JP3238223B2 - Liquid crystal display device and display device - Google Patents

Liquid crystal display device and display device

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Publication number
JP3238223B2
JP3238223B2 JP710793A JP710793A JP3238223B2 JP 3238223 B2 JP3238223 B2 JP 3238223B2 JP 710793 A JP710793 A JP 710793A JP 710793 A JP710793 A JP 710793A JP 3238223 B2 JP3238223 B2 JP 3238223B2
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JP
Japan
Prior art keywords
flexible substrate
liquid crystal
display device
switching element
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP710793A
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Japanese (ja)
Other versions
JPH06214220A (en
Inventor
廣 森田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP710793A priority Critical patent/JP3238223B2/en
Publication of JPH06214220A publication Critical patent/JPH06214220A/en
Application granted granted Critical
Publication of JP3238223B2 publication Critical patent/JP3238223B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は液晶表示装置に係わ
り、特に可撓性基板を用いて表示面を湾曲配置した液晶
表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a display surface curved using a flexible substrate.

【0002】[0002]

【従来の技術】近年、アクティブマトリクス型液晶表示
器をもちいた表示装置は、パーソナルコンピュータ、ワ
ードプロセッサ、各種OA用端末機器やTV用画像表示
などの大容量の情報表示用途に使用されてきており、よ
り高画質な表示が求められている。アクティブマトリク
ス型液晶表示器のスイッチング素子としては各種のもの
が実用化されており、代表的には薄膜トランジスタを用
いたTFT型と非線形抵抗素子を用いたMIM型が挙げ
られる。この内、2端子型MIM、即ち、金属−絶縁膜
−金属からなる非線形抵抗素子は構造が簡単で製造が容
易であることから多用化されつつある。このようなMI
M型非線形抵抗素子の基本的な構造及び製造方法は特開
昭55−161273号公報や特開昭58−17832
0号公報に示されている。即ち、図7に示すように、ガ
ラス基板1上に金属例えばTa膜3をスパッタリング法
や蒸着法により形成し、写真食刻法によりパターニング
し、一方向に延伸する配線とMIMの片方の電極とが形
成される。次に、Ta膜3を例えばクエン酸水溶液中で
陽極酸化法により化成し、酸化膜5を形成する。さらに
MIMのもう片方の電極として、例えばCr膜6を同じ
く写真食刻法によりパターニング形成することにより、
MIM素子が完成する。さらにCr膜6の一部に重畳す
るように画素表示用の透明電極8を形成する。他方の基
板(図示せず)上には一方向に延伸する透明電極を形成
し、2枚の基板の一方向に延伸する電極同志が直交する
ように対向配置し、2枚の基板間には液晶層が注入され
る。スイッチング素子としてのMIM素子は上記交差部
に対応して配置されることになる。このようなアクティ
ブマトリクス型液晶表示器の基板としては、通常ガラス
板が用いられるので、表示面はフラットである。
2. Description of the Related Art In recent years, display devices using an active matrix type liquid crystal display have been used for large-capacity information display applications such as personal computers, word processors, various OA terminal devices, and TV image displays. There is a demand for higher quality display. Various types of switching elements of the active matrix type liquid crystal display have been put into practical use, and typically, there are a TFT type using a thin film transistor and an MIM type using a non-linear resistance element. Among them, the two-terminal type MIM, that is, the nonlinear resistance element composed of metal-insulating film-metal has been widely used because of its simple structure and easy manufacture. Such MI
The basic structure and manufacturing method of an M-type nonlinear resistance element are disclosed in Japanese Patent Application Laid-Open Nos. 55-161273 and 58-17832.
No. 0 publication. That is, as shown in FIG. 7, a metal, for example, a Ta film 3 is formed on a glass substrate 1 by a sputtering method or an evaporation method, and is patterned by a photolithography method, and a wiring extending in one direction and one electrode of the MIM are formed. Is formed. Next, the Ta film 3 is formed by, for example, anodizing in an aqueous citric acid solution to form an oxide film 5. Further, as another electrode of the MIM, for example, a Cr film 6 is similarly patterned by photolithography,
The MIM element is completed. Further, a transparent electrode 8 for pixel display is formed so as to overlap a part of the Cr film 6. A transparent electrode extending in one direction is formed on the other substrate (not shown), and the electrodes extending in one direction of the two substrates are opposed to each other so as to be orthogonal to each other. A liquid crystal layer is injected. The MIM element as a switching element is arranged corresponding to the intersection. Since a glass plate is usually used as a substrate of such an active matrix type liquid crystal display, the display surface is flat.

【0003】[0003]

【発明が解決しようとする課題】近年、種々の電子機器
にアクティブマトリクス型液晶表示器が多用化されるに
伴い、電子機器の形状やデザイン上の問題、あるいは省
スペースの問題などから曲面表示用液晶表示器が要求さ
れるようになってきた。このような曲面表示に対して、
従来のガラス基板ではガラスを予め曲面状に成型してお
くしかないが、曲面状の基板上へのスイッチング素子の
高精度の形成や基板間距離の一定化など製造面からは実
用できない。
In recent years, as active matrix type liquid crystal displays have been widely used in various electronic devices, there has been a problem with the shape and design of electronic devices or the problem of space-saving. Liquid crystal displays have been required. For such a curved surface display,
In a conventional glass substrate, glass has to be formed into a curved surface in advance, but it is not practical from a manufacturing point of view, such as forming a switching element on a curved substrate with high accuracy and keeping the distance between substrates constant.

【0004】そこで、可撓性の基板を用いることが考え
られる。光学表示である液晶表示器では、光学的に等方
なことが要求されるので、2軸延伸のポリエステルフィ
ルム(PET)などは使用できない。光学軸がフィルム
面内で変化しないような1軸延伸のポリエステルフィル
ム(PET)やポリエーテルサルフォン(PES)を用
いることができる。例えば、PESはガラス転移点が2
00℃以上、連続180℃の高温で変化せず、透明で耐
薬品性に優れているところから、100乃至300μm
のものを用いることができる。しかしながら、実際にス
イッチング素子としての、例えば、MIM素子に必要な
数千オングストロームの厚さで数十μmの幅で、長さ数
cm以上の一方向に延伸する金属配線をこの可撓性基板
フィルム上に形成し、金属配線の延伸する方向に湾曲さ
せてみると、数mmから数cm程度の曲率半径で金属配
線の長手方向で剥がれが発生する。同様なパターンを透
明電極(ITO)で形成し同じく湾曲させた場合は良く
密着しており剥がれは生じなかった。即ち、一方向に延
伸する金属配線の延伸する方向に湾曲させると金属配線
の剥がれが多発する。しかも、これは大画面、高精細の
ものほど顕著であった。
Therefore, it is conceivable to use a flexible substrate. In a liquid crystal display which is an optical display, since it is required to be optically isotropic, a biaxially stretched polyester film (PET) or the like cannot be used. A uniaxially stretched polyester film (PET) or polyether sulfone (PES) can be used so that the optical axis does not change in the plane of the film. For example, PES has a glass transition point of 2
It does not change at a high temperature of more than 00 ° C and continuous 180 ° C, is transparent and has excellent chemical resistance.
Can be used. However, for example, a metal wiring that extends in one direction with a thickness of several thousand angstroms and a width of several tens of μm and a length of several cm or more, which is required for an MIM element, is used as a switching element. When it is formed on the upper surface and bent in the direction in which the metal wiring extends, peeling occurs in the longitudinal direction of the metal wiring with a radius of curvature of several mm to several cm. When a similar pattern was formed with a transparent electrode (ITO) and was similarly curved, it adhered well and did not peel. That is, if the metal wiring extending in one direction is bent in the extending direction, the metal wiring is frequently peeled off. Moreover, this was more remarkable for a large screen and a high definition.

【0005】この発明は、以上の問題に鑑みてなされた
もので、可撓性基板を用いて表示面を湾曲させた大画
面、高精細の表示でも電極剥がれのないスイッチング素
子をもちいた高性能の液晶表示装置を提供することを目
的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has a high performance using a switching element having no electrode peeling even in a large screen and a high definition display in which a display surface is curved using a flexible substrate. It is an object of the present invention to provide a liquid crystal display device.

【0006】[0006]

【課題を解決するための手段】本発明は、第1の方向に
延伸する配線電極が表面に形成された第1の可撓性基板
と、前記第1の方向とは直交する第2の方向に延伸する
配線電極が表面に形成された第2の可撓性基板と、前記
第1の可撓性基板と第2の可撓性基板の配線電極が直交
するように対向配置され前記透明電極が直交する部分に
形成されたスイッチング素子と、前記対向配置された第
1の可撓性基板と第2の可撓性基板の間に挟持された液
晶層とを少なくとも備えた液晶表示装置において、可撓
性基板を湾曲させる時、その湾曲方向をスイッチング素
子の実質的に矩形状の短辺方向と一致させること、ある
いは、その湾曲方向を線幅の大きい方の配線電極の延伸
する方向と一致させること、さらには、スイッチング素
子が形成された可撓性基板を湾曲する曲率中心とは反対
側に位置せしめることによって、上記目的を達成するも
のである。
According to the present invention, there is provided a first flexible substrate having a surface on which wiring electrodes extending in a first direction are formed, and a second direction orthogonal to the first direction. A second flexible substrate having a wiring electrode extending on the surface thereof, and a transparent electrode in which the wiring electrodes of the first flexible substrate and the second flexible substrate are arranged so as to be orthogonal to each other. A liquid crystal display device comprising at least a switching element formed in a portion orthogonal to the liquid crystal layer and a liquid crystal layer sandwiched between the first flexible substrate and the second flexible substrate disposed opposite to each other. When bending the flexible substrate, make the bending direction match the substantially rectangular short side direction of the switching element, or make the bending direction match the extending direction of the wiring electrode having the larger line width. That the switching element is formed. The center of curvature of the curved sexual substrate by allowed to opposite, it is to achieve the above object.

【0007】[0007]

【作用】アクティブマトリクス型液晶表示装置では、画
素をアドレスするために、上下基板上には互いに直交す
るようにストライプ状の配線電極が形成される。そして
スイッチング素子は、2枚の基板の一対の配線電極の直
交交差する対応部分に形成される。今、液晶表示装置を
2枚の基板の配線電極の一方に沿って湾曲させる場合、
曲げ剥がれに対して強い方に沿って湾曲させれば剥がれ
不良に対する効果は高い。例えば、MIM素子の場合、基
板側の金属電極となるTaは金属膜の内部応力が大きく、
且つ厚みのわりには幅が狭い。このため、図1に示すよ
うに、対向基板上の透明電極)(ITO)パターン15
向きの矢印10に沿って湾曲させた方がアレイ基板の配
線電極3の向きの矢印11に沿って湾曲させるよりも剥
がれは少ない。実際に、前者の場合、曲率半径10mm
で剥がれは生じないのに対し、後者は曲率半径50mm
で剥がれが生じた。
In the active matrix type liquid crystal display device, stripe-shaped wiring electrodes are formed on the upper and lower substrates so as to be orthogonal to each other in order to address pixels. The switching elements are formed at corresponding portions of the pair of wiring electrodes of the two substrates that intersect at right angles. Now, when bending the liquid crystal display device along one of the wiring electrodes of the two substrates,
If it bends along the direction that is strong against bending peeling, the effect on peeling failure is high. For example, in the case of a MIM element, Ta serving as a metal electrode on the substrate side has a large internal stress of the metal film,
And the width is narrow for the thickness. For this reason, as shown in FIG. 1, it is more preferable to bend along the arrow 10 in the direction of the transparent electrode (ITO) pattern 15 on the opposing substrate, along the arrow 11 in the direction of the wiring electrode 3 on the array substrate. Peeling is less than it does. Actually, in the former case, the radius of curvature is 10 mm
Does not occur, whereas the latter has a radius of curvature of 50 mm.
Peeled off.

【0008】さらに、図2に示すように、MIM素子9
の矩形状の幅W1とW2、即ち、Ta電極3の幅W1を
6μmとし、Ti電極6の幅W2を4μmとして形成し
たところ、Ti電極6の配線方向である矢印13の方向
に沿う湾曲は、Ta電極3の配線方向である矢印12の
方向に沿う湾曲に比較して、圧倒的に剥がれ易かった。
また、基板を湾曲させるとき、湾曲の曲率中心側の基
板上の湾曲方向に沿う電極には全て発散応力が働き剥が
れが生じ易くなる。剥がれにまで至らなくてもクラック
が生じ電気的導通が損なわれると、液晶表示装置として
致命的な欠陥となる。これに対して、湾曲の曲率中心と
は反対側の基板上の湾曲方向に沿う電極には全て圧縮応
力が働き、従って、湾曲の曲率中心側の基板上の湾曲方
向に沿う電極よりは剥がれやクラックの危険性ははるか
に少なくなる。
[0008] Further, as shown in FIG.
When the width W1 of the Ta electrode 3 was set to 6 μm and the width W2 of the Ti electrode 6 was set to 4 μm, the curvature of the Ti electrode 6 along the direction of the arrow 13 which is the wiring direction was And the Ta electrode 3 was overwhelmingly easily peeled as compared with the curvature along the direction of the arrow 12 which is the wiring direction.
Further, when the substrate is bent, divergent stress acts on all the electrodes on the substrate on the side of the center of curvature of the curvature in the bending direction, and peeling is likely to occur. If cracks occur and electrical continuity is impaired even without peeling, it is a fatal defect as a liquid crystal display device. On the other hand, compressive stress acts on all the electrodes along the bending direction on the substrate on the side opposite to the curvature center of the curvature, and therefore, the electrodes are more likely to peel off than the electrodes along the bending direction on the substrate near the center of the curvature. The risk of cracking is much less.

【0009】この結果、基板の湾曲方向に対して、予め
配線電極やスイッチング素子のパターン方向を適切に選
択設計しておく必要がある。即ち、一方の基板上に形成
されたスイッチング素子を構成する部分が実質的に矩形
状であり、その矩形状の短辺に沿う方向を湾曲方向と一
致させれば良い。また、2枚の基板の配線電極の内、電
極幅の広い方の配線方向に沿う方向を湾曲方向と一致さ
せれば良い。さらにはスイッチング素子が形成された基
板は、湾曲の曲率中心とは反対側に配置すると良い。
As a result, it is necessary to appropriately select and design the pattern directions of the wiring electrodes and the switching elements in advance with respect to the bending direction of the substrate. In other words, the portion constituting the switching element formed on one substrate is substantially rectangular, and the direction along the short side of the rectangular shape may be matched with the bending direction. In addition, the direction along the wiring direction with the wider electrode width of the wiring electrodes of the two substrates may be matched with the bending direction. Further, the substrate on which the switching element is formed is preferably disposed on the side opposite to the center of curvature of the curve.

【0010】[0010]

【実施例】以下に本発明の実施例について、アクティブ
マトリクス型液晶表示装置のスイッチング素子としてM
IMを適用した例を挙げて図3および図4を用いて詳細
に説明する。まず、図3(a)に示すように、例えば、
低温スパッターで形成した二酸化シリコンのアンダーコ
ート膜を表面部に備えた0.2mm厚のポリエーテルサ
ルフォンフィルム基板1の上に、3000オングストロ
ームのTaからなる薄膜3をスパッタ法で形成する。次
に、薄膜3上にポジタイプのフォトレジスト膜を全面塗
布した後、フォトマスクを用いて露光し、現像してレジ
ストパターン4aを形成する。続いて、ケミカルドライ
エッチング法により薄膜3のエッチングを行なう。ここ
では、CF4とO2ガスを等量混合したプラズマ中でエ
ッチングを行ない、パターン周辺のエッジ部にテーパ形
状が形成される。引き続き、図3(b)に示すように、
レジストパターン4aを除去した後、Taからなる薄膜
パターン3を陽極とし、白金メッシュ板を陰極として、
1重量%硼酸アンモニウム水溶液の電解液中で陽極酸化
を行ない、電圧を制御することによってTaからなる薄
膜パターン3の表面上に絶縁体層5を所望の厚さに形成
する。例えば、48Vの電圧印加で約800オングスト
ロームの絶縁体層が得られた。電解液に対し、露出して
いるTaでは、膜厚約320オングストロームの金属が
膜厚約800オングストロームの五酸化タンタルに変化
する。次に、図3(c)に示すように、全面に膜厚約1
200オングストロームのTiからなる薄膜6をスパッ
タ法で形成する。このTiからなる薄膜6の上に、再度
ポジタイプのフォトレジスト膜を全面塗布した後、フォ
トマスクを用いて露光し、現像してレジストパターン4
bを形成する。続いて、エチレンジアミン・テトラ・ア
セティック・アシッド9gと水400cc、過酸化水素
216cc、アンモニア水30mlの割合で混合し、室
温に保ってTiからなる薄膜6をエッチングし、残った
レジストパターン4bを除去する。これにより、MIM
素子のうち基板に遠い側の上部電極が形成される。次
に、図3(d)に示すように、全面に膜厚約1000オ
ングストロームのITOからなる透明導電膜7をスパッ
タ法で形成する。この透明導電膜7の上に、再度ポジタ
イプのフォトレジスト膜を全面塗布した後、フォトマス
クを用いて露光し、現像してレジストパターン4cを形
成する。続いて、水、塩酸、硝酸を容量比1:1:0.
1の割合で混合し、30℃に加熱したエッチング液によ
りエッチングし、ITOパターン8を形成する。このよ
うにして、図3(e)及び図4に示すように、MIM素
子9を含むアレイ基板が形成される。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to FIG.
An example in which an IM is applied will be described in detail with reference to FIGS. First, for example, as shown in FIG.
A thin film 3 of 3000 Å of Ta is formed by a sputtering method on a polyethersulfone film substrate 1 having a thickness of 0.2 mm and a silicon dioxide undercoat film formed on the surface thereof by a low-temperature sputtering. Next, after applying a positive type photoresist film on the entire surface of the thin film 3, it is exposed using a photomask and developed to form a resist pattern 4a. Subsequently, the thin film 3 is etched by a chemical dry etching method. Here, etching is performed in plasma in which CF4 and O2 gases are mixed in equal amounts, and a tapered shape is formed at an edge portion around the pattern. Subsequently, as shown in FIG.
After removing the resist pattern 4a, the thin film pattern 3 made of Ta is used as an anode, and a platinum mesh plate is used as a cathode.
Anodization is performed in an electrolytic solution of a 1% by weight aqueous solution of ammonium borate, and an insulating layer 5 is formed to a desired thickness on the surface of the thin film pattern 3 made of Ta by controlling the voltage. For example, when a voltage of 48 V was applied, an insulator layer of about 800 Å was obtained. At Ta which is exposed to the electrolyte, the metal having a thickness of about 320 Å is changed to tantalum pentoxide having a thickness of about 800 Å. Next, as shown in FIG.
A thin film 6 made of 200 angstroms of Ti is formed by a sputtering method. On the thin film 6 made of Ti, a positive-type photoresist film is again applied on the entire surface, and then exposed using a photomask and developed to form a resist pattern 4.
b is formed. Subsequently, 9 g of ethylenediamine tetraacetic acid, 400 cc of water, 216 cc of hydrogen peroxide and 30 ml of ammonia water were mixed at a ratio of 30 g, and the thin film 6 made of Ti was etched at room temperature to remove the remaining resist pattern 4 b. I do. Thereby, MIM
An upper electrode on the far side of the device is formed on the substrate. Next, as shown in FIG. 3D, a transparent conductive film 7 made of ITO having a thickness of about 1000 Å is formed on the entire surface by sputtering. A positive-type photoresist film is again applied on the entire surface of the transparent conductive film 7 and then exposed using a photomask and developed to form a resist pattern 4c. Subsequently, water, hydrochloric acid and nitric acid were mixed at a volume ratio of 1: 1: 0.
The mixture was mixed at a ratio of 1 and etched with an etchant heated to 30 ° C. to form an ITO pattern 8. Thus, an array substrate including the MIM element 9 is formed as shown in FIGS.

【0011】次に、上記アレイ基板に用いたと同じポリ
エーテルサルフォンフィルム基板上に上記と同様の手法
で、一方向に延伸する配線電極としてのITOパターン電
15を形成して対向基板を作成する。これらのように
して準備された両基板は、ポリイミド樹脂からなる配向
膜を塗布、焼成し、液晶配向を規制するために一方向に
沿ったラビング処理を行なう。次いで、両基板の配線電
極が対向し、配線電極が互いに90度を成すように直交
させ、且つ両基板の間隔を5〜10μmに保持して基板
周辺部を接着剤により一部の液晶注入口を除いてシール
する(図示せず)。そして液晶注入口より、例えばTN型
液晶材を真空注入法により注入し、最後に液晶注入口も
シールする。さらに、両基板の外側にラビング方向に沿
って互いに90度直交するように偏光板を装着すること
により、90度捩じれのTN型アクティブマトリクス型液
晶表示装置が完成する。
Next, an ITO pattern electrode 15 as a wiring electrode extending in one direction is formed on the same polyether sulfone film substrate used for the array substrate by the same method as described above, and a counter substrate is formed. . Both substrates prepared as described above are coated with an alignment film made of a polyimide resin, baked, and subjected to a rubbing process in one direction to regulate liquid crystal alignment. Next, the wiring electrodes of both substrates are opposed to each other, the wiring electrodes are orthogonal to each other so as to form 90 degrees, and the distance between the two substrates is maintained at 5 to 10 μm, and a part of the liquid crystal injection port is filled with an adhesive around the substrates. And seal (not shown). Then, for example, a TN type liquid crystal material is injected from the liquid crystal injection port by a vacuum injection method, and finally, the liquid crystal injection port is also sealed. Furthermore, a TN type active matrix type liquid crystal display device having a 90-degree twist is completed by mounting polarizing plates on the outer sides of both substrates so as to be orthogonal to each other by 90 degrees along the rubbing direction.

【0012】次に、この液晶表示装置の基板の湾曲方向
について、図5及び図6を用いて説明する。図5は、1
画素と対向基板上の対向電極の配置関係を重ねて示すも
のである。図5において、斜線部分で示すMIM素子部9
は長辺方向の幅W1が6μm、短辺方向の幅W2が4μmの
矩形状をなしている。また、配線電極であるTaパターン
3の線幅W3が20μmであるのに対し、対向基板上の配
線電極であるITOパターン15の線幅W4は250μmで
あり、Taパターン3とITOパターン15のうち、一方が
走査信号供給配線、他方がデータ信号供給配線として機
能する。
Next, the bending direction of the substrate of the liquid crystal display device will be described with reference to FIGS. FIG.
FIG. 6 shows the arrangement relationship between pixels and a counter electrode on a counter substrate in an overlapping manner. In FIG. 5, the MIM element section 9 indicated by hatching
Has a rectangular shape with a width W1 in the long side direction of 6 μm and a width W2 in the short side direction of 4 μm. Also, while the line width W3 of Ta pattern 3 is a wiring electrode is 20 [mu] m, line width W4 of the ITO pattern 15 is a wiring electrode on the counter substrate is 250 [mu] m, and Ta pattern 3 and the ITO pattern 15 One functions as a scanning signal supply line, and the other functions as a data signal supply line.

【0013】図6(a)は、図5のA-A線に沿う断面を示
し、同じく図6(b)は、図5のB-B線に沿う断面をそ
れぞれ示す。即ち、MIM素子9の短辺方向と、配線電極
のうちより線幅の広いITOパターン15に沿うA-A線に平
行な方向に、基板は約30cmの曲率半径をもって湾曲
されているのに対し、B-B線に沿う方向はフラットであ
る。さらに、MIM素子の形成された基板1は対向基板2
に対し湾曲の曲率中心とは反対側に位置している。
FIG. 6A shows a cross section along the line AA of FIG. 5, and FIG. 6B shows a cross section along the line BB of FIG. 5, respectively. That is, while the substrate is curved with a radius of curvature of about 30 cm in the short side direction of the MIM element 9 and in the direction parallel to the AA line along the wider ITO pattern 15 of the wiring electrodes, The direction along the BB line is flat. Further, the substrate 1 on which the MIM element is formed is a counter substrate 2
Is located on the opposite side to the center of curvature of the curve.

【0014】この実施例の液晶表示装置を駆動させた
が、配線電極及びMIM素子の電極剥がれやクラックに
よる電気的導通不良に起因する欠陥は何等認められなか
った。以上の実施例では、スイッチング素子としてMI
M素子を適用したアクティブマトリクス型液晶表示装置
について説明したが、本発明はこれに捕われず薄膜トラ
ンジスタを用いたアクティブマトリクス型液晶表示装置
にも適用し得る。
When the liquid crystal display device of this embodiment was driven, no defect was found due to electrical conduction failure due to peeling or cracking of the wiring electrode and the MIM element. In the above embodiment, the switching element is MI
Although the active matrix type liquid crystal display device to which the M element is applied has been described, the present invention is not limited to this and can be applied to an active matrix type liquid crystal display device using a thin film transistor.

【0015】[0015]

【発明の効果】以上述べたように、この発明による可撓
性基板を湾曲した曲面表示面を有する液晶表示装置は、
実質的に矩形状のスイッチング素子の短辺に沿う方向に
湾曲せしめること、およびまたは対向する配線電極のう
ち線幅の広い配線電極に沿う方向に湾曲せしめること、
およびまたはスイッチング素子の形成された基板を湾曲
する基板の曲率中心とは反対側に位置せしめること、即
ち、基板上の電極パターンを曲げ応力に強い方向に湾曲
せしめることによって、配線電極及びスイッチング素子
の電極剥がれやクラックによる電気的導通不良に起因す
る欠陥のない、信頼性の高い曲面表示用の液晶表示装置
に有効である。
As described above, the liquid crystal display device having a curved display surface obtained by bending a flexible substrate according to the present invention,
Curving in the direction along the short side of the substantially rectangular switching element, and / or curving in the direction along the wide wiring electrode among the opposed wiring electrodes,
And / or by positioning the substrate on which the switching elements are formed on the side opposite to the center of curvature of the curved substrate, i.e., by bending the electrode pattern on the substrate in a direction strong against bending stress, the wiring electrodes and the switching elements are formed. The present invention is effective for a highly reliable liquid crystal display device for displaying a curved surface, which is free from defects due to poor electrical conduction due to electrode peeling or cracks.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の作用を説明するための模式図。FIG. 1 is a schematic diagram for explaining the operation of the present invention.

【図2】この発明の作用を説明するための模式図。FIG. 2 is a schematic diagram for explaining the operation of the present invention.

【図3】この発明の実施例の製造工程を説明するための
工程分解図。
FIG. 3 is an exploded view for explaining a manufacturing process according to the embodiment of the present invention.

【図4】図3の平面を示す平面図。FIG. 4 is a plan view showing the plane of FIG. 3;

【図5】この発明の実施例の電極配置を示す平面図。FIG. 5 is a plan view showing an electrode arrangement according to the embodiment of the present invention.

【図6】図5のA-A線、B-B線に沿う断面を示す断面図。FIG. 6 is a sectional view showing a section taken along line AA and line BB in FIG. 5;

【図7】スイッチング素子としてのMIM素子の構造を示
す断面図。
FIG. 7 is a sectional view showing the structure of a MIM element as a switching element.

【符号の説明】[Explanation of symbols]

1・・・基板 2・・・基板 3・・・Ta電極 5・・・絶縁体層 6・・・Ti電極 8・・・ITO電極 9・・・MIM素子 14・・・液晶層15・・・ITO電極 DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Substrate 3 ... Ta electrode 5 ... Insulator layer 6 ... Ti electrode 8 ... ITO electrode 9 ... MIM element 14 ... Liquid crystal layer 15 ...・ ITO electrode

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 第1の方向に延伸する配線電極が表面に
形成された第1の可撓性基板と、前記第1の方向とは直
交する第2の方向に延伸する配線電極が表面に形成され
た第2の可撓性基板と、前記第1の可撓性基板と第2の
可撓性基板の配線電極が直交するように対向配置され前
記配線電極が直交する部分に形成された実質的に矩形状
のスイッチング素子と、前記対向配置された第1の可撓
性基板と第2の可撓性基板の間に狭持された液晶層とを
少なくとも備えた液晶表示装置において、前記2枚の可
撓性基板は前記第1の方向または第2の方向のいずれか
の方向に沿って湾曲配置され、その湾曲方向が前記スイ
ッチング素子の矩形上の短辺方向と一致することを特徴
とする液晶表示装置。
1. A first flexible substrate having a surface on which a wiring electrode extending in a first direction is formed, and a wiring electrode extending in a second direction orthogonal to the first direction on a surface. The formed second flexible substrate, and the wiring electrodes of the first flexible substrate and the second flexible substrate are disposed so as to face each other so as to be orthogonal to each other, and the wiring electrodes are formed in portions where the wiring electrodes are orthogonal to each other. A liquid crystal display device comprising at least a substantially rectangular switching element, and a liquid crystal layer sandwiched between the first and second flexible substrates opposed to each other, The two flexible substrates are arranged in a curved manner along one of the first direction and the second direction, and the curved direction coincides with the short side direction on the rectangle of the switching element. Liquid crystal display device.
【請求項2】 第1の方向に延伸する配線電極が表面に
形成された第1の可撓性基板と、前記第1の方向とは直
交する第2の方向に延伸する配線電極が表面に形成され
た第2の可撓性基板と、前記第1の可撓性基板と第2の
可撓性基板の配線電極が直交するように対向配置され前
記配線電極が直交する部分に形成されたスイッチング素
子と、前記対向配置された第1の可撓性基板と第2の可
撓性基板の間に狭持された液晶層とを少なくとも備えた
液晶表示装置において、前記第1の方向に延伸する配線
電極の線幅と前記第2の方向に延伸する配線電極の線幅
とは異なっており、前記2枚の可撓性基板は前記第1の
方向または第2の方向のいずれかの方向に沿って湾曲配
置され、その湾曲方向が前記線幅の大きい方の配線電極
の延伸する方向と一致することを特徴とする液晶表示装
置。
2. A first flexible substrate having a surface on which a wiring electrode extending in a first direction is formed, and a wiring electrode extending in a second direction orthogonal to the first direction on a surface. The formed second flexible substrate, and the wiring electrodes of the first flexible substrate and the second flexible substrate are disposed so as to face each other so as to be orthogonal to each other, and the wiring electrodes are formed in portions where the wiring electrodes are orthogonal to each other. In a liquid crystal display device including at least a switching element and a liquid crystal layer sandwiched between the first and second flexible substrates opposed to each other, the liquid crystal display device extends in the first direction. The line width of the wiring electrode to be formed is different from the line width of the wiring electrode extending in the second direction, and the two flexible substrates are arranged in any one of the first direction and the second direction. And the bending direction is the same as the extending direction of the wiring electrode having the larger line width. A liquid crystal display device characterized by:
【請求項3】 第1の方向に延伸する配線電極が表面に
形成された第1の可撓性基板と、前記第1の方向とは直
交する第2の方向に延伸する配線電極が表面に形成され
た第2の可撓性基板と、前記第1の可撓性基板と第2の
可撓性基板の配線電極が直交するように対向配置され前
記配線電極が直交する部分に形成されたスイッチング素
子と、前記対向配置された第1の可撓性基板と第2の可
撓性基板の間に狭持された液晶層とを少なくとも備えた
液晶表示装置において、前記2枚の可撓性基板は前記第
1の方向または第2の方向のいずれかの方向に沿って湾
曲配置され、前記スイッチング素子が形成された可撓性
基板は前記湾曲する曲率中心とは反対側に位置すること
を特徴とする液晶表示装置。
3. A first flexible substrate having a surface on which a wiring electrode extending in a first direction is formed, and a wiring electrode extending in a second direction orthogonal to the first direction on a surface. The formed second flexible substrate, and the wiring electrodes of the first flexible substrate and the second flexible substrate are disposed so as to face each other so as to be orthogonal to each other, and the wiring electrodes are formed in portions where the wiring electrodes are orthogonal to each other. In a liquid crystal display device comprising at least a switching element and a liquid crystal layer sandwiched between the first flexible substrate and the second flexible substrate disposed opposite to each other, the two flexible substrates The substrate is curvedly arranged along any one of the first direction and the second direction, and the flexible substrate on which the switching element is formed is located on a side opposite to the curved center of curvature. Characteristic liquid crystal display device.
【請求項4】 第1の可撓性基板と、前記第1の可撓性
基板に対向配置される第2の可撓性基板と、前記第1の
可撓性基板に配置され、第1の方向に延伸する配線電極
と、前記配線電極に接続され、実質的に矩形状のスイッ
チング素子と、前記スイッチング素子に接続された画素
と、を備えた表示装置であって、前記2枚の可撓性基板
は湾曲して配置され、その湾曲方向が、前記スイッチン
グ素子の矩形状の短辺方向と一致することを特徴とする
表示装置。
4. A first flexible substrate, a second flexible substrate arranged opposite to the first flexible substrate, and a first flexible substrate arranged on the first flexible substrate. A wiring electrode extending in the direction of, a substantially rectangular switching element connected to the wiring electrode, and a pixel connected to the switching element.
And wherein the two flexible substrates are arranged in a curved manner, and the curved direction thereof coincides with the rectangular short side direction of the switching element. apparatus.
【請求項5】 第1の可撓性基板と、前記第1の可撓性
基板に対向配置される第2の可撓性基板と、前記第1の
可撓性基板に配置され、第1の方向に延伸する配線電極
と、前記配線電極に接続されるスイッチング素子と、前
記スイッチング素子に接続された画素と、を備えた表示
装置であって、前記2枚の可撓性基板は湾曲して配置さ
れ、前記スイッチング素子が形成された可撓性基板は、
前記湾曲する曲率中心とは反対側に位置することを特徴
とする表示装置。
5. A first flexible substrate, a second flexible substrate arranged opposite to the first flexible substrate, and a first flexible substrate arranged on the first flexible substrate. And a switching element connected to the wiring electrode, and a pixel connected to the switching element, wherein the two flexible substrates are curved. Is disposed, the flexible substrate on which the switching element is formed,
A display device, wherein the display device is located on a side opposite to the curved center of curvature.
JP710793A 1993-01-20 1993-01-20 Liquid crystal display device and display device Expired - Fee Related JP3238223B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP710793A JP3238223B2 (en) 1993-01-20 1993-01-20 Liquid crystal display device and display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP710793A JP3238223B2 (en) 1993-01-20 1993-01-20 Liquid crystal display device and display device

Publications (2)

Publication Number Publication Date
JPH06214220A JPH06214220A (en) 1994-08-05
JP3238223B2 true JP3238223B2 (en) 2001-12-10

Family

ID=11656870

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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