JPH0196814A - Composite type thin film magnetic head - Google Patents
Composite type thin film magnetic headInfo
- Publication number
- JPH0196814A JPH0196814A JP25362987A JP25362987A JPH0196814A JP H0196814 A JPH0196814 A JP H0196814A JP 25362987 A JP25362987 A JP 25362987A JP 25362987 A JP25362987 A JP 25362987A JP H0196814 A JPH0196814 A JP H0196814A
- Authority
- JP
- Japan
- Prior art keywords
- head
- substrate
- insulating layer
- thin film
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 45
- 239000010409 thin film Substances 0.000 title claims abstract description 11
- 239000002131 composite material Substances 0.000 title claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 230000001939 inductive effect Effects 0.000 claims description 8
- 239000004020 conductor Substances 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 239000002952 polymeric resin Substances 0.000 abstract description 4
- 229920003002 synthetic resin Polymers 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 2
- 239000000956 alloy Substances 0.000 abstract description 2
- 238000001312 dry etching Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
Landscapes
- Magnetic Heads (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気ディスク、VTRなどの磁気記録に係り、
特に高密度磁気記録に好適な薄膜磁気ヘッドに関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to magnetic recording for magnetic disks, VTRs, etc.
In particular, the present invention relates to a thin film magnetic head suitable for high-density magnetic recording.
誘導型簿膜磁気ヘッドと磁気抵抗効果型磁気ヘットとを
複合化する技術としては、(1)磁気抵抗゛ 効果型ヘ
ッドの上に誘導型薄膜磁気ヘッドを形成する。(2)誘
導型磁気ヘッドの磁極間に磁気抵抗効果型ヘッドを形成
する。(3)誘導型薄膜磁気ヘッドの上に磁気抵抗効果
型ヘッドを形成するという3つの構造が提案されている
。これらの技術に関してはそれぞれ特開昭51−148
411号、特開昭52−11921号、特開昭58−1
89818号において論じられている。Techniques for combining an inductive thin film magnetic head and a magnetoresistive magnetic head include (1) forming an inductive thin film magnetic head on a magnetoresistive head; (2) A magnetoresistive head is formed between the magnetic poles of the inductive magnetic head. (3) Three structures have been proposed in which a magnetoresistive head is formed on an inductive thin film magnetic head. These techniques are described in Japanese Patent Application Laid-Open No. 51-148
No. 411, JP-A-52-11921, JP-A-58-1
No. 89818.
これらの技術の中で、3番目の誘導型磁気ヘッドの上に
磁気抵抗効果型磁気ヘッドを積層する構造の複合ヘッド
では、第2図に示すように、媒体に対して、記録ヘッド
の後に再生ヘッドを置く構造となるため、書き込み直後
に読み出しができる。Among these technologies, a composite head with a structure in which a magnetoresistive magnetic head is stacked on top of a third inductive magnetic head, as shown in Fig. Since the head is placed in a structure, reading can be performed immediately after writing.
このため、書き込んだ情報の確認ができ、磁気記録にお
けるエラーレートを極めて小さくすることができる。Therefore, the written information can be confirmed, and the error rate in magnetic recording can be extremely reduced.
しかしながら、上記従来技術では、第2図に示すように
、平坦な基板上に記録ヘッドを形成するため、再生ヘッ
ド形成部分の近傍に記録ヘッドの段差部分7が生じる。However, in the above-mentioned prior art, as shown in FIG. 2, since the recording head is formed on a flat substrate, a stepped portion 7 of the recording head is generated in the vicinity of the portion where the reproducing head is formed.
このように平坦な部分が十分得られないため再生ヘッド
を精度良く形成することが困難であった。In this way, it has been difficult to form a reproducing head with high precision because a sufficiently flat portion cannot be obtained.
本発明の目的は、記録ヘッドの上部を平坦化して、精度
良く再生ヘッドを形成することのできる複合型薄膜磁気
ヘッドを提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a composite thin-film magnetic head in which the upper part of the recording head can be flattened to form a reproducing head with high precision.
上記目的は、あらかじめ凹部を有する基板上に記録ヘッ
ドを形成することによって達成される。The above object is achieved by forming a recording head on a substrate that has recesses in advance.
本発明の作用を第1図を用いて説明する。予め基板1を
加工して、なだらかな側面を有する凹部を形成する。続
いて、下部磁極2を形成し、励磁用のコイル3を凹部に
形成する。その後、コイル3の上に絶縁層4を積層して
平坦化を行ない、続いて上記磁極5を形成する。このと
き、コイル3は基板の凹部に形成できるので、記録ヘッ
ドのギャップ部には段差が生じず、平坦な表面が得られ
る。このためこの上に精度良く磁気抵抗効果型の再生ヘ
ッド6を形成することができる。The operation of the present invention will be explained using FIG. The substrate 1 is processed in advance to form a recessed portion having gentle side surfaces. Subsequently, the lower magnetic pole 2 is formed, and the excitation coil 3 is formed in the recess. Thereafter, an insulating layer 4 is laminated on the coil 3 and planarized, and then the magnetic pole 5 is formed. At this time, since the coil 3 can be formed in the recessed part of the substrate, no step is formed in the gap part of the recording head, and a flat surface can be obtained. Therefore, the magnetoresistive type reproducing head 6 can be formed thereon with high accuracy.
以下、本発明の一実施例を第3図により説明する。はじ
めに、基板1に深さ約8μmの溝を形成する。このとき
側面のテーパ角が20’〜45″となるようにドライエ
ツチングを用いたテーパエツチングを行なう(第3図(
a))。続いて下部磁極2を形成する強磁性合金、たと
えばN1−F e 、 F e −A Q 、 G o
系非晶質合金などを約3μm被着し、加工する(第3図
(b))。次に、S i 02. A n zos、
S i 8N4やポリイミド系高分子樹脂などの絶縁層
4と、AQやCuなどからなるコイル3とを、順次積層
し、上記凹部にコイル3と絶縁層4を充填する。(第3
図(C))。An embodiment of the present invention will be described below with reference to FIG. First, a groove with a depth of about 8 μm is formed in the substrate 1. At this time, taper etching is performed using dry etching so that the taper angle of the side surface is 20' to 45'' (see Figure 3).
a)). Subsequently, a ferromagnetic alloy forming the lower magnetic pole 2, such as N1-Fe, Fe-AQ, Go
Approximately 3 μm of amorphous alloy or the like is deposited and processed (Fig. 3(b)). Next, S i 02. A n zos,
An insulating layer 4 made of Si 8N4 or polyimide polymer resin, and a coil 3 made of AQ, Cu, or the like are sequentially laminated, and the coil 3 and insulating layer 4 are filled in the recess. (3rd
Figure (C)).
このとき、コイル3は膜厚が3μmでリフトオフを用い
て形成した。また高分子樹脂の塗布およびエッチバック
法を用いて、平坦化を行なった。次に、ギャップ部を形
成する絶縁層4′としてA I2.208を0.5μm
被着した後、その一部を除去し、続いて上記磁極5を形
成する(第3図(d))。At this time, the coil 3 had a film thickness of 3 μm and was formed using lift-off. Furthermore, planarization was performed using a polymer resin coating and an etch-back method. Next, as the insulating layer 4' forming the gap part, A I2.208 was coated with a thickness of 0.5 μm.
After being deposited, a part of it is removed, and then the magnetic pole 5 is formed (FIG. 3(d)).
材料および膜厚は下部磁極の場合と同様である。The material and film thickness are the same as those for the lower magnetic pole.
その後、絶縁層8としてA Q 203を約0.5μm
被着し続いてその上に、磁気抵抗効果型の再生ヘッド6
を積層した。再生ヘッドとしてはNi−Fe合金(膜厚
400人)およびTi膜(2000人)からなるシャン
トバイアス型の磁気抵抗効果素子を用いた。なお、再生
ヘッドとしては、バーバポール型や永久磁石型など他の
バイアス方式を用いた磁気抵抗効果動素子も用いること
ができる。さらに本実施例では再生ヘッドとして磁気抵
抗効果型ヘッドを用いたが誘導型の薄膜ヘッドも用いる
ことができる。また、6B気抵抗効果型再生ヘツドにお
いて、シールド膜が必要な場合には、再生ヘッドの上部
にパーマロイなどの軟磁性膜を積層することも可能であ
る。After that, as the insulating layer 8, AQ 203 was coated with a thickness of about 0.5 μm.
Then, a magnetoresistive reproducing head 6 is deposited thereon.
were laminated. As a reproducing head, a shunt bias type magnetoresistive element made of a Ni--Fe alloy (400 thick) and a Ti film (2000 thick) was used. Note that as the reproducing head, a magnetoresistive element using other bias methods such as a barber pole type or a permanent magnet type can also be used. Furthermore, although a magnetoresistive head is used as the reproducing head in this embodiment, an inductive thin film head may also be used. If a shield film is required in the 6B pneumatic read head, it is also possible to laminate a soft magnetic film such as permalloy on the top of the read head.
以上述べてきたように、記録ヘッドの上部を平坦にする
ことができるので、さらにその上に精度良く磁気抵抗効
果型の再生ヘッドを形成することができる。As described above, since the upper part of the recording head can be made flat, a magnetoresistive type reproducing head can be formed thereon with high accuracy.
実施例 2
本実施例を第4図を用いて説明する。実施例1と同様に
テーパエツチング法を用いて基板1を加工する(第4図
(a))。続いて下部磁極2を形成し、次に絶縁層4お
よび導体コイル3を順次積層して基板の凹部にコイルを
充填するとともに。Example 2 This example will be explained using FIG. 4. The substrate 1 is processed using the taper etching method as in Example 1 (FIG. 4(a)). Subsequently, the lower magnetic pole 2 is formed, and then the insulating layer 4 and the conductive coil 3 are sequentially laminated to fill the concave portion of the substrate with the coil.
表面を平坦化する(同図(b))。このとき各材料およ
び膜厚は、実施例1と同様である。次にギャップ層とな
る絶縁層4′としてAQzOa膜(約0.5μm)を積
層し、続いて、下部磁極とのコンタクトを取るため、樹
脂層のテーパエツチングを行なう(同図(C))。さら
に上部磁極5および絶縁M8を積層し、さらに実施例1
と同様にその上に磁気抵抗効果型の再生ヘッド6を形成
する。The surface is flattened ((b) in the same figure). At this time, each material and film thickness are the same as in Example 1. Next, an AQzOa film (approximately 0.5 .mu.m) is laminated as an insulating layer 4' serving as a gap layer, and then the resin layer is taper-etched in order to make contact with the lower magnetic pole (FIG. 4(C)). Furthermore, the upper magnetic pole 5 and the insulation M8 are laminated, and then Example 1
Similarly, a magnetoresistive type reproducing head 6 is formed thereon.
本実施例では、先の実施例と異なり、上部磁極と下部磁
極のコンタクトをとるためのコンタクトホール9を形成
する必要がある。しかしながら四部に絶縁層およびコイ
ルを充填する際に、コイル中心部に基板の凸部がないた
め、実施例1の場合より1表面の平坦化が容易に行なえ
るというメリットがある。このように本実施例によれば
、記録ヘッドの上部を平坦にすることができるので、そ
の上に精度良く再生ヘッドを形成することができる。In this embodiment, unlike the previous embodiment, it is necessary to form a contact hole 9 for making contact between the upper magnetic pole and the lower magnetic pole. However, when filling the four parts with the insulating layer and the coil, since there is no convex part of the substrate at the center of the coil, there is an advantage that one surface can be flattened more easily than in the case of the first embodiment. As described above, according to this embodiment, since the upper part of the recording head can be made flat, the reproducing head can be formed thereon with high precision.
本実施例を第5図を用いて、説明する。実施例では、基
板1′としてNi−ZnもしくはM n −Znフェラ
イトなどの強磁性基板を用いる。このため基板が下部磁
極となる6テーパエツチングにより、基板に断面がなだ
らかな凹部を形成する(同図(a))。続いて実施例1
で示したプロセスと同様に、基板凹部に絶11M4とコ
イル3を充填し、続いて上部磁極5磁気抵抗効果型再生
ヘツド6を積層する。This embodiment will be explained using FIG. 5. In the embodiment, a ferromagnetic substrate such as Ni-Zn or Mn-Zn ferrite is used as the substrate 1'. For this purpose, a concave portion with a gentle cross section is formed in the substrate by 6-taper etching, in which the substrate becomes the lower magnetic pole (FIG. 4(a)). Next, Example 1
Similarly to the process shown in 1, the recessed portion of the substrate is filled with the magnet 11M4 and the coil 3, and then the upper magnetic pole 5 and the magnetoresistive read head 6 are laminated.
実施例では、基板を下部磁極として用いるため、下部磁
極の形成が不要となり、作製工程が簡略化できる。In the example, since the substrate is used as the lower magnetic pole, it is not necessary to form the lower magnetic pole, and the manufacturing process can be simplified.
本発明によれば、基板側の溝部にコイルを形して記録ヘ
ッドの上部磁極表面を平坦にすることが、できるので、
その上に再生ヘッドとなる磁気抵抗型素子を精度良く形
成できるという効果がある。According to the present invention, it is possible to flatten the upper magnetic pole surface of the recording head by forming a coil in the groove on the substrate side.
There is an advantage that a magnetoresistive element that becomes a reproducing head can be formed with high precision thereon.
第1図は本発明の複合型磁気ヘッドの断面図、第2図は
従来の複合型磁気ヘッドの断面図、第3図〜第5図は変
発明の実施例のヘッド製作工程を示す断面図である6
1・・・基板、2・・・下部磁極、3・・・コイル、4
・・・絶縁第 1 図
纂2図
74差
嘉 3 図
4絶縁1 と艶昧j
第4図
慕5図
ビ基赦
6 再生へ、庄′FIG. 1 is a sectional view of a composite magnetic head of the present invention, FIG. 2 is a sectional view of a conventional composite magnetic head, and FIGS. 3 to 5 are sectional views showing the head manufacturing process of an embodiment of the modified invention. 6 1... Substrate, 2... Lower magnetic pole, 3... Coil, 4
...Insulation No. 1 Fig. 2 Fig. 74 Difference 3 Fig. 4 Insulation 1 and glaze j Fig. 4 Fig. 5 Fig. 6 Towards rebirth, Sho'
Claims (1)
磁気抵抗効果型磁界検出部を備えた薄膜ヘッドにおいて
、誘導型磁気ヘッドの下部磁性層、導体層および絶縁層
の一部が、あらかじめ溝加工を施した基板の溝に埋め込
まれ、上記磁性層表面が基板水平面とほぼ平行であるこ
とを特徴とする複合型薄膜磁気ヘッド。1. In a thin-film head that includes an inductive magnetic head and a magnetoresistive magnetic field detection section thereon via an electrically insulating layer, a portion of the lower magnetic layer, conductor layer, and insulating layer of the inductive magnetic head is 1. A composite thin-film magnetic head, which is embedded in a groove of a substrate which has been grooved in advance, and wherein the surface of the magnetic layer is substantially parallel to a horizontal plane of the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25362987A JPH0196814A (en) | 1987-10-09 | 1987-10-09 | Composite type thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25362987A JPH0196814A (en) | 1987-10-09 | 1987-10-09 | Composite type thin film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0196814A true JPH0196814A (en) | 1989-04-14 |
Family
ID=17254002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25362987A Pending JPH0196814A (en) | 1987-10-09 | 1987-10-09 | Composite type thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0196814A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03108113A (en) * | 1989-09-21 | 1991-05-08 | Hitachi Ltd | Composite thin-film magnetic head |
JPH03269814A (en) * | 1990-03-19 | 1991-12-02 | Hitachi Ltd | Thin-film magnetic head and production thereof |
JPH06295418A (en) * | 1993-04-09 | 1994-10-21 | Nec Corp | Combined magnetic head and magnetic recording and reproducing device |
EP0670570A2 (en) * | 1994-03-03 | 1995-09-06 | Seagate Technology International | Magnetoresistive head and method of manufacture thereof |
EP0747887A2 (en) * | 1995-06-07 | 1996-12-11 | Seagate Technology, Inc. | Method of fabricating an inverted magnetoresistive head |
EP0752700A2 (en) * | 1995-07-05 | 1997-01-08 | Sony Corporation | Complex type thin film magnetic head and production method thereof |
US5668689A (en) * | 1994-03-03 | 1997-09-16 | Seagate Technology, Inc. | Inverted magnetoresistive head |
US6008969A (en) * | 1997-12-18 | 1999-12-28 | Read-Rite Corporation | Planar recording head having formed yokes |
US6296776B1 (en) * | 1997-12-26 | 2001-10-02 | Tdk Corporation | Method of manufacturing a combination type thin film magnetic head |
US6671135B2 (en) | 1997-12-12 | 2003-12-30 | Tdk Corporation | Thin film magnetic head recessed partially into substrate and including planarization layers |
-
1987
- 1987-10-09 JP JP25362987A patent/JPH0196814A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03108113A (en) * | 1989-09-21 | 1991-05-08 | Hitachi Ltd | Composite thin-film magnetic head |
JPH03269814A (en) * | 1990-03-19 | 1991-12-02 | Hitachi Ltd | Thin-film magnetic head and production thereof |
JPH06295418A (en) * | 1993-04-09 | 1994-10-21 | Nec Corp | Combined magnetic head and magnetic recording and reproducing device |
EP0670570A3 (en) * | 1994-03-03 | 1997-01-22 | Seagate Technology | Magnetoresistive head and method of manufacture thereof. |
EP0670570A2 (en) * | 1994-03-03 | 1995-09-06 | Seagate Technology International | Magnetoresistive head and method of manufacture thereof |
US5640753A (en) * | 1994-03-03 | 1997-06-24 | Seagate Technology, Inc. | Method of fabricating an inverted magnetoresistive head |
US5668689A (en) * | 1994-03-03 | 1997-09-16 | Seagate Technology, Inc. | Inverted magnetoresistive head |
EP0747887A2 (en) * | 1995-06-07 | 1996-12-11 | Seagate Technology, Inc. | Method of fabricating an inverted magnetoresistive head |
EP0747887A3 (en) * | 1995-06-07 | 1997-02-26 | Seagate Technology | Method of fabricating an inverted magnetoresistive head |
EP0752700A2 (en) * | 1995-07-05 | 1997-01-08 | Sony Corporation | Complex type thin film magnetic head and production method thereof |
EP0752700A3 (en) * | 1995-07-05 | 1998-01-14 | Sony Corporation | Complex type thin film magnetic head and production method thereof |
US6671135B2 (en) | 1997-12-12 | 2003-12-30 | Tdk Corporation | Thin film magnetic head recessed partially into substrate and including planarization layers |
US6008969A (en) * | 1997-12-18 | 1999-12-28 | Read-Rite Corporation | Planar recording head having formed yokes |
US6296776B1 (en) * | 1997-12-26 | 2001-10-02 | Tdk Corporation | Method of manufacturing a combination type thin film magnetic head |
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