JP2001240972A - Glass substrate storage jig for cvd and ale system - Google Patents
Glass substrate storage jig for cvd and ale systemInfo
- Publication number
- JP2001240972A JP2001240972A JP2000058004A JP2000058004A JP2001240972A JP 2001240972 A JP2001240972 A JP 2001240972A JP 2000058004 A JP2000058004 A JP 2000058004A JP 2000058004 A JP2000058004 A JP 2000058004A JP 2001240972 A JP2001240972 A JP 2001240972A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- cvd
- storage jig
- ale
- support portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、半導体素子の製造
プロセスにおけるガラス基板への薄膜形成、例えば金属
膜、酸化膜などの成膜を行ったり、或いはガラス基板へ
の単結晶層のエピタキシャル成膜を行なう半導体成膜装
置における反応容器内でのガラス基板の収納治具に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a thin film on a glass substrate, for example, forming a metal film, an oxide film, or the like, in a semiconductor device manufacturing process, or for forming an epitaxial film of a single crystal layer on a glass substrate. The present invention relates to a jig for accommodating a glass substrate in a reaction vessel in a semiconductor film forming apparatus.
【０００２】[0002]
【従来の技術】ガラス基板に絶縁膜を形成するＣＶＤや
ＡＬＥ（Atomic Layer Epitaxy）装置等では、約３００
℃以上の高温が大型ガラス基板に印加される場合があ
る。このような大型ガラス基板をＡＬＥ装置にて処理す
る場合、反応容器内での大型ガラス基板の支持として、
熱変形を考慮すると図７のようにガラス面を点で支持す
る方法が容易に考えられる。これは、台座Ａに固定され
た位置決めピンＢによってガラス基板Ｃを支持する方法
である。この場合、反応容器内の成膜ガスがガラス基板
の裏面に容易に回り込んでしまうため、ガラス基板の一
部しか正常部が得られなかったり、成膜後に膜を剥離す
るという余分な工程を必要とするという問題があった。2. Description of the Related Art In a CVD or ALE (Atomic Layer Epitaxy) apparatus for forming an insulating film on a glass substrate, about 300
In some cases, a high temperature of not less than ° C is applied to a large glass substrate. When such a large glass substrate is processed by the ALE apparatus, as a support for the large glass substrate in the reaction vessel,
Considering thermal deformation, a method of supporting the glass surface at points as shown in FIG. 7 can be easily considered. This is a method in which a glass substrate C is supported by positioning pins B fixed to a pedestal A. In this case, since the film forming gas in the reaction vessel easily flows around to the back surface of the glass substrate, only a part of the glass substrate can have a normal part, or an extra step of peeling the film after film formation is required. There was a problem of needing.
【０００３】また、このガラス基板の裏面への成膜ガス
の回り込みを防止するには、シール性を向上させれば良
く、ガラス基板の周囲と裏面とをシール材でシールする
方法が考えられる。しかし、ＣＶＤやＡＬＥ装置等で３
００℃以上の高温が印加される場合は、ゴム等の軟弱な
シール部品が適用できず、金属によるシール即ちガラス
と金属を接触させることが必須となっている。しかしな
がら、高温下においては金属とガラスの線膨張係数の違
いによるガラス基板とこれを保持する治具との温度変形
差により、ガラスの欠け・割れが発生してしまう。生産
効率を向上するために、ガラス基板が大型化すると特に
この問題は重要である。Further, in order to prevent the film formation gas from sneaking into the back surface of the glass substrate, it is only necessary to improve the sealing property, and a method of sealing the periphery and the back surface of the glass substrate with a sealing material can be considered. However, 3
When a high temperature of 00 ° C. or more is applied, soft sealing parts such as rubber cannot be applied, and it is essential to seal with metal, that is, to contact glass with metal. However, at high temperatures, the glass substrate is chipped or cracked due to the difference in temperature deformation between the glass substrate and the jig holding the glass substrate due to the difference in linear expansion coefficient between the metal and the glass. This problem is particularly important when the size of the glass substrate is increased in order to improve the production efficiency.
【０００４】[0004]
【発明が解決しようとする課題】本発明の目的は、この
ガスのガラス基板の回り込みによるガラス基板裏面への
成膜量が、ガス流の方向とガスの乱流とに相関関係があ
ることに着目し、ガラス基板の割れ・欠けとガラス基板
裏面への成膜との２つの問題を解決したＣＶＤ，ＡＬＥ
装置用ガラス基板収納治具を提供することである。An object of the present invention is that the amount of film formed on the back surface of the glass substrate due to the gas wrapping around the glass substrate has a correlation between the direction of the gas flow and the turbulent gas flow. Attention has been paid to CVD and ALE that solve two problems: cracking and chipping of the glass substrate and film formation on the back surface of the glass substrate.
An object of the present invention is to provide a glass substrate storage jig for an apparatus.
【０００５】[0005]
【課題を解決するための手段】本発明は、前記課題を解
決するための手段として、特許請求の範囲の各請求項に
記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具を提供
する。請求項１に記載のＣＶＤ，ＡＬＥ装置用ガラス基
板収納治具は、ガラス基板の４つの側面を支える上部カ
バー部、下部支持部及び左右側面支持部のうち少なくと
もガス流の下流に位置する下部支持部がガラス基板の下
辺表面を覆う押え壁を有することにより、ガス流下流に
位置するガラス基板の下部でのガラス基板裏面への回り
込むガス量が最も多い回り込みを防止でき、正常な成膜
部が多くなり、生産性が向上する。According to the present invention, there is provided a jig for accommodating a glass substrate for a CVD or ALE apparatus according to the present invention. The glass substrate storage jig for a CVD or ALE apparatus according to claim 1, wherein the lower support located at least downstream of the gas flow among the upper cover, the lower support, and the left and right side supports supporting the four side surfaces of the glass substrate. Section has a pressing wall that covers the lower surface of the glass substrate, so that the largest amount of gas flowing to the back of the glass substrate at the lower part of the glass substrate located downstream of the gas flow can be prevented, and a normal film forming section can be prevented. Increase, and productivity is improved.
【０００６】請求項２の該収納治具は、ガラス基板の４
つの側面を支える上部カバー部、下部支持部及び左右側
面支持部とを備えていて、上部カバー部、下部支持部及
び左右側面支持部の各々が、ガラス基板の各周辺表面を
覆う押え壁を有することにより、ガラス基板の各周辺で
のガス流の回り込みが防止でき、ガス流の回り込みが更
に改善される。請求項３の該収納治具は、押え壁のガラ
ス基板と接する側と反対側の端部を流線形にしたもので
あり、ガス流が押え壁の端部に当って乱流となることを
低減でき、ガス流が押え壁の流線形に沿ってスムーズに
流れるので、ガス流のガラス基板裏面への回り込みが一
層改善される。According to a second aspect of the present invention, the storage jig is made of a glass substrate.
An upper cover portion, a lower support portion, and a left and right side support portion that support one side surface, and each of the upper cover portion, the lower support portion, and the left and right side support portions has a holding wall that covers each peripheral surface of the glass substrate. This makes it possible to prevent the gas flow from flowing around each of the glass substrates, thereby further improving the gas flow. In the storage jig of the third aspect, the end of the holding wall opposite to the side in contact with the glass substrate has a streamlined shape, and the gas flow hits the end of the holding wall and becomes turbulent. Since the gas flow can be reduced and the gas flow smoothly flows along the streamline of the holding wall, the flow of the gas flow to the back surface of the glass substrate is further improved.
【０００７】請求項４の該収納治具は、ガラス基板を挟
持する押え壁と裏面支持部との間隔を可変することで、
成膜中の熱による材料の熱膨張差による変形を吸収で
き、ガラス基板の割れ・欠けを防止できる。更にガラス
基板をセットする際に挿入部位（間隔）を拡げ、挿入後
に該部位を狭めることで、セット時のガラス基板の割れ
・欠けも防止できる。請求項５の該収納治具は、前記押
え壁と前記裏面支持部との間隔を可変にする機構を具体
化したものであり、請求項４と同様の作用効果を奏す
る。請求項６の該収納治具は、ガラス基板を２枚一組と
して裏面支持部の両側で支持することにより、ガラス基
板を効率よく支持でき、ほぼ２倍の生産効率を上げるこ
とができる。According to a fourth aspect of the present invention, the distance between the holding wall for holding the glass substrate and the back support is variable.
Deformation due to a difference in thermal expansion of a material due to heat during film formation can be absorbed, and cracking and chipping of a glass substrate can be prevented. Further, by increasing the insertion portion (interval) when setting the glass substrate and narrowing the insertion portion after insertion, cracking and chipping of the glass substrate during setting can be prevented. According to a fifth aspect of the present invention, there is provided a storage jig which implements a mechanism for varying a distance between the holding wall and the back support, and has the same operation and effect as the fourth aspect. According to the storage jig of the sixth aspect, by supporting the glass substrate as a set of two glass sheets on both sides of the back surface supporting portion, the glass substrate can be efficiently supported, and the production efficiency can be almost doubled.
【０００８】[0008]
【発明の実施の形態】以下図面を参照して、本発明の実
施の形態のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具に
ついて説明する。一般にＣＶＤ，ＡＬＥ装置において
は、図６に示すように反応容器１内に成膜するガラス基
板１０を収納した収納治具２０を載置する支持台２が設
けられ、反応容器１には原料ガスを供給するための供給
管３とガスを排気するための排気管４が接続されてい
る。このガラス基板１０は、垂直状又は水平状或いは傾
斜状に多数並置される。供給される原料ガス、例えばＡ
ｌＣｌ3 ，ＴｉＣｌ2 等は、反応容器１内の高温雰囲気
中で同じく供給された水（Ｈ 2 Ｏ）と反応し、ガラス基
板１０上にＡｌ2 Ｏ3 又はＴｉＯ2 等の膜を生成すると
同時にガス状の副生成物を発生する。これが排気管４か
ら排気される。BRIEF DESCRIPTION OF THE DRAWINGS FIG.
For glass substrate storage jig for CVD and ALE equipment of the embodiment
explain about. Generally in CVD and ALE equipment
Is a glass substrate formed in the reaction vessel 1 as shown in FIG.
The support table 2 on which the storage jig 20 storing the plate 10 is placed is provided.
And supply the raw material gas to the reaction vessel 1.
A pipe 3 and an exhaust pipe 4 for exhausting gas are connected.
You. This glass substrate 10 is vertically or horizontally or tilted.
Many are juxtaposed side by side. Source gas supplied, for example, A
lClThree, TiClTwoIs the high temperature atmosphere in the reaction vessel 1.
Water (H TwoO) and reacts with glass
Al on the plate 10TwoOThreeOr TiOTwoWhen a film such as
At the same time, gaseous by-products are generated. This is the exhaust pipe 4
Exhausted.
【０００９】図１は、本発明の実施の形態のガラス基板
収納治具２０を示している。収納治具２０は、ガラス基
板１０の裏面を支える裏面支持部２１と、ガラス基板１
０の４つの側面を支える上部カバー部２２、下部支持部
２３及び側面支持部２４とから構成されている。更にこ
れら上部カバー部２２、下部支持部２３及び側面支持部
２４は、ガラス基板１０の表面周辺を覆うための押え壁
２５をそれぞれ有している。したがって、図２，３に示
されるように、ガラス基板１０は、裏面支持部２１と押
え壁２５とにより挟持されるようになる。この押え壁２
５は、それぞれ対応する上部カバー部２２、下部支持部
２３及び側面支持部２４に一体に形成されてよく、又は
別体として形成され溶接、ボルト等により固着してもよ
い。また、図示されてはいないが、裏面支持部２１と、
上部カバー部２２、下部支持部２３及び側面支持部２４
とは、ボルト等により数個所で締結されている。FIG. 1 shows a glass substrate storage jig 20 according to an embodiment of the present invention. The storage jig 20 includes a back support 21 for supporting the back of the glass substrate 10 and the glass substrate 1.
An upper cover 22, a lower support 23, and a side support 24 that support the four side surfaces 0. Further, the upper cover portion 22, the lower support portion 23, and the side support portion 24 each have a holding wall 25 for covering the periphery of the surface of the glass substrate 10. Therefore, as shown in FIGS. 2 and 3, the glass substrate 10 is sandwiched between the back support 21 and the holding wall 25. This holding wall 2
5 may be formed integrally with the corresponding upper cover portion 22, lower support portion 23, and side support portion 24, or may be formed separately and fixed by welding, bolts, or the like. Also, although not shown, the back support 21 and
Upper cover part 22, lower support part 23, and side support part 24
Is fastened at several places by bolts or the like.
【００１０】図１に示されたものでは、ガラス基板１０
の４辺に渡って押え壁２５が設けられているが、実際に
はガス流は下流に位置するガラス基板１０の下部から裏
面に回り込むのが最も多く、図２に示されるように、ガ
ラス基板１０の裏面支持部２１と、押え壁２５を有する
下部支持部２３のみを設けるだけで、かなりの効果を上
げることができるものである。In the embodiment shown in FIG.
The press wall 25 is provided over the four sides of the glass substrate 10. In practice, however, the gas flow most often flows from the lower part of the glass substrate 10 located downstream to the back surface, and as shown in FIG. By providing only the back support part 21 of the tenth and the lower support part 23 having the holding wall 25, a considerable effect can be achieved.
【００１１】図３は、押え壁２５の別の実施の形態を示
すもので、ここでは押え壁２５のガラス基板１０と接し
ない方の端部２６を流線形にしている。これは、図２の
ように押え壁２５の該端部２６が角部を形成している
と、ガス流がこの角部に当って乱流を発生し、押え壁２
５とガラス基板１０との隙間から入り込みガラス基板１
０の裏面にいくらか回り込むために、このガス漏れを更
に防止するために流線形にしたものである。これによ
り、ガス流はスムーズになり、乱流の発生が押えられ
る。なお、図３に示されるように下部支持部２３の下端
部も流線形にすると一層効果が上がる。FIG. 3 shows another embodiment of the holding wall 25. Here, the end 26 of the holding wall 25 which is not in contact with the glass substrate 10 has a streamlined shape. This is because when the end 26 of the holding wall 25 forms a corner as shown in FIG. 2, the gas flow hits this corner and generates a turbulent flow.
Glass substrate 1 entering through a gap between glass substrate 5 and glass substrate 10
It is streamlined to further prevent this gas leakage, in order to somewhat wrap around the back of 0. Thereby, the gas flow becomes smooth, and the generation of turbulence is suppressed. It is to be noted that the effect is further enhanced when the lower end portion of the lower support portion 23 is also streamlined as shown in FIG.
【００１２】図４の（ａ）は、更に別の実施の形態を示
すもので、押え壁２５と裏面支持部２１と間隔を可変に
する構造としている。これは成膜中の熱によるガラス基
板１０と収納治具２０との熱膨張差から、この間隔が不
規則に変形する。そこでガラス基板１０の側面の支持部
である上部カバー部２２、下部支持部２３及び側面支持
部２４と裏面支持部２１との締結を、溶接等の完全固定
式から数mm程度ずれて可動する構造とすることで、この
変形を吸収しガラスの割れ・欠けを防止するようにして
いる。FIG. 4A shows still another embodiment in which the distance between the pressing wall 25 and the back support 21 is variable. This interval is irregularly deformed due to a difference in thermal expansion between the glass substrate 10 and the storage jig 20 due to heat during film formation. Therefore, a structure in which the upper cover portion 22, the lower support portion 23, which are the support portions on the side surface of the glass substrate 10, and the fastening between the side support portion 24 and the back surface support portion 21 are shifted from the completely fixed type such as welding by about several mm. By doing so, this deformation is absorbed to prevent cracking and chipping of the glass.
【００１３】図４の（ｂ）は、この１つの実施例を示し
ている。下部支持部２３には、裏面支持部２１に締結す
るための孔２７が穿設される。ボルト等の締結具３０を
挿通する穴３１が明けられた円筒状のカラー３２が、下
部支持部２３の孔２７内に配置される。孔２７の内径
は、カラー３２の外径より大きく、カラー３２が横方向
に数mm程度移動できる大きさとなっている。カラー３２
の前後には孔２７より大きな径のワッシャー３３が配置
される。このような状態で、締結具３０をワッシャー３
３及びカラー３２を挿通し、裏面支持部２１のねじ穴に
螺合することで裏面支持部２１と下部支持部２３とが締
結される。このような締結個所がガラス基板１０の１側
辺当り数個所設けられる。なお、下部支持部２３の表面
からワッシャー３３が突出しないように、下部支持部２
３の表面にはワッシャー３３の収容部が形成されてい
る。この構造により下部支持部２３は裏面支持部２１に
対して横方向に数mm程度移動できる。即ち裏面支持部２
１と押え壁２５との間隔が可変にできるものである。従
って、ガラス基板の大型化によって厳しくなった熱膨張
差による変形の影響を排除できる。FIG. 4B shows this one embodiment. A hole 27 for fastening to the back support 21 is formed in the lower support 23. A cylindrical collar 32 having a hole 31 through which a fastener 30 such as a bolt is inserted is disposed in the hole 27 of the lower support portion 23. The inner diameter of the hole 27 is larger than the outer diameter of the collar 32, and is large enough to allow the collar 32 to move about several mm in the lateral direction. Color 32
A washer 33 having a diameter larger than that of the hole 27 is disposed before and after. In such a state, the fastener 30 is
The back support 21 and the lower support 23 are fastened by inserting the collar 3 and the collar 32 and screwing them into the screw holes of the back support 21. Several such fastening locations are provided per side of the glass substrate 10. Note that the lower support portion 2 is provided so that the washer 33 does not protrude from the surface of the lower support portion 23.
An accommodation portion for the washer 33 is formed on the surface of 3. With this structure, the lower support portion 23 can move about several mm in the lateral direction with respect to the back surface support portion 21. That is, the back support 2
The distance between 1 and the holding wall 25 can be changed. Therefore, it is possible to eliminate the influence of deformation due to the difference in thermal expansion that has become severe due to the enlargement of the glass substrate.
【００１４】前記のように下部支持部２３と裏面支持部
２１との可動構造は、大型ガラス基板１０をセットする
際に、裏面支持部２１と押え壁２５とで形成される挿入
部位を拡げ、ガラス基板を挿入後に手で押す等によって
狭めることで、セット時のガラスの欠け・割れを防止す
ることもできる。なお、下部支持部２３以外の上部カバ
ー部２２及び側面支持部２４にも、前記の裏面支持部２
１との可動構造を採用できるものである。As described above, the movable structure of the lower support portion 23 and the back support portion 21 allows the insertion portion formed by the back support portion 21 and the holding wall 25 to be expanded when the large glass substrate 10 is set. By narrowing the glass substrate by inserting it by hand after insertion, chipping and cracking of the glass at the time of setting can also be prevented. The upper cover 22 and the side support 24 other than the lower support 23 are also provided on the back support 2.
1 can be adopted.
【００１５】図５は更に別の実施の形態を示すもので、
裏面支持部２１の両面にガラス基板１０を配置したもの
である。当然、この場合には押え壁２５は、上部カバー
部２２、下部支持部２３及び側面支持部２４とも両側に
設けられている。また、前記した押え壁２５の端部２６
の流線形化及び裏面支持部２１と支持部２２，２３，２
４との可動な締結構造を適宜採用できるものである。こ
のように裏面支持部の両側を有効に利用することで、省
スペースでなおかつ約２倍のガラス基板を収納できる。
なお、本実施の形態では、ガラス基板を垂直に多数並置
する場合を例にとって説明しているが、水平に多数並置
する場合においても適用可能なものである。その場合
は、原料ガスを反応容器内に横方向から導入して、ガス
状副生成物を横方向から排出する等の工夫が必要であろ
う。FIG. 5 shows still another embodiment.
The glass substrate 10 is arranged on both sides of the back support 21. Naturally, in this case, the holding wall 25 is provided on both sides of the upper cover portion 22, the lower support portion 23, and the side support portion 24. Further, the end 26 of the holding wall 25
Streamlining and back support 21 and support 22, 23, 2
4, and a movable fastening structure can be appropriately adopted. By effectively utilizing both sides of the back support portion in this manner, the glass substrate can be stored in a space-saving manner and about twice as large.
Note that, in the present embodiment, a case where a large number of glass substrates are juxtaposed vertically is described as an example, but the present invention is also applicable to a case where many glass substrates are juxtaposed horizontally. In such a case, it may be necessary to introduce a raw material gas into the reaction vessel from the lateral direction and discharge gaseous by-products from the lateral direction.
【００１６】以上説明したように本発明のＣＶＤ，ＡＬ
Ｅ装置用ガラス基板収納治具においては、ガラス基板の
成膜の不具合部を減少できると共に大型のガラス基板で
あっても割れ・欠けを防止することができ、かつ省スペ
ースで大量のガラス基板を収納できるので、１バッチの
処理時間が約１２時間程かかるＣＶＤ，ＡＬＥ装置にあ
っては、その生産効率を格段に改善できるものである。As described above, the CVD and AL of the present invention
The glass substrate storage jig for the E device can reduce the defective portion of the film formation on the glass substrate, can prevent the breakage and chipping even of the large glass substrate, and can save a large amount of the glass substrate in a small space. Since it can be accommodated, in a CVD or ALE apparatus that requires about 12 hours of processing time for one batch, the production efficiency can be remarkably improved.
【図１】本発明の実施の形態のＣＶＤ，ＡＬＥ装置用ガ
ラス基板収納治具の斜視図である。FIG. 1 is a perspective view of a glass substrate storage jig for a CVD or ALE apparatus according to an embodiment of the present invention.
【図２】本発明の収納治具の一部側面拡大図である。FIG. 2 is a partially enlarged side view of the storage jig of the present invention.
【図３】本発明の別の実施の形態の収納治具の一部側面
拡大図である。FIG. 3 is a partially enlarged side view of a storage jig according to another embodiment of the present invention.
【図４】（ａ）は本発明の更に別の実施の形態の収納治
具の一部側面拡大図で、（ｂ）はその一実施例を示す一
部側面拡大断面図である。FIG. 4 (a) is a partially enlarged side view of a storage jig according to still another embodiment of the present invention, and FIG. 4 (b) is a partially enlarged side sectional view showing one embodiment thereof.
【図５】本発明の更に別の実施の形態の収納治具の一部
側面拡大図である。FIG. 5 is a partially enlarged side view of a storage jig according to still another embodiment of the present invention.
【図６】ＣＶＤ，ＡＬＥ装置の反応容器内に配置された
ガラス基板収納治具を概念的に説明する図である。FIG. 6 is a diagram conceptually illustrating a glass substrate storage jig arranged in a reaction vessel of a CVD or ALE apparatus.
【図７】従来のガラス基板収納治具を説明する図であ
る。FIG. 7 is a diagram illustrating a conventional glass substrate storage jig.
１０…ガラス基板 ２０…収納治具 ２１…裏面支持部 ２２…上部カバー部 ２３…下部支持部 ２４…側面支持部 ２５…押え壁 ２６…端部 ３０…締結具 ３２…カラー ３３…ワッシャー DESCRIPTION OF SYMBOLS 10 ... Glass substrate 20 ... Storage jig 21 ... Back support part 22 ... Upper cover part 23 ... Lower support part 24 ... Side support part 25 ... Holding wall 26 ... End part 30 ... Fastener 32 ... Collar 33 ... Washer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 岡田 伸彦 愛知県刈谷市昭和町１丁目１番地 株式会 社デンソー内 (72)発明者 田中 保之 愛知県刈谷市昭和町１丁目１番地 株式会 社デンソー内 Ｆターム(参考） 4G077 AA03 DB30 ED06 EG03 TF04 TG15 TK01 4K030 AA03 BA43 BA46 CA06 FA10 GA02 LA18 5F045 AA15 AB31 AB37 AC03 AF07 BB08 BB13 EM02 EM08 ────────────────────────────────────────────────── ─── Continuing from the front page (72) Inventor Nobuhiko Okada 1-1-1, Showa-cho, Kariya-shi, Aichi Prefecture Inside Denso Corporation (72) Inventor Yasuyuki Tanaka 1-1-1, Showa-cho, Kariya-shi, Aichi Co., Ltd. F term in DENSO (reference) 4G077 AA03 DB30 ED06 EG03 TF04 TG15 TK01 4K030 AA03 BA43 BA46 CA06 FA10 GA02 LA18 5F045 AA15 AB31 AB37 AC03 AF07 BB08 BB13 EM02 EM08
Claims (6)
成されるガラス基板を支持するためのＣＶＤ，ＡＬＥ装
置用ガラス基板収納治具において、この収納治具が、 ガラス基板の裏面を支持する裏面支持部と、 ガラス基板の４つの側面を支える上部カバー部、下部支
持部及び左右側面支持部と、より構成され、 少なくともガス流の下流に位置する該下部支持部がガラ
ス基板の下辺表面を覆う押え壁を有していることを特徴
とするＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。1. A glass substrate storage jig for a CVD or ALE apparatus for supporting a glass substrate on which a thin film is formed in a reaction vessel using a raw material gas, the storage jig supporting a back surface of the glass substrate. A lower back surface that supports at least four sides of the glass substrate, a lower support portion, and left and right side support portions. A glass substrate storage jig for a CVD or ALE apparatus, characterized by having a holding wall for covering the substrate.
部カバー部、左右側面支持部もそれぞれガラス基板の周
辺表面を覆う押え壁を有していることを特徴とする請求
項１に記載のＣＶＤ，ＡＬＥ装置用ガラス基板収納治
具。2. The method according to claim 1, wherein the upper cover portion for supporting the remaining three side surfaces of the glass substrate and the left and right side support portions also have pressing walls for covering the peripheral surface of the glass substrate. Glass substrate storage jig for CVD and ALE equipment.
対側の端部を流線形として、ガス流の抵抗を低減したこ
とを特徴とする請求項１又は２に記載のＣＶＤ，ＡＬＥ
装置用ガラス基板収納治具。3. The CVD or ALE according to claim 1, wherein the end of the pressing wall opposite to the side in contact with the glass substrate has a streamline shape to reduce gas flow resistance.
Glass substrate storage jig for equipment.
裏面支持部との間隔が可変となっていることを特徴とす
る請求項１〜３のいずれか一項に記載のＣＶＤ，ＡＬＥ
装置用ガラス基板収納治具。4. The CVD or ALE according to claim 1, wherein a distance between the holding wall holding the glass substrate and the back support is variable.
Glass substrate storage jig for equipment.
変とする機構が、ボルトを挿通する穴を有する円筒状カ
ラーを、少なくとも前記下部支持部に穿孔された、カラ
ーの外径よりやや大きい径の孔内に配置し、該カラーを
利用して前記下部支持部と前記裏面支持部とをボルトで
締結することよりなることを特徴とする請求項４に記載
のＣＶＤ，ＡＬＥ装置用ガラス基板収納治具。5. A mechanism for changing the distance between the holding wall and the back support portion, wherein a mechanism for changing a cylindrical collar having a hole through which a bolt is inserted is formed by at least an outer diameter of the collar perforated in the lower support portion. 5. The CVD and ALE apparatus according to claim 4, wherein said lower support portion and said back support portion are bolted to each other by using a collar and arranged in a hole having a slightly larger diameter. Glass substrate storage jig.
の両側で保持されていることを特徴とする請求項１〜５
のいずれか一項に記載のＣＶＤ，ＡＬＥ装置用ガラス基
板収納治具。6. The glass substrate is held on both sides of the back support as a set of two glass substrates.
The glass substrate storage jig for a CVD or ALE apparatus according to any one of the above.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000058004A JP4211185B2 (en) | 2000-02-29 | 2000-02-29 | Glass substrate storage jig for CVD and ALE equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000058004A JP4211185B2 (en) | 2000-02-29 | 2000-02-29 | Glass substrate storage jig for CVD and ALE equipment |
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| Publication Number | Publication Date |
|---|---|
| JP2001240972A true JP2001240972A (en) | 2001-09-04 |
| JP4211185B2 JP4211185B2 (en) | 2009-01-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000058004A Expired - Fee Related JP4211185B2 (en) | 2000-02-29 | 2000-02-29 | Glass substrate storage jig for CVD and ALE equipment |
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