JP4710952B2 - Polishing equipment - Google Patents

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JP4710952B2
JP4710952B2 JP2008263753A JP2008263753A JP4710952B2 JP 4710952 B2 JP4710952 B2 JP 4710952B2 JP 2008263753 A JP2008263753 A JP 2008263753A JP 2008263753 A JP2008263753 A JP 2008263753A JP 4710952 B2 JP4710952 B2 JP 4710952B2
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polishing
gas
temperature
polishing liquid
liquid
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JP2009006480A (en
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英文 加藤
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Nikon Corp
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Description

本発明は、研磨液槽内の研磨液に研磨対象物を浸して、研磨対象物の表面に気体を噴射することによって研磨を実施する研磨装置に関する。   The present invention relates to a polishing apparatus that performs polishing by immersing a polishing object in a polishing liquid in a polishing liquid tank and injecting gas onto the surface of the polishing object.

従来、水等の液体と研磨材とを混合した研磨液を噴射ノズルから噴射させて研磨対象物の表面を研磨する、という方法が知られている。この場合には、研磨材が直接噴射ノズルの通路中を通過するので、噴射ノズルの先端に研磨材が付着して目詰まりを起こすという問題がある。また、研磨材が高速で噴射ノズルの細い通路を通過することになるので、通路内壁の摩耗の原因になり、通路内壁が摩耗すると、噴射ノズルの通路の径が変わることになり、このような状況で研磨を実施すると、研磨液の流量変化に伴う研磨速度の変化により、研磨対象物の表面にむらができる原因になる。   Conventionally, a method of polishing a surface of an object to be polished by spraying a polishing liquid obtained by mixing a liquid such as water and an abrasive from an injection nozzle is known. In this case, since the abrasive directly passes through the passage of the injection nozzle, there is a problem that the abrasive adheres to the tip of the injection nozzle and causes clogging. In addition, since the abrasive passes through the narrow passage of the injection nozzle at a high speed, it causes wear of the inner wall of the passage, and when the inner wall of the passage is worn, the diameter of the passage of the injection nozzle changes. When polishing is performed under such circumstances, the surface of the object to be polished becomes uneven due to a change in the polishing rate accompanying a change in the flow rate of the polishing liquid.

一方、被加工物のバリ取りを行う装置として特許文献１に記載の液中表面加工装置が公開されている。ここでは、この装置は、タンク内の研磨剤混入液中に被加工物が載置され、この被加工物の加工対象表面へ向けてノズル装置から加工流体が高圧噴射されるようになっており、この加工流体として各種液体及び気体が利用可能である旨記載されている。但し、この特許文献１では、加工流体として気体を用いた実施形態は記載されていないものである。
特開２００２−１１３６６３号公報 On the other hand, an in-liquid surface processing apparatus disclosed in Patent Document 1 is disclosed as an apparatus for deburring a workpiece. Here, in this apparatus, a workpiece is placed in an abrasive mixed liquid in a tank, and a machining fluid is jetted from a nozzle device toward the surface of the workpiece to be processed at a high pressure. It is described that various liquids and gases can be used as the processing fluid. However, in this patent document 1, the embodiment using gas as a processing fluid is not described.
JP 2002-113663 A

しかしながら、この特許文献１に記載のものは、バリ取りを行う装置であるため、高精度の表面研磨が要求される光学素子等の研磨に適用するのは難しいものである。   However, since the device described in Patent Document 1 is a deburring device, it is difficult to apply it to polishing of optical elements and the like that require highly accurate surface polishing.

そこで、本発明者らは、研磨材と水などの液体からなる研磨液で満たした研磨液槽内に研磨対象物を浸して噴射ノズルから気体を噴射する研磨装置を特許出願している（但し、現時点では未公開）。この噴射ノズルから気体を噴射することにより、この気体に巻き込まれた研磨液によって研磨対象物の表面研磨を行うものである。   Therefore, the inventors have applied for a patent on a polishing apparatus that immerses a polishing object in a polishing liquid tank filled with a polishing liquid consisting of a polishing material and a liquid such as water and injects a gas from an injection nozzle (however, , Not yet published). By injecting gas from this injection nozzle, the surface of the object to be polished is polished with the polishing liquid entrained in this gas.

しかし、図２に示すように、気体１４の噴射を用いて研磨対象物を研磨する際に、噴射ノズル１５から噴射された気体１４は、研磨液中で急激に膨張することにより温度低下する。従って、この気体噴射による研磨を実行し続けると研磨液の温度も低下することになり、単位時間当たりの研磨除去量が低下し、研磨対象物の研磨加工時間が長くなってしまい、研磨の安定性に欠ける、という現象を本発明者らは見出した（図３参照）。   However, as shown in FIG. 2, when the object to be polished is polished by using the injection of the gas 14, the temperature of the gas 14 injected from the injection nozzle 15 is lowered by rapidly expanding in the polishing liquid. Therefore, if the polishing by this gas injection is continued, the temperature of the polishing liquid will also decrease, the amount of polishing removal per unit time will decrease, the polishing processing time of the object to be polished will become longer, and polishing stability will be increased. The present inventors have found a phenomenon of lack of properties (see FIG. 3).

そこで、本発明は、研磨速度を一定に保ち研磨の安定性を保つことが可能な研磨装置を提供することを目的とする。   Therefore, an object of the present invention is to provide a polishing apparatus capable of maintaining a constant polishing rate and maintaining polishing stability.

本発明に係る第１の研磨装置は、研磨液槽（１１）内の研磨液（１３）に研磨対象物（１２）を浸し、該研磨対象物の表面に気体（１４）を噴射することによって前記表面の研磨を行う研磨装置（１０）であって、研磨時間中の前記研磨液の温度を一定に保つための温度調節手段（１８、２２）を備え、前記温度調節手段は、前記研磨液槽の壁面に気体（２４）を吹き付ける気体吹付手段（２２）を設置し、該気体吹付手段により吹き付ける気体の温度を制御することにより、前記研磨液の温度を一定に保つ研磨装置としたことを特徴とする。   The first polishing apparatus according to the present invention immerses the polishing object (12) in the polishing liquid (13) in the polishing liquid tank (11) and injects a gas (14) onto the surface of the polishing object. A polishing apparatus (10) for polishing the surface, comprising temperature adjusting means (18, 22) for maintaining a constant temperature of the polishing liquid during a polishing time, the temperature adjusting means comprising the polishing liquid A polishing apparatus for keeping the temperature of the polishing liquid constant by installing a gas blowing means (22) for blowing gas (24) on the wall surface of the tank and controlling the temperature of the gas blown by the gas blowing means. Features.

本発明に係る第２の研磨装置は、研磨液槽（１１）内の研磨液（１３）に研磨対象物（１２）を浸し、該研磨対象物の表面に気体（１４）を噴射することによって前記表面の研磨を行う研磨装置（１０）であって、研磨時間中の前記研磨液の温度を一定に保つための温度調節手段（１８、２２）を備え、前記温度調節手段は、前記研磨液槽の壁面に所定の温度の気体（２４）を吹き付ける気体吹付手段（２２）を設置し、該気体吹付手段により吹き付ける気体の送風量を制御することにより、前記研磨液の温度を一定に保つ研磨装置としたことを特徴とする。   The second polishing apparatus according to the present invention immerses the polishing object (12) in the polishing liquid (13) in the polishing liquid tank (11) and injects a gas (14) onto the surface of the polishing object. A polishing apparatus (10) for polishing the surface, comprising temperature adjusting means (18, 22) for maintaining a constant temperature of the polishing liquid during a polishing time, wherein the temperature adjusting means comprises the polishing liquid Polishing that keeps the temperature of the polishing liquid constant by installing a gas blowing means (22) for blowing a gas (24) of a predetermined temperature on the wall surface of the tank and controlling the amount of gas blown by the gas blowing means It is a device.

なお、ここでは、本発明をわかりやすく説明するため、実施の形態を表す図面の符号に対応づけて説明したが、本発明が実施の形態に限定されるものでないことは言及するまでもない。   Here, in order to explain the present invention in an easy-to-understand manner, the description has been made in association with the reference numerals of the drawings representing the embodiments, but it goes without saying that the present invention is not limited to the embodiments.

請求項１に記載の発明によれば、研磨液槽内の研磨液に研磨対象物を浸し、該研磨対象物の表面に気体を噴射することによって前記表面の研磨を行う研磨装置であって、研磨時間中の前記研磨液の温度を一定に保つための温度調節手段を備えるので、研磨速度が一定であり、安定した研磨が実施可能となる。この効果に加えて、前記温度調節手段は、前記研磨液槽の壁面に気体を吹き付ける気体吹付手段を設置し、該気体吹付手段により吹き付ける気体の温度を制御することにより、前記研磨液の温度を一定の温度に保つので、より研磨速度が一定で、安定した研磨が実施可能となる。   According to the first aspect of the present invention, there is provided a polishing apparatus that polishes the surface by immersing a polishing object in a polishing liquid in a polishing liquid tank and injecting a gas onto the surface of the polishing object. Since the temperature adjusting means for keeping the temperature of the polishing liquid constant during the polishing time is provided, the polishing rate is constant and stable polishing can be performed. In addition to this effect, the temperature adjusting means is provided with gas blowing means for blowing gas onto the wall surface of the polishing liquid tank, and the temperature of the polishing liquid is controlled by controlling the temperature of the gas blown by the gas blowing means. Since the temperature is kept constant, the polishing rate is more constant and stable polishing can be performed.

請求項２に記載の発明によれば、研磨液槽内の研磨液に研磨対象物を浸し、該研磨対象物の表面に気体を噴射することによって前記表面の研磨を行う研磨装置であって、研磨時間中の前記研磨液の温度を一定に保つための温度調節手段を備えるので、研磨速度が一定であり、安定した研磨が実施可能となる。この効果に加えて、前記温度調節手段は、前記研磨液槽の壁面に所定の温度の気体を吹き付ける気体吹付手段を設置し、該気体吹付手段により吹き付ける気体の送風量を制御することにより、前記研磨液の温度を一定に保つので、より研磨速度が一定で、安定した研磨が実施可能となる。   According to the invention of claim 2, a polishing apparatus for polishing the surface by immersing a polishing object in a polishing liquid in a polishing liquid tank and injecting a gas onto the surface of the polishing object, Since the temperature adjusting means for keeping the temperature of the polishing liquid constant during the polishing time is provided, the polishing rate is constant and stable polishing can be performed. In addition to this effect, the temperature adjusting means is provided with a gas blowing means for blowing a gas of a predetermined temperature on the wall surface of the polishing liquid tank, and by controlling the amount of gas blown by the gas blowing means, Since the temperature of the polishing liquid is kept constant, the polishing rate is more constant and stable polishing can be performed.

以下、本発明の実施の形態について説明する。
［発明の実施の形態１］ Embodiments of the present invention will be described below.
Embodiment 1 of the Invention

図１は、本発明の実施の形態１に係る研磨装置１０の概念図である。   FIG. 1 is a conceptual diagram of a polishing apparatus 10 according to Embodiment 1 of the present invention.

まず、構成を説明する。   First, the configuration will be described.

研磨装置１０は、研磨液１３に研磨対象物１２を浸すための研磨液槽１１と、研磨対象物１２に気体１４を噴射させるための噴射ノズル１５とを備えている。研磨液層１１の周囲には、送風機２２からの気体２４を吹き付ける温度安定用ノズル２３が設置されて、直接、研磨液層１１に対面している。そして、その送風機２２が温度コントローラー１８に接続され、この温度コントローラー１８が温度計１６に接続されている。この送風機２２及び温度コントローラー１８等により、「温度調節手段」が構成されている。   The polishing apparatus 10 includes a polishing liquid tank 11 for immersing the polishing object 12 in the polishing liquid 13 and an injection nozzle 15 for injecting a gas 14 to the polishing object 12. A temperature stabilizing nozzle 23 for blowing the gas 24 from the blower 22 is installed around the polishing liquid layer 11 and directly faces the polishing liquid layer 11. The blower 22 is connected to the temperature controller 18, and the temperature controller 18 is connected to the thermometer 16. The blower 22 and the temperature controller 18 constitute a “temperature adjusting means”.

その研磨液槽１１は、所定の容量の研磨液１３が貯留可能な大きさの四角形の箱形状を呈し、内部の略中央部に研磨対象物１２が配設できるように構成されている。   The polishing liquid tank 11 has a rectangular box shape capable of storing a predetermined volume of polishing liquid 13, and is configured such that the polishing object 12 can be disposed at a substantially central portion inside.

その研磨液１３は、研磨材と水とを混合したもので、この研磨材としては、酸化物系（ＣｅＯ2 、ＺｒＯ2 、Ａｌ2 Ｏ3 ）の研磨材、コロイダルシリカ等が用いられる。 The polishing liquid 13 is a mixture of an abrasive and water. As this abrasive, an oxide-based (CeO 2 , ZrO 2 , Al 2 O 3 ) abrasive, colloidal silica, or the like is used.

また、研磨対象物１２としては、蛍石、石英、紫外線用多成分ガラス、低熱膨張ガラス、シリコン、無電解ニッケル等が用いられる。   As the polishing object 12, fluorite, quartz, ultraviolet multicomponent glass, low thermal expansion glass, silicon, electroless nickel, or the like is used.

さらにまた、温度コントローラー１８は、研磨液１３の温度を計測するための温度計１６に接続されている。   Furthermore, the temperature controller 18 is connected to a thermometer 16 for measuring the temperature of the polishing liquid 13.

このようなものにあっては、噴射ノズル１５から気体１４が噴射され、その気体１４に巻き込まれた研磨液１３が、研磨対象物１２の表面に衝突することにより、この研磨対象物１２の表面が研磨される。噴射された気体１４は、図２で示したように、急激に温度低下するが、温度計１６で計測された温度を基に、所定の温度になるように温度コントローラー１８が演算を行い、演算結果を送風機２２にフィードバックさせることにより、送風機２２から送出される気体２４の温度を制御したり、所定の温度の気体２４の送風量を制御することによって、研磨液１３の温度を一定に調節するようにしている。これにより、研磨速度を一定に保つことができ、安定した研磨が実施可能となる。   In such a case, the gas 14 is injected from the injection nozzle 15, and the polishing liquid 13 entrained in the gas 14 collides with the surface of the polishing object 12, whereby the surface of the polishing object 12. Is polished. As shown in FIG. 2, the injected gas 14 rapidly decreases in temperature, but based on the temperature measured by the thermometer 16, the temperature controller 18 performs calculation so that the temperature reaches a predetermined temperature. By feeding back the result to the blower 22, the temperature of the gas 24 sent from the blower 22 is controlled, or the temperature of the polishing liquid 13 is adjusted to be constant by controlling the blown amount of the gas 24 at a predetermined temperature. I am doing so. As a result, the polishing rate can be kept constant and stable polishing can be performed.

また、研磨材と混合させる液体として、水など沸点が比較的高く、化学反応性のない液体の場合は、研磨液１３、若しくは研磨液槽１１をヒーター（図示せず）で直接加熱する手法（以下、「直接加熱法」という。）が好適であるが、アルコール類やその他有機溶媒のように沸点が比較的低くて化学反応性が高く、場合によっては引火する液体を使用する場合には、直接加熱法によると、熱が局所に集中して、局所的に沸点を超えてしまったり、又、液体の変性を引き起こす虞がある。そこで、気体２４を用いて研磨液槽１１を加温することとすれば、研磨液槽１１を穏やかに加温することができる。   In addition, when the liquid to be mixed with the abrasive is a liquid having a relatively high boiling point such as water and no chemical reactivity, a method of directly heating the polishing liquid 13 or the polishing liquid tank 11 with a heater (not shown) ( Hereinafter, it is referred to as “direct heating method”), but when using a liquid having a relatively low boiling point and high chemical reactivity, such as alcohols and other organic solvents, and in some cases, a flammable liquid, According to the direct heating method, there is a possibility that heat is concentrated locally and exceeds the boiling point locally, or the liquid is denatured. Therefore, if the polishing liquid tank 11 is heated using the gas 24, the polishing liquid tank 11 can be gently heated.

なお、本発明の実施の形態１の変形例として、噴射ノズル１５から噴射される気体１４自体を所定の温度に暖めて、噴射ノズル１５から噴出させても良い。また、噴射ノズル１５自体を所定の温度に暖めることにより、研磨液１３を暖めるためのヒーターとして用いても良い。これらの構成を用いることで、研磨液１３の温度を一定に保つことが可能となる。したがって、研磨速度を一定に保つことができ、安定した研磨が実施可能となる。   As a modification of the first embodiment of the present invention, the gas 14 itself injected from the injection nozzle 15 may be warmed to a predetermined temperature and ejected from the injection nozzle 15. Moreover, you may use as a heater for warming polishing liquid 13 by heating injection nozzle 15 itself to predetermined temperature. By using these configurations, the temperature of the polishing liquid 13 can be kept constant. Therefore, the polishing rate can be kept constant, and stable polishing can be performed.

本発明の実施の形態１に係る研磨装置１０の概念図である。1 is a conceptual diagram of a polishing apparatus 10 according to Embodiment 1 of the present invention. 気体噴射による温度分布図である。It is a temperature distribution figure by gas injection. 気体噴射による研磨加工量の温度依存性を示す図である。It is a figure which shows the temperature dependence of the grinding | polishing processing amount by gas injection.

符号の説明Explanation of symbols

１０……研磨装置
１１……研磨液槽
１２……研磨対象物
１３……研磨液
１４……気体
１５……噴射ノズル
１６……温度計
１８……温度コントローラー
２２……送風機
２３……温度安定用ノズル
２４……気体 DESCRIPTION OF SYMBOLS 10 ... Polishing apparatus 11 ... Polishing liquid tank 12 ... Polishing object 13 ... Polishing liquid 14 ... Gas 15 ... Injection nozzle 16 ... Thermometer 18 ... Temperature controller 22 ... Blower 23 ... Temperature stability Nozzles 24 …… Gas

Claims (3)

研磨液槽内の研磨液に研磨対象物を浸し、該研磨対象物の表面に気体を噴射することによって前記表面の研磨を行う研磨装置であって、
研磨時間中の前記研磨液の温度を一定に保つための温度調節手段を備え、
前記温度調節手段は、前記研磨液槽の壁面に気体を吹き付ける気体吹付手段を設置し、該気体吹付手段により吹き付ける気体の温度を制御することにより、前記研磨液の温度を一定に保つことを特徴とする研磨装置。 A polishing apparatus that polishes the surface by immersing a polishing object in a polishing liquid in a polishing liquid tank and injecting a gas onto the surface of the polishing object,
Comprising a temperature adjusting means for keeping the temperature of the polishing liquid constant during the polishing time;
The temperature adjusting means is provided with gas blowing means for blowing gas onto the wall surface of the polishing liquid tank, and the temperature of the polishing liquid is kept constant by controlling the temperature of the gas blown by the gas blowing means. Polishing equipment. 研磨液槽内の研磨液に研磨対象物を浸し、該研磨対象物の表面に気体を噴射することによって前記表面の研磨を行う研磨装置であって、
研磨時間中の前記研磨液の温度を一定に保つための温度調節手段を備え、
前記温度調節手段は、前記研磨液槽の壁面に所定の温度の気体を吹き付ける気体吹付手段を設置し、該気体吹付手段により吹き付ける気体の送風量を制御することにより、前記研磨液の温度を一定に保つことを特徴とする研磨装置。 A polishing apparatus that polishes the surface by immersing a polishing object in a polishing liquid in a polishing liquid tank and injecting a gas onto the surface of the polishing object,
Comprising a temperature adjusting means for keeping the temperature of the polishing liquid constant during the polishing time;
The temperature adjusting means is provided with gas blowing means for blowing a gas at a predetermined temperature onto the wall surface of the polishing liquid tank, and the temperature of the polishing liquid is kept constant by controlling the amount of gas blown by the gas blowing means. A polishing apparatus characterized in that it is kept at a high level. 前記温度調節手段は、前記気体吹付手段により吹き付ける気体を用いて前記研磨液槽を加温することを特徴とする請求項１または２に記載の研磨装置。The polishing apparatus according to claim 1, wherein the temperature adjusting unit heats the polishing liquid tank using a gas blown by the gas blowing unit.
JP2008263753A 2008-10-10 2008-10-10 Polishing equipment Expired - Fee Related JP4710952B2 (en)

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CN110666703B (en) * 2019-09-12 2021-04-16 武汉大学 Closed autogenous abrasive material jet device and experimental method using same
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JPS6213528A (en) * 1985-07-11 1987-01-22 Nippon Steel Corp Apparatus for heat treating hot rolled rail
JPH01147051A (en) * 1987-12-03 1989-06-08 Toshiba Corp Method and apparatus for flame spraying inner surface of thin-walled cylindrical body
JPH01242719A (en) * 1988-03-24 1989-09-27 Nippon Steel Corp Equipment for heat-treating hot-rolled rail
JPH0839428A (en) * 1994-07-22 1996-02-13 Yamaguchi Pref Gov Coolant supplying device for both dry type cutting grinding wheel and wet type cutting grinding wheel
JPH10303155A (en) * 1997-04-24 1998-11-13 Hitachi Ltd Polishing method and polishing device
JPH11347935A (en) * 1998-06-10 1999-12-21 Ebara Corp Polishing device
JP2000079553A (en) * 1998-09-02 2000-03-21 Nec Corp Polishing device and polishing method
JP2000158330A (en) * 1998-11-30 2000-06-13 Speedfam-Ipec Co Ltd Manufacturing device for highly flat material
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