JPH0631241A - Spin coating method - Google Patents

Spin coating method

Info

Publication number
JPH0631241A
JPH0631241A JP4188298A JP18829892A JPH0631241A JP H0631241 A JPH0631241 A JP H0631241A JP 4188298 A JP4188298 A JP 4188298A JP 18829892 A JP18829892 A JP 18829892A JP H0631241 A JPH0631241 A JP H0631241A
Authority
JP
Japan
Prior art keywords
substrate
coating
coating liquid
container
rotated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4188298A
Other languages
Japanese (ja)
Inventor
Kazuhide Masuda
一英 増田
Haruki Sonoda
治毅 園田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPC Electronics Corp
Original Assignee
SPC Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SPC Electronics Corp filed Critical SPC Electronics Corp
Priority to JP4188298A priority Critical patent/JPH0631241A/en
Publication of JPH0631241A publication Critical patent/JPH0631241A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To provide a spin coating method by which an inside of a recessed part on the surface of a substrate is coated while the recessed part is filled with the coating liquid and defoaming of the liquid is carried out easily. CONSTITUTION:A substrate 2 is rotated by a motor through a substrate supporting part 6 in a container 5 to apply a coating liquid 3 to the surface of the substrate 2. Then. the container is evacuated to become vacuum and the substrate 2 and the coating liquid 3 are kept in the vacuum atmosphere.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば焼結金属ウエハ
等のように表面に凹部がある基板の表面にレジスト等の
塗布液を塗布するのに好適な回転式塗布方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary coating method suitable for coating a coating solution such as a resist on the surface of a substrate having a recess on the surface such as a sintered metal wafer.

【0002】[0002]

【従来の技術】従来、遠心力を利用して基板の表面に塗
布液を塗布する場合には、水平な基板の表面の中心に塗
布液を置き、該基板を回転させてその表面に塗布液を遠
心力を利用して塗布していた。この場合、塗布液の塗布
厚さ調整は、回転速度と回転時間を調整することにより
行っていた。
2. Description of the Related Art Conventionally, when a coating liquid is applied to the surface of a substrate by utilizing centrifugal force, the coating liquid is placed at the center of the surface of a horizontal substrate and the substrate is rotated to apply the coating liquid to the surface. Was applied using centrifugal force. In this case, the coating thickness of the coating liquid was adjusted by adjusting the rotation speed and the rotation time.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな回転式塗布方法では、図6のように表面に凹部1が
存在する焼結金属ウエハ等のような基板2の場合には、
凹部1内に空気が閉じ込められてしまい、凹部1内まで
塗布液3を一様に塗布することができない問題点があっ
た。
However, in such a spin coating method, in the case of a substrate 2 such as a sintered metal wafer having concave portions 1 on its surface as shown in FIG.
There is a problem that the coating liquid 3 cannot be uniformly applied to the inside of the recess 1 because the air is trapped in the recess 1.

【0004】また、塗布前に塗布液3の中に気泡4が混
入している場合も、この気泡4が最後まで残ってしま
い、ここが欠陥部となってしまう問題点があった。
Further, even when the bubbles 4 are mixed in the coating liquid 3 before the coating, the bubbles 4 remain until the end and there is a problem that this becomes a defective portion.

【0005】本発明の目的は、基板の表面の凹部内にも
塗布液を充填して塗布することができ、且つ塗布液中の
脱泡も容易に行うことができる回転式塗布方法を提供す
ることにある。
An object of the present invention is to provide a rotary coating method capable of filling and coating a coating liquid even in a concave portion of the surface of a substrate and easily defoaming the coating liquid. Especially.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成する本
発明の手段を説明すると、次の通りである。
The means of the present invention for achieving the above object will be described below.

【0007】請求項1に記載の発明は、水平な基板の表
面の中心に塗布液を置き、前記基板を回転させて該基板
の表面に前記塗布液を遠心力を利用して塗布する回転式
塗布方法において、前記基板の表面に前記塗布液を塗布
しつつ或いは塗布した段階で、該基板とその塗布液を真
空引きした雰囲気中に置くことを特徴とする。
According to a first aspect of the present invention, the coating liquid is placed at the center of the surface of a horizontal substrate, the substrate is rotated, and the coating liquid is applied to the surface of the substrate by using centrifugal force. In the coating method, the substrate and the coating liquid are placed in an atmosphere in which the substrate and the coating liquid are evacuated while or while the coating liquid is being coated on the surface of the substrate.

【0008】請求項2に記載の発明は、基板支持部に基
板を水平に吸着し、該基板の表面の中心に塗布液を置
き、前記基板支持部を回転することにより前記基板を回
転させて該基板の表面に前記塗布液を遠心力を利用して
塗布する回転式塗布方法において、容器の中で前記基板
を大気圧中で回転して前記基板の表面に前記塗布液を塗
布し、次に前記基板の回転を停止した状態で前記容器内
を真空引きして所定時間置き、しかる後前記容器内で前
記基板を大気圧中で回転して前記塗布液の塗布厚さ調整
を行うことを特徴とする。
According to a second aspect of the present invention, the substrate is adsorbed horizontally on the substrate supporting portion, the coating solution is placed at the center of the surface of the substrate, and the substrate supporting portion is rotated to rotate the substrate. In a rotary coating method of applying the coating solution to the surface of the substrate using centrifugal force, the substrate is rotated in a container at atmospheric pressure to apply the coating solution onto the surface of the substrate, While the rotation of the substrate is stopped, the inside of the container is evacuated and left for a predetermined time, and then the substrate is rotated in the container at atmospheric pressure to adjust the coating thickness of the coating liquid. Characterize.

【0009】[0009]

【作用】請求項1のように、基板の表面に塗布液を塗布
しつつ或いは塗布した段階で、該基板とその塗布液を真
空引きした雰囲気中に置くと、基板の表面の凹部内の空
気や塗布液内の気泡の脱泡を容易に行える。
According to the present invention, when the substrate and the coating liquid are placed in a vacuumed atmosphere while or at the time of applying the coating liquid to the surface of the substrate, the air in the concave portion of the surface of the substrate And the bubbles in the coating liquid can be easily removed.

【0010】請求項2のように、容器の中で基板を大気
圧中で回転して該基板の表面に塗布液を塗布し、次に基
板の回転を停止した状態で容器内を真空引きすると、基
板を基板支持部に吸着して作業を行う場合でも、基板の
回転時には容器内を真空引きしてないので、基板が基板
支持部から真空引きで落下させられるのを回避して、脱
泡作業を行うことができる。
When the substrate is rotated in the container at atmospheric pressure to apply the coating liquid on the surface of the substrate, and then the inside of the container is evacuated while the rotation of the substrate is stopped. Even when performing work by adsorbing the substrate to the substrate support part, since the inside of the container is not evacuated when rotating the substrate, it is possible to avoid dropping the substrate from the substrate support part by vacuuming and defoaming. You can do the work.

【0011】脱泡後には、大気圧中で基板を再び回転し
て塗布液の塗布厚さ調整を行うので、基板が基板支持部
から脱落するのを防止しつつ塗布厚さ調整を行うことが
できる。また、脱泡後に塗布厚さ調整を行うと、脱泡で
厚みが薄くなったところの塗布液の塗布厚さの修正も容
易に行うことができる。
After degassing, the substrate is rotated again at atmospheric pressure to adjust the coating thickness of the coating liquid, so that the coating thickness can be adjusted while preventing the substrate from falling off the substrate supporting portion. it can. Further, if the coating thickness is adjusted after defoaming, it is possible to easily correct the coating thickness of the coating liquid when the thickness becomes thin due to defoaming.

【0012】[0012]

【実施例】図1は、本発明の第1実施例で用いる回転式
塗布装置を示したものである。本実施例では、容器5内
に基板支持部6を配置し、該基板支持部6を容器5の外
のモータ7で回転軸8を介して回転するようになってい
る。回転軸8は、中空になっていて、基板支持部6での
基板2の吸着をこの回転軸8の穴を利用して行えるよう
になっている。基板支持部6の上面には、基板2が水平
向きで吸着支持されるようになっている。容器5は、そ
の上部が蓋9で開閉されるようになっている。容器5の
底部には、真空引き排気口10が設けられている。基板
2の上面には、容器5の外部から塗布液供給ノズル11
で塗布液3が供給されるようになっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a rotary coating apparatus used in the first embodiment of the present invention. In this embodiment, the substrate supporting portion 6 is arranged in the container 5, and the substrate supporting portion 6 is rotated by the motor 7 outside the container 5 via the rotating shaft 8. The rotary shaft 8 is hollow so that the substrate 2 can be adsorbed on the substrate support 6 by using the hole of the rotary shaft 8. The substrate 2 is adapted to be horizontally supported by suction on the upper surface of the substrate support portion 6. The container 5 is configured such that the upper portion thereof is opened and closed by the lid 9. A vacuum evacuation port 10 is provided at the bottom of the container 5. On the upper surface of the substrate 2, the coating liquid supply nozzle 11 is supplied from the outside of the container 5.
The coating liquid 3 is supplied by.

【0013】次に、このような回転式塗布装置を用いた
本実施例の回転式塗布方法を図1及び図2を参照して説
明する。
Next, the rotary coating method of this embodiment using such a rotary coating apparatus will be described with reference to FIGS. 1 and 2.

【0014】容器5内で基板支持部6に基板2を水平向
きで吸着支持させ、該基板2の表面中央に塗布液3を塗
布液供給ノズル11で供給する。かかる状態で、図2
(ア)に示すように基板支持部6を介してモータ7で基
板2を大気圧中で回転し、遠心力で塗布液3を基板2の
表面に塗布する。
The substrate 2 is horizontally adsorbed and supported by the substrate supporting portion 6 in the container 5, and the coating liquid 3 is supplied to the center of the surface of the substrate 2 by the coating liquid supply nozzle 11. In such a state, FIG.
As shown in (A), the substrate 2 is rotated under atmospheric pressure by the motor 7 via the substrate supporting portion 6, and the coating liquid 3 is applied to the surface of the substrate 2 by centrifugal force.

【0015】次に、回転を中止し、容器5内を図2
(イ)に示すように所定時間真空引きする。このとき容
器5内を5Torr前後に10秒程保持する。これにより、
基板2の表面の凹部1内の空気や塗布液3中の気泡4の
脱泡を容易に行える。
Next, the rotation is stopped and the inside of the container 5 is shown in FIG.
As shown in (a), a vacuum is drawn for a predetermined time. At this time, the inside of the container 5 is held at about 5 Torr for about 10 seconds. This allows
The air in the concave portion 1 on the surface of the substrate 2 and the bubbles 4 in the coating liquid 3 can be easily removed.

【0016】次に、容器5内に図2(ウ)に示すように
大気を導入し、容器5内を大気圧状態に戻し、図2
(エ)に示すように基板支持部6を介してモータ7で基
板2を大気圧中で高速回転し、回転数と回転時間の調整
で塗布液3の塗布膜厚の調整をする。
Next, as shown in FIG. 2C, the atmosphere is introduced into the container 5 to return the inside of the container 5 to the atmospheric pressure state, and
As shown in (d), the substrate 2 is rotated at a high speed by the motor 7 through the substrate supporting portion 6 under the atmospheric pressure, and the coating film thickness of the coating liquid 3 is adjusted by adjusting the rotation speed and the rotation time.

【0017】なお、図2(ウ)においては、大気導入を
行う弁の動作タイミングを示している。
2 (c) shows the operation timing of the valve for introducing the atmosphere.

【0018】このような塗布方法をとると、容器5内の
真空引きにより、図3に示すように基板2の表面の凹部
1内の空気や塗布液3内の気泡4の脱泡が容易に行え
る。
With this coating method, the air in the recess 1 on the surface of the substrate 2 and the bubbles 4 in the coating liquid 3 can be easily removed by vacuuming the container 5. You can do it.

【0019】脱泡後には、大気圧中で基板2を再び回転
するので、基板2が基板支持部6から脱落するのを防止
しつつ塗布厚さ調整を行うことができる。
After defoaming, the substrate 2 is rotated again under atmospheric pressure, so that the coating thickness can be adjusted while preventing the substrate 2 from falling off the substrate supporting portion 6.

【0020】また、脱泡後に塗布液3の塗布厚さ調整を
行うので、脱泡で厚みが薄くなったところの塗布液3の
塗布厚さの修正も容易に行うことができる。
Further, since the coating thickness of the coating liquid 3 is adjusted after defoaming, it is possible to easily correct the coating thickness of the coating liquid 3 when the thickness becomes thin due to defoaming.

【0021】図4は、本発明の第2実施例で用いる回転
式塗布装置を示したものである。本実施例では、回転式
塗布装置が基板支持部6に基板2をチャック12で機械
的に支持する構造の例を示したものである。
FIG. 4 shows a rotary coating apparatus used in the second embodiment of the present invention. In the present embodiment, an example of a structure in which the rotary coating device mechanically supports the substrate 2 on the substrate support 6 by the chuck 12 is shown.

【0022】次に、このような回転式塗布装置を用いた
本実施例の回転式塗布方法を図4及び図5を参照して説
明する。
Next, the rotary coating method of this embodiment using such a rotary coating apparatus will be described with reference to FIGS. 4 and 5.

【0023】容器5内で基板支持部6に基板2を水平向
きにチャック12で支持させ、該基板2の表面中央に塗
布液3を塗布液供給ノズル11で供給する。かかる状態
で、図5(a)に示すように容器5内を所定時間真空引
きし、且つ図5(b)に示すように基板支持部6を介し
てモータ7で基板2を低速回転し、遠心力で塗布液3を
基板2の表面に塗布する。
The substrate 2 is horizontally supported by the chuck 12 in the container 5 in the container 5, and the coating liquid 3 is supplied to the center of the surface of the substrate 2 by the coating liquid supply nozzle 11. In this state, the inside of the container 5 is evacuated for a predetermined time as shown in FIG. 5A, and the substrate 2 is rotated at a low speed by the motor 7 via the substrate support 6 as shown in FIG. 5B. The coating liquid 3 is applied to the surface of the substrate 2 by centrifugal force.

【0024】次に、容器5内を図5(c)に示すように
大気を導入し、容器5内を大気圧状態に戻し、図5
(d)に示すように基板支持部6を介してモータ7で基
板2を大気圧中で高速回転し、回転数と回転時間の調整
で塗布液3の塗布膜厚の調整をする。
Next, as shown in FIG. 5 (c), the atmosphere is introduced into the container 5 to return the inside of the container 5 to the atmospheric pressure state.
As shown in (d), the substrate 7 is rotated at a high speed by the motor 7 via the substrate supporting portion 6 under the atmospheric pressure, and the coating film thickness of the coating liquid 3 is adjusted by adjusting the rotation speed and the rotation time.

【0025】なお、図5(c)においては、大気導入を
行う弁の動作タイミングを示している。
5 (c) shows the operation timing of the valve for introducing the atmosphere.

【0026】このような塗布方法でも、容器5内の真空
引きにより、図3に示すように基板2の表面の凹部1内
の空気や塗布液3内の気泡4の脱泡を容易に行える。
Even with such a coating method, the air in the concave portion 1 on the surface of the substrate 2 and the bubbles 4 in the coating liquid 3 can be easily degassed by evacuation of the container 5.

【0027】脱泡後には、大気圧中で基板2を高速回転
するので、塗布液3の塗布厚さ調整を容易に行うことが
できる。
After degassing, the substrate 2 is rotated at high speed under atmospheric pressure, so that the coating thickness of the coating liquid 3 can be easily adjusted.

【0028】また、脱泡後に塗布液3の塗布厚さ調整を
行うので、脱泡で厚みが薄くなったところの塗布液3の
塗布厚さの修正も容易に行うことができる。
Further, since the coating thickness of the coating liquid 3 is adjusted after defoaming, it is possible to easily correct the coating thickness of the coating liquid 3 when the thickness becomes thin due to defoaming.

【0029】[0029]

【発明の効果】以上説明したように本発明に係る回転式
塗布方法によれば、下記のような効果を得ることができ
る。
As described above, according to the rotary coating method of the present invention, the following effects can be obtained.

【0030】請求項1に記載の回転式塗布方法では、基
板の表面に塗布液を塗布しつつ或いは塗布した段階で、
該基板とその塗布液を真空引きした雰囲気中に置くの
で、基板の表面の凹部内の空気や塗布液内の気泡の脱泡
を容易に行うことができる。
In the rotary coating method according to the first aspect, the coating liquid is applied to the surface of the substrate or at the stage of applying the coating liquid.
Since the substrate and its coating liquid are placed in a vacuumed atmosphere, it is possible to easily deaerate the air in the recesses on the surface of the substrate and the bubbles in the coating liquid.

【0031】請求項2に記載の回転式塗布方法では、容
器の中で基板を大気圧中で回転して該基板の表面に塗布
液を塗布し、次に基板の回転を停止した状態で容器内を
真空引きするので、基板を基板支持部に吸着して作業を
行う場合でも、基板の回転時には容器内を真空引きして
ないので、基板が基板支持部から真空引きで落下させら
れるのを回避して、脱泡作業を行うことができる。
In the rotary coating method according to the second aspect of the present invention, the substrate is rotated in the container at atmospheric pressure to apply the coating liquid on the surface of the substrate, and then the container is stopped while the rotation of the substrate is stopped. Since the inside is evacuated, even when performing work by adsorbing the substrate to the substrate support part, since the inside of the container is not evacuated when the substrate is rotated, the substrate can be dropped from the substrate support part by vacuuming. By avoiding this, defoaming work can be performed.

【0032】脱泡後には、大気圧中で基板を再び回転す
るので、基板の基板支持部からの脱落を防止しつつ塗布
厚さ調整を行うことができる。また、脱泡後に塗布厚さ
調整を行うので、脱泡で厚みが薄くなったところの塗布
液の塗布厚さの修正も容易に行うことができる。
After defoaming, the substrate is rotated again at atmospheric pressure, so that the coating thickness can be adjusted while preventing the substrate from falling off the substrate supporting portion. Further, since the coating thickness is adjusted after defoaming, it is possible to easily correct the coating thickness of the coating liquid when the thickness becomes thin due to defoaming.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る回転式塗布方法を実施する回転式
塗布装置の第1実施例を示す縦断面図である。
FIG. 1 is a vertical sectional view showing a first embodiment of a rotary coating apparatus for carrying out a rotary coating method according to the present invention.

【図2】第1実施例の回転式塗布方法の操作順序を示す
説明図である。
FIG. 2 is an explanatory diagram showing an operation sequence of the rotary coating method according to the first embodiment.

【図3】第1実施例の回転式塗布方法で基板に塗布液を
塗布した状態を示す要部拡大断面図である。
FIG. 3 is an enlarged sectional view of an essential part showing a state in which a substrate is coated with a coating liquid by the rotary coating method according to the first embodiment.

【図4】本発明に係る回転式塗布方法を実施する回転式
塗布装置の第2実施例を示す縦断面図である。
FIG. 4 is a vertical cross-sectional view showing a second embodiment of the rotary coating apparatus for carrying out the rotary coating method according to the present invention.

【図5】第2実施例の回転式塗布方法の操作順序を示す
説明図である。
FIG. 5 is an explanatory diagram showing an operation sequence of the rotary coating method according to the second embodiment.

【図6】従来の回転式塗布方法で基板に塗布液を塗布し
た状態を示す要部拡大断面図である。
FIG. 6 is an enlarged sectional view of an essential part showing a state in which a substrate is coated with a coating liquid by a conventional rotary coating method.

【符号の説明】[Explanation of symbols]

1 凹部 2 基板 3 塗布液 4 気泡 5 容器 6 基板支持部 7 モータ 8 回転軸 9 蓋 10 真空引き排気口 11 塗布液供給ノズル 12 チャック DESCRIPTION OF SYMBOLS 1 recessed part 2 substrate 3 coating liquid 4 air bubble 5 container 6 substrate support 7 motor 8 rotating shaft 9 lid 10 vacuum evacuation port 11 coating liquid supply nozzle 12 chuck

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 水平な基板の表面の中心に塗布液を置
き、前記基板を回転させて該基板の表面に前記塗布液を
遠心力を利用して塗布する回転式塗布方法において、 前記基板の表面に前記塗布液を塗布しつつ或いは塗布し
た段階で、該基板とその塗布液を真空引きした雰囲気中
に置くことを特徴とする回転式塗布方法。
1. A rotary coating method in which a coating solution is placed on the center of a horizontal substrate surface, and the substrate is rotated to apply the coating solution to the surface of the substrate by using centrifugal force. A rotary coating method characterized in that the substrate and the coating liquid are placed in an atmosphere in which the substrate and the coating liquid are evacuated while the coating liquid is being coated on the surface or at the stage of coating.
【請求項2】 基板支持部に基板を水平に吸着し、該基
板の表面の中心に塗布液を置き、前記基板支持部を回転
することにより前記基板を回転させて該基板の表面に前
記塗布液を遠心力を利用して塗布する回転式塗布方法に
おいて、 容器の中で前記基板を大気圧中で回転して前記基板の表
面に前記塗布液を塗布し、次に前記基板の回転を停止し
た状態で前記容器内を真空引きして所定時間置き、しか
る後前記容器内で前記基板を大気圧中で回転して前記塗
布液の塗布厚さ調整を行うことを特徴とする回転式塗布
方法。
2. The substrate is adsorbed horizontally on the substrate support, the coating liquid is placed on the center of the surface of the substrate, and the substrate is rotated by rotating the substrate support to apply the coating on the surface of the substrate. In a rotary coating method of coating a liquid by using centrifugal force, the substrate is rotated in a container at atmospheric pressure to coat the surface of the substrate with the coating liquid, and then the rotation of the substrate is stopped. In this state, the container is evacuated and left for a predetermined time, and then the substrate is rotated in the container at atmospheric pressure to adjust the coating thickness of the coating liquid, thereby performing a rotary coating method. .
JP4188298A 1992-07-15 1992-07-15 Spin coating method Withdrawn JPH0631241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4188298A JPH0631241A (en) 1992-07-15 1992-07-15 Spin coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4188298A JPH0631241A (en) 1992-07-15 1992-07-15 Spin coating method

Publications (1)

Publication Number Publication Date
JPH0631241A true JPH0631241A (en) 1994-02-08

Family

ID=16221174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4188298A Withdrawn JPH0631241A (en) 1992-07-15 1992-07-15 Spin coating method

Country Status (1)

Country Link
JP (1) JPH0631241A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6208867B1 (en) 1997-04-25 2001-03-27 Nec Corporation Portable terminal system, option apparatus for portable terminal unit, and method for connecting portable terminal unit and option apparatus for portable terminal unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6208867B1 (en) 1997-04-25 2001-03-27 Nec Corporation Portable terminal system, option apparatus for portable terminal unit, and method for connecting portable terminal unit and option apparatus for portable terminal unit

Similar Documents

Publication Publication Date Title
EP0363235B1 (en) Process and apparatus for the uniform application of a resist layer to a substrate
JPH0631241A (en) Spin coating method
JPH02122520A (en) Application of resist
JPH04332116A (en) Spin coater
JP2764069B2 (en) Application method
JP2802636B2 (en) Coating device and coating method
JPH07275780A (en) Rotary cup type treating device
JPH08299878A (en) Rotary coating apparatus and rotary coating method
JP2649156B2 (en) Resist coating apparatus and method
JPH0361510B2 (en)
JPS60152029A (en) Coating device
JPH07185450A (en) Application of coating liquid to substrate
JP2736769B2 (en) Coating device
JPH0817700A (en) Application of resist and resist applying device
JPH02160074A (en) Coater
JPH0219957Y2 (en)
JPH06232038A (en) Rotary coating device
JPS63248471A (en) Coating device
JP3548363B2 (en) Processing equipment
JP3230891B2 (en) Coating device
JP2003031476A (en) Resist film, its formation method and apparatus thereof
JPH03272130A (en) Spin coating process
JPH0152065B2 (en)
JPH0751611A (en) Rotary coating method and rotary applicaor for base plate
JPH01191147A (en) Photoresist applying device

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19991005