JP2011049210A - Method for transferring thin-film element group - Google Patents

Method for transferring thin-film element group Download PDF

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JP2011049210A
JP2011049210A JP2009194094A JP2009194094A JP2011049210A JP 2011049210 A JP2011049210 A JP 2011049210A JP 2009194094 A JP2009194094 A JP 2009194094A JP 2009194094 A JP2009194094 A JP 2009194094A JP 2011049210 A JP2011049210 A JP 2011049210A
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substrate
water
transfer destination
manufacturer
adhesive
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Mitsutoshi Miyasaka
光敏 宮坂
Naoki Kimura
尚己 木村
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Seiko Epson Corp
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Seiko Epson Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for transferring a thin-film element group 110 wherein the manufacturer's original substrate 100 can be protected against breaking when the thin-film element group is transferred from the manufacturer's original substrate 100 to a transfer destination substrate 200. <P>SOLUTION: The method for transferring a thin-film element group includes a surface treatment process where either the periphery 130 of the manufacturer's original substrate 100 on which the thin film element group 110 is formed or the periphery 230 of the transfer destination substrate 200 is subjected to water-repellent treatment, an adhesive coating process where the surface of either the manufacturer's original substrate 100 or the transfer destination substrate 200 is coated with a water-soluble adhesive 150, a substrate arrangement process where the surfaces of the manufacturer's original substrate 100 and the transfer destination substrate 200 are stuck while facing each other, an adhesive curing process, and a substrate peeling process where the thin-film element group 110 is transfer destination to the transfer destination substrate 200 by peeling the manufacturer's original substrate 100 from the transfer destination substrate 200. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は薄膜素子群の転写方法に関し、取り分け薄膜素子群をそれらが製造された製造元基板から別の転写先基板へと転写する事に依り、薄膜素子群から成る回路基板を製造する方法に関する。   The present invention relates to a method for transferring a thin film element group, and more particularly to a method for manufacturing a circuit board including a thin film element group by transferring the thin film element group from a manufacturer substrate on which the thin film element group is manufactured to another transfer destination substrate.

電気泳動表示装置(EPD)や液晶表示装置(LCD)、電子発光(エレクトロルミネッセンス:EL)表示装置の様な薄膜半導体装置が用いられる半導体回路は、電子装置の落下等の衝撃に依る破損防止や柔軟性の向上、或いは軽量化の目的で、プラスチック基板等に形成される場合がある。プラスチック等を基板として使用する薄膜回路基板は、ガラス基板から成る製造元基板上に薄膜素子群である薄膜半導体回路(TFT回路)を形成し、この薄膜素子群を転写先基板であるプラスチック基板等へ転写する方法が用いられる。   Semiconductor circuits using thin-film semiconductor devices such as electrophoretic display devices (EPD), liquid crystal display devices (LCD), and electroluminescent (EL) display devices can prevent damage due to impact such as dropping of electronic devices. In order to improve flexibility or reduce weight, it may be formed on a plastic substrate or the like. A thin film circuit board using plastic or the like as a substrate forms a thin film semiconductor circuit (TFT circuit) as a thin film element group on a manufacturer substrate made of a glass substrate, and the thin film element group is transferred to a plastic substrate or the like as a transfer destination substrate. A transfer method is used.

従来は斯うした回路基板を製造する際に、薄膜素子群が形成された製造元基板と転写先基板との間に接着剤を充填して硬化接着させ、その後、製造元基板から転写先基板へと薄膜素子群を転写して居た。当該方法は特許文献1(特開2001−51296号公報)や特許文献2(特開2004−327836号公報)等に記載されて居る。   Conventionally, when manufacturing such a circuit board, an adhesive is filled between the manufacturer substrate on which the thin film element group is formed and the transfer destination substrate to cure and bond, and then from the manufacturer substrate to the transfer destination substrate. The thin film element group was transferred. The said method is described in patent document 1 (Unexamined-Japanese-Patent No. 2001-51296), patent document 2 (Unexamined-Japanese-Patent No. 2004-327836), etc.

特開2001−51296号公報JP 2001-51296 A 特開2004−327836号公報JP 2004-327836 A

しかしながら従来の方法では、製造元基板から転写先基板を剥離して薄膜素子群を転写先基板に転写する際に、製造元基板乃至は転写先基板が割れて、薄膜素子群を転写先基板に転写出来ない不良が頻発していた。   However, in the conventional method, when the transfer destination substrate is peeled from the manufacturer substrate and the thin film element group is transferred to the transfer destination substrate, the manufacturer substrate or the transfer destination substrate is cracked, and the thin film element group can be transferred to the transfer destination substrate. There were no failures frequently.

其処で本発明は上述の課題を鑑み、その目的の一つは、薄膜素子群を製造元基板から転写先基板に転写する際に、製造元基板乃至は転写先基板が割れる不良を低減する薄膜素子群の転写方法を提供する事にある。   Therefore, in view of the above-described problems, one of the objects of the present invention is to reduce a defect in which the manufacturer substrate or the transfer destination substrate is broken when the thin film element group is transferred from the manufacturer substrate to the transfer destination substrate. Is to provide a transfer method.

斯かる課題を解決する為に、本発明の一態様としての薄膜素子群の転写方法は、製造元基板表面に形成された薄膜素子群を転写先基板表面に転写する薄膜素子群の転写方法に於いて、製造元基板の周辺部及び転写先基板の周辺部の少なくとも一方に撥水処理を行って撥水領域を作成する表面処理工程と、前記製造元基板表面及び前記転写先基板表面の少なくとも一方に水溶性接着剤を塗布する接着剤塗布工程と、前記製造元基板表面と前記転写先基板表面とを前記水溶性接着剤を介して対向させて配置する基板配置工程と、前記水溶性接着剤を硬化させる接着剤硬化工程と、前記製造元基板を前記転写先基板から剥離させる事に依って前記薄膜素子群を前記転写先基板に転写する基板剥離工程と、を有する事を特徴とする。   In order to solve such a problem, a thin film element group transfer method according to one aspect of the present invention is a thin film element group transfer method in which a thin film element group formed on a manufacturer substrate surface is transferred to a transfer destination substrate surface. A surface treatment step of creating a water-repellent region by performing water-repellent treatment on at least one of the peripheral part of the manufacturer's substrate and the peripheral part of the transfer-destination substrate; and at least one of the surface of the manufacturer's substrate and the surface of the transfer-destination substrate An adhesive application step of applying a water-soluble adhesive, a substrate placement step of arranging the manufacturer substrate surface and the transfer destination substrate surface to face each other with the water-soluble adhesive therebetween, and curing the water-soluble adhesive An adhesive curing step; and a substrate peeling step of transferring the thin film element group to the transfer destination substrate by peeling the manufacturer substrate from the transfer destination substrate.

従来の薄膜素子群の転写方法では、製造元基板から転写先基板へと薄膜素子群を転写する際に、接着剤を製造元基板のほぼ全面に塗布した後に接着剤を硬化させて製造元基板と転写先基板とを接着させ、次いで製造元基板と転写先基板とを剥離する方法が用いられて居た。しかしながら本願発明者らが調査した所、上記従来の方法では、製造元基板と転写先基板との間に充填された接着剤が製造元基板の剥離可能領域外をも転写先基板と接着し、更には余分な接着剤が製造元基板の端面(エッジ部)と転写先基板の端面(エッジ部)を覆って硬化して居た。製造元基板の端面と転写先基板の端面とを覆った状態や剥離可能領域外で接着剤が硬化すると、製造元基板が転写先基板から剥離しにくくなる。その結果、剥離時に製造元基板乃至は転写先基板に意図せぬ余分な力が加わって、基板が割れる不良を誘発する事が判明した。   In a conventional thin film element group transfer method, when transferring a thin film element group from a manufacturer substrate to a transfer destination substrate, an adhesive is applied to almost the entire surface of the manufacturer substrate, and then the adhesive is cured to transfer the manufacturer substrate and the transfer destination substrate. A method has been used in which the substrate is bonded, and then the manufacturer substrate and the transfer destination substrate are peeled off. However, as a result of investigation by the inventors of the present application, in the above-described conventional method, the adhesive filled between the manufacturer substrate and the transfer destination substrate adheres to the transfer destination substrate even outside the peelable region of the manufacturer substrate. Excess adhesive was cured covering the end surface (edge portion) of the manufacturer's substrate and the end surface (edge portion) of the transfer destination substrate. When the adhesive is cured in a state where the end face of the manufacturer's substrate and the end face of the transfer destination substrate are covered or outside the peelable region, the manufacturer's substrate becomes difficult to peel from the transfer destination substrate. As a result, it has been found that an unintended extra force is applied to the manufacturer substrate or the transfer destination substrate at the time of peeling, thereby inducing a defect that the substrate breaks.

これに対し、上記本発明の一形態の方法に依れば、製造元基板の端面周辺部及び転写先基板の端面周辺部の少なくとも一方に撥水領域を設ける事で、当該部分に水溶性接着剤が付着しづらくなる。これに依って、仮令水溶性接着剤が余ったり、漏れたりしても、製造元基板の端面及びその周辺部と転写先基板の端面及びその周辺部とは接着しなくなる。或いは接着力がその部位では著しく弱くなる。その為に製造元基板を転写先基板から剥離する際に、製造元基板乃至は転写先基板が割れる不良を著しく低減させることが出来る。   On the other hand, according to the method of one aspect of the present invention, by providing a water-repellent region in at least one of the peripheral portion of the end surface of the manufacturer substrate and the peripheral portion of the end surface of the transfer destination substrate, the water-soluble adhesive is applied to the portion. Is difficult to adhere. As a result, even if the temporary water-soluble adhesive remains or leaks, the end surface of the manufacturer's substrate and its peripheral portion and the end surface of the transfer destination substrate and its peripheral portion will not adhere. Alternatively, the adhesive strength is significantly weakened at the site. Therefore, when the manufacturer substrate is peeled off from the transfer destination substrate, it is possible to remarkably reduce a defect that the manufacturer substrate or the transfer destination substrate breaks.

接着剤塗布工程では、前記製造元基板と前記転写先基板とで面積の小さい方の基板表面に水溶性接着剤を塗布し、前記基板配置工程では、平面視に於いて、前記面積の小さい方の基板全面を覆い重ねる様に面積の大きい方の基板を配置する事を特徴とする。   In the adhesive application step, a water-soluble adhesive is applied to the surface of the smaller substrate between the manufacturer substrate and the transfer destination substrate, and in the substrate arrangement step, the smaller area in the plan view. The substrate having the larger area is arranged so as to cover the entire surface of the substrate.

水溶性接着剤を塗布する際には小さい方の基板に接着剤を塗布し、上から大きい方の基板を覆い重ねるので、製造元基板と転写先基板とを貼り合わせる際に、万が一此等の間から水溶性接着剤が漏れ出ても、漏れ出た水溶性接着剤が上方に位置する大きい方の基板端部や裏面に回り込んで接着する不良を防止することが出来る。   When applying a water-soluble adhesive, the adhesive is applied to the smaller substrate and the larger substrate is covered from the top. Therefore, when the manufacturer substrate and the transfer destination substrate are bonded together, Even if the water-soluble adhesive leaks from the substrate, it is possible to prevent the leaked water-soluble adhesive from adhering to the edge or the back surface of the larger substrate positioned above.

又、接着剤塗布工程前に前記面積の小さい方の基板表面に囲い込み手段を形成する囲み手段形成工程を有し、前記囲い込み手段は前記基板配置工程時に前記撥水領域の内側で、且つ前記薄膜素子群を囲む様に形成され、前記接着剤塗布工程では前記囲い込み手段の内側に前記水溶性接着剤を塗布する事を特徴とする。   Further, it has an enclosing means forming step for forming enclosing means on the surface of the substrate having the smaller area before the adhesive coating step, and the enclosing means is inside the water-repellent region at the time of the substrate placing process and the thin film. It is formed so as to surround the element group, and the water-soluble adhesive is applied to the inside of the enclosing means in the adhesive application step.

斯かる方法に依れば、製造元基板表面及び転写先基板表面の少なくとも一方に水溶性接着剤を塗布する接着剤塗布工程に於いて、水溶性接着剤が製造元基板と転写先基板との間から漏れ出る不良を低減出来る。   According to such a method, in the adhesive application step of applying the water-soluble adhesive to at least one of the manufacturer substrate surface and the transfer destination substrate surface, the water-soluble adhesive is removed from between the manufacturer substrate and the transfer destination substrate. Leakage defects can be reduced.

又、囲い込み手段は粘度が5000cps以上且つ50000cps以下の囲み用接着剤で形成される事を特徴とする。   Further, the enclosing means is characterized by being formed of an enclosing adhesive having a viscosity of 5000 cps or more and 50000 cps or less.

水溶性接着剤が漏れにくい囲い込み手段の高さは10μmから100μmで有るが、粘度が5000cps以上の接着剤を用いると、簡単にこの高さの囲い込み手段を作成できる。一方で粘度が50000cps以下の接着剤を用いると、市販のディスペンス装置(ディスペンサー)を用いて容易に囲み手段が形成される。囲い込み手段に用いられる囲み用接着剤は、水溶性接着剤と相溶しない物とするのが好ましい。水溶性接着剤が囲い込み手段を為す囲み用接着剤と相溶しなければ、基板配置工程時に囲み手段が破壊されて水溶性接着剤が漏れ出る事故の発生確率が低くなるからである。   The height of the enclosing means for preventing the water-soluble adhesive from leaking is 10 μm to 100 μm, but if an adhesive having a viscosity of 5000 cps or more is used, the enclosing means having this height can be easily created. On the other hand, when an adhesive having a viscosity of 50000 cps or less is used, a surrounding means is easily formed using a commercially available dispensing device (dispenser). It is preferable that the enclosing adhesive used for the enclosing means is incompatible with the water-soluble adhesive. This is because if the water-soluble adhesive is not compatible with the enclosing adhesive that forms the enclosing means, the probability of an accident in which the enclosing means is destroyed and the water-soluble adhesive leaks during the substrate placement process is reduced.

更に囲み手段と撥水領域とは1mm以上且つ5mm以下の距離を以て離れ、撥水領域よりも内側に囲い込み手段を形成する事が好ましい。通常囲い込み手段は幅0.5mm程度から1.0mm程度にディスペンス装置等の印刷機にて描かれる。囲い込み手段が幅xmmで撥水領域からymm離れた位置に形成されるとは、撥水領域から囲い込み手段迄の最短距離がymmで、撥水領域から囲い込み手段の中心線迄の平均距離が(x/2+y)mmと云う意味である。通常、基板配置工程時に囲い込み手段は圧迫されてその幅を2mmから3mmへ広げる。この際に当初最も太い幅1.0mmの囲い込み手段が最も広がって3mmの幅を有する様になった場合でも、囲い込み手段が撥水領域から1mm以上離されて形成されて居れば、それが撥水領域にまでは広がらない。即ち、接着剤で形成された囲い込み手段が撥水処理された周辺部まで広がって溢れ出る不良を低減する。反対に、圧迫されて広がった後の囲い込み手段外側領域は全く接着されないので、転写されない領域となる。この領域は薄膜電子回路に使用出来ないので出来る限り狭い事が生産性を高める観点から望まれる。囲い込み手段が圧迫されて広がった後にその線幅の変動や中心線位置の変動を考慮に入れると、当初撥水領域から5mm以下に離して囲い込み手段を形成しておけば、転写されない未使用領域を1mmから2mmとの僅かに出来て、生産性が向上する。   Further, it is preferable that the enclosing means and the water repellent area are separated by a distance of 1 mm or more and 5 mm or less, and the enclosing means is formed inside the water repellent area. Usually, the enclosing means is drawn by a printing machine such as a dispensing device with a width of about 0.5 mm to about 1.0 mm. The enclosing means is formed with a width xmm and a position ymm away from the water repellent area. The shortest distance from the water repellent area to the enclosing means is ymm, and the average distance from the water repellent area to the center line of the enclosing means is ( x / 2 + y) mm. Usually, the enclosure means is pressed during the substrate placement process to increase its width from 2 mm to 3 mm. At this time, even when the enclosing means having the thickest width of 1.0 mm is widest and has a width of 3 mm, if the enclosing means is formed 1 mm or more away from the water-repellent region, it will be repelled. It does not spread to the water area. That is, it is possible to reduce a defect that the enclosing means formed of the adhesive spreads to the peripheral portion subjected to the water repellent treatment and overflows. On the other hand, the area outside the enclosure means after being compressed and expanded is not bonded at all, so that the area is not transferred. Since this region cannot be used for a thin film electronic circuit, it is desirable from the viewpoint of increasing productivity to be as narrow as possible. Taking into account fluctuations in the line width and center line position after the enclosing means are compressed and spread, if the enclosing means is formed at a distance of 5 mm or less from the initial water-repellent area, the unused area that is not transferred Can be made as small as 1 mm to 2 mm, and productivity is improved.

又、囲み用接着剤が粘着剤、シール剤、又は水溶性接着剤である事を特徴とする。   The enclosing adhesive is a pressure-sensitive adhesive, a sealant, or a water-soluble adhesive.

又、基板配置工程の前に、前記面積の小さい方の基板よりも更に小さい面積の設置面を有するステージ上に前記面積の小さい方の基板を設置する基板設置工程を有する事を特徴とする。   Further, before the substrate placement step, there is a substrate installation step in which the substrate having the smaller area is installed on a stage having an installation surface having a smaller area than the substrate having the smaller area.

本願では製造元基板と転写先基板とを比較して小さい方の基板を下にし、これに水溶性接着剤を塗布する。次いで大きい方の基板を上から覆い被せる。この作業を行うステージが面積の小さい方の基板よりも更に小さければ、仮令製造元基板と転写先基板との間から水溶性接着剤が漏れ出ても、漏れ出た水溶性接着剤はステージの設置面に留まる事なく、それ故に製造元基板と転写先基板とが両基板端面部で接着する不良を防ぐ。   In the present application, the manufacturer substrate and the transfer destination substrate are compared with the smaller substrate facing down, and a water-soluble adhesive is applied thereto. Next, the larger substrate is covered from above. If the stage on which this work is performed is even smaller than the substrate with the smaller area, even if the water-soluble adhesive leaks from between the temporary manufacturer substrate and the transfer destination substrate, the leaked water-soluble adhesive will be installed on the stage. Therefore, it is possible to prevent a defect that the manufacturer substrate and the transfer destination substrate are bonded at the end surface portions of the both substrates without staying on the surface.

又、前記水溶性接着剤は、粘度が1cps以上且つ50cps以下である事が好ましい。   The water-soluble adhesive preferably has a viscosity of 1 cps or more and 50 cps or less.

斯かる方法に依れば、製造元基板上の囲み手段の内側領域にて水溶性接着剤が十分に広がるので、水溶性接着剤が存在しない箇所(水溶性接着剤がない気泡など)を最少と出来、転写不良を最少とする。言う迄も無く、水溶性接着剤が存在しない箇所は接着されないので転写不良となる。   According to such a method, since the water-soluble adhesive spreads sufficiently in the inner region of the surrounding means on the manufacturer's substrate, the location where there is no water-soluble adhesive (such as bubbles without water-soluble adhesive) is minimized. And minimize transfer defects. Needless to say, a portion where no water-soluble adhesive is present is not bonded, resulting in transfer failure.

又、前記基板剥離工程の後に、前記薄膜素子群が転写された前記転写先基板表面と第二転写先基板表面とを対向させて、第二の接着剤を介在させて貼り合わせる第二接着工程と、前記転写先基板を前記第二転写先基板から剥離させる事に依って、前記薄膜素子群を前記第二転写先基板に転写する第二転写工程と、前記水溶性接着剤を除去する接着剤除去工程と、を有する事を特徴とする。   Also, after the substrate peeling step, a second bonding step in which the transfer destination substrate surface onto which the thin film element group has been transferred and the second transfer destination substrate surface are opposed to each other and a second adhesive is interposed therebetween. And a second transfer step of transferring the thin film element group to the second transfer destination substrate by peeling the transfer destination substrate from the second transfer destination substrate, and an adhesive for removing the water-soluble adhesive. And an agent removing step.

斯かる方法に依れば、二度の転写を行う事で薄膜素子群を製造元基板から第二転写先基板に転写する事が可能となる。   According to such a method, it is possible to transfer the thin film element group from the manufacturer substrate to the second transfer destination substrate by performing the transfer twice.

又、前記表面処理工程に於いて、前記薄膜素子群が形成された前記製造元基板の周辺部と前記転写先基板の周辺部の双方に撥水処理を行う事が好ましい。   In the surface treatment step, it is preferable to perform water repellent treatment on both the peripheral portion of the manufacturer substrate on which the thin film element group is formed and the peripheral portion of the transfer destination substrate.

斯かる方法に依れば、両基板の周辺部に撥水領域が形成されるので、仮令水溶性接着剤が撥水領域に漏れ溢れても撥水処理領域同士が接着される不良が著しく減少し、その結果、製造元基板を転写先基板から剥離する際に製造元基板乃至は転写先基板が割れる不具合をより効果的に防止する。   According to such a method, a water-repellent region is formed in the peripheral portion of both substrates, so that even if the temporary water-soluble adhesive leaks into the water-repellent region, the defect that the water-repellent regions are bonded to each other is remarkably reduced. As a result, when the manufacturer substrate is peeled off from the transfer destination substrate, a problem that the manufacturer substrate or the transfer destination substrate breaks is more effectively prevented.

又、前記表面処理工程が、前記製造元基板表面乃至は前記転写先基板表面に形成された前記撥水領域の外側に親水処理を施して親水領域を作成する工程を含む事を特徴とする。   Further, the surface treatment step includes a step of creating a hydrophilic region by performing a hydrophilic treatment on the outside of the water-repellent region formed on the surface of the manufacturer substrate or the surface of the transfer destination substrate.

斯かる方法に依れば、撥水処理領域以外を親水領域とするので水溶性接着剤は製造元基板と転写先基板とで、周辺部を除き、良く濡れ広がり強固な接着を為すと共に水溶性接着剤の無い箇所を最少とするので、転写不良は著しく削減される。転写不良は水溶性接着剤が無かったり、或いは水溶性接着剤の接着力が弱い場合に発生するので、水溶性接着剤が濡れ広がる程、転写不良は減少する。   According to such a method, water-soluble adhesives are wet and spread well at the manufacturer's substrate and the transfer-destination substrate, except for the peripheral portion, so that the water-soluble adhesive and the water-repellent treatment region are formed except for the water-repellent treatment region. Since the number of places where no agent is present is minimized, transfer defects are significantly reduced. The transfer failure occurs when there is no water-soluble adhesive or when the adhesive strength of the water-soluble adhesive is weak. Therefore, the transfer failure decreases as the water-soluble adhesive spreads.

又、前記撥水領域は前記製造元基板乃至は前記転写先基板の端面から1mm以上且つ10mm以下の範囲である事を特徴とする。   Further, the water repellent region is in a range of 1 mm or more and 10 mm or less from an end face of the manufacturer substrate or the transfer destination substrate.

斯かる方法に依れば、製造元基板上の薄膜素子群を形成可能な面積を大きくしながら、撥水処理の効果を得る事が可能となる。   According to such a method, it is possible to obtain a water repellent effect while increasing the area where the thin film element group on the manufacturer substrate can be formed.

又、前記表面処理工程で行われる撥水処理として、フッ素プラズマ処理を行う事を特徴とする。   Further, as the water repellent treatment performed in the surface treatment step, fluorine plasma treatment is performed.

又、前記表面処理工程で行われる撥水処理として、油脂の塗布を行う事を特徴とする。   In addition, as a water repellent treatment performed in the surface treatment step, an oil is applied.

撥水処理を施す前の製造元基板を示す図。The figure which shows the manufacturer board | substrate before performing a water repellent process. 撥水処理を施す前の転写先基板を示す図。The figure which shows the transcription | transfer destination board | substrate before performing a water repellent process. 撥水処理を施した製造元基板を示す図。The figure which shows the manufacturer board | substrate which performed the water repellent process. 撥水処理を施した転写先基板を示す図。The figure which shows the transfer destination board | substrate which performed the water repellent process. 囲み手段を形成された製造元基板を示す図。The figure which shows the manufacturer board | substrate with which the surrounding means was formed. 囲み手段の内側に水溶性接着剤を塗布した状態の製造元基板を示す図。The figure which shows the manufacturer board | substrate of the state which apply | coated the water-soluble adhesive inside the surrounding means. 製造元基板と転写先基板とを貼り合わせた状態を示す図。The figure which shows the state which bonded the manufacturer board | substrate and the transfer destination board | substrate. 製造元基板と転写先基板とに紫外線を照射し水溶性接着剤を硬化させる工程を示す図。The figure which shows the process of irradiating a manufacture board | substrate and a transfer destination board | substrate with an ultraviolet-ray, and hardening a water-soluble adhesive. 製造元基板と転写先基板とを剥離させる工程を示す図。The figure which shows the process of peeling a manufacture board | substrate and a transfer destination board | substrate. 転写先基板と第二転写先基板とを貼り合わせた状態を示す図。The figure which shows the state which bonded together the transfer destination board | substrate and the 2nd transfer destination board | substrate. 転写先基板と第二転写先基板とを剥離した状態を示す図。The figure which shows the state which peeled the transfer destination board | substrate and the 2nd transfer destination board | substrate. 第二転写先基板上の水溶性接着剤及び囲み手段を除去した状態を示す図。The figure which shows the state which removed the water-soluble adhesive and surrounding means on a 2nd transfer destination board | substrate. 本実施形態の一作用を示す第1の図。The 1st figure which shows one effect | action of this embodiment. 本実施形態の一作用を示す第2の図。The 2nd figure which shows one effect | action of this embodiment. 本実施形態の一作用を示す第3の図。The 3rd figure which shows one effect | action of this embodiment. 本実施形態の一作用を示す第4の図。The 4th figure which shows one effect | action of this embodiment.

本発明に係る実施形態を、以下の構成に従って、図面を参照しながら具体的に説明する。但し、以下の実施形態はあくまで本発明の一例に過ぎず、本発明の技術的範囲を限定するものではない。尚、各図面に於いて、同一の部品には同一の符号を付しており、その説明を省略する場合がある。
1.定義
2.実施形態
(1)表面処理工程(撥水処理及び親水処理)
(2)囲い込み手段形成工程(囲み手段の形成)
(3)接着剤塗布工程(水溶性接着剤の塗布)
(4)基板設置工程並びに基板配置工程(製造元基板と転写先基板との貼り合わせ)
(5)接着剤硬化工程(水溶性接着剤の硬化)
(6)基板剥離工程(製造元基板と転写先基板との剥離)
(7)第二接着工程(転写先基板と第二転写先基板との貼り合わせ)
(8)第二転写工程(転写先基板と第二転写先基板との剥離)
(9)接着剤除去工程(水溶性接着剤の除去)
3.まとめ
4.補足
An embodiment according to the present invention will be specifically described with reference to the drawings according to the following configuration. However, the following embodiments are merely examples of the present invention, and do not limit the technical scope of the present invention. In addition, in each drawing, the same code | symbol is attached | subjected to the same component and the description may be abbreviate | omitted.
1. Definition 2. Embodiment (1) Surface treatment process (water repellent treatment and hydrophilic treatment)
(2) Enclosing means forming step (formation of enclosing means)
(3) Adhesive application process (application of water-soluble adhesive)
(4) Substrate installation step and substrate placement step (bonding of the manufacturer substrate and the transfer destination substrate)
(5) Adhesive curing process (curing of water-soluble adhesive)
(6) Substrate peeling step (peeling between the manufacturer's substrate and the transfer destination substrate)
(7) Second bonding step (bonding of transfer destination substrate and second transfer destination substrate)
(8) Second transfer step (peeling of the transfer destination substrate and the second transfer destination substrate)
(9) Adhesive removal step (removal of water-soluble adhesive)
3. Summary 4. Supplement

<1.定義>
まず、本明細書に於ける用語を以下の通り定義する。
<1. Definition>
First, terms used in this specification are defined as follows.

「塗布」:「塗布」するとは、所定の物質に塗る事のみならず、所定の物質上の所定の領域に供給し、又は所定の物質と物質との間に介在させたり充填したりする事を含む。
「製造元基板表面」:製造元基板の面の内で、転写先基板に転写する薄膜素子群が形成された面を指す。
「転写先基板表面」:転写先基板の面の内で、製造元基板から薄膜素子群が転写される面を指す。
“Apply”: “Apply” means not only to apply to a predetermined substance, but also to supply to a predetermined area on a predetermined substance, or to interpose or fill between a predetermined substance and a substance. including.
“Manufacturer substrate surface”: refers to the surface of the manufacturer substrate on which a thin film element group to be transferred to the transfer destination substrate is formed.
“Transfer destination substrate surface”: refers to the surface of the transfer destination substrate on which the thin film element group is transferred from the manufacturer substrate.

<2.実施形態>
本発明の一形態である本実施形態は、薄膜素子群の転写方法に関し、取り分け製造元基板表面に形成された薄膜素子群を転写先基板へと転写する事に依り回路基板を製造する方法に関する。中でも特徴的な工程の一つは、製造元基板と転写先基板との周辺部に対して撥水処理を施す工程である。以下では、当該工程を含む薄膜素子群の転写方法について工程毎に説明する。
<2. Embodiment>
The present embodiment, which is an aspect of the present invention, relates to a method for transferring a thin film element group, and more particularly, to a method for manufacturing a circuit board by transferring a thin film element group formed on the surface of a manufacturer substrate to a transfer destination substrate. Among them, one of the characteristic processes is a process of performing water repellent treatment on the peripheral part of the manufacturer substrate and the transfer destination substrate. Below, the transfer method of the thin film element group including the said process is demonstrated for every process.

<(1)表面処理工程(撥水処理及び親水処理)>
まず、図1乃至図4を参照しながら、製造元基板及び転写先基板に対して行う撥水処理及び親水処理の工程について説明する。此処では撥水処理と親水処理の両者を行う例を示すが、接着剤塗布工程時に水溶性接着剤が十分に基板表面に濡れ広がれば必ずしも親水処理を行う必要はない。要するに表面処理工程で撥水処理は必須であるが、親水処理は任意である。又、以下では親水処理を施した後に撥水処理を施す例を示すが、無論反対に撥水処理を施した後に親水処理を施しても良い。更に以下の例では製造元基板と転写先基板の双方に対して表面処理を施すが、表面処理工程はどちらか一方の基板だけに施してもその効果は認められる。
<(1) Surface treatment process (water repellent treatment and hydrophilic treatment)>
First, the steps of water repellent treatment and hydrophilic treatment performed on the manufacturer substrate and the transfer destination substrate will be described with reference to FIGS. Here, an example in which both the water repellent treatment and the hydrophilic treatment are performed is shown. However, if the water-soluble adhesive is sufficiently wetted and spreads on the substrate surface during the adhesive application step, the hydrophilic treatment is not necessarily performed. In short, water repellent treatment is essential in the surface treatment step, but hydrophilic treatment is optional. In the following, an example in which the water repellent treatment is performed after the hydrophilic treatment is performed is shown. However, on the contrary, the water repellent treatment may be performed and then the hydrophilic treatment may be performed. Furthermore, in the following example, surface treatment is performed on both the manufacturer substrate and the transfer destination substrate, but the effect is recognized even if the surface treatment step is performed only on one of the substrates.

図1は撥水処理等の表面処理を施す前の製造元基板100を示す図である。図1に於いて上図が製造元基板100を表面(上方)から見た平面図、下図が平面図のa1−a2に於ける断面図である。図1に示す様に、製造元基板100上には薄膜素子群110が形成されており、製造元基板100と薄膜素子群110との間には剥離層120が形成されて居る。製造元基板100はガラス等からなる。薄膜素子群110は複数の薄膜トランジスタ(TFT)や薄膜ダイオード、薄膜抵抗や薄膜コンデンサなどから成る半導体回路である。剥離層120は所定のエネルギー付与に依って剥離する特性を有する材料から形成されて居る。剥離する特性とは、一定の強度の光やエネルギーを提供する事に依り、剥離層120を構成する材料の原子間又は分子間の結合力が消失ししたり、或いは剥離層と薄膜素子群との界面乃至は剥離層と製造元基板との界面での密着力が低下したり、剥離層自体がアブレーション(ablation)を生じたりした結果、剥離を引き起こす性質である。剥離層120の組成としては、例えばアモルファス(非晶質)シリコン(a−Si)等が用いられる。   FIG. 1 is a view showing a manufacturer substrate 100 before a surface treatment such as a water repellent treatment. In FIG. 1, the upper diagram is a plan view of the manufacturer's substrate 100 as viewed from the surface (above), and the lower diagram is a cross-sectional view taken along a1-a2 of the plan view. As shown in FIG. 1, a thin film element group 110 is formed on a manufacturer substrate 100, and a release layer 120 is formed between the manufacturer substrate 100 and the thin film element group 110. The manufacturer substrate 100 is made of glass or the like. The thin film element group 110 is a semiconductor circuit including a plurality of thin film transistors (TFTs), thin film diodes, thin film resistors, thin film capacitors, and the like. The release layer 120 is made of a material having a property of peeling by applying predetermined energy. The characteristic of peeling is that the bonding force between atoms or molecules of the material constituting the peeling layer 120 disappears by providing light or energy with a certain intensity, or the peeling layer and the thin film element group This is a property that causes peeling as a result of a decrease in the adhesive force at the interface or the interface between the release layer and the manufacturer's substrate, or ablation of the release layer itself. As the composition of the peeling layer 120, for example, amorphous (amorphous) silicon (a-Si) or the like is used.

図2は撥水処理等の表面処理を施す前の転写先基板200を示す図であり、上図は転写先基板表面から見た平面図、下図は平面図のb1−b2に於ける断面図である。転写先基板200と製造元基板100とは其々その面積が異なっている。どちらが大きくても構わないが、本例では転写先基板を製造元基板よりも大きくしてある。勿論反対に転写先基板が製造元基板より小さくても良い。基板が大きい小さいとは面積の大小を表すと同時に辺の長短も意味し、より具体的には大きい基板が小さい基板を包含し得る関係に有る事を意味する。製造元基板と転写先基板とを異なった大きさにすると、後の基板配置工程時に小さい方の基板を下にする事で、万が一水溶性接着剤が溢れたとしても、溢れた水溶性接着剤が上側の大きい方の基板の裏面に回り込んで両基板を接着する不良をなくせる。基板配置工程時に小さい方の基板を下にするので、本願では接着剤塗布工程時には小さい方の基板表面に水溶性接着剤を塗布し、その後に大きい方の基板を上から小さい方の基板を包含する形で配置する。先に述べた通り、製造元基板と転写先基板とでどちらを大きくしても構わない。製造元基板を転写先基板よりも小さくすると、製造元基板を下にし、これに水溶性接着剤を塗布した後により大きい転写先基板を乗せる事になる。製造元基板には剥離層が設けられて居るので紫外光は透過しない。これに対して転写先基板には紫外光透過性の基板を使用出来るので、紫外光透過性の転写先基板が上に来ると、後の接着剤硬化工程にて上側から紫外光を照射出来る。斯くして水溶性接着剤を挟持する二枚の基板を反転させる必要が無くなり、上方から紫外光を照射するので、水溶性接着剤に市販されている紫外線硬化型水溶性接着剤を使用する事が可能となる。又、基板配置工程にて両基板を重ね合わせた状態でそのまま紫外光を照射するので両基板がずれたり、或いはずれた拍子に水溶性接着剤が漏れ出るとの不具合を解消できる。反対に製造元基板を転写先基板よりも大きくすると、転写先基板を下にし、これに水溶性接着剤を塗布する事になる。製造元基板表面には薄膜素子層が設けられて居て様々な材質が表面に出ているが、転写先基板は表面が均質な基板を使用出来る。斯うすると転写先基板表面は均質なので水溶性接着剤も均質に広がり、接着不良を低減する効果が現れる。   FIG. 2 is a view showing the transfer destination substrate 200 before the surface treatment such as water repellent treatment is performed. The upper view is a plan view seen from the transfer destination substrate surface, and the lower view is a cross-sectional view taken along b1-b2 of the plan view. It is. The transfer destination substrate 200 and the manufacturer substrate 100 have different areas. Whichever is larger, in this example, the transfer destination substrate is made larger than the manufacturer substrate. Needless to say, the transfer destination substrate may be smaller than the manufacturer substrate. Large and small substrates represent the size of the area and mean the length of the sides, and more specifically, the relationship that a large substrate can include a small substrate. If the manufacturer's substrate and the transfer destination substrate are made different sizes, even if the water-soluble adhesive overflows, the overflowing water-soluble adhesive will be removed by lowering the smaller substrate during the subsequent substrate placement process. It is possible to eliminate the defect of joining the two substrates by going around the back surface of the larger upper substrate. Since the smaller substrate is placed down during the substrate placement process, in this application, a water-soluble adhesive is applied to the surface of the smaller substrate during the adhesive application step, and then the larger substrate is included from the top to the smaller substrate. Arrange in the form As described above, either the manufacturer substrate or the transfer destination substrate may be enlarged. If the manufacturer's substrate is made smaller than the transfer destination substrate, the manufacturer's substrate is turned down and a larger transfer destination substrate is placed after applying a water-soluble adhesive thereto. Since the release substrate is provided on the manufacturer's substrate, it does not transmit ultraviolet light. On the other hand, since an ultraviolet light transmissive substrate can be used as the transfer destination substrate, when the ultraviolet light transmissive transfer destination substrate is on the upper side, ultraviolet light can be irradiated from the upper side in a later adhesive curing step. Thus, it is not necessary to invert the two substrates sandwiching the water-soluble adhesive, and the ultraviolet light is irradiated from above, so that a commercially available UV-curable water-soluble adhesive should be used for the water-soluble adhesive. Is possible. Further, since the ultraviolet light is irradiated as it is in the state in which both the substrates are overlapped in the substrate arranging step, it is possible to solve the problem that both the substrates are displaced or the water-soluble adhesive leaks into the displaced time signature. On the other hand, if the manufacturer substrate is made larger than the transfer destination substrate, the transfer destination substrate is turned down and a water-soluble adhesive is applied thereto. Although a thin film element layer is provided on the surface of the manufacturer's substrate and various materials are exposed on the surface, a substrate having a uniform surface can be used as the transfer destination substrate. In this case, since the surface of the transfer destination substrate is homogeneous, the water-soluble adhesive spreads uniformly, and the effect of reducing adhesion failure appears.

製造元基板100上に構成された薄膜素子群110は、転写先基板200を最終製品に組み込まれる回路基板の最終的な基板として転写する場合と、転写先基板200に仮転写した後に第二転写先基板に再度転写する場合とがある。本実施形態では、薄膜素子群110を転写先基板200に仮転写した後、第二転写先基板に再度転写する方法を例に挙げて説明する。薄膜素子群110を最終的に第二転写先基板に転写する場合、転写先基板200はいわば一時的に転写されるだけの基板であるため、必ずしも可撓性や衝撃に対する耐性が高い必要はない。一方で薄膜素子群110を最終的に転写先基板200に転写する場合、転写先基板200はその用途に合わせて可撓性を有する物であったり、衝撃に対する高い耐性を有する物であったりする。可撓性を有する転写先基板200の例としてはプラスチック基板や薄い金属基板、或いは繊維、紙、布等が挙げられる。   The thin film element group 110 configured on the manufacturer substrate 100 transfers the transfer destination substrate 200 as the final substrate of the circuit board to be incorporated into the final product, and the second transfer destination after temporary transfer to the transfer destination substrate 200. In some cases, the image is transferred again to the substrate. In the present embodiment, a method in which the thin film element group 110 is temporarily transferred to the transfer destination substrate 200 and then transferred to the second transfer destination substrate will be described as an example. When the thin film element group 110 is finally transferred to the second transfer destination substrate, the transfer destination substrate 200 is a substrate that is only temporarily transferred, so it is not always necessary to have high flexibility and resistance to impact. . On the other hand, when the thin film element group 110 is finally transferred to the transfer destination substrate 200, the transfer destination substrate 200 may be a flexible material or a material having high resistance to impact according to the application. . Examples of the transfer destination substrate 200 having flexibility include a plastic substrate, a thin metal substrate, fiber, paper, cloth, and the like.

図3は、撥水処理が施された製造元基板100を示す図であり、上図は製造元基板表面(上方)から見た平面図、下図は平面図のa1−a2に於ける断面図である。製造元基板100に対する表面処理工程は撥水処理の他に親水処理を施しても良い。基板表面で撥水処理が施されない領域が親水処理領域となる。本実施形態では、撥水処理と親水処理との双方の処理を行う方法を説明する。まず製造元基板100に於いて薄膜素子群110が形成された製造元基板表面の全面に対して親水処理を行う。親水処理は水滴接触角が40°以下になる程度に行う事が水溶性接着剤との適度な親和性を示すのに好ましく、水滴接触角が15°未満の超親水処理を行う事は、水溶性接着剤との更に良好な親和性を示すので、より好ましい。親水処理は従来から知られる様々な方法により行う事も可能であるし、以下の様な方法を用いてもよい。製造元基板100及び転写先基板200がガラスである場合、最も簡単な親水処理方法は純水洗浄で有り、製造元基板100の表面に付着した油脂成分を洗い流す。この時に石鹸等の界面活性剤を利用すると、より効果的である。又、製造元基板に形成された薄膜素子群110の表面には金属や酸化ケイ素膜、有機樹脂等様々な物質が現れる。この様な物質に対して効果的な親水処理方法は、酸素プラズマやオゾン照射と云った酸化処理である。更には酸素プラズマ中に水素を導入したり、或いは酸素プラズマ中に水蒸気を導入したり、不活性ガスプラズマ中に水蒸気を導入するなどの水プラズマ処理も効果的である。此等の親水処理に依って、基板表面に酸化膜を介して水酸基を誘起出来き、水に対する表面エネルギーを減少させると共に水溶性接着剤の接着力を増す。尚、上記の様にガラス基板を洗浄すると水滴接触角が25°程度になり、酸化処理や水プラズマ処理を行うと水滴接触角が15°未満の超親水性となる。   FIG. 3 is a view showing the manufacturer substrate 100 that has been subjected to water repellent treatment. The upper diagram is a plan view as seen from the manufacturer substrate surface (above), and the lower diagram is a cross-sectional view taken along a1-a2 of the plan view. . The surface treatment process for the manufacturer substrate 100 may be subjected to a hydrophilic treatment in addition to the water repellent treatment. A region where the water repellent treatment is not performed on the substrate surface is a hydrophilic treatment region. In the present embodiment, a method for performing both the water repellent treatment and the hydrophilic treatment will be described. First, a hydrophilic treatment is performed on the entire surface of the manufacturer substrate on which the thin film element group 110 is formed on the manufacturer substrate 100. The hydrophilic treatment is preferably performed to such an extent that the water droplet contact angle is 40 ° or less in order to show an appropriate affinity with the water-soluble adhesive, and the superhydrophilic treatment having a water droplet contact angle of less than 15 ° is a water-soluble adhesive. This is more preferable because it shows a better affinity with the adhesive. The hydrophilic treatment can be carried out by various conventionally known methods, and the following methods may be used. When the manufacturer substrate 100 and the transfer destination substrate 200 are glass, the simplest hydrophilic treatment method is pure water cleaning, and the oil and fat components adhering to the surface of the manufacturer substrate 100 are washed away. At this time, it is more effective to use a surfactant such as soap. Various materials such as metals, silicon oxide films, and organic resins appear on the surface of the thin film element group 110 formed on the manufacturer's substrate. An effective hydrophilic treatment method for such a substance is an oxidation treatment such as oxygen plasma or ozone irradiation. Further, water plasma treatment such as introducing hydrogen into the oxygen plasma, introducing water vapor into the oxygen plasma, or introducing water vapor into the inert gas plasma is also effective. By these hydrophilic treatments, hydroxyl groups can be induced on the substrate surface via an oxide film, reducing the surface energy against water and increasing the adhesive strength of the water-soluble adhesive. When the glass substrate is washed as described above, the water droplet contact angle becomes about 25 °, and when the oxidation treatment or the water plasma treatment is performed, the water droplet contact angle becomes super hydrophilic with a water droplet contact angle of less than 15 °.

次に製造元基板100の周辺部130に撥水処理を施して撥水領域を形成する。此処で撥水処理を行う周辺部130は、図3に示す様に、製造元基板100の端面(側面部)と、製造元基板表面に於ける端面に続く所定の範囲と、製造元基板の裏面に於ける端面に続く所定の範囲を含むものとする。周辺部130を為す所定の範囲とは、製造元基板表面及び製造元基板裏面に於いて、それぞれ端面から最低1mm以上の幅を有する領域で有る事が好ましい。撥水領域となる周辺部130が余りに狭いと、水溶性接着剤150(後述)が漏れた際に接着させない効果が弱くなる為である。一方で、周辺部130の範囲が広くなり過ぎると薄膜素子群から成る回路部の面積が小さくなるので、端面からの距離を10mm未満とする事が好ましい。撥水処理が安定的に施され、撥水処理効果が確実に得られ、且つ回路部の面積を最大とするには、撥水領域範囲を基板端面から2mm以上6mm以下とする事が理想的と言える。撥水処理は、従来から知られる様々な方法により行う事も可能であるし、以下の様な方法を用いてもよい。   Next, the peripheral portion 130 of the manufacturer substrate 100 is subjected to water repellent treatment to form a water repellent region. As shown in FIG. 3, the peripheral portion 130 where the water repellent treatment is performed here is an end surface (side surface portion) of the manufacturer's substrate 100, a predetermined range following the end surface on the manufacturer's substrate surface, and a back surface of the manufacturer's substrate. A predetermined range following the end face is included. The predetermined range for forming the peripheral portion 130 is preferably a region having a width of at least 1 mm from the end surface on the manufacturer substrate surface and the manufacturer substrate back surface. This is because if the peripheral portion 130 serving as the water-repellent region is too narrow, the effect of preventing adhesion when the water-soluble adhesive 150 (described later) leaks is weakened. On the other hand, if the range of the peripheral part 130 becomes too wide, the area of the circuit part made up of the thin film element group becomes small, so that the distance from the end face is preferably less than 10 mm. Ideally, the water repellent area should be 2 mm or more and 6 mm or less from the edge of the substrate in order to ensure that the water repellent treatment is performed stably, the water repellent treatment effect can be reliably obtained, and the circuit area is maximized. It can be said. The water repellent treatment can be performed by various conventionally known methods, and the following methods may be used.

第1の例は撥水処理領域にフッ素プラズマを照射する方法で有る。即ち、親水処理が為された製造元基板100の表面の内で周辺部130を除く内側の領域(以下「非周辺部」という)をフォトレジストで覆い、その後にフッ素を含んだ物質を用いたプラズマ処理を行う。フッ素プラズマ処理に用いるフッ素を含んだ物質としては、四フッ化メタン(CF)、三フッ化窒素(NF)、六フッ化硫黄(SF)、フッ化水素(HF)、フッ素ガス(F)等が挙げられる。取り分け安全上からも扱い易い四フッ化メタン(CF)の使用が好ましい。プラズマ処理後はフォトレジストを除去する。 A first example is a method of irradiating a water repellent treatment region with fluorine plasma. That is, the inner region (hereinafter referred to as “non-peripheral portion”) excluding the peripheral portion 130 on the surface of the manufacturer substrate 100 subjected to the hydrophilic treatment is covered with a photoresist, and then plasma using a substance containing fluorine is used. Process. Fluorine-containing materials used for the fluorine plasma treatment include tetrafluoromethane (CF 4 ), nitrogen trifluoride (NF 3 ), sulfur hexafluoride (SF 6 ), hydrogen fluoride (HF), fluorine gas ( F 2 ) and the like. In particular, it is preferable to use tetrafluoromethane (CF 4 ), which is easy to handle from the viewpoint of safety. After the plasma treatment, the photoresist is removed.

第2の例は撥水処理領域に撥水性物質を塗布する方法である。具体的には製造元基板100の周辺部130に油脂又はワックスを塗布する。油脂とは、高級脂肪酸と一価又は二価の高級アルコールとのエステルを指すが、これと類似した性質を示す中性脂肪や高級脂肪酸、炭化水素等をも含む。より具体的な油脂の例としては、脂肪酸(化1)とグリセリン(化2)とのエステルであるトリアシルグリセロース(化3)等が挙げられる。


The second example is a method of applying a water repellent substance to the water repellent treatment region. Specifically, oil or wax is applied to the peripheral portion 130 of the manufacturer substrate 100. Fats and oils refer to esters of higher fatty acids and mono- or divalent higher alcohols, but also include neutral fats, higher fatty acids, hydrocarbons and the like that exhibit similar properties. More specific examples of fats and oils include triacyl glycerose (Chemical Formula 3), which is an ester of fatty acid (Chemical Formula 1) and glycerin (Chemical Formula 2).


又、油脂の他にも、アルキルケテンダイマー・ワックス(化4)やジアルキルケトン・ワックス(化5)等のワックスが使用される。

In addition to fats and oils, waxes such as alkyl ketene dimer wax (Chemical Formula 4) and dialkyl ketone wax (Chemical Formula 5) are used.

此処で、R及びRからRは、炭素数が10から30程度の直鎖又は分岐鎖を有するアルキル基(C2n+1、n=10〜31)、又は炭素数が10から30程度の直鎖又は分岐鎖を有するアルケニル基(C2n−1、n=10〜31)を指す。良好な撥水性を示すにはR及びRからRは飽和化合物が好まし居ため、アルケニル基よりもアルキル基の方が好ましい。又、R及びRからRに含まれる水素原子の一部又は全部をフッ素原子で置換してもよい。 Here, R and R 1 to R 7 are linear or branched alkyl groups having about 10 to 30 carbon atoms (C n H 2n + 1 , n = 10 to 31), or about 10 to 30 carbon atoms. Or an alkenyl group having a straight chain or branched chain (C n H 2n−1 , n = 10 to 31). In order to show good water repellency, since R and R 1 to R 7 are preferably saturated compounds, an alkyl group is preferred to an alkenyl group. In addition, some or all of the hydrogen atoms contained in R and R 1 to R 7 may be substituted with fluorine atoms.

より好ましい油脂としては、RからRが炭素数11−17の直鎖アルキルで、ラウリン酸(CH−(CH10−COOH)のグリセリド(C(OCOC1123、飽和アルキル基の炭素数n=11)、ミリスチン酸(CH−(CH12−COOH)のグリセリド(C(OCOC1327、飽和アルキル基の炭素数n=13)、パルミチン酸(CH−(CH14−COOH)のグリセリド(トリパルミチン、C(OCOC1531、飽和アルキル基の炭素数n=15)、ステアリン酸(CH−(CH16−COOH)のグリセリド(トリステアリン、C(OCOC1735、飽和アルキル基の炭素数n=17)が挙げられる。 As more preferred fats and oils, R 1 to R 3 are linear alkyl having 11 to 17 carbon atoms, and glyceride (C 3 H 5 (OCOC 11 H 23 ) of lauric acid (CH 3 — (CH 2 ) 10 —COOH). 3 , carbon number of saturated alkyl group n = 11), glyceride of myristic acid (CH 3- (CH 2 ) 12 -COOH) (C 3 H 5 (OCOC 13 H 27 ) 3 , carbon number of saturated alkyl group n = 13), glycerides of palmitic acid (CH 3- (CH 2 ) 14 -COOH) (tripalmitin, C 3 H 5 (OCOC 15 H 31 ) 3 , saturated carbon number n = 15), stearic acid (CH 3 - (CH 2) 16 -COOH ) glycerides (tristearin, C 3 H 5 (OCOC 17 H 35) 3, carbon atoms of the saturated alkyl group n = 17) And the like.

ワックスとしては、RからRが炭素数11−17の直鎖アルキルがより好ましい。ケテンダイマーとしては、ミリスチルケテンダイマー、パルミチルケテンダイマー、ステアリンケテンダイマー、又はベヘニルケテンダイマーが特に好ましい。ジアルキルケトンとしては、パルミトン、又はステアロンが特に好ましい。又、石油から製造され、炭素数20〜30程度の直鎖状のパラフィン系炭化水素(ノルマル・パラフィン)を主成分とするパラフィンワックス等も使用出来る。 As the wax, R 4 to R 7 are more preferably linear alkyl having 11 to 17 carbon atoms. As the ketene dimer, myristyl ketene dimer, palmityl ketene dimer, stearin ketene dimer, or behenyl ketene dimer is particularly preferable. As the dialkyl ketone, palmitone or stearone is particularly preferable. Moreover, the paraffin wax etc. which are manufactured from petroleum and have as a main component a linear paraffinic hydrocarbon (normal paraffin) having about 20 to 30 carbon atoms can also be used.

図4は撥水処理を施した転写先基板200を示す図であり、上図は転写先基板から見た平面図で、下図は断面図である。転写先基板200に対する表面処理も、製造元基板100に対する表面処理と同様に、撥水処理と親水処理との両者を行っても良い。此処では撥水処理と親水処理との双方を行う方法を説明する。又、転写先基板200に対する撥水処理及び親水処理は、製造元基板100に対する撥水処理及び親水処理と同様の方法で行う事が出来るが、撥水処理を行うべき部分が異なるので、その点を中心に説明する。転写先基板200に対する撥水処理は、周辺部230に対して行われる。此処で、転写先基板200に於ける周辺部230を除いた非周辺部は、製造元基板100の表面に於ける周辺部130を除いた非周辺部とほぼ等しい面積を有し、ほぼ等しい辺長と成っている。即ち水溶性接着剤で接着される領域が両基板でほぼ等しくなる様に撥水処理領域を設ける。ほぼ等しいとは製造上の誤差を除いて、製造元基板の非周辺部と転写先基板の周辺部を除いた領域とが同一辺長同一面積に成る様に撥水領域を作成している事を意味する。前述の如く本例では転写先基板を製造元基板よりも大きくしているので、転写先基板200に於ける周辺部230の幅は、製造元基板100に於ける周辺部130の幅よりも広くなり、その結果として両基板で親水性の非周辺部の面積はほぼ同一となる。尚、此処でいう「幅」とは、基板に於ける端面から非周辺部までの距離を指す。   FIG. 4 is a view showing a transfer destination substrate 200 that has been subjected to a water repellent treatment. An upper view is a plan view seen from the transfer destination substrate, and a lower view is a cross-sectional view. Similarly to the surface treatment for the manufacturer substrate 100, both the water repellent treatment and the hydrophilic treatment may be performed on the transfer destination substrate 200. Here, a method of performing both water repellent treatment and hydrophilic treatment will be described. In addition, the water repellent treatment and the hydrophilic treatment for the transfer destination substrate 200 can be performed by the same method as the water repellent treatment and the hydrophilic treatment for the manufacturer substrate 100, but the portions to be subjected to the water repellent treatment are different. The explanation is centered. The water repellent treatment for the transfer destination substrate 200 is performed on the peripheral portion 230. Here, the non-peripheral portion excluding the peripheral portion 230 in the transfer destination substrate 200 has substantially the same area as the non-peripheral portion excluding the peripheral portion 130 on the surface of the manufacturer's substrate 100, and has substantially the same side length. It consists of. That is, the water-repellent treatment region is provided so that the region to be bonded with the water-soluble adhesive is substantially equal on both substrates. Nearly equal means that the water-repellent region is created so that the non-peripheral portion of the manufacturer's substrate and the region excluding the peripheral portion of the transfer destination substrate have the same side length and the same area, excluding manufacturing errors. means. As described above, in this example, since the transfer destination substrate is made larger than the manufacturer substrate, the width of the peripheral portion 230 in the transfer destination substrate 200 is wider than the width of the peripheral portion 130 in the manufacturer substrate 100. As a result, the area of the hydrophilic non-peripheral part is almost the same on both substrates. The “width” here refers to the distance from the end surface to the non-peripheral portion of the substrate.

此処まで撥水処理領域を製造元基板と転写先基板の双方に形成して来たが、撥水処理は製造元基板100又は転写先基板200の何れか一方にのみ行ってもよい。撥水処理をどちらかの基板に施せば、後の工程で仮令水溶性接着剤150が溢れ出ても撥水処理領域で水溶性接着剤150は接着せず(或いは接着力が著しく弱まり)、製造元基板100と転写先基板200との剥離が容易となる。撥水処理を転写先基板200のみに対して行った場合、製造元基板100に形成された薄膜素子群110が撥水処理に依って汚染される事が無いとの利点が見られる。理想は製造元基板100と転写先基板200との双方に撥水処理を行う事で、此に依り、後の工程にて製造元基板100と転写先基板200との剥離をより容易に、より確実に行える様になる。   Up to this point, the water-repellent treatment region has been formed on both the manufacturer substrate and the transfer destination substrate, but the water repellent treatment may be performed only on either the manufacturer substrate 100 or the transfer destination substrate 200. If water repellent treatment is applied to either substrate, even if the temporary water-soluble adhesive 150 overflows in a later step, the water-soluble adhesive 150 does not adhere in the water-repellent treatment region (or the adhesive strength is significantly weakened) The manufacturer substrate 100 and the transfer destination substrate 200 can be easily separated. When the water repellent treatment is performed only on the transfer destination substrate 200, there is an advantage that the thin film element group 110 formed on the manufacturer substrate 100 is not contaminated by the water repellent treatment. Ideally, both the manufacturer substrate 100 and the transfer destination substrate 200 are subjected to water repellency treatment, which makes it easier and more reliable to peel off the manufacturer substrate 100 and the transfer destination substrate 200 in a later step. You can do it.

<(2)囲い込み手段形成工程(囲み手段の形成)>
次に製造元基板100と転写先基板とを比較して、面積の小さい方の基板表面に囲み手段140を形成する。此処では先と同様に製造元基板の方が転写先基板よりも小さい例を説明する。即ち製造元基板に囲み手段140を形成する例を説明する。
<(2) Enclosing means forming step (formation of enclosing means)>
Next, the manufacturer substrate 100 and the transfer destination substrate are compared, and the surrounding means 140 is formed on the surface of the smaller substrate. Here, an example will be described in which the manufacturer's substrate is smaller than the transfer destination substrate as before. That is, an example in which the surrounding means 140 is formed on the manufacturer substrate will be described.

図5は囲み手段140が形成された製造元基板100を示す図であり、上図は製造元基板表面(上方)から見た平面図、下図は断面図である。図5に示す様に、囲み手段140は、平面視に於いて製造元基板100の周辺部130より内側の非周辺部であって、剥離層120の上に薄膜素子群110を囲む様に形成される。即ち、囲み手段は親水性領域に形成される。この際に囲み手段140は、囲み手段140から周辺部130迄の距離が1mm以上且つ5mm以下と成るべく、形成される。囲み手段140を周辺部130から1mm以上の距離をもって形成すれば、製造元基板100と転写先基板200とを貼り合わせる際に接着剤で形成された囲み手段140が圧迫されて広がっても、当該囲み手段140が撥水処理された周辺部130迄は広がらない。撥水処理された周辺部130では囲み手段を形成する接着剤の塗れ性が悪いので、囲み手段がとぎれ、その結果、囲み手段140として機能しなくなる不具合が発生し得る。囲み手段が周辺部から1mm以上離れて形成されれば、この不具合を防止出来る。又、囲み手段140を周辺部130から5mm以下の距離を以て形成すると、デバイス領域(薄膜素子群が形成される領域)を広く取れ、生産性向上の視点より好ましい。斯うした囲み手段140は囲み用接着剤に依って形成され、その粘度が5000cps以上且つ50000cps以下で有ることが望ましい。此処での接着剤とは粘着剤やシール剤、或いは水溶性接着剤を意味する。囲み手段140の粘度が5000cps以上であれば、囲み手段の高さは10μmから100μm程度となり、この内側に水溶性接着剤150を塗布した後にも水溶性接着剤が漏れにくくなる。又、粘度が50000cps以下ならば、市販のディスペンス装置(ディスペンサー)を用いて容易に囲み手段140を形成出来る。尚、囲み手段140を形成する接着剤と、水溶性接着剤150とは互いに異なる接着剤で、相溶しない材質同士とするのが好ましい。   FIG. 5 is a view showing the manufacturer's substrate 100 on which the surrounding means 140 is formed. The upper view is a plan view seen from the surface of the manufacturer's substrate (above), and the lower view is a cross-sectional view. As shown in FIG. 5, the surrounding means 140 is a non-peripheral portion inside the peripheral portion 130 of the manufacturer substrate 100 in a plan view, and is formed on the release layer 120 so as to surround the thin film element group 110. The That is, the surrounding means is formed in the hydrophilic region. At this time, the surrounding means 140 is formed so that the distance from the surrounding means 140 to the peripheral portion 130 is 1 mm or more and 5 mm or less. If the surrounding means 140 is formed at a distance of 1 mm or more from the peripheral portion 130, even if the surrounding means 140 formed of an adhesive is pressed and spreads when the manufacturer substrate 100 and the transfer destination substrate 200 are bonded together, the surrounding means 140 The means 140 does not spread to the peripheral portion 130 where the water repellent treatment is performed. The peripheral portion 130 subjected to the water-repellent treatment is poor in the applicability of the adhesive forming the surrounding means, so that the surrounding means is interrupted, and as a result, a malfunction that does not function as the surrounding means 140 may occur. If the surrounding means is formed 1 mm or more away from the peripheral part, this problem can be prevented. Further, if the surrounding means 140 is formed at a distance of 5 mm or less from the peripheral portion 130, a wider device region (region where the thin film element group is formed) can be obtained, which is preferable from the viewpoint of improving productivity. Such a surrounding means 140 is preferably formed of an enclosing adhesive and has a viscosity of not less than 5000 cps and not more than 50000 cps. Here, the adhesive means a pressure-sensitive adhesive, a sealant, or a water-soluble adhesive. When the viscosity of the surrounding means 140 is 5000 cps or more, the height of the surrounding means is about 10 μm to 100 μm, and the water-soluble adhesive is difficult to leak even after the water-soluble adhesive 150 is applied to the inside. If the viscosity is 50000 cps or less, the surrounding means 140 can be easily formed using a commercially available dispensing device (dispenser). Note that the adhesive forming the surrounding means 140 and the water-soluble adhesive 150 are preferably different adhesives and are incompatible materials.

<(3)接着剤塗布工程(水溶性接着剤の塗布)>
次に、囲み手段140が形成された小さい方の基板表面で、囲み手段の内側に水溶性接着剤150を塗布する。
<(3) Adhesive application process (application of water-soluble adhesive)>
Next, a water-soluble adhesive 150 is applied to the inside of the surrounding means on the surface of the smaller substrate on which the surrounding means 140 is formed.

図6は、製造元基板と転写先基板で小さい方の基板(今の例では製造元基板)がステージ300上に設置され、その小さい方の基板表面の囲み手段140の内側に水溶性接着剤150を塗布(充填)した状態を示して居る。水溶性接着剤150を塗布するに際して、製造元基板100はステージ300上に設置される。そして、図6に示す様に、水溶性接着剤150が囲み手段140の内側の親水性領域に、囲み手段140から外側に漏れない様に塗布される。水溶性接着剤150は、粘度が1cps以上且つ50cps以下の低粘度水溶性接着剤である事が好ましい。粘度が50cps以下の低粘度水溶性接着剤を用いれば、親水処理された製造元基板100乃至は転写先基板の表面で水溶性接着剤150が綺麗に濡れ広がり、製造元基板100と転写先基板200とを欠陥無く均一に、且つ強力に接着する。又、接着剤で最も粘度が低い物は1cps程度なので、1cps以上で有れば、接着剤の選択肢が広がり、様々な種類の接着剤から最適な接着剤を選択する事が可能となる。接着剤塗布工程後に次工程(基板配置工程)にて製造元基板と転写先基板とを貼り合わせるが、此等二工程(接着剤塗布工程と基板配置工程)は同一ステージ300上で行うのが好ましい。同一ステージで行うと接着剤が塗布された小さい方の基板を移動させる必要がないので、低粘度水溶性接着剤が囲み手段を乗り越えて流れ出す不良をなくせるからである。   FIG. 6 shows that the smaller substrate (manufacturer substrate in this example) of the manufacturer substrate and the transfer destination substrate is placed on the stage 300, and the water-soluble adhesive 150 is placed inside the surrounding means 140 on the surface of the smaller substrate. The state of application (filling) is shown. When applying the water-soluble adhesive 150, the manufacturer substrate 100 is placed on the stage 300. Then, as shown in FIG. 6, the water-soluble adhesive 150 is applied to the hydrophilic region on the inner side of the surrounding means 140 so as not to leak from the surrounding means 140. The water-soluble adhesive 150 is preferably a low-viscosity water-soluble adhesive having a viscosity of 1 cps or more and 50 cps or less. If a low-viscosity water-soluble adhesive having a viscosity of 50 cps or less is used, the water-soluble adhesive 150 cleanly wets and spreads on the surface of the manufacturer-treated substrate 100 or the transfer-destination substrate that has been subjected to hydrophilic treatment. Are bonded uniformly and strongly without defects. Moreover, since the thing with the lowest viscosity of an adhesive agent is about 1 cps, if it is 1 cps or more, the choice of an adhesive agent will spread and it will become possible to select the optimal adhesive agent from various kinds of adhesive agents. After the adhesive application step, the manufacturer substrate and the transfer destination substrate are bonded together in the next step (substrate arrangement step). These two steps (adhesive application step and substrate arrangement step) are preferably performed on the same stage 300. . This is because if the same stage is used, there is no need to move the smaller substrate to which the adhesive is applied, so that it is possible to eliminate the defect that the low-viscosity water-soluble adhesive flows over the surrounding means.

<(4)基板設置工程並びに基板配置工程(製造元基板と転写先基板との貼り合わせ)>
次に基板配置工程に進み、製造元基板100と転写先基板200とを貼り合わせる。両基板を貼り合わせるには、水溶性接着剤が塗布された小さい方の基板を、貼り合わせが為される装置のステージ300上に設置せねばならない。これが基板設置工程である。基板配置工程が行われるステージ300は基板を設置する設置面を有して居り、その設置面の面積は製造元基板と転写先基板とで面積の小さい方の基板よりも更に小さい。此処で云う面積が小さいとは、面積値が小さいと同時に基板の各辺と対応するステージの各辺とを比較して、総ての辺に於いてステージの辺の方が短く、その結果、設置面を小さい方の基板が完全に覆う事を意味する。具体的には、通常は製造元基板も転写先基板も長方形乃至は正方形の四角形基板を用い、ステージ300も長方形乃至は正方形の四角形又は円形の設置面を有する。基板もステージも四角形の場合、ステージの短辺を小さい方の基板の短辺よりも2mm(基板を乗せた際に片側1mm)から10mm(基板を乗せた際に片側5mm)短くし、ステージの長辺を小さい方の基板の長辺よりも2mm(基板を乗せた際に片側1mm)から10mm(基板を乗せた際に片側5mm)短くする。又、ステージが円形の場合、ステージの直径を小さい方の基板の短辺よりも2mm(基板を乗せた際に片側1mm)から10mm(基板を乗せた際に片側5mm)短くする。斯うすると、後に図15と図16とを用いて詳述するが、仮令水溶性接着剤が漏れ出しても、漏れ出した水溶性接着剤はステージ上に留まらないで下方に滴るので、製造元基板と転写先基板とを端面部(エッジ部)で接着する事が無くなり、剥離工程時の基板割れ不良を低減するからで有る。
<(4) Substrate installation step and substrate placement step (bonding of manufacturer substrate and transfer destination substrate)>
Next, the process proceeds to the substrate placement step, where the manufacturer substrate 100 and the transfer destination substrate 200 are bonded together. In order to bond the two substrates together, the smaller substrate coated with the water-soluble adhesive must be placed on the stage 300 of the apparatus where the bonding is performed. This is the substrate installation process. The stage 300 on which the substrate placement process is performed has an installation surface on which the substrate is installed, and the area of the installation surface is further smaller than the smaller substrate of the manufacturer substrate and the transfer destination substrate. The small area here means that the area value is small and at the same time each side of the substrate is compared with each side of the corresponding stage, and the side of the stage is shorter on all sides. It means that the smaller board completely covers the installation surface. Specifically, a rectangular substrate or a square substrate is generally used for both the manufacturer substrate and the transfer destination substrate, and the stage 300 also has a rectangular or square quadrangular or circular installation surface. When both the substrate and the stage are square, the short side of the stage is shortened by 2 mm (1 mm on one side when the substrate is placed) to 10 mm (5 mm on one side when the substrate is placed) shorter than the shorter side of the stage. The long side is shorter than the long side of the smaller substrate by 2 mm (1 mm on one side when the substrate is placed) to 10 mm (5 mm on one side when the substrate is placed). When the stage is circular, the diameter of the stage is shortened by 2 mm (1 mm on one side when the substrate is placed) to 10 mm (5 mm on one side when the substrate is placed) shorter than the shorter side of the smaller substrate. In this case, as will be described in detail later with reference to FIGS. 15 and 16, even if the temporary water-soluble adhesive leaks out, the leaked water-soluble adhesive does not stay on the stage and drops downward. This is because the substrate and the transfer destination substrate are not bonded to each other at the end surface portion (edge portion), and the substrate cracking defect during the peeling process is reduced.

基板設置工程は基板配置工程に先立って行われねばならず、その直前に為されても良いが、より好ましいのは囲い込み手段形成工程前に為される事である。即ち水溶性接着剤が塗布された基板を基板配置工程が行われるステージ300に設置しても良いが、より好ましいのは基板設置工程後に囲い込み手段形成工程と接着剤塗布工程及び基板配置工程とを同一のステージ300上で連続して行う事である。斯うすると、水溶性接着剤が塗布された基板を移動させる必要が無くなるので、前述の如く、低粘度水溶性接着剤が囲み手段を乗り越えて流れ出す不良をなくせる。理想は基板設置工程後に囲い込み手段形成工程と接着剤塗布工程と基板配置工程とその次の接着剤硬化工程とを同一ステージ300上で行う事である。此に依り囲み手段形成から接着剤硬化迄の間、基板は全く移動しないので、基板移動に伴う水溶性接着剤流出不良を完全になくせる様になる。   The substrate placement process must be performed prior to the substrate placement process and may be performed immediately before, but more preferably is performed before the enclosure means forming process. That is, the substrate coated with the water-soluble adhesive may be placed on the stage 300 where the substrate placement step is performed, but more preferably, the enclosing means forming step, the adhesive coating step, and the substrate placement step are performed after the substrate placement step. This is performed continuously on the same stage 300. In this case, it is not necessary to move the substrate coated with the water-soluble adhesive, and as described above, it is possible to eliminate the defect that the low-viscosity water-soluble adhesive flows out over the surrounding means. Ideally, the enclosing means forming step, the adhesive applying step, the substrate arranging step, and the subsequent adhesive curing step are performed on the same stage 300 after the substrate setting step. Thus, since the substrate does not move at all from the formation of the surrounding means to the curing of the adhesive, it is possible to completely eliminate the water-soluble adhesive outflow defect due to the movement of the substrate.

図7は基板配置工程直後の状態を示し、製造元基板100と転写先基板200とが貼り合わされて居る。製造元基板100及び転写先基板200は、平面視に於いて、大きい方の基板(今の例では転写先基板200)が小さい方の基板(今の例では製造元基板100)の全面を覆い重ねる様に貼り合わせる。此等の基板を貼り合わせる際には、まず雰囲気を真空とし、低粘度水溶性接着剤150から気泡を除去する。気泡部分は接着不良となり、後の基板剥離工程にて転写不良となる。従って此の脱泡処理に依り、気泡に起因する転写不良を削減する。気泡を効率的に除去するには100Pa以下の真空度で1秒以上維持する。100Pa以上の低真空では気泡が残って仕舞うためである。50cps以下の低粘度水溶性接着剤を大気中で充填させた場合、100Pa以下の真空になる間に脱泡が進むので、1秒程度と云ったほんの僅かな時間だけ100Pa以下にすれば良い。大気から100Pa迄の真空引きは5秒から120秒の間に行う。5秒未満で真空引きを行うと水溶性接着剤150が飛び散って仕舞い、120秒以上掛かると水溶性接着剤の組成が目に見えて変わると共に接着材量も著しく減少する為に、接着品質を確保出来ないからで有る。接着品質を確保し、接着剤量を設計通りに保つには、100Pa以下の真空度に維持する期間を真空引き開始から120秒以下とする。具体的に最適な条件は大気から20秒から25秒掛けて50Paから60Paの真空とし、この真空度にて20秒から40秒維持する方法である。この様にして水溶性接着剤150から気泡を除去したら、真空中にて小さい方の基板(今の例では製造元基板100)上に大きい方の基板(今の例では転写先基板200)を乗せ、次いで雰囲気を大気に戻す。   FIG. 7 shows a state immediately after the substrate placement step, in which the manufacturer substrate 100 and the transfer destination substrate 200 are bonded together. In the plan view, the manufacturer substrate 100 and the transfer destination substrate 200 are such that the larger substrate (the transfer destination substrate 200 in this example) covers the entire surface of the smaller substrate (the manufacturer substrate 100 in this example). Paste to. When these substrates are bonded together, first, the atmosphere is evacuated and air bubbles are removed from the low-viscosity water-soluble adhesive 150. A bubble part becomes adhesion failure and becomes a transfer defect in a subsequent substrate peeling process. Therefore, this defoaming process reduces transfer defects caused by bubbles. In order to remove bubbles efficiently, the vacuum is maintained at 100 Pa or less for 1 second or more. This is because bubbles remain in a low vacuum of 100 Pa or more. When a low-viscosity water-soluble adhesive having a viscosity of 50 cps or less is filled in the atmosphere, defoaming proceeds while a vacuum of 100 Pa or less is reached. Therefore, the pressure should be 100 Pa or less for only a short time of about 1 second. The vacuuming from the atmosphere to 100 Pa is performed between 5 seconds and 120 seconds. When vacuuming is performed in less than 5 seconds, the water-soluble adhesive 150 scatters and finishes, and when it takes 120 seconds or more, the composition of the water-soluble adhesive is visibly changed and the amount of adhesive is significantly reduced. This is because it cannot be secured. In order to secure the adhesive quality and keep the amount of adhesive as designed, the period of maintaining the vacuum degree of 100 Pa or less is set to 120 seconds or less from the start of evacuation. Specifically, the optimum condition is a method in which a vacuum of 50 Pa to 60 Pa is applied over 20 to 25 seconds from the atmosphere, and this vacuum is maintained for 20 to 40 seconds. After removing the bubbles from the water-soluble adhesive 150 in this way, the larger substrate (transfer destination substrate 200 in this example) is placed on the smaller substrate (manufacturer substrate 100 in this example) in a vacuum. The atmosphere is then returned to the atmosphere.

<(5)接着剤硬化工程(水溶性接着剤の硬化)>
次に、図8に示す様に、貼り合わされた製造元基板100と転写先基板200とに紫外線400を照射し、水溶性接着剤150を硬化させる。尚、水溶性接着剤150を硬化させるには、水溶性接着剤150の特性に合わせた何らかのエネルギーを供給すれば良く、供給エネルギー形態は必ずしも紫外光照射で無くても良い。例えば水溶性接着剤が熱硬化型であれば、熱エネルギーを供給する。
<(5) Adhesive curing step (curing of water-soluble adhesive)>
Next, as shown in FIG. 8, ultraviolet light 400 is applied to the bonded manufacturer substrate 100 and transfer destination substrate 200 to cure the water-soluble adhesive 150. Note that in order to cure the water-soluble adhesive 150, it is only necessary to supply some energy in accordance with the characteristics of the water-soluble adhesive 150, and the supply energy form is not necessarily ultraviolet light irradiation. For example, if the water-soluble adhesive is a thermosetting type, heat energy is supplied.

<(6)基板剥離工程(製造元基板と転写先基板との剥離)>
次に、図9に示す様に、製造元基板100側からレーザー光500を照射し、剥離層120にて製造元基板100と転写先基板200とを剥離させる。この工程後に薄膜素子群110は、硬化した水溶性接着剤150を介在して、転写先基板200に転写される。
<(6) Substrate Peeling Step (Peeling of Manufacturer Substrate and Transfer Destination Substrate)>
Next, as shown in FIG. 9, the laser beam 500 is irradiated from the manufacturer substrate 100 side, and the manufacturer substrate 100 and the transfer destination substrate 200 are separated by the release layer 120. After this step, the thin film element group 110 is transferred to the transfer destination substrate 200 with the cured water-soluble adhesive 150 interposed therebetween.

本実施形態では基板剥離工程後に薄膜素子群を転写先基板200から第二転写先基板に再度転写し、第二転写先基板を最終製品に組み込まれる回路基板とするが、無論、転写先基板200を最終的な基板としても良い。転写先基板200を最終的な基板とする場合、回路基板の製造工程は、当該製造元基板100と転写先基板200とを剥離する工程で終了となる。   In this embodiment, the thin film element group is transferred again from the transfer destination substrate 200 to the second transfer destination substrate after the substrate peeling step, and the second transfer destination substrate is used as a circuit board incorporated in the final product. May be the final substrate. When the transfer destination substrate 200 is the final substrate, the circuit board manufacturing process ends with the process of peeling the manufacturer substrate 100 and the transfer destination substrate 200 from each other.

<(7)第二接着工程(転写先基板と第二転写先基板との貼り合わせ)>
次に、転写先基板200と第二転写先基板600とを貼り合わせる。
<(7) Second bonding step (bonding of transfer destination substrate and second transfer destination substrate)>
Next, the transfer destination substrate 200 and the second transfer destination substrate 600 are bonded together.

図10は転写先基板200と第二転写先基板600とを貼り合わせた状態を示して居る。転写先基板200と第二転写先基板600とを貼り合わせる際、薄膜素子群110が転写された転写先基板200と第二転写先基板600とを対向させ、非水溶性接着剤を介在させて貼り合わせる。尚、本実施形態に於いて、第二転写先基板600は最終製品に組み込まれる回路基板の最終的な基板であるため、製造された回路基板としての所望の材料により形成される。例えば、可撓性を有する基板を有する回路基板を製造する場合には、可撓性を有するプラスチック等を基板として用いる。   FIG. 10 shows a state where the transfer destination substrate 200 and the second transfer destination substrate 600 are bonded together. When the transfer destination substrate 200 and the second transfer destination substrate 600 are bonded together, the transfer destination substrate 200 to which the thin film element group 110 has been transferred is opposed to the second transfer destination substrate 600, and a water-insoluble adhesive is interposed therebetween. to paste together. In the present embodiment, the second transfer destination substrate 600 is a final substrate of a circuit board to be incorporated into a final product, and thus is formed of a desired material as a manufactured circuit board. For example, when a circuit board having a flexible substrate is manufactured, flexible plastic or the like is used as the substrate.

<(8)第二転写工程(転写先基板と第二転写先基板との剥離)>
次に、図11に示す様に、転写先基板200と第二転写先基板600とを剥離する。転写先基板200と第二転写先基板600とを剥離する当該工程は、上記の製造元基板100と転写先基板200とを剥離する工程の様に、転写先基板200に予め剥離層を設けておき、転写先基板200側からレーザー光等を照射する方法を用いてもよい。又、水溶性接着剤150を水に溶解させるなど、それ以外の従来の方法を用いてもよい。
<(8) Second transfer step (peeling of transfer destination substrate and second transfer destination substrate)>
Next, as shown in FIG. 11, the transfer destination substrate 200 and the second transfer destination substrate 600 are peeled off. In the step of peeling the transfer destination substrate 200 and the second transfer destination substrate 600, a peeling layer is provided on the transfer destination substrate 200 in advance as in the step of peeling the manufacturer substrate 100 and the transfer destination substrate 200. Alternatively, a method of irradiating laser light or the like from the transfer destination substrate 200 side may be used. In addition, other conventional methods such as dissolving the water-soluble adhesive 150 in water may be used.

<(9)接着剤除去工程(水溶性接着剤の除去)>
最後に、図12に示す様に、第二転写先基板600上に残存した水溶性接着剤150及び囲み手段140を除去する。水溶性接着剤150及び囲み手段140の除去は、純水等で洗い流す方法を用いてもよいし、その他従来の方法を用いてもよい。
<(9) Adhesive removal step (removal of water-soluble adhesive)>
Finally, as shown in FIG. 12, the water-soluble adhesive 150 and the surrounding means 140 remaining on the second transfer destination substrate 600 are removed. For removal of the water-soluble adhesive 150 and the surrounding means 140, a method of washing with pure water or the like may be used, or other conventional methods may be used.

以上の工程を経て、図12に示す様に、第二転写先基板600に薄膜素子群110を転写し、所望の回路基板を製造する事が可能となる。   Through the above steps, as shown in FIG. 12, it is possible to transfer the thin film element group 110 to the second transfer destination substrate 600 and manufacture a desired circuit board.

<3.まとめ>
以上の様に、本実施形態に於ける薄膜素子群の転写方法に依れば、製造元基板100の周辺部130、及び転写先基板200の周辺部230の少なくとも一方に撥水処理を行う事で、当該部分に水溶性接着剤150が付着しづらくなる。仮に、製造元基板100及び転写先基板200のいずれに対しても全く撥水処理を行わず、かつステージ300が製造元基板100及び転写先基板200よりも大きい場合、以下の様な状態となる。即ち、図13に示す様に、製造元基板100の端面と転写先基板200の端面とを覆う様に水溶性接着剤150が付着する。この状態のまま、紫外線500を照射して水溶性接着剤150を硬化すると、図14に示す様に、製造元基板100の端面と転写先基板200の端面とを覆ったまま水溶性接着剤150が硬化して仕舞う。この状態で製造元基板100と転写先基板200とを剥離しようとして力を加えると、製造元基板100乃至は転写先基板が割れて仕舞う。しかし、上記本実施形態に於ける薄膜素子群の転写方法を用いる事で、製造元基板100の端面と転写先基板200の端面とに水溶性接着剤150が付着する事を防ぎ、併せて端面部での接着剤硬化を防止出来る。斯くして製造元基板100を転写先基板200から剥離する際に、製造元基板100乃至は転写先基板が割れる不良を防止出来るので有る。撥水処理をどちらか一方の基板周辺部のみに対して施した場合、仮令水溶性接着剤150が溢れ出でも、撥水処理領域では接着しない(接着力が著しく弱くなる)。これに依って、製造元基板100と転写先基板200との剥離が容易となる。撥水処理を転写先基板200のみに対して行った場合、製造元基板100に形成された薄膜素子群110が撥水処理に依って汚染される事を避ける事が出来る。但し、製造元基板100と転写先基板200との双方に撥水処理を行う事が、製造元基板100と転写先基板200との剥離をより確実に行う事が出来るため、更に好ましい。
<3. Summary>
As described above, according to the thin film element group transfer method in the present embodiment, at least one of the peripheral portion 130 of the manufacturer substrate 100 and the peripheral portion 230 of the transfer destination substrate 200 is subjected to water repellent treatment. The water-soluble adhesive 150 is difficult to adhere to the part. If neither the manufacturer substrate 100 nor the transfer destination substrate 200 is subjected to water repellent treatment and the stage 300 is larger than the manufacturer substrate 100 and the transfer destination substrate 200, the following state is obtained. That is, as shown in FIG. 13, the water-soluble adhesive 150 adheres so as to cover the end surface of the manufacturer substrate 100 and the end surface of the transfer destination substrate 200. In this state, when the water-soluble adhesive 150 is cured by irradiating the ultraviolet ray 500, the water-soluble adhesive 150 is covered with the end face of the manufacturer substrate 100 and the end face of the transfer destination substrate 200 as shown in FIG. Harden and finish. In this state, if a force is applied to peel the manufacturer substrate 100 and the transfer destination substrate 200, the manufacturer substrate 100 or the transfer destination substrate is broken and finished. However, by using the thin film element group transfer method in the present embodiment, the water-soluble adhesive 150 is prevented from adhering to the end face of the manufacturer's substrate 100 and the end face of the transfer destination substrate 200, and the end face portion Can prevent curing of adhesive. Thus, when the manufacturer substrate 100 is peeled from the transfer destination substrate 200, it is possible to prevent a defect that the manufacturer substrate 100 or the transfer destination substrate breaks. When the water repellent treatment is performed only on the peripheral portion of one of the substrates, even if the temporary water-soluble adhesive 150 overflows, it does not adhere in the water repellent treatment region (adhesive strength becomes extremely weak). This facilitates separation of the manufacturer substrate 100 and the transfer destination substrate 200. When the water repellent treatment is performed only on the transfer destination substrate 200, the thin film element group 110 formed on the manufacturer substrate 100 can be prevented from being contaminated by the water repellent treatment. However, it is more preferable to perform water repellent treatment on both the manufacturer substrate 100 and the transfer destination substrate 200 because the manufacturer substrate 100 and the transfer destination substrate 200 can be more reliably peeled off.

又、本実施形態に於ける方法では、製造元基板100の面積と転写先基板200の面積とが異なっている。そして此等の基板を貼り合わせる際に、平面視に於いて、大きい方の基板が小さい方の基板の全面に覆い重なる様に貼り合わせている。これに依って基板配置工程時に仮令此等の間から漏れ出ても、水溶性接着剤150が上側の大きい方の基板裏面に回り込む不良を防げ、故に両基板が基板端部にて接着される不具合を解消している。   Further, in the method according to the present embodiment, the area of the manufacturer substrate 100 and the area of the transfer destination substrate 200 are different. When these substrates are bonded together, they are bonded so that the larger substrate covers the entire surface of the smaller substrate in plan view. Therefore, even if leaking from between these temporary provisions during the substrate placement process, it is possible to prevent the water-soluble adhesive 150 from flowing into the upper side of the larger substrate, so that both substrates are bonded at the end of the substrate. The bug has been resolved.

又、本実施形態に於ける方法では、小さい方の基板に水溶性接着剤150を塗布する前に、平面視に於いて、小さい方の基板周辺部130より内側に、薄膜素子群110を囲む囲み手段140を形成しその内側に低粘度水溶性接着剤を充填している。これに依って、水溶性接着剤150が製造元基板100と転写先基板200との間から漏れ出る不良を削減して居る。   In the method according to the present embodiment, before the water-soluble adhesive 150 is applied to the smaller substrate, the thin film element group 110 is enclosed inside the peripheral portion 130 of the smaller substrate in plan view. An enclosing means 140 is formed and filled with a low-viscosity water-soluble adhesive. Accordingly, defects that the water-soluble adhesive 150 leaks from between the manufacturer substrate 100 and the transfer destination substrate 200 are reduced.

又、本実施形態に於ける囲み手段140は、粘度が5000cps以上且つ50000cps以下の接着剤で形成されて居る。この様に、囲み手段140の材料として粘度が5000cps以上の接着剤を用居たので、水溶性接着剤150が漏れ出づらい、好ましい高さである10μm以上且つ100μm以下程度の囲み手段140を形成可能となる。又、粘度が50000cps以下の接着剤を用居たので、市販のディスペンス装置(ディスペンサー)に依って、容易に囲み手段140を形成する事が可能となる。   Moreover, the surrounding means 140 in this embodiment is formed with the adhesive agent whose viscosity is 5000 cps or more and 50000 cps or less. In this way, since the adhesive having a viscosity of 5000 cps or more is used as the material of the surrounding means 140, the water-soluble adhesive 150 is difficult to leak out, and the surrounding means 140 having a preferred height of about 10 μm to about 100 μm is formed. It becomes possible. Further, since an adhesive having a viscosity of 50000 cps or less is used, the surrounding means 140 can be easily formed by using a commercially available dispensing device (dispenser).

又、接着剤は、水溶性接着剤150と相溶しないものとする事が好ましい。これに依れば、水溶性接着剤150が囲み手段140を形成する接着剤と相溶する事に依って、囲み手段140が破壊される事を防止する事が出来る。   The adhesive is preferably incompatible with the water-soluble adhesive 150. According to this, it is possible to prevent the enclosure means 140 from being destroyed due to the water-soluble adhesive 150 being compatible with the adhesive forming the enclosure means 140.

又、囲み手段140は、周辺部130から1mm以上且つ5mm以下の距離をもって形成する事が好ましい。この様に囲み手段140を周辺部130から1mm以上の距離をもって形成すれば、製造元基板100と転写先基板200とを貼り合わせる際に接着剤で形成された囲み手段140が圧迫され広がった場合で有っても、当該囲み手段140が撥水処理された周辺部130にまで広がる事を防止する事が出来る。即ち、接着剤で形成された囲み手段140が撥水処理された周辺部130まで広がり、当該囲み手段140と製造元基板100との接着力が弱まり、囲み手段140として機能しなくなる事を防止する事が出来る。又、囲み手段140を周辺部130から5mm以下の距離をもって形成すると、デバイス領域を広く取る事ができ、生産性が向上するので好ましい。   Moreover, it is preferable to form the surrounding means 140 at a distance of 1 mm or more and 5 mm or less from the peripheral portion 130. If the surrounding means 140 is formed at a distance of 1 mm or more from the peripheral portion 130 in this way, the surrounding means 140 formed of an adhesive is pressed and spread when the manufacturer substrate 100 and the transfer destination substrate 200 are bonded together. Even if it exists, it can prevent that the said surrounding means 140 spreads to the peripheral part 130 by which the water-repellent process was carried out. That is, it is possible to prevent the surrounding means 140 formed of an adhesive from spreading to the peripheral portion 130 subjected to the water-repellent treatment, and the adhesive force between the surrounding means 140 and the manufacturer's substrate 100 is weakened and cannot function as the surrounding means 140. I can do it. In addition, it is preferable to form the surrounding means 140 with a distance of 5 mm or less from the peripheral portion 130 because a device area can be widened and productivity is improved.

又、本実施形態に於いては、少なくとも製造元基板100と転写先基板200とを貼り合わせる際に、平面視に於いて小さい方の基板よりも更に小さい面積の設置面を有するステージ300上に、小さい方の基板を設置する。これに依って、ステージ300上に設置した小さい方の基板と大きい方の基板とを貼り合わせる際に、仮令両基板間から水溶性接着剤が漏れ出ても、ステージ300と小さい方の基板との間やその周辺に留まる不具合を解消出来る。図15と図16はこれを説明した図で、ステージ300上に設置した小さい方の基板(今の例では製造元基板100)と大きい方の基板(今の例では転写先基板200)とを貼り合わせた際に、万が一水溶性接着剤150が漏れ出た際の状態を示して居る。図15に示す様に、万が一水溶性接着剤が漏れ出しても、本願構成ではステージ300が両基板より小さい面積を有している為に、水溶性接着剤150はステージ300上に溜まる事なく漏れ落ちる。水溶性接着剤150が滴り落ちた後に紫外線400を照射して水溶性接着剤150を硬化させるので、製造元基板100と転写先基板200と漏れた接着剤により端面部で接着される事を防止する事が出来るので有る(図16)。尚、仮令水溶性接着剤が漏れても、周辺部は撥水処理されているので、この領域も接着せず、基板剥離が容易に且つ安定的に為される。更に基板設置工程後に囲い込み手段形成工程を行い、接着剤塗布工程、基板配置工程、接着剤塗布工程を同じステージ300上で行えば、基板を移動させる事に依り水溶性接着剤150が流れ出す事を防止出来るため好ましい。   Further, in this embodiment, at least when the manufacturer substrate 100 and the transfer destination substrate 200 are bonded together, on the stage 300 having an installation surface having a smaller area than the smaller substrate in plan view, Install the smaller board. Accordingly, when the small substrate and the large substrate installed on the stage 300 are bonded together, even if the water-soluble adhesive leaks between the temporary substrates, the stage 300 and the smaller substrate The problem of staying in and around the room can be resolved. FIG. 15 and FIG. 16 are diagrams for explaining this, and a smaller substrate (manufacturer substrate 100 in this example) and a larger substrate (transfer destination substrate 200 in this example) mounted on the stage 300 are pasted. When combined, the state when the water-soluble adhesive 150 leaks out is shown. As shown in FIG. 15, even if the water-soluble adhesive leaks out, the stage 300 has an area smaller than both substrates in the configuration of the present application, so that the water-soluble adhesive 150 does not collect on the stage 300. Leaks down. Since the water-soluble adhesive 150 is cured by irradiating the ultraviolet ray 400 after the water-soluble adhesive 150 is dripped, it is possible to prevent the manufacturer substrate 100 and the transfer destination substrate 200 from being bonded to each other by the leaked adhesive. Yes, it is possible (Figure 16). Even if the temporary water-soluble adhesive leaks, the peripheral portion is water-repellent, so that this region does not adhere, and the substrate can be peeled easily and stably. Further, if the enclosure means forming step is performed after the substrate installation step, and the adhesive application step, the substrate placement step, and the adhesive application step are performed on the same stage 300, the water-soluble adhesive 150 flows out by moving the substrate. Since it can prevent, it is preferable.

又、本実施形態に於ける水溶性接着剤150は、粘度が1cps以上且つ50cps以下である。これに依って、製造元基板100上の囲み手段140の内側で、水溶性接着剤150が十分に広がり、製造元基板100と転写先基板200とを貼り合わせやすくする事が出来る。又、粘度が1cps以上のものを使用可能であるため、様々な種類の接着剤から選択する事が可能となる。   Further, the water-soluble adhesive 150 in the present embodiment has a viscosity of 1 cps or more and 50 cps or less. Accordingly, the water-soluble adhesive 150 is sufficiently spread inside the surrounding means 140 on the manufacturer's substrate 100, and the manufacturer's substrate 100 and the transfer destination substrate 200 can be easily bonded together. Moreover, since a thing with a viscosity of 1 cps or more can be used, it becomes possible to select from various kinds of adhesives.

又、本実施形態では、薄膜素子群110が転写された転写先基板200の転写先基板と、第二転写先基板600の転写先基板とを対向させて、接着剤を介在させて貼り合わせる。そして、転写先基板200を第二転写先基板600から剥離させる事に依って、薄膜素子群110を第二転写先基板600に転写し、その後、水溶性接着剤150を除去する。これに依って、薄膜素子群110を、製造元基板100から第二転写先基板600に転写する事が可能となる。   In the present embodiment, the transfer destination substrate 200 to which the thin film element group 110 has been transferred and the transfer destination substrate of the second transfer destination substrate 600 are opposed to each other and bonded together with an adhesive interposed therebetween. Then, the thin film element group 110 is transferred to the second transfer destination substrate 600 by peeling the transfer destination substrate 200 from the second transfer destination substrate 600, and then the water-soluble adhesive 150 is removed. Accordingly, the thin film element group 110 can be transferred from the manufacturer substrate 100 to the second transfer destination substrate 600.

又、本実施形態では、撥水処理を行う際に、薄膜素子群110が形成された製造元基板100の周辺部130、及び転写先基板200の周辺部230の双方に撥水処理を行う。これに依って、より効果的に、製造元基板100を転写先基板200から剥離する際に、製造元基板100が割れて仕舞う事を防止する事が可能となる。   In this embodiment, when performing the water repellent treatment, the water repellent treatment is performed on both the peripheral portion 130 of the manufacturer substrate 100 on which the thin film element group 110 is formed and the peripheral portion 230 of the transfer destination substrate 200. Accordingly, when the manufacturer substrate 100 is peeled from the transfer destination substrate 200, it is possible to prevent the manufacturer substrate 100 from being broken and finished.

又、本実施形態では更に、製造元基板100の製造元基板表面に於ける撥水領域外の非周辺部に親水処理を行い、転写先基板200の転写先基板に於ける撥水領域外の非周辺部に親水処理を行う。これに依って、水溶性接着剤150に依って、製造元基板100と転写先基板200とを容易に貼り合わせる事が可能となる。   Further, in the present embodiment, the non-peripheral portion outside the water-repellent region on the surface of the manufacturer substrate of the manufacturer substrate 100 is subjected to a hydrophilic treatment, and the non-periphery outside the water-repellent region of the transfer destination substrate 200 on the transfer destination substrate. Hydrophilic treatment is performed on the part. Accordingly, the manufacturer substrate 100 and the transfer destination substrate 200 can be easily bonded to each other by the water-soluble adhesive 150.

又、本実施形態では、製造元基板100の製造元基板表面に於ける周辺部130が、製造元基板100の端面から1mm以上且つ10mm以下の範囲としている。これに依って、製造元基板100上の薄膜素子群110を形成可能な面積を大きくしながら、撥水処理の効果を得る事が可能となる。尚、撥水処理を行う周辺部130が余りに狭いと、水溶性接着剤150が漏れた際に接着出来ない様にした効果がなくなるため、製造元基板100の製造元基板表面に於ける周辺部130は、製造元基板100の端面から1mm以上とする事が好ましい。一方で、周辺部130の範囲が広くなりすぎると製造元基板表面積が小さくなるので、10mm未満とする事が好ましい。撥水処理が安定し、撥水処理を行った効果が得られ、かつ製造元基板表面積を最大とするには、周辺部130に於ける所定の範囲を2mm以上6mm以下とする事がより好ましい。   In the present embodiment, the peripheral portion 130 on the manufacturer substrate surface of the manufacturer substrate 100 is in the range of 1 mm or more and 10 mm or less from the end surface of the manufacturer substrate 100. Accordingly, it is possible to obtain the effect of the water repellent treatment while increasing the area where the thin film element group 110 on the manufacturer substrate 100 can be formed. If the peripheral portion 130 to be subjected to the water repellent treatment is too narrow, the effect of preventing the water-soluble adhesive 150 from being bonded when the water-soluble adhesive 150 leaks is lost. Therefore, the peripheral portion 130 on the manufacturer substrate surface of the manufacturer substrate 100 is It is preferable that the distance is 1 mm or more from the end surface of the manufacturer substrate 100. On the other hand, if the range of the peripheral portion 130 becomes too wide, the surface area of the manufacturer's substrate becomes small. In order to stabilize the water repellent treatment, obtain the effect of performing the water repellent treatment, and maximize the manufacturer substrate surface area, it is more preferable to set the predetermined range in the peripheral portion 130 to 2 mm or more and 6 mm or less.

<4.補足>
尚、実施形態に於いては、製造元基板100の周辺部130、及び転写先基板200の周辺部230の双方に撥水処理を行っているが、此等の何れか一方に撥水処理を行ってもよい。又、親水処理も、製造元基板100の非周辺部、及び転写先基板200の非周辺部の双方に対して行っているが、何れか一方に対してのみ行ってもよい。更に、親水処理は必ずしも行わなくてもよい。
<4. Supplement>
In the embodiment, the water repellent treatment is performed on both the peripheral portion 130 of the manufacturer's substrate 100 and the peripheral portion 230 of the transfer destination substrate 200, but the water repellent treatment is performed on either one of these. May be. Further, although the hydrophilic treatment is performed on both the non-peripheral portion of the manufacturer substrate 100 and the non-peripheral portion of the transfer destination substrate 200, it may be performed only on one of them. Furthermore, the hydrophilic treatment is not necessarily performed.

又、親水処理と撥水処理を行う方法として、実施形態に於いては、製造元基板100及び転写先基板200の全面に親水処理を行った後、撥水処理を行うべき周辺部に対して撥水処理を行う例を挙げているが、これに限る趣旨ではない。つまり、例えば製造元基板100及び転写先基板200の全面に撥水処理を行った後に、それぞれの非周辺部に親水処理を行ってもよい。   Further, as a method of performing hydrophilic treatment and water repellent treatment, in the embodiment, after hydrophilic treatment is performed on the entire surface of the manufacturer substrate 100 and the transfer destination substrate 200, the peripheral portion to be subjected to the water repellent treatment is repelled. Although the example which performs a water treatment is given, it is not the meaning limited to this. That is, for example, after the water repellent treatment is performed on the entire surface of the manufacturer substrate 100 and the transfer destination substrate 200, the non-peripheral portions may be subjected to a hydrophilic treatment.

100……製造元基板、110……薄膜素子群、120……剥離層、130……周辺部、140……手段、150……水溶性接着剤、200……転写先基板、230……周辺部、300……ステージ、400……紫外線、500……レーザー光、600……第二転写先基板 DESCRIPTION OF SYMBOLS 100 ... Manufacturer substrate, 110 ... Thin film element group, 120 ... Release layer, 130 ... Peripheral part, 140 ... Means, 150 ... Water-soluble adhesive, 200 ... Transfer destination substrate, 230 ... Peripheral part , 300 ... Stage, 400 ... Ultraviolet light, 500 ... Laser light, 600 ... Second transfer destination substrate

Claims (13)

製造元基板表面に形成された薄膜素子群を転写先基板表面に転写する薄膜素子群の転写方法に於いて、
前記製造元基板の周辺部及び前記転写先基板の周辺部の少なくとも一方に撥水処理を行って撥水領域を作成する表面処理工程と、
前記製造元基板表面及び前記転写先基板表面の少なくとも一方に水溶性接着剤を塗布する接着剤塗布工程と、
前記製造元基板表面と前記転写先基板表面とを前記水溶性接着剤を介して対向させて配置する基板配置工程と、
前記水溶性接着剤を硬化させる接着剤硬化工程と、
前記製造元基板を前記転写先基板から剥離させる事に依って、前記薄膜素子群を前記転写先基板に転写する基板剥離工程と、を有する事を特徴とする薄膜素子群の転写方法。
In the thin film element group transfer method of transferring the thin film element group formed on the manufacturer's substrate surface to the transfer destination substrate surface,
A surface treatment step of creating a water-repellent region by performing water-repellent treatment on at least one of the peripheral portion of the manufacturer substrate and the peripheral portion of the transfer destination substrate;
An adhesive application step of applying a water-soluble adhesive to at least one of the manufacturer substrate surface and the transfer destination substrate surface;
A substrate placement step of placing the manufacturer substrate surface and the transfer destination substrate surface opposite to each other via the water-soluble adhesive;
An adhesive curing step for curing the water-soluble adhesive;
And a substrate peeling step of transferring the thin film element group to the transfer destination substrate by peeling the manufacturer substrate from the transfer destination substrate.
前記接着剤塗布工程では、前記製造元基板と前記転写先基板とで面積の小さい方の基板表面に水溶性接着剤を塗布し、
前記基板配置工程では、平面視に於いて、前記面積の小さい方の基板全面を覆い重ねる様に面積の大きい方の基板を配置する事を特徴とする請求項1に記載の薄膜素子群の転写方法。
In the adhesive application step, a water-soluble adhesive is applied to the substrate surface of the smaller area between the manufacturer substrate and the transfer destination substrate,
2. The thin film element group transfer according to claim 1, wherein, in the substrate placement step, the substrate having the larger area is arranged so as to cover the entire surface of the substrate having the smaller area in plan view. Method.
前記接着剤塗布工程前に前記面積の小さい方の基板表面に囲い込み手段を形成する囲み手段形成工程を有し、
前記囲い込み手段は前記基板配置工程時に前記撥水領域の内側で、且つ前記薄膜素子群を囲む様に形成され、
前記接着剤塗布工程では前記囲い込み手段の内側に前記水溶性接着剤を塗布する事を特徴とする請求項2に記載の薄膜素子群の転写方法。
An enclosing means forming step for forming an enclosing means on the surface of the smaller substrate before the adhesive application step;
The enclosing means is formed so as to surround the thin film element group inside the water-repellent region during the substrate arranging step.
3. The thin film element group transfer method according to claim 2, wherein in the adhesive application step, the water-soluble adhesive is applied to the inside of the enclosing means.
前記囲い込み手段は粘度が5000cps以上且つ50000cps以下の囲み用接着剤で形成される事を特徴とする請求項3に記載の薄膜素子群の転写方法。   4. The thin film element group transfer method according to claim 3, wherein the enclosing means is formed of an enclosing adhesive having a viscosity of 5000 cps or more and 50000 cps or less. 前記囲み用接着剤が粘着剤、シール剤、又は水溶性接着剤である事を特徴とする請求項3又は4に記載の薄膜素子群の転写方法。   The method for transferring a thin film element group according to claim 3 or 4, wherein the enclosing adhesive is a pressure-sensitive adhesive, a sealant, or a water-soluble adhesive. 前記基板配置工程の前に、前記面積の小さい方の基板よりも更に小さい面積の設置面を有するステージ上に前記面積の小さい方の基板を設置する基板設置工程を有する事を特徴とする請求項2乃至5の何れか1項に記載の薄膜素子群の転写方法。   The substrate placing step of placing the substrate having the smaller area on a stage having an installation surface having a smaller area than the substrate having the smaller area is provided before the substrate placing step. The method for transferring a thin film element group according to any one of 2 to 5. 前記接着剤塗布工程で塗布する前記水溶性接着剤は粘度が1cps以上且つ50cps以下である事を特徴とする請求項1乃至6の何れか1項に記載の薄膜素子群の転写方法。   The thin film element group transfer method according to any one of claims 1 to 6, wherein the water-soluble adhesive applied in the adhesive application step has a viscosity of 1 cps or more and 50 cps or less. 前記基板剥離工程の後に、前記薄膜素子群が転写された前記転写先基板表面と第二転写先基板表面とを対向させて、第二の接着剤を介在させて貼り合わせる第二接着工程と、
前記転写先基板を前記第二転写先基板から剥離させる事に依って、前記薄膜素子群を前記第二転写先基板に転写する第二転写工程と、
前記水溶性接着剤を除去する接着剤除去工程と、を有する事を特徴とする請求項1乃至7の何れか1項に記載の薄膜素子群の転写方法。
After the substrate peeling step, the second bonding step in which the transfer destination substrate surface to which the thin film element group has been transferred and the second transfer destination substrate surface are opposed to each other and the second adhesive is interposed therebetween, and
A second transfer step of transferring the thin film element group to the second transfer destination substrate by peeling the transfer destination substrate from the second transfer destination substrate;
The thin film element group transfer method according to any one of claims 1 to 7, further comprising an adhesive removing step of removing the water-soluble adhesive.
前記表面処理工程に於いて、前記製造元基板の周辺部と前記転写先基板の周辺部の双方に撥水処理を行う事を特徴とする請求項1乃至8の何れか1項に記載の薄膜素子群の転写方法。   9. The thin film element according to claim 1, wherein in the surface treatment step, water repellent treatment is performed on both a peripheral portion of the manufacturer substrate and a peripheral portion of the transfer destination substrate. Group transfer method. 前記表面処理工程が、前記製造元基板表面乃至は前記転写先基板表面に形成された前記撥水領域の外側に親水処理を施して親水領域を作成する工程を含む事を特徴とする請求項1乃至9の何れか1項に記載の薄膜素子群の転写方法。   The surface treatment step includes a step of creating a hydrophilic region by applying a hydrophilic treatment to the outside of the water-repellent region formed on the surface of the manufacturer substrate or the surface of the transfer destination substrate. 10. The method for transferring a thin film element group according to any one of 9 above. 前記撥水領域は前記製造元基板乃至は前記転写先基板の端面から1mm以上且つ10mm以下の範囲である事を特徴とする請求項1乃至10の何れか1項に記載の薄膜素子群の転写方法。   11. The thin film element group transfer method according to claim 1, wherein the water-repellent region is in a range of 1 mm or more and 10 mm or less from an end face of the manufacturer substrate or the transfer destination substrate. . 前記表面処理工程で行われる撥水処理としてフッ素プラズマ処理を行う事を特徴とする請求項1乃至11の何れか1項に記載の薄膜素子群の転写方法。   The method for transferring a thin film element group according to claim 1, wherein fluorine plasma treatment is performed as the water repellent treatment performed in the surface treatment step. 前記表面処理工程で行われる撥水処理として油脂の塗布を行う事を特徴とする請求項1乃至11の何れか1項に記載の薄膜素子群の転写方法。   The method for transferring a thin film element group according to any one of claims 1 to 11, wherein fats and oils are applied as the water repellent treatment performed in the surface treatment step.
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JP7181370B2 (en) 2016-08-31 2022-11-30 株式会社半導体エネルギー研究所 Manufacturing method of semiconductor device
KR20190048917A (en) * 2017-10-31 2019-05-09 이화여자대학교 산학협력단 Method of manufacturing electronic device and electronic device manufactured using the same
KR102030566B1 (en) * 2017-10-31 2019-10-10 이화여자대학교 산학협력단 Method of manufacturing electronic device and electronic device manufactured using the same
WO2022163425A1 (en) * 2021-01-29 2022-08-04 東京エレクトロン株式会社 Method for manufacturing chip-mounted substrate, and substrate processing device

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