JP2005221726A - Photosensitive transfer material, protrusion for liquid crystal alignment control and method for forming the same, and liquid crystal display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photosensitive transfer material suitable for use in formation of protrusions for liquid crystal alignment control which regulate alignment of liquid crystal molecules, ensuring a uniform thickness even when protrusions for liquid crystal alignment control are formed on a large substrate, and having a wide development latitude; protrusions for liquid crystal alignment control formed using the photosensitive transfer material; a method for forming the protrusions; and a liquid crystal display. <P>SOLUTION: The photosensitive transfer material has at least one photosensitive resin layer containing a cresol novolac resin on a temporary support. The protrusions for liquid crystal alignment control using the photosensitive transfer material, the method for forming the protrusions, and the liquid crystal display are also provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a transfer material having a photosensitive resin layer that is chemically changed by light irradiation, a liquid crystal alignment control protrusion, a method for forming the same, and a liquid crystal display device. Specifically, a photosensitive transfer material used for forming a liquid crystal alignment control protrusion provided so as to protrude from the outside of a conductive layer constituting a liquid crystal display (LCD) to the liquid crystal layer side, and The present invention relates to a liquid crystal alignment control protrusion formed using the same, a manufacturing method thereof, and a liquid crystal display device.

  In recent years, a liquid crystal display (LCD) has been most widely used as a flat panel display to replace a CRT (Cathode-Ray Tube) display, and its expectation is also great. Among them, the thin film transistor (TFT) type LCD (TFT-LCD) is expected to further expand the market by application to personal computers, word processors, OA devices, portable televisions, etc. There is a need for further improvement in image quality.

  Currently, the most widely used method among TFT-LCDs is a normally white mode TN (Twisted Nematic) type LCD. However, the TN type LCD has a drawback that the viewing angle is narrow, and the display state differs depending on the position where the display screen is observed. For this reason, the TN type LCD has a problem that its application is limited.

  The problem with TN-type LCDs is that they can be displayed by holding a liquid crystal between a pair of substrates with electrodes and applying a voltage between the electrodes (for example, a simple matrix type or a plasma addressed type LCD). This is also a problem that occurs in the same way.

  That is, such an LCD can be seen almost white in any orientation in a white display state where no voltage is applied. However, in a black display state in which a predetermined voltage is applied, obliquely incident light passes obliquely with respect to liquid crystal molecules aligned in the vertical direction. For this reason, when the black display LCD is observed from an oblique direction, the deflection direction is twisted to some extent, and it appears to be halftone (gray) instead of completely black.

  Further, in the halftone display state where an intermediate voltage is applied, the liquid crystal display rises halfway in the middle portion of the cell, and the light that is vertically incident is displayed in halftone (gray). However, in the state of halftone display, the appearance of light incident obliquely on the left and right differs depending on the incident direction. Specifically, since the liquid crystal molecules are aligned in parallel with respect to the light traveling from the lower right to the upper left, the LCD looks black when viewed from the left side. On the other hand, since the liquid crystal molecules are vertically aligned with respect to the light traveling from the lower left to the upper right, when the LCD is observed from the right side, it appears to be almost white. As described above, the LCD described above has a drawback that the display state depends on the viewing angle.

  As a means for solving the above-described drawbacks, a technique for forming protrusions on the liquid crystal layer has been proposed. Such protrusions are formed to control the alignment of the liquid crystal and are referred to as liquid crystal alignment control protrusions. The protrusions locally incline the alignment state of the liquid crystal molecules along the surface, and even when observed obliquely with respect to the liquid crystal surface, the same display state as when the liquid crystal surface is observed from the front To widen the viewing angle.

  As such a technique, a technique of forming a liquid crystal alignment control protrusion using a phenol novolac resin has been proposed (see, for example, Patent Document 1). In such a technique, a positive photoresist is applied to a thickness of 1.5 μm with a spin coater to form a coating layer, and after pre-baking the coating layer, exposure and development are performed to form a pattern, Post-baking (heat flow) is performed at 240 ° C. for 20 minutes to form liquid crystal alignment control protrusions. However, the phenol novolac resin has a narrow development latitude, and the performance varies greatly depending on the development conditions.

  In addition, in this method of applying a liquid photoresist by a spin coater, the uniformity of the film thickness becomes a problem. In particular, in recent years, the size of LCDs has been increased, and even the original substrate size exceeding 1 m is being put into practical use. When such a large-sized substrate is used, the film thickness distribution becomes large in the application by the spin coater. For this reason, there is a problem that the film thickness becomes non-uniform and the display characteristics of the LCD vary (unevenness).

  In order to solve the problems caused by using the spin coater as described above, the following methods have been proposed. One is a method using a photosensitive transfer material obtained by drying a coating layer in which a photoresist is uniformly applied to a temporary support having a width exceeding 1 m in advance (hereinafter, a photosensitive transfer material was used). The method may be referred to as “transfer method”). In such a transfer system, it is possible to apply the liquid property appropriately adjusted, and to improve the uniformity of the film thickness. As such a photosensitive transfer material, a thermoplastic resin layer, an intermediate layer, a cover film, and the like are used as necessary (see, for example, Patent Document 2).

The above-described method can improve the uniformity at the time of coating a large substrate as compared with the case where a spin coater is used. However, even in these methods, when a phenol novolac resin is used as described above, the development latitude of the phenol novolac resin is narrow, so that development unevenness occurs in the substrate when developing a coating applied to a large substrate. For this reason, there is a problem in that unevenness of liquid crystal characteristics is caused when incorporated in an LCD.
JP 2002-122858 A JP-A-5-80503

  In order to solve the above-mentioned problem, the present invention is suitably used for forming a liquid crystal alignment control protrusion for regulating the alignment of liquid crystal molecules, and even when the liquid crystal alignment control protrusion is formed on a large substrate. To provide a photosensitive transfer material having a uniform film thickness and a wide development latitude, a liquid crystal alignment control protrusion formed using the same, a method for forming the same, and a liquid crystal display device using the same. With the goal.

The above problem is solved by the following means.
<1> A photosensitive transfer material comprising at least one photosensitive resin layer containing a cresol novolac resin on a temporary support.

  <2> The photosensitive transfer material according to <1>, wherein the photosensitive resin layer contains naphthoquinone diazide ester.

  <3> The photosensitive transfer material according to <1> or <2>, wherein the photosensitive resin layer contains a plasticizer.

  <4> The photosensitive transfer material according to <1> to <3>, wherein the photosensitive resin layer contains a high boiling point solvent.

  <5> The photosensitive transfer material according to the above <1> to <4>, wherein a thermoplastic resin layer, an intermediate layer, and the photosensitive resin layer are provided in this order on the temporary support. is there.

  <6> A liquid crystal alignment control protrusion formed using the photosensitive transfer material according to the above items <1> to <5>.

  <7> A method for forming a liquid crystal alignment control protrusion using the photosensitive transfer material according to the above <1> to <5>, wherein a transfer step of transferring a photosensitive resin layer of the photosensitive transfer material onto a substrate; And a patterning step of patterning the photosensitive resin layer transferred onto the substrate. A method for forming a protrusion for controlling liquid crystal alignment.

  <8> A liquid crystal display device comprising the liquid crystal alignment control protrusion according to <6>.

  According to the present invention, it is suitably used for forming a liquid crystal alignment control protrusion for regulating the alignment of liquid crystal molecules, and even when the liquid crystal alignment control protrusion is formed on a large substrate, the film thickness is uniform. In addition, it is possible to provide a photosensitive transfer material having a wide development latitude, a liquid crystal alignment control protrusion formed using the photosensitive transfer material, a method of forming the protrusion, and a liquid crystal display device using the same.

  The photosensitive transfer material of the present invention is characterized by having at least one photosensitive resin layer containing a cresol novolac resin on a temporary support. According to the present invention, by containing a cresol novolac resin in the photosensitive resin layer, image burn-in can be prevented when used for manufacturing a liquid crystal display device. Furthermore, since the photosensitive transfer material of the present invention has a wider development latitude than when a phenol novolac resin is used, when the photosensitive resin layer is transferred to a substrate or the like, pixels (photosensitive) A pattern of the conductive resin layer) is less likely to drop off from the substrate and is less dependent on development conditions.

  The present invention also relates to a transfer material used for the transfer method. For this reason, when a liquid crystal alignment control protrusion (hereinafter also referred to as “rib”) is formed on a large-sized substrate, a film made of a photosensitive resin with high thickness accuracy is formed on the substrate ( Transfer).

  The photosensitive transfer material of the present invention is a structure (projection for liquid crystal alignment control) provided so as to protrude from the outside (between the conductive layer and the liquid crystal layer) of the conductive layer constituting the liquid crystal display device to the liquid crystal layer side. It can use suitably for formation of. The photosensitive resin layer preferably further contains a naphthoquinone diazide ester, a plasticizer, and a high boiling point solvent.

  The installation location of the liquid crystal alignment control projection of the present invention in the liquid crystal display device will be described with reference to FIG. FIG. 1 is a schematic view showing a liquid crystal display device using the liquid crystal alignment control protrusion of the present invention. 1A, the liquid crystal display device 10 has a structure in which a glass substrate 12, a conductive layer 14, a liquid crystal layer 16 including liquid crystal molecules 15, a conductive layer 18, and a glass substrate 20 are stacked in this order. Have. In FIG. 1A, the liquid crystal alignment control protrusions 22 can be provided between the conductive layer 14 and the liquid crystal layer 16 and between the conductive layer 18 and the liquid crystal layer 16. Further, as shown in FIG. 1B, when the liquid crystal display device 10 includes a color filter 24 between the conductive layer 18 and the glass substrate 20, the liquid crystal alignment control protrusions 22 are formed in the same manner as in FIG. As shown in b), it can be provided between the conductive layer 18 and the liquid crystal layer 16 and between the conductive layer 14 and the liquid crystal layer 16. A liquid crystal alignment film (polyimide film) may be provided between the liquid crystal alignment control protrusion 22 and the liquid crystal layer 16.

  Hereinafter, the photosensitive transfer material of the present invention, the liquid crystal alignment control protrusion and the liquid crystal display device formed using the same will be described in detail.

<Photosensitive transfer material>
The photosensitive transfer material of the present invention has at least one photosensitive resin layer, and can optionally have a thermoplastic resin layer and an intermediate layer. Hereinafter, the photosensitive transfer material of the present invention will be described by taking as an example an embodiment in which a thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer are laminated in this order on a temporary support. However, the present invention is not limited to this, and may be an embodiment in which a photosensitive resin layer is formed directly on the temporary support, or between the temporary support and the photosensitive resin layer. Only one of the plastic resin layer and the intermediate layer may be formed.

<Photosensitive resin layer>
The photosensitive resin layer preferably contains at least a cresol novolak resin, and further contains a naphthoquinone diazide ester as necessary, and further contains a high-boiling solvent and other additives as a plasticizer and a residual solvent.

(Cresol novolac resin)
The cresol novolac resin preferably has a molar ratio of formaldehyde to cresol of about 0.7 to 1.0, more preferably 0.8 to 1.0. Moreover, as a weight average molecular weight of the said cresol novolak resin, 800-8000 are preferable and 1000-6000 are especially preferable.

  The isomer ratio (molar ratio of o-isomer / m-isomer / p-isomer) of the cresol novolak resin is not particularly limited, but the ratio of the p-isomer to the total isomer is 10 mol% from the viewpoint of improving developability. It is preferable that it is above, and it is still more preferable that it is 20 mol% or more. Further, from the viewpoint of improving the liquid crystal panel performance (such as anti-seizing ability), the m-isomer ratio is preferably 5 mol% or more, and preferably 20 mol% or more.

  The cresol novolac resin may be used alone or as a mixture of two or more. In this case, it may be used by mixing with other resins such as phenol novolac. In the present invention, as the cresol novolak resin, a derivative of a cresol novolak resin such as a reaction product with naphthoquinone diazide sulfonate may be used.

As the usage-amount of the said cresol novolak resin, 0.1-10 g / m < ² > is preferable and 0.5-5 g / m < ² > is further more preferable.

(Naphthoquinone diazide ester)
In the photosensitive resin layer, naphthoquinone diazide ester is preferably used in combination with a cresol novolac resin. The naphthoquinone diazide ester may be a monofunctional compound, a bifunctional or higher compound, and a mixture thereof. The monofunctional naphthoquinone diazide ester is preferably an ester compound obtained by reacting naphthoquinone-4-sulfonic acid chloride or naphthoquinone-5-sulfonic acid chloride with a substituted phenol.

  The bifunctional or higher naphthoquinone diazide ester is preferably an ester compound obtained by reacting naphthoquinone-4-sulfonic acid chloride or naphthoquinone-5-sulfonic acid chloride with a compound having a plurality of phenolic hydroxyl groups. Examples of the compound having a plurality of phenolic hydroxyl groups include polyphenols such as bisphenols, trisphenols and tetraquinosphenols; polyfunctional phenols such as dihydroxybenzene and trihydroxybenzene; bis-type or tris-type dihydroxybenzene or Trihydroxybenzene, asymmetric polynuclear phenol, a mixture thereof, and the like are preferable.

  Specific examples of the compound having a phenolic hydroxyl group include, for example, 4-t-butylphenol, 4-isoamylphenol, 4-t-octylphenol, 2-isopropyl-5-methylphenol, 2-acetylphenol, and 4-hydroxybenzophenone. , 3-chlorophenol, 4-benzyloxycarbonylphenol, 4-dodecylphenol, resorcinol, 4- (1-methyl-1-phenylethyl) -1,3-benzenediol, phloroglucinol, 4,4′-dihydroxy Benzophenone, bis (4-hydroxyphenyl) methane, 1,1-bis (4-hydroxyphenyl) cyclohexane, 2,2-bis (3-methyl-4-hydroxyphenyl) methane, 2,3,4,4′- Tetrahydroxybenzophenone, 4, '- [(4-hydroxyphenyl) methylene] bis [2-cyclohexyl-5-methylphenol], and the like.

  Specific examples of the naphthoquinonediazide ester include, for example, 4′-t-octylphenylnaphthoquinonediazide-4-sulfonate, 4′-t-octylphenylnaphthoquinonediazide-5-sulfonate, 4′-benzoylphenylnaphthoquinonediazide-5 Examples include sulfonate, a reaction product of 2,3,4,4′-tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid chloride. These may be used alone or in combination of two or more.

  The mass ratio of the naphthoquinone diazide ester to the cresol novolac resin in the photosensitive resin is preferably 1 to 200% by mass, and more preferably 5 to 50% by mass from the viewpoint of improving developability.

(Plasticizer)
As described above, the photosensitive resin layer preferably contains a plasticizer. By using the plasticizer in combination with the cresol novolak resin, the film strength of the photosensitive resin layer can be increased. For this reason, even if it is a case where the said photosensitive resin layer is thinned, generation | occurrence | production of a crack defect etc. can be suppressed.

  Examples of the plasticizer include phenol compounds such as 4-t-butylphenol and 4-t-octylphenol; low molecular weight phenol novolac (preferably a phenol novolak having a weight average molecular weight of 1000 or less); tricresyl phosphate (tricresyl phosphate) ), Polar low molecular compounds such as dibutyl phthalate, diethylene glycol monomethyl ether, glycerin, and propylene glycol; and the like, and 4-t-butylphenol, low molecular weight phenol novolak, tricresyl phosphate, and propylene glycol are preferable.

  The amount of the plasticizer added in the photosensitive resin layer is preferably about 0.5 to 20% by mass, and more preferably 5 to 15% by mass with respect to the total solid content of the photosensitive resin layer.

(High boiling point solvent)
In the photosensitive transfer material of the present invention, the solvent remains in the photosensitive resin layer to be softened, and when the film is thinned, the film becomes brittle and can be prevented from cracking.
The solvent remaining in the photosensitive resin layer may be a solvent used in the photosensitive resin composition used for forming the photosensitive resin layer, and a high boiling point solvent is particularly preferable. Examples of the high boiling point solvent include 1-methoxypropyl acetate, cyclohexanone, N-methylpyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, tetrahydrofuryl alcohol, ethoxypropylpropionate, and the like.

  Moreover, as a boiling point of the said high boiling point solvent, 120 degreeC or more is preferable and 140 degreeC or more is still more preferable. The content of the solvent remaining in the photosensitive resin layer with respect to the total solid content in the photosensitive resin layer is preferably 0.1 to 20% by mass, and more preferably 0.5 to 5% by mass.

(Other additives)
In order to promote the developability of the photosensitive resin layer, the photosensitive resin layer may contain a divalent or higher aliphatic carboxylic acid or a divalent to hexavalent phenol compound.
Examples of the divalent or higher aliphatic carboxylic acid include malonic acid, succinic acid, fumaric acid, maleic acid, hydroxysuccinic acid, glutaric acid, and adipic acid, and malonic acid and succinic acid are preferable. As content of the said bivalent or more aliphatic carboxylic acid with respect to the total solid in the said photosensitive resin, 0.5-20 mass% is preferable, and 5-15 mass% is still more preferable.

  Moreover, as said 2-6 valent phenol compound, a 2-4 valent phenol compound is especially preferable. Examples of the divalent to hexavalent phenol compound include resorcinol, 4- (1-methyl-1-phenylethyl) -1,3-benzenediol, phloroglucinol, 4,4′-dihydroxybenzophenone, bis (4 -Hydroxyphenyl) methane, 1,1-bis (4-hydroxyphenyl) cyclohexane, 2,2-bis (3-methyl-4-hydroxyphenyl) methane, 2,3,4,4'-tetrahydroxybenzophenone, 4 , 4 ′-[(4-hydroxyphenyl) methylene] bis [2-cyclohexyl-5-methylphenol] and the like, and resorcinol and 1,1-bis (4-hydroxyphenyl) cyclohexane are preferable. As content of the said 2-6 valent phenol compound with respect to the total solid in the said photosensitive resin, 0.5-20 mass% is preferable, and 5-15 mass% is still more preferable.

  Furthermore, a decolorizable dye may be added to the photosensitive resin layer from the viewpoint of enabling recognition of failures such as transfer failure and accuracy failure during the formation of the liquid crystal alignment control protrusions and improving manufacturing suitability. it can. The decolorizable dye generally means a pigment that can be decolored by heating at 200 ° C. for 1 hour, and is a colored dye that can be decolored during baking. As the decolorizable dye, a dye that can be decolored by heating at 180 ° C. for 1 hour is preferable. Such dyes usually undergo structural changes due to thermal decomposition or oxidation, or are evaporated or sublimated by heat. In addition, when a liquid crystal alignment control protrusion is produced using a decolorizable dye, the liquid crystal alignment control protrusion has a light transmittance of 90% or more with respect to parallel light of 400 to 800 nm after decoloring. Is preferred.

  Examples of the decolorizable dye include dyes that decompose by heat, such as dialkylaminotriphenyl such as Victoria Pure Blue BOH, Victoria Pure Blue BOH-M, Malachite Green, Eisen Malachite Green, Malachite Green Hydrochloride, Eisen Diamond Green, and the like. Examples include methane-based dyes. Examples of the dye that evaporates or sublimates by heat include Orient Oil Brown, Methyl Yellow, Sumicaron Brilliant Blue B, 1,3,5-triphenyltetrazolium formazan, and the like.

  As the decolorizable dye, in addition to the above, the stain resistance evaluation of the sublimation fastness test described in Dye Handbook (edited by Synthetic Organic Chemistry Association, Maruzen, issued July 20, 1972) (180 ° C., Those having a condition of 1 to 3 hours) can also be used. Specifically, CI Disperse Yellow 8, 31, 72, CI Disperse Orange 1, 3,20, 21, CI Disperse Red 15, 55, 60, 65, CI Disperse Violet 8, 23,26, 37, CI Disperse Blue 20, 26, 55, 56, 72, 90, 91, 92, 106, CI Disperse Black 29, Diacellition Direct Black BM / D (Mitsubishi Kasei Co., Ltd.), Sumikaron Violet RS (Sumitomo Chemical Co., Ltd.), Dianix Fast Sky Blue BM / D (Mitsubishi Kasei Co., Ltd.), Miketon Polyester Blue BCL, GRN (Mitsui Petrochemical Co., Ltd.), Kayaro Polyester Navy Blue GF (Nippon Kayaku Co., Ltd.) . Considering the suitability of the heating device and environmental pollution, the decolorizable dye is preferably a thermally decomposable dye.

  The addition amount of the decolorizable dye is preferably 0.1 to 10% by mass with respect to the total solid content of the photosensitive resin layer.

Moreover, a thermoplastic binder can be used for the photosensitive resin layer. Examples of the thermoplastic binder include known binders such as ethylenically unsaturated compounds.
The addition amount of the binder and the plasticizer is appropriately determined as long as the effects of the present invention are not impaired.

(Photosensitive resin layer)
The photosensitive transfer material of the present invention uses a cresol novolak resin and a naphthoquinone diazide ester in combination with a photosensitive resin layer to remove the exposed portion by development with an aqueous alkaline solution when exposed in a desired pattern. Photosensitive transfer material. That is, naphthoquinone diazide ester acts as a dissolution inhibitor for alkali-soluble cresol novolak resins, but when it receives light, 3-indenecarboxylic acid is produced and the dissolution inhibition effect is lost. For this reason, the said photosensitive resin layer containing a cresol novolak resin and naphthoquinone diazide functions as a positive resist in which only a light irradiation part is melt | dissolved by alkali image development.

  The layer thickness of the photosensitive resin layer is preferably 0.5 to 10 μm, and more preferably 1 to 6 μm. When the film thickness is in the range of 0.5 to 10 μm, when the photosensitive resin layer coating solution is applied onto the temporary support, pinholes are unlikely to occur, and the exposed portion can be easily removed for development. Can be done.

  The photosensitive resin layer comprises a photosensitive resin composition in which components contained in the photosensitive resin layer such as the cresol novolak resin and naphthoquinonediazide ester described above are dissolved in a solvent, a temporary support (temporary support and photosensitive resin layer). In the case where a thermoplastic resin layer or an intermediate layer is provided between the two layers, it can be formed by coating and drying on the layer) using various coating means.

  As a solvent used for the said photosensitive resin composition, what was selected from the well-known solvent suitably can be used in the range which does not impair the effect of this invention. Examples of the solvent include alcohols such as methanol and ethanol; ethers such as tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, and ethylene glycol monoethyl ether; methyl cellosolve acetate Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; diethylene glycols such as diethylene glycol monomethyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether; propylene glycol Propylene glycol alkyl ether acetates such as tilether acetate and propylene glycol ethyl ether acetate; aromatic hydrocarbons such as toluene and xylene; ketones such as methyl ethyl ketone, cyclohexanone and 4-hydroxy-4-methyl-2-pentanone; 2 -Ethyl hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-2-methylbutanoate, 3-methoxypropion And esters such as methyl acid, ethyl 3-methoquinpropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl acetate, butyl acetate; and the like. These organic solvents may be used individually by 1 type, and may be used in combination of 2 or more type.

  Among these, in terms of solubility of each component and film forming property, glycol ethers such as ethylene glycol dimethyl ether, ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate, ethyl 2-hydroxypropionate, 3-methoxypropion Particularly suitable are esters such as methyl acid and ethyl 3-ethoxypropionate and diethylene glycols such as diethylene glycol dimethyl ether.

  Further, as described above, in order to leave the solvent in the layer after forming the photosensitive resin layer, the solvent may be, for example, 1-methoxypropyl acetate, cyclohexanone, N-methylpyrrolidone, N, N-dimethylacetamide, N, It preferably contains a high boiling point solvent such as N-dimethylformamide, tetrahydrofuryl alcohol, ethoxypropylpropionate.

  As the coating means for forming the photosensitive resin layer, a known coating means can be appropriately selected.

<Temporary support>
As the temporary support, those having a releasability that does not interfere with transfer with respect to a thermoplastic resin layer described later are preferable, and those that are chemically and thermally stable and flexible are preferable. Specific examples of the temporary support include thin film sheets such as Teflon (R), polyethylene terephthalate, polycarbonate, polyethylene, and polypropylene, or a laminate thereof.

  Between the temporary support and the thermoplastic resin layer, it is preferable that surface treatment such as glow discharge is not performed and an undercoat layer such as gelatin is not provided in order to ensure good peelability. As thickness of the said temporary support body, 5-300 micrometers is suitable and 20-150 micrometers is preferable.

<Thermoplastic resin layer>
As described above, the temporary support and the alkali-soluble thermoplastic resin layer are provided as the first layer on the temporary support, mainly comprising a thermoplastic resin, and other components as necessary. May be included. As the above-mentioned thermoplastic resin, alkali development after transfer is possible, or removal processing is possible when the thermoplastic resin protrudes to the surroundings and contaminates the substrate to be transferred depending on the transfer conditions at the time of transfer. Therefore, a resin that is soluble in an alkaline aqueous solution is preferable. Further, the thermoplastic resin layer is a cushion that prevents transfer defects that may occur due to irregularities present on the substrate (or color filter) when transferred onto the substrate (or color filter) that is the transfer target. From the viewpoint of exhibiting the function as a material, it is preferable that the material has a property that can be deformed according to the unevenness of the surface of the transfer object during heat adhesion.

  In view of the above, the thermoplastic resin is preferably an alkali-soluble resin having a substantial softening point of 80 ° C. or lower. Examples of thermoplastic resins having a softening point of 80 ° C. or lower include saponified products of ethylene and acrylate copolymers, saponified products of styrene and (meth) acrylate copolymers, vinyltoluene and (meth). Examples include saponified products such as saponified products with acrylic acid ester copolymers, poly (meth) acrylic acid esters, and (meth) acrylic acid ester copolymers of butyl (meth) acrylate and vinyl acetate. The thermoplastic resin may be a single type or a combination of two or more types.

  Further, the thermoplastic resin has a softening point of about 80 as described in “Plastic Performance Handbook” (edited by the Japan Plastics Industry Federation, edited by the All Japan Plastics Molding Industry Association, published by the Industrial Research Council, issued on October 25, 1968). Among organic polymer substances having a temperature of 0 ° C. or lower, those soluble in an alkaline aqueous solution can also be used.

  In addition, even when an organic polymer substance has a softening point of 80 ° C. or higher, a substantial softening point can be obtained by adding various known plasticizers compatible with the organic polymer substance to the organic polymer substance. The temperature can be lowered to 80 ° C. or lower.

  When the organic polymer substance is used, various polymers, supercooling substances, adhesion improvers, interfaces, and the like within a range where the substantial softening point does not exceed 80 ° C. for the purpose of adjusting the adhesive force with the temporary support described above. An activator, a release agent and the like can also be added.

  The photosensitive transfer material of the present invention is formed by sequentially laminating a thermoplastic resin layer, a later-described intermediate layer, and the photosensitive resin layer on a temporary support, and in particular, the thermoplastic resin layer and the temporary support. It is necessary that the adhesive strength between the body is smaller than the adhesive strength between other layers. Thereby, after transfer, the temporary support can be easily peeled off, and further, the temporary support can be removed without being accompanied by destruction of the surface of the thermoplastic resin layer. This is a preferable aspect in that the exposure to the photosensitive resin layer after removing the temporary support can be performed uniformly.

  The thermoplastic resin layer is prepared by dissolving a thermoplastic resin and other components as required in an organic solvent to prepare a coating solution (a coating solution for a thermoplastic resin layer). It can be formed by coating or the like by a coating method.

  Examples of the organic solvent include alcohols such as methanol and ethanol; ethers such as tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, and ethylene glycol monoethyl ether; methyl cellosolve Ethylene glycol alkyl ether acetates such as acetate and ethyl cellosolve acetate; diethylene glycols such as diethylene glycol monomethyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether; propylene glycol Propylene glycol alkyl ether acetates such as rumethyl ether acetate and propylene glycol ethyl ether acetate; aromatic hydrocarbons such as toluene and xylene; ketones such as methyl ethyl ketone, cyclohexanone and 4-hydroxy-4-methyl-2-pentanone; Ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-2-methylbutanoate, 3-methoxy And esters such as methyl propionate, ethyl 3-methoquinpropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl acetate, butyl acetate; and the like. These organic solvents may be used individually by 1 type, and may be used in combination of 2 or more type.

  Among these, in terms of solubility of each component and film forming property, glycol ethers such as ethylene glycol dimethyl ether, ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate, ethyl 2-hydroxypropionate, 3-methoxypropion Particularly suitable are esters such as methyl acid and ethyl 3-ethoxypropionate and diethylene glycols such as diethylene glycol dimethyl ether.

  Further, N-methylformamide, N, N-dimethylformamide, N-methylformanilide, N-methylacetamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, benzylethyl ether, dihexyl ether, acetonylacetone , Isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, etc. A high boiling point solvent can also be added.

  As a layer thickness of the said thermoplastic resin layer, 6-100 micrometers is preferable and 6-50 micrometers is more preferable. When the layer thickness is in the range of 6 to 100 μm, unevenness of 1 μm or more on the substrate (or color filter) can be completely absorbed, and developability and production suitability can be improved.

<Intermediate layer>
Since an organic solvent is used for the photosensitive resin layer and the thermoplastic resin layer, both intermediate layers have a function of preventing the two layers from being mixed with each other. Moreover, the said intermediate | middle layer should just be disperse | distributed or melt | dissolved in water or alkaline aqueous solution, and a thing with low oxygen permeability is preferable.

  The intermediate layer is mainly composed of a resin component that can be dispersed and dissolved in water or an aqueous alkali solution, and may contain other components such as a surfactant, if necessary. The resin component constituting the intermediate layer can be appropriately selected from known ones. For example, the polyvinyl ether / maleic anhydride polymer described in JP-A No. 46-2121 and JP-B No. 56-40824 is disclosed. , Water-soluble salts of carboxyalkyl cellulose, water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinyl pyrrolidone, various polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, Examples thereof include ethylene oxide polymers, water-soluble salts of the group consisting of various starches and the like, styrene / maleic acid copolymers, maleate resins, and combinations of two or more thereof.

  Among them, a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferable. Further, the polyvinyl alcohol preferably has a saponification rate of 80% or more. Moreover, as content of the said polyvinylpyrrolidone, it is preferable that it is 1-75 mass% of solid content of an intermediate | middle layer, It is more preferable that it is 1-60 mass%, It is most 10-50 mass% preferable. When the content of the polyvinyl pyrrolidone is in the range of 1 to 75% by mass, the adhesion with the photosensitive resin layer can be sufficiently enhanced, and the oxygen blocking ability may be improved.

  When the oxygen barrier ability of the intermediate layer is lowered, the resolution may be lowered. For this reason, it is preferable that the oxygen permeability of the intermediate layer is small.

The intermediate layer is formed by dissolving and dispersing a resin component or the like in an aqueous solvent to prepare a coating liquid (intermediate layer coating liquid) and coating the coating liquid on the thermoplastic resin layer by a known coating method. Is possible.
Examples of the aqueous solvent include a solvent containing water such as distilled water as a main component and, if desired, a solvent having affinity with water such as alcohol, a salt, or the like as long as the effects of the present invention are not impaired.

  The thickness of the intermediate layer is preferably about 0.1 to 5 μm, and more preferably 0.5 to 2 μm. When the layer thickness is in the range of about 0.1 to 5 μm, oxygen permeability becomes too high and the resolution of the photosensitive resin layer does not decrease, and development and intermediate layer removal can be easily performed. it can.

<Cover film>
A cover film is preferably provided on the photosensitive resin layer for the purpose of protecting it from dirt and damage during storage. The cover film can be selected from those easily peelable from the photosensitive resin layer, and may be made of the same or similar material as the temporary support. Specifically, silicone paper, polyolefin, polytetrafluoroethylene sheet or the like is preferable, and among them, polyethylene and polypropylene films are more preferable.

  The thickness of the cover film is preferably about 5 to 100 μm, and more preferably 10 to 60 μm.

<Method for producing photosensitive transfer material>
In the photosensitive transfer material of the present invention, on the temporary support, first, a coating solution (a coating solution for a thermoplastic resin layer) prepared by dissolving a thermoplastic resin in a solvent is applied and dried to obtain a thermoplastic resin layer. Subsequently, a coating liquid (intermediate layer coating liquid) using a solvent that does not dissolve the thermoplastic resin layer is applied onto the thermoplastic resin layer and dried to provide an intermediate layer. In addition, a coating liquid (coating liquid for photosensitive resin layer) prepared by dissolving cresol novolak resin or the like in a solvent that does not dissolve the intermediate layer is applied and dried to provide a photosensitive resin layer. Alternatively, by providing a photosensitive resin layer on the cover film and separately providing a thermoplastic resin layer and an intermediate layer on a temporary support, and bonding them so that the intermediate layer and the photosensitive resin layer are in contact with each other. It can also be formed. In addition, the photosensitive transfer material of the present invention is provided with a photosensitive resin layer and an intermediate layer on the cover film, and a thermoplastic resin layer separately on a temporary support, and the intermediate layer is formed in the same manner as described above. It can manufacture by sticking together so that a photosensitive resin layer may contact | connect.

Further, as will be described later, in the process of peeling the temporary support of the photosensitive transfer material after the photosensitive transfer material of the present invention is brought into close contact with the substrate or color filter which is the transfer target, As a result, the surrounding dust or the like may be attracted, and the dust or the like may adhere to the photosensitive resin layer after peeling. In such a case, an unexposed portion may be formed in the photosensitive resin layer in the subsequent exposure process, and the portion may remain during development. For this reason, for the purpose of preventing charging, by providing a conductive layer on at least one surface of the temporary support or using a temporary support with conductivity, the electrical resistance of the surface is 10 ¹³ Ω or less. It is preferable to reduce to.

  In order to impart conductivity to the temporary support as described above, a conductive substance may be contained in the temporary support. As such a method, for example, a method of kneading metal oxide fine particles or an antistatic agent in advance is suitable. Examples of the metal oxide include zinc oxide, titanium oxide, tin oxide, aluminum oxide, indium oxide, silicon oxide, magnesium oxide, barium oxide, and crystalline oxides such as molybdenum oxide and / or composite oxides thereof. Fine particles are mentioned.

  Examples of the antistatic agent include Electro Stripper A (manufactured by Kao Corporation), Elenon No. Alkyl phosphate anionic surfactants such as 19 (Daiichi Kogyo Seiyaku Co., Ltd.); Betaine amphoteric surfactants such as Amorgen K (Daiichi Kogyo Seiyaku Co., Ltd.); Nissan Nonion L (Nippon Yushi Polyoxyethylene fatty acid ester-based nonionic surfactants such as Emulgen 106, 120, 147, 420, 220, 905, 910 (made by Kao Corporation) and Nissan Nonion E (made by Nippon Oil & Fats Co., Ltd.) Polyoxyethylene alkyl ether type nonionic surfactants such as) are suitable. Other nonionic surfactants include polyoxyethylene alkylphenol ethers, polyhydric alcohol fatty acid esters, polyoxyethylene sorbitan fatty acid esters, polyoxyethylene alkylamines, and the like.

When the conductive layer is provided on the temporary support, the conductive layer can be appropriately selected from known ones. The conductive material used for the conductive layer is at least one crystalline metal oxide selected from ZnO, TiO ₂ , SnO ₂ , Al ₂ O ₃ , In ₂ O ₃ , SiO ₂ , MgO, BaO, MoO _{3 and the} like. And / or fine particles of the composite oxide thereof. A method in which these conductive substances are contained in a conductive layer and used is preferable in that a stable conductive effect is exhibited without being affected by the humidity environment.

The volume resistance value of the crystalline metal oxide or the composite oxide fine particles is preferably 10 ⁷ Ω · cm or less, more preferably 10 ⁵ Ω · cm or less. Moreover, as the particle diameter, 0.01-0.7 micrometer is preferable and 0.02-0.5 micrometer is still more preferable.

A method for producing fine particles of the crystalline metal oxide and its composite oxide is described in detail in JP-A-56-143430. That is, firstly, metal oxide fine particles are produced by firing and heat treatment is performed in the presence of different atoms to improve conductivity, and secondly, the conductivity is improved when producing metal oxide fine particles by firing. And a third method for introducing oxygen defects by reducing the oxygen concentration in the atmosphere when producing metal fine particles by firing. Specific examples of the hetero atoms include Al, In, etc. for ZnO; Nb, Ta, etc. for TiO ₂ ; Sb, Nb, halogen elements, etc. for SnO ₂ . Can be mentioned.

As addition amount of the said different atom, 0.01-30 mol% is preferable and 0.1-10 mol% is more preferable. As a usage-amount of electroconductive particle, 0.05-20 g / m < ² > is preferable and 0.1-10 g / m < ² > is more preferable.

  In the conductive layer provided on the temporary support of the photosensitive transfer material of the present invention, as a binder, for example, gelatin, cellulose nitrate, cellulose triacetate, cellulose diacetate, cellulose acetate butyrate, cellulose acetate propionate, etc. Cellulose esters; homopolymers or copolymers containing vinylidene chloride, vinyl chloride, styrene, acrylonitrile, vinyl acetate, alkyl acrylates having 1 to 4 carbon atoms, vinyl pyrrolidone, etc .; soluble polyesters, polycarbonates, soluble polyamides, etc. may be used it can.

  In addition, when dispersing conductive particles in these binders, a dispersion such as a titanium-based dispersant or a silane-based dispersant may be added, and a binder cross-linking agent may be added as necessary. it can.

  Examples of the titanium dispersant include titanate coupling agents, preneact (manufactured by Ajinomoto Co., Inc.) and the like described in US Pat. Nos. 4,069,192 and 4,080,353. Is mentioned. Examples of the silane dispersant include vinyltrichlorosilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-glycidoxypropyltrimethoxysilane, and γ-methacryloxypropyltrimethoxysilane. "Silane coupling agent" (manufactured by Shin-Etsu Chemical Co., Ltd.). Examples of the binder crosslinking agent include an epoxy crosslinking agent, an isocyanate crosslinking agent, an aziridine crosslinking agent, and an epoxy crosslinking agent.

  The conductive layer is prepared by dispersing conductive fine particles in a binder and coating the temporary support or applying a subbing treatment (for example, an undercoat layer) on the temporary support. It can be provided by attaching.

The conductive layer may be provided on the surface of the temporary support opposite to the surface on which the photosensitive resin layer is coated. In this case, the conductive layer is formed on the conductive layer for the purpose of ensuring sufficient scratch resistance. It is preferable to further provide a hydrophobic polymer layer. The hydrophobic polymer layer may be applied in a state in which the hydrophobic polymer is dissolved in an organic solvent or in the form of an aqueous latex, and the coating amount is preferably about 0.05 to 1 g / m ² in terms of dry mass. .

  Examples of the hydrophobic polymer include cellulose esters such as nitrocellulose and cellulose acetate; vinyl polymers containing vinyl chloride, vinylidene chloride, vinyl acrylate and the like; polymers such as organic solvent-soluble polyamide and polyester.

  For the purpose of imparting smoothness to the hydrophobic polymer layer, for example, a smoothing agent such as an organic carboxylic acid amide described in JP-A-55-79435 can be used. Moreover, a mat agent etc. can also be used as needed. Even if such a hydrophobic polymer layer is provided, the effect of the conductive layer is not substantially affected.

  When an undercoat layer is provided, JP-A-51-135526, U.S. Pat. Nos. 3,143,421, 3,586,508, 2,698,235, No. 3,567,452 etc., vinylidene chloride copolymer described in JP-A No. 51-114120, US Pat. No. 3,615,556 etc. Glycidyl acrylate or glycidyl methacrylate-containing copolymers described in JP-A-51-58469, polyamide / epichlorohydrin resins described in JP-A-48-24923, and JP-A-50-39536 A maleic anhydride-containing copolymer can be used.

  In the present invention, JP-A-56-82504, JP-A-56-143443, JP-A-57-104931, JP-A-57-118242, JP-A-58-62647, A conductive layer described in JP-A-60-258541 can be used as necessary.

When the conductive layer is applied on the temporary support, it can be applied by a known method such as roller coating, air knife coating, gravure coating, bar coating, or curtain coating. In order to obtain a sufficient antistatic effect, the surface electrical resistance value of the conductive layer or the temporary support provided with conductivity is preferably 10 ¹³ Ω or less, and more preferably 10 ¹² Ω or less. .

  In addition, in order to prevent strong adhesion between the thermoplastic resin layer and the temporary support, a slip agent composition containing known fine particles, a release agent composition containing a silicone compound, etc. are applied to the temporary support surface. You can also.

  When a conductive layer is provided on the surface of the temporary support on which the thermoplastic resin layer is not provided, the temporary support is provided with, for example, a glow layer for the purpose of improving the adhesion between the thermoplastic resin layer and the temporary support. Surface treatment such as discharge treatment, corona treatment, ultraviolet irradiation treatment, undercoating treatment such as phenolic substance, polyvinylidene chloride resin, styrene butadiene rubber, gelatin, or a combination of these treatments can be applied.

  A film for a temporary support can be formed by extrusion, but when a conductive material or a conductive layer is contained in a plastic raw material that is the same or different from that of the temporary support and is formed simultaneously with the film, Can easily obtain a conductive layer excellent in adhesion and scratch resistance. In this case, it is not necessary to provide the hydrophobic polymer layer or the undercoat layer, and this is the most preferred embodiment as a conductivity-imparting temporary support constituting the transfer material.

《LCD alignment control protrusions》
The liquid crystal alignment control protrusion of the present invention transfers the photosensitive resin layer onto the substrate using the photosensitive transfer material of the present invention (transfer process), and after the transfer, the photosensitive resin layer is irradiated with light in a pattern. It can be formed by removing unnecessary portions (exposure portions) by (patterning step) and development processing.
The liquid crystal alignment control protrusion of the present invention formed as described above has a shape and a shape that can regulate the orientation direction of the liquid crystal molecules, and as described above, the inner side of the conductive layer of the liquid crystal display device (conductive layer) And the shape and form thereof are not particularly limited. The shape of the liquid crystal alignment control protrusion of the present invention can be appropriately selected from known shapes. For example, a pyramid shape (triangular pyramid, quadrangular pyramid, etc.) with the substrate surface (or color filter surface) as the bottom surface is available. A hemispherical type, a conical shape, a trapezoidal shape, a bowl shape having a substrate surface (or color filter surface) as a bottom surface, or a band shape formed on a substrate (or color filter) and its length direction A triangular prism having a triangular cross-sectional shape, and a columnar body having a semicircular, quadrangular, trapezoidal, bowl-shaped, etc. cross-sectional shape orthogonal to its length direction can be used. The liquid crystal alignment control protrusions can be formed in, for example, the shape described in Japanese Patent No. 2947350.

  In addition, the arrangement mode of the alignment control protrusions of the present invention can be appropriately selected from known modes. For example, it can be formed in the mode described in Japanese Patent No. 2947350. For example, a plurality of columnar bodies formed in a strip shape on a substrate and having a trapezoidal cross-sectional shape perpendicular to the length direction are arranged in a pattern extending in parallel in one direction at an equal pitch, and each conductive material of two substrates It may be an embodiment formed between both the layer and the substrate (see FIG. 14 of Japanese Patent No. 2947350). When the liquid crystal alignment control protrusion of the present invention is provided between the conductive layer substrates of both substrates, it is not always necessary to form a structure with the same shape, but a combination of structures with different shapes is formed. Also good. Further, the liquid crystal alignment control protrusion formed in a strip shape on the substrate (or color filter) is not limited to a linear shape, and may be provided in a bent shape at a predetermined angle (Japanese Patent No. 2947350). 42 and 55 etc.).

  In addition, for details on the size, arrangement interval, arrangement shape, etc. of the liquid crystal alignment control protrusions, the description in Japanese Patent No. 2947350 can be referred to.

  Among the above-mentioned structures, a structure having a trapezoidal shape or a bowl-shaped cross section perpendicular to the substrate is preferable in that a sufficient viewing angle can be obtained. The above substrate surface (or color filter surface) A trapezoidal shape, a bowl shape, or a columnar body having a semicircular shape, a trapezoidal shape, a bowl shape, or the like that is formed on a substrate (color filter) in a band shape and perpendicular to the length direction is preferable.

A spacer can also be formed using the photosensitive transfer material of the present invention. In this case, for example, at the time of forming the color filter, a portion where two or more kinds of pixel materials of the color filter are overlapped is formed, and after forming the transparent electrode, the photosensitive transfer material of the present invention is used thereon. The spacer can be formed by transferring the photosensitive resin layer.
The thickness of the spacer generally needs to be equal to the cell gap, and is thicker than the thickness of the alignment control protrusion. In the above configuration, the cell gap is defined by the total thickness of the color filter material and the spacer. Therefore, it is not necessary to form the photosensitive resin layer thickly. For this reason, the alignment control protrusion and the spacer can be formed simultaneously.

  As described above, the liquid crystal alignment control protrusion of the present invention is provided on the outer side of the conductive layer (between the conductive layer and the liquid crystal layer) so as to protrude toward the liquid crystal layer, thereby along the convex surface of the structure. Since the orientation of the liquid crystal molecules is regulated so as to be inclined, a wide viewing angle independent of the position (viewing angle) at which the liquid crystal surface is observed can be secured.

  As described above, the liquid crystal display device using the liquid crystal alignment control protrusion according to the present invention generally has a color filter side substrate including a color filter and a conductive layer (electrode) on the color filter, and is disposed opposite to the substrate. The liquid crystal layer is formed by two substrates (a driving element such as a thin film transistor (TFT) may be provided on either the color filter side substrate or the counter substrate) and a counter substrate with a conductive layer (electrode) to be formed. It is pinched. The protrusion for controlling liquid crystal alignment according to the present invention is formed using the above-described photosensitive resin composition, and is provided on at least one inner side (particularly between the substrate and the conductive layer) of each of the conductive layers provided on the two substrates. , Provided as a transparent structure that protrudes toward the liquid crystal layer. By providing the liquid crystal alignment control projection of the present invention, the orientation direction of the liquid crystal molecules can be regulated, and a wide viewing angle independent of the observation position (viewing angle) with respect to the liquid crystal surface can be secured.

  In addition, as described above, the liquid crystal alignment control projection of the present invention is a liquid crystal display device without a color filter (a device for black-and-white display or a field sequential type that displays while changing the color of the backlight in a short time. (Apparatus).

  Next, a method for forming a liquid crystal alignment control protrusion using the photosensitive transfer material of the present invention will be described. Here, as the photosensitive transfer material of the present invention, a photosensitive transfer material in which an alkali-soluble thermoplastic resin layer, an intermediate layer, a photosensitive resin layer, and a cover film are laminated in this order on a temporary support is used. Furthermore, an example using a substrate provided with a color filter layer on the entire surface of the substrate is shown.

  First, the cover film of the photosensitive transfer material of the present invention is removed, and the photosensitive resin layer is closely bonded onto the color filter layer of the substrate, which is a transfer target, under pressure and heating. For the bonding of the substrate and the heat-sensitive recording layer, one appropriately selected from conventionally known laminators, vacuum laminators and the like can be used, and an auto-cut laminator can also be used in order to increase productivity. After laminating the substrate and the photosensitive resin layer, the temporary support is peeled off at the interface with the thermoplastic resin layer, and the photosensitive resin layer is passed through the thermoplastic resin layer and the intermediate layer from above the thermoplastic resin layer. Exposure (patterning) into a positive pattern. The exposure can be performed by irradiation with light having a wavelength of 300 to 500 nm. Examples of the light source for the exposure include a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, and an Hg—Xe lamp.

  Examples of the patterning method include a photolithography method, a method in which an exposure mask is arranged above the thermoplastic resin layer, and a pattern is exposed through the mask, and a proximity proximity exposure apparatus. Examples include a method using an exposure unit. When performing patterning by a method using an exposure means such as the above-described proximity proximity exposure apparatus, the exposure amount is preferably 1 to 5 times the minimum exposure amount at which the photosensitive resin layer dissolves. 40 to 300 μm is preferable.

  After the exposure, development processing is performed to remove the thermoplastic resin layer, the intermediate layer, and the photosensitive resin layer in an unnecessary portion (exposed portion). Then, only the unirradiated part remains on the conductive layer, and a transparent structure is formed.

  The development can be performed by a known method, for example, using a solvent or an aqueous developer, particularly an alkaline aqueous solution, for example, (a) immersing the exposed substrate itself in a developing bath, (b) the exposed substrate. For the purpose of further improving the solubility, for example, by spraying with a spray or the like, rubbing with a rotating brush, a wet sponge or the like, or applying ultrasonic waves.

  As the alkaline aqueous solution, a dilute aqueous solution of an alkaline substance is preferable, and a solution obtained by adding a small amount of a water-miscible organic solvent can also be suitably used. Examples of the alkaline substance include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, alkali metal carbonates such as sodium carbonate and potassium carbonate, alkali metal bicarbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate, silica Alkali metal silicates such as sodium silicate and potassium silicate, alkali metal metasilicates such as sodium metasilicate and potassium metasilicate, tetraalkyl such as triethanolamine, diethanolamine, monoethanolamine, morpholine and tetramethylammonium hydroxide Ammonium hydroxides, trisodium phosphate and the like can be mentioned.

  The concentration of the alkaline substance in the alkaline aqueous solution is preferably 0.01 to 30% by mass, and the pH is preferably 8 to 14.

  Examples of the water-miscible organic solvent include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-butyl ether, benzyl alcohol, Examples include acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, and N-methylpyrrolidone. The addition amount of the organic solvent is preferably 0.1 to 30% by mass.

  Various known surfactants can also be added to the alkaline aqueous solution. The concentration of the surfactant is preferably 0.01 to 10% by mass. The temperature during development is usually preferably around room temperature to 40 ° C. Furthermore, after the development processing, a step of washing with water can be added.

  When forming alignment control protrusions and spacers using the photosensitive transfer material of the present invention, the structure can be further cured by performing a heat treatment called baking after exposure and development. Further, by baking, the shape of the structure can be moderately moderated by contraction of the structure and appropriate flow.

  The baking temperature is preferably 200 to 300 ° C, more preferably 220 to 260 ° C, and most preferably 230 to 250 ° C. The baking time is preferably 10 to 120 minutes, more preferably 20 to 70 minutes, and most preferably 30 to 60 minutes. Thus, by performing the said baking by setting temperature and time, the crosslinking reaction in a photosensitive resin component can advance easily, discoloration of a color filter can be prevented, and productivity can be improved.

<Liquid crystal display device>
As described above, the liquid crystal display device of the present invention formed using the photosensitive transfer material of the present invention and the liquid crystal alignment control protrusion of the present invention has two sheets, each having a conductive layer on the surface facing each other. The liquid crystal layer is sandwiched between the substrates, and the protrusions for controlling liquid crystal alignment according to the present invention described above are provided so as to protrude from the outside of the conductive layer on the substrate (between the conductive layer and the liquid crystal layer) to the liquid crystal layer side. Can be configured. An alignment film can be formed on the conductive layer so as to cover them.

  The basic configuration of the liquid crystal display device of the present invention includes: (1) a driving side in which driving elements such as thin film transistors (hereinafter sometimes referred to as “TFTs”) and pixel electrodes (conductive layers) are arranged; A substrate and a color filter side substrate having a color filter and a counter electrode (conductive layer) are arranged to face each other with a spacer interposed therebetween, and a liquid crystal material is sealed in the gap portion; (2) the color filter The color filter integrated drive substrate directly formed on the drive side substrate and a counter substrate having a counter electrode (conductive layer) are arranged to face each other with a spacer interposed therebetween, and a liquid crystal material is sealed in the gap portion. And the like.

Examples of the conductive layer include an ITO film; a metal film such as Al, Zn, Cu, Fe, Ni, Cr, and Mo; a metal oxide film such as SiO _2. A membrane is particularly preferred. The drive side substrate, the color filter side substrate, and the counter substrate are made of, for example, a known glass plate such as a soda glass plate, a low expansion glass plate, a non-alkali glass plate, a quartz glass plate, or a plastic film. Constructed using.

  As a driving side substrate in which driving elements such as TFTs and pixel electrodes are arranged, for example, TFTs and TFTs connected to data bus lines and gate bus lines arranged in a matrix so as to cross each other vertically are arranged. For example, a conductive layer connected to the data bus line may be provided.

  In any of the above embodiments, a conductive layer is formed on both of the substrates constituting the liquid crystal display element, a voltage is applied between the two conductive layers, and the liquid crystal material sandwiched therebetween changes the alignment state according to the voltage. Display. Accordingly, the structure described above can be formed in any desired shape and form inside any conductive layer (between the conductive layer and the substrate).

  The configuration mode (1) will be described with reference to FIG. An example of the configuration mode (1) is the liquid crystal display device shown in FIG. Referring to FIG. 1B as an example, one substrate 30 is a color filter side substrate. On the surface of the glass substrate 20 facing the liquid crystal layer 16, a color filter 24, a conductive layer (ITO film) 18 forming a common electrode, and a liquid crystal alignment control protrusion 22 having a trapezoidal cross section formed at an equal pitch. Is formed. Further, an alignment film (not shown) can be provided between the conductive layer 18 and the liquid crystal alignment control protrusion 22 and the liquid crystal layer 16. The other substrate 32 is a drive side substrate including TFTs. On the surface of the substrate 32 facing the liquid crystal layer 16, a TFT (not shown), a conductive layer (ITO film) 14 bonded to the drain electrode of the TFT, and a trapezoidal liquid crystal formed at an equal pitch An orientation control protrusion 22 (only one is shown in FIG. 1) is formed. The substrate 32 is formed with a plurality of gate bus lines that form gate electrodes (not shown), and a plurality of data bus lines (not shown) that are orthogonal to the gate bus lines are formed in parallel. A plurality of TFTs are arranged corresponding to the intersections of the gate bus lines and the data bus lines. Further, an alignment film (not shown) can be provided between the TFT, the conductive layer 14 and the liquid crystal alignment control protrusion 22 and the liquid crystal layer 16. A liquid crystal layer 16 in which a liquid crystal material is sealed is sandwiched between the substrate 30 and the substrate 32, and the liquid crystal alignment control protrusion 22 protrudes from the outside of the conductive layer 18 or 14 to the liquid crystal layer 16 side, The liquid crystal molecules 15 are aligned along the convex surface.

  As described above, the liquid crystal display device of the present invention is provided with the transparent liquid crystal alignment control protrusion without coloration inside the conductive layer of the substrate (between the conductive layer and the liquid crystal layer). A wide viewing angle that does not depend on (viewing angle) can be secured, and the color purity of the three primary colors (B (blue), G (green), R (red)) is not impaired, and there is no hue deviation. A liquid crystal display device capable of displaying a full-color image can be provided.

  The liquid crystal display device shown in FIG. 1A is the same as that shown in FIG. 1B except that it does not include a color filter. That is, the liquid crystal layer 16 formed by enclosing a liquid crystal material is sandwiched between the substrate 32 and the substrate 32, and the liquid crystal alignment control protrusions 22 protrude from the outside of the conductive layer 14 to the liquid crystal layer 16 side, The liquid crystal molecules 15 are aligned along the convex surface. Also according to this configuration, a transparent liquid crystal alignment control protrusion is provided between the conductive layer and the liquid crystal layer of the substrate, so that a wide viewing angle independent of the observation position (viewing angle) with respect to the liquid crystal display surface can be obtained. Can be secured.

  EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention further more concretely, this invention is not limited to these Examples at all. In the examples, “parts” and “%” represent “parts by mass” and “% by mass”, respectively. Hereinafter, the structure according to the present invention may be referred to as a transparent structure.

[Example 1]
-Production of transfer material (1)-
A polyethylene terephthalate film (PET film) having a thickness of 100 μm is prepared as a temporary support, and a thermoplastic resin layer coating solution H1 having the following composition is applied onto the temporary support and dried to obtain a dry layer thickness of 20 μm. The thermoplastic resin layer was formed.

<Composition of coating liquid H1 for thermoplastic resin layer>
・ Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization ratio (molar ratio) = 55 / 28.8 / 11.7 / 4.5, mass average molecular weight 90000) 15 parts ・ polypropylene glycol 6.5 parts of diacrylate (average molecular weight 822)
・ Tetraethylene glycol dimethacrylate 1.5 parts ・ p-Toluenesulfonamide 0.5 part ・ Benzophenone 1.0 part ・ Methyl ethyl ketone 30 parts

Subsequently, an intermediate layer coating solution B1 having the following composition was applied onto the thermoplastic resin layer and dried to form an intermediate layer having a dry layer thickness of 1.6 μm.
<Composition of coating liquid B1 for intermediate layer>
-130 parts of polyvinyl alcohol (trade name: PVA-205 (saponification rate 80%), manufactured by Kuraray Co., Ltd.)
-60 parts of polyvinylpyrrolidone (trade name: PVP K-90, manufactured by GAF Corporation)
・ 10 parts of fluorosurfactant (trade name: Surflon S-131, manufactured by Asahi Glass Co., Ltd.)
・ 3350 parts of distilled water

Subsequently, a photosensitive resin layer coating solution T1 having the following composition was prepared, further coated on the intermediate layer, and dried to laminate a photosensitive resin layer having a dry layer thickness of 2.0 μm. In the following, “m / p” represents the molar ratio of meta-position / para-position in the cresol novolac resin, and “MW” represents the weight average molecular weight.
<Composition of Coating Solution T1 for Photosensitive Resin Layer>
-Cresol novolac resin A 30 parts (m / p = 60/40, MW = 2600)
-30 parts of cresol novolac resin B (m / p = 80/20, MW = 2200)
4'-t-octylphenyl naphthoquinone diazide-4-sulfonate
18 parts 1-methoxypropyl acetate 100 parts Tetrahydrofurfuryl alcohol (high boiling point organic solvent) 500 parts Surfactant 0.05 parts (trade name: MegaFuck F-780F, manufactured by Dainippon Ink Co., Ltd.)

  Further, a polypropylene (thickness: 12 μm) film is provided as a cover film by pressure bonding on the photosensitive resin layer, and a thermoplastic resin layer, an intermediate layer, a photosensitive resin layer, and a cover film are arranged in this order on the temporary support. A laminated transfer material (1) was produced.

-Production of liquid crystal panels-
First, a stripe-shaped black matrix having a predetermined size and shape and a frame-shaped light shielding portion were formed on a glass substrate having a predetermined size by using the black matrix resin composition. Thereafter, a colored film composed of R (red), G (green), and B (blue) was formed at a predetermined position by the method for producing a color filter described in JP-A-2000-98599. Further, a transparent electrode film was formed thereon by sputtering of ITO.

Subsequently, the cover film is peeled off from the transfer material (1) obtained as described above, and the surface of the photosensitive resin layer and the surface of the color filter side substrate on which the ITO film is provided are overlaid, and a laminator (trade name) : VP-II, manufactured by Taisei Laminator Co., Ltd.) and bonded under the conditions of 0.8 kg / cm ² , temperature 130 ° C., and conveyance speed 1 m / min. Thereafter, only the temporary support of the transfer material was peeled and removed at the interface with the thermoplastic resin layer. In this state, the photosensitive resin layer, the intermediate layer, and the thermoplastic resin layer are laminated in this order on the color filter side substrate.

Next, a proximity exposure machine is arranged above the outermost thermoplastic resin layer so that the predetermined photomask is at a distance of 100 μm from the surface of the photosensitive resin layer, and the ultrahigh pressure is passed through the photomask. Proximity exposure was performed with a mercury lamp at an irradiation energy of 150 mJ / cm ² . Thereafter, a 1% triethanolamine aqueous solution was sprayed onto the substrate at 30 ° C. for 30 seconds with a shower type developing device to dissolve and remove the thermoplastic resin layer and the intermediate layer. At this stage, the photosensitive resin layer was not substantially developed.

Subsequently, a 2.38% tetramethylammonium hydroxide aqueous solution was developed while sprayed onto a substrate at 33 ° C. for 30 seconds with a shower type developing device, and unnecessary portions (exposed portions) of the photosensitive resin layer were developed and removed. As a result, a structure made of a photosensitive resin layer patterned into a desired shape was formed on the color filter side substrate. At this time, the respective line widths of the 14 μm wide pattern at the center of the substrate and the 14 μm wide pattern located 40 cm from the center were measured to evaluate development unevenness. The results are shown in Table 1 below.
Subsequently, the color filter side substrate on which the structure was formed was baked at 230 ° C. for 30 minutes, whereby a transparent rib (a) could be formed on the color filter side substrate. As a result of observing with a scanning electron microscope, the shape of the transparent rib (a) had a saddle-shaped cross-sectional shape with a line width of 11 μm and a central portion height of about 1.5 μm.

  A liquid crystal panel was produced by a known method using the obtained substrate and the display performance was evaluated.

[Example 2]
A liquid crystal panel was produced in the same manner as in Example 1 except that the photosensitive resin layer coating solution T1 in Example 1 was changed to the photosensitive resin layer coating solution T2 having the following composition. When the display performance of the obtained liquid crystal panel was evaluated, it showed sufficient performance.
<Composition of Coating Solution T2 for Photosensitive Resin Layer>
-Cresol novolac resin A 30 parts (m / p = 60/40, MW = 2600)
-30 parts of cresol novolac resin B (m / p = 80/20, MW = 2200)
4'-t-octylphenyl naphthoquinone diazide-4-sulfonate
18 parts 1-methoxypropyl acetate 100 parts Victoria Pure Blue 30% methanol solution 2 parts Surfactant 0.05 parts (trade name: MegaFuck F-780F, manufactured by Dainippon Ink, Inc.)
・ 500 parts of tetrahydrofuryl alcohol

[Example 3]
A liquid crystal panel was produced in the same manner as in Example 1 except that the photosensitive resin layer coating solution T1 in Example 1 was changed to the photosensitive resin layer coating solution T3 having the following composition. When the display performance of the obtained liquid crystal panel was evaluated, it showed sufficient performance.
<Composition of Coating Solution T3 for Photosensitive Resin Layer>
-Cresol novolac resin A 30 parts (m / p = 60/40, MW = 2600)
-30 parts of cresol novolac resin B (m / p = 80/20, MW = 2200)
4'-t-octylphenyl naphthoquinone diazide-4-sulfonate
18 parts Bisphenol cyclohexyl 3.0 parts Victoria Pure Blue 30% methanol solution 5.0 parts Surfactant 0.05 parts (Trade name: MegaFuck F-780F, manufactured by Dainippon Ink Co., Ltd.)
・ 600 parts of 1-methoxypropyl acetate (high boiling point solvent)

[Example 4]
A liquid crystal panel was produced in the same manner as in Example 1 except that the photosensitive resin layer coating solution T1 in Example 1 was changed to the photosensitive resin layer coating solution T4 having the following composition. When the display performance of the obtained liquid crystal panel was evaluated, it showed sufficient performance.
<Composition of Coating Solution T4 for Photosensitive Resin Layer>
-Cresol novolac resin A 30 parts (m / p = 60/40, MW = 2600)
-30 parts of cresol novolac resin B (m / p = 80/20, MW = 2200)
4'-t-octylphenyl naphthoquinone diazide-4-sulfonate
18 parts, 3.0 parts of bisphenol cyclohexyl, 5.0 parts of tricresyl phosphate, 0.05 parts of surfactant (trade name: Megafac F-780F, manufactured by Dainippon Ink Co., Ltd.)
・ 600 parts of 1-methoxypropyl acetate (high boiling point solvent)

[Example 5]
A liquid crystal panel was produced in the same manner as in Example 1 except that the photosensitive resin layer coating solution T1 in Example 1 was changed to the photosensitive resin layer coating solution T5 having the following composition. When the display performance of the obtained liquid crystal panel was evaluated, it showed sufficient performance.
<Composition of Coating Solution T5 for Photosensitive Resin Layer>
-Cresol novolac resin A 30 parts (m / p = 60/40, MW = 2600)
-30 parts of cresol novolac resin B (m / p = 80/20, MW = 2200)
4'-t-octylphenyl naphthoquinone diazide-4-sulfonate
18 parts, bisphenolcyclohexyl 3.0 parts, tricresyl phosphate 5.0 parts, malonic acid 5.0 parts, surfactant 0.05 parts (trade name: Megafac F-780F, manufactured by Dainippon Ink, Inc. )
・ 600 parts of 1-methoxypropyl acetate (high boiling point solvent)

[Example 6]
In Example 1, the photosensitive resin layer coating solution T1 was treated with 1000 parts of a resist solution (trade name: FH-2405, manufactured by Fuji Film Arch Co., Ltd .; containing cresol novolac resin, naphthoquinone diazide ester, propylene glycol monomethyl ether acetate) A liquid crystal panel was produced in the same manner as in Example 1 except that the solution was changed to 500 parts of tetrahydrofurfuryl alcohol. When the display performance of the obtained liquid crystal panel was evaluated, it showed sufficient performance.

[Comparative Example 1]
In the same manner as in Example 1, except that 60 parts of phenol novolak resin (MW = 2400) was used instead of cresol novolak resins A and B in the coating solution T1 for the photosensitive resin layer in Example 1, in the same manner. A liquid crystal panel was produced. When the display performance of the obtained liquid crystal panel was evaluated, it did not show satisfactory performance.

[Comparative Example 2]
A liquid crystal panel was produced in the same manner as in Example 1 except that the photosensitive resin layer coating solution T1 in Example 1 was changed to the photosensitive resin layer coating solution T6 having the following composition. When the display performance of the obtained liquid crystal panel was evaluated, it did not show satisfactory performance.
<Composition of Coating Solution T6 for Photosensitive Resin Layer>
-Benzyl methacrylate / methacrylic acid copolymer 60 parts (BzMA / MAA copolymer weight ratio = 72/28)
Dipentaerythritol hexaacrylate 30 parts 2,4-bis (trichloromethyl) -6- [4 '-(N, N-bis (ethoxycarbonylmethyl) -3'-bromophenyl) -s-triazine 1.0 Part ・ 30 parts methanol solution of Victoria Pure Blue 2.0 parts ・ Surfactant 0.05 parts (trade name: MegaFuck F-780F, manufactured by Dainippon Ink Co., Ltd.)
・ 600 parts of 1-methoxypropyl acetate (high boiling point solvent)

※現像ムラについては、線幅が１３μｍ以上１５μｍ以下であるものを「○」、線幅が１３μｍ未満または１５μｍを越えるものを「×」と評価した。

* Regarding development unevenness, “◯” indicates that the line width is 13 μm or more and 15 μm or less, and “X” indicates that the line width is less than 13 μm or exceeds 15 μm.

  From Table 1, in Examples 1 to 6, development unevenness was small, whereas in Comparative Example 1, development unevenness was significant. Moreover, although the display performance of the liquid crystal panel showed satisfactory performance for Examples 1 to 6, satisfactory performance could not be obtained for Comparative Examples 1 and 2.

It is the schematic which shows the liquid crystal display device using the protrusion for liquid crystal orientation control of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Liquid crystal display device 12, 20 Glass substrate 14, 18 Conductive layer 15 Liquid crystal molecule 16 Liquid crystal layer 22 Protrusion 24 for liquid crystal orientation control Color filter 30, 32 Substrate

Claims (8)

  A photosensitive transfer material comprising at least one photosensitive resin layer containing a cresol novolac resin on a temporary support.   The photosensitive transfer material according to claim 1, wherein the photosensitive resin layer contains naphthoquinone diazide ester.   The photosensitive transfer material according to claim 1, wherein the photosensitive resin layer contains a plasticizer.   The photosensitive transfer material according to claim 1, wherein the photosensitive resin layer contains a high boiling point solvent.   The photosensitive transfer material according to any one of claims 1 to 4, further comprising a thermoplastic resin layer, an intermediate layer, and the photosensitive resin layer in this order on the temporary support.   A protrusion for controlling liquid crystal alignment, which is formed using the photosensitive transfer material according to claim 1.   A method for forming a liquid crystal alignment control protrusion using the photosensitive transfer material according to any one of claims 1 to 5, wherein a transfer step of transferring a photosensitive resin layer of the photosensitive transfer material onto a substrate; And a patterning step of patterning the photosensitive resin layer transferred onto the substrate.   A liquid crystal display device comprising the liquid crystal alignment control protrusion according to claim 6.

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