JP6351062B2 - Curable epoxy composition, film, laminated film, prepreg, laminate, cured product, and composite - Google Patents

Description

  The present invention relates to a curable epoxy composition, a film, a laminated film, a prepreg, a laminate, a cured product, and a composite.

  With the pursuit of downsizing, multi-functionalization, high-speed communication, etc. of electronic devices, there is a need for higher density circuit boards used in electronic devices. To meet such demands for higher density, Circuit boards are being made multilayered. In such a multilayer circuit board, for example, an electrical insulation layer is laminated on an inner layer substrate composed of an electrical insulation layer and a conductor layer formed on the surface thereof, and a conductor layer is formed on the electrical insulation layer. Further, it is formed by repeatedly stacking these electrical insulating layers and forming the conductor layer.

  As a material for constituting such an electrical insulating layer of the multilayer circuit board, a ceramic or a thermosetting resin is generally used. Among these, epoxy resins as thermosetting resins are widely used because they are excellent in terms of balance between economy and performance.

  As an epoxy resin material for constituting such an electrical insulating layer, for example, Patent Document 1 discloses an epoxy resin containing (A) an epoxy resin, (B) an active ester compound, and (C) a triazine-containing cresol novolak resin. A composition is disclosed. According to Patent Document 1, according to such an epoxy resin composition, although it has a low roughness, it exhibits high adhesion to a plated conductor, and has a low linear expansion coefficient and low dielectric loss tangent. It is described that a layer can be formed.

JP 2011-132507 A

  In recent years, higher performance of multilayer circuit boards has been demanded, and further improvements have been demanded for resin materials for constituting electrical insulating layers. However, on the other hand, when the present inventor examined, when the electrical insulating layer of a multilayer circuit board was formed using the epoxy resin composition described in Patent Document 1 described above, electrical characteristics (especially in the high frequency region, Characteristics) and adhesion to the conductor layer is not sufficient, and it has not been able to sufficiently respond to the downsizing, multifunctionalization, and communication speed of electronic devices.

  An object of the present invention is to provide a curable epoxy composition capable of forming an electrical insulating layer having excellent electrical characteristics in a high frequency region and adhesion with a conductor layer, and a film and a laminated film obtained using the same. It is to provide a prepreg, a laminate, a cured product, and a composite.

  As a result of earnest research to achieve the above object, the present inventor has found a curable epoxy composition comprising an epoxy compound, an active ester compound, and a polymer having a triazine structure in the side chain of the polymerization. For example, it has been found that an electrical insulating layer excellent in electrical characteristics in a high frequency region and adhesiveness with a conductor layer can be obtained, and the present invention has been completed based on such knowledge.

［上記一般式（１Ａ）及び（１Ｂ）中、Ｒ^１は、水素原子又は炭素数１〜６のアルキル基であり、Ｒ^２は、置換基を有していてもよい炭素数１〜６のアルキル基、炭素数２〜６のアルケニル基、炭素数３〜１４のシクロアルキル基、炭素数３〜１４のシクロアルケニル基、又は炭素数６〜１２のアリール基であり、Ｘ^１，Ｘ^２は、それぞれ独立して、−Ｈ、−ＯＲ^５、−ＳＲ^６、又はＮＲ^７Ｒ^８で表される基（Ｒ^５〜Ｒ^８は、それぞれ独立して、水素原子又は置換基を有していてもよい炭素数１〜１２のアルキル基、又は炭素数６〜１２のアリール基である。）であり、Ｘ^３は、化学的な単結合、又は、−Ｒ^９−Ｏ−Ｒ^１０−、−Ｒ^１１−Ｓ−Ｒ^１２−、もしくは−Ｒ^１３−Ｃ（＝Ｏ）−ＯＲ^１４−で表される基（Ｒ^９〜Ｒ^１４は、それぞれ独立して、置換基を有していてもよい炭素数１〜６のアルキレン基）である。）であり、
上記一般式（２Ａ）及び（２Ｂ）中、Ｒ^３は、水素原子又は炭素数１〜６のアルキル基であり、Ｒ^４は、置換基を有していてもよい炭素数１〜６のアルキル基、炭素数２〜６のアルケニル基、炭素数３〜１４のシクロアルキル基、炭素数３〜１４のシクロアルケニル基、又は炭素数６〜１２のアリール基であり、
前記重合体は、上記一般式（１Ａ）又は（１Ｂ）で表される化合物及び上記一般式（２Ａ）又は（２Ｂ）で表される化合物の一方あるいは両方として、それぞれ異なる構造を有する化合物を２以上用いて、縮合反応させたものであってもよい。］
〔３〕前記エポキシ硬化剤（Ｂ）が活性エステル化合物を含む、前記〔１〕又は〔２〕に記載の硬化性エポキシ組成物、
〔４〕さらに硬化促進剤を含有する前記〔１〕〜〔３〕のいずれかに記載の硬化性エポキシ組成物、
〔５〕前記〔１〕〜〔４〕のいずれかに記載の硬化性エポキシ組成物からなるフィルム、
〔６〕前記〔１〕〜〔４〕に記載の硬化性エポキシ組成物からなる接着層と、被めっき層用樹脂組成物からなる被めっき層と、を有する積層フィルム、
〔７〕前記〔５〕に記載のフィルム又は前記〔６〕に記載の積層フィルムと、繊維基材と、からなるプリプレグ、
〔８〕前記〔５〕に記載のフィルム、前記〔６〕に記載の積層フィルム又は前記〔７〕に記載のプリプレグを、基材に積層してなる積層体、
〔９〕前記〔１〕〜〔４〕のいずれかに記載の硬化性エポキシ組成物、前記〔５〕に記載のフィルム、前記〔６〕に記載の積層フィルム、前記〔７〕に記載のプリプレグ、又は前記〔８〕に記載の積層体を硬化してなる硬化物、
〔１０〕前記〔９〕に記載の硬化物の表面に導体層を形成してなる複合体、並びに
〔１１〕前記〔９〕に記載の硬化物又は前記〔１０〕に記載の複合体を構成材料として含む電子材料用基板、
が提供される。 That is, according to the present invention,
[1] A curable epoxy composition comprising an epoxy compound (A), an epoxy curing agent (B), and a polymer (C) having a triazine structure in the side chain,
[2] By causing the polymer (C) to undergo a condensation reaction between a compound represented by the following general formula (1A) or (1B) and a compound represented by the following general formula (2A) or (2B). The curable epoxy composition according to [1], which is a polymer to be obtained,

[In the above general formulas (1A) and (1B), R ¹ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R ² has 1 to 6 carbon atoms which may have a substituent. An alkyl group, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, a cycloalkenyl group having 3 to 14 carbon atoms, or an aryl group having 6 to 12 carbon atoms, and X ¹ and X ² are Each independently represents a group represented by —H, —OR ⁵ , —SR ⁶ , or NR ⁷ R ⁸ (R ^{5 to} R ⁸ each independently has a hydrogen atom or a substituent, X ³ may be a chemical single bond, or —R ⁹ —O—R ¹⁰ —, —, or an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms. ^{R 11 -S-R 12} -, or ^{-R 13 -C (= O) -OR} 14 - group represented by ^{(R 9} R ¹⁴ are each independently an alkylene group) having 1 to 6 carbon atoms which may have a substituent. ) And
In the general formulas (2A) and (2B), R ³ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R ⁴ is an alkyl having 1 to 6 carbon atoms that may have a substituent. A alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, a cycloalkenyl group having 3 to 14 carbon atoms, or an aryl group having 6 to 12 carbon atoms,
The polymer includes 2 compounds each having a different structure as one or both of the compound represented by the general formula (1A) or (1B) and the compound represented by the general formula (2A) or (2B). A condensation reaction may be used as described above. ]
[3] The curable epoxy composition according to [1] or [2], wherein the epoxy curing agent (B) includes an active ester compound,
[4] The curable epoxy composition according to any one of [1] to [3], further containing a curing accelerator,
[5] A film comprising the curable epoxy composition according to any one of [1] to [4],
[6] A laminated film having an adhesive layer made of the curable epoxy composition according to [1] to [4], and a plated layer made of a resin composition for a plated layer,
[7] A prepreg comprising the film according to [5] or the laminated film according to [6], and a fiber base material,
[8] A laminate obtained by laminating the film according to [5], the laminated film according to [6] or the prepreg according to [7] on a base material,
[9] The curable epoxy composition according to any one of [1] to [4], the film according to [5], the laminated film according to [6], and the prepreg according to [7]. Or a cured product obtained by curing the laminate according to [8],
[10] A composite formed by forming a conductor layer on the surface of the cured product according to [9], and [11] the cured product according to [9] or the composite according to [10]. A substrate for electronic materials, including as a material,
Is provided.

  ADVANTAGE OF THE INVENTION According to this invention, the curable epoxy composition which can form the electrical insulation layer excellent in the electrical property in a high frequency area | region, and adhesiveness with a conductor layer, and the film obtained by using this, a laminated film Prepregs, laminates, cured products, and composites are provided.

[Curable epoxy composition]
The curable epoxy composition of the present invention comprises an epoxy compound (A), an active ester compound (B1), and a polymer (C) having a triazine structure in the side chain.

[Epoxy compound (A)]
The epoxy compound (A) used in the present invention is not particularly limited as long as it is a compound having an epoxy group (oxirane ring), but a polyvalent epoxy compound having at least two epoxy groups in one molecule is preferably used. For example, phenol novolac type epoxy compound, bisphenol A type epoxy compound, bisphenol F type epoxy compound, polyhydric phenol type epoxy compound, brominated bisphenol A type epoxy compound, brominated bisphenol F type epoxy compound, hydrogenation Examples thereof include glycidyl ether type epoxy compounds such as bisphenol A type epoxy compounds, alicyclic epoxy compounds, glycidyl ester type epoxy compounds, and glycidyl amine type epoxy compounds. Moreover, what has alicyclic olefin, an aromatic ring, a condensed aromatic ring, a fluorene structure etc. is mentioned as frame | skeleton of the said epoxy compound. Among these, a phenol novolac type epoxy compound is preferable, and an epoxy compound having a biphenyl structure and / or a condensed polycyclic structure is particularly preferable. In the present invention, the phenol novolac type epoxy compound is typically an epoxy compound obtained by condensation polymerization of an aromatic hydroxy compound such as phenol, cresol and naphthol with an aldehyde or a ketone.

（式（３）中のｍは０〜５０の整数、Ａはアルキレン、アリーレン、アリールアルキレン、又は脂環構造から選択される少なくとも一種の二価の基であり、Ｙは水素原子、ヒドロキシル基、炭素原子数１〜１０のアルキル基、炭素原子数２〜１０のアルケニル基又は下記式（４）で表される基である。）

（式（４）中、Ｔは直接結合、メチレン、エチリデン、プロピリデン、−Ｏ−、−Ｓ−又は−ＳＯ_２−である。） Examples of the phenol novolac type epoxy compound include those having a structure represented by the following formula (3).

(In Formula (3), m is an integer of 0 to 50, A is at least one divalent group selected from alkylene, arylene, arylalkylene, or alicyclic structure, Y is a hydrogen atom, a hydroxyl group, (It is a group represented by an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or the following formula (4).)

(In the formula (4), T is a direct bond, methylene, ethylidene, propylidene, -O -, - S- or -SO ₂ - and a.)

The biphenyl structure refers to a structure in which two benzene rings are connected by a single bond. In the resulting cured resin, the biphenyl structure usually constitutes the main chain of the resin, but may be present in the side chain.
The condensed polycyclic structure refers to a structure in which two or more monocycles are condensed (condensed). The ring constituting the condensed polycyclic structure may be an alicyclic ring or an aromatic ring, and may contain a hetero atom. Although the number of condensed rings is not particularly limited, it is preferably 2 or more from the viewpoint of increasing the heat resistance and mechanical strength of the resulting electrical insulating layer, and practically, the upper limit is about 10 rings. is there. Examples of such a condensed polycyclic structure include a dicyclopentadiene structure, a naphthalene structure, a fluorene structure, an anthracene structure, a phenanthrene structure, a triphenylene structure, a pyrene structure, and an ovalen structure. The condensed polycyclic structure, like the biphenyl structure described above, usually constitutes the main chain of the resin in the resulting cured resin, but may be present in the side chain.

  The epoxy compound having a biphenyl structure and / or a condensed polycyclic structure used in the present invention has a biphenyl structure, a condensed polycyclic structure, or both a biphenyl structure and a condensed polycyclic structure. From the viewpoint of increasing the heat resistance and mechanical strength of the insulating layer, those having a biphenyl structure are preferred, and those having a biphenyl aralkyl structure are more preferred.

  In addition, when a material having a biphenyl structure (including those having both a biphenyl structure and a condensed polycyclic structure) and a material having a condensed polycyclic structure are used in combination, the heat resistance and electrical characteristics of the electrical insulating layer are improved. From the viewpoint of making them, the blending ratio is a weight ratio (a polyvalent epoxy compound having a biphenyl structure / a polyvalent epoxy compound having a condensed polycyclic structure), and usually 3/7 to 7/3 is preferable.

The epoxy compound having a biphenyl structure and / or a condensed polycyclic structure used in the present invention can be appropriately produced according to a known method, but can also be obtained as a commercial product.
Examples of commercially available epoxy compounds having a biphenyl structure include novolak-type epoxy compounds having a biphenyl aralkyl structure. For example, trade names “NC3000-FH, NC3000-H, NC3000, NC3000-L, NC3100” (above, Nippon Kayaku Co., Ltd.); and an epoxy compound having a tetramethylbiphenyl structure, for example, “YX-4000” (manufactured by Mitsubishi Chemical Corporation);
Examples of commercially available epoxy compounds having a condensed polycyclic structure are novolak-type epoxy compounds having a dicyclopentadiene structure. (Above, manufactured by DIC, “Epiclon” is a registered trademark), trade names “Tactix556, Tactix756” (above, manufactured by Huntsman Advanced Materials, “Tactix” is a registered trademark), and trade name “XD-1000-1L” , XD-1000-2L "(manufactured by Nippon Kayaku Co., Ltd.); and epoxy compounds having a fluorene structure, for example, trade names" ONCOAT EX-1010, ONCOAT EX-1011, ONCOAT EX-101 " , ONCOAT EX-1020, ONCOAT EX-1030, ONCOAT EX-1040, ONCOAT EX-1050, ONCOAT EX-1051 "(Nagase Sangyo Co., Ltd.," ONCOAT "is a registered trademark), trade name “Ogsol PG-100, Ogsol EG-200, Ogsol EG-250” (above, manufactured by Osaka Gas Chemical Co., Ltd., “Ogsol” is a registered trademark);
The above epoxy compounds having a biphenyl structure and / or a condensed polycyclic structure can be used alone or in admixture of two or more.

  In the present invention, when an epoxy compound having a biphenyl structure and / or a condensed polycyclic structure is used, a bisphenol A type epoxy compound, a bisphenol F type epoxy compound, a trivalent or higher polyhydric phenol type epoxy compound, etc. Other epoxy compounds may be used in combination. For example, by further using a trihydric or higher polyhydric phenol type epoxy compound, it becomes possible to further improve the heat resistance and electrical characteristics of the obtained electrical insulating layer.

  The trihydric or higher polyhydric phenol type epoxy compound is not particularly limited as long as it is a trihydric or higher polyhydric phenol epoxy compound, but a trivalent or higher polyhydric hydroxyphenylalkane type epoxy compound is preferable. Here, the polyvalent hydroxyphenylalkane type epoxy compound having a valence of 3 or more is a compound having a structure in which a hydroxyl group of an aliphatic hydrocarbon substituted with a 3 or more hydroxyphenyl group is glycidylated.

（式（５）中、Ｒ^１５は、それぞれ独立に水素原子又は炭素数１〜３の炭化水素基を表す。）

（式（７）中、ｐは正の整数を表す。）

Among such trivalent or higher polyvalent hydroxyphenylalkane-type epoxy compounds, trivalent to tetravalent polyvalent hydroxyphenylalkane-type epoxy compounds are more preferable, and among them, trishydroxyphenylmethane type epoxy compounds, tetrakishydroxyphenyl An ethane type epoxy compound is particularly preferably used. Among these, an epoxy compound having a structure represented by the following general formula (5) is preferable, and an epoxy compound having any structure represented by the following general formulas (6) to (8) is more preferable.

(In the formula ^{(5), R 15} each independently represent a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.)

(In formula (7), p represents a positive integer.)

The trihydric or higher polyhydric phenol type epoxy compound used in the present invention can be appropriately produced according to a known method, but is also available as a commercial product.
For example, as examples of commercially available trishydroxyphenylmethane type epoxy compounds, trade names “EPPN-503, EPPN-502H, EPPN-501H” (above, manufactured by Nippon Kayaku Co., Ltd.), trade names “TACTIX-742” (above) , Manufactured by Dow Chemical Company), “jER 1032H60” (manufactured by Mitsubishi Chemical Corporation), and the like. Moreover, as an example of a commercial item of a tetrakishydroxyphenylethane type epoxy compound, a trade name “jER 1031S” (manufactured by Mitsubishi Chemical Corporation) and the like can be given.

  The content ratio of the trihydric or higher polyhydric phenol type epoxy compound in the case of using the trihydric or higher polyhydric phenol type epoxy compound is not particularly limited, but is preferably 0.1% in the total 100% by weight of the epoxy compound to be used. It is 1 to 40 weight%, More preferably, it is 1 to 20 weight%.

  In the present invention, a phosphorus-containing epoxy compound may be used as the epoxy compound (A). As the phosphorus-containing epoxy compound, an epoxy compound having a phosphaphenanthrene structure can be preferably exemplified. By using such an epoxy compound having a phosphaphenanthrene structure, the heat resistance, electrical characteristics and It is possible to further improve the adhesion to the conductor layer and to improve the desmear property (ease of removing smear by desmear treatment).

The epoxy compound having a phosphaphenanthrene structure is not particularly limited as long as it is an epoxy compound having a phosphaphenanthrene structure represented by the following formula (9). For example, a biphenyl type epoxy compound having a phosphaphenanthrene structure, Examples thereof include a bisphenol type epoxy compound having a phosphaphenanthrene structure and a phenol novolak type epoxy compound having a phosphaphenanthrene structure.

  The epoxy compound having a phosphaphenanthrene structure is obtained by modifying the above epoxy compound by a known method using 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide or a derivative thereof. And epoxy compounds having various phosphaphenanthrene structures. Examples of such compounds include, but are not limited to, an epoxy compound having a tetramethylbiphenyl structure using 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide or a derivative thereof; Phosphorus-containing epoxy compounds having various phosphaphenanthrene structures obtained by modifying bisphenol-type epoxy compounds such as A-type epoxy compounds and bisphenol F-type epoxy compounds; and phenol novolac-type epoxy compounds; Is mentioned.

  As an epoxy compound having a phosphaphenanthrene structure used in the present invention, any epoxy compound having at least one epoxy group in the molecule can be used. It is a polyvalent epoxy compound having at least two epoxy groups in the molecule from the point that it is possible to reduce the mechanical strength and heat resistance of the layer, to lower the linear expansion coefficient, and to improve the electrical characteristics. preferable.

  The content ratio of the phosphorus-containing epoxy compound in the case of containing the phosphorus-containing epoxy compound as the epoxy compound is not particularly limited, but is preferably 20 to 90% by weight, more preferably 30% in the total 100% by weight of the epoxy compound to be used. ~ 70 wt%. By making the content rate of a phosphorus containing epoxy compound into the said range, the improvement effect of the heat resistance of the electric insulation layer obtained, an electrical property, the adhesiveness with respect to a conductor layer, and desmear property can be improved more.

[Epoxy curing agent (B)]
The epoxy curing agent (B) used in the present invention may be a compound having a function of reacting with the epoxy compound (A) and curing, and examples thereof include a compound having a phenolic hydroxyl group, an aromatic amine compound, an acid anhydride, and the like. Examples include active ester compounds. Among these, the active ester compound (B1) is preferable in consideration of electrical characteristics, moisture resistance and the like.

  The active ester compound (B1) used in the present invention may be any compound having an active ester group, but in the present invention, a compound having at least two active ester groups in the molecule is preferable. The active ester compound (B1) acts as a curing agent for the epoxy compound (A) used in the present invention by reacting the ester moiety with the epoxy group by heating.

  The active ester compound (B1) is obtained from a product obtained by reacting a carboxylic acid compound and / or a thiocarboxylic acid compound with a hydroxy compound and / or a thiol compound from the viewpoint of increasing the heat resistance of the obtained electrical insulating layer. Active ester compounds are preferable, and active ester compounds obtained by reacting a carboxylic acid compound with one or more selected from the group consisting of a phenol compound, a naphthol compound and a thiol compound are more preferable. An aromatic compound obtained from a reaction of an acid compound with an aromatic compound having a phenolic hydroxyl group and having at least two active ester groups in the molecule is particularly preferred. The active ester compound (B1) may be linear or multi-branched. For example, the active ester compound (B1) is derived from a compound having at least two carboxylic acids in the molecule. When the compound having at least two carboxylic acids in the molecule contains an aliphatic chain, the compatibility with the epoxy compound can be increased, and when it has an aromatic ring, the heat resistance is improved. Can be high.

  Specific examples of the carboxylic acid compound for forming the active ester compound (B1) include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, pyromellitic acid and the like. . Among these, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, and terephthalic acid are preferable, and phthalic acid, isophthalic acid, and terephthalic acid are more preferable, from the viewpoint of increasing the heat resistance of the obtained electrical insulating layer. More preferred are isophthalic acid and terephthalic acid.

  Specific examples of the thiocarboxylic acid compound for forming the active ester compound (B1) include thioacetic acid and thiobenzoic acid.

  Specific examples of the hydroxy compound for forming the active ester compound (B1) include hydroquinone, resorcin, bisphenol A, bisphenol F, bisphenol S, phenolphthalin, methylated bisphenol A, methylated bisphenol F, and methylated bisphenol S. , Phenol, o-cresol, m-cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, tri Examples thereof include hydroxybenzophenone, tetrahydroxybenzophenone, phloroglucin, benzenetriol, dicyclopentadienyl diphenol, and phenol novolac. Among them, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, from the viewpoint of improving the solubility of the active ester compound (B1) and increasing the heat resistance of the obtained electrical insulating layer, Dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, dicyclopentadienyl diphenol, and phenol novolac are preferable, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, dicyclopentadienyl diphenol, and phenol novolak are more preferable, More preferred are cyclopentadienyl diphenol and phenol novolac.

  Specific examples of the thiol compound for forming the active ester compound (B1) include benzenedithiol and triazinedithiol.

  The manufacturing method of an active ester compound (B1) is not specifically limited, It can manufacture by a well-known method. For example, it can be obtained by the condensation reaction of the carboxylic acid compound and / or thiocarboxylic acid compound and the hydroxy compound and / or thiol compound.

  In the present invention, as the active ester compound (B1), for example, an aromatic compound having an active ester group disclosed in JP-A-2002-12650 and a polyfunctional compound disclosed in JP-A-2004-277460 are disclosed. Polyester or commercially available products can be used. Examples of commercially available products include trade names “EXB 9451, EXB 9460, EXB 9460 S, Epicron HPC-8000-65T” (manufactured by DIC, “Epicron” is a registered trademark), and trade name “DC808” (manufactured by Japan Epoxy Resin). And trade name “YLH1026” (manufactured by Japan Epoxy Resin Co., Ltd.).

  The compounding amount of the active ester compound (B1) in the curable epoxy composition of the present invention is preferably 10 to 150 parts by weight, more preferably 15 to 130 parts by weight with respect to 100 parts by weight of the epoxy compound (A) used. Parts, more preferably in the range of 20 to 120 parts by weight. Further, the equivalent ratio of the epoxy compound (A) to the active ester compound (B1) used in the curable epoxy composition [the epoxy of the epoxy compound (A) with respect to the total number of active ester groups of the active ester compound (B1)) The ratio of the total number of groups (epoxy group amount / active ester group amount)] is preferably 0.5 to 1.5, more preferably 0.7 to 1.4, and still more preferably 0.8 to 1.3. Particularly preferably, it is in the range of 0.9 to 1.1. By making the compounding quantity of an active ester compound (B1) into the said range, the electrical property and heat resistance of the electrical insulation layer which are obtained can be improved, and a thermal expansion coefficient can be restrained small.

[Polymer having triazine structure in side chain (C)]
The polymer (C) having a triazine structure in the side chain used in the present invention (hereinafter referred to as “triazine structure-containing polymer (C)” as appropriate) is a polymer having a triazine structure in the side chain of the polymer. It is. In the present invention, “having a triazine structure in the side chain” does not mean that the triazine structure constitutes the main chain of the polymer, but the triazine structure is directly on the main chain of the polymer or other group. It means a state of being connected through. In addition, the triazine structure-containing polymer (C) may have a cyclic main chain structure, and even in this case, the triazine structure is not substantially taken into the cyclic main chain structure. It has a simple structure. In the present invention, by blending such a triazine structure-containing polymer (C) in the curable epoxy composition, the resulting electrical insulation layer is excellent in electrical properties, and from a metal foil or the like. It is possible to improve the adhesion to the conductor layer.

The triazine structure-containing polymer (C) is not particularly limited as long as it is a polymer having a triazine structure in the side chain. However, from the viewpoint that the effect of improving the adhesion to the conductor layer becomes more remarkable, the following general formula The triazine structure-containing polymer (C1) obtained by subjecting the compound represented by (1A) or (1B) and the compound represented by the following general formula (2A) or (2B) to a condensation reaction is preferable. .

In the general formulas (1A) and (1B), R ¹ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms. R ² is an optionally substituted alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, and a cycloalkenyl group having 3 to 14 carbon atoms. Or an aryl group having 6 to 12 carbon atoms. X ¹ and X ² are each independently a group represented by —H, —OR ⁵ , —SR ⁶ , or NR ⁷ R ⁸ (R ^{5 to} R ⁸ are each independently a hydrogen atom or It is a C1-C12 alkyl group which may have a substituent, or a C6-C12 aryl group.), Preferably, it is group represented by -NR < ⁷ > R < ⁸ >. Further, X ³ is a chemical single bond, or —R ⁹ —O—R ¹⁰ —, —R ¹¹ —S—R ¹² —, or —R ¹³ —C (═O) —OR ¹⁴ —. Group (R ^{9 to} R ¹⁴ are each independently an optionally substituted alkylene group having 1 to 6 carbon atoms), preferably —R ¹¹ —S—R ¹² —. It is a group represented.

On the other hand, in the general formula (2A) and (2B), ^{R 3} is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms. R ⁴ is an optionally substituted alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, and a cycloalkenyl group having 3 to 16 carbon atoms. Or an aryl group having 6 to 14 carbon atoms.

  The triazine structure-containing polymer (C1) used in the present invention is represented by the compound represented by the general formula (1A) or (1B) and the general formula (2A) or (2B) as described above. The unit based on the compound represented by the above general formula (1A) or (1B) exhibits an effect of improving the adhesion strength to the conductor layer due to the effect of the triazine structure. Moreover, the unit based on the compound represented by the said general formula (2A) or (2B) has an effect | action which improves compatibility with an epoxy compound (A). And by using such a triazine structure containing polymer (C1), the adhesiveness with respect to the conductor layer of the electric insulation layer obtained can be improved more appropriately.

In obtaining the triazine structure-containing polymer (C1) used in the present invention, the compound represented by the general formula (1A) or (1B) and the compound represented by the general formula (2A) or (2B) Table in as a method of condensation reaction is not particularly limited, for example, -OR ¹ group of the compound represented by the above general formula (1A) or (1B), and the general formula (2A) or (2B) bets Hydrolyzate of the compound represented by the general formula (1A) or (1B) obtained by hydrolyzing -OR ² group of the compound obtained, and the compound represented by the general formula (2A) or (2B) And a method of dehydrating and condensing the hydrolyzate. In this case, the hydrolysis reaction and the dehydration / condensation reaction may be carried out according to known methods.

Further, as the compound represented by the general formula (1A) or (1B), a plurality of compounds in which any of R ² , X ¹ , X ² and X ³ are different from each other may be used. As a unit based on the compound represented by the general formula (1A) or (1B), a plurality of units in which any of X ¹ , X ² and X ³ is different from each other are contained in the triazine structure-containing polymer (C1). Can be introduced. Similarly, as the compound represented by the general formula (2A) or (2B), a plurality of compounds having different R ^{4 s} may be used. In this case, in the general formula (2A) or (2B) As the unit based on the represented compound, a plurality of units having different R ^{4 s} can be introduced into the triazine structure-containing polymer (C1).

Thus, the triazine structure-containing polymer obtained by condensation reaction of the compound represented by the general formula (1A) or (1B) and the compound represented by the general formula (2A) or (2B). (C1) is considered to have the following structural units, for example. That is, as a unit based on the compound represented by the general formula (1A) or (1B), a unit represented by the following general formula (10) is provided, and is represented by the general formula (2A) or (2B). The unit based on the compound is considered to have a unit represented by the following general formula (11).

Here, in the general formula (10), X ^{1 to} X ³ are the same as the general formulas (1A) and (1B), and Y ¹ is R ² (R ² is the general formula (1A)). , -OH, or -OR ¹ (R ¹ is the same as in the above general formulas (1A) and (1B)), or in the above general formula (10). Or a unit represented by the general formula (11). That is, in the unit represented by the general formula (10), at least of three or two —OR ¹ groups present in the compound represented by the general formula (1A) or (1B) Two are involved in the condensation reaction to form a condensed structure, while for one remaining —OR ¹ group, some are not involved in the condensation reaction and are —OH or —OR ¹ The remaining group remains, and the remainder is involved in the condensation reaction, so that another unit (that is, the unit represented by the general formula (10) and the general formula (11)) is represented. It is considered that a condensed structure is formed together with the unit.

In the general formula (11), R ⁴ is the same as the general formulas (2A) and (2B), and Y ² is R ⁴ (R ⁴ is the general formulas (2A) and (2B)). The group represented by —OH or —OR ³ (R ³ is the same as in the above general formulas (2A) and (2B)), or the unit represented by the above general formula (10), Or it is a unit represented by the said General formula (11). That is, in the unit represented by the general formula (11), at least of the ^three or two —OR ³ groups present in the compound represented by the general formula (2A) or (2B), at least Two are involved in the condensation reaction to form a condensed structure, while one remaining —OR ³ group that is not involved in the condensation reaction is partly —OH or —OR ³ The remaining group remains, and the remainder is involved in the condensation reaction, so that another unit (that is, the unit represented by the general formula (10) and the general formula (11)) is represented. It is considered that a condensed structure is formed together with the unit.

  In the triazine structure-containing polymer (C1) used in the present invention, a unit based on the compound represented by the general formula (1A) or (1B) and the general formula (2A) or (2B) The ratio of the unit based on the compound may be appropriately set according to the adhesion to the target conductor layer and the compatibility with the epoxy compound (A), but “in the above general formula (1A) or (1B)” The molar ratio of the unit based on the compound represented: the unit based on the compound represented by the general formula (2A) or (2B) above, preferably 0.1: 99.9 to 20:80, more preferably 5 : 95 to 15: 85. In addition, the ratio of the unit based on the compound represented by the general formula (1A) or (1B) and the unit based on the compound represented by the general formula (2A) or (2B) is the above-described ratio used for the condensation reaction. It can be controlled by adjusting the ratio between the compound represented by the general formula (1A) or (1B) and the compound represented by the above general formula (2A) or (2B).

Further, as the triazine structure-containing polymer (C), instead of the above-described triazine structure-containing polymer (C1), or together with the triazine structure-containing polymer (C1), a unit represented by the following general formula (12) and A triazine structure-containing polymer (C2) having a unit represented by the following general formula (13) may be used.

In the general formula (12), X ⁴ and X ⁵ are each independently a group represented by —H, —OR ¹⁷ , —SR ¹⁸ , or NR ¹⁹ R ²⁰ (R ^{17 to} R ²⁰ are each represented by Independently, a hydrogen atom or an optionally substituted alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms), preferably —NR ¹⁹ R ²⁰ It is a group represented. In the general formula (12), X ⁶ represents a chemical single bond, —R ²¹ —O—R ²² —, —R ²³ —S—R ²⁴ —, or R ²⁵ —C (═O ) —OR ²⁶ — (R ^{21 to} R ²⁶ are each independently an alkylene group having 1 to 6 carbon atoms which may have a substituent), preferably a chemical group. It is a single bond. The triazine structure-containing polymer (C2) may contain a plurality of units in which any of X ⁴ , X ⁵ and X ⁶ is different from each other as the unit represented by the general formula (12).

On the other hand, in the general formula (13), X ^{7 to} X ¹⁰ are each independently —H, —R ²⁷ , —OR ²⁸ , —O—C (═O) —R ²⁹ , —C (═O ) -OR ³⁰ or a group represented by O—C (═O) —OR ³¹ (R ^{27 to} R ³¹ each independently represents a hydrogen atom or a carbon atom which may have a substituent 1 An alkyl group having 6 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, a cycloalkenyl group having 3 to 14 carbon atoms, or an aryl group having 6 to 12 carbon atoms. . The triazine structure-containing polymer (C2) used in the present invention may contain a plurality of units in which any of X ^{7 to} X ¹⁰ is different from each other as the unit represented by the general formula (13). Good.

  As described above, the triazine structure-containing polymer (C2) used in the present invention has a unit represented by the general formula (12) and a unit represented by the general formula (13). Similar to the triazine structure-containing polymer (C1) described above, the unit represented by the general formula (12) exhibits an effect of improving the adhesion strength to the conductor layer due to the effect of the triazine structure, and the general formula (13). The unit represented by) has an action of improving the compatibility with the epoxy compound (A). And thereby, the adhesiveness with respect to the conductor layer of the electrically insulating layer obtained can be improved more appropriately.

  In the triazine structure-containing polymer (C2) used in the present invention, the ratio of the unit represented by the general formula (12) and the unit represented by the general formula (13) is the target conductor layer. May be appropriately set according to the adhesion to the epoxy compound and the compatibility with the epoxy compound (A), but “unit represented by the general formula (12): unit represented by the general formula (13)” The molar ratio is preferably 0.01: 99.99 to 20:80, more preferably 2:98 to 5:95. The weight average molecular weight of the triazine structure-containing polymer (C2) is preferably 1,000 to 100,000, more preferably 2,000 to 12,000.

（上記一般式（１４）、（１５）中、Ｘ^４〜Ｘ^１０は、上記一般式（１２）、（１３）と同様である。） The triazine structure-containing polymer (C2) can be usually produced by copolymerizing a compound represented by the following general formula (14) and a compound represented by the following general formula (15). The form of copolymerization may be any form of block copolymerization or random copolymerization, but block copolymerization is preferred from the viewpoint that the operational effects become more prominent. In addition, as a unit represented by the general formula (12), when any of X ⁴ , X ⁵ and X ⁶ contains a plurality of different units, a compound represented by the following general formula (14) A plurality of corresponding compounds may be used. Similarly, when a unit represented by any one of X ^{7 to} X ¹⁰ is a unit represented by the general formula (13), A plurality of corresponding compounds may be used as the compound represented by the formula (15).

(In the general formulas (14) and (15), X ^{4 to} X ¹⁰ are the same as the above general formulas (12) and (13).)

  The blending amount of the triazine structure-containing polymer (C) in the curable epoxy composition of the present invention is preferably 0.1 to 40 parts by weight, more preferably 0 with respect to 100 parts by weight of the epoxy compound (A). .5 to 20 parts by weight, more preferably 1 to 15 parts by weight. If the blending amount of the triazine structure-containing polymer (C) is too small, it is difficult to obtain an effect of improving the adhesion to the conductor layer. On the other hand, if the blending amount is too large, the adhesion to the conductor layer is reduced or the electrical properties are reduced. And storage stability may be reduced.

[Other ingredients]
The curable epoxy composition of the present invention may further contain other components as described below in addition to the above-described components, as long as the effects of the present invention are not inhibited.

  By mix | blending a filler with the curable epoxy composition of this invention, the electrically insulating layer obtained can be made into a low linear expansion thing. As the filler, any of known inorganic fillers and organic fillers can be used, but inorganic fillers are preferred. Specific examples of inorganic fillers include calcium carbonate, magnesium carbonate, barium carbonate, zinc oxide, titanium oxide, magnesium oxide, magnesium silicate, calcium silicate, zirconium silicate, hydrated alumina, magnesium hydroxide, aluminum hydroxide , Barium sulfate, silica, talc, clay and the like. Among these, silica is preferable because it is excellent in mechanical properties, heat resistance, and electrical properties of the obtained electrical insulating layer. The volume average particle diameter of the filler is preferably 0.10 μm or more and 10 μm or less, more preferably 0.1 μm or more and 2 μm or less, and further preferably 0.15 μm or more and 1 μm or less. In addition, it is preferable that the filler to be used is a surface-treated in advance with a silane coupling agent or the like because the dispersibility of the filler in the curable epoxy composition and the water resistance of the obtained cured product are excellent. Although it does not specifically limit as content of the filler in the curable epoxy composition of this invention, It is 30 to 90 weight% normally in conversion of solid content, Preferably it is 50 to 80 weight%.

  Moreover, you may make the curable epoxy composition of this invention contain a hardening accelerator if desired. The curing accelerator is not particularly limited, and examples thereof include aliphatic polyamines, aromatic polyamines, secondary amines, tertiary amines, acid anhydrides, imidazole derivatives, organic acid hydrazides, dicyandiamide and derivatives thereof, urea derivatives, and the like. Can be mentioned. Of these, imidazole derivatives are particularly preferable.

  The imidazole derivative is not particularly limited as long as it is a compound having an imidazole skeleton, and examples thereof include 2-ethylimidazole, 2-ethyl-4-methylimidazole, bis-2-ethyl-4-methylimidazole, and 1-methyl. Alkyl-substituted imidazole compounds such as 2-ethylimidazole, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-heptadecylimidazole; 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2- Aryl groups and aralkyl groups such as methylimidazole, 1-benzyl-2-ethylimidazole, 1-benzyl-2-phenylimidazole, benzimidazole, 2-ethyl-4-methyl-1- (2′-cyanoethyl) imidazole, etc. Environment Such as imidazole compounds substituted with a hydrocarbon group containing a like. These can be used individually by 1 type or in combination of 2 or more types.

  As a compounding quantity of the hardening accelerator in the curable epoxy composition of this invention, it is 0.1-10 weight part normally with respect to 100 weight part of epoxy compounds (A), Preferably it is 0.5-8 weight part. It is.

  Furthermore, an alicyclic olefin polymer having a polar group can be blended in the curable epoxy composition of the present invention. Examples of the polar group include a group having a structure capable of reacting with an epoxy group to form a covalent bond, and a group containing a hetero atom and having no reactivity with the epoxy group, and containing a hetero atom. And a group having no reactivity with an epoxy group is preferred. Such an alicyclic olefin polymer does not have reactivity with an epoxy group, and therefore does not substantially contain a functional group having reactivity with an epoxy group. Here, “substantially does not contain a functional group having reactivity with an epoxy group” means that an alicyclic olefin polymer inhibits a functional group having reactivity with an epoxy group, and the expression of the effect of the present invention is inhibited. It means that it does not contain to the extent to be done. Examples of the functional group having reactivity with an epoxy group include groups having a structure capable of reacting with an epoxy group to form a covalent bond, such as a primary amino group, a secondary amino group, a mercapto group, a carboxyl group, Examples include heteroatom-containing functional groups that react with epoxy groups to form covalent bonds, such as carboxylic anhydride groups, hydroxy groups, and epoxy groups.

  The alicyclic olefin polymer includes, for example, an alicyclic olefin monomer (a) containing no hetero atom and containing an aromatic ring, and an alicyclic olefin monomer containing no hetero ring and containing a hetero atom. Body (b), an alicyclic olefin monomer (c) containing both an aromatic ring and a heteroatom, and the alicyclic olefin monomer (a) not containing both an aromatic ring and a heteroatom It can be easily obtained by appropriately combining monomers (d) copolymerizable with (c) and polymerizing according to a known method. The resulting polymer may be further hydrogenated.

  The amount of the alicyclic olefin polymer having a polar group in the curable epoxy composition of the present invention is not particularly limited, but is usually 50 with respect to 100 parts by weight of the epoxy compound (A). The amount is not more than parts by weight, preferably not more than 35 parts by weight.

  Furthermore, the curable epoxy composition of the present invention is used for forming a general electrical insulating film such as a halogen-based flame retardant or a phosphate ester-based flame retardant for the purpose of improving the flame retardancy of the obtained electrical insulating layer. You may mix | blend suitably the flame retardant mix | blended with this resin composition.

  In addition, the curable epoxy composition of the present invention may further include a flame retardant aid, a heat resistance stabilizer, a weather resistance stabilizer, an anti-aging agent, an ultraviolet absorber (laser processability improver), a leveling agent, an antistatic agent, if desired. Known components such as an agent, a slip agent, an antiblocking agent, an antifogging agent, a lubricant, a dye, a natural oil, a synthetic oil, a wax, an emulsion, a magnetic substance, a dielectric property adjusting agent, and a toughening agent may be appropriately blended.

  The method for producing the curable epoxy composition of the present invention is not particularly limited, and the above components may be mixed as they are, or may be mixed in a state dissolved or dispersed in an organic solvent. Then, a composition in which a part of each of the above components is dissolved or dispersed in an organic solvent is prepared, and the remaining components may be mixed with the composition.

(the film)
The film of this invention is a molded object formed by shape | molding the curable epoxy composition of this invention mentioned above in a sheet form or a film form.

  When the curable epoxy composition of the present invention is molded into a sheet or film to obtain a molded product, the curable epoxy composition of the present invention is applied to a support with an organic solvent added as desired. It is preferably obtained by spraying or casting and then drying.

  Examples of the support used at that time include resin films and metal foils. Examples of the resin film include polyethylene terephthalate film, polypropylene film, polyethylene film, polycarbonate film, polyethylene naphthalate film, polyarylate film, and nylon film. Among these films, a polyethylene terephthalate film or a polyethylene naphthalate film is preferable because of excellent heat resistance, chemical resistance, and peelability. Examples of the metal foil include copper foil, aluminum foil, nickel foil, chrome foil, gold foil, and silver foil.

  The thickness of the sheet-like or film-like molded body is not particularly limited, but is usually 1 to 150 μm, preferably 2 to 100 μm, more preferably 5 to 80 μm from the viewpoint of workability and the like.

  Examples of the method for applying the curable epoxy composition of the present invention include dip coating, roll coating, curtain coating, die coating, slit coating, and gravure coating.

  In the present invention, it is preferable that the curable epoxy composition of the present invention is in an uncured or semi-cured state as a sheet-shaped or film-shaped molded body. Here, uncured means a state where substantially all of the epoxy compound (A) is dissolved when the molded body is immersed in a solvent capable of dissolving the epoxy compound (A) used in the preparation of the composition. Say. The semi-curing is a state where it is cured to the middle so that it can be cured by further heating. Preferably, the epoxy compound (A) used for the preparation of the composition is dissolved in a solvent capable of dissolving the epoxy compound (A). A) is partly dissolved (specifically, an amount of 7% by weight or more and a part of which remains), or the molded body is immersed in a solvent for 24 hours. It means a state in which the later volume is 200% or more (swelling rate) of the volume before immersion.

  Moreover, after apply | coating the curable epoxy composition of this invention on a support body, you may dry if desired. The drying temperature is preferably a temperature at which the curable epoxy composition of the present invention is not cured, and is usually 20 to 300 ° C, preferably 30 to 200 ° C. If the drying temperature is too high, the curing reaction proceeds too much, and the resulting molded article may not be in an uncured or semi-cured state. The drying time is usually 30 seconds to 1 hour, preferably 1 minute to 30 minutes.

  And the film of this invention obtained in this way is used in the state made to adhere on a support body, or peeling from a support body.

(Laminated film)
The laminated film of the present invention has an adhesive layer composed of the curable epoxy composition described above and a layer to be plated composed of a resin composition for a layer to be plated.

  The layer to be plated is not particularly limited, but from the viewpoint of improving the electrical properties and heat resistance of the laminated film, 50% by weight or more of the resin constituting the layer is composed of an alicyclic olefin polymer. preferable. As a resin composition for a to-be-plated layer for forming such a to-be-plated layer, what contains the alicyclic olefin polymer which has a polar group, and a hardening | curing agent is preferable.

  The alicyclic olefin polymer having a polar group is not particularly limited, and examples of the alicyclic structure include those having a cycloalkane structure or a cycloalkene structure. Those having a cycloalkane structure are preferred because of excellent mechanical strength and heat resistance. The polar groups contained in the alicyclic olefin polymer include alcoholic hydroxyl groups, phenolic hydroxyl groups, carboxyl groups, alkoxyl groups, epoxy groups, glycidyl groups, oxycarbonyl groups, carbonyl groups, amino groups, carboxylic acid anhydrides. Physical group, sulfonic acid group, phosphoric acid group and the like. Among these, a carboxyl group, a carboxylic acid anhydride group, and a phenolic hydroxyl group are preferable, and a carboxylic acid anhydride group is more preferable.

  The curing agent contained in the resin composition for the layer to be plated is not particularly limited as long as it can form a crosslinked structure in the alicyclic olefin polymer having a polar group by heating, and is not particularly limited. The hardening | curing agent mix | blended with the resin composition for insulating film formation can be used. As the curing agent, it is preferable to use a compound having two or more functional groups capable of reacting with the polar group of the alicyclic olefin polymer having the polar group to be used to form a bond.

For example, as an alicyclic olefin polymer having a polar group, a curing agent suitably used when using an alicyclic olefin polymer having a carboxyl group, a carboxylic anhydride group, or a phenolic hydroxyl group includes a polyvalent epoxy. Examples thereof include compounds, polyvalent isocyanate compounds, polyvalent amine compounds, polyvalent hydrazide compounds, aziridine compounds, basic metal oxides, and organometallic halides. These may be used alone or in combination of two or more. Moreover, you may use as a hardening | curing agent by using together these compounds and a peroxide.
Among these, as the curing agent, the reactivity with the polar group of the alicyclic olefin polymer having a polar group is moderate, and the handling of the resin composition for the plated layer is facilitated. In particular, glycidyl ether type epoxy compounds and alicyclic polyvalent epoxy compounds are particularly preferably used.

  The compounding amount of the curing agent in the resin composition for the plating layer is preferably 1 to 100 parts by weight, more preferably 5 to 80 parts by weight with respect to 100 parts by weight of the alicyclic olefin polymer having a polar group. More preferably, it is in the range of 10 to 50 parts by weight. By making the compounding quantity of a hardening | curing agent into the said range, the mechanical strength and electrical property of the hardened | cured material obtained by hardening | curing the laminated | multilayer film of this invention can be made favorable.

  Moreover, the resin composition for to-be-plated layer used by this invention may contain the hindered phenol compound and the hindered amine compound other than the said component.

  Moreover, the resin composition for to-be-plated layers used by this invention may contain the hardening accelerator other than the said component. As the curing accelerator, a curing accelerator blended in a general resin composition for forming an electric insulation film may be used. For example, the same curing accelerator as that of the curable epoxy composition of the present invention described above is used. be able to. The blending amount of the curing accelerator in the resin composition for the layer to be plated may be appropriately selected according to the purpose of use, but is preferably 0 with respect to 100 parts by weight of the alicyclic olefin polymer having a polar group. 0.001 to 30 parts by weight, more preferably 0.01 to 10 parts by weight, and still more preferably 0.03 to 5 parts by weight.

  Furthermore, the resin composition for to-be-plated layer used by this invention may contain the filler other than the said component. As a filler, the thing similar to the filler used for the curable epoxy composition mentioned above can be used. The compounding amount of the filler in the resin composition for a layer to be plated is usually 1 to 50% by weight, preferably 2 to 45% by weight, more preferably 3 to 35% by weight in terms of solid content. .

  Moreover, the resin composition for to-be-plated layer used by this invention is a hardening accelerator, a flame retardant, a flame retardant adjuvant, and a heat stabilizer other than the said component similarly to the curable epoxy composition of this invention mentioned above. , Weathering stabilizer, anti-aging agent, UV absorber (laser processability improver), leveling agent, antistatic agent, slip agent, anti-blocking agent, anti-fogging agent, lubricant, dye, natural oil, synthetic oil, wax, Known components such as emulsions, magnetic materials, dielectric property adjusting agents, toughening agents, and the like may be appropriately blended. What is necessary is just to select suitably the mixture ratio of these arbitrary components in the range which does not impair the objective of this invention.

  The method for producing the resin composition for a layer to be plated used in the present invention is not particularly limited, and the above components may be mixed as they are, or mixed in a state dissolved or dispersed in an organic solvent. Alternatively, a composition in which a part of each of the above components is dissolved or dispersed in an organic solvent may be prepared, and the remaining components may be mixed with the composition.

  The laminated film of the present invention is produced using such a resin composition for a layer to be plated and the above-described curable epoxy composition of the present invention. Specifically, the laminated film of the present invention has, for example, the following two methods: (1) The above-described resin composition for a layer to be plated is applied, spread or cast on a support, and is dried as desired. Next, a method of producing the above-described curable epoxy composition by further coating or casting thereon and drying as desired; (2) coating the above-described resin composition for a layer to be plated on a support; The molded body for a layer to be plated formed by spraying or casting and, if desired, dried to form a sheet or film, and the above-described curable epoxy composition applied, spread or cast on the support. Then, it can be produced by a method of producing a laminate by laminating and molding the adhesive layer molded body formed into a sheet or film after drying if desired. Among these production methods, the production method (1) is preferred because it is an easier process and is excellent in productivity.

  In the production method of (1) above, a curable epoxy is applied to the resin composition for a layer to be plated, which is applied, spread or cast on the support, and when the resin composition for the layer to be plated is applied, spread or cast. When the composition is applied, dispersed or cast, or in the production method of (2) above, the resin composition for the layer to be plated and the curable epoxy composition are formed into a sheet shape or a film shape for the layer to be plated. When forming the molded body and the molded body for the adhesive layer, the resin composition for the layer to be plated or the curable epoxy composition may be applied, spread or cast on the support by adding an organic solvent as desired. preferable.

  Examples of the support used at that time include resin films and metal foils. Examples of the resin film include polyethylene terephthalate film, polypropylene film, polyethylene film, polycarbonate film, polyethylene naphthalate film, polyarylate film, and nylon film. Among these films, a polyethylene terephthalate film or a polyethylene naphthalate film is preferable from the viewpoint of heat resistance, chemical resistance, peelability, and the like. Examples of the metal foil include copper foil, aluminum foil, nickel foil, chrome foil, gold foil, and silver foil. The average surface roughness Ra of the support is usually 300 nm or less, preferably 150 nm or less, more preferably 100 nm or less.

  The thickness of the resin composition for the plating layer and the curable epoxy composition in the manufacturing method of (1) described above, or the thickness of the molded body for the plating layer and the molding of the adhesive layer in the manufacturing method of (2) described above. Although there is no particular limitation, the thickness of the layer to be plated when the laminated film is formed is preferably 1 to 10 μm, more preferably 1.5 to 8 μm, still more preferably 2 to 5 μm, and the thickness of the adhesive layer is The thickness is preferably 10 to 100 μm, more preferably 10 to 80 μm, and still more preferably 15 to 60 μm. If the thickness of the layer to be plated is too thin, the formability of the conductor layer may be reduced when the conductor layer is formed by electroless plating on the cured product obtained by curing the laminated film. If the thickness of the layer to be plated is too thick, the linear expansion of the cured product obtained by curing the laminated film may be increased. Moreover, when the thickness of an adhesive layer is too thin, there exists a possibility that the wiring embedding property of a laminated | multilayer film may fall.

  Examples of the method for applying the resin composition for the layer to be plated and the curable epoxy composition include dip coating, roll coating, curtain coating, die coating, slit coating, and gravure coating.

  In addition, after the resin composition for a plating layer in the manufacturing method of (1) described above is applied, spread or cast on a support, or a curable epoxy composition is applied on the resin composition for a plating layer. After spraying or casting, or after applying the resin composition for a layer to be plated and the curable epoxy composition on the support in the production method of (2), drying may be performed as desired. . The drying temperature is preferably a temperature at which the resin composition for a layer to be plated and the curable epoxy composition are not cured, and is usually 20 to 300 ° C, preferably 30 to 200 ° C. The drying time is usually 30 seconds to 1 hour, preferably 1 minute to 30 minutes.

  In the laminated film of the present invention, the layer to be plated and the adhesive layer constituting the laminated film are preferably in an uncured or semi-cured state. By making these into an uncured or semi-cured state, the laminated film of the present invention can be made highly adhesive. Moreover, the laminated film of this invention can exhibit the plating peeling strength which was excellent by the to-be-plated layer by forming a to-be-plated layer.

(Prepreg)
The prepreg of the present invention comprises a fiber base material in the above-described film of the present invention or the laminated film of the present invention.

  Examples of the fiber base material include organic fibers such as polyamide fiber, polyaramid fiber and polyester fiber, and inorganic fibers such as glass fiber and carbon fiber. Moreover, as a form of a fiber base material, the form of woven fabrics, such as a plain weave or a twill weave, the form of a nonwoven fabric, etc. are mentioned. The thickness of the fiber substrate is preferably 5 to 100 μm, and preferably in the range of 10 to 50 μm. If it is too thin, handling becomes difficult, and if it is too thick, the resin layer becomes relatively thin and the wiring embedding property may be insufficient.

  When the prepreg of the present invention comprises the above-described film of the present invention and a fiber substrate, the prepreg of the present invention impregnates the fiber substrate with the curable epoxy composition of the present invention. Can be manufactured. In this case, the method for impregnating the fiber base material with the curable epoxy composition of the present invention is not particularly limited, but an organic solvent is added to the curable epoxy composition of the present invention in order to adjust the viscosity and the like. And a method of immersing a fiber substrate in a curable epoxy composition to which an organic solvent has been added, a method of applying or spraying a curable epoxy composition to which an organic solvent has been added to the fiber substrate, and the like. In the method of coating or spraying, a curable epoxy composition to which an organic solvent is added can be applied or sprayed on a fiber substrate placed on a support. In the present invention, as the sheet-shaped or film-shaped composite molded body, the curable epoxy composition of the present invention is in an uncured or semi-cured state, similarly to the above-described sheet-shaped or film-shaped molded body. It is preferably contained.

  Moreover, after impregnating the fiber base material with the curable epoxy composition of this invention, you may dry as desired. The drying temperature is preferably a temperature at which the curable epoxy composition of the present invention is not cured, and is usually 20 to 300 ° C, preferably 30 to 200 ° C. If the drying temperature is too high, the curing reaction proceeds too much, and the resulting composite molded article may not be in an uncured or semi-cured state. The drying time is usually 30 seconds to 1 hour, preferably 1 minute to 30 minutes.

  Alternatively, when the prepreg of the present invention comprises a fiber base material in the above-described laminated film of the present invention, the prepreg of the present invention has an adhesive layer on one surface and a plate to be plated on the other surface. It is preferable that the layer has a fiber substrate inside, and the production method thereof is not limited. For example, the following methods are used: (1) Curable epoxy composition film with support and layer to be plated with support A method of producing a resin composition film by laminating the resin layer side of each film so that the fiber base material is sandwiched between them, and laminating under conditions of pressure, vacuum, heating, etc. as desired; (2) Either a curable epoxy composition or a resin composition for a layer to be plated is impregnated into a fiber base, and if necessary, a prepreg is produced by drying, and the other resin composition is applied to, dispersed in, or spread on this prepreg. Casting Or the other method of producing a laminate by laminating a resin composition film with a support; (3) applying, dispersing or coating either a curable epoxy composition or a resin composition for a layer to be plated on a support; It is possible to manufacture by laminating by casting or the like, superimposing a fiber base material thereon, further laminating by applying, spreading or casting the other resin composition from above, and drying as desired. . In any method, an organic solvent is added to the composition as desired, and the viscosity of the composition is adjusted to improve the workability in impregnation into the fiber base material, application to the support, spraying or casting. It is preferable to control.

  In addition, as a support used in this case, a polyethylene terephthalate film, a polypropylene film, a polyethylene film, a polycarbonate film, a polyethylene naphthalate film, a polyarylate film, a nylon film, a copper film, an aluminum foil, a nickel foil, Metal foils, such as chrome foil, gold foil, and silver foil, are mentioned, and these may be attached not only to one side of the prepreg but also to both sides.

  The thickness of the prepreg of the present invention is not particularly limited, but the thickness of the layer to be plated is preferably 1 to 10 μm, more preferably 1.5 to 8 μm, still more preferably 2 to 5 μm, and the thickness of the adhesive layer is The thickness is preferably 10 to 100 μm, more preferably 10 to 80 μm, and still more preferably 15 to 60 μm.

  Examples of the method for applying the resin composition for a layer to be plated and the curable epoxy composition when producing the prepreg of the present invention include dip coating, roll coating, curtain coating, die coating, slit coating, and gravure coating. .

  Moreover, in the prepreg of this invention, it is preferable that the resin composition which comprises a prepreg is a non-hardened or semi-hardened state similarly to the film and laminated | multilayer film of this invention mentioned above.

  And the prepreg of this invention obtained in this way can be made into hardened | cured material by heating this and making it harden | cure.

  The curing temperature is usually 30 to 400 ° C, preferably 70 to 300 ° C, more preferably 100 to 200 ° C. The curing time is 0.1 to 5 hours, preferably 0.5 to 3 hours. The heating method is not particularly limited, and may be performed using, for example, an electric oven.

(Laminate)
The laminate of the present invention is obtained by laminating the above-described film, laminated film or prepreg of the present invention on a substrate. As the laminate of the present invention, at least the film of the present invention, the laminated film or the prepreg described above may be laminated, but the substrate having the conductor layer on the surface, the film of the present invention described above, and the laminate What laminates | stacks the electrical insulation layer which consists of a film or a prepreg is preferable.

  A substrate having a conductor layer on the surface has a conductor layer on the surface of the electrically insulating substrate. The electrically insulating substrate is a resin containing a known electrically insulating material (for example, alicyclic olefin polymer, epoxy compound, maleimide resin, (meth) acrylic resin, diallyl phthalate resin, triazine resin, polyphenylene ether, glass, etc.) It is formed by curing the composition. Although a conductor layer is not specifically limited, Usually, it is a layer containing the wiring formed with conductors, such as an electroconductive metal, Comprising: Various circuits may be included further. The configuration and thickness of the wiring and circuit are not particularly limited. Specific examples of the substrate having a conductor layer on the surface include a printed wiring board and a silicon wafer substrate. The thickness of the substrate having a conductor layer on the surface is usually 10 μm to 10 mm, preferably 20 μm to 5 mm, more preferably 30 μm to 2 mm.

  The substrate having a conductor layer on the surface used in the present invention is preferably pretreated on the surface of the conductor layer in order to improve adhesion to the electrical insulating layer. As a pretreatment method, a known technique can be used without any particular limitation. For example, if the conductor layer is made of copper, an oxidation treatment method in which a strong alkali oxidizing solution is brought into contact with the surface of the conductor layer to form a copper oxide layer on the conductor surface and roughened, After oxidation with this method, reduce with sodium borohydride, formalin, etc., deposit and roughen the plating on the conductor layer, contact the organic acid with the conductor layer to elute the copper grain boundaries and roughen And a method of forming a primer layer with a thiol compound or a silane compound on the conductor layer. Among these, from the viewpoint of easy maintenance of the shape of a fine wiring pattern, a method in which an organic acid is brought into contact with a conductor layer to elute and roughen a copper grain boundary, and a primer using a thiol compound or a silane compound A method of forming a layer is preferred.

  The laminate of the present invention is usually a molded product obtained by molding the above-described film of the present invention (that is, the curable epoxy composition of the present invention into a sheet or film) on a substrate having a conductor layer on the surface. ), A laminated film (that is, a sheet-like or film-like molded product comprising an adhesive layer comprising the curable epoxy composition of the present invention and a layer to be plated), or a prepreg (including a fiber substrate in the film of the present invention). Or a composite molded body comprising a fiber base material on the laminated film of the present invention can be produced by thermocompression bonding.

  As a method of thermocompression bonding, a molded body with a support or a composite molded body is superposed so as to be in contact with the conductor layer of the substrate described above, and a pressure laminator, a press, a vacuum laminator, a vacuum press, a roll laminator or the like The method of carrying out thermocompression bonding (lamination) using is mentioned. By heating and pressurizing, bonding can be performed so that there is substantially no void at the interface between the conductor layer on the substrate surface and the molded body or composite molded body. The molded body or composite molded body is usually laminated on the conductor layer of the substrate in an uncured or semi-cured state.

  The temperature of the thermocompression bonding operation is usually 30 to 250 ° C, preferably 50 to 200 ° C, more preferably 70 to 100 ° C. If the temperature is too low, the adhesion to the substrate may be insufficient, or the embedding in the wiring pattern may be insufficient and the flatness may not be achieved. On the other hand, if the temperature is too high, curing proceeds and adhesion may be insufficient or may not become flat. The pressure applied in the thermocompression operation is usually 10 kPa to 20 MPa, preferably 100 kPa to 10 MPa, and the time is usually 30 seconds to 5 hours, preferably 1 minute to 3 hours. The thermocompression bonding is preferably performed under reduced pressure in order to improve the embedding property of the wiring pattern and suppress the generation of bubbles. The pressure under reduced pressure at which thermocompression bonding is performed is usually 100 kPa to 1 Pa, preferably 40 kPa to 10 Pa.

(Cured product)
The cured product of the present invention is formed by curing the curable epoxy composition of the present invention, and is formed by curing the film, laminated film, prepreg, and laminate of the present invention that are composed of the composition. Any are included. Curing can be performed by appropriately heating the curable epoxy composition or film of the present invention under the curing conditions described below.

  For example, about the laminated body of this invention, it can be set as hardened | cured material by performing the process which hardens the film, laminated | multilayer film, or prepreg of this invention which comprises it. Curing is usually performed by heating the entire substrate on which the film, laminated film or prepreg of the present invention is formed on the conductor layer. Curing can be performed simultaneously with the above-described thermocompression bonding operation. Alternatively, the thermocompression may be performed after the thermocompression operation is performed under conditions that do not cause curing, that is, at a relatively low temperature and in a short time.

  In addition, for the purpose of improving the flatness of the electrical insulation layer and the purpose of increasing the thickness of the electrical insulation layer, two or more films, laminated films or prepregs of the present invention are bonded and laminated on the conductor layer of the substrate. Also good.

  The curing temperature is usually 30 to 400 ° C, preferably 70 to 300 ° C, more preferably 100 to 200 ° C. Moreover, hardening time is 0.1 to 5 hours normally, Preferably it is 0.5 to 3 hours. The heating method is not particularly limited, and may be performed using, for example, an electric oven.

(Complex)
The composite of the present invention is formed by forming a conductor layer on the surface of the cured product of the present invention described above.

  For example, when the laminate of the present invention forms a multilayer substrate, the composite of the present invention is obtained by forming another conductor layer on the electrical insulating layer of the laminate. As the conductor layer, metal plating or metal foil can be used. The metal plating method may be dry plating such as sputtering or vapor deposition, or wet plating such as electroless plating or electrolytic plating. Examples of the material used for metal plating include gold, silver, copper, rhodium, palladium, nickel, tin, and the like, and examples of the metal foil include those used as a support for the above-described film, laminated film, or prepreg. In the present invention, the method using metal plating as the conductor layer is preferred from the viewpoint that fine wiring is possible. Hereinafter, the manufacturing method of the composite of the present invention will be described by exemplifying a multilayer circuit board using metal plating as a conductor layer as an example of the composite of the present invention.

  First, a via hole or a through hole that penetrates the electrical insulating layer is formed in the laminate. The via hole is formed to connect the respective conductor layers constituting the multilayer circuit board when the multilayer circuit board is used. The via hole or the through hole can be formed by chemical processing such as photolithography or physical processing such as drilling, laser, or plasma etching. Among these methods, a laser method (carbon dioxide laser, excimer laser, UV-YAG laser, or the like) is preferable because a finer via hole can be formed without degrading the characteristics of the electrical insulating layer.

Next, the surface roughening process which roughens the surface of the electric insulation layer (namely, hardened | cured material of this invention) of a laminated body is performed. The surface roughening treatment is performed in order to improve the adhesion with the conductor layer formed on the electrical insulating layer.
The surface average roughness Ra of the electrical insulating layer is preferably 0.05 μm or more and less than 0.5 μm, more preferably 0.06 μm or more and 0.3 μm or less, and the surface 10-point average roughness Rzjis is preferably 0.00. They are 3 micrometers or more and less than 5 micrometers, More preferably, they are 0.5 micrometers or more and 3 micrometers or less. In this specification, Ra is the arithmetic average roughness shown in JIS B0601-2001, and the surface ten-point average roughness Rzjis is the ten-point average roughness shown in JIS B0601-2001 appendix 1.

  Although it does not specifically limit as a surface roughening processing method, The method etc. which make an electrical insulating layer surface and an oxidizing compound contact are mentioned. Examples of the oxidizing compound include known compounds having oxidizing ability, such as inorganic oxidizing compounds and organic oxidizing compounds. In view of easy control of the surface average roughness of the electrical insulating layer, it is particularly preferable to use an inorganic oxidizing compound or an organic oxidizing compound. Examples of inorganic oxidizing compounds include permanganate, chromic anhydride, dichromate, chromate, persulfate, activated manganese dioxide, osmium tetroxide, hydrogen peroxide, periodate, and the like. . Examples of the organic oxidizing compound include dicumyl peroxide, octanoyl peroxide, m-chloroperbenzoic acid, peracetic acid, and ozone.

  There is no particular limitation on the method of roughening the surface of the electrical insulating layer using an inorganic oxidizing compound or an organic oxidizing compound. For example, there is a method in which an oxidizing compound solution prepared by dissolving the oxidizing compound in a soluble solvent is brought into contact with the surface of the electrical insulating layer. The method of bringing the oxidizing compound solution into contact with the surface of the electrical insulating layer is not particularly limited. For example, the dipping method in which the electrical insulating layer is immersed in the oxidizing compound solution, the surface tension of the oxidizing compound solution is used. Any method may be used, such as a liquid filling method in which the oxidizing compound solution is placed on the electric insulating layer, or a spray method in which the oxidizing compound solution is sprayed on the electric insulating layer. By performing the surface roughening treatment, it is possible to improve the adhesion between the electrical insulating layer and another layer such as a conductor layer.

  The temperature and time for bringing these oxidizing compound solutions into contact with the surface of the electrical insulating layer may be set arbitrarily in consideration of the concentration and type of the oxidizing compound, the contact method, etc. It is 100 degreeC, Preferably it is 20-90 degreeC, and time is 0.5 to 60 minutes normally, Preferably it is 1 to 40 minutes.

  Note that the surface of the electrical insulating layer after the surface roughening treatment is washed with water in order to remove the oxidizing compound after the surface roughening treatment. In addition, if a substance that cannot be washed with water is attached, the substance can be further washed with a dissolvable cleaning solution or brought into contact with other compounds to make it soluble in water. Wash with water. For example, when an alkaline aqueous solution such as an aqueous potassium permanganate solution or an aqueous sodium permanganate solution is brought into contact with the electrical insulating layer, a mixed solution of hydroxylamine sulfate and sulfuric acid is used to remove the generated manganese dioxide film. It can wash | clean with water, after neutralizing-reducing process with the acidic aqueous solution of this.

Next, after surface roughening treatment is performed on the electrical insulating layer of the laminate, a conductor layer is formed on the surface of the electrical insulating layer and the inner wall surfaces of the via holes and through holes.
The conductive layer is preferably formed by an electroless plating method from the viewpoint that a conductive layer having excellent adhesion can be formed.

  For example, when forming a conductor layer by an electroless plating method, first, before forming a metal thin film on the surface of the electrical insulation layer, catalyst nuclei such as silver, palladium, zinc, and cobalt are formed on the electrical insulation layer. It is common to attach. The method for attaching the catalyst nucleus to the electrical insulating layer is not particularly limited. For example, a metal compound such as silver, palladium, zinc, or cobalt, or a salt or complex thereof is added to water or an organic solvent such as alcohol or chloroform to 0.001. Examples include a method of reducing a metal after dipping in a solution dissolved at a concentration of 10 wt% to 10 wt% (which may optionally contain an acid, an alkali, a complexing agent, a reducing agent, etc.).

  As the electroless plating solution used in the electroless plating method, a known autocatalytic electroless plating solution may be used, and the metal species, reducing agent species, complexing agent species, hydrogen ion concentration, The dissolved oxygen concentration is not particularly limited. For example, electroless copper plating solution using ammonium hypophosphite, hypophosphorous acid, ammonium borohydride, hydrazine, formalin, etc. as a reducing agent; electroless nickel-phosphorous plating solution using sodium hypophosphite as a reducing agent Electroless nickel-boron plating solution using dimethylamine borane as a reducing agent; electroless palladium plating solution; electroless palladium-phosphorous plating solution using sodium hypophosphite as a reducing agent; electroless gold plating solution; electroless silver Plating solution: An electroless plating solution such as an electroless nickel-cobalt-phosphorous plating solution using sodium hypophosphite as a reducing agent can be used.

  After forming the metal thin film, the substrate surface can be brought into contact with a rust preventive agent to carry out a rust prevention treatment. Moreover, after forming a metal thin film, a metal thin film can also be heated in order to improve adhesiveness. The heating temperature is usually 50 to 350 ° C, preferably 80 to 250 ° C. In this case, heating may be performed under a pressurized condition. As a pressurizing method at this time, for example, a method using a physical pressurizing means such as a hot press machine or a pressurizing and heating roll machine can be cited. The applied pressure is usually 0.1 to 20 MPa, preferably 0.5 to 10 MPa. If it is this range, the high adhesiveness of a metal thin film and an electrically insulating layer is securable.

  A resist pattern for plating is formed on the metal thin film thus formed, and further, plating is grown thereon by wet plating such as electrolytic plating (thick plating), then the resist is removed, and further etched. The metal thin film is etched into a pattern to form a conductor layer. Therefore, the conductor layer formed by this method usually consists of a patterned metal thin film and plating grown thereon.

  Alternatively, when a metal foil is used instead of metal plating as the conductor layer constituting the multilayer circuit board, it can be manufactured by the following method.

  That is, first, in the same manner as described above, a laminate composed of an electrically insulating layer made of a film or prepreg and a conductor layer made of a metal foil is prepared. As such a laminated body, when it is laminated, the curable epoxy composition has a degree of curing that can maintain each required characteristic, and there is no problem when it is processed afterwards or when a multilayer circuit board is formed. In particular, it is desirable to form by laminating under vacuum. In addition, the laminated body comprised from the electrically insulating layer which consists of such a film or a prepreg, and the conductor layer which consists of metal foil can be used also for a printed wiring board by a well-known subtractive method, for example.

  Then, in the same manner as described above, via holes and through holes penetrating the electrical insulating layer are formed in the prepared laminated body, and then the laminated body in which through holes are formed in order to remove the resin residue in the formed via holes. About desmear processing. Although the method of a desmear process is not specifically limited, For example, the method of contacting the solution (desmear liquid) of oxidizing compounds, such as a permanganate, is mentioned. Specifically, the laminated body in which the via holes are formed is rock-immersed for 1 to 50 minutes in an aqueous solution at 60 to 90 ° C. adjusted to have a sodium permanganate concentration of 70 g / liter and a sodium hydroxide concentration of 40 g / liter. Thus, desmear processing can be performed.

  Subsequently, after performing a desmear process about a laminated body, a conductor layer is formed in a via hole inner wall surface. The method for forming the conductor layer is not particularly limited, and either an electroless plating method or an electrolytic plating method can be used. From the viewpoint that a conductor layer having excellent adhesion can be formed, metal plating is used as the above-described conductor layer. It can carry out by the electroless-plating method similarly to the method of forming.

  Next, after forming a conductor layer on the inner wall surface of the via hole, a resist pattern for plating is formed on the metal foil, and further, plating is grown on the metal foil by wet plating such as electrolytic plating (thick plating). Then, the metal foil is etched into a pattern by etching to form a conductor layer. Therefore, the conductor layer formed by this method usually consists of a patterned metal foil and plating grown thereon.

  The multilayer circuit board obtained as described above is used as a substrate for manufacturing the above-described laminate, and this is thermocompression-bonded with the above-described molded body or composite molded body and cured to form an electrical insulating layer. Further, by further forming a conductor layer according to the above-described method and repeating these, further multilayering can be performed, whereby a desired multilayer circuit board can be obtained.

  The composite of the present invention thus obtained (and the multilayer circuit board as an example of the composite of the present invention) has an electrical insulating layer (cured product of the present invention) comprising the curable epoxy composition of the present invention. Thus, since the electrical insulating layer is excellent in electrical characteristics in the high frequency region and adhesion to the conductor layer, the composite of the present invention (and the multilayer circuit board as an example of the composite of the present invention) It can be suitably used for various applications.

(Electronic material substrate)
The board | substrate for electronic materials of this invention consists of the hardened | cured material or composite_body | complex of this invention mentioned above. The substrate for electronic material of the present invention comprising such a cured product or composite of the present invention is a mobile phone, PHS, notebook computer, PDA (personal digital assistant), mobile video phone, personal computer, supercomputer, server, Router, liquid crystal projector, engineering workstation (EWS), pager, word processor, TV, viewfinder type or monitor direct view type video tape recorder, electronic notebook, electronic desk calculator, car navigation device, POS terminal, device with touch panel It can use suitably for various electronic devices.

  Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples. In the examples, “parts” and “%” are based on weight unless otherwise specified. Various physical properties were evaluated according to the following methods.

(1) Number average molecular weight (Mn) and weight average molecular weight (Mw) of alicyclic olefin polymer
It was measured by gel permeation chromatography (GPC) using tetrahydrofuran as a developing solvent, and was determined as a polystyrene equivalent value.

(2) Hydrogenation rate of alicyclic olefin polymer The ratio of the number of moles of unsaturated bonds hydrogenated to the number of moles of unsaturated bonds in the polymer before hydrogenation was measured by ¹ H-NMR spectrum at 400 MHz. This was taken as the hydrogenation rate.

(3) Relative permittivity A small piece having a width of 2.6 mm, a length of 80 mm, and a thickness of 40 μm is cut out from a film-like cured product of the curable epoxy composition, and the relative permittivity at 10 GHz using a cavity resonator perturbation method permittivity measurement apparatus. The rate was measured.

(4) Dielectric loss tangent A piece having a width of 2.6 mm, a length of 80 mm, and a thickness of 40 μm is cut out from a film-like cured product of the curable epoxy composition, and the dielectric loss tangent at 10 GHz is measured using a cavity resonator perturbation method dielectric constant measuring device. Measurements were made.

(5) Copper foil peel strength (adhesion of copper foil)
The surface of an electrolytic copper foil having a thickness of 35 μm was etched by about 1 μm with an etching agent (trade name “CZ-8101”, manufactured by MEC). Laminated so that the surface on the resin layer side of the film molded body of the curable epoxy composition is in contact with the etched surface of the obtained electrolytic copper foil, with a vacuum laminator, the degree of vacuum is 1 kPa or less, 90 ° C., 30 seconds, Thermocompression bonding was performed under a pressure of 0.7 MPa. Next, the support is peeled off from the surface of the film molded body opposite to the resin layer, and the surface of the resin layer that appears is etched with a glass epoxy copper clad laminate (FR-4) etched by about 2 μm with the etchant. The treated surfaces were stacked and heat-pressed using a vacuum laminator under the same conditions as described above. The composite molded body thus obtained was heated in an oven at 180 ° C. for 90 minutes to obtain a cured laminate. The peel strength of the copper foil from the obtained laminate cured product was measured according to JIS C6481.

Production Example 1
Hydrolysis and dehydration of alkoxysilane using 3.47 parts of diaminotriazine structure-containing silane compound represented by the following formula (16) and 21.2 parts of norbornene structure-containing silane compound represented by the following formula (17) These were hydrolyzed by the condensation reaction method, and the resulting hydrolyzate was subjected to dehydration condensation to obtain a diaminotriazine structure-containing silane compound / norbornene structure-containing silane compound condensate. When the composition ratio of the obtained copolymer was measured by elemental analysis, the unit based on the diaminotriazine structure-containing silane compound = 10 mol% and the unit based on the norbornene structure-containing silane compound = 90 mol%. The weight average molecular weight was 942.

Production Example 2
Hydrolysis and dehydration condensation reaction of alkoxysilane using 3.47 parts of diaminotriazine structure-containing silane compound represented by the formula (16) and 11.3 parts of dimethyldimethoxysilane represented by the following formula (18) These were hydrolyzed by the above method, and the resulting hydrolyzate was subjected to dehydration condensation to obtain a diaminotriazine structure-containing silane compound / dimethyldimethoxysilane condensate. When the composition ratio of the obtained copolymer was measured by elemental analysis, the unit based on the diaminotriazine structure-containing silane compound = 10 mol% and the unit based on dimethyldimethoxysilane = 90 mol%. The weight average molecular weight was 1,143.

Example 1
(Preparation of curable epoxy composition)
Novolak-type epoxy compound having a dicyclopentadiene structure as the epoxy compound (A) (trade name “Epicron HP7200HH”, manufactured by DIC, epoxy equivalent 280), 100 parts of active ester compound (trade name) "Epiclon HPC-8000-65T", 65% non-volatile toluene solution, manufactured by DIC, active ester group equivalent 223) 130.8 parts (85 parts in terms of active ester compound), triazine structure-containing polymer (C) 2.6 parts of the diaminotriazine structure-containing silane compound / norbornene structure-containing silane compound condensate obtained in Production Example 1 above, 350 parts of silica as a filler (trade name “SC2500-SXJ”, manufactured by Admatex), Hindered phenolic antioxidants as anti-aging agents (Product name “Irganox (registered trademark) 3114”, manufactured by BASF) 1.1 parts and 180 parts of anisole were mixed and dispersed with a pressure disperser. Furthermore, 9.0 parts (2.7 parts in terms of 1-benzyl-2-phenylimidazole) in which 30% 1-benzyl-2-phenylimidazole was dissolved in anisole as a curing accelerator were mixed, The mixture was stirred with a planetary stirrer for 5 minutes to obtain a varnish of a curable epoxy composition. In addition, content of the filler was 65 weight% in the total solid of a varnish.

(Production of film molding)
Subsequently, the varnish of the curable epoxy composition obtained above is a polyethylene terephthalate film having a size of length 300 mm × width 300 mm, thickness 38 μm, and surface average roughness Ra 0.08 μm using a die coater. [Support: Lumirror (registered trademark) T60 manufactured by Toray Industries, Inc.], then dried in a nitrogen atmosphere at 80 ° C. for 10 minutes, and formed into a film of 43 μm thick curable epoxy composition on the support Got the body. Using the obtained film molded body, the peel strength of the copper foil was measured according to the above method. The results are shown in Table 1.

(Preparation of cured film)
Next, a small piece cut out from the film molded product of the obtained curable epoxy composition on a copper foil having a thickness of 10 μm, with the support attached, the curable epoxy composition is on the inside, Using a vacuum laminator equipped with a base plate made of heat-resistant rubber, the pressure is reduced to 200 Pa, heat-press lamination is performed at a temperature of 110 ° C. and a pressure of 0.1 MPa for 60 seconds, and then the support is peeled off and air is applied at 180 ° C. for 120 minutes. Heat cured in. After curing, the cured resin with a copper foil was cut out and the copper foil was dissolved in a 1 mol / L ammonium persulfate aqueous solution to obtain a film-like cured product. Using the obtained film-like cured product, the relative dielectric constant and dielectric loss tangent were measured according to the above methods. The results are shown in Table 1.

Example 2
When preparing the curable epoxy composition, the blending amount of the diaminotriazine structure-containing silane compound / norbornene structure-containing silane compound condensate obtained in Production Example 1 as the triazine structure-containing polymer (C) was 2.6. The varnish, film molded body and film-like cured product of the curable epoxy composition were obtained in the same manner as in Example 1 except that the amount was changed to 13 parts, and the measurement and evaluation were performed in the same manner. The results are shown in Table 1.

Example 3
When preparing the curable epoxy composition, instead of 2.6 parts of the diaminotriazine structure-containing silane compound / norbornene structure-containing silane compound condensate obtained in Production Example 1 as the triazine structure-containing polymer (C). In the same manner as in Example 1 except that 2.6 parts of the diaminotriazine structure-containing silane compound / dimethyldimethoxysilane condensate obtained in Production Example 2 was used, the varnish of the curable epoxy composition and the film molded product And the film-like hardened | cured material was obtained and measured and evaluated similarly. The results are shown in Table 1.

Comparative Example 1
When preparing the curable epoxy composition, curing was carried out in the same manner as in Example 1 except that the diaminotriazine structure-containing silane compound / norbornene structure-containing silane compound condensate obtained in Production Example 1 was not blended. The varnish, the film molding, and the film-like cured product of the conductive epoxy composition were obtained, and similarly measured and evaluated. The results are shown in Table 1.

Comparative Example 2
When preparing the curable epoxy composition, the compounding amount of the active ester compound (trade name “Epiclon HPC-8000-65T”, 65% non-volatile toluene solution) is 130.8 to 90.8 parts (active ester) In addition to 2.6 parts of the diaminotriazine structure-containing silane compound / norbornene structure-containing silane compound condensate obtained in Preparation Example 1 above, the triazine structure-containing cresol-novolak resin (product) Name "Phenolite LA-3018-50P", propylene glycol monomethyl ether solution with 50% non-volatile content, manufactured by DIC, polymer containing triazine structure in the main chain of polymer 36 parts (triazine structure-containing cresol novolac resin) Curable epoxy set in the same manner as in Example 1 except that 18 parts) was used. Varnish things, to obtain a film forming member and the film-like cured product, likewise measured and evaluated. The results are shown in Table 1.

  As shown in Table 1, according to the curable epoxy composition of the present invention, the relative permittivity and dielectric loss tangent in the high frequency region are low, the electrical characteristics in the high frequency region are excellent, the peel strength of the copper foil is high, and A film-like cured product having excellent adhesion can be obtained (Examples 1 and 2). Therefore, according to the curable epoxy composition of this invention, it turns out that the electrical insulation layer which has such an outstanding characteristic can be formed.

  On the other hand, in the case where the predetermined triazine structure-containing polymer (C) of the present invention is not blended, the obtained film-like cured product has low peel strength of the copper foil and is inferior in adhesion to the conductor layer (Comparative Example 1). In place of the triazine structure-containing polymer (C) according to the present invention, when a polymer containing a triazine structure in the main chain of the polymer is used, the obtained film-like cured product has adhesion to the conductor layer, The results were inferior in electrical characteristics (Comparative Example 2).

Production Example 3
As the first stage of the polymerization, 35 mol parts of 5-ethylidene-bicyclo [2.2.1] hept-2-ene, 0.9 mol parts of 1-hexene, 340 mol parts of anisole, and 4- 0.005 mol part of acetoxybenzylidene (dichloro) (4,5-dibromo-1,3-dimesityl-4-imidazoline-2-ylidene) (tricyclohexylphosphine) ruthenium (manufactured by Wako Pure Chemical Industries, Ltd., C1063), nitrogen-substituted The pressure-resistant glass reactor was charged, and a polymerization reaction was carried out at 80 ° C. for 30 minutes with stirring to obtain a norbornene-based ring-opening polymer solution.
Next, tetracyclo [6.5.0.1 ^2,5 ... In the solution obtained in the first stage of polymerization as the second stage of polymerization. 0 ^8,13] trideca -3,8,10,12- 45 molar parts of tetraene, bicyclo [2.2.1] hept-2-ene-5,6-dicarboxylic acid anhydride 20 parts by mole, anisole 250 mol parts and 0.01 mol parts of C1063 were added, and a polymerization reaction was performed at 80 ° C. for 1.5 hours with stirring to obtain a solution of a norbornene-based ring-opening polymer. When this solution was measured by gas chromatography, it was confirmed that substantially no monomer remained, and the polymerization conversion rate was 99% or more.
Next, the obtained ring-opened polymer solution was charged into an autoclave equipped with a stirrer substituted with nitrogen, 0.03 mol part of C1063 was added, and the mixture was stirred at 150 ° C. and a hydrogen pressure of 7 MPa for 5 hours to conduct a hydrogenation reaction. Thus, a solution of the alicyclic olefin polymer (1), which is a hydrogenated product of a norbornene-based ring-opening polymer, was obtained. The weight average molecular weight of the alicyclic olefin polymer (1) was 60,000, the number average molecular weight was 30,000, and the molecular weight distribution was 2. The hydrogenation rate was 95%, and the content of repeating units having a carboxylic anhydride group was 20 mol%. The solid content concentration of the alicyclic olefin polymer (1) solution was 22%.

Example 4
(Resin composition for plated layer)
454 parts of the alicyclic olefin polymer (1) solution obtained in Synthesis Example 2 [100 parts in terms of alicyclic olefin polymer (1)], polyvalent epoxy having a dicyclopentadiene skeleton as a curing agent 36 parts of a compound (trade name “Epicron HP7200L”, manufactured by DIC), silica as an inorganic filler (trade name “Admafine SO-C1”, manufactured by Admatechs, average particle size 0.25 μm, “Admafine” 24.5 parts of registered trademark, tris (3,5-di-t-butyl-4-hydroxybenzyl) -isocyanurate (trade name “Irganox (registered trademark) 3114”, manufactured by BASF) as an anti-aging agent 1 part, 0.5 part of 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole as an ultraviolet absorber, and In addition, 0.5 part of 1-benzyl-2-phenylimidazole as a curing accelerator is mixed with anisole and mixed so that the concentration of the compounding agent is 16%. Got.

(Production of laminated film)
The varnish of the resin composition for a layer to be plated obtained above was applied onto a polyethylene terephthalate film (support) having a thickness of 38 μm using a wire bar, and then dried at 80 ° C. for 10 minutes in a nitrogen atmosphere. Thus, a film with a support on which a layer to be plated having a thickness of 3 μm made of an uncured resin composition for a layer to be plated was formed was obtained.

  Next, the varnish of the curable epoxy composition obtained in Example 1 was applied to the surface of the layer to be plated formed of the resin composition for the layer to be plated of the film with support, with a doctor blade (manufactured by Tester Sangyo Co., Ltd.) Coating with an auto film applicator (manufactured by Tester Sangyo Co., Ltd.), followed by drying at 80 ° C. for 10 minutes in a nitrogen atmosphere to form a laminate with a support on which a layer to be plated and an adhesive layer having a total thickness of 43 μm are formed A film was obtained. The laminated film with a support was formed in the order of a support, a plated layer made of a resin composition for a plated layer, and an adhesive layer made of a curable epoxy composition.

(Preparation of cured laminate)
Next, separately from the above, the surface of the core material obtained by impregnating glass fiber with a varnish containing a glass filler and a halogen-free epoxy compound was bonded with copper having a thickness of 18 μm, a thickness of 0.8 mm, On a 150 mm square (150 mm long, 150 mm wide) double-sided copper-clad substrate surface, a conductor layer having a wiring width and distance between wirings of 50 μm, a thickness of 18 μm, and a microetched surface by contact with an organic acid is formed. An inner layer substrate was obtained.

  After the laminated film with the support obtained above was cut into 150 mm squares on both surfaces of the inner layer substrate, the surfaces were bonded so that the surface on the resin composition side for the adhesive layer would be inside, and then the primary press Went. The primary press is thermocompression bonding at a temperature of 110 ° C. and a pressure of 0.1 MPa for 90 seconds under a reduced pressure of 200 Pa using a vacuum laminator provided with heat-resistant rubber press plates at the top and bottom. Furthermore, using a hydraulic press device provided with metal press plates at the top and bottom, thermocompression bonding was performed at a pressure bonding temperature of 110 ° C. and 1 MPa for 90 seconds. Next, the support was peeled off to obtain a laminate of a resin layer and an inner layer substrate composed of a curable epoxy composition and a resin composition for a layer to be plated. Further, the laminate was left in an air atmosphere at 180 ° C. for 60 minutes to cure the resin layer and form an electrical insulating layer on the inner layer substrate.

(Swelling process)
The obtained laminate cured product was prepared to have a swelling liquid (“Swelling Dip Securigant P”, manufactured by Atotech, “Securigant” is a registered trademark), 500 mL / L, and sodium hydroxide 3 g / L. After dipping in an aqueous solution at 15 ° C. for 15 minutes, it was washed with water.

(Oxidation process)
Next, after dipping for 15 minutes in an aqueous solution of permanganate (“Concentrate Compact CP”, manufactured by Atotech) at 640 mL / L and an aqueous solution of 80 ° C. prepared to have a sodium hydroxide concentration of 40 g / L. , Washed with water.

(Neutralization reduction process)
Subsequently, a hydroxylamine sulfate aqueous solution (“Reduction Securigant P 500”, manufactured by Atotech Co., Ltd., “Securigant” is a registered trademark) is 100 mL / L, and an aqueous solution at 40 ° C. prepared to have a sulfuric acid of 35 mL / L The cured product was immersed for 5 minutes, neutralized and reduced, and then washed with water.

(Cleaner / conditioner process)
Next, the laminate cured product was added to an aqueous solution at 50 ° C. adjusted to a concentration of 50 ml / L with an aqueous cleaner / conditioner aqueous solution (“Alcup MCC-6-A”, manufactured by Uemura Kogyo Co., Ltd., “Alcup” is a registered trademark) for 5 minutes. Immersion and treatment with cleaner and conditioner were performed. Next, the laminate cured product was immersed in 40 ° C. washing water for 1 minute, and then washed with water.

(Soft etching process)
Next, the laminate cured product was immersed for 2 minutes in an aqueous solution prepared to have a sulfuric acid concentration of 100 g / L and sodium persulfate of 100 g / L, and then washed with water.

(Pickling process)
Next, the laminate cured product was immersed in an aqueous solution prepared to have a sulfuric acid concentration of 100 g / L for 1 minute to perform pickling treatment, and then washed with water.

(Catalyst application process)
Next, Alcup Activator MAT-1-A (trade name, manufactured by Uemura Kogyo Co., Ltd., “Alcup” is a registered trademark) is 200 mL / L, Alcup Activator MAT-1-B (upper product name, manufactured by Uemura Kogyo Co., Ltd., “Alcup”) Was immersed in a 60 ° C. Pd salt-containing plating catalyst aqueous solution prepared so that the registered trademark was 30 mL / L and sodium hydroxide was 0.35 g / L, and then washed with water.

(Activation process)
Subsequently, Alcup Redeusa MAB-4-A (trade name, manufactured by Uemura Kogyo Co., Ltd., “Alcup” is a registered trademark) is 20 mL / L, Alcup Redeusa MAB-4-B (trade name, manufactured by Uemura Kogyo Co., Ltd., “ “Alcup” was a laminate obtained by immersing the laminate cured product in an aqueous solution adjusted to 200 mL / L at 35 ° C. for 3 minutes to reduce the plating catalyst, and then washed with water.

(Accelerator processing process)
Next, the cured product of the laminate was immersed in an aqueous solution prepared so that Alcap Accelerator MEL-3-A (trade name, manufactured by Uemura Kogyo Co., Ltd., “Alcup” is a registered trademark) at 50 mL / L at 25 ° C. for 1 minute. did.

(Electroless plating process)
The laminate cured product thus obtained was obtained by using Sulcup PEA-6-A (trade name, manufactured by Uemura Kogyo Co., Ltd., “Sulcup” is a registered trademark), 100 mL / L, Sulcup PEA-6-B-2X (trade name). , Manufactured by Uemura Kogyo Co., Ltd.) 50 mL / L, Sulcup PEA-6-C (trade name, manufactured by Uemura Kogyo Co., Ltd.) 14 mL / L, Sulcup PEA-6-D (trade name, manufactured by Uemura Kogyo Co., Ltd.) -6-E (trade name, manufactured by Uemura Kogyo Co., Ltd.) 50 mL / L, 37% soaked in electroless copper plating solution prepared to be 5 mL / L formalin aqueous solution at a temperature of 36 ° C. for 20 minutes while blowing air. Then, an electroless plating process was performed to form an electroless plating film on the surface of the cured laminate (the surface of the layer to be plated made of the resin composition for the layer to be plated).

  Next, the laminate cured product on which the electroless plating film was formed was annealed at 150 ° C. for 30 minutes in an air atmosphere.

An electrolytic copper plating film was applied to the cured laminate obtained by annealing to form an electrolytic copper plating film having a thickness of 30 μm. Next, the multilayer cured product is heat-treated at 180 ° C. for 60 minutes to obtain a multilayer printed wiring board having two layers on both sides in which a conductor layer composed of the metal thin film layer and the electrolytic copper plating film is formed on the cured laminate. It was.

Claims (11)

Epoxy compound (A), an epoxy curing agent (B), and, seen containing polymer having a triazine structure in a side chain (C),
The polymer (C) is obtained by a condensation reaction between a compound represented by the following general formula (1A) or (1B) and a compound represented by the following general formula (2A) or (2B). A curable epoxy composition that is a coalescence.

[In the above general formulas (1A) and (1B), R ¹ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R ² has 1 to 6 carbon atoms which may have a substituent. An alkyl group, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, a cycloalkenyl group having 3 to 14 carbon atoms, or an aryl group having 6 to 12 carbon atoms, and X ¹ and X ² are Each independently represents a group represented by —H, —OR ⁵ , —SR ⁶ , or NR ⁷ R ⁸ (R ^{5 to} R ⁸ each independently has a hydrogen atom or a substituent, X ³ may be a chemical single bond, or —R ⁹ —O—R ¹⁰ —, — , or an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms. ^{R 11 -S-R 12} -, or ^{-R 13 -C (= O) -OR} 14 - group represented by ^{(R 9} R ¹⁴ are each independently an alkylene group) having 1 to 6 carbon atoms which may have a substituent. ) And
In the general formulas (2A) and (2B), R ³ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R ⁴ is an alkyl having 1 to 6 carbon atoms that may have a substituent. A alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, a cycloalkenyl group having 3 to 14 carbon atoms, or an aryl group having 6 to 12 carbon atoms,
The polymer includes 2 compounds each having a different structure as one or both of the compound represented by the general formula (1A) or (1B) and the compound represented by the general formula (2A) or (2B). A condensation reaction may be used as described above. ] Epoxy compound (A), an epoxy curing agent (B), and, seen containing polymer having a triazine structure in a side chain (C),
A curable epoxy composition in which the polymer (C) is a polymer having a structural unit represented by the following general formula (10) and a structural unit represented by the following general formula (11).

[In the general formula (10),
X ¹ and X ² are each independently a group represented by —H, —OR ⁵ , —SR ⁶ , or NR ⁷ R ⁸ (R ^{5 to} R ⁸ are each independently a hydrogen atom or a substituent; X ³ is an alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms which may have a group.), And X ³ is a chemical single bond or —R ⁹ —O. Groups represented by —R ¹⁰ —, —R ¹¹ —S—R ¹² —, or —R ¹³ —C (═O) —OR ¹⁴ — (R ^{9 to} R ¹⁴ are each independently a substituent; An optionally substituted alkylene group having 1 to 6 carbon atoms). ) And
Y ¹ is R ² (R ² is an optionally substituted alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, or a carbon number. 3 to 14 cycloalkenyl groups or aryl groups having 6 to 12 carbon atoms), —OH, or a group represented by —OR ¹ (R ¹ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms). Is)
In the general formula (11),
R ⁴ is an optionally substituted alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, and a cycloalkenyl group having 3 to 14 carbon atoms. Or an aryl group having 6 to 12 carbon atoms,
Y ² is a group represented by R ⁴ , —OH, or —OR ³ (R ³ is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms). ]   The curable epoxy composition according to claim 1 or 2, wherein the epoxy curing agent (B) contains an active ester compound. Furthermore, the curable epoxy composition as described in any one of Claim 1 to 3 containing a hardening accelerator. The film which consists of a curable epoxy composition as described in any one of Claim 1 to 4. The laminated film which has an adhesion layer which consists of a curable epoxy composition as described in any one of Claim 1 to 4, and a to-be-plated layer which consists of a resin composition for to-be-plated layers.   A prepreg comprising the film according to claim 5 or the laminated film according to claim 6 and a fiber substrate.   The laminated body formed by laminating | stacking the film of Claim 5, the laminated film of Claim 6, or the prepreg of Claim 7. The curable epoxy composition according to any one of claims 1 to 4, the film according to claim 5, the laminated film according to claim 6, the prepreg according to claim 7, or the claim 8. A cured product obtained by curing the laminate.   The composite_body | complex formed by forming a conductor layer in the surface of the hardened | cured material of Claim 9.   An electronic material substrate comprising the cured product according to claim 9 or the composite according to claim 10 as a constituent material.