JP2010245157A - Component for wiring and method of manufacturing the same, and electronic device package used by incorporating the component for wiring and method of manufacturing the same - Google Patents

Component for wiring and method of manufacturing the same, and electronic device package used by incorporating the component for wiring and method of manufacturing the same Download PDF

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JP2010245157A
JP2010245157A JP2009089998A JP2009089998A JP2010245157A JP 2010245157 A JP2010245157 A JP 2010245157A JP 2009089998 A JP2009089998 A JP 2009089998A JP 2009089998 A JP2009089998 A JP 2009089998A JP 2010245157 A JP2010245157 A JP 2010245157A
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substrate
electronic device
post electrode
wiring
device package
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Masamichi Ishihara
政道 石原
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Kyushu Institute of Technology NUC
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To integrate additional processes as components, of vertical wiring for forming a structure of an electronic device package, and to produce very simply and inexpensively by using conventionally-used normal manufacturing technique using die pressing. <P>SOLUTION: The component for wiring is used by being incorporated in an electronic device package including a circuit element containing a semiconductor chip arranged on a substrate with a wiring layer formed on an upper surface. The component for wiring includes a post electrode formed by half-punching a metal plate having a thickness equal to a height of the post electrode, and a half-punch plate connected to the post electrode via a joint part. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、ポスト電極を有する配線用部品及びその製造方法、並びに、該配線用部品を組み込んで、そのポスト電極を、上面に配線層を形成した基板上に配置した回路素子と外部電極に接続する電子デバイスパッケージ及びその製造方法に関する。   The present invention relates to a wiring component having a post electrode, a method of manufacturing the wiring component, and a circuit element in which the wiring component is incorporated and disposed on a substrate having a wiring layer formed on the upper surface and an external electrode. The present invention relates to an electronic device package and a manufacturing method thereof.

外部電極をおもて面に配置した電子デバイスパッケージ構造のように、LSIチップ搭載基板から離れて他方に電極を取り出す場合や、或いはウエハレベルチップサイズパッケージのようにLSIチップの能動面から離れて他方に電極を取り出す場合は、基板と離れて電極を取り出すための少なくとも垂直配線を含めた構造が必要である。   When the electrode is taken away from the LSI chip mounting substrate as in the electronic device package structure in which the external electrode is arranged on the front surface, or away from the active surface of the LSI chip as in the wafer level chip size package On the other hand, when an electrode is taken out, a structure including at least a vertical wiring for taking out the electrode apart from the substrate is necessary.

このために、特許文献1は、部品化した配線用部品を半導体基板上の所定位置に接続することにより、配線する技術を開示する。図13及び図14は、特許文献1に開示の電子デバイスパッケージを説明する図であり、図13は、その製造途中の断面図であり、図14は、完成した状態で示す断面図である。図13に示すように、導電性材料の支持板に電鋳法により水平配線部(再配線)及びポスト電極を成長させて、支持板と一体に連結した配線用部品を形成する。そして、この配線用部品を、半導体基板(多層有機基板)おもて面に形成した配線層上の所定位置に接続する。この後、図14に示すように、回路素子(LSIチップ)を覆う樹脂を充填して樹脂封止した後、支持板を剥がすことにより電気的には個々の水平配線部及びポスト電極に分離して構成する。これによって、簡潔に、しかもコスト的にも安く外部電極をおもて面に配置した電子デバイスパッケージを製造することが可能となる。   For this purpose, Patent Document 1 discloses a technique for wiring by connecting a component for wiring to a predetermined position on a semiconductor substrate. 13 and 14 are diagrams for explaining the electronic device package disclosed in Patent Document 1, FIG. 13 is a cross-sectional view in the middle of its manufacture, and FIG. 14 is a cross-sectional view shown in a completed state. As shown in FIG. 13, horizontal wiring parts (rewiring) and post electrodes are grown on a support plate made of a conductive material by electroforming, thereby forming wiring components integrally connected to the support plate. Then, this wiring component is connected to a predetermined position on the wiring layer formed on the front surface of the semiconductor substrate (multilayer organic substrate). Thereafter, as shown in FIG. 14, after filling the resin covering the circuit element (LSI chip) and sealing the resin, the support plate is peeled off to electrically separate the individual horizontal wiring portion and the post electrode. Configure. As a result, it is possible to manufacture an electronic device package in which external electrodes are arranged on the front surface in a simple and inexpensive manner.

このように、電子デバイスパッケージ構造形成のための垂直配線の追加工程を部品として集約させ、工程を簡素化し部品は専門メーカに任せることでコスト低減を実現することができる。この部品化によりウエハレベルチップサイズパッケージなどは前工程に近い設備が必要な工程をオフラインで部品に集約することができ、これによって、後工程メーカも大きな投資の必要なく参入できることになる。   In this way, the cost reduction can be realized by integrating the additional process of the vertical wiring for forming the electronic device package structure as a part, simplifying the process, and leaving the part to a specialized manufacturer. This componentization allows wafer level chip size packages and the like to consolidate processes that require equipment close to the previous process into parts offline, and this allows post-process manufacturers to enter without a large investment.

しかし、例示の配線用部品を製造するための電鋳法は非常に優れた方法ではあるものの、電鋳法自体にはノウハウが多く、現状では製造業者が限られているという問題がある。   However, although the electroforming method for manufacturing the illustrated wiring component is a very excellent method, there is a problem that the electroforming method itself has a lot of know-how and the number of manufacturers is limited at present.

なお、特許文献2には、従来より用いられている金型プレスを使う通常の製造技術をターミナルランドフレームの製造に適用した例が開示されている。   Patent Document 2 discloses an example in which a conventional manufacturing technique using a conventionally used mold press is applied to manufacturing a terminal land frame.

国際公開WO2008/065896 A1International Publication WO2008 / 065896 A1 特許第3422276号公報Japanese Patent No. 3422276

本発明は、係る問題点を解決して、電子デバイスパッケージ構造形成のための垂直配線の追加工程を部品として集約させることを目的としている。   An object of the present invention is to solve such problems and to integrate vertical wiring additional steps for forming an electronic device package structure as parts.

また、本発明は、電子デバイスパッケージに用いる配線用部品を、電鋳法を用いることなく従来より用いられている金型プレスを使う通常の製造技術を用いて極めてシンプルに低コストで作成可能にすることを目的としている。   In addition, the present invention makes it possible to produce wiring parts used in electronic device packages very simply and at low cost by using a conventional manufacturing technique using a conventionally used die press without using an electroforming method. The purpose is to do.

本発明の配線用部品は、上面に配線層を形成した基板上に半導体チップを含む回路素子を配置した電子デバイスパッケージに組み込んで用いられて、この回路素子と外部電極に接続されるポスト電極を有する。この配線用部品は、ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより形成されたポスト電極と、該ポスト電極と繋ぎ部を介して連結した半抜き板とから成る。   The wiring component of the present invention is used by being incorporated in an electronic device package in which a circuit element including a semiconductor chip is arranged on a substrate having a wiring layer formed on an upper surface, and a post electrode connected to the circuit element and an external electrode is used. Have. The wiring component includes a post electrode formed by punching a metal plate having a thickness equal to the height of the post electrode, and a half punched plate connected to the post electrode via a connecting portion. .

本発明の電子デバイスパッケージは、上面に配線層を形成した基板上に半導体チップを含む回路素子を配置して、該回路素子と外部電極に接続されるポスト電極が内在する。この基板は、配線層を有するガラス基板又は光透過性の良い透明樹脂基板であり、かつ、該基板の上に搭載して接続される半導体チップが、イメージセンサチップである。この基板上の配線層に、ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより形成したポスト電極の一端が接続され、かつ、そのポスト電極の他端が、外部電極に接続されて、イメージセンサチップパッケージとして機能する。   In the electronic device package of the present invention, a circuit element including a semiconductor chip is arranged on a substrate having a wiring layer formed on the upper surface, and a post electrode connected to the circuit element and an external electrode is included. This substrate is a glass substrate having a wiring layer or a transparent resin substrate having good light transmittance, and a semiconductor chip mounted on and connected to the substrate is an image sensor chip. One end of the post electrode formed by punching out from a metal plate having a thickness equal to the height of the post electrode is connected to the wiring layer on the substrate, and the other end of the post electrode is connected to the external electrode. To function as an image sensor chip package.

また、本発明の電子デバイスパッケージにおいて、基板は、ヒートシンクとして機能する高放熱基板であり、かつ、該基板の上に搭載して接続される半導体チップが、高放熱型のLSIチップである。この基板上の配線層に、ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより形成したポスト電極の一端が接続され、かつ、そのポスト電極の他端が、外部電極に接続されて、高放熱型チップパッケージとして機能する。   In the electronic device package of the present invention, the substrate is a high heat dissipation substrate functioning as a heat sink, and the semiconductor chip mounted and connected on the substrate is a high heat dissipation LSI chip. One end of the post electrode formed by punching out from a metal plate having a thickness equal to the height of the post electrode is connected to the wiring layer on the substrate, and the other end of the post electrode is connected to the external electrode. And function as a high heat dissipation type chip package.

また、本発明の電子デバイスパッケージの製造方法は、基板上に配線層を形成し、ポスト電極の高さに等しい板厚を有する金属板から、ポスト電極を半抜きに打ち抜くことにより、ポスト電極と、該ポスト電極と繋ぎ部を介して連結した半抜き板からなる配線用部品を形成し、この配線用部品のポスト電極を基板上の配線層に接続した後、半抜き板を引き剥がす。   Further, the method for manufacturing an electronic device package of the present invention includes forming a wiring layer on a substrate and punching the post electrode halfway from a metal plate having a plate thickness equal to the height of the post electrode. Then, after forming a wiring component composed of a half-cut plate connected to the post electrode through a connecting portion, connecting the post electrode of the wiring component to the wiring layer on the substrate, the half-cut plate is peeled off.

本発明によれば、電子デバイスパッケージ形成のための垂直配線の追加工程を部品として集約させることができる。   According to the present invention, it is possible to consolidate the additional process of the vertical wiring for forming the electronic device package as a part.

また、本発明は、電子デバイスパッケージに用いる配線用部品を、電鋳法を用いることなく従来より用いられている金型プレスを使う通常の製造技術を用いて極めてシンプルに低コストで作成することができる。   In addition, the present invention makes it possible to produce wiring components used in electronic device packages extremely simply and at low cost by using a normal manufacturing technique using a conventionally used die press without using an electroforming method. Can do.

また、本発明によれば、簡易な方法で、イメージセンサあるいは高放熱のパッケージのような基板と反対側に電極を取り出す必要のある半導体パッケージを製作できる。半導体基板に貫通孔を開けて金属材料を充填する貫通配線技術の必要も無く、半導体基板と反対側に容易に電極を取り出し、かつ配線することができる。   In addition, according to the present invention, it is possible to manufacture a semiconductor package that requires an electrode to be taken out on the opposite side of the substrate, such as an image sensor or a high heat dissipation package, by a simple method. There is no need for through wiring technology in which a through hole is formed in a semiconductor substrate and filled with a metal material, and an electrode can be easily taken out and wired on the opposite side of the semiconductor substrate.

本発明に基づき構成した電子デバイスパッケージの第1の例を示す図である。It is a figure which shows the 1st example of the electronic device package comprised based on this invention. 配線用部品を示す図であり、(A)は斜視図を、(B)はラインX-X’で切断した断面図をそれぞれ示している。It is a figure which shows the components for wiring, (A) is a perspective view, (B) has shown sectional drawing cut | disconnected by line X-X ', respectively. 半抜き状態を示す断面の顕微鏡写真である。It is a microscope picture of the section which shows a half punching state. 基板上に、電子部品として半導体チップ(LSIチップ)を接着し、かつ接続した状態で示す図であり、(A)は断面図を、(B)は斜視図を示している。2A and 2B are diagrams showing a state in which a semiconductor chip (LSI chip) is bonded and connected as an electronic component on a substrate, FIG. 3A is a cross-sectional view, and FIG. 半導体LSIチップを装着した基板上に、上述の配線用部品を接続した状態で示す図である。It is a figure shown in the state which connected the above-mentioned wiring component on the board | substrate with which the semiconductor LSI chip was mounted | worn. 樹脂封止した状態で示す図である。It is a figure shown in the state sealed with resin. 本発明に基づき構成した電子デバイスパッケージの第2の例を示す図である。It is a figure which shows the 2nd example of the electronic device package comprised based on this invention. 配線層を有するガラス基板又はヒートシンクとして機能する高放熱基板の上に、イメージセンサ又は高放熱型のLSIチップのような電子部品が搭載されて接続された状態で示す図である。FIG. 3 is a view showing a state in which an electronic component such as an image sensor or a high heat dissipation type LSI chip is mounted and connected on a glass substrate having a wiring layer or a high heat dissipation substrate functioning as a heat sink. 基板上に配線用部品を接続、固定した状態で示す図である。It is a figure shown in the state which connected and fixed the components for wiring on the board | substrate. 完成したイメージセンサチップパッケージ(又は高放熱型チップパッケージ)を示す図である。It is a figure which shows the completed image sensor chip package (or high heat dissipation type | mold chip package). (A)は、上層電子デバイスパッケージを、(B)は、下層電子デバイスパッケージを、(C)は、(A)及び(B)に示す両電子デバイスパッケージを上下に接続して構成した二層構成の半導体パッケージを例示する図である。(A) is an upper-layer electronic device package, (B) is a lower-layer electronic device package, (C) is a two-layer structure in which both electronic device packages shown in (A) and (B) are connected vertically. It is a figure which illustrates the semiconductor package of a structure. (A)は、基板を、(B)は、中層電子デバイスパッケージを、(C)は、下層電子デバイスパッケージを、(D)は、(A)〜(C)に示す構成を上下に接続して構成した三層構成の半導体パッケージを例示する図である。(A) is a substrate, (B) is a middle-layer electronic device package, (C) is a lower-layer electronic device package, and (D) is a vertical connection of the configurations shown in (A) to (C). It is a figure which illustrates the semiconductor package of the 3 layer structure comprised in this way. 特許文献1に開示の電子デバイスパッケージを説明する図であり、その製造途中の断面図である。It is a figure explaining the electronic device package disclosed by patent document 1, and is sectional drawing in the middle of the manufacture. 特許文献1に開示の電子デバイスパッケージを説明する図であり、完成した状態で示す断面図である。It is a figure explaining the electronic device package disclosed by patent document 1, and is sectional drawing shown in the completed state.

以下、例示に基づき、本発明の配線用部品及びその製造方法を、順を追って説明する。図1は、本発明に基づき構成した電子デバイスパッケージの第1の例を示す図である。上面に配線層を形成した基板上に、電子部品として半導体チップ(LSIチップ)を接着し、かつ接続する。この配線層には、ポスト電極の高さに等しい板厚を有する金属板(銅板)から半抜きに打ち抜いた後、半抜き板を引き剥がすことにより形成したポスト電極が接続されている。必要に応じて、基板上面を樹脂封止し、樹脂封止の外部に露出したポスト電極の先端を外部電極として利用する。また、基板を貫通する貫通配線を設けて、その一端を基板上面の配線層に接続すると共に、他端を基板裏面に導いて、ここで、他の電子デバイスパッケージ等と接続可能の接続部(図示省略)を形成することができる。   Hereinafter, the wiring component and the manufacturing method thereof according to the present invention will be described step by step based on examples. FIG. 1 is a diagram showing a first example of an electronic device package configured according to the present invention. A semiconductor chip (LSI chip) is bonded and connected as an electronic component on a substrate having a wiring layer formed on the upper surface. The wiring layer is connected to a post electrode formed by punching out a half-cut plate after being punched out from a metal plate (copper plate) having a plate thickness equal to the height of the post electrode. If necessary, the top surface of the substrate is resin-sealed, and the tip of the post electrode exposed outside the resin seal is used as the external electrode. Also, through wiring that penetrates the substrate is provided, one end of which is connected to the wiring layer on the top surface of the substrate, and the other end is led to the back surface of the substrate. (Not shown) can be formed.

次に、このような電子デバイスパッケージの第1の例の製造について、図2〜図6を参照して、順次説明する。図2は、配線用部品を示す図であり、(A)は斜視図を、(B)はラインX-X’で切断した断面図をそれぞれ示している。図2は、1個の単体パターンを例示するが、実際の製造においては、多数個一体に連結された状態で作成され、その状態で電子デバイスパッケージに組み込んで製造した後、個々のチップに切断して切り分ける個片化を経て、最終製品として完成する。この配線用部品は、ポスト電極の高さに等しい板厚を有する金属板(銅板)から、ポスト電極を半抜きに打ち抜く。即ち、完全に打ち抜かずに、部分的な打ち抜きで止める。この段階ではまだポスト電極は、繋ぎ部を介して、半抜き板と連結している。ポスト電極以外の金属板部分(以下、「半抜き板」という)は、電子デバイスパッケージ製造中に、複数個の水平配線部及びポスト電極を一体に結合するよう機能する。半抜き板は、電子デバイスパッケージ製造のための樹脂封止工程後に、引き剥がして除去される。   Next, the manufacture of the first example of such an electronic device package will be sequentially described with reference to FIGS. 2A and 2B are diagrams showing wiring components, where FIG. 2A shows a perspective view and FIG. 2B shows a cross-sectional view taken along line X-X ′. FIG. 2 illustrates a single unit pattern. In actual manufacturing, a single unit pattern is formed in a state of being connected to one another, manufactured in an electronic device package in that state, and then cut into individual chips. After being cut into individual pieces, it is completed as a final product. In this wiring component, a post electrode is punched out from a metal plate (copper plate) having a plate thickness equal to the height of the post electrode. That is, it is stopped by partial punching without completely punching. At this stage, the post electrode is still connected to the half-cut plate through the connecting portion. Metal plate portions other than the post electrodes (hereinafter referred to as “half-cut plates”) function to integrally couple a plurality of horizontal wiring portions and post electrodes during the manufacture of the electronic device package. The half punched plate is peeled off and removed after the resin sealing step for manufacturing the electronic device package.

図3は、半抜き状態を示す断面の顕微鏡写真である。図中の上側に示す段差部をさらに拡大して、下側に示している。ポスト電極と半抜き板の繋ぎ部には、切れ目が生じており、容易に引き剥がし可能になっていることが分かる。   FIG. 3 is a cross-sectional photomicrograph showing the half-blanked state. The step portion shown on the upper side in the figure is further enlarged and shown on the lower side. It can be seen that there is a break at the joint between the post electrode and the half-cut plate, and it can be easily peeled off.

図4は、基板上に、電子部品として半導体チップ(LSIチップ)を接着し、かつ接続した状態で示す図であり、(A)は断面図を、(B)は斜視図を示している。例示の基板は、上面に配線層を形成したシリコン基板(半導体基板)として例示している。   4A and 4B are diagrams showing a state in which a semiconductor chip (LSI chip) is bonded and connected as an electronic component on a substrate, where FIG. 4A shows a cross-sectional view and FIG. 4B shows a perspective view. The illustrated substrate is exemplified as a silicon substrate (semiconductor substrate) having a wiring layer formed on the upper surface.

半導体基板上に配線層を形成するために、半導体基板の全面に、配線パターンとなるべき金属のシード層を形成する(例えばスパッタ層あるいはナノ金属材料を塗膜)。このシード層としては、例えば、銅メッキを可能とする金、銀、銅、パラジューム箔を用いることができる。配線層のパターンはシード層の上にレジストを塗布し、パターンを露光、現像してさらにエッチングを行い、レジストを除去して完成させる。このシード層の上にメッキにより配線層を成長させる。或いは、ナノ金属粒子で直接シード層をパターニングにしてリソグラフィ工程を省略することもできる。この直接パターニングは、有機溶媒中に銅等のナノ金属粒子を含有させて、それをプリンターで実用されているインクジェット法で所望のパターンを描く方法である。   In order to form a wiring layer on the semiconductor substrate, a metal seed layer to be a wiring pattern is formed on the entire surface of the semiconductor substrate (for example, a sputtered layer or a nano metal material is coated). As the seed layer, for example, gold, silver, copper, or palladium foil that enables copper plating can be used. The wiring layer pattern is completed by applying a resist on the seed layer, exposing and developing the pattern, further etching, removing the resist. A wiring layer is grown on the seed layer by plating. Alternatively, the lithography process can be omitted by patterning the seed layer directly with nano metal particles. This direct patterning is a method in which nano metal particles such as copper are contained in an organic solvent and a desired pattern is drawn by an ink jet method which is practically used in a printer.

半導体LSIチップは、基板上の配線層とはフリップチップボンド接続するものとして例示している。このフリップチップボンド接続に代えて、基板上の配線層に、ボンディングワイヤ接続電極となるボンディング用金属パッド部を形成して、ボンディングワイヤにより接続することも可能である。この場合、配線層上の金属パッド部と半導体LSIチップは、例えば、Auボンディングワイヤにより接続される。   The semiconductor LSI chip is illustrated as being flip-chip bonded to the wiring layer on the substrate. Instead of this flip chip bond connection, it is also possible to form a bonding metal pad portion to be a bonding wire connection electrode on the wiring layer on the substrate and connect it by a bonding wire. In this case, the metal pad portion on the wiring layer and the semiconductor LSI chip are connected by, for example, an Au bonding wire.

図5は、半導体LSIチップを装着した基板上に、上述の配線用部品を接続した状態で示す図である。基板上面に形成した配線層の所定の位置には、配線用部品のポスト電極が固定され、かつ電気的に接続される。ポスト電極を固定及び接続する手法としては、(1)超音波による接合、(2)銀ペースト等の導電性ペーストによる接続、(3)半田接続、(4)半導体基板側に設けた接続電極用金属パッド部に凹部を設ける一方、配線用部品側は凸部を設けて挿入圧着あるいは挿入してカシメる方法、により行うことができる。   FIG. 5 is a diagram showing a state in which the above-described wiring components are connected to a substrate on which a semiconductor LSI chip is mounted. A post electrode of a wiring component is fixed and electrically connected to a predetermined position of the wiring layer formed on the upper surface of the substrate. As a method for fixing and connecting the post electrode, (1) ultrasonic bonding, (2) connection using a conductive paste such as silver paste, (3) solder connection, (4) connection electrode provided on the semiconductor substrate side While the metal pad portion is provided with a concave portion, the wiring component side can be formed by a method of providing a convex portion and inserting / crimping or inserting and crimping.

図6は、樹脂封止した状態で示す図である。一体に連結されているポスト電極が配線層の所定の位置に固定された後、この状態で、必要に応じて、基板の上面は、半抜き板下面までトランスファーモールドされ、或いは液状樹脂(材質は、例えばエポキシ系)を用いて樹脂封止される。   FIG. 6 is a diagram showing the resin-sealed state. After the integrally connected post electrodes are fixed at predetermined positions on the wiring layer, the upper surface of the substrate is transfer-molded to the lower surface of the half-cut plate, or a liquid resin (material is used) in this state as necessary. For example, epoxy-based).

この後、半抜き板を引き剥がした後の状態で示したのが上述の図1に示した電子デバイスパッケージである。半抜き板は、単なる引き剥がしで可能であるが、さらに、引き剥がし力低減のために全面エッチング工程を追加することもできる。配線部品を、図6の上方から全面エッチングすることによって、ポスト電極と半抜き板の繋ぎ部の厚みをより薄くすることができる。全面エッチングであるため他の部分もエッチングされるが、半抜き板との繋ぎ部の厚みが一番薄くなっており、その薄い部分がさらに両サイドからエッチングされることによって一層薄くなることによって、引き剥がしが容易となる。おもて面側においては、ポスト電極の先端に、或いは、おもて面側の封止樹脂の上に上面配線を設けて、この上面配線を介してポスト電極先端とは異なる位置に外部電極(バンプ電極)を設けることができる。   Thereafter, the electronic device package shown in FIG. 1 is shown in a state after the half-cut plate is peeled off. The half-cut plate can be simply peeled off, but an entire surface etching process can be added to reduce the peeling force. By etching the entire surface of the wiring component from above in FIG. 6, the thickness of the connecting portion between the post electrode and the half-cut plate can be further reduced. Other parts are also etched because it is a full-surface etching, but the thickness of the connecting part with the half-cut plate is the thinnest, and the thin part is further thinned by etching from both sides, It becomes easy to peel off. On the front surface side, an upper surface wiring is provided at the tip of the post electrode or on the sealing resin on the front surface side, and the external electrode is located at a position different from the tip of the post electrode through the upper surface wiring. (Bump electrode) can be provided.

図7は、本発明に基づき構成した電子デバイスパッケージの第2の例を示す図である。第2の例は、第1の例の電子デバイスパッケージ(図1参照)の基板裏面に、外部電極(バンプ電極)を備えたものである。このバンプ電極は、基板を貫通する貫通配線を通して、基板上面の配線層に接続される。或いは、バンプ電極を備えること無く、この貫通配線は裏面側に形成された端面電極部であるランドに接続することもできる。   FIG. 7 is a diagram showing a second example of an electronic device package configured according to the present invention. In the second example, external electrodes (bump electrodes) are provided on the back surface of the substrate of the electronic device package (see FIG. 1) of the first example. The bump electrode is connected to the wiring layer on the upper surface of the substrate through a through wiring penetrating the substrate. Alternatively, the through wiring can be connected to a land which is an end surface electrode portion formed on the back surface side without providing a bump electrode.

図4を参照して説明したように、第1の例(及び第2の例)は、基板として半導体シリコン基板を用いる場合を例として説明したが、このような基板としては、特許文献2に開示のような多層有機基板とか或いはリードフレームを用いることも可能である。多層有機基板を用いた際には、スルーホール内部の導体層を介して基板上面の配線層に接続される外部電極を、基板裏面側においても容易に形成することができる。多層有機基板は、複数層から成る基板の各層に、それぞれ配線パターンを形成した後これらの基板を貼り合わせ、必要に応じて各層の配線パターンを接続するためのスルーホールを形成したものである。このスルーホールの内部には導体層が形成され、この導体層が裏面側に形成された端面電極部であるランドと接続されている。   As described with reference to FIG. 4, the first example (and the second example) has been described using an example in which a semiconductor silicon substrate is used as the substrate. It is also possible to use a multilayer organic substrate as disclosed or a lead frame. When a multilayer organic substrate is used, the external electrode connected to the wiring layer on the upper surface of the substrate via the conductor layer inside the through hole can be easily formed on the back surface side of the substrate. The multilayer organic substrate is a substrate in which a wiring pattern is formed on each layer of a substrate composed of a plurality of layers, and then these substrates are bonded together, and through holes for connecting the wiring patterns of each layer are formed as necessary. A conductor layer is formed inside the through hole, and the conductor layer is connected to a land which is an end face electrode portion formed on the back surface side.

このように、本発明は、例示の配線用部品を用いることにより、おもて面側のポスト電極(或いはそれに接続された水平配線部)に接続された外部電極を形成すること、さらには、裏面側にも外部電極を形成することが容易に可能になる。   As described above, the present invention forms an external electrode connected to the front surface side post electrode (or a horizontal wiring portion connected thereto) by using the exemplified wiring component, It is possible to easily form an external electrode also on the back side.

次に、本発明の電子デバイスパッケージをイメージセンサチップパッケージ又は高放熱型チップパッケージに用いた場合を、図8〜図10を参照して説明する。図8は、配線層を有するガラス基板(又は光透過性の良い透明樹脂基板)又はヒートシンクとして機能する高放熱基板の上に、イメージセンサ又は高放熱型のLSIチップのような電子部品が搭載されて接続された状態で示す図である。イメージセンサの場合は、受光面を下側に向けて配置する。透明ガラス基板上の配線層は、図4を参照して上述した半導体基板上の配線層と同様な方法で形成することができる。ガラス基板に形成した配線層をボンディングパッド領域として、イメージセンサ(半導体LSIチップ)のような電子部品を固定しかつ電気的に接続する。   Next, the case where the electronic device package of the present invention is used for an image sensor chip package or a high heat dissipation type chip package will be described with reference to FIGS. In FIG. 8, an electronic component such as an image sensor or a high heat dissipation type LSI chip is mounted on a glass substrate having a wiring layer (or a transparent resin substrate having good light transmission) or a high heat dissipation substrate functioning as a heat sink. FIG. In the case of an image sensor, the light receiving surface is arranged facing downward. The wiring layer on the transparent glass substrate can be formed by the same method as the wiring layer on the semiconductor substrate described above with reference to FIG. An electronic component such as an image sensor (semiconductor LSI chip) is fixed and electrically connected using a wiring layer formed on a glass substrate as a bonding pad region.

図9は、基板上に配線用部品を接続、固定した状態で示す図である。この接続は、図5を参照して前述したように行う。   FIG. 9 is a diagram showing a state in which wiring components are connected and fixed on the substrate. This connection is performed as described above with reference to FIG.

図10は、完成したイメージセンサチップパッケージ(又は高放熱型チップパッケージ)を示す図である。樹脂封止後、半抜き板を引き剥がし、その後、ポスト電極の先端に外部電極を形成した状態で示している。前述したようにして、ガラス基板と半抜き板の間の空間を満たすようにトランスファーモールドされ、或いは液状樹脂(材質は、例えばエポキシ系)を用いて樹脂封止される。この後、半抜き板は、引き剥がされる。さらに、おもて面側においては、ポスト電極の先端に外部電極(バンプ電極)を設ける。或いは、おもて面側に上面配線を設けて、この上面配線を介してポスト電極先端とは異なる位置に外部電極(バンプ電極)を設ける。この後、個々のチップに切断して切り分ける個片化を経た後に、製品として、イメージセンサチップパッケージ又は高放熱型チップパッケージが完成する。これによって、配線層を有するガラス基板(又は光透過性の良い透明樹脂基板)又はヒートシンクとして機能する高放熱基板の上に、イメージセンサ又は高放熱型のLSIチップのような電子部品が実装されて、貫通電極の必要なく、基板とは反対側のおもて面に外部電極を形成したイメージセンサチップパッケージ又は高放熱型チップパッケージが完成する。   FIG. 10 is a view showing a completed image sensor chip package (or a high heat dissipation type chip package). After the resin sealing, the half-cut plate is peeled off, and then the external electrode is formed at the tip of the post electrode. As described above, transfer molding is performed so as to fill the space between the glass substrate and the half-cut plate, or resin sealing is performed using a liquid resin (a material is, for example, an epoxy type). Thereafter, the half-cut plate is peeled off. Further, on the front surface side, an external electrode (bump electrode) is provided at the tip of the post electrode. Alternatively, an upper surface wiring is provided on the front surface side, and an external electrode (bump electrode) is provided at a position different from the tip of the post electrode via the upper surface wiring. Thereafter, after being cut into individual chips and separated into individual pieces, an image sensor chip package or a high heat dissipation type chip package is completed as a product. As a result, an electronic component such as an image sensor or a high heat dissipation type LSI chip is mounted on a glass substrate having a wiring layer (or a transparent resin substrate with good light transmission) or a high heat dissipation substrate functioning as a heat sink. An image sensor chip package or a high heat dissipation type chip package in which external electrodes are formed on the front surface opposite to the substrate without the need for through electrodes is completed.

次に、本発明の電子デバイスパッケージを二層構成の半導体パッケージに用いた場合を、図11を参照して説明する。図11(A)は、上層電子デバイスパッケージを、(B)は、下層電子デバイスパッケージを、(C)は、(A)及び(B)に示す両電子デバイスパッケージを上下に接続して構成した二層構成の半導体パッケージを例示している。図11(A)に示す電子デバイスパッケージは、図1に例示したような構成を有している。基板裏面に外部電極は形成していないが、下層電子デバイスパッケージのポスト電極に接続される端面電極部は備えている。この端面電極部は、基板を貫通して基板上面の配線層に接続されている。(B)に示した下層電子デバイスパッケージは、基板裏面に外部電極を有するタイプの電子デバイスパッケージ(図7参照)である。このような(A)及び(B)に示す両電子デバイスパッケージを上下に接続することにより、(C)に示すような二層構成の半導体パッケージが構成される。このように、本発明の電子デバイスパッケージを用いれば、二層構成の半導体パッケージが容易に構成される。   Next, the case where the electronic device package of the present invention is used for a semiconductor package having a two-layer structure will be described with reference to FIG. 11A shows an upper-layer electronic device package, FIG. 11B shows a lower-layer electronic device package, and FIG. 11C shows a configuration in which both electronic device packages shown in FIGS. A two-layer semiconductor package is illustrated. The electronic device package illustrated in FIG. 11A has a configuration illustrated in FIG. External electrodes are not formed on the back surface of the substrate, but end face electrode portions connected to the post electrodes of the lower layer electronic device package are provided. The end face electrode portion penetrates the substrate and is connected to the wiring layer on the upper surface of the substrate. The lower layer electronic device package shown in (B) is an electronic device package (see FIG. 7) of a type having an external electrode on the back surface of the substrate. By connecting both electronic device packages shown in (A) and (B) above and below, a semiconductor package having a two-layer structure as shown in (C) is formed. As described above, when the electronic device package of the present invention is used, a two-layered semiconductor package can be easily configured.

次に、本発明の電子デバイスパッケージを三層構成の半導体パッケージに用いた場合を、図12を参照して説明する。図12(A)は、基板を、(B)は、中層電子デバイスパッケージを、(C)は、下層電子デバイスパッケージを、(D)は、(A)〜(C)に示す構成を上下に接続して構成した三層構成の半導体パッケージを例示している。図12(A)に示す基板は、上面配線層、及び該配線層に接続される貫通配線などを備えることができ、さらに、(B)に示す電子デバイスパッケージのように、上面配線層の上には、電子回路素子を接続することもできる。また、図12(B)に示す中層電子デバイスパッケージは、図1に例示したような構成を有しているが、樹脂封止しないものとして例示している。基板裏面に外部電極は形成していないが、下層電子デバイスパッケージのポスト電極に接続される端面電極部(図示省略)は備えている。この端面電極部は、基板を貫通して基板上面の配線層に接続されている。また、電子部品の例として、抵抗及びICを備えている。(C)に示した下層電子デバイスパッケージは、基板裏面に外部電極を有するタイプの電子デバイスパッケージ(図7参照)である。このように、本発明の電子デバイスパッケージを用いれば、三層構成の半導体パッケージが容易に構成される。
Next, the case where the electronic device package of the present invention is used in a three-layer semiconductor package will be described with reference to FIG. 12A shows the substrate, FIG. 12B shows the middle-layer electronic device package, FIG. 12C shows the lower-layer electronic device package, and FIG. 12D shows the configuration shown in FIGS. A semiconductor package having a three-layer structure formed by connecting is illustrated. The substrate shown in FIG. 12A can include an upper surface wiring layer, a through wiring connected to the wiring layer, and the like. Further, like the electronic device package shown in FIG. An electronic circuit element can also be connected. In addition, the middle-layer electronic device package shown in FIG. 12B has the configuration illustrated in FIG. 1 but is illustrated as not being resin-sealed. Although no external electrode is formed on the back surface of the substrate, an end face electrode portion (not shown) connected to the post electrode of the lower layer electronic device package is provided. The end face electrode portion penetrates the substrate and is connected to the wiring layer on the upper surface of the substrate. Moreover, a resistor and an IC are provided as examples of electronic components. The lower layer electronic device package shown in (C) is an electronic device package (see FIG. 7) of a type having an external electrode on the back surface of the substrate. As described above, if the electronic device package of the present invention is used, a three-layer semiconductor package can be easily configured.

Claims (11)

上面に配線層を形成した基板上に半導体チップを含む回路素子を配置した電子デバイスパッケージに組み込んで用いられて、該回路素子と外部電極に接続されるポスト電極を有する配線用部品において、
前記ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより形成されたポスト電極と、該ポスト電極と繋ぎ部を介して連結した半抜き板とから成る配線用部品。
In a wiring component having a post electrode connected to the circuit element and an external electrode, which is used by being incorporated in an electronic device package in which a circuit element including a semiconductor chip is arranged on a substrate having a wiring layer formed on the upper surface,
A wiring component comprising a post electrode formed by punching out from a metal plate having a thickness equal to the height of the post electrode, and a half punched plate connected to the post electrode through a connecting portion.
上面に配線層を形成した基板上に半導体チップを含む回路素子を配置した電子デバイスパッケージに組み込んで用いられて、該回路素子と外部電極に接続されるポスト電極を有する配線用部品の製造方法において、
前記ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより、ポスト電極と、該ポスト電極と繋ぎ部を介して連結した半抜き板とを形成することから成る配線用部品の製造方法。
In a method for manufacturing a wiring component having a post electrode connected to an external electrode and used in an electronic device package in which a circuit element including a semiconductor chip is disposed on a substrate having a wiring layer formed on an upper surface ,
A wiring component comprising: forming a post electrode and a half punched plate connected to the post electrode through a connecting portion by punching in half from a metal plate having a thickness equal to the height of the post electrode. Manufacturing method.
上面に配線層を形成した基板上に半導体チップを含む回路素子を配置して、該回路素子と外部電極に接続されるポスト電極が内在する電子デバイスパッケージにおいて、
前記基板は、配線層を有するガラス基板又は光透過性の良い透明樹脂基板であり、かつ、該基板の上に搭載して接続される半導体チップが、イメージセンサチップであり、
前記基板上の配線層に、ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより形成したポスト電極の一端が接続され、かつ、そのポスト電極の他端が、前記外部電極に接続されたことから成るイメージセンサチップパッケージとして機能する電子デバイスパッケージ。
In an electronic device package in which a circuit element including a semiconductor chip is disposed on a substrate having a wiring layer formed on an upper surface, and a post electrode connected to the circuit element and an external electrode is present,
The substrate is a glass substrate having a wiring layer or a transparent resin substrate with good light transmission, and a semiconductor chip mounted and connected on the substrate is an image sensor chip,
One end of a post electrode formed by punching in half from a metal plate having a thickness equal to the height of the post electrode is connected to the wiring layer on the substrate, and the other end of the post electrode is connected to the external An electronic device package that functions as an image sensor chip package consisting of being connected to electrodes.
上面に配線層を形成した基板上に半導体チップを含む回路素子を配置して、該回路素子と外部電極に接続されるポスト電極が内在する電子デバイスパッケージにおいて、
前記基板は、ヒートシンクとして機能する高放熱基板であり、かつ、該基板の上に搭載して接続される半導体チップが、高放熱型のLSIチップであり、
前記基板上の配線層に、ポスト電極の高さに等しい板厚を有する金属板から半抜きに打ち抜くことにより形成したポスト電極の一端が接続され、かつ、そのポスト電極の他端が、前記外部電極に接続されたことから成る高放熱型チップパッケージとして機能する電子デバイスパッケージ。
In an electronic device package in which a circuit element including a semiconductor chip is disposed on a substrate having a wiring layer formed on an upper surface, and a post electrode connected to the circuit element and an external electrode is present,
The substrate is a high heat dissipation substrate that functions as a heat sink, and the semiconductor chip mounted and connected on the substrate is a high heat dissipation LSI chip,
One end of a post electrode formed by punching in half from a metal plate having a thickness equal to the height of the post electrode is connected to the wiring layer on the substrate, and the other end of the post electrode is connected to the external An electronic device package that functions as a high heat dissipation chip package consisting of being connected to electrodes.
上面に配線層を形成した基板上に半導体チップを含む回路素子を配置して、該回路素子と外部電極に接続されるポスト電極が内在する電子デバイスパッケージの製造方法において、
基板上に配線層を形成し、
前記ポスト電極の高さに等しい板厚を有する金属板から、ポスト電極を半抜きに打ち抜くことにより、ポスト電極と、該ポスト電極と繋ぎ部を介して連結した半抜き板からなる配線用部品を形成し、
前記配線用部品のポスト電極を前記基板上の配線層に接続した後、前記半抜き板を引き剥がす、
ことから成る電子デバイスパッケージの製造方法。
In a method for manufacturing an electronic device package, in which a circuit element including a semiconductor chip is arranged on a substrate having a wiring layer formed on an upper surface, and a post electrode connected to the circuit element and an external electrode is present,
A wiring layer is formed on the substrate,
From a metal plate having a thickness equal to the height of the post electrode, a post electrode is punched out in half, thereby forming a wiring component comprising a post electrode and a half punched plate connected to the post electrode through a connecting portion. Forming,
After connecting the post electrode of the wiring component to the wiring layer on the substrate, the half-cut plate is peeled off,
An electronic device package manufacturing method comprising:
前記配線用部品のポスト電極が前記基板上の配線層に接続された後、基板の上面は、前記半抜き板下面まで樹脂封止される請求項5に記載の電子デバイスパッケージの製造方法。 6. The method of manufacturing an electronic device package according to claim 5, wherein after the post electrode of the wiring component is connected to the wiring layer on the substrate, the upper surface of the substrate is resin-sealed to the lower surface of the half-cut plate. 前記ポスト電極の先端に、或いは、前記封止樹脂の上に上面配線を設けて、この上面配線を介してポスト電極先端とは異なる位置に、外部電極を設けた請求項6に記載の電子デバイスパッケージの製造方法。 The electronic device according to claim 6, wherein a top surface wiring is provided at the tip of the post electrode or on the sealing resin, and an external electrode is provided at a position different from the tip of the post electrode through the top surface wiring. Package manufacturing method. 前記基板の裏面に、該基板を貫通する貫通配線を通して、基板上面の配線層に接続される外部電極を備えた請求項7に記載の電子デバイスパッケージの製造方法。 The method for manufacturing an electronic device package according to claim 7, further comprising an external electrode connected to a wiring layer on an upper surface of the substrate through a through wiring penetrating the substrate on a back surface of the substrate. 前記基板は、配線層を有するガラス基板又は光透過性の良い透明樹脂基板であり、該基板の上に、イメージセンサチップが搭載されて接続されることにより、イメージセンサチップパッケージが構成される請求項5に記載の電子デバイスパッケージの製造方法。 The substrate is a glass substrate having a wiring layer or a transparent resin substrate having good light transmission, and an image sensor chip package is configured by mounting and connecting an image sensor chip on the substrate. Item 6. A method for manufacturing an electronic device package according to Item 5. 前記基板は、ヒートシンクとして機能する高放熱基板であり、該基板の上に、高放熱型のLSIチップが搭載されて接続されることにより、高放熱型チップパッケージが構成される請求項5に記載の電子デバイスパッケージの製造方法。 6. The substrate according to claim 5, wherein the substrate is a high heat dissipation substrate that functions as a heat sink, and a high heat dissipation type LSI package is mounted on and connected to the substrate. Manufacturing method of electronic device package. 前記電子デバイスパッケージの複数個を上下に接続することにより、複数層構成の半導体パッケージが構成される請求項5に記載の電子デバイスパッケージの製造方法。
6. The method of manufacturing an electronic device package according to claim 5, wherein a semiconductor package having a multi-layer structure is configured by connecting a plurality of the electronic device packages vertically.
JP2009089998A 2009-04-02 2009-04-02 Component for wiring and method of manufacturing the same, and electronic device package used by incorporating the component for wiring and method of manufacturing the same Pending JP2010245157A (en)

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Cited By (6)

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JP2013058516A (en) * 2011-09-07 2013-03-28 Murata Mfg Co Ltd Manufacturing method of module
JP2015018932A (en) * 2013-07-11 2015-01-29 日本特殊陶業株式会社 Wiring board
JP2016111319A (en) * 2014-12-08 2016-06-20 旭徳科技股▲ふん▼有限公司 Package structure and manufacturing method of the same
US9491846B2 (en) 2011-09-07 2016-11-08 Murata Manufacturing Co., Ltd. Method of manufacturing module
US9538649B2 (en) 2011-09-07 2017-01-03 Murata Manufacturing Co., Ltd. Method of manufacturing module
US9591747B2 (en) 2011-09-09 2017-03-07 Murata Manufacturing Co., Ltd. Module board

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013058516A (en) * 2011-09-07 2013-03-28 Murata Mfg Co Ltd Manufacturing method of module
US9491846B2 (en) 2011-09-07 2016-11-08 Murata Manufacturing Co., Ltd. Method of manufacturing module
US9538649B2 (en) 2011-09-07 2017-01-03 Murata Manufacturing Co., Ltd. Method of manufacturing module
US9591747B2 (en) 2011-09-09 2017-03-07 Murata Manufacturing Co., Ltd. Module board
JP2015018932A (en) * 2013-07-11 2015-01-29 日本特殊陶業株式会社 Wiring board
JP2016111319A (en) * 2014-12-08 2016-06-20 旭徳科技股▲ふん▼有限公司 Package structure and manufacturing method of the same
CN105990157A (en) * 2014-12-08 2016-10-05 旭德科技股份有限公司 Packaging structure and manufacturing method thereof
US9589942B2 (en) 2014-12-08 2017-03-07 Subtron Technology Co., Ltd. Package structure and manufacturing method thereof

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