JP4211185B2 - Glass substrate storage jig for CVD and ALE equipment - Google Patents

Glass substrate storage jig for CVD and ALE equipment Download PDF

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Publication number
JP4211185B2
JP4211185B2 JP2000058004A JP2000058004A JP4211185B2 JP 4211185 B2 JP4211185 B2 JP 4211185B2 JP 2000058004 A JP2000058004 A JP 2000058004A JP 2000058004 A JP2000058004 A JP 2000058004A JP 4211185 B2 JP4211185 B2 JP 4211185B2
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glass substrate
cvd
support portion
storage jig
back surface
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JP2001240972A (en
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和重 末松
和彦 杉浦
岡田　　伸彦
保之 田中
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Denso Corp
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Denso Corp
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Description

【０００１】
【発明の属する技術分野】
本発明は、半導体素子の製造プロセスにおけるガラス基板への薄膜形成、例えば金属膜、酸化膜などの成膜を行ったり、或いはガラス基板への単結晶層のエピタキシャル成膜を行なう半導体成膜装置における反応容器内でのガラス基板の収納治具に関するものである。
【０００２】
【従来の技術】
ガラス基板に絶縁膜を形成するＣＶＤやＡＬＥ（Atomic Layer Epitaxy）装置等では、約３００℃以上の高温が大型ガラス基板に印加される場合がある。このような大型ガラス基板をＡＬＥ装置にて処理する場合、反応容器内での大型ガラス基板の支持として、熱変形を考慮すると図７のようにガラス面を点で支持する方法が容易に考えられる。これは、台座Ａに固定された位置決めピンＢによってガラス基板Ｃを支持する方法である。この場合、反応容器内の成膜ガスがガラス基板の裏面に容易に回り込んでしまうため、ガラス基板の一部しか正常部が得られなかったり、成膜後に膜を剥離するという余分な工程を必要とするという問題があった。
【０００３】
また、このガラス基板の裏面への成膜ガスの回り込みを防止するには、シール性を向上させれば良く、ガラス基板の周囲と裏面とをシール材でシールする方法が考えられる。しかし、ＣＶＤやＡＬＥ装置等で３００℃以上の高温が印加される場合は、ゴム等の軟弱なシール部品が適用できず、金属によるシール即ちガラスと金属を接触させることが必須となっている。しかしながら、高温下においては金属とガラスの線膨張係数の違いによるガラス基板とこれを保持する治具との温度変形差により、ガラスの欠け・割れが発生してしまう。生産効率を向上するために、ガラス基板が大型化すると特にこの問題は重要である。
【０００４】
【発明が解決しようとする課題】
本発明の目的は、このガスのガラス基板の回り込みによるガラス基板裏面への成膜量が、ガス流の方向とガスの乱流とに相関関係があることに着目し、ガラス基板の割れ・欠けとガラス基板裏面への成膜との２つの問題を解決したＣＶＤ，ＡＬＥ装置用ガラス基板収納治具を提供することである。
【０００５】
【課題を解決するための手段】
本発明は、前記課題を解決するための手段として、特許請求の範囲の各請求項に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具を提供する。
請求項１に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具は、ガラス基板の４つの側面を支える上部カバー部、下部支持部及び左右側面支持部のうち少なくともガス流の下流に位置する下部支持部がガラス基板の下辺表面を覆う押え壁を有することにより、ガス流下流に位置するガラス基板の下部でのガラス基板裏面への回り込むガス量が最も多い回り込みを防止でき、正常な成膜部が多くなり、生産性が向上する。
【０００６】
請求項２の該収納治具は、ガラス基板の４つの側面を支える上部カバー部、下部支持部及び左右側面支持部とを備えていて、上部カバー部、下部支持部及び左右側面支持部の各々が、ガラス基板の各周辺表面を覆う押え壁を有することにより、ガラス基板の各周辺でのガス流の回り込みが防止でき、ガス流の回り込みが更に改善される。
請求項３の該収納治具は、押え壁のガラス基板と接する側と反対側の端部を流線形にしたものであり、ガス流が押え壁の端部に当って乱流となることを低減でき、ガス流が押え壁の流線形に沿ってスムーズに流れるので、ガス流のガラス基板裏面への回り込みが一層改善される。
【０００７】
請求項４の該収納治具は、ガラス基板を挟持する押え壁と裏面支持部との間隔を可変することで、成膜中の熱による材料の熱膨張差による変形を吸収でき、ガラス基板の割れ・欠けを防止できる。更にガラス基板をセットする際に挿入部位（間隔）を拡げ、挿入後に該部位を狭めることで、セット時のガラス基板の割れ・欠けも防止できる。
請求項５の該収納治具は、前記押え壁と前記裏面支持部との間隔を可変にする機構を具体化したものであり、請求項４と同様の作用効果を奏する。
請求項６の該収納治具は、ガラス基板を２枚一組として裏面支持部の両側で支持することにより、ガラス基板を効率よく支持でき、ほぼ２倍の生産効率を上げることができる。
【０００８】
【発明の実施の形態】
以下図面を参照して、本発明の実施の形態のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具について説明する。一般にＣＶＤ，ＡＬＥ装置においては、図６に示すように反応容器１内に成膜するガラス基板１０を収納した収納治具２０を載置する支持台２が設けられ、反応容器１には原料ガスを供給するための供給管３とガスを排気するための排気管４が接続されている。このガラス基板１０は、垂直状又は水平状或いは傾斜状に多数並置される。供給される原料ガス、例えばＡｌＣｌ3 ，ＴｉＣｌ2 等は、反応容器１内の高温雰囲気中で同じく供給された水（Ｈ2 Ｏ）と反応し、ガラス基板１０上にＡｌ2 Ｏ3 又はＴｉＯ2 等の膜を生成すると同時にガス状の副生成物を発生する。これが排気管４から排気される。
【０００９】
図１は、本発明の実施の形態のガラス基板収納治具２０を示している。収納治具２０は、ガラス基板１０の裏面を支える裏面支持部２１と、ガラス基板１０の４つの側面を支える上部カバー部２２、下部支持部２３及び側面支持部２４とから構成されている。更にこれら上部カバー部２２、下部支持部２３及び側面支持部２４は、ガラス基板１０の表面周辺を覆うための押え壁２５をそれぞれ有している。したがって、図２，３に示されるように、ガラス基板１０は、裏面支持部２１と押え壁２５とにより挟持されるようになる。
この押え壁２５は、それぞれ対応する上部カバー部２２、下部支持部２３及び側面支持部２４に一体に形成されてよく、又は別体として形成され溶接、ボルト等により固着してもよい。また、図示されてはいないが、裏面支持部２１と、上部カバー部２２、下部支持部２３及び側面支持部２４とは、ボルト等により数個所で締結されている。
【００１０】
図１に示されたものでは、ガラス基板１０の４辺に渡って押え壁２５が設けられているが、実際にはガス流は下流に位置するガラス基板１０の下部から裏面に回り込むのが最も多く、図２に示されるように、ガラス基板１０の裏面支持部２１と、押え壁２５を有する下部支持部２３のみを設けるだけで、かなりの効果を上げることができるものである。
【００１１】
図３は、押え壁２５の別の実施の形態を示すもので、ここでは押え壁２５のガラス基板１０と接しない方の端部２６を流線形にしている。これは、図２のように押え壁２５の該端部２６が角部を形成していると、ガス流がこの角部に当って乱流を発生し、押え壁２５とガラス基板１０との隙間から入り込みガラス基板１０の裏面にいくらか回り込むために、このガス漏れを更に防止するために流線形にしたものである。これにより、ガス流はスムーズになり、乱流の発生が押えられる。なお、図３に示されるように下部支持部２３の下端部も流線形にすると一層効果が上がる。
【００１２】
図４の（ａ）は、更に別の実施の形態を示すもので、押え壁２５と裏面支持部２１と間隔を可変にする構造としている。これは成膜中の熱によるガラス基板１０と収納治具２０との熱膨張差から、この間隔が不規則に変形する。そこでガラス基板１０の側面の支持部である上部カバー部２２、下部支持部２３及び側面支持部２４と裏面支持部２１との締結を、溶接等の完全固定式から数mm程度ずれて可動する構造とすることで、この変形を吸収しガラスの割れ・欠けを防止するようにしている。
【００１３】
図４の（ｂ）は、この１つの実施例を示している。下部支持部２３には、裏面支持部２１に締結するための孔２７が穿設される。ボルト等の締結具３０を挿通する穴３１が明けられた円筒状のカラー３２が、下部支持部２３の孔２７内に配置される。孔２７の内径は、カラー３２の外径より大きく、カラー３２が横方向に数mm程度移動できる大きさとなっている。カラー３２の前後には孔２７より大きな径のワッシャー３３が配置される。このような状態で、締結具３０をワッシャー３３及びカラー３２を挿通し、裏面支持部２１のねじ穴に螺合することで裏面支持部２１と下部支持部２３とが締結される。このような締結個所がガラス基板１０の１側辺当り数個所設けられる。なお、下部支持部２３の表面からワッシャー３３が突出しないように、下部支持部２３の表面にはワッシャー３３の収容部が形成されている。
この構造により下部支持部２３は裏面支持部２１に対して横方向に数mm程度移動できる。即ち裏面支持部２１と押え壁２５との間隔が可変にできるものである。
従って、ガラス基板の大型化によって厳しくなった熱膨張差による変形の影響を排除できる。
【００１４】
前記のように下部支持部２３と裏面支持部２１との可動構造は、大型ガラス基板１０をセットする際に、裏面支持部２１と押え壁２５とで形成される挿入部位を拡げ、ガラス基板を挿入後に手で押す等によって狭めることで、セット時のガラスの欠け・割れを防止することもできる。
なお、下部支持部２３以外の上部カバー部２２及び側面支持部２４にも、前記の裏面支持部２１との可動構造を採用できるものである。
【００１５】
図５は更に別の実施の形態を示すもので、裏面支持部２１の両面にガラス基板１０を配置したものである。当然、この場合には押え壁２５は、上部カバー部２２、下部支持部２３及び側面支持部２４とも両側に設けられている。また、前記した押え壁２５の端部２６の流線形化及び裏面支持部２１と支持部２２，２３，２４との可動な締結構造を適宜採用できるものである。
このように裏面支持部の両側を有効に利用することで、省スペースでなおかつ約２倍のガラス基板を収納できる。
なお、本実施の形態では、ガラス基板を垂直に多数並置する場合を例にとって説明しているが、水平に多数並置する場合においても適用可能なものである。その場合は、原料ガスを反応容器内に横方向から導入して、ガス状副生成物を横方向から排出する等の工夫が必要であろう。
【００１６】
以上説明したように本発明のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具においては、ガラス基板の成膜の不具合部を減少できると共に大型のガラス基板であっても割れ・欠けを防止することができ、かつ省スペースで大量のガラス基板を収納できるので、１バッチの処理時間が約１２時間程かかるＣＶＤ，ＡＬＥ装置にあっては、その生産効率を格段に改善できるものである。
【図面の簡単な説明】
【図１】本発明の実施の形態のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具の斜視図である。
【図２】本発明の収納治具の一部側面拡大図である。
【図３】本発明の別の実施の形態の収納治具の一部側面拡大図である。
【図４】（ａ）は本発明の更に別の実施の形態の収納治具の一部側面拡大図で、（ｂ）はその一実施例を示す一部側面拡大断面図である。
【図５】本発明の更に別の実施の形態の収納治具の一部側面拡大図である。
【図６】ＣＶＤ，ＡＬＥ装置の反応容器内に配置されたガラス基板収納治具を概念的に説明する図である。
【図７】従来のガラス基板収納治具を説明する図である。
【符号の説明】
１０…ガラス基板
２０…収納治具
２１…裏面支持部
２２…上部カバー部
２３…下部支持部
２４…側面支持部
２５…押え壁
２６…端部
３０…締結具
３２…カラー
３３…ワッシャー[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a reaction in a semiconductor film forming apparatus for forming a thin film on a glass substrate in a manufacturing process of a semiconductor element, for example, forming a metal film, an oxide film or the like, or epitaxially forming a single crystal layer on a glass substrate. The present invention relates to a glass substrate storage jig in a container.
[0002]
[Prior art]
In a CVD or ALE (Atomic Layer Epitaxy) apparatus that forms an insulating film on a glass substrate, a high temperature of about 300 ° C. or higher may be applied to the large glass substrate. When such a large glass substrate is processed by an ALE apparatus, a method of supporting the glass surface with dots as shown in FIG. 7 can be easily considered when supporting the large glass substrate in the reaction vessel in consideration of thermal deformation. . This is a method in which the glass substrate C is supported by the positioning pins B fixed to the pedestal A. In this case, since the film forming gas in the reaction vessel easily wraps around the back surface of the glass substrate, only a part of the glass substrate can be obtained as a normal part, or an extra step of peeling the film after film forming is performed. There was a problem of need.
[0003]
Further, in order to prevent the deposition gas from flowing into the back surface of the glass substrate, it is only necessary to improve the sealing property, and a method of sealing the periphery and the back surface of the glass substrate with a sealing material is conceivable. However, when a high temperature of 300 ° C. or higher is applied by a CVD or ALE apparatus or the like, a soft seal component such as rubber cannot be applied, and it is essential to make a metal seal, that is, a glass and a metal contact. However, at high temperatures, glass chips and cracks are generated due to the temperature deformation difference between the glass substrate and the jig holding the glass substrate due to the difference in the linear expansion coefficient between metal and glass. This problem is particularly important when the glass substrate is enlarged in order to improve production efficiency.
[0004]
[Problems to be solved by the invention]
The purpose of the present invention is to focus on the fact that the amount of film formed on the back surface of the glass substrate due to the wrapping of the glass substrate correlates with the gas flow direction and the gas turbulence. And a glass substrate storage jig for a CVD / ALE apparatus that solves the two problems of film formation on the back surface of the glass substrate.
[0005]
[Means for Solving the Problems]
The present invention provides a glass substrate storage jig for a CVD / ALE apparatus according to the claims as a means for solving the problems.
The glass substrate storage jig for CVD and ALE apparatus according to claim 1 is a lower support located at least downstream of the gas flow among an upper cover portion, a lower support portion, and left and right side support portions that support four side surfaces of the glass substrate. By having a holding wall that covers the lower side surface of the glass substrate, it is possible to prevent the wraparound with the largest amount of gas flowing into the back surface of the glass substrate at the lower part of the glass substrate located downstream of the gas flow. Increases productivity.
[0006]
The storage jig according to claim 2 includes an upper cover portion, a lower support portion, and left and right side support portions that support four side surfaces of the glass substrate, and each of the upper cover portion, the lower support portion, and the left and right side support portions. However, by having the holding wall covering each peripheral surface of the glass substrate, it is possible to prevent the gas flow from wrapping around each glass substrate, and the gas flow wraparound is further improved.
The storage jig according to claim 3 is configured such that the end of the press wall opposite to the side in contact with the glass substrate is streamlined, and the gas flow hits the end of the press wall and becomes a turbulent flow. Since the gas flow smoothly flows along the streamline of the holding wall, the wraparound of the gas flow to the rear surface of the glass substrate is further improved.
[0007]
The storage jig according to claim 4 can absorb the deformation due to the difference in thermal expansion of the material due to the heat during film formation by changing the distance between the holding wall that sandwiches the glass substrate and the back surface support portion. Can prevent cracking and chipping. Further, when the glass substrate is set, the insertion portion (interval) is expanded, and the portion is narrowed after the insertion, whereby the glass substrate can be prevented from cracking or chipping during setting.
The storage jig according to a fifth aspect of the present invention embodies a mechanism that makes the distance between the presser wall and the back surface support portion variable, and has the same effect as that of the fourth aspect.
The storage jig according to claim 6 can support the glass substrate efficiently by supporting two glass substrates as a set on both sides of the back surface support portion, and can increase the production efficiency almost twice.
[0008]
DETAILED DESCRIPTION OF THE INVENTION
A glass substrate storage jig for a CVD / ALE apparatus according to an embodiment of the present invention will be described below with reference to the drawings. In general, in a CVD / ALE apparatus, as shown in FIG. 6, a support base 2 is provided on which a storage jig 20 storing a glass substrate 10 to be formed is placed in a reaction vessel 1. A supply pipe 3 for supplying gas and an exhaust pipe 4 for exhausting gas are connected. A large number of glass substrates 10 are juxtaposed in a vertical shape, a horizontal shape, or an inclined shape. The supplied source gas, for example, AlCl 3 , TiCl 2, etc., reacts with water (H 2 O) that is also supplied in the high temperature atmosphere in the reaction vessel 1 to cause Al 2 O 3 or TiO 2 on the glass substrate 10. A gaseous by-product is generated at the same time as the formation of a film. This is exhausted from the exhaust pipe 4.
[0009]
FIG. 1 shows a glass substrate storage jig 20 according to an embodiment of the present invention. The storage jig 20 includes a back surface support portion 21 that supports the back surface of the glass substrate 10, an upper cover portion 22 that supports four side surfaces of the glass substrate 10, a lower support portion 23, and a side surface support portion 24. Furthermore, the upper cover part 22, the lower support part 23, and the side support part 24 each have a pressing wall 25 for covering the periphery of the surface of the glass substrate 10. Therefore, as shown in FIGS. 2 and 3, the glass substrate 10 is sandwiched between the back surface support portion 21 and the pressing wall 25.
The pressing wall 25 may be formed integrally with the corresponding upper cover portion 22, lower support portion 23, and side surface support portion 24, or may be formed as a separate body and fixed by welding, bolts, or the like. Although not shown in the drawing, the back surface support portion 21, the upper cover portion 22, the lower support portion 23, and the side surface support portion 24 are fastened at several locations by bolts or the like.
[0010]
In the case shown in FIG. 1, the holding wall 25 is provided over the four sides of the glass substrate 10, but in practice, the gas flow is most likely to circulate from the lower part of the glass substrate 10 located downstream to the back surface. In many cases, as shown in FIG. 2, it is possible to obtain a considerable effect only by providing only the back surface support portion 21 of the glass substrate 10 and the lower support portion 23 having the pressing wall 25.
[0011]
FIG. 3 shows another embodiment of the presser wall 25. Here, the end 26 of the presser wall 25 that is not in contact with the glass substrate 10 is streamlined. As shown in FIG. 2, when the end portion 26 of the presser wall 25 forms a corner portion, the gas flow hits the corner portion to generate a turbulent flow, and the presser wall 25 and the glass substrate 10 are In order to enter the gap and enter the back surface of the glass substrate 10 somewhat, it is streamlined to further prevent this gas leakage. Thereby, a gas flow becomes smooth and generation | occurrence | production of a turbulent flow is suppressed. In addition, if a lower end part of the lower support part 23 is also streamlined as shown in FIG.
[0012]
FIG. 4A shows still another embodiment, which has a structure in which the interval between the presser wall 25 and the back surface support portion 21 is variable. This interval is irregularly deformed due to a difference in thermal expansion between the glass substrate 10 and the storage jig 20 due to heat during film formation. Therefore, the upper cover portion 22, the lower support portion 23, and the side surface support portion 24, which are side surface support portions of the glass substrate 10, and the back surface support portion 21 can be fastened with a displacement of about several mm from a completely fixed type such as welding. By absorbing this deformation, the glass is prevented from cracking or chipping.
[0013]
FIG. 4B shows this one embodiment. The lower support portion 23 is provided with a hole 27 for fastening to the back surface support portion 21. A cylindrical collar 32 having a hole 31 through which a fastener 30 such as a bolt is inserted is disposed in the hole 27 of the lower support portion 23. The inner diameter of the hole 27 is larger than the outer diameter of the collar 32, and the collar 32 can move by several millimeters in the lateral direction. Before and after the collar 32, a washer 33 having a diameter larger than that of the hole 27 is disposed. In such a state, the back support 21 and the lower support 23 are fastened by inserting the washer 33 and the collar 32 through the fastener 30 and screwing into the screw holes of the back support 21. Several such fastening points are provided per side of the glass substrate 10. In addition, the accommodating part of the washer 33 is formed in the surface of the lower support part 23 so that the washer 33 may not protrude from the surface of the lower support part 23.
With this structure, the lower support portion 23 can move about several millimeters in the lateral direction with respect to the back support portion 21. That is, the distance between the back surface support portion 21 and the pressing wall 25 can be made variable.
Therefore, it is possible to eliminate the influence of deformation due to the difference in thermal expansion that has become severe due to the increase in size of the glass substrate.
[0014]
As described above, when the large glass substrate 10 is set, the movable structure of the lower support portion 23 and the back surface support portion 21 expands the insertion site formed by the back surface support portion 21 and the holding wall 25, and the glass substrate is The glass can be prevented from being broken or broken during setting by pressing it with a hand after insertion.
In addition, the movable structure with the said back surface support part 21 is employable also for the upper cover part 22 and the side surface support part 24 other than the lower support part 23.
[0015]
FIG. 5 shows still another embodiment in which glass substrates 10 are arranged on both surfaces of the back surface support portion 21. Naturally, in this case, the presser wall 25 is provided on both sides of the upper cover part 22, the lower support part 23, and the side face support part 24. Further, the above-described streamlining of the end portion 26 of the presser wall 25 and the movable fastening structure of the back surface support portion 21 and the support portions 22, 23, 24 can be appropriately employed.
Thus, by effectively using both sides of the back surface support portion, it is possible to store a glass substrate that is space-saving and about twice as large.
In this embodiment, the case where a large number of glass substrates are juxtaposed vertically has been described as an example, but the present invention can also be applied to a case where a large number of glass substrates are juxtaposed horizontally. In that case, it is necessary to devise such as introducing the raw material gas into the reaction vessel from the lateral direction and discharging the gaseous by-product from the lateral direction.
[0016]
As described above, in the glass substrate storage jig for CVD and ALE apparatus of the present invention, it is possible to reduce defective portions of film formation on the glass substrate and to prevent cracking and chipping even with a large glass substrate. In addition, since a large amount of glass substrates can be accommodated in a space-saving manner, the production efficiency can be remarkably improved in a CVD / ALE apparatus that takes about 12 hours of processing time for one batch.
[Brief description of the drawings]
FIG. 1 is a perspective view of a glass substrate storage jig for a CVD / ALE apparatus according to an embodiment of the present invention.
FIG. 2 is an enlarged partial side view of the storage jig of the present invention.
FIG. 3 is an enlarged partial side view of a storage jig according to another embodiment of the present invention.
FIG. 4A is an enlarged partial side view of a storage jig according to still another embodiment of the present invention, and FIG. 4B is an enlarged partial side sectional view showing an example thereof.
FIG. 5 is an enlarged partial side view of a storage jig according to still another embodiment of the present invention.
FIG. 6 is a diagram conceptually illustrating a glass substrate storage jig disposed in a reaction vessel of a CVD / ALE apparatus.
FIG. 7 is a diagram illustrating a conventional glass substrate storage jig.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 ... Glass substrate 20 ... Storage jig 21 ... Back surface support part 22 ... Upper cover part 23 ... Lower support part 24 ... Side surface support part 25 ... Pressing wall 26 ... End part 30 ... Fastener 32 ... Color 33 ... Washer

Claims (6)

原料ガスを使用して反応容器内で薄膜形成されるガラス基板を支持するためのＣＶＤ，ＡＬＥ装置用ガラス基板収納治具において、この収納治具が、
ガラス基板の裏面を支持する裏面支持部と、
ガラス基板の４つの側面を支える上部カバー部、下部支持部及び左右側面支持部と、
より構成され、
少なくともガス流の下流に位置する該下部支持部がガラス基板の下辺表面を覆う押え壁を有していることを特徴とするＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。In a glass substrate storage jig for a CVD / ALE apparatus for supporting a glass substrate formed into a thin film in a reaction vessel using a raw material gas,
A back support portion for supporting the back surface of the glass substrate;
An upper cover part, a lower support part and left and right side support parts that support the four side surfaces of the glass substrate;
Consists of
A glass substrate storage jig for a CVD / ALE apparatus, wherein at least the lower support portion located downstream of the gas flow has a pressing wall covering the lower surface of the glass substrate. ガラス基板の残りの３の側面を支える上部カバー部、左右側面支持部もそれぞれガラス基板の周辺表面を覆う押え壁を有していることを特徴とする請求項１に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。The upper cover part and the left and right side support parts for supporting the remaining three side surfaces of the glass substrate each have a pressing wall that covers the peripheral surface of the glass substrate. Glass substrate storage jig. 前記押え壁のガラス基板と接する側と反対側の端部を流線形として、ガス流の抵抗を低減したことを特徴とする請求項１又は２に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。The glass substrate storage jig for a CVD or ALE apparatus according to claim 1 or 2, wherein an end of the holding wall opposite to the side in contact with the glass substrate is streamlined to reduce gas flow resistance. . ガラス基板を挟持する前記押え壁と前記裏面支持部との間隔が可変となっていることを特徴とする請求項１〜３のいずれか一項に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。The glass substrate storage jig for a CVD or ALE apparatus according to any one of claims 1 to 3, wherein a distance between the holding wall for holding the glass substrate and the back surface support portion is variable. . 前記押え壁と前記裏面支持部との間を可変とする機構が、ボルトを挿通する穴を有する円筒状カラーを、少なくとも前記下部支持部に穿孔された、カラーの外径よりやや大きい径の孔内に配置し、該カラーを利用して前記下部支持部と前記裏面支持部とをボルトで締結することよりなることを特徴とする請求項４に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。A hole having a diameter slightly larger than the outer diameter of the collar, in which a mechanism that makes the space between the presser wall and the back surface support portion pierced at least in the lower support portion has a cylindrical collar having a hole through which a bolt is inserted. The glass substrate storage jig for a CVD / ALE apparatus according to claim 4, wherein the jig is disposed inside and the lower support part and the back support part are fastened with bolts using the collar. . ガラス基板が２枚一組として裏面支持部の両側で保持されていることを特徴とする請求項１〜５のいずれか一項に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。The glass substrate storage jig for a CVD or ALE apparatus according to any one of claims 1 to 5, wherein two glass substrates are held as a set on both sides of the back surface support portion.
JP2000058004A 2000-02-29 2000-02-29 Glass substrate storage jig for CVD and ALE equipment Expired - Fee Related JP4211185B2 (en)

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