JP2021189064A - Probe needle and probe unit - Google Patents

Probe needle and probe unit Download PDF

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JP2021189064A
JP2021189064A JP2020095571A JP2020095571A JP2021189064A JP 2021189064 A JP2021189064 A JP 2021189064A JP 2020095571 A JP2020095571 A JP 2020095571A JP 2020095571 A JP2020095571 A JP 2020095571A JP 2021189064 A JP2021189064 A JP 2021189064A
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probe
plating layer
probe needle
metal conductor
insulating coating
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雅章 深澤
Masaaki Fukazawa
洋一 岡田
Yoichi Okada
卓弥 小澤
Takuya Ozawa
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Totoku Electric Co Ltd
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Totoku Electric Co Ltd
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Abstract

To provide a probe needle and a probe unit which do not increase in the wire diameter even if the plating thickness is increased and which can achieve a narrow pitch in a probe needle for inspection mainly used for the continuity inspection of an electronic component and a substrate or the like.SOLUTION: In a probe needle 10 which includes: a body part 6 having an insulating coating film 2 on the outer periphery of a pin-shaped metal conductor 1; and an end part 3 having no insulating coating film at both ends of the metal conductor 1, a plating layer 4 within the range of thickness 1 μm or more and 5 μm or less is formed only in the end part 3. When the outer diameter of the body part 6 is D3 and the outer diameter of the end part 3 is D2, it is preferable that [(D3 - D2)/2] is within the range of 1.5 μm to 5 μm.SELECTED DRAWING: Figure 2

Description

本発明は、主に電子部品及び基板等の導通検査に用いる検査用のプローブ針及びプローブユニットに関する。 The present invention mainly relates to a probe needle and a probe unit for inspection used for continuity inspection of electronic parts and substrates.

近年、携帯電話等に使用される高密度実装基板、又は、パソコン等に組み込まれるBGA(Ball Grid Array)やCSP(Chip Size Package)等のICパッケージ基板等、様々な回路基板が多く用いられている。このような回路基板は、実装の前後の工程において、例えば直流抵抗値の測定や導通検査等が行われ、その電気特性の良否が検査されている。電気特性の良否の検査は、電気特性を測定する検査装置に接続された検査装置用治具(以下、「プローブユニット」という。)を用いて行われ、例えば、プローブユニットに装着されたピン形状のプローブ針の先端を、その回路基板(以下「被測定体」ともいう。)の電極に接触させることにより行われている。 In recent years, various circuit boards such as high-density mounting boards used for mobile phones and IC package boards such as BGA (Ball Grid Array) and CSP (Chip Size Package) incorporated in personal computers and the like have been widely used. There is. In such a circuit board, in the steps before and after mounting, for example, measurement of DC resistance value, continuity inspection, and the like are performed, and the quality of the electrical characteristics of such a circuit board is inspected. The quality of the electrical characteristics is inspected using an inspection device jig (hereinafter referred to as "probe unit") connected to the inspection device for measuring the electrical characteristics. For example, the shape of a pin attached to the probe unit. This is done by bringing the tip of the probe needle of the above into contact with the electrode of the circuit board (hereinafter, also referred to as “measured object”).

特に最近は、被測定体の電極のピッチが狭くなっており、プローブユニットに装着されるプローブ針も狭ピッチで配置されることが要請されている。こうした要請に応えるプローブ針として、例えば特許文献1には、微細なプリント配線板の導通検査に用いられるプローブ及びプローブの製造方法が提案されている。その導通検査用のプローブは、導電性の線材と、前記線材を被覆している絶縁膜とからなり、前記絶縁膜は無機絶縁体で形成され、その線材全体は電解めっき処理によりめっき層で覆われている。 In particular, recently, the pitch of the electrodes of the object to be measured has become narrower, and it is required that the probe needles mounted on the probe unit are also arranged at a narrow pitch. As a probe needle that meets such a demand, for example, Patent Document 1 proposes a probe and a method for manufacturing a probe used for a continuity inspection of a fine printed wiring board. The probe for continuity inspection is composed of a conductive wire and an insulating film covering the wire. The insulating film is formed of an inorganic insulator, and the entire wire is covered with a plating layer by electrolytic plating. It has been.

特開2017−215221号公報Japanese Unexamined Patent Publication No. 2017-215221

特許文献1では、所定長さに切断した導体の全体に電気めっきでめっき層を設け、その後に絶縁層を設けているので、そのめっき層が電極との接触抵抗の上昇を抑制するという効果を奏する。特にプローブ針と電極とは繰り返し接触するので、長期間良好な接触を維持するためには、めっき厚は厚い方が好ましい。しかし、めっき厚を厚くすると外径が大きくなり、特に近年の狭ピッチ化の要請には応えられなくなってしまうという難点がある。 In Patent Document 1, a plating layer is provided by electroplating on the entire conductor cut to a predetermined length, and then an insulating layer is provided. Therefore, the plating layer has the effect of suppressing an increase in contact resistance with an electrode. Play. In particular, since the probe needle and the electrode come into contact with each other repeatedly, a thick plating thickness is preferable in order to maintain good contact for a long period of time. However, if the plating thickness is increased, the outer diameter becomes large, and there is a drawback that it cannot meet the recent demand for narrower pitch.

本発明は、上記課題を解決するためになされたものであって、その目的は、主に電子部品及び基板等の導通検査に用いる検査用のプローブ針において、めっき厚を厚くしても線径が大きくならず、狭ピッチ化を実現できるプローブ針及びプローブユニットを提供することにある。 The present invention has been made to solve the above problems, and an object thereof is a probe needle for inspection mainly used for continuity inspection of electronic parts and substrates, even if the plating thickness is increased. It is an object of the present invention to provide a probe needle and a probe unit which can realize a narrow pitch without increasing the size.

(1)本発明に係るプローブ針は、ピン形状の金属導体の外周に絶縁被膜を有する胴体部と、前記金属導体の両端に該絶縁被膜を有しない端部とを有するプローブ針において、前記端部のみに厚さ1μm以上5μm以下の範囲内のめっき層が形成されている、ことを特徴とする。 (1) The probe needle according to the present invention is a probe needle having a body portion having an insulating coating on the outer periphery of a pin-shaped metal conductor and ends having no insulating coating on both ends of the metal conductor. It is characterized in that a plating layer having a thickness of 1 μm or more and 5 μm or less is formed only on the portion.

この発明によれば、端部のみに上記範囲内の厚さのめっき層が形成されているので、そのめっき層の厚さ分だけ胴体部の金属導体の線径を細くすることができる。その結果、プローブ針の細径化を実現でき、プローブユニットでの狭ピッチ化の要請に応えることができる。この場合において、胴体部の金属導体にめっき層が設けられる場合に比べ、胴体部の絶縁被膜の厚さをそのめっき層の厚さ分だけ厚くでき、胴体部の絶縁耐圧を高くすることができる。さらに、このプローブ針を装着したプローブユニットにおいて、設けられためっき層により被測定体の電極との接触抵抗の上昇を抑制でき、プローブ針と電極との繰り返し接触を長期間良好に維持することができる。 According to the present invention, since the plating layer having a thickness within the above range is formed only at the end portion, the wire diameter of the metal conductor of the body portion can be reduced by the thickness of the plating layer. As a result, the diameter of the probe needle can be reduced, and the demand for narrowing the pitch in the probe unit can be met. In this case, as compared with the case where the plating layer is provided on the metal conductor of the body portion, the thickness of the insulating film of the body portion can be increased by the thickness of the plating layer, and the withstand voltage of the body portion can be increased. .. Further, in the probe unit equipped with this probe needle, an increase in contact resistance with the electrode of the object to be measured can be suppressed by the provided plating layer, and repeated contact between the probe needle and the electrode can be maintained well for a long period of time. can.

本発明に係るプローブ針において、前記胴体部の外径をD3とし、前記端部の外径をD2としたとき、[(D3−D2)/2]が1.5μm以上5μm以下の範囲内であることが好ましい。 In the probe needle according to the present invention, when the outer diameter of the body portion is D3 and the outer diameter of the end portion is D2, [(D3-D2) / 2] is within the range of 1.5 μm or more and 5 μm or less. It is preferable to have.

この発明によれば、上記数値範囲は、プローブユニットの案内穴周縁に当接する絶縁被膜端部の厚さを表しているので、高い絶縁耐圧を示しつつ、案内穴周縁への当接を行うことができる。 According to the present invention, the above numerical range represents the thickness of the end portion of the insulating coating that abuts on the peripheral edge of the guide hole of the probe unit. Can be done.

本発明に係るプローブ針において、前記めっき層が、ニッケルめっき層、金めっき層及びロジウムめっき層から選ばれる単層又は複層であることが好ましい。 In the probe needle according to the present invention, it is preferable that the plating layer is a single layer or a plurality of layers selected from a nickel plating layer, a gold plating layer and a rhodium plating layer.

本発明に係るプローブ針において、前記金属導体の外径が、8μm以上、120μm以下の範囲内であることが好ましい。 In the probe needle according to the present invention, it is preferable that the outer diameter of the metal conductor is within the range of 8 μm or more and 120 μm or less.

(2)本発明に係るプローブユニットは、ピン形状の金属導体の外周に絶縁被膜を有する胴体部と、前記金属導体の両端に該絶縁被膜を有しない端部とを有するプローブ針と、前記プローブ針が装着される案内穴を有した被測定体側に配置された支持板とを有し、前記支持板の前記案内穴の周縁に前記プローブ針の前記絶縁被膜の端部を当てるとともに前記被測定体の電極に前記金属導体の先端を接触させて行う検査に用いるプローブユニットであって、
前記プローブ針の前記端部のみに厚さ1μm以上5μm以下の範囲内のめっき層が形成されている、ことを特徴とする。
、ことを特徴とする。
(2) The probe unit according to the present invention has a fuselage portion having an insulating coating on the outer periphery of a pin-shaped metal conductor, a probe needle having both ends of the metal conductor having no insulating coating, and the probe. It has a support plate arranged on the side of the object to be measured having a guide hole to which the needle is mounted, and the end portion of the insulating coating of the probe needle is applied to the peripheral edge of the guide hole of the support plate and the measurement is performed. A probe unit used for inspection performed by contacting the tip of the metal conductor with the electrode of the body.
It is characterized in that a plating layer having a thickness of 1 μm or more and 5 μm or less is formed only on the end portion of the probe needle.
, Characterized by that.

この発明によれば、上記本発明に係るプローブ針を有するので、プローブ針の細径化を実現でき、プローブユニットでの狭ピッチ化の要請に応えることができる。さらに、このプローブ針を装着したプローブユニットにおいて、設けられためっき層により被測定体の電極との接触抵抗の上昇を抑制でき、プローブ針と電極との繰り返し接触を長期間良好に維持することができる。 According to the present invention, since the probe needle according to the present invention is provided, the diameter of the probe needle can be reduced, and the request for narrowing the pitch in the probe unit can be met. Further, in the probe unit equipped with this probe needle, an increase in contact resistance with the electrode of the object to be measured can be suppressed by the provided plating layer, and repeated contact between the probe needle and the electrode can be maintained well for a long period of time. can.

本発明に係るプローブユニットにおいて、前記胴体部の外径をD3とし、前記端部の外径をD2としたとき、[(D3−D2)/2]が1.5μm以上5μm以下の範囲内であり、前記案内穴に装着される前記プローブ針同士の隙間Gが、2μm以上10μm以下の範囲内であることが好ましい。 In the probe unit according to the present invention, when the outer diameter of the body portion is D3 and the outer diameter of the end portion is D2, [(D3-D2) / 2] is within the range of 1.5 μm or more and 5 μm or less. It is preferable that the gap G between the probe needles mounted in the guide hole is within the range of 2 μm or more and 10 μm or less.

この発明によれば、上記[(D3−D2)/2]の数値範囲はプローブユニットの案内穴周縁に当接する絶縁被膜端部の厚さを表しているので、高い絶縁耐圧を示しつつ、案内穴周縁への当接を行うことができる。さらに、プローブ針同士の隙間Gが上記範囲内であるので、狭ピッチ化した場合であっても隣り合うプローブ針同士の隙間を確保することができる。 According to the present invention, the numerical range of the above [(D3-D2) / 2] represents the thickness of the end portion of the insulating coating that abuts on the peripheral edge of the guide hole of the probe unit. Contact with the perimeter of the hole can be made. Further, since the gap G between the probe needles is within the above range, it is possible to secure a gap between adjacent probe needles even when the pitch is narrowed.

本発明によれば、主に電子部品及び基板等の導通検査に用いる検査用のプローブ針において、めっき厚を厚くしても線径が大きくならず、狭ピッチ化を実現できる。特に、めっき層の厚さ分だけ胴体部の金属導体の線径を細くすることができるので、プローブ針の細径化を実現でき、プローブユニットでの狭ピッチ化の要請に応えることができる。また、胴体部の金属導体にめっき層が設けられる場合に比べ、胴体部の絶縁被膜の厚さをそのめっき層の厚さ分だけ厚くでき、胴体部の絶縁耐圧を高くすることができる。また、狭ピッチ化した場合であっても隣り合うプローブ針同士の隙間を確保することができる。 According to the present invention, in a probe needle for inspection mainly used for continuity inspection of electronic parts and substrates, the wire diameter does not increase even if the plating thickness is increased, and a narrow pitch can be realized. In particular, since the wire diameter of the metal conductor of the body portion can be reduced by the thickness of the plating layer, the diameter of the probe needle can be reduced, and the demand for narrowing the pitch in the probe unit can be met. Further, as compared with the case where the plating layer is provided on the metal conductor of the body portion, the thickness of the insulating film of the body portion can be increased by the thickness of the plating layer, and the withstand voltage of the body portion can be increased. Further, even when the pitch is narrowed, it is possible to secure a gap between adjacent probe needles.

本発明に係るプローブ針の一例を示す説明図である。It is explanatory drawing which shows an example of the probe needle which concerns on this invention. 本発明に係るプローブ針の断面図である。It is sectional drawing of the probe needle which concerns on this invention. 本発明に係るプローブユニットの一例を示す説明図ある。It is explanatory drawing which shows an example of the probe unit which concerns on this invention.

本発明に係るプローブ針及びプローブユニットについて図面を参照しつつ説明する。なお、以下に説明する実施形態は、本発明の技術的思想の一例であり、本発明の技術的範囲は、以下の記載や図面だけに限定されるものではなく、同様の技術的思想の発明を含んでいる。 The probe needle and the probe unit according to the present invention will be described with reference to the drawings. The embodiments described below are examples of the technical idea of the present invention, and the technical scope of the present invention is not limited to the following description and drawings, but inventions of the same technical idea. Includes.

[プローブ針]
本発明に係るプローブ針10は、図1及び図2に示すように、ピン形状の金属導体1の外周に絶縁被膜2を有する胴体部6と、その金属導体1の両端に絶縁被膜2を有しない端部3とを有し、その端部3のみに厚さ(T2)が1μm以上5μm以下の範囲内のめっき層4が形成されていることに特徴がある。
[Probe needle]
As shown in FIGS. 1 and 2, the probe needle 10 according to the present invention has a body portion 6 having an insulating coating 2 on the outer periphery of a pin-shaped metal conductor 1 and insulating coatings 2 at both ends of the metal conductor 1. It is characterized in that it has a non-existing end portion 3 and a plating layer 4 having a thickness (T2) of 1 μm or more and 5 μm or less is formed only on the end portion 3.

こうしたプローブ針10は、端部3のみに上記範囲内の厚さT2のめっき層4が形成されているので、そのめっき層4の厚さ分だけ胴体部6の金属導体1の外径D1を細くすることができる。その結果、プローブ針10の細径化を実現でき、プローブユニット60での狭ピッチ化の要請に応えることができる。この場合において、胴体部6の金属導体1にめっき層4が設けられる場合に比べ、胴体部6の絶縁被膜2の厚さT1をそのめっき層4の厚さ(T1)分だけ厚くでき、胴体部6の絶縁耐圧を高くすることができる。さらに、このプローブ針10を装着したプローブユニット60において、設けられためっき層4により被測定体11の電極12との接触抵抗の上昇を抑制でき、プローブ針10と電極12との繰り返し接触を長期間良好に維持することができる。すなわち、本発明に係るプローブ針10は、端部3のめっき層4を厚くしても、胴体部6の外径D3が大きくならず、狭ピッチ化に対応できるという格別の効果を奏する。 In such a probe needle 10, since the plating layer 4 having a thickness T2 within the above range is formed only on the end portion 3, the outer diameter D1 of the metal conductor 1 of the body portion 6 is adjusted by the thickness of the plating layer 4. It can be made thinner. As a result, the diameter of the probe needle 10 can be reduced, and the request for narrowing the pitch in the probe unit 60 can be met. In this case, as compared with the case where the plating layer 4 is provided on the metal conductor 1 of the body portion 6, the thickness T1 of the insulating coating 2 of the body portion 6 can be made thicker by the thickness (T1) of the plating layer 4, and the body can be made thicker. The withstand voltage of the part 6 can be increased. Further, in the probe unit 60 to which the probe needle 10 is mounted, an increase in contact resistance of the object to be measured 11 with the electrode 12 can be suppressed by the provided plating layer 4, and repeated contact between the probe needle 10 and the electrode 12 is lengthened. It can be maintained well for a period of time. That is, the probe needle 10 according to the present invention has a special effect that the outer diameter D3 of the body portion 6 does not increase even if the plating layer 4 of the end portion 3 is thickened, and the pitch can be narrowed.

各構成要素について詳しく説明する。 Each component will be described in detail.

プローブ針10は、図3に示すように、プローブユニット60を構成する被測定体側の第1支持板20の案内穴周縁に絶縁被膜2の端部7を当てるとともに被測定体11の電極12に金属導体1の先端1aを接触させて行う検査で使用されるものである。このプローブ針10は、金属導体1と、金属導体1の少なくとも両端以外の領域(胴体部6)に設けられた絶縁被膜2とを有している。 As shown in FIG. 3, the probe needle 10 abuts the end portion 7 of the insulating coating 2 on the peripheral edge of the guide hole of the first support plate 20 on the side to be measured, which constitutes the probe unit 60, and is applied to the electrode 12 of the body to be measured 11. It is used in an inspection performed by contacting the tip 1a of the metal conductor 1. The probe needle 10 has a metal conductor 1 and an insulating coating 2 provided in a region (body portion 6) other than at least both ends of the metal conductor 1.

(金属導体)
金属導体1は、所定の長さに加工されてなるピン形状の導体であり、高い導電性と高い弾性率を有する金属線(「金属ばね線」ともいう。)を切断加工されている。金属導体1に用いられる金属としては、広い弾性域を持つ金属を挙げることができ、例えば銀銅合金、錫銅合金、ベリリウム銅合金等の銅合金、パラジウム合金、タングステン、レニウムタングステン、鋼(例えば高速度鋼:SKH)等を好ましく用いることができる。特に、後述の実施例に示すように、高強度特性を備え且つ細径化も実現できるタングステン、レニウムタングステン等が好ましい。
(Metal conductor)
The metal conductor 1 is a pin-shaped conductor processed to a predetermined length, and is formed by cutting a metal wire (also referred to as “metal spring wire”) having high conductivity and high elastic modulus. Examples of the metal used for the metal conductor 1 include metals having a wide elastic range, such as copper alloys such as silver-copper alloys, tin-copper alloys, and beryllium-copper alloys, palladium alloys, tungsten, renium tungsten, and steel (for example). High-speed steel: SKH) and the like can be preferably used. In particular, as shown in Examples described later, tungsten, rhenium tungsten and the like having high strength characteristics and capable of reducing the diameter are preferable.

金属導体1は、通常、上記の金属が所定の径の線状導体となるまで冷間又は熱間伸線等の塑性加工が施される。金属導体1の直径D1は、近年の狭ピッチ化の要請から、細径化が求められており、プローブユニット60において隣り合う各プローブ針10の隙間Gに応じて、8μm以上、120μm以下の範囲内、好ましくは10〜110μmの範囲内から任意に選択することができる。 The metal conductor 1 is usually subjected to plastic working such as cold or hot wire drawing until the metal becomes a linear conductor having a predetermined diameter. The diameter D1 of the metal conductor 1 is required to be reduced in diameter due to the recent demand for narrower pitch, and is in the range of 8 μm or more and 120 μm or less depending on the gap G of the adjacent probe needles 10 in the probe unit 60. Of these, it can be arbitrarily selected from the range of preferably 10 to 110 μm.

金属導体1の先端側と後端側の先端1a及び後端1bの形状は、図示しないが、半球形状、円錐形状、先端に半球形状を有する円錐形状、先端に平坦形状を有する円錐形状、等から選ばれるいずれかとすることができる。ここでいう「半球形状」、「円錐形状」は、正確な半球や円錐を含むが、略円錐や略半球も含む。 The shapes of the front end 1a and the rear end 1b on the front end side and the rear end side of the metal conductor 1 are not shown, but are hemispherical, conical, conical with a hemispherical shape at the tip, conical shape with a flat tip, and the like. Can be selected from. The "hemispherical shape" and "conical shape" referred to here include an accurate hemisphere and a cone, but also include a substantially conical shape and a substantially hemisphere.

金属導体1の端部3(絶縁被膜2が設けられていない部分)においては、金属導体1と、電極12又は検査装置のリード線50との接触抵抗値の上昇を抑制するために、図2に示すように、めっき層4が端部3のみに設けられている。めっき層4を形成する金属としては、ニッケル、金、ロジウム等の金属や金合金等の合金を挙げることができる。具体的には、めっき層4は、ニッケルめっき層、金めっき層及びロジウムめっき層から選ばれる単層又は複層を挙げることができる。複層のめっき層4としては、ニッケルめっき層上に金めっき層が形成されたものを好ましく挙げることができる。めっき層4は、絶縁被膜2を形成した金属導体1を切断した後、絶縁被膜2の剥離加工と金属導体1の端部加工を行った後に、露出した金属導体1の表面だけに形成される。 At the end 3 of the metal conductor 1 (the portion where the insulating coating 2 is not provided), in order to suppress an increase in the contact resistance value between the metal conductor 1 and the electrode 12 or the lead wire 50 of the inspection device, FIG. As shown in, the plating layer 4 is provided only on the end portion 3. Examples of the metal forming the plating layer 4 include metals such as nickel, gold and rhodium, and alloys such as gold alloys. Specifically, the plating layer 4 may be a single layer or a plurality of layers selected from a nickel plating layer, a gold plating layer and a rhodium plating layer. As the multi-layered plating layer 4, a layer in which a gold plating layer is formed on a nickel plating layer can be preferably mentioned. The plating layer 4 is formed only on the surface of the exposed metal conductor 1 after cutting the metal conductor 1 on which the insulating film 2 is formed, peeling the insulating film 2 and processing the end portion of the metal conductor 1. ..

めっき層4の厚さT2は、1μm以上、5μm以下の範囲内とすることができるが、後述の実施例に示すように、1.2μm以上、5μm以下であることが好ましい。こうした厚さT2のめっき層4が端部3のみに形成されているので、そのめっき層4の厚さ分だけ胴体部6の金属導体1の線径を細くすることができる。めっき層4を端部のみに設けたので、金属導体1の全長(胴体部6にも)にめっき層4を設けた場合に比べ、胴体部6の絶縁被膜2の厚さT1をめっき層4の厚さ(T2)分だけ厚くでき、胴体部6の絶縁耐圧を高くすることができる。 The thickness T2 of the plating layer 4 can be in the range of 1 μm or more and 5 μm or less, but as shown in Examples described later, it is preferably 1.2 μm or more and 5 μm or less. Since the plating layer 4 having such a thickness T2 is formed only on the end portion 3, the wire diameter of the metal conductor 1 of the body portion 6 can be reduced by the thickness of the plating layer 4. Since the plating layer 4 is provided only at the end portion, the thickness T1 of the insulating coating 2 of the body portion 6 is increased to the plating layer 4 as compared with the case where the plating layer 4 is provided on the entire length of the metal conductor 1 (also on the body portion 6). The thickness can be increased by the thickness (T2) of the body portion 6, and the withstand voltage of the body portion 6 can be increased.

このように、本発明では、端部3のめっき層4を厚くしても、胴体部6の外径D3が大きくならず、狭ピッチ化に対応できるという格別の効果を奏する。厚く設けためっき層4は、電極12との接触抵抗の上昇を抑制でき、さらに、電極12との繰り返し接触を長期間良好に維持することができるという効果を併せ持つ。 As described above, in the present invention, even if the plating layer 4 at the end portion 3 is thickened, the outer diameter D3 of the body portion 6 does not become large, and a special effect that the pitch can be narrowed can be obtained. The thickly provided plating layer 4 has the effect of suppressing an increase in contact resistance with the electrode 12 and further maintaining good repeated contact with the electrode 12 for a long period of time.

なお、プローブ針10をプローブユニット60に装着し易くし、且つ、プローブユニット60の使用時においてプローブ針10の先端1aが第1支持板20の案内穴21の周縁に引っかかることによりプローブ針10の動きが妨げられるのを防止する観点からは、金属導体1の真直度が高いことが好ましく、具体的には真直度が曲率半径Rで1000mm以上であることが好ましい。 The probe needle 10 can be easily attached to the probe unit 60, and the tip 1a of the probe needle 10 is caught on the peripheral edge of the guide hole 21 of the first support plate 20 when the probe unit 60 is used. From the viewpoint of preventing the movement from being hindered, the straightness of the metal conductor 1 is preferably high, and specifically, the straightness is preferably 1000 mm or more with a radius of curvature R.

(絶縁被膜)
絶縁被膜2は、図1及び図2に示すように、金属導体1の少なくとも両側の端部3,3以外の領域の外周に設けられている。絶縁被膜2を有する部分は胴体部6といい、絶縁被膜2が設けられていない部分は端部3といい、端部3の先端を先端1a及び後端1bという。
(Insulation film)
As shown in FIGS. 1 and 2, the insulating coating 2 is provided on the outer periphery of a region other than the ends 3 and 3 on at least both sides of the metal conductor 1. The portion having the insulating coating 2 is referred to as a body portion 6, the portion not provided with the insulating coating 2 is referred to as an end portion 3, and the tip of the end portion 3 is referred to as a tip 1a and a rear end 1b.

絶縁被膜2の構成材料は特に限定されないが、例えば、ポリウレタン、ポリエステル、ポリエステルイミド、ポリアミドイミド、ポリイミド及びフッ素樹脂から選ばれる1種又は2種以上の樹脂材料で構成されていることが好ましい。そして、上記1種又は2種以上の樹脂材料により、単層又は2層以上で形成されている。これら絶縁被膜2の形成は、通常、長尺の金属導体1上に連続エナメル焼き付け方法によって行うことが好ましいが、電着塗装等の公知の他の方法で形成したものであってもよい。 The constituent material of the insulating coating 2 is not particularly limited, but is preferably composed of one or more resin materials selected from, for example, polyurethane, polyester, polyesterimide, polyamideimide, polyimide and fluororesin. Then, it is formed of a single layer or two or more layers by the above-mentioned one or more kinds of resin materials. The insulating coating 2 is usually preferably formed on a long metal conductor 1 by a continuous enamel baking method, but may be formed by another known method such as electrodeposition coating.

絶縁被膜2は、単層でも2層以上の積層(3層でも4層でもよい)でもよく、特に限定されないが、顔料や染料を含有させて他のプローブ針10と識別可能にすることが便利である。顔料と染料はいずれでもよいが、絶縁被膜2の強度を低下させないという観点からは、顔料を用いることが好ましい。顔料としては、一般的にエナメル線の識別に採用されている各種顔料を採用することができる。そうした顔料を樹脂に含有させたエナメル塗料とし、エナメル焼き付けして、着色した絶縁被膜2を形成することができる。 The insulating film 2 may be a single layer or a laminated layer of two or more layers (three layers or four layers may be used), and is not particularly limited, but it is convenient to contain a pigment or a dye so as to be distinguishable from other probe needles 10. Is. Either the pigment or the dye may be used, but from the viewpoint of not reducing the strength of the insulating film 2, it is preferable to use the pigment. As the pigment, various pigments generally used for identifying enamel wires can be adopted. An enamel paint containing such a pigment in a resin can be obtained and baked with enamel to form a colored insulating film 2.

絶縁被膜2が設けられた胴体部6の外径D3は、上記した金属導体1の場合と同様、被測定体11の電極12の狭ピッチ化の要請から、細径化が求められており、10μm以上、140μm以下の範囲内、好ましくは13μm以上、130μm以下の範囲内であることが好ましい。本発明において、胴体部6の外径をD3とし、端部3の外径をD2としたとき、[(D3−D2)/2]が1.5μm以上5μm以下の範囲内であることが好ましい。この[(D3−D2)/2]は、第1支持板20の案内穴21の周縁に当接する絶縁被膜2の端部7の厚さを表している。本発明では、そうした端部7の厚さが、1.5μm以上5μm以下の範囲内を確保できている。端部3の厚さがこの範囲内であるので、高い絶縁耐圧を示しつつ、案内穴周縁への当接を行うことができる。 Similar to the case of the metal conductor 1 described above, the outer diameter D3 of the body portion 6 provided with the insulating coating 2 is required to have a smaller diameter due to the request for narrowing the pitch of the electrode 12 of the object to be measured 11. It is preferably within the range of 10 μm or more and 140 μm or less, preferably within the range of 13 μm or more and 130 μm or less. In the present invention, when the outer diameter of the body portion 6 is D3 and the outer diameter of the end portion 3 is D2, it is preferable that [(D3-D2) / 2] is within the range of 1.5 μm or more and 5 μm or less. .. This [(D3-D2) / 2] represents the thickness of the end portion 7 of the insulating coating 2 that abuts on the peripheral edge of the guide hole 21 of the first support plate 20. In the present invention, the thickness of such an end portion 7 can be secured within the range of 1.5 μm or more and 5 μm or less. Since the thickness of the end portion 3 is within this range, it is possible to perform contact with the peripheral edge of the guide hole while exhibiting a high dielectric strength.

したがって、絶縁被膜2の厚さT1は、絶縁被膜2の端部7の厚さである[(D3−D2)/2](μm)と、上記しためっき層4の厚さT2(μm)との和となる。[(D3−D2)/2]は1.5μm以上5μm以下の範囲内であり、めっき層4の厚さT2は1μm以上5μm以下の範囲内であるので、胴体部6の絶縁被膜2の厚さT1は、2.5μm以上10μm以下の範囲内である。こうした厚さT1の絶縁被膜2を持つ胴体部6は、高い絶縁耐圧を確保することができる。 Therefore, the thickness T1 of the insulating coating 2 is the thickness of the end portion 7 of the insulating coating 2 [(D3-D2) / 2] (μm), and the thickness T2 (μm) of the plating layer 4 described above. It becomes the sum of. [(D3-D2) / 2] is within the range of 1.5 μm or more and 5 μm or less, and the thickness T2 of the plating layer 4 is within the range of 1 μm or more and 5 μm or less. T1 is in the range of 2.5 μm or more and 10 μm or less. The body portion 6 having the insulating film 2 having such a thickness T1 can secure a high dielectric strength.

(プローブユニット)
本発明に係るプローブユニット60は、ピン形状の金属導体1の外周に絶縁被膜2を有する胴体部6と、金属導体1の両端に絶縁被膜2を有しない端部3とを有するプローブ針10と、そのプローブ針10が装着される案内穴21を有した被測定体側に配置された支持板20とを有している。支持板については、具体的には、図3に示すように、被測定体側に配置された第1支持板20と、検査装置側に配置された第2支持板30とを有し、それら少なくとも2つの第1支持板20,第2支持板30には、それぞれ案内穴21,31を有している。そして、被測定体側の第1支持板20の案内穴21の周縁にプローブ針10の絶縁被膜2の端部7を当てるとともに被測定体11の電極12に金属導体1の先端1aを接触させて検査が行われる。そして、そのプローブ針10の端部3のみに厚さ(T2)が1μm以上5μm以下の範囲内のめっき層4が形成されていることを特徴とする。
(Probe unit)
The probe unit 60 according to the present invention includes a probe needle 10 having a body portion 6 having an insulating coating 2 on the outer periphery of a pin-shaped metal conductor 1 and end portions 3 having no insulating coating 2 at both ends of the metal conductor 1. It has a support plate 20 arranged on the side to be measured, which has a guide hole 21 to which the probe needle 10 is mounted. Specifically, as shown in FIG. 3, the support plate has a first support plate 20 arranged on the side to be measured and a second support plate 30 arranged on the inspection device side, and at least these of them. The two first support plates 20 and the second support plate 30 have guide holes 21 and 31, respectively. Then, the end portion 7 of the insulating coating 2 of the probe needle 10 is applied to the peripheral edge of the guide hole 21 of the first support plate 20 on the measured body side, and the tip 1a of the metal conductor 1 is brought into contact with the electrode 12 of the measured body 11. The inspection is done. The plating layer 4 having a thickness (T2) of 1 μm or more and 5 μm or less is formed only on the end portion 3 of the probe needle 10.

こうしたプローブユニット60においても、本発明に係るプローブ針10を有するので、プローブ針10の細径化を実現でき、プローブユニット60での狭ピッチ化の要請に応えることができる。さらに、このプローブ針10を装着したプローブユニット60において、設けられためっき層4により被測定体11の電極12との接触抵抗の上昇を抑制でき、プローブ針10と電極12との繰り返し接触を長期間良好に維持することができる。 Since the probe unit 60 also has the probe needle 10 according to the present invention, the diameter of the probe needle 10 can be reduced, and the request for narrowing the pitch in the probe unit 60 can be met. Further, in the probe unit 60 to which the probe needle 10 is mounted, an increase in contact resistance of the object to be measured 11 with the electrode 12 can be suppressed by the provided plating layer 4, and repeated contact between the probe needle 10 and the electrode 12 is lengthened. It can be maintained well for a period of time.

プローブ針10を装着したプローブユニット60において、胴体部6の外径をD3とし、端部3の外径をD2としたとき、[(D3−D2)/2]が1.5μm以上5μm以下の範囲内であり、案内穴21に装着されるプローブ針同士10,10の隙間Gが、2μm以上10μm以下の範囲内であることが好ましい。[(D3−D2)/2]の数値範囲はプローブユニット60の案内穴周縁に当接する絶縁被膜端部7の厚さを表しているので、高い絶縁耐圧を示しつつ、案内穴周縁への当接を行うことができる。さらに、プローブ針同士の隙間Gが上記範囲内であるので、狭ピッチ化した場合であっても隣り合うプローブ針同士の隙間を確保することができる。 In the probe unit 60 equipped with the probe needle 10, when the outer diameter of the body portion 6 is D3 and the outer diameter of the end portion 3 is D2, [(D3-D2) / 2] is 1.5 μm or more and 5 μm or less. It is preferably within the range, and the gap G between the probe needles 10 and 10 mounted in the guide hole 21 is preferably within the range of 2 μm or more and 10 μm or less. Since the numerical range of [(D3-D2) / 2] represents the thickness of the insulating coating end portion 7 that abuts on the peripheral edge of the guide hole of the probe unit 60, it hits the peripheral edge of the guide hole while showing a high dielectric strength. You can make contact. Further, since the gap G between the probe needles is within the above range, it is possible to secure a gap between adjacent probe needles even when the pitch is narrowed.

なお、検査装置側の第2支持板30は、胴体部6の外径D3よりも若干大きい内径の案内穴31を有している。一方、被測定体側の第1支持板20は、端部3の外径D2よりも若干大きい内径の案内穴21を有している。若干大きいとは、僅かなクリアランス(例えば1〜3μm)だけ大きいことを意味している。案内穴21は、胴体部6の外径D3よりも小さいので、その案内穴21をプローブ針10がすり抜けることはなく、絶縁被膜2の端部7が案内穴周縁のエッジに当接する。案内穴21は、一本一本のプローブ針10をガイドし、被測定体11の電極12に金属導体1の先端1aを正確に接触させるようにガイドする。 The second support plate 30 on the inspection device side has a guide hole 31 having an inner diameter slightly larger than the outer diameter D3 of the body portion 6. On the other hand, the first support plate 20 on the side to be measured has a guide hole 21 having an inner diameter slightly larger than the outer diameter D2 of the end portion 3. A slightly larger means that the clearance is slightly larger (eg 1-3 μm). Since the guide hole 21 is smaller than the outer diameter D3 of the body portion 6, the probe needle 10 does not slip through the guide hole 21, and the end portion 7 of the insulating coating 2 abuts on the edge of the peripheral edge of the guide hole. The guide hole 21 guides each probe needle 10 so as to accurately contact the tip 1a of the metal conductor 1 with the electrode 12 of the object to be measured 11.

プローブユニット60は、図3の例では、被測定体11の電気特性を検査する際、プローブ針10と被測定体11とが対応するように位置制御される。電気特性の検査は、プローブユニット60を上下にストロークさせ、プローブ針10の弾性力を利用して被測定体11の電極12にプローブ針10の先端1aを所定の圧力で押し当てることにより行われる。このとき、プローブ針10の後端1bはリード線50に接触し、被測定体11からの電気信号がそのリード線50を通って検査装置(図示しない。)に送られる。 In the example of FIG. 3, the probe unit 60 is positioned so that the probe needle 10 and the measured body 11 correspond to each other when inspecting the electrical characteristics of the measured body 11. The inspection of the electrical characteristics is performed by stroking the probe unit 60 up and down and using the elastic force of the probe needle 10 to press the tip 1a of the probe needle 10 against the electrode 12 of the object to be measured 11 with a predetermined pressure. .. At this time, the rear end 1b of the probe needle 10 comes into contact with the lead wire 50, and an electric signal from the object to be measured 11 is sent to an inspection device (not shown) through the lead wire 50.

実施例と比較例により具体的に説明する。 This will be specifically described with reference to Examples and Comparative Examples.

[実施例1]
金属導体1として、長尺のレニウムタングステン線(外径D1が10μm)を用いた。絶縁被膜2は、ポリエステル被膜形成用のエナメル塗料を用い、厚さT1が3μmとなるように金属導体1上に形成した。絶縁被膜2が形成された長尺の金属導体1を定尺切断機で切断して長さ10mmの絶縁被膜付きプローブ針を切り出し、その絶縁被膜付きプローブ針の両側の端部3,3の所定長さをレーザー剥離した。絶縁被膜2が剥離されて露出した金属導体1の表面に、電気めっきで厚さ1μmのニッケルめっき層を設けた後、さらにその上に厚さ0.2μmの金めっき層を設けて合計厚さT2が1.2μmのめっき層4を形成した。このプローブ針10は、D1=10μm、D2=12.4μm、D3=16μm、T1=3μm、T2=1.2μm、[(D3−D2)/2]=1.8μm、であった。表1中、Pは、プローブユニット60における案内穴21のピッチ(μm)であり、Gは、プローブ針間の隙間(μm)である。
[Example 1]
As the metal conductor 1, a long rhenium tungsten wire (outer diameter D1 is 10 μm) was used. The insulating film 2 was formed on the metal conductor 1 so that the thickness T1 was 3 μm by using an enamel paint for forming a polyester film. A long metal conductor 1 on which the insulating coating 2 is formed is cut with a standard cutting machine to cut out a probe needle with an insulating coating having a length of 10 mm, and predetermined ends 3 and 3 on both sides of the probe needle with the insulating coating are cut out. The length was laser stripped. A nickel plating layer having a thickness of 1 μm is provided on the surface of the metal conductor 1 exposed by peeling the insulating film 2, and then a gold plating layer having a thickness of 0.2 μm is further provided on the nickel plating layer to have a total thickness. A plating layer 4 having T2 of 1.2 μm was formed. The probe needle 10 had D1 = 10 μm, D2 = 12.4 μm, D3 = 16 μm, T1 = 3 μm, T2 = 1.2 μm, and [(D3-D2) / 2] = 1.8 μm. In Table 1, P is the pitch (μm) of the guide holes 21 in the probe unit 60, and G is the gap (μm) between the probe needles.

[実施例2〜8]
金属導体1については、実施例2〜4は実施例1と同じレニウムタングステン線を用い、実施例5〜8はレニウムタングステン線に代えてタングステン線を用いた。絶縁被膜2については、実施例2〜5は実施例1と同じポリエステル被膜形成用のエナメル塗料を用い、実施例6〜8はポリエステル被膜形成用のエナメル塗料に代えてポリウレタン被膜形成用のエナメル塗料を用いた。めっき層4については、実施例2〜8は実施例1と同様、ニッケルめっき層上に金めっき層を設けた。金属導体1の外径D1、絶縁被膜2の厚さT1、めっき層4の厚さT2は、それぞれ表1に示した。さらに、D2,D3,[(D3−D2)/2],P,Gについても、表1に示した。
[Examples 2 to 8]
As for the metal conductor 1, the same rhenium tungsten wire as in Example 1 was used in Examples 2 to 4, and a tungsten wire was used in Examples 5 to 8 instead of the rhenium tungsten wire. As for the insulating film 2, Examples 2 to 5 use the same enamel paint for forming a polyester film as in Example 1, and Examples 6 to 8 use an enamel paint for forming a polyurethane film instead of the enamel paint for forming a polyester film. Was used. As for the plating layer 4, in Examples 2 to 8, a gold plating layer was provided on the nickel plating layer as in Example 1. The outer diameter D1 of the metal conductor 1, the thickness T1 of the insulating coating 2, and the thickness T2 of the plating layer 4 are shown in Table 1, respectively. Furthermore, D2, D3, [(D3-D2) / 2], P, and G are also shown in Table 1.

[比較例1〜8]
金属導体1については、比較例1〜4は実施例1と同じレニウムタングステン線を用い、比較例5〜8はレニウムタングステン線に代えてタングステン線を用いた。絶縁被膜2については、比較例1〜5は実施例1と同じポリエステル被膜形成用のエナメル塗料を用い、比較例6〜8はポリエステル被膜形成用のエナメル塗料に代えてポリウレタン被膜形成用のエナメル塗料を用いた。めっき層4については、比較例1〜8は実施例1と同様、ニッケルめっき層上に金めっき層を設けた。金属導体1の外径D1、絶縁被膜2の厚さT1、めっき層4の厚さT2は、それぞれ表1に示した。さらに、D2,D3,[(D3−D2)/2],P,Gについても、表1に示した。
[Comparative Examples 1 to 8]
As for the metal conductor 1, Comparative Examples 1 to 4 used the same rhenium tungsten wire as in Example 1, and Comparative Examples 5 to 8 used a tungsten wire instead of the rhenium tungsten wire. Regarding the insulating film 2, Comparative Examples 1 to 5 used the same enamel paint for forming a polyester film as in Example 1, and Comparative Examples 6 to 8 used an enamel paint for forming a polyurethane film instead of the enamel paint for forming a polyester film. Was used. As for the plating layer 4, in Comparative Examples 1 to 8, a gold plating layer was provided on the nickel plating layer as in Example 1. The outer diameter D1 of the metal conductor 1, the thickness T1 of the insulating coating 2, and the thickness T2 of the plating layer 4 are shown in Table 1, respectively. Furthermore, D2, D3, [(D3-D2) / 2], P, and G are also shown in Table 1.

Figure 2021189064
Figure 2021189064

[結果]
実施例1〜8及び比較例1〜8のプローブ針及びプローブユニットについて、表1にまとめた。表1の結果より、D1,T1,T2,D2を同じにした場合、実施例1〜3では、プローブ針10の隙間Gを確保でき、狭ピッチでプローブ針10をセッチングすることができた。一方、比較例1〜8では、プローブ針10の隙間Gを確保できず、プローブ針10をセッチングすることすらできなかった。この違いは、実施例1〜8では胴体部6にめっき層4が設けられていないので、胴体部6の外径D3を小さくすることができたのに対し、比較例1〜8では胴体部6にめっき層4が設けられているので、胴体部6の外径D3を小さくすることができなかったためである。なお、仮に胴体部6の外径を同じにしようとすると、比較例1〜8では絶縁被膜2の厚さT1を小さくするか、金属導体1の外径D1を細くしなければならず、前者は絶縁耐圧が小さくなってしまい、後者は導体抵抗が高くなってしまうという難点がある。一方、実施例1〜8では、こうした難点は生じ得ない。
[result]
The probe needles and probe units of Examples 1 to 8 and Comparative Examples 1 to 8 are summarized in Table 1. From the results in Table 1, when D1, T1, T2, and D2 are the same, in Examples 1 to 3, the gap G of the probe needle 10 can be secured, and the probe needle 10 can be set at a narrow pitch. On the other hand, in Comparative Examples 1 to 8, the gap G of the probe needle 10 could not be secured, and even the probe needle 10 could not be set. The difference is that in Examples 1 to 8, since the plating layer 4 is not provided on the body portion 6, the outer diameter D3 of the body portion 6 can be reduced, whereas in Comparative Examples 1 to 8, the body portion can be reduced. This is because the plating layer 4 is provided on the body 6, so that the outer diameter D3 of the body portion 6 cannot be reduced. If the outer diameter of the body portion 6 is to be the same, in Comparative Examples 1 to 8, the thickness T1 of the insulating coating 2 must be reduced or the outer diameter D1 of the metal conductor 1 must be reduced, which is the former. Has a drawback that the withstand voltage becomes small and the latter has a high conductor resistance. On the other hand, in Examples 1 to 8, such a difficulty cannot occur.

1 金属導体
1a 先端
1b 後端
2 絶縁被膜
3 端部
4 めっき層
6 胴体部
7 案内穴の周縁に当接する絶縁被膜端部
10 プローブ針
11 被測定体
12 電極
20 第1支持板
21 案内穴
30 第2支持板
31 案内穴
40 リード線用の保持板
50 リード線
60 プローブユニット
D1 金属導体の外径
D2 端部の直径
D3 プローブ針の外径
T1 絶縁被膜の厚さ
T2 めっき層の厚さ
G プローブ針間の隙間



1 Metal conductor 1a Tip 1b Rear end 2 Insulation coating 3 End 4 Plating layer 6 Body 7 Insulation coating end that abuts on the periphery of the guide hole 10 Probe needle 11 Measured body 12 Electrode 20 First support plate 21 Guide hole 30 2nd support plate 31 Guide hole 40 Lead wire holding plate 50 Lead wire 60 Probe unit D1 Metal conductor outer diameter D2 End diameter D3 Probe needle outer diameter T1 Insulation coating thickness T2 Plating layer thickness G Gap between probe needles



Claims (6)

ピン形状の金属導体の外周に絶縁被膜を有する胴体部と、前記金属導体の両端に該絶縁被膜を有しない端部とを有するプローブ針において、前記端部のみに厚さ1μm以上5μm以下の範囲内のめっき層が形成されている、ことを特徴とするプローブ針。 In a probe needle having a fuselage portion having an insulating coating on the outer periphery of a pin-shaped metal conductor and an end portion having no insulating coating on both ends of the metal conductor, the thickness range is 1 μm or more and 5 μm or less only at the end portion. A probe needle characterized in that an inner plating layer is formed. 前記胴体部の外径をD3とし、前記端部の外径をD2としたとき、[(D3−D2)/2]が1.5μm以上5μm以下の範囲内である、請求項1に記載のプローブ針。 The first aspect of the present invention, wherein when the outer diameter of the body portion is D3 and the outer diameter of the end portion is D2, [(D3-D2) / 2] is within the range of 1.5 μm or more and 5 μm or less. Probe needle. 前記めっき層が、ニッケルめっき層、金めっき層及びロジウムめっき層から選ばれる単層又は複層である、請求項1又は2に記載のプローブ針。 The probe needle according to claim 1 or 2, wherein the plating layer is a single layer or a plurality of layers selected from a nickel plating layer, a gold plating layer, and a rhodium plating layer. 前記金属導体の外径が、8μm以上、120μm以下の範囲内である、請求項1〜3のいずれか1項に記載のプローブ針。 The probe needle according to any one of claims 1 to 3, wherein the outer diameter of the metal conductor is within the range of 8 μm or more and 120 μm or less. ピン形状の金属導体の外周に絶縁被膜を有する胴体部と、前記金属導体の両端に該絶縁被膜を有しない端部とを有するプローブ針と、前記プローブ針が装着される案内穴を有した被測定体側に配置された支持板とを有し、前記支持板の前記案内穴の周縁に前記プローブ針の前記絶縁被膜の端部を当てるとともに前記被測定体の電極に前記金属導体の先端を接触させて行う検査に用いるプローブユニットであって、
前記プローブ針の前記端部のみに厚さ1μm以上5μm以下の範囲内のめっき層が形成されている、ことを特徴とするプローブユニット。
A body portion having an insulating coating on the outer periphery of a pin-shaped metal conductor, a probe needle having an end portion having no insulating coating at both ends of the metal conductor, and a cover having a guide hole to which the probe needle is mounted. It has a support plate arranged on the side of the measuring body, and the end of the insulating coating of the probe needle is applied to the peripheral edge of the guide hole of the support plate, and the tip of the metal conductor is in contact with the electrode of the measured body. It is a probe unit used for inspections performed by
A probe unit characterized in that a plating layer having a thickness of 1 μm or more and 5 μm or less is formed only on the end portion of the probe needle.
前記胴体部の外径をD3とし、前記端部の外径をD2としたとき、[(D3−D2)/2]が1.5μm以上5μm以下の範囲内であり、前記案内穴に装着される前記プローブ針同士の隙間Gが、2μm以上10μm以下の範囲内である、請求項5に記載のプローブユニット。


When the outer diameter of the body portion is D3 and the outer diameter of the end portion is D2, [(D3-D2) / 2] is within the range of 1.5 μm or more and 5 μm or less, and is mounted in the guide hole. The probe unit according to claim 5, wherein the gap G between the probe needles is within the range of 2 μm or more and 10 μm or less.


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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102514926B1 (en) * 2022-10-26 2023-03-29 (주)새한마이크로텍 Probe member for pogo pin and pogo pin with the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102514926B1 (en) * 2022-10-26 2023-03-29 (주)새한마이크로텍 Probe member for pogo pin and pogo pin with the same

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