JP2017021721A - Touch panel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a touch panel capable of improving the accuracy in position detection while preventing occurrence of distortion in electric potential distribution.SOLUTION: A touch panel 10 includes: a lower circuit board 11; a transparent conductive film 12 which includes, in a part thereof, a detection area 18 for detecting an input position; a plurality of electrodes 15 for supplying a voltage which are formed extending parallel to four sides of a detection area 18 for detecting an input position; a transparent conductive film 13 which is formed on the lower circuit board 11 being electrically connected to the electrode 15 and being electrically separated from the transparent conductive film 12; and a point electrode 16 conducting across the transparent conductive films 12 and 13. The electrode 15 and the point electrode 16 have resistance values lower than resistance values of the transparent conductive films 12 and 13.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a touch panel.

  Conventionally, a 5-wire type touch panel in which a pair of electrodes is formed on a lower substrate along the X direction and the Y direction has been known (see, for example, Patent Document 1).

  FIG. 1 is a diagram showing a wiring structure of a lower substrate of a 5-wire touch panel. The touch panel 5 in FIG. 1 includes a pair of wirings 1A and 1B parallel to the X direction, a pair of wirings 2A and 2B parallel to the Y direction, and electrodes 3A to 3D for voltage supply. The voltage supply electrodes 3A to 3D are provided at the intersections of the wirings 1A, 1B, 2A, and 2B (that is, the four corners of the touch panel 5).

  When detecting an input position in the X direction on the touch panel 5, for example, a voltage of 5V is applied to the electrodes 3A and 3C, the electrodes 3B and 3D are connected to the ground, and a potential gradient along the X direction is formed. To do. And the input position of a X direction is detected by detecting the voltage in the upper electrode provided in the upper board | substrate which is not shown in figure. When detecting the input position in the Y direction, for example, a voltage of 5 V is applied to the electrodes 3A and 3B, the electrodes 3C and 3D are connected to the ground, and a potential gradient along the Y direction is formed. And the input position of a Y direction is detected by detecting a voltage with an upper electrode.

JP2013-8242A

  For example, when the wirings 1A, 1B, 2A, and 2B are formed of a low resistance material, the resistance value of the conductive film of the touch panel 5 is higher than the resistance value of the wirings 1A, 1B, 2A, and 2B. Flows to the wirings 1A, 1B, 2A and 2B, and the input position cannot be detected. For this reason, it is necessary to form the wirings 1A, 1B, 2A, and 2B with a high resistance material.

  Therefore, for example, it is assumed that the wirings 1A, 1B, 2A, and 2B are formed of a high resistance material and the input position in the X direction is detected. As described above, when the input position in the X direction is detected, a voltage of 5 V is applied to the electrodes 3A and 3C, but the voltage drops in the middle of the wiring 2A because the wiring 2A is formed of a high resistance material. Resulting in. For example, the voltage is about 4 V at the center of the wiring 2A. For this reason, the potential distribution in the X direction is distorted, and the accuracy of position detection deteriorates. Similarly, even when the input position in the Y direction is detected, the voltage drops in the middle of the wiring 1A, the potential distribution in the Y direction is distorted, and the position detection accuracy deteriorates.

  In view of the above problems, an object of the present invention is to provide a touch panel that can avoid the occurrence of distortion of potential distribution and improve the accuracy of position detection.

  In order to achieve the above object, a touch panel disclosed in the specification includes a substrate, a first conductive film including a detection region for detecting an input position in a part thereof, and four sides of the detection region for detecting an input position. A first electrode for supplying a voltage extending in parallel; a second conductive film formed on the substrate; electrically connected to the first electrode; and electrically separated from the first conductive film; And a second electrode for conducting the first conductive film and the second conductive film, wherein the first electrode and the second electrode have a resistance value greater than a resistance value of the first conductive film and the second conductive film. It has a low resistance value.

  According to the present invention, it is possible to avoid the occurrence of distortion of the potential distribution and improve the accuracy of position detection.

It is a figure which shows the wiring structure of the lower board | substrate of a 5-wire type touch panel. (A) is a figure which shows the structure of the lower board | substrate of the touchscreen which concerns on 1st Embodiment. (B) is sectional drawing of the AA line of FIG. 2 (A). (C) is the elements on larger scale of the lower board | substrate of a touchscreen. It is a figure which shows the modification of the structure of the lower board | substrate of a touchscreen. It is a flowchart which shows the manufacturing method of the structure by the side of the lower board | substrate of the touchscreen of FIG. (A) is a figure which shows the structure of the lower board | substrate of the touchscreen which concerns on 2nd Embodiment. FIG. 5B is an enlarged view of a region 39 in FIG. (C) And (D) is a figure which shows the modification of a point electrode. (A) is sectional drawing of the BB line of FIG. 5 (A). (B) is sectional drawing of CC line of FIG. 5 (A). It is a flowchart which shows the manufacturing method of the structure by the side of the lower board | substrate of the touchscreen of FIG.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(First embodiment)
FIG. 2A is a diagram illustrating the structure of the lower substrate of the touch panel according to the first embodiment. FIG. 2B is a cross-sectional view taken along line AA in FIG. (C) is the elements on larger scale of the lower board | substrate of a touchscreen. FIG. 2A particularly shows the positional relationship between the electrode and the conductive film, and the insulating layer formed as the uppermost layer is omitted.

  In FIG. 2A, the touch panel 10 is, for example, a 5-wire or 7-wire touch panel. The touch panel 10 is electrically formed from the lower substrate 11 made of glass or the like, the transparent conductive film 12 formed on the lower substrate 11 and made of ITO (Indium Tin Oxide), and the transparent conductive film 12 by wet etching. The separated transparent conductive film 13, two pairs of electrodes 15 extending in parallel in the X direction and the Y direction, to which a voltage for detecting the input position is applied, and the transparent conductive film 12 and the transparent conductive film 13 And a point electrode 16 that electrically connects the transparent conductive film 12 and the transparent conductive film 13 to each other.

  In addition, the touch panel 10 according to the present embodiment includes an upper substrate (not shown) arranged to face the lower substrate. A transparent conductive film made of ITO is formed on the surface of the upper substrate facing the lower substrate, and an electrode for detecting the potential of the transparent conductive film of the upper substrate is provided. A gap is formed between the transparent conductive film of the upper substrate and the transparent conductive film 12, and the transparent conductive film of the upper substrate and the transparent conductive film 12 are in contact with each other in a state where a voltage is applied to the transparent conductive film 12. At this time, the potential is detected by the electrode on the upper substrate side, and the contact / operation position of the touch panel 10 is determined.

  In addition, when it is necessary to distinguish the four electrodes 15, it describes as electrodes 15A-15D. The electrode 15 and the point electrode 16 function as a first electrode and a second electrode, respectively, and the transparent conductive film 12 and the transparent conductive film 13 function as a first conductive film and a second conductive film, respectively.

  As shown in FIG. 2B, the exposed portions of the lower substrate 11, the transparent conductive film 12 (excluding the detection region 18), the transparent conductive film 13, the electrode 15, and the point electrode 16 are the insulating layer 17. Covered with.

  A U-shaped gap 14 is formed between the transparent conductive film 12 and the transparent conductive film 13 by wet etching. The transparent conductive film 12 and the transparent conductive film 13 are insulated from each other by the gap 14, so that no current flows directly from the transparent conductive film 13 to the transparent conductive film 12. In addition, a detection region 18 for detecting an input position exists in the center of the transparent conductive film 12. The transparent conductive film 13 is formed by wet etching of the ITO film, and is made of ITO like the transparent conductive film 12. The resistance value of ITO is 10-200Ω. In FIG. 2A, the transparent conductive film 13 has a square shape, but is not limited to this shape, and may be, for example, a rectangle, a triangle, or a circle.

  The electrodes 15A to 15D are independently arranged on the lower substrate 11 and are not electrically connected to each other. The electrodes 15A to 15D are also not electrically connected to the transparent conductive film 12. Therefore, for example, current does not flow from the electrode 15A to the electrode 15B.

  The electrode 15 and the point electrode 16 are made of a low resistance material such as silver paste, and the resistance value of the electrode 15 and the point electrode 16 is less than 10Ω. Thus, since the electrode 15 is made of a low-resistance material such as silver paste, a voltage drop that causes the voltage at the center of the electrode 15 to be extremely lower than the voltage at the end of the electrode 15 does not occur. Absent. That is, even if a voltage drop occurs, it is only a minute voltage drop that can be ignored in reality. Therefore, for example, when a voltage (for example, 5 V) for detecting the input position of the touch panel is applied to the electrode 15A, the voltage is uniformly applied to the entire electrode 15A.

  Further, since the voltage applied to the electrode 15 is applied to each point electrode 16 through the transparent conductive film 13 having a resistance value larger than the resistance value of the electrode 15, a current is applied from the electrode 15 to each point electrode 16. There is no direct flow around. That is, the transparent conductive film 13 that is electrically separated from the transparent conductive film 12 restricts current from flowing from the electrode 15 to the point electrode 16.

  A part of the point electrode 16 is electrically connected to the transparent conductive film 12. Therefore, when a voltage is applied to the electrode 15, a voltage is applied to the transparent conductive film 12 via the transparent conductive film 13 and the point electrode 16.

  In this way, a voltage is uniformly applied to the entire electrode 15, and current wraparound from the electrode 15 to the point electrode 16 is prevented by the transparent conductive film 13 having a resistance value larger than the resistance value of the electrode 15. Yes. In addition, since the transparent conductive film 13 and the transparent conductive film 12 are electrically separated, it is possible to prevent current from flowing from the transparent conductive film 13 to the transparent conductive film 12. For this reason, a uniform voltage is applied to each point electrode 16, generation | occurrence | production of the distortion of the electric potential distribution on the detection area | region 18 can be avoided, and the precision of the position detection of a touch panel can be improved.

  Further, in the present embodiment, the transparent conductive film 13 is connected between the electrode 15 and the point electrode 16, thereby suppressing variations in resistance values of paths from the electrode 15 to the respective point electrodes 16.

  For example, a configuration in which the point electrode 16 is formed of a material having a resistance value larger than the resistance value of the electrode 15 and the point electrode 16 is connected to the electrode 15 via electric wiring without passing through the transparent conductive film is conceivable. In this case, the resistance value variation is likely to occur due to the difference in the length of each electric wiring material (silver paste) used for connecting the point electrode 16 and the electrode 15. As a result, a uniform voltage is not applied to each point electrode 16 and the potential distribution on the detection region is likely to be distorted.

  In the present embodiment, as the wiring between the point electrode 16 and the electrode 15, the transparent conductive film 13 having less variation in resistance value than the electric wiring is used, so that a uniform voltage is applied to each point electrode 16, Generation of potential distribution distortion can be avoided.

  The shape of the electrode 15 and the point electrode 16 is not limited to the shape shown in FIG. For example, if the transparent conductive film 13 is etched so that the transparent conductive film 13 is closer to the electrode 15 than the transparent conductive film 12 when the transparent conductive film 13 is formed, the shape of the electrode 15 may be rectangular. The shape of the point electrode 16 may be circular, rectangular or polygonal. For example, as shown in FIG. 2C, the shape of the point electrode 16 may be T-shaped.

  In FIG. 2A, the transparent conductive film 13 is formed by removing the outer periphery of the transparent conductive film 12 in a U shape. For example, as shown in FIG. And one rectangular transparent conductive film 13 (13A-13D) may be formed to face each of the four sides of the transparent conductive film 12. FIG. 3 is a diagram showing a modification of the structure of the lower substrate of the touch panel. The cross section taken along line AA in FIG. 3 is the same as the cross section in FIG. In the arrangement example of the transparent conductive films 12 and 13 in FIG. 3, the electrode 15 may have a rectangular shape as long as it is connected to the transparent conductive film 13. Also, the shape of the point electrode 16 in FIG. 3 may be rectangular or polygonal. Further, in FIG. 3, a plurality of point electrodes 16 are arranged on one side of the transparent conductive film 12, but the point electrodes 16 electrically connect the transparent conductive film 12 and the transparent conductive film 13 opposed thereto. As long as the number of point electrodes 16 is one, it may be one. In this case, it is desirable to use an elongated rectangular electrode along one side of the transparent conductive film 12 instead of the point electrode 16 so that a uniform current flows from the transparent conductive film 13 to the transparent conductive film 12.

  The resistance value of the transparent conductive film 13 is the cross-sectional area 19A (that is, the height of the transparent conductive film 13 in FIG. 2B × the length of the transparent conductive film 13 in the depth direction not shown in FIG. 2B). ) And in proportion to the length 19B (see FIG. 2B), the aspect ratio of the transparent conductive film 13 when the transparent conductive film 12 is etched (that is, in plan view (FIG. 2A)). The aspect ratio of the transparent conductive film 13 is variable. The optimum size or shape of the transparent conductive film 13 is calculated from the area resistance of the transparent conductive film 13 and the aspect ratio of the lower substrate 11 (that is, the outer shape of the panel).

  Hereinafter, a method for detecting the input position on the touch panel 10 will be described.

  When detecting the input position in the X direction on the touch panel 10, for example, a voltage of 5V is applied to the electrode 15B, the electrode 15D is connected to the ground, and the potential gradient along the X direction is detected by the transparent conductive film 12. Formed on region 18. Then, the upper electrode provided on the upper substrate (not shown) detects the voltage, thereby detecting the input position in the X direction. When detecting the input position in the Y direction, for example, a voltage of 5 V is applied to the electrode 15A, the electrode 15C is connected to the ground, and a potential gradient along the Y direction is applied to the detection region 18 of the transparent conductive film 12. Form. Then, the upper electrode provided on the upper substrate (not shown) detects the voltage, thereby detecting the input position in the Y direction.

  FIG. 4 is a flowchart showing a manufacturing method of the structure on the lower substrate side of the touch panel 10 of FIG.

  First, the transparent conductive film 12 is formed on the lower substrate 11 by sputtering or vacuum deposition (step S1). Next, a photoresist is formed on the transparent conductive film 12, the pattern on the photomask is transferred to the photoresist (exposure), and a resist pattern 20 is formed on the transparent conductive film 12 (step S2). Thereafter, a part of the transparent conductive film 12 (that is, a part not masked by the resist pattern 20) is removed by wet etching (step S3). At this time, a transparent conductive film 13 that is electrically separated from the transparent conductive film 12 is formed. Next, the resist pattern 20 is removed (step S4).

  Next, the electrode 15 is formed on a part of the lower substrate 11 and the transparent conductive film 13 by screen printing, and the point electrode 16 is made transparent by screen printing so that the transparent conductive film 12 and the transparent conductive film 13 are conductive. It forms on a part of film | membrane 12 and the transparent conductive film 13 (step S5). Finally, the insulating layer 17 is formed on the lower substrate 11, the transparent conductive film 12 (excluding the detection region 18), the transparent conductive film 13, the electrode 15, and the point electrode 16 (step S6), and this process is finished. Through the above steps, the structure on the lower substrate side of the touch panel 10 of FIG.

  As described above, according to the first embodiment, since the electrodes 15A to 15D are each made of a low-resistance material and are electrically arranged independently, a voltage is uniformly applied to each electrode 15. Thus, current wraparound from one electrode to another electrode (for example, electrode 15A to electrode 15B) is prevented. Further, since the electrode 15 is connected to the point electrode 16 through the transparent conductive film 13 having a resistance value larger than the resistance value of the electrode 15, current wraparound from the electrode 15 to the point electrode 16 is prevented. 13 to prevent. Therefore, a uniform voltage is applied to each point electrode 16, generation of potential distribution distortion on the detection region 18 of the transparent conductive film 12 can be avoided, and position detection accuracy can be improved.

(Second Embodiment)
In the second embodiment, two pairs of electrodes extending in parallel with each other in the X direction and the Y direction are arranged on the inner side of the point electrodes, and the entire two pairs of electrodes are on one transparent conductive film. This is different from the first embodiment in that it is arranged in the first embodiment.

  FIG. 5A shows the structure of the lower substrate of the touch panel according to the second embodiment. FIG. 5B is an enlarged view of the region 39 in FIG. 5C and 5D are diagrams showing a modification of the point electrode. FIG. 6A is a cross-sectional view taken along line BB in FIG. FIG. 6B is a cross-sectional view taken along line CC in FIG. 5A and 5B particularly show the positional relationship between the electrode and the conductive film, and the insulating layer formed as the uppermost layer is omitted.

  In FIG. 5A, the touch panel 10A is, for example, a 5-wire or 7-wire touch panel. The touch panel 10A is electrically formed from the lower substrate 31 made of glass or the like, the transparent conductive film 32 formed on the lower substrate 31 and made of ITO (Indium Tin Oxide), and the transparent conductive film 32 by laser etching. On the separated transparent conductive film 33, two pairs of electrodes 35 that are applied with a voltage for detecting the input position and extend in parallel in the X direction and the Y direction, and on the transparent conductive film 32 and the transparent conductive film 33 And a point electrode 36 that electrically connects the transparent conductive film 32 and the transparent conductive film 33. The transparent conductive film 32 is laminated on the lower substrate 31 so as to cover the entire lower substrate 31. Similarly to the first embodiment, in the touch panel of the present embodiment, an upper substrate (not shown) provided with a conductive film and an upper electrode is disposed facing the lower substrate.

  In addition, when it is necessary to distinguish the four electrodes 35, they are described as electrodes 35A to 35D. The electrode 35 and the point electrode 36 function as a first electrode and a second electrode, respectively, and the transparent conductive film 32 and the transparent conductive film 33 function as a first conductive film and a second conductive film, respectively.

  As shown in FIGS. 6A and 6B, the transparent conductive film 32, the transparent conductive film 33, the electrode 35, and the point electrode 36 are covered with an insulating layer 43.

  A gap 34 is formed between the transparent conductive film 32 and the transparent conductive film 33 by laser etching, and the transparent conductive film 33 is insulated from the transparent conductive film 32. Therefore, the current does not flow directly from the transparent conductive film 33 to the transparent conductive film 32. In addition, a detection region 38 for detecting the input position exists in the center of the transparent conductive film 32. At least the detection region 38 is not covered with the insulating layer 43. The transparent conductive film 33 is formed by removing a part of ITO by laser etching. The resistance value of ITO is, for example, 200-500Ω. 5A and 5B, the transparent conductive film 33 has a rectangular shape, but is not limited to this shape, and may be, for example, a square, a triangle, or a circle.

  The resistance value of the transparent conductive film 33 is variable according to the aspect ratio of the transparent conductive film 33 when the transparent conductive film 32 is etched (the aspect ratio in the top view of FIG. 5A). The optimum size or shape of the transparent conductive film 33 is calculated from the area resistance of the transparent conductive film 33 and the aspect ratio of the lower substrate 31 (that is, the outer shape of the panel).

  Further, as shown in FIGS. 5A and 5B, the electrode 35 includes a main body portion 42 extending in the X direction or the Y direction, and an arm extending outwardly from the main body portion 42 in a U-shape. Part 41. One end of the arm portion 41 is electrically connected to the main body portion 42, and the other end of the arm portion 41 is connected to the transparent conductive film 33. A point electrode 36 that connects the transparent conductive film 32 and the transparent conductive film 33 is disposed between the other end of the arm part 41 and the main body part 42. The shape of the point electrode 36 may be circular, square, or polygonal. For example, as shown in FIG. 5C, the shape of the point electrode 36 may be T-shaped. As shown in FIG. 5D, the shape of the point electrode 36 may be L-shaped.

  The electrode 35 and the point electrode 36 are made of a low resistance material such as silver paste, and the resistance value of the electrode 35 and the point electrode 36 is less than 10Ω. As described above, since the electrode 35 is made of a low resistance material such as silver paste, the voltage at the center of the main body 42 is not extremely lower than the voltage at the end of the main body 42. That is, even if a voltage drop occurs in the electrode 35, it is only a minute voltage drop that can be ignored in reality. Therefore, for example, when a voltage (for example, 5 V) for detecting the input position is applied to the electrode 35A, the voltage is uniformly applied to the entire electrode 35A.

  As shown in FIGS. 6A and 6B, an insulating layer 40 is formed on the transparent conductive film 32, and a main body 42 of the electrode 35 is formed on the insulating layer 40. Thereby, the main body 42 of the electrode 35 is insulated from the transparent conductive film 32. Thus, the electrodes 35A to 35D are arranged independently on the insulating layer 40 and are not electrically connected. Therefore, for example, current does not flow from the electrode 35A to the electrode 35B.

  Further, as shown in FIG. 6B, the arm part 41 is formed on the insulating layer 40 and the transparent conductive film 33. Accordingly, the arm portion 41 is also insulated from the transparent conductive film 32. For this reason, the voltage applied to the main body portion 42 of the electrode 35 is applied to the point electrode 16 via the arm portion 41 and the transparent conductive film 13 having a resistance value larger than the resistance value of the electrode 35. Current does not flow directly from the electrode 35 to each point electrode 36. That is, the transparent conductive film 33 electrically separated from the transparent conductive film 32 restricts the current from flowing from the electrode 35 to each point electrode 36. Further, since the transparent conductive film 33 and the transparent conductive film 32 are also insulated from each other, no current flows directly from the transparent conductive film 33 to the transparent conductive film 32 even when a voltage is applied to the electrode 35.

  A part of the point electrode 36 is electrically connected to the transparent conductive film 32. Therefore, when a voltage is applied to the electrode 35, the voltage is applied to the transparent conductive film 32 via the transparent conductive film 33 and the point electrode 36.

  In this way, a voltage is uniformly applied to the entire electrode 35 and current wraparound is prevented by the transparent conductive film 33 having a resistance value larger than the resistance value of the electrode 35. A uniform voltage is applied, the occurrence of potential distribution distortion on the detection region 38 of the transparent conductive film 32 can be avoided, and the accuracy of position detection can be improved.

  In the present embodiment, the transparent conductive film 33 is connected between the electrode 35 and the point electrode 36 to suppress variations in resistance values of paths from the electrode 35 to the respective point electrodes 36.

  For example, a configuration is conceivable in which the point electrode 36 has a resistance value larger than the resistance value of the electrode 35 and the point electrode 36 is connected to the electrode 35 through electric wiring without passing through the transparent conductive film. In this case, variation in resistance value is likely to occur due to the electrical wiring material (silver paste) used for connection between the point electrode 36 and the electrode 35 and the length of the electrical wiring. As a result, a uniform voltage is not applied to each point electrode 36 and the potential distribution is likely to be distorted.

  On the other hand, ITO formed on the lower substrate 31 can be considered to have a uniform resistance distribution, and the resistance value of the transparent conductive film 33 can be relatively easily set to a desired value. Can be suppressed. In the present embodiment, since the transparent conductive film 33 having less variation in resistance value than the electric wiring is used as the wiring between the point electrode 36 and the electrode 35, a uniform voltage is applied to each point electrode 36, and the transparent electrode 33 is transparent. Generation of distortion of the potential distribution on the conductive film 32 can be avoided.

  FIG. 7 is a flowchart showing a manufacturing method of the structure on the lower substrate side of the touch panel 10A of FIG.

  First, the transparent conductive film 32 is formed on the lower substrate 31 by sputtering or vacuum deposition (step S11). Next, a photoresist is formed on the transparent conductive film 32, the pattern on the photomask is transferred to the photoresist (exposure), and a resist pattern 44 is formed on the transparent conductive film 32 (step S12). Thereafter, a part of the transparent conductive film 32 (that is, a part not masked by the resist pattern 44) is removed by laser etching (step S13). At this time, a transparent conductive film 33 that is electrically separated from the transparent conductive film 32 is formed. Next, the resist pattern 44 is removed (step S14).

  Next, the insulating layer 40 is formed on part of the transparent conductive film 32 and the transparent conductive film 33 (step S15). At this time, as shown in the right figure of step S15, the insulating layer 40 is placed on the transparent conductive film 32 and the transparent conductive film 33 so that a part of the insulating layer 40 straddles the gap 34 (only the gap 34 on the right side in the drawing). It is formed.

  Next, the body portion 42 of the electrode 35 is formed on the insulating layer 40 by screen printing, and the arm portion 41 of the electrode 35 is formed on the insulating layer 40 and the transparent conductive film 33 by screen printing. A point electrode 36 is formed on each of the transparent conductive film 32 and a part of the transparent conductive film 33 so that the film 33 is conductive (step S16). Finally, the insulating layer 43 is formed on the exposed portions of the transparent conductive film 32, the transparent conductive film 33, the electrode 35, the point electrode 36, and the insulating layer 40 (step S17), and this process is finished. Through the above steps, the structure on the lower substrate side of the touch panel 10A in FIG. 5A is formed.

  As described above, according to the second embodiment, the electrodes 35A to 35D are each made of a low-resistance material and are electrically arranged independently. A voltage is applied to prevent current from flowing from one electrode to another (for example, electrode 35A to electrode 35B). In addition, since the electrode 35 is connected to each point electrode 36 via the transparent conductive film 33 having a resistance value larger than the resistance value of the electrode 35, current flowing from the electrode 35 to each point electrode 36 is transparent. This is prevented by the conductive film 33. Therefore, a uniform voltage is applied to each point electrode 36, the occurrence of distortion of the potential distribution on the detection region 38 of the transparent conductive film 32 can be avoided, and the accuracy of position detection can be improved.

  The present invention is not limited to the above-described embodiment, and can be implemented with various modifications within a range not departing from the gist thereof.

10, 10A Touch panel 11, 31 Lower substrate 12, 13, 32, 33 Transparent conductive film 14, 34 Gap 15, 35 Electrode 16, 36 Point electrode 17, 40, 43 Insulating layer 41 Arm 42 Main body

Claims (5)

A substrate,
A first conductive film including a detection region for detecting an input position in a part of the first conductive film;
A first electrode for voltage supply extending in parallel with the four sides of the detection region for detecting the input position;
A second conductive film formed on the substrate, electrically connected to the first electrode and electrically separated from the first conductive film;
A second electrode for conducting the first conductive film and the second conductive film;
The touch panel, wherein the first electrode and the second electrode have lower resistance values than the resistance values of the first conductive film and the second conductive film.   The first electrode is disposed on the substrate and the second conductive film, and the second electrode is disposed on the first conductive film and the second conductive film. Touch panel as described in 1.   The said 1st electrode, the said 2nd electrically conductive film, the said 2nd electrode, and the said 1st electrically conductive film are arrange | positioned in this order toward the center from the outer edge of the said touch panel. The touch panel described. An insulating layer is formed between the first conductive film and the first electrode;
The first electrode includes a main body part and an arm part extending from the main body part to the outer edge side of the touch panel,
The touch panel according to claim 1, wherein one end of the arm portion is electrically connected to the main body portion, and the other end of the arm portion is electrically connected to the second conductive film. .   5. The touch panel according to claim 1, wherein the first conductive film and the second conductive film are made of ITO (Indium Tin Oxide), and the second conductive film is formed by etching ITO. .

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