JPH05196431A - Measuring apparatus for state of base plate - Google Patents

Measuring apparatus for state of base plate

Info

Publication number
JPH05196431A
JPH05196431A JP730492A JP730492A JPH05196431A JP H05196431 A JPH05196431 A JP H05196431A JP 730492 A JP730492 A JP 730492A JP 730492 A JP730492 A JP 730492A JP H05196431 A JPH05196431 A JP H05196431A
Authority
JP
Japan
Prior art keywords
substrate
measured
base plate
measurement
state
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP730492A
Other languages
Japanese (ja)
Other versions
JP3277531B2 (en
Inventor
Osamu Hikita
理 疋田
Daisuke Nagano
大介 永野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP00730492A priority Critical patent/JP3277531B2/en
Publication of JPH05196431A publication Critical patent/JPH05196431A/en
Application granted granted Critical
Publication of JP3277531B2 publication Critical patent/JP3277531B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

PURPOSE:To enable highly-precise three-dimensional measurement of a base plate to be measured even when it has a warp or a curve, by fixing the base plate by a base plate holding means and by measuring the base plate by a state measuring means. CONSTITUTION:A base plate 1 to be measured is conveyed in a direction A by a base plate conveyor 2. A base plate stopper 6 rises to a measuring position, the base plate l is stopped by the stopper and a drive motor of the conveyor 2 stops. A positioning pin 7 rises and pierces a positioning hole 8 provided in the base plate 1, so as to execute accurate positioning for measurement and inspection. Moreover, a holder plate 9 approaches the base plate 1 on the conveyor 2 and rises to hold the base plate 1 and, simultaneously, the base plate l is sucked and fixed on the plate 9 by a low pneumatic pressure generating device 12 such as a vacuum pump by sucking it at a plurality of suction holes 10 of the plate through an air hose 11. When a warp of the base plate 1 is conspicuous, it is pressed down by DELTAZ at an arbitrary position from above by a pressing mechanism 13, so that it be brought into close contact with the plate 9. Thereafter an X-Y table 5 and a Z shaft 4 are driven by motors and measurement is executed by a base plate state measuring head 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プリント基板の状態を
測定する基板状態測定装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a board condition measuring device for measuring the condition of a printed circuit board.

【0002】[0002]

【従来の技術】近年、基板状態測定装置は、機器の小型
化に伴うさらなる高密度実装により、目視による検査が
限界に近づくと共に、作業者不足を補う設備自動化への
要望からも最も自動化の遅れている検査工程の自動化の
ために、積極的に導入されようとしている。
2. Description of the Related Art In recent years, a board condition measuring device has reached the limit of visual inspection due to higher density mounting accompanying downsizing of equipment, and the automation is the most delayed due to a demand for automation of equipment to compensate for worker shortage. It is about to be introduced actively in order to automate the inspection process.

【0003】以下図面を参照しながら、上述した従来の
基板状態測定装置の一例について説明する。図4は従来
の基板状態測定装置の構成を示す斜視図、図5はその詳
細の側面図である。
An example of the above-mentioned conventional substrate state measuring apparatus will be described below with reference to the drawings. FIG. 4 is a perspective view showing the configuration of a conventional substrate state measuring device, and FIG. 5 is a detailed side view thereof.

【0004】51は状態を測定検査される被測定基板で
あり、ガラエポ、セラミックス等で作られている。52
は基板搬送コンベアで基板ストッパー56によって基板
測定位置に基板を停止させることができる。また、57
は被測定基板を精度良く測定位置に停止させるために用
いられる、位置決めピンである。また、58は被測定基
板に設けられた、位置決めピン57の貫通する位置決め
穴である。53はカメラもしくはレーザースキャナー等
からなる基板状態測定ヘッドであり、X−Y2次元を移
動、位置決め可能なX−Yテーブル55に取り付けられ
た、上下に移動、位置決め可能なZ軸に固定されること
によって、被測定基板51の任意の場所の状態測定検査
が可能である。
Reference numeral 51 denotes a substrate to be measured whose state is to be inspected, which is made of glass epoxy, ceramics or the like. 52
The substrate can be stopped at the substrate measuring position by the substrate stopper 56 on the substrate transfer conveyor. Also, 57
Is a positioning pin used to accurately stop the substrate to be measured at the measurement position. Further, reference numeral 58 is a positioning hole formed in the substrate to be measured and through which the positioning pin 57 penetrates. Reference numeral 53 denotes a substrate state measuring head including a camera or a laser scanner, which is attached to an XY table 55 capable of moving and positioning in XY two dimensions, and fixed to a Z axis capable of moving vertically and positioning. With this, it is possible to perform a state measurement inspection of an arbitrary place on the substrate 51 to be measured.

【0005】以上のように構成されたプリント基板測定
装置について、以下その動作について説明する。
The operation of the printed circuit board measuring device configured as described above will be described below.

【0006】まず、測定検査されようとする被測定基板
51は基板搬送コンベア52によってA方向にローディ
ングされる。被測定基板51のローディングに伴い、基
板ストッパー56が被測定基板51を測定位置に止める
ために上昇し、あらかじめ決められた測定場所に被測定
基板51が基板ストッパー56によってその動きを止め
られ、その直後基板搬送コンベア52を駆動しているモ
ーターが停止する。さらに、その後位置決めピン57が
上昇し、被測定基板51に設けられた位置決め穴58を
貫通する事によって、測定検査のための正確な位置決め
を行う。被測定基板51が測定場所に正確に位置決めさ
れると、X−Yテーブル55とZ軸54は図にない制御
装置によってそのそれぞれの軸のモーターを駆動するこ
とによってあらかじめ教示された通りに、基板状態測定
ヘッド53は決められた場所に移動し、基板の状態をカ
メラやレーザースキャナーを用いて取り込み、測定検査
を行う。あらかじめ教示された測定検査すべて終了する
と、位置決めピン57は下降し位置決め穴58から離
れ、基板ストッパー56も下降し被測定基板51を遮ら
なくなる。そして、基板搬送コンベア52のモーターは
再び駆動し、被測定基板51をB方向に排出する。その
後、基板搬送コンベア52は次の被測定基板を同じ方法
によって測定場所に導く。この一連の動作が続けられ、
次々と測定検査が連続的に実施される。
First, the substrate 51 to be measured and inspected is loaded in the direction A by the substrate conveyor 52. Along with the loading of the substrate to be measured 51, the substrate stopper 56 moves upward to stop the substrate to be measured 51 at the measurement position, and the substrate to be measured 51 is stopped at its predetermined measurement position by the substrate stopper 56. Immediately after that, the motor driving the substrate transfer conveyor 52 is stopped. Further, after that, the positioning pin 57 rises and penetrates the positioning hole 58 provided in the substrate 51 to be measured, thereby performing accurate positioning for measurement inspection. When the substrate 51 to be measured is accurately positioned at the measurement location, the XY table 55 and the Z-axis 54 are moved as previously taught by driving the motors of their respective axes by a controller (not shown). The state measuring head 53 moves to a predetermined place, captures the state of the substrate using a camera or a laser scanner, and performs measurement inspection. When all the measurement inspections taught in advance are completed, the positioning pin 57 descends and moves away from the positioning hole 58, and the substrate stopper 56 also descends so that the substrate 51 to be measured is no longer blocked. Then, the motor of the substrate transfer conveyor 52 is driven again to eject the substrate 51 to be measured in the B direction. After that, the substrate transfer conveyor 52 guides the next substrate to be measured to the measurement place by the same method. This series of operations is continued,
Measurement inspections are continuously performed one after another.

【0007】[0007]

【発明が解決しようとする課題】しかしながら上記のよ
うな構成では、被測定基板51の状態を3次元にて測定
しなければならない場合(例えば被測定基板上に印刷さ
れたクリーム半田の厚み等の測定)、X−Y2次元方向
には、位置決めピン57と位置決め穴58によって高精
度な位置決めができるが、Z軸方向は、被測定基板それ
ぞれにソリや曲がりが存在している事が多いため、あら
かじめ教示された状態と大きく異なり、高精度な測定が
できないという問題点を有していた。例えば図6に示し
たように、被検査基板51が基板状態測定ヘッド53の
方向に凸型に反っている場合には、図中に示すとおり、
第5図の様に平面にあるときよりもΔZの誤差がZ軸方
向に発生するため、高精度な測定ができなかった。
However, in the above configuration, when the state of the substrate 51 to be measured must be measured three-dimensionally (for example, the thickness of the cream solder printed on the substrate to be measured, etc.). (Measurement), the positioning pin 57 and the positioning hole 58 can perform high-precision positioning in the XY two-dimensional directions, but in the Z-axis direction, warpage or bending is often present on each of the substrates to be measured. There is a problem that highly accurate measurement cannot be performed, which is significantly different from the state taught in advance. For example, as shown in FIG. 6, when the substrate 51 to be inspected is warped in a convex shape toward the substrate state measuring head 53, as shown in FIG.
As shown in FIG. 5, an error of ΔZ occurs in the Z-axis direction than when it is on a flat surface, so that highly accurate measurement cannot be performed.

【0008】本発明は上記問題点を解決するために、被
測定基板を高精度に3次元測定することができる基板状
態測定装置を提供することを目的とする。
SUMMARY OF THE INVENTION In order to solve the above problems, it is an object of the present invention to provide a substrate state measuring device capable of highly accurately three-dimensionally measuring a substrate to be measured.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に本願発明の基板状態測定装置は被測定基板の状態を測
定する状態測定手段と、状態測定手段の設置位置を経る
ようにして被測定基板を次々と移送する移送手段と、前
記状態測定手段により得られる被測定基板の状態を解析
して各被検査基板を測定する測定処理手段と、前記被測
定基板を前記状態測定手段によって測定するため位置決
め手段と、前記被測定基板を保持する被測定基板保持手
段と、前記被測定基板の変形を解消する被測定基板固定
手段とを備え、かつ前記被測定基板固定手段により被検
査基板を固定し、前記状態測定手段により被測定基板の
状態を測定するものである。
In order to achieve the above object, the substrate condition measuring device of the present invention measures the condition of the substrate to be measured and the position to be measured by passing the condition measuring device. Transferring means for transferring substrates one after another, measurement processing means for analyzing each state of the inspected substrates obtained by the state measuring means and measuring each inspected substrate, and measuring the inspected substrates by the state measuring means. For this purpose, it is provided with a positioning means, a measured substrate holding means for holding the measured substrate, and a measured substrate fixing means for eliminating deformation of the measured substrate, and the measured substrate fixing means fixes the inspected substrate. Then, the state of the substrate to be measured is measured by the state measuring means.

【0010】[0010]

【作用】この発明の基板状態測定装置は、被測定基板に
反りや曲がりが伴っている場合でも、被測定基板固定手
段によって被測定基板保持手段の保持面に被測定基板を
吸着固定して、被測定面の平面度を出すことによって、
基板の変形をなくし、高精度な3次元測定を可能にす
る。
According to the substrate state measuring apparatus of the present invention, even when the substrate to be measured is warped or bent, the substrate to be measured is fixed to the holding surface of the substrate to be measured holding means by the means to fix the substrate to be measured, By obtaining the flatness of the measured surface,
It eliminates substrate deformation and enables highly accurate three-dimensional measurement.

【0011】[0011]

【実施例】以下、この発明の一実施例を、図面を参照し
ながら詳しく説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings.

【0012】図1は本実施例にかかる基板状態測定装置
の高性を示す斜視図、図2はその詳細の側面図である。
FIG. 1 is a perspective view showing the height of the substrate condition measuring apparatus according to this embodiment, and FIG. 2 is a detailed side view thereof.

【0013】1は状態を測定検査される被測定基板であ
り、ガラエポ、セラミックス等で作られている。2は基
板搬送コンベアで基板ストッパー6によって基板測定位
置に基板を停止させることができる。7は被測定基板を
精度良く測定位置に停止させるために用いられる、位置
決めピン、8は被測定基板に設けられた、位置決めピン
7の貫通する位置決め穴である。9は被測定基板1を保
持するホルダープレートであり、被測定基板1を固定す
るための吸着穴9を適切な場所に複数個持ち、エアホー
ス11を介して、12の真空ポンプ等の低気圧発生装置
とつながれており、被測定基板1をホルダープレート9
の保持面に吸着固定させるものである。13は押さえ機
構であって外部から基板を任意の位置で押さえることが
可能である。3はカメラもしくはレーザースキャナー等
からなる基板状態測定ヘッドであり、X−Y2次元を移
動、位置決め可能なX−Yテーブル5に取り付けられ
た、上下に移動、位置決め可能なZ軸に固定されること
によって、被測定基板の任意の場所の状態測定検査が可
能である。
Reference numeral 1 denotes a substrate to be measured whose state is to be inspected, which is made of glass epoxy, ceramics or the like. Reference numeral 2 denotes a substrate transfer conveyor, which can stop the substrate at the substrate measurement position by the substrate stopper 6. Reference numeral 7 is a positioning pin used to accurately stop the substrate to be measured at the measurement position, and 8 is a positioning hole provided in the substrate to be measured and through which the positioning pin 7 penetrates. Reference numeral 9 denotes a holder plate for holding the substrate 1 to be measured, which has a plurality of suction holes 9 for fixing the substrate 1 to be measured at an appropriate place, and generates a low pressure such as a vacuum pump 12 through an air hose 11. The substrate to be measured 1 is connected to the device and the holder plate 9
It is to be adsorbed and fixed on the holding surface of. A pressing mechanism 13 can press the substrate from the outside at an arbitrary position. Reference numeral 3 denotes a substrate state measuring head including a camera or a laser scanner, which is attached to an XY table 5 capable of moving and positioning in XY two dimensions, and fixed to a Z axis capable of moving vertically and positioning. With this, it is possible to perform a state measurement inspection of an arbitrary place on the substrate to be measured.

【0014】以上のように構成された基板状態測定装置
について、以下その動作について説明する。まず、測定
検査されようとする被測定基板1は基板搬送コンベア2
によってA方向にローディングされる。被測定基板1の
ローディングに伴い、基板ストッパー6が被測定基板1
を測定位置に止めるために上昇し、あらかじめ決められ
た測定場所に被測定基板1は基板ストッパー6によって
その動きを止められ、その直後基板搬送コンベア2を駆
動しているモーターが停止する。さらに、その後位置決
めピン7が上昇し、被測定基板1に設けられた位置決め
穴8を貫通することにより、測定検査のための正確な位
置決めを行う。次にホルダープレート9が基板搬送コン
ベア2上にある被測定基板1に接するところまで、シリ
ンダー等(図示せず)によって上昇することによって被
測定基板1を保持し、それと同時に被測定基板1を固定
するために設けられた複数個の吸着穴9からは、エアホ
ース11を介して接続されている真空ポンプ等の低気圧
発生装置12により吸引され、被測定基板1をホルダー
プレート9の保持面に吸着固定される。また、図3に示
すように、被測定基板1の反り方が著しい場合は、押さ
え機構13で任意の位置を、上方からΔZ押し込むこと
によって、ホルダープレート9の保持面に被測定基板1
を密着させることにより吸着固定することができる。被
測定基板1が保持面に吸着され固定されれば、基板の変
形が矯正され、高精度の測定を妨げる要因がなくなるの
で、高精度な3次元測定が可能となる。なお、吸着固定
されれば、押さえ機構13が再び上昇し、測定動作に影
響をあたえないような構成になっているのは、説明する
までもない。被測定基板1が測定場所に正確に位置決め
され、吸着固定されると、X−Yテーブル5とZ軸4は
制御装置(図示せず)によってそれぞれの軸のモーター
を駆動し、あらかじめ教示された通りに基板状態測定ヘ
ッド3をヘッドが測定しようと決められた場所に移動
し、基板の状態をカメラやレーザースキャナーを用いて
取り込み、測定検査を行う。あらかじめ教示された測定
検査がすべて終了すると、低気圧発生装置12からの吸
引は遮断されることにより、固定は解除され、位置決め
ピン7は下降し位置決め穴8から離れ、サポートホルダ
ー9が下降した後、基板ストッパー6も下降し被測定基
板1を遮らなくなる。そして、基板搬送コンベア2のモ
ーターは再び駆動し、被測定基板1をB方向に排出す
る。その後、基板搬送コンベア2は次なる被測定基板を
同じ方法によって測定場所に導く。この一連の動作が続
けることによって、次々と測定検査が連続的に実施され
る。
The operation of the substrate condition measuring device configured as described above will be described below. First, the substrate to be measured 1 to be measured and inspected is a substrate transfer conveyor 2
Loaded in the A direction. As the substrate 1 to be measured is loaded, the substrate stopper 6 is moved to the substrate 1 to be measured.
To the measurement position, the movement of the substrate 1 to be measured is stopped by the substrate stopper 6 at a predetermined measurement position, and immediately thereafter, the motor driving the substrate transfer conveyor 2 is stopped. Further, thereafter, the positioning pin 7 rises and penetrates the positioning hole 8 provided in the substrate 1 to be measured, thereby performing accurate positioning for measurement inspection. Next, the substrate to be measured 1 is held by being raised by a cylinder or the like (not shown) until the holder plate 9 comes into contact with the substrate to be measured 1 on the substrate transport conveyor 2, and at the same time the substrate to be measured 1 is fixed. Through a plurality of suction holes 9 provided for the purpose of suction, a low pressure generating device 12 such as a vacuum pump connected through an air hose 11 sucks the substrate 1 to be measured onto a holding surface of a holder plate 9. Fixed. Further, as shown in FIG. 3, when the warp of the substrate to be measured 1 is remarkable, the pressing mechanism 13 pushes an arbitrary position from above by ΔZ, so that the substrate to be measured 1 is placed on the holding surface of the holder plate 9.
It can be adsorbed and fixed by bringing them into close contact. If the substrate to be measured 1 is adsorbed and fixed to the holding surface, the deformation of the substrate is corrected and there are no factors that hinder high-accuracy measurement, so high-accuracy three-dimensional measurement is possible. It is needless to say that the pressing mechanism 13 is lifted again when it is fixed by suction, so that the measurement operation is not affected. When the substrate 1 to be measured is accurately positioned at the measurement location and fixed by suction, the XY table 5 and the Z-axis 4 drive the motors of the respective axes by the control device (not shown), and are taught in advance. As described above, the substrate state measuring head 3 is moved to a place determined to be measured by the head, the state of the substrate is captured by using a camera or a laser scanner, and measurement inspection is performed. When all the measurement tests taught in advance are completed, the suction from the low pressure generating device 12 is cut off, the fixation is released, the positioning pin 7 descends and separates from the positioning hole 8, and the support holder 9 descends. The substrate stopper 6 also descends and does not block the substrate 1 to be measured. Then, the motor of the substrate transfer conveyor 2 is driven again, and the substrate to be measured 1 is discharged in the B direction. After that, the substrate transfer conveyor 2 guides the next substrate to be measured to the measurement place by the same method. By continuing this series of operations, measurement and inspection are continuously performed one after another.

【0015】なお、本実施例における被検査基板の位置
決めには位置決めピンと位置決め穴を想定したが、被測
定基板外周を位置決め基準に押し当てて位置決め規正す
る外周規正方式でも同様の効果が期待される。また、本
実施例において押さえ機構は基板状態測定ヘッドに取り
付けられていたが、基板搬送コンベア近傍に取り付けら
れていても、あるいはまったく異なるところに取り付け
られていても、同様の働きをするものであればその種類
を問わない。
Although the positioning pins and the positioning holes are assumed for the positioning of the substrate to be inspected in this embodiment, the same effect can be expected in the outer circumference regulating method in which the outer circumference of the substrate to be measured is pressed against the positioning reference to perform the positioning regulation. .. Further, in the present embodiment, the pressing mechanism is attached to the substrate state measuring head, but it may have the same function even if it is attached in the vicinity of the substrate transfer conveyor or in a completely different place. The type does not matter.

【0016】さらに、状態測定手段としては、例えば、
1ないし複数のカメラで構成されるイメージ測定手段が
ある。イメージ測定手段には、たとえば照射光であるレ
ーザ光を検出するCCD先差を備えたビデオカメラを挙
げる事ができるが、これに限らず照射X線を検出するX
線用ビデオカメラでも良い。前者の場合はレーザ光照射
手段がそれぞれ基板状態測定装置に設けられ、被測定基
板にレーザ光やX線が当てられることは言うまでもな
い。複数のカメラで構成されるイメージ測定手段の場
合、5〜6個のカメラを同時使用し3次元測定ができる
ようにしたマルチカメラ方式をとることもできる。
Further, as the state measuring means, for example,
There is an image measuring means consisting of one or more cameras. The image measuring means may be, for example, a video camera having a CCD tip difference for detecting laser light which is irradiation light, but is not limited to this, and X for detecting irradiation X-rays can be used.
It may be a line video camera. It goes without saying that in the former case, the laser light irradiating means is provided in each of the substrate state measuring devices and the substrate to be measured is irradiated with laser light or X-rays. In the case of the image measuring means composed of a plurality of cameras, it is possible to adopt a multi-camera system in which 5 to 6 cameras are simultaneously used and three-dimensional measurement is possible.

【0017】被測定基板移送手段としては、ベルトコン
ベア方式、移動テーブル方式等を初めさまざまな方式の
ものが用いられる。
As the means for transferring the substrate to be measured, various methods such as a belt conveyor method and a moving table method are used.

【0018】測定処理部は、測定プログラム等を記憶す
るメモリおよび測定プログラムを実行するCPU等で主
に構成されている。
The measurement processing section is mainly composed of a memory for storing the measurement program and the like, and a CPU for executing the measurement program.

【0019】位置決め手段としてはパルスモーター等で
送りネジを駆動し、位置決めを行う移動テーブル方式、
リニアモーター等で直接駆動するダイレクトリニア駆動
方式等を始め様々なものが用いられる。
As a positioning means, a moving table system for positioning by driving a feed screw with a pulse motor or the like,
Various types are used, including a direct linear drive system in which a linear motor is directly driven.

【0020】被測定基板保持手段としては被測定基板の
形状に応じて、被測定基板の測定面が平面性を確保でき
るよう、保持面を工夫したものが用いられる。一般的に
は、保持面は平面に維持されている場合が多いが、被測
定基板の形状により異なる。
As the means for holding the substrate to be measured, there is used a means for holding the surface of the substrate to be measured so that the measuring surface of the substrate to be measured can have flatness according to the shape of the substrate to be measured. Generally, the holding surface is often kept flat, but it depends on the shape of the substrate to be measured.

【0021】被測定基板固定手段としては被測定基板保
持手段の保持面に吸引穴を設け、真空ポンプ等の低気圧
発生装置から吸引を行い、被測定基板が保持面に吸着す
ることによって固定されるものとする。
As the substrate to be measured fixing means, a suction hole is provided in the holding surface of the substrate to be measured holding means, suction is performed from a low pressure generating device such as a vacuum pump, and the substrate to be measured is fixed by adsorbing to the holding surface. Shall be.

【0022】被測定基板矯正手段としては、被測定基板
の変形度合いが著しく、被測定基板固定手段のみでは固
定が困難な際に、被測定基板が被測定基板保持手段によ
って保持面に保持された際に、被測定基板の測定面に測
定に影響を与えない範囲で、例えば状態測定手段である
カメラユニット近傍に併設された基板押さえ機構によっ
て保持面に密着させるものであり、併設される場所は状
態測定に支障を来さない限り、被測定基板移送手段近傍
等にあってよい。
As the measured substrate correcting means, the measured substrate is held on the holding surface by the measured substrate holding means when the measured substrate is deformed so much that it is difficult to fix the measured substrate only by the fixing means. At this time, within a range that does not affect the measurement on the measurement surface of the substrate to be measured, for example, a substrate pressing mechanism provided near the camera unit, which is a state measuring means, is brought into close contact with the holding surface. As long as it does not hinder the state measurement, it may be in the vicinity of the substrate transfer means to be measured.

【0023】[0023]

【発明の効果】以上に述べたように、この発明の基板状
態測定装置の場合、被測定基板がサポートホルダーの保
持面に吸着固定されるので、基板の変形が原因であった
高精度な測定を妨げる要因がなくなり、高精度な3次元
測定が可能となる。
As described above, in the substrate condition measuring device of the present invention, since the substrate to be measured is adsorbed and fixed on the holding surface of the support holder, the high-precision measurement caused by the deformation of the substrate. As a result, the factors that hinder the measurement are eliminated, and highly accurate three-dimensional measurement becomes possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の基板状態測定装置の概略斜
視図
FIG. 1 is a schematic perspective view of a substrate state measuring device according to an embodiment of the present invention.

【図2】図1の基板保持の詳細を示す側面図FIG. 2 is a side view showing details of substrate holding shown in FIG.

【図3】図2の被検査基板の変形程度が大きいときの例
を示す側面図
FIG. 3 is a side view showing an example in which the substrate to be inspected in FIG. 2 is largely deformed.

【図4】従来の基板状態測定装置の概略斜視図FIG. 4 is a schematic perspective view of a conventional substrate state measuring device.

【図5】図4の基板保持の詳細を示す側面図FIG. 5 is a side view showing details of substrate holding shown in FIG.

【図6】図5の被検査基板の変形程度が大きいときの例
を示す側面図
6 is a side view showing an example in which the substrate to be inspected in FIG. 5 is largely deformed.

【符号の説明】[Explanation of symbols]

1 被測定基板 2 基板搬送コンベア 3 基板状態測定ヘッド 4 Z軸 5 X−Yテーブル 9 サポートホルダー 12 低気圧発生装置 13 押さえ機構 1 substrate to be measured 2 substrate conveyer 3 substrate state measuring head 4 Z axis 5 XY table 9 support holder 12 low pressure generator 13 pressing mechanism

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 被測定基板の状態を測定する状態測定手
段と、前記状態測定手段の設置位置を経るようにして被
測定基板を次々と移送する移送手段と、前記状態測定手
段により得られる被測定基板の状態を解析して各被測定
基板を測定する測定処理手段と、前記被測定基板を前記
状態測定手段によって測定するための位置決め手段と、
前記被測定基板を保持する被測定基板保持手段と、前記
被測定基板の変形を解消する被測定基板基板固定手段と
を備え、かつ前記被測定基板固定手段により被検査基板
を固定し、前記状態測定手段によって被測定基板の状態
を測定することを特徴とする基板状態測定装置。
1. A state measuring means for measuring the state of a substrate to be measured, a transfer means for successively transferring the substrate to be measured through the installation position of the state measuring means, and a substrate obtained by the state measuring means. Measurement processing means for analyzing the state of the measurement substrate to measure each measured substrate, and positioning means for measuring the measured substrate by the state measuring means,
The substrate to be measured holding means for holding the substrate to be measured and the substrate to be measured substrate fixing means to eliminate deformation of the substrate to be measured, and the substrate to be inspected are fixed by the substrate to be measured fixing state, A substrate condition measuring device, characterized in that the condition of a substrate to be measured is measured by a measuring means.
【請求項2】 被測定基板固定手段が、被測定基板を保
持する被測定基板保持手段の被測定基板保持面に前記被
測定基板を低気圧発生装置からの吸引力により前記保持
面に吸着固定することを特徴とする請求項1記載の基板
状態測定装置。
2. The substrate to be measured fixing means fixes the substrate to be measured on the substrate holding surface of the substrate to be measured holding the substrate to be measured by suction by a suction force from a low pressure generating device. The substrate condition measuring device according to claim 1, wherein
【請求項3】 被測定基板固定手段の作動を促進させる
被測定基板矯正手段を備えた請求項1または2記載の基
板状態測定装置。
3. The substrate condition measuring device according to claim 1, further comprising a measured substrate correcting means for accelerating the operation of the measured substrate fixing means.
JP00730492A 1992-01-20 1992-01-20 Substrate condition measuring device Expired - Fee Related JP3277531B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP00730492A JP3277531B2 (en) 1992-01-20 1992-01-20 Substrate condition measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00730492A JP3277531B2 (en) 1992-01-20 1992-01-20 Substrate condition measuring device

Publications (2)

Publication Number Publication Date
JPH05196431A true JPH05196431A (en) 1993-08-06
JP3277531B2 JP3277531B2 (en) 2002-04-22

Family

ID=11662278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP00730492A Expired - Fee Related JP3277531B2 (en) 1992-01-20 1992-01-20 Substrate condition measuring device

Country Status (1)

Country Link
JP (1) JP3277531B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001315298A (en) * 2000-05-09 2001-11-13 Matsushita Electric Ind Co Ltd Screen printing apparatus and screen printing process
JP2009524011A (en) * 2006-01-17 2009-06-25 エアバス・ドイチュラント・ゲーエムベーハー Apparatus and method for acquiring deviation of contour of flexible part by acquiring weight of part
WO2010030829A3 (en) * 2008-09-11 2010-06-17 Litesentry Corporation Automated online measurement of glass part geometry
KR101409812B1 (en) * 2013-05-14 2014-06-24 한국기계연구원 Property testing apparatus and method of freestanding nanofilm

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001315298A (en) * 2000-05-09 2001-11-13 Matsushita Electric Ind Co Ltd Screen printing apparatus and screen printing process
JP2009524011A (en) * 2006-01-17 2009-06-25 エアバス・ドイチュラント・ゲーエムベーハー Apparatus and method for acquiring deviation of contour of flexible part by acquiring weight of part
WO2010030829A3 (en) * 2008-09-11 2010-06-17 Litesentry Corporation Automated online measurement of glass part geometry
KR101409812B1 (en) * 2013-05-14 2014-06-24 한국기계연구원 Property testing apparatus and method of freestanding nanofilm

Also Published As

Publication number Publication date
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