since the drainage / exhaust hole 22 is not directly opened to the buffer space S1 where the exhaust port 23 is open but is opened to the communication space S2 having a small volume,
The inner cup 3 is uniformly depressurized without being affected by the exhaust port 23.

【0020】この後インナーカップ3を回転せしめる。
すると、インナーカップ3と被処理物Wを吸引固定した
チャック10とが一体的に回転し、遠心力によって滴下
された液体が被処理物W上面に均一に拡散せしめられ
る。また、遠心力によってインナーカップ3内の気体は
排液兼排気孔22からアウターカップ2の連通空間S2
を介してバッファ空間S1に入り、更にインナーカップ
3内は減圧される。
After that, the inner cup 3 is rotated.
Then, the inner cup 3 and the chuck 10 suction-fixing the workpiece W rotate integrally, and the liquid dropped by the centrifugal force is uniformly diffused on the upper surface of the workpiece W. Further, due to the centrifugal force, the gas in the inner cup 3 is discharged from the exhaust / exhaust hole 22 into the communication space S2 of the outer cup 2.
The inner space of the inner cup 3 is further decompressed by entering the buffer space S1 via.

【0021】そして、所定時間経過したらモータの回転
を止め、インナーカップ3を停止せしめる。このときイ
ンナーカップ3内は内部の気体が遠心力で排出されてい
るので前記したように減圧状態にある。したがって大容
積のバッファ空間S1の気体が小容積の連通空間S2を
介して徐々にインナーカップ3内に流入する。このとき
小容積の連通空間S2を介して流入するため、急激にイ
ンナーカップ内に流入することがなく脈動が防止され
る。
After a lapse of a predetermined time, the rotation of the motor is stopped and the inner cup 3 is stopped. At this time, since the gas inside is exhausted by the centrifugal force, the inner cup 3 is in a reduced pressure state as described above. Therefore, the gas in the large-capacity buffer space S1 gradually flows into the inner cup 3 via the small-volume communication space S2. At this time, since it flows in via the small-volume communication space S2, it does not suddenly flow into the inner cup and pulsation is prevented.

【0022】図4は排気通路の別実施例を示す平断面図
であり、この実施例にあっては排気通路20の対向する
2箇所に排気方向が排気通路20の接線方向で且つ逆向
きの排気口23,23を形成し、更に均一に排気が行え
るようにしている。
FIG. 4 is a plan cross-sectional view showing another embodiment of the exhaust passage. In this embodiment, the exhaust direction is opposite to the exhaust passage 20 in the tangential direction and in the opposite direction at two opposing locations of the exhaust passage 20. The exhaust ports 23, 23 are formed so that the exhaust can be performed more uniformly.

【0023】[0023]

【発明の効果】以上に説明したように本発明によれば、
回転カップ式処理装置のアウターカップに排気口を設け
た排気通路を形成し、この排気通路を隔壁にて大容積の
バッファ空間と小容積の連通空間とに区画し、連通空間
にはインナーカップの排液兼排気孔を開口させたので、
インナーカップとアウターカップの上面開口を蓋体で閉
じ、処理を開始する際にインナーカップ内の圧力分布が
不均一になることがない。更にインナーカップの回転を
停止した場合でも、外部の気体はバッファ空間から一旦
小容積の連通空間を経てインナーカップ内に戻るため脈
動の発生が抑制される。したがって、形成される塗膜と
して波打ち等のない均一な厚みのものが得られる。
As described above, according to the present invention,
An exhaust passage having an exhaust port is formed in the outer cup of the rotary cup type processing apparatus, and the exhaust passage is partitioned by a partition into a large-capacity buffer space and a small-volume communication space. Since the drainage and exhaust hole is opened,
When the upper openings of the inner cup and the outer cup are closed by the lids, the pressure distribution in the inner cup does not become uneven when starting the process. Further, even when the rotation of the inner cup is stopped, the external gas temporarily returns from the buffer space to the inner cup through the small-volume communication space, so that pulsation is suppressed. Therefore, a coating film having a uniform thickness without waviness can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る回転カップ式処理装置の縦断面図FIG. 1 is a vertical sectional view of a rotary cup type processing apparatus according to the present invention.

【図2】同回転カップ式処理装置の要部拡大断面図FIG. 2 is an enlarged sectional view of a main part of the rotary cup type processing device.

【図3】排気通路を示す平断面図FIG. 3 is a plan sectional view showing an exhaust passage.

【図4】排気通路の別実施例を示す平断面図FIG. 4 is a plan sectional view showing another embodiment of an exhaust passage.

【符号の説明】[Explanation of symbols]

1…ベース、2…アウターカップ、3…インナーカッ
プ、10…チャック、20…排気通路、21…隔壁、2
2…排液兼排気孔、23…排気口、26…アウターカッ
プ用蓋体、27…インナーカップ用蓋体、S1…バッフ
ァ空間、S2…連通空間、W…被処理物。
1 ... Base, 2 ... Outer cup, 3 ... Inner cup, 10 ... Chuck, 20 ... Exhaust passage, 21 ... Partition wall, 2
2 ... Drainage / exhaust hole, 23 ... Exhaust port, 26 ... Outer cup lid, 27 ... Inner cup lid, S1 ... Buffer space, S2 ... Communication space, W ... Object to be treated.

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/306 21/68 N (72)発明者 小針 英也 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 (72)発明者 上田 康爾 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 (72)発明者 宮本 英典 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 (72)発明者 高月 龍三 岡山県井原市木之子町6186番地 タツモ株 式会社内Continuation of the front page (51) Int.Cl. 6 Identification number Reference number in the agency FI Technical indication location H01L 21/306 21/68 N (72) Inventor Hideya Kodaira 150 Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa Tokyo Koka (72) Inventor Koji Ueda 150 Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa Tokyo Ohka Kogyo Co., Ltd. (72) Hidenori Miyamoto 150, Nakamaruko, Nakahara-ku, Kawasaki, Kanagawa Tokyokyoka Kogyo Co., Ltd. (72) Inventor Ryuzo Takatsuki 6186 Kinoko Town, Ihara City, Okayama Prefecture Tatsumo Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 モータにて回転せしめられるインナーカ
ップの外側にベースに固定されるアウターカップを配置
し、このアウターカップにインナーカップの外周に沿っ
た環状の排気通路を形成した回転カップ式処理装置にお
いて、前記排気通路は隔壁によって排気装置につながる
大容積のバッファ空間と、このバッファ空間と前記イン
ナーカップ内空間とをつなぐ小容積の連通空間とに区画
されていることを特徴とする回転カップ式処理装置。
1. A rotary cup type processing apparatus in which an outer cup fixed to a base is arranged outside an inner cup rotated by a motor, and an annular exhaust passage is formed in the outer cup along the outer circumference of the inner cup. In the rotary cup type, the exhaust passage is divided into a large-capacity buffer space connected to the exhaust device by a partition wall and a small-volume communication space that connects the buffer space and the inner cup inner space. Processing equipment.
【請求項2】 請求項1に記載の回転カップ式処理装置
において、前記排気通路には対向する2箇所に排気口が
形成されていることを特徴とする回転カップ式処理装
置。
2. The rotary cup type processing apparatus according to claim 1, wherein exhaust ports are formed at two opposing locations in the exhaust passage.
JP6944494A 1994-04-07 1994-04-07 Rotating cup type processing equipment Expired - Fee Related JP2756639B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6944494A JP2756639B2 (en) 1994-04-07 1994-04-07 Rotating cup type processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6944494A JP2756639B2 (en) 1994-04-07 1994-04-07 Rotating cup type processing equipment

Publications (2)

Publication Number Publication Date
JPH07275780A true JPH07275780A (en) 1995-10-24
JP2756639B2 JP2756639B2 (en) 1998-05-25

Family

ID=13402823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6944494A Expired - Fee Related JP2756639B2 (en) 1994-04-07 1994-04-07 Rotating cup type processing equipment

Country Status (1)

Country Link
JP (1) JP2756639B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6251487B1 (en) 1998-09-04 2001-06-26 Nec Corporation Method for coating a resist film
WO2003074756A1 (en) * 2002-03-07 2003-09-12 Tdk Corporation Disk-like member holding device
JP2009099910A (en) * 2007-10-19 2009-05-07 Mtc:Kk Spin coater
CN106195021A (en) * 2016-08-30 2016-12-07 无锡溥汇机械科技有限公司 A kind of flush coater rotating disk bearing water-tight device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6251487B1 (en) 1998-09-04 2001-06-26 Nec Corporation Method for coating a resist film
WO2003074756A1 (en) * 2002-03-07 2003-09-12 Tdk Corporation Disk-like member holding device
JP2009099910A (en) * 2007-10-19 2009-05-07 Mtc:Kk Spin coater
CN106195021A (en) * 2016-08-30 2016-12-07 无锡溥汇机械科技有限公司 A kind of flush coater rotating disk bearing water-tight device

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