JPH05283757A - Photoelectric conversion element - Google Patents

Photoelectric conversion element

Info

Publication number
JPH05283757A
JPH05283757A JP4102423A JP10242392A JPH05283757A JP H05283757 A JPH05283757 A JP H05283757A JP 4102423 A JP4102423 A JP 4102423A JP 10242392 A JP10242392 A JP 10242392A JP H05283757 A JPH05283757 A JP H05283757A
Authority
JP
Japan
Prior art keywords
photoelectric conversion
conversion element
cover
conversion unit
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4102423A
Other languages
Japanese (ja)
Inventor
Hisashi Hirama
恒 平間
Yoshito Miyano
義人 宮野
Seiji Koike
誠二 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Priority to JP4102423A priority Critical patent/JPH05283757A/en
Publication of JPH05283757A publication Critical patent/JPH05283757A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a photoelectric conversion element which can be stably assembled by use of a vacuum suction type die bonding device and sucked by a vacuum suction collet as pasted on an adhesive tape as it is kept as a wafer. CONSTITUTION:A cover 10 is joined to a photoelectric conversion element covering a conversion section 4 so as to enable the photoelectric conversion element to be sucked by a vacuum suction collet without causing damage to the conversion section. Furthermore, a cover 10 is joined to the rear side of a substrate 1 so as to enable the photoelectric conversion element to be pushed up without damaging a support 3. In this case, a space produced between the cover 10 and the conversion section 4 is lessened enough in pressure, whereby a photoelectric conversion element can be lessened in thermal energy loss.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、中央部に空洞部を設け
た基板上に薄膜状の支持体を設け、該支持体表面上に薄
膜からなる熱エネルギーを電気エネルギーに変換する変
換部を設け、該変換部上に絶縁膜を介して吸収体を設け
た光電変換素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention provides a thin film support on a substrate having a hollow portion in the center thereof, and a conversion unit for converting thermal energy of a thin film into electric energy on the surface of the support. The present invention relates to a photoelectric conversion element in which an absorber is provided on the conversion unit via an insulating film.

【0002】[0002]

【従来の技術】以下、赤外線エネルギーを電気エネルギ
ーに変換する光電変換素子を例に説明する。図4は従来
のこの種の光電変換素子の一例を示す。図において、1
は基板、2は基板1の中央部に設けた空洞部、3は基板
1上に設けた薄膜状の支持体、4は支持体3表面上に設
けた熱電対や焦電効果を持つ薄膜からなる熱エネルギー
を電気エネルギーに変換する変換部、5は変換部4上に
設けた絶縁膜、6は絶縁膜5上に設けた入射した光を熱
エネルギーに変換する吸収体、7は吸収体6を覆う保護
膜である。
2. Description of the Related Art A photoelectric conversion element for converting infrared energy into electric energy will be described below as an example. FIG. 4 shows an example of a conventional photoelectric conversion element of this type. In the figure, 1
Is a substrate, 2 is a cavity provided in the central portion of the substrate 1, 3 is a thin film-like support provided on the substrate 1, and 4 is a thermocouple or a thin film having a pyroelectric effect provided on the surface of the support 3. Is a conversion part for converting heat energy into electric energy, 5 is an insulating film provided on the conversion part 4, 6 is an absorber for converting incident light into heat energy provided on the insulating film 5, and 7 is an absorber 6 Is a protective film that covers.

【0003】この種の光電変換素子は、変換効率を良く
するために、変換部4を基板1の中央部に設けた空洞部
2上の薄膜状の支持体3表面上に設け、変換部4の熱容
量を小さくする構造を採っている。赤外線は保護膜7を
透過して吸収体6に入射し、熱エネルギーに変換され、
この熱エネルギーが変換部4で電気エネルギーに変換さ
れ、電圧が出力電極から出力される構成となっている。
製造は、通常の半導体微細加工技術により、ウエハに配
列して形成し、ダイシングして個々の素子に分離する方
法を採る。
In this type of photoelectric conversion element, in order to improve conversion efficiency, the conversion portion 4 is provided on the surface of the thin film-shaped support 3 on the cavity 2 provided in the central portion of the substrate 1, and the conversion portion 4 is provided. Adopts a structure that reduces the heat capacity of. Infrared rays pass through the protective film 7 and enter the absorber 6, are converted into heat energy,
This thermal energy is converted into electric energy by the conversion unit 4, and a voltage is output from the output electrode.
For manufacturing, a method of arranging and forming on a wafer by a normal semiconductor microfabrication technique and dicing into individual elements is adopted.

【0004】上記のような構造の光電変換素子出は、組
立作業能率の向上のために、ダイボンドに真空吸着方式
のダイボンディング装置を使用すると、変換部の機械的
強度が非常に弱いために、真空吸着用のコレットが接触
する際、薄膜構造の変換部が破損するという問題があっ
た。上記の問題を解決するために、図5に示すように、
基板1を長方形状とし、機械的強度の弱い変換部4を基
板1の中心より偏った位置に設け、真空吸着に必要な機
械的強度を持つ部分を広くする構造が提供されている。
しかし、上記の方法では、光電変換素子の寸法が大きく
なるため、1枚のウエハから取れる個数が減少し、コス
ト上昇をまねく。また、組み立て時の吸着部分が素子の
中心より偏った位置にあるため、パッケージにダイボン
ドする際素子に圧力が不均一に加わり、接着剤の量が多
い場合には、パッケージの接着面に対し素子が傾いて接
着されることがあり、この場合変換部の薄膜に歪みが発
生し、出力変動の原因となるという問題があった。図5
において、図4と同一の符号は同一又は相当する部分を
示し、8は出力電極である。
In the photoelectric conversion device having the above-mentioned structure, when a vacuum suction type die bonding device is used for die bonding in order to improve the assembly work efficiency, the mechanical strength of the conversion portion is very weak. There is a problem that the conversion part of the thin film structure is damaged when the collet for vacuum adsorption comes into contact with it. In order to solve the above problem, as shown in FIG.
There is provided a structure in which the substrate 1 has a rectangular shape, the conversion portion 4 having weak mechanical strength is provided at a position deviated from the center of the substrate 1, and a portion having mechanical strength required for vacuum suction is widened.
However, in the above method, the size of the photoelectric conversion element is increased, so that the number of wafers that can be taken from one wafer is reduced, and the cost is increased. In addition, since the adsorption part at the time of assembly is offset from the center of the element, the pressure is unevenly applied to the element during die-bonding to the package. May be inclined and adhered, and in this case, there is a problem that the thin film of the conversion portion is distorted, which causes output fluctuation. Figure 5
4, the same reference numerals as those in FIG. 4 indicate the same or corresponding portions, and 8 is an output electrode.

【0005】[0005]

【発明が解決しようとする課題】本発明は、素子の平面
的構造と寸法を変えることなく、ダイボンドに真空吸着
式のダイボンディング装置を使用できる構造とすること
を目的とする。さらに、作業能率を上げるために、ウエ
ハ状態で粘着テープ上に貼り付け、テープ下部からピン
で突き上げて個々の素子をテープから分離し、真空吸着
コレットで吸着する方法が採れる構造とするとともに、
熱エネルギーの損失を減らし、変換効率を上げることを
目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a structure in which a vacuum suction type die bonding apparatus can be used for die bonding without changing the planar structure and dimensions of the element. In addition, in order to improve work efficiency, it is attached on an adhesive tape in a wafer state, and individual elements are separated from the tape by pushing up from the bottom of the tape with pins, and with a structure that can be adsorbed with a vacuum adsorption collet,
The purpose is to reduce heat energy loss and increase conversion efficiency.

【0006】[0006]

【課題を解決するための手段】本発明は、ダイボンドに
真空吸着式のダイボンディング装置を使用できるよう
に、変換部を機械的衝撃から保護するため、支持体表面
上に変換部を覆う光透過性材料からなる中央部に変換部
と接触しないように凹部を設けたカバーを接合し、さら
に、ダイボンドの際、ウエハ状態で粘着テープ上に貼り
付け、テープ下部からピンで突き上げて個々の素子をテ
ープから分離し、真空吸着コレットで吸着できる用に、
下部から突き上げるピンから薄膜状の支持体を保護する
とともに、変換部からの熱エネルギーの損失を減らすた
め、支持体表面上に変換部を覆う光透過性材料からなる
中央部に上記変換部と接触しないように凹部を設けたカ
バーを上記凹部内の圧力を充分低くして気密構造に接合
し、基板の裏面上に該基板中央部の空洞部を覆うカバー
を該空洞部内の圧力を十分低くして気密構造に接合し
た。
According to the present invention, in order to protect a conversion unit from mechanical shock so that a vacuum suction type die bonding apparatus can be used for die bonding, a light transmission layer covering the conversion unit on a surface of a support is transmitted. A cover with a recess is joined to the central part made of a conductive material so that it does not come into contact with the conversion part.Furthermore, at the time of die bonding, it is affixed to the adhesive tape in the wafer state and pushed up with a pin from the bottom of the tape to separate individual Separated from the tape and sucked with a vacuum suction collet,
In order to protect the thin film support from the pins pushed up from the bottom and to reduce the loss of heat energy from the conversion part, the conversion part is in contact with the center part made of a light-transmissive material that covers the conversion part on the surface of the support. In order to prevent this, a cover provided with a concave portion is bonded to an airtight structure by sufficiently lowering the pressure in the concave portion, and a cover for covering the hollow portion in the central portion of the substrate on the back surface of the substrate is made sufficiently low in the hollow portion. Joined to the airtight structure.

【0007】[0007]

【実施例】図1、図2は請求項1の発明の一実施例を示
す。図において図4、図5と同一符号は同一又は相当す
る部分を示し、10はシリコン等の光透過性材料で形成
したカバー、11はカバー10の中央部に変換部4と接
触しないように設けた凹部12はカバー10の周辺部の
凸状部、13は低融点ガラス等の接合剤、14はカバー
10の周辺部の一部に出力電極8を露出させるために設
けた開放部である。
1 and 2 show an embodiment of the present invention. In the drawings, the same reference numerals as those in FIGS. 4 and 5 denote the same or corresponding portions, 10 is a cover formed of a light-transmitting material such as silicon, and 11 is provided in the central portion of the cover 10 so as not to come into contact with the conversion portion 4. The concave portion 12 is a convex portion in the peripheral portion of the cover 10, 13 is a bonding agent such as low melting point glass, and 14 is an open portion provided to expose the output electrode 8 in a part of the peripheral portion of the cover 10.

【0008】光電変換素子の支持体3表面へのカバー1
0の接合は、従来構造の光電変換素子を配列して形成し
たウエハ上に、カバー10を上記光電変換素子と同配列
に形成したウエハを重ねて接合する。カバー10には、
赤外線透過性のシリコンウエハを用いる。シリコンウエ
ハ表面全面に低融点ガラス、あるいは、低融点金属等の
接合剤13をスパッタ等で形成し、ホトレジストをマス
クとしてカバー10の凹部11領域の接合剤13をエッ
チング除去する。低融点ガラスの場合は、弗酸によって
簡単にエッチングすることができる。次に、接合剤1
3、あるいは、接合剤13とレジストをマスクとしてシ
リコンの選択エッチングを行ない、エッチング深さが1
0μm〜100μmの凹部11と表面に接合剤13が付
着した凸状部12からなるカバー10を形成する。この
ウエハを従来構造の光電変換素子を配列して形成したウ
エハ上にカバー10の凹部11と変換部4の位置を合わ
せてのせ、その上に圧力を加えるために重りをのせ、ホ
ットプレート上で400〜500℃に加熱し、接合剤1
3を融解して接合する。その後、冷却し、ダイシングに
よって個々の素子に分離する。
Cover 1 for the surface of the support 3 of the photoelectric conversion element
In the bonding of 0, the wafer having the cover 10 formed in the same arrangement as the photoelectric conversion elements is overlaid and bonded onto the wafer formed by arranging the photoelectric conversion elements having the conventional structure. The cover 10 has
An infrared transparent silicon wafer is used. A bonding agent 13 such as low melting point glass or low melting point metal is formed on the entire surface of the silicon wafer by sputtering or the like, and the bonding agent 13 in the recess 11 region of the cover 10 is removed by etching using the photoresist as a mask. In the case of low melting glass, it can be easily etched with hydrofluoric acid. Next, the bonding agent 1
3, or silicon is selectively etched using the bonding agent 13 and the resist as a mask, and the etching depth is 1
The cover 10 is formed of a concave portion 11 of 0 μm to 100 μm and a convex portion 12 having the bonding agent 13 attached to the surface thereof. This wafer is placed on a wafer formed by arranging photoelectric conversion elements having a conventional structure with the concave portion 11 of the cover 10 and the converting portion 4 aligned with each other, and a weight for applying pressure is placed on the wafer, and the wafer is placed on a hot plate. Heat to 400-500 ° C and bond 1
Melt 3 and join. After that, it is cooled and separated into individual elements by dicing.

【0009】図3は請求項2の発明の一実施例を示す。
図において、図1と同一の符号は同一又は相当する部分
を示し、15は基板1の裏面上に接合した基板1の空洞
部2を覆うカバーである。カバー15にもシリコンウエ
ハを用い、シリコンウエハ表面全体に接合剤13を形成
し、このウエハ上に従来構造の光電変換素子を配列して
形成したウエハを接合の位置を合わせてのせ、その上
に、図1の説明において示したカバー10を配列して形
成したウエハを接合の位置を合わせてのせ、それをホッ
トプレート上にのせ、ウエハ上に重りをのせ、ホットプ
レートごと真空装置内に設置し、排気し、圧力が十分低
下した状態でホットプレートで加熱すると、接合剤13
が融解して、凹部11内と空洞部2内を十分低い圧力に
保って気密構造に接合できる。その後、冷却して真空装
置内から接合したウエハを取り出し、ダイシングによっ
て個々の素子に分離する。
FIG. 3 shows an embodiment of the invention of claim 2.
In the figure, the same reference numerals as those in FIG. 1 indicate the same or corresponding portions, and 15 is a cover for covering the cavity 2 of the substrate 1 bonded to the back surface of the substrate 1. A silicon wafer is also used for the cover 15, the bonding agent 13 is formed on the entire surface of the silicon wafer, and a wafer formed by arranging photoelectric conversion elements having a conventional structure on this wafer is aligned with the bonding position, and then the wafer is formed. 1, the wafer formed by arranging the covers 10 shown in the explanation of FIG. 1 is placed with the bonding positions aligned, placed on a hot plate, a weight is placed on the wafer, and the whole hot plate is placed in a vacuum apparatus. When the material is evacuated and heated with a hot plate while the pressure is sufficiently reduced, the bonding agent 13
Melts, and the inside of the recess 11 and the inside of the cavity 2 can be bonded to an airtight structure while maintaining a sufficiently low pressure. After that, the wafer is cooled and the bonded wafer is taken out from the vacuum apparatus and separated into individual elements by dicing.

【0010】接合する際、加圧用の重りを使う代わり
に、適当な治具を用いてウエハを固定しておき、接合剤
13が加熱溶解した時点で、急速排気弁等を用いて真空
装置内の圧力を短時間で大気圧に戻す方法によってもよ
く、この方法によると、空洞部2と凹部11内の圧力と
外側の大気圧の圧力差により上下のカバー10、15の
ウエハ全体に圧力が均一にかかり、より良好な気密構造
に接合できる。
At the time of bonding, instead of using a weight for pressurization, the wafer is fixed using an appropriate jig, and when the bonding agent 13 is heated and melted, a rapid exhaust valve or the like is used in the vacuum apparatus. May be returned to the atmospheric pressure in a short time. According to this method, the pressure difference between the pressure inside the cavity 2 and the recess 11 and the atmospheric pressure on the outside causes the pressure to be applied to the entire wafers of the upper and lower covers 10 and 15. It is evenly applied and can be bonded to a better airtight structure.

【0011】図1、2に示す構造のものは、薄膜状の変
換部4を破損することなくカバー10を吸着用コレット
で吸着できるため、真空吸着式のダイボンディング装置
を使用してダイボンドできることになり、作業能率が上
がる。図3に示す構造のものは、ウエハ状態で粘着テー
プに貼り付け、下からピンで突き上げても、薄膜状の支
持体3がカバー15に保護されて破壊されることがな
く、分離した素子をトレイ上に整列する必要がなくな
り、さらに作業能率が向上する。また、空洞部2と凹部
11内の圧力が十分低くなっているため、従来のように
変換部4から気体を通して伝導や対流によって失われる
エネルギーが殆どなくなり、変換効率が上がり、出力が
増大する。
In the structure shown in FIGS. 1 and 2, since the cover 10 can be sucked by the suction collet without damaging the thin film conversion portion 4, die bonding can be performed by using a vacuum suction type die bonding apparatus. And work efficiency increases. In the structure shown in FIG. 3, the thin film-like support body 3 is protected by the cover 15 and is not destroyed even when it is attached to an adhesive tape in a wafer state and pushed up by a pin from below, and separated elements are separated. Since it is not necessary to align them on the tray, work efficiency is further improved. Further, since the pressures inside the cavity 2 and the recess 11 are sufficiently low, the energy lost from conduction and convection through the gas from the conversion unit 4 as in the conventional case is almost eliminated, the conversion efficiency is increased, and the output is increased.

【0012】[0012]

【発明の効果】以上説明したように、本発明によれば、
ダイボンドに真空吸着式ダイボンディング装置を使用で
きるようになり、さらに、ウエハ状態で粘着テープに貼
り付け、下からピンで突き上げて個々の素子を分離し、
真空吸着コレットで吸着する方法を採ることができるよ
うになり、組立作業能率が上がり、安定した量産が可能
になる。その上に、熱エネルギーの損失が減り、変換効
率が上がり、出力が増大する。
As described above, according to the present invention,
A vacuum suction type die bonding device can now be used for die bonding, and furthermore, it is attached to an adhesive tape in a wafer state and pushed up with a pin from below to separate individual elements,
The vacuum suction collet can be used for suction, which improves the assembly work efficiency and enables stable mass production. Moreover, the loss of heat energy is reduced, the conversion efficiency is increased, and the output is increased.

【図面の簡単な説明】[Brief description of drawings]

【図1】請求項1の発明の一実施例を示す断面図であ
る。
FIG. 1 is a sectional view showing an embodiment of the invention of claim 1.

【図2】請求項1の発明の一実施例を示す平面図であ
る。
FIG. 2 is a plan view showing an embodiment of the invention of claim 1;

【図3】請求項2の発明の一実施例を示す断面図であ
る。
FIG. 3 is a sectional view showing an embodiment of the invention of claim 2;

【図4】従来のこの種の光電変換素子の一例を示す断面
図である。
FIG. 4 is a sectional view showing an example of a conventional photoelectric conversion element of this type.

【図5】ダイボンドに真空吸着式ダイボンディング装置
を使用するため従来提供されている光電変換素子の一例
を示す平面図である。
FIG. 5 is a plan view showing an example of a photoelectric conversion element conventionally provided for using a vacuum suction type die bonding apparatus for die bonding.

【符号の説明】[Explanation of symbols]

1 基板 2 空洞部 3 支持体 4 変換部 5 絶縁膜 6 吸収体 7 保護膜 8 出力電極 10 カバー 11 凹部 12 凸状部 13 接合剤 14 開放部 15 カバー 1 Substrate 2 Cavity 3 Support 4 Conversion 5 Insulator 6 Absorber 7 Protective film 8 Output electrode 10 Cover 11 Recess 12 Convex 13 Bonding agent 14 Opening 15 Cover

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 中央部に空洞部を設けた基板上に薄膜
状の支持体を設け、該支持体表面上に薄膜からなる熱エ
ネルギーを電気エネルギーに変換する変換部を設け、該
変換部上に絶縁膜を介して吸収体を設けた光電変換素子
において、 上記支持体表面上に上記変換部を覆う光透過性材料から
なる中央部に上記変換部と接触しないように凹部を設け
たカバーを接合したことを特徴とする光電変換素子。
1. A thin film-shaped support is provided on a substrate having a hollow portion in the center, and a conversion unit for converting thermal energy of the thin film into electric energy is provided on the surface of the support, and the conversion unit is provided on the conversion unit. In a photoelectric conversion element having an absorber provided via an insulating film, a cover provided with a recessed portion on the surface of the support body so as not to come into contact with the conversion unit is formed in the central portion made of a light-transmissive material that covers the conversion unit. A photoelectric conversion element characterized by being joined.
【請求項2】 中央部に空洞部を設けた基板上に薄膜
状の支持体を設け、該支持体表面状に薄膜からなる熱エ
ネルギーを電気エネルギーに変換する変換部を設け、該
変換部上に絶縁膜を介して吸収体を設けた光電変換素子
において、 上記支持体表面上に上記変換部を覆う光透過性材料から
なる中央部に上記変換部と接触しないように凹部を設け
たカバーを上記凹部内の圧力を十分低くして気密構造に
接合し、上記基板の裏面上に該基板中央部の空洞部を覆
うカバーを該空洞部内の圧力を十分低くして気密構造に
接合したことを特徴とする光電変換素子。
2. A thin film-shaped support is provided on a substrate having a hollow portion in the center, and a conversion unit for converting thermal energy of the thin film into electric energy is provided on the surface of the support, and on the conversion unit. In a photoelectric conversion element having an absorber provided via an insulating film, a cover provided with a recessed portion on the surface of the support body so as not to come into contact with the conversion unit is formed in the central portion made of a light-transmissive material that covers the conversion unit. The pressure in the recess is made sufficiently low to bond to the airtight structure, and the cover for covering the cavity in the central portion of the substrate is bonded to the airtight structure on the back surface of the substrate by sufficiently lowering the pressure in the cavity. Characteristic photoelectric conversion element.
JP4102423A 1992-03-30 1992-03-30 Photoelectric conversion element Pending JPH05283757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4102423A JPH05283757A (en) 1992-03-30 1992-03-30 Photoelectric conversion element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4102423A JPH05283757A (en) 1992-03-30 1992-03-30 Photoelectric conversion element

Publications (1)

Publication Number Publication Date
JPH05283757A true JPH05283757A (en) 1993-10-29

Family

ID=14327049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4102423A Pending JPH05283757A (en) 1992-03-30 1992-03-30 Photoelectric conversion element

Country Status (1)

Country Link
JP (1) JPH05283757A (en)

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WO2005083374A1 (en) * 2004-02-26 2005-09-09 Hamamatsu Photonics K.K. Infrared sensor and method of producing the same
JP2007171170A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Method for manufacturing thermal type infrared sensing device
JP2007171174A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Thermal type infrared sensing device and its manufacturing method
JP2008190992A (en) * 2007-02-05 2008-08-21 Seiko Npc Corp Infrared sensor
JP2011511264A (en) * 2007-12-17 2011-04-07 ピレオス エルテーデー Thermal radiation sensing element with shielded sandwich structure and use thereof
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JP2019504298A (en) * 2015-11-27 2019-02-14 ハイマン・ゼンゾル・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング Thermal infrared sensor array in wafer level package
US20220283034A1 (en) * 2019-07-09 2022-09-08 Heimann Sensor Gmbh Method for Producing a Thermal Infrared Sensor Array in a Vacuum-Filled Wafer-Level Housing

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083374A1 (en) * 2004-02-26 2005-09-09 Hamamatsu Photonics K.K. Infrared sensor and method of producing the same
US7635605B2 (en) 2004-02-26 2009-12-22 Hamamatsu Photonics K.K. Infrared sensor and method of producing the same
JP2007171170A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Method for manufacturing thermal type infrared sensing device
JP2007171174A (en) * 2005-11-25 2007-07-05 Matsushita Electric Works Ltd Thermal type infrared sensing device and its manufacturing method
JP2008190992A (en) * 2007-02-05 2008-08-21 Seiko Npc Corp Infrared sensor
JP2011511264A (en) * 2007-12-17 2011-04-07 ピレオス エルテーデー Thermal radiation sensing element with shielded sandwich structure and use thereof
JP2012058084A (en) * 2010-09-09 2012-03-22 Seiko Npc Corp Method of manufacturing infrared sensor device, and the infrared sensor device manufactured by the method
JP2019504298A (en) * 2015-11-27 2019-02-14 ハイマン・ゼンゾル・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング Thermal infrared sensor array in wafer level package
US10788370B2 (en) 2015-11-27 2020-09-29 Heimann Sensor Gmbh Thermal infrared sensor array in wafer-level package
JP2021009152A (en) * 2015-11-27 2021-01-28 ハイマン・ゼンゾル・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング Thermal infrared sensor array in wafer level package
US20220283034A1 (en) * 2019-07-09 2022-09-08 Heimann Sensor Gmbh Method for Producing a Thermal Infrared Sensor Array in a Vacuum-Filled Wafer-Level Housing

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