JP2004145269A - Projection optical system, reflective and refractive projection optical system, scanning exposure apparatus and exposure method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a projection optical system having a plurality of projection optical units which do not generate eccentric aberration even when the projection magnification of the projection optical system is changed. <P>SOLUTION: The projection optical system has a plurality of projection optical units PL to form the pattern image of a mask 10 onto a glass substrate 30. Each unit in the plurality of projection optical units PL is equipped with a magnification controlling member to control the projection magnification. The magnification controlling member is disposed to align the optical axes of the lenses constituting the projection optical unit to the optical axes of the lenses constituting the magnification controlling member. <P>COPYRIGHT: (C)2004,JPO

Description

【００８４】
（表２）に倍率補正部材を構成するレンズの光軸を露光エリアの中心（露光中心）に偏心させたことによって、図７に示す露光エリア内の（Ｘ、Ｙ）の位置で発生する収差を示す。
【００８５】
【表２】

（表３）に、（表２）に示す収差から（表１）に示す収差を除いた収差を示す。
【００８６】
【表３】

【００８７】
投影光学ユニットを構成するレンズの光軸と倍率補正部材を構成するレンズの光軸とが一致している場合の収差（表１）においては、Ｍ（メリジオナル）及びＳ（サジタル）の双方が投影光学系の光軸に対してほぼ回転対象に発生しているため、この回転対象成分を倍率補正部材を構成するレンズの光軸と露光中心が一致している場合の収差（表２）から除けば、回転非対称な成分を抽出することができる（表３）。
【００８８】
この（表３）に示す収差（△Ｍ，△Ｓ）は、露光エリアの全体にわたってほぼ一様な値となっているため、倍率補正部材を構成するレンズの間隔を変更することによって収差補正を行うことができない。従って、このような回転非対称な偏心収差を発生させないためには、本実施の形態に示すように投影光学ユニットを構成するレンズの光軸と倍率補正部材を構成するレンズの光軸とを一致させる必要がある。
【００８９】
次に、本発明の各投影光学ユニットＰＬの実施例について説明する。実施例において、露光波長として、基準波長であるｉ線（λ＝３６５ｎｍ）、ｈ線（λ＝４０５ｎｍ）、ｇ線（λ＝４３６ｎｍ）を使用している。（表４）に、実施例の各投影光学ユニットＰＬの諸元の値を掲げる。（表４）において、面番号は物体面であるマスク面から像面であるガラス基板面へ軸線ＡＸＦＣにしたがって光線の進行する方向に沿ったマスク側からの面の順序を、ｒは各面の曲率半径を、ｄは各面の軸上間隔すなわち面間隔をそれぞれ示している。また、（表５）に、倍率補正部材を変更した各投影光学ユニットＰＬの諸元の値を掲げる。（表５）においても、面番号は物体面であるマスク面から像面であるガラス基板面へ軸線ＡＸＦＣにしたがって光線の進行する方向に沿ったマスク側からの面の順序を、ｒは各面の曲率半径を、ｄは各面の軸上間隔すなわち面間隔をそれぞれ示している。
【００９０】
なお、（表４）（表５）においては、各面の軸上間隔ｄは、反射される度にその符号を変えるものとする。したがって、面間隔ｄの符号は、第１反射面Ｐ１ｒから第１凹面反射鏡Ｍ１までの光路中では負とし、第２反射面Ｐ２ｒから第３反射面Ｐ３ｒまでの光路中では負とし、第２凹面反射鏡Ｍ２から第４反射面Ｐ４ｒまでの光路中では負とし、その他の光路中では正としている。そして、各面の軸上間隔ｄが正である光路中においては、光線の入射側に向かって凸面の曲率半径を正とし、凹面の曲率半径を負としている。逆に、各面の軸上間隔ｄが負である光路中においては、光線の入射側に向かって凹面の曲率半径を正とし、凸面の曲率半径を負としている。さらに、（表４）（表５）いて、ｎ（ｉ），ｎ（ｈ），ｎ（ｇ）は、ｉ線（λ＝３６５ｎｍ）、ｈ線（λ＝４０５ｎｍ）、ｇ線（λ＝４３６ｎｍ）に対する屈折率をそれぞれ表している。なお、各面の軸上間隔ｄが負である光路中においては、屈折率の符号を負としている。
【００９１】
【表４】

【００９２】
【表５】

この（表４）に示すレンズデータは、倍率補正部材をレンズで構成した場合であり、（表５）に示すレンズデータは、倍率補正部材を全て平行平面板で構成した場合である。倍率補正部材を構成する平行平面板をレンズに変更することにより収差が発生するが、この発生した収差を補正するために凹面鏡を光軸方向に移動させている。即ち、凹面鏡を光軸方向に６０μｍ移動させている。また、倍率補正部材とガラス基板との間隔を１１１．９μｍ短くしている。
【００９３】
【発明の効果】
本発明の投影光学系によれば、投影光学ユニットを構成するレンズの光軸と倍率調整部材を構成するレンズの光軸とが一致するように配置されているため、倍率調整部材を用いて倍率調整を行う場合においても、偏心収差を発生させることなく倍率調整を行うことができる。また、像ずれ補正手段により倍率調整部材による倍率調整に伴い発生する像ずれの補正を行うことができる。
【００９４】
また、本発明の投影光学系によれば、倍率調整部材を構成するレンズのレンズ面の少なくとも１面の曲率半径を変更することにより、投影光学ユニットにより第２基板上に形成された像面の形状を制御することができる。
【００９５】
また、本発明の反射屈折型投影光学系によれば、像面形状制御部材が第１基板と第１の偏向部材との間の光路中又は、第２の偏向部材と第２基板との間の光路中に配置されている。即ち、像面形状制御部材が結像光学系外に配置されているため、像面形状制御部材を構成する少なくとも１枚のレンズの交換をきわめて容易に行うことができ、第２基板上に形成された像面の形状を容易に制御することができる。
【００９６】
また、本発明の反射屈折型投影光学系によれば、投影光学ユニットを構成するレンズの光軸と像面形状制御部材を構成するレンズの光軸とが一致するように配置されているため、像面形状制御部材を用いて像面形状の制御を行う場合においても、偏心収差を発生させることなく像面形状の制御を行うことができる。
【００９７】
また、本発明の反射屈折型投影光学系によれば、像面形状制御部材を構成するレンズの中の少なくとも１つを交換することにより、投影光学ユニットによって第２基板上に形成された像面の形状を制御することができる。
【００９８】
また、本発明の走査型投影露光装置によれば、投影光学系又は反射屈折型投影光学系の倍率調整が良好に行われていることから、第１基板に形成されたパターンを前記第２基板上に良好に投影露光することができる。
【００９９】
また、本発明の露光方法によれば、投影光学系又は反射屈折型投影光学系の倍率調整が良好に行われていることから、第１基板に形成されたパターンを前記第２基板上に良好に投影露光することができる。
【図面の簡単な説明】
【図１】本発明の実施の形態にかかる走査型露光装置の全体の概略構成を示す斜視図である。
【図２】本発明の実施の形態にかかる投影光学系を構成する投影光学ユニットの１つに着目して走査型露光装置の全体構成を示す斜視図である。
【図３】本発明の実施の形態にかかる各投影光学ユニットの構成を示す図である。
【図４】本発明の実施の形態にかかる各投影光学ユニットの倍率調整に伴い発生する像ずれを説明するための図である。
【図５】本発明の実施の形態にかかる倍率調整部材において行う像面制御を説明するための図である。
【図６】本発明の実施の形態にかかるマイクロデバイスとしての液晶表示素子を製造する方法のフローチャートである。
【図７】本発明の実施の形態にかかる投影光学ユニットの露光エリア内の位置を示す図である。
【符号の説明】
１０…マスク、１１…マスクステージ、３０…ガラス基板、３１…基板ステージ、４０…クサビレンズ、４２…平行平面板、４４…倍率補正部材、ＰＬ…投影光学ユニット、Ｋ１…第１結像光学系、Ｋ２…第２結像光学系、ＦＳ…視野絞り、ＨＫ１…第１反射屈折光学系、ＨＫ２…第２反射屈折光学系、Ｇ１Ｐ…第１屈折光学系、Ｇ２Ｐ…第２屈折光学系、Ｍ１…第１凹面反射鏡、Ｍ２…第２凹面反射鏡。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention provides a projection optical system having a plurality of projection optical units for forming an image of a pattern on a first substrate on a second substrate, a catadioptric projection optical system including a plurality of catadioptric projection optical units, A scanning projection exposure apparatus that includes the projection optical system or the catadioptric projection optical system and projects and exposes a mask pattern onto a glass substrate while moving the mask and the glass substrate, and using the scanning projection exposure apparatus It relates to an exposure method.
[0002]
[Prior art]
In recent years, liquid crystal display panels have been frequently used as display elements for word processors, personal computers, televisions, and the like. The liquid crystal display panel is manufactured by patterning a transparent thin-film electrode into a desired shape on a glass substrate by a photolithography technique. As an apparatus for photolithography, a projection exposure apparatus that exposes an original pattern formed on a mask to a photoresist layer on a glass substrate via a projection optical system is used.
[0003]
In recent years, there has been an increasing demand for a larger area of the liquid crystal display panel, and with this demand, it has been desired to enlarge the exposure area in this type of projection exposure apparatus. In order to enlarge the exposure area, a so-called scanning projection exposure apparatus has been proposed. In this scanning type projection exposure apparatus, a mask pattern is projected and exposed on a glass substrate while moving the mask and the glass substrate with respect to a projection optical system including a plurality of projection optical units.
[0004]
Generally, in a projection exposure apparatus, pattern exposure is repeated over a number of layers while performing a predetermined process on one glass substrate. At this time, the glass substrate expands and contracts due to the process treatment, particularly the heat treatment, and is deformed from the initial shape. Therefore, a scanning projection exposure apparatus has been developed which can adjust the magnification of each projection optical unit in accordance with the expansion and contraction, that is, the change in shape of the glass substrate (see Patent Document 1).
[0005]
Also, a scanning projection exposure apparatus that can adjust the projection magnification at any time according to the deformation of the glass substrate by using a magnification correction member arranged in the optical path of the projection optical system without complicating the replacement operation of the glass substrate. It has been developed (see Patent Document 2).
[0006]
[Patent Document 1]
JP-A-7-183212
[Reference number 2]
JP 2000-187332 A
[0007]
[Problems to be solved by the invention]
By the way, in the scanning projection exposure apparatus disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 2000-187332, the lens constituting the magnification correcting member is arranged so that the center of the lens coincides with the center of the exposure area. Therefore, the projection magnification of the projection optical system can be adjusted by adjusting the distance between the lenses constituting the magnification correction member, but the center of the lens constituting the magnification correction member and the projection optical system are constituted. Since the center of the lens does not coincide, decentering aberration occurs.
[0008]
An object of the present invention is to provide a projection optical system having a plurality of projection optical units in which eccentric aberration does not occur even when the projection magnification of the projection optical system is changed, and to achieve eccentricity even when the projection magnification of the projection optical system is changed. An object of the present invention is to provide a catadioptric projection optical system including a plurality of catadioptric projection optical units in which no aberration occurs. A scanning projection exposure apparatus that includes the projection optical system or the catadioptric projection optical system and projects and exposes a mask pattern onto a glass substrate while moving the mask and the glass substrate; and An object of the present invention is to provide an exposure method used.
[0009]
[Means for Solving the Problems]
The projection optical system according to claim 1, wherein the projection optical system includes a plurality of projection optical units for forming an image of a pattern on a first substrate on a second substrate, wherein each of the plurality of projection optical units is A magnification adjusting member for adjusting a projection magnification, wherein the magnification adjusting member is arranged such that an optical axis of a lens constituting the projection optical unit coincides with an optical axis of a lens constituting the magnification adjusting member. It is characterized by having been done.
[0010]
According to the projection optical system of the first aspect, since the optical axis of the lens constituting the projection optical unit and the optical axis of the lens constituting the magnification adjusting member are arranged to coincide with each other, the magnification adjusting member is used. In the case where the magnification adjustment is performed, the magnification can be adjusted without causing eccentric aberration.
[0011]
Further, the projection optical system according to claim 2 further includes an image shift correcting unit that corrects an image shift caused by magnification correction by the magnification adjusting member.
[0012]
In the projection optical system according to a third aspect, the image shift correcting unit is configured by a first image shift correcting unit that corrects an image shift in a direction orthogonal to an optical axis of a lens constituting the projection optical unit. It is characterized by the following.
[0013]
In the projection optical system according to a fourth aspect, the first image shift correcting unit is an image shifting unit including a plane-parallel plate.
[0014]
According to a fifth aspect of the present invention, in the projection optical system, the image shift correcting unit includes a second image shift correcting unit that corrects an image shift in a direction of an optical axis of a lens included in the projection optical unit. And
[0015]
In a projection optical system according to a sixth aspect, the second image shift correcting unit is a focal position correcting unit including a wedge lens.
[0016]
The projection optical system according to claim 7 is characterized in that the magnification adjusting member is constituted by at least two lenses, and the magnification is adjusted by changing the distance between the lenses.
[0017]
According to the projection optical system of the present invention, it is possible to correct the image shift caused by the magnification adjustment by the magnification adjusting member by the image shift correcting means. That is, since the center of the exposure area does not coincide with the optical axis of the lens constituting the magnification adjusting member, an image shift occurs due to the magnification adjustment by the magnification adjusting member. Therefore, the image shift in the direction perpendicular to the optical axis of the lens constituting the projection optical unit is corrected by the first image shift correcting means, for example, the image shift means having a parallel plane plate. Further, the image shift of the lens constituting the projection optical unit in the optical axis direction is corrected by a second image shift correcting unit, for example, a focal position correcting unit including a wedge lens.
[0018]
Further, in the projection optical system according to claim 8, the magnification adjusting member includes a first plano-concave lens, a biconvex lens, and a second plano-concave lens. The shape of an image plane formed on the second substrate by the projection optical unit is controlled by changing a radius of curvature of at least one of the lens surfaces.
[0019]
In the projection optical system according to the ninth aspect, the shape of an image plane formed on the second substrate by the projection optical unit may be changed by changing a radius of curvature of at least one of the lens surfaces of the biconvex lens. It is characterized by controlling.
[0020]
Also, in the projection optical system according to claim 10, the magnification adjusting member includes a first plano-convex lens, a biconcave lens, and a second plano-convex lens, and the magnification adjusting member includes a first plano-convex lens, a biconcave lens, and a second plano-convex lens. The shape of an image plane formed on the second substrate by the projection optical unit is controlled by changing a radius of curvature of at least one of the lens surfaces.
[0021]
In the projection optical system according to the eleventh aspect, the shape of an image plane formed on the second substrate by the projection optical unit may be changed by changing a radius of curvature of at least one of the lens surfaces of the biconcave lens. It is characterized by controlling.
[0022]
According to the projection optical system of claims 8 to 11, the projection optical unit is formed on the second substrate by changing the radius of curvature of at least one of the lens surfaces of the lens constituting the magnification adjusting member. It is possible to control the shape of the obtained image plane.
[0023]
13. The projection optical system according to claim 12, wherein each of the plurality of projection optical units includes an imaging optical system including a refraction optical system and a concave reflecting mirror, and the imaging optical system transmits light from the first substrate to the imaging optical system. A first deflecting member for guiding the light to the optical system, and a second deflecting member for guiding the light passing through the imaging optical system to the second substrate. In the optical path between the first deflecting member, in the optical path between the first deflecting member and the imaging optical system, and in the optical path between the imaging optical system and the second deflecting member , Is disposed in an optical path between the second deflecting member and the second substrate or in an optical path of the imaging optical system.
[0024]
Further, in the projection optical system according to the present invention, the image shift correcting unit may be configured such that the first deflecting member and the imaging optical system are arranged in an optical path between the first substrate and the first deflecting member. In the optical path between the imaging optical system and the second deflecting member, in the optical path between the second deflecting member and the second substrate, or in the imaging optical system. It is characterized by being arranged in the optical path.
[0025]
The projection optical system according to claim 14, wherein the imaging optical system includes a first refractive optical system and a first refractive optical system for condensing light from the pattern on the first substrate to form a primary image of the pattern. A first catadioptric optical system including a first concave reflecting mirror; and a second catadioptric optical system for condensing light from the primary image to form a secondary image of the pattern on the second substrate. A second catadioptric optical system including a second concave reflecting mirror, a third deflecting member for guiding light passing through the first catadioptric optical system to the primary image, and transmitting light from the primary image to the first image. And a fourth deflecting member for guiding to the catadioptric system, wherein the magnification adjusting member is provided between the first deflecting member and the first deflecting member in an optical path between the first substrate and the first deflecting member. In an optical path between the first catadioptric optical system and an optical path between the first catadioptric optical system and the third deflecting member, In the optical path between the third deflecting member and the fourth deflecting member, in the optical path between the fourth deflecting member and the second catadioptric optical system, the second catadioptric optical system It is provided in an optical path between the second deflecting member, an optical path between the second deflecting member and the second substrate, or an optical path of the imaging optical system.
[0026]
In a catadioptric projection optical system according to a fifteenth aspect, the catadioptric projection optical system includes a projection optical unit for forming a pattern on the first substrate on the second substrate. An image optical system, a first deflecting member for guiding light from the first substrate to the image forming optical system, and an optical path between the first substrate and the first deflecting member; An image plane disposed in at least one optical path in an optical path between the deflecting member and the second substrate, for controlling a shape of an image plane formed on the second substrate by the projection optical unit. And a shape control member.
[0027]
The catadioptric projection optical system according to claim 16 has a plurality of projection optical units for forming an image of a pattern of a first substrate on a second substrate, and each of the plurality of projection optical units is An imaging optical system including a refractive optical system and a concave reflecting mirror; a first deflection member for guiding light from the first substrate to the imaging optical system; and light passing through the imaging optical system. Plane shape control which comprises a second deflecting member for guiding the light to the second substrate, and at least two lenses, and controls the shape of the image plane formed on the second substrate by the projection optical unit. In the catadioptric projection optical system, the image plane shape control member is provided in an optical path between the first substrate and the first deflecting member, or in the second deflecting member and the second substrate. Are arranged in an optical path between the image plane shape control member and the image plane shape control member. And controlling the shape of the image surface formed on the second substrate by the projection optical unit by replacing at least one lens that.
[0028]
According to the catadioptric projection optical system according to the fifteenth and sixteenth aspects, the image plane shape control member is provided in the optical path between the first substrate and the first deflecting member or between the second deflecting member and the second deflecting member. It is arranged in an optical path between the substrate and the substrate. That is, since the image plane shape control member is disposed outside the image forming optical system, for example, replacement of at least one lens constituting the image plane shape control member can be performed very easily, and the second substrate The shape of the image plane formed thereon can be easily controlled.
[0029]
Further, in the catadioptric projection optical system according to claim 17, the image plane shape control member is configured such that an optical axis of a lens constituting the projection optical unit and an optical axis of a lens constituting the image plane shape control member. It is characterized by being arranged so as to match.
[0030]
According to the catadioptric projection optical system of the present invention, since the optical axis of the lens forming the projection optical unit and the optical axis of the lens forming the image plane shape control member coincide with each other, Even when the image plane shape is controlled using the image plane shape control member, the image plane shape can be controlled without generating eccentric aberration.
[0031]
The catadioptric projection optical system according to claim 18, wherein the optical path between the first substrate and the first deflecting member or the optical path between the second deflecting member and the second substrate. Preferably, the apparatus further comprises an image shift correcting unit for correcting an image shift generated by the image plane shape control unit.
[0032]
According to the catadioptric projection optical system of the eighteenth aspect, the image shift correction means can correct the image shift caused by the control of the image plane shape by the image plane shape control member.
[0033]
In the catadioptric projection optical system according to claim 19, the image plane shape control member is constituted by a first plano-concave lens, a biconvex lens, and a second plano-concave lens, and the first plano-concave lens, the biconvex lens, and the By exchanging at least one of the second plano-concave lenses, the shape of the image plane formed on the second substrate by the projection optical unit is controlled.
[0034]
In the catadioptric projection optical system according to claim 20, the image plane shape control member is constituted by a first plano-convex lens, a biconcave lens and a second plano-convex lens, and the first plano-convex lens, the biconcave lens and the By exchanging at least one of the second plano-convex lenses, the shape of the image plane formed on the second substrate by the projection optical unit is controlled.
[0035]
According to the catadioptric projection optical system of the present invention, by exchanging at least one of the lenses constituting the image plane shape control member, the projection optical unit is formed on the second substrate. It is possible to control the shape of the obtained image plane.
[0036]
In a catadioptric projection optical system according to a twenty-first aspect, the image plane shape control member has a function as a magnification correcting unit.
[0037]
According to the catadioptric projection optical system of the twenty-first aspect, the magnification of the projection optical unit can be adjusted by changing the distance between the lenses constituting the image plane shape control member.
[0038]
The catadioptric projection optical system according to claim 22, wherein the imaging optical system includes a first refractive optical system and a first concave reflecting mirror, and forms a primary image of the pattern on the first substrate. A second catadioptric optical system, a second dioptric optical system, and a second concave reflecting mirror for condensing light from the primary image to form a secondary image of the pattern on the second substrate; And a catadioptric optical system.
[0039]
In a catadioptric projection optical system according to a twenty-third aspect, the image plane shape control member suppresses an image plane shape in the optical axis direction of the projection optical unit.
[0040]
The scanning projection exposure apparatus according to claim 24, wherein the first substrate and the second substrate are moved with respect to a projection optical system, and a pattern formed on the first substrate is transferred to the projection optical system through the projection optical system. In a scanning projection exposure apparatus that performs projection exposure on two substrates, the projection optical system is constituted by the projection optical system according to any one of claims 1 to 14.
[0041]
A scanning projection exposure apparatus according to claim 25, wherein the first substrate and the second substrate are moved with respect to a projection optical system, and a pattern formed on the first substrate is transferred to the second substrate via the projection optical system. In a scanning projection exposure apparatus for projecting and exposing on two substrates, the projection optical system is constituted by the catadioptric projection optical system according to any one of claims 15 to 23.
[0042]
According to the scanning projection exposure apparatus of the present invention, since the magnification adjustment of the projection optical system or the catadioptric projection optical system is performed well, the pattern formed on the first substrate can be removed. Projection exposure can be favorably performed on the second substrate.
[0043]
27. The exposure method according to claim 26, wherein the first substrate and the second substrate are moved with respect to a projection optical system including a plurality of projection optical units, and a pattern formed on the first substrate is projected onto the projection optical system. 15. An exposure method for projecting and exposing at a same magnification onto the second substrate via the projection optical system according to any one of claims 1 to 14, wherein the first substrate and the second substrate are provided to the projection optical system according to any one of claims 1 to 14. It is characterized by including a step of performing scanning exposure by moving.
[0044]
The exposure method according to claim 27, wherein the first substrate and the second substrate are moved with respect to a projection optical system including a plurality of catadioptric projection optical units, and the pattern formed on the first substrate is changed. 24. An exposure method for projecting and exposing at a same magnification onto the second substrate via the projection optical system, wherein the first and second catadioptric projection optical systems according to any one of claims 15 to 23 are arranged in the first direction. A step of performing scanning exposure by moving the substrate and the second substrate.
[0045]
According to the exposure method of claim 26 and claim 27, since the magnification adjustment of the projection optical system or the catadioptric projection optical system is performed well, the pattern formed on the first substrate is Good projection exposure can be performed on the substrate.
[0046]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view schematically showing an overall configuration of a scanning projection exposure apparatus according to an embodiment of the present invention. FIG. 2 is a perspective view showing the overall configuration of the scanning projection exposure apparatus in more detail, focusing on one typical projection optical unit among a plurality of projection optical units constituting the projection optical system. 1 and 2, the X-axis is set along a direction (scanning direction) in which a mask (first substrate) 10 on which a predetermined circuit pattern is formed and a glass substrate (second substrate) 30 coated with a resist are moved. You have set. The Y axis is set along the direction orthogonal to the X axis in the plane of the mask 10, and the Z axis is set along the normal direction of the glass substrate 30.
[0047]
The illustrated projection exposure apparatus includes an illumination optical system (not shown in FIGS. 1 and 2) for uniformly illuminating a mask 10 supported in parallel with an XY plane on a mask stage (not shown in FIG. 1). ). This illumination optical system illuminates a plurality (seven in FIG. 1 in total) of trapezoidal regions arranged in the Y direction on the mask 10. Light from each illumination area on the mask 10 enters a projection optical system including a plurality of projection optical units arranged along the Y direction so as to correspond to each illumination area. The light having passed through the projection optical system forms a mask pattern image on a glass substrate 30 supported on a substrate stage (not shown in FIG. 1) 31 in parallel with the XY plane. In addition, since each projection optical unit is configured as an equal magnification erecting system as described later, a plurality of trapezoidal shapes arranged in the Y direction on the glass substrate 30 which is a photosensitive substrate so as to correspond to each illumination area. An erect image of the same size as that of the mask pattern is formed in the exposure region of.
[0048]
Meanwhile, the mask stage 11 is provided with a scanning drive system 14 having a long stroke for moving the stage along the X direction which is the scanning direction. Further, a pair of alignment driving systems 15 and 16 are provided for moving the mask stage 11 by a minute amount in the Y direction and rotating the mask stage 11 by a minute amount around the Z axis. Although not shown, a similar drive system is also provided on the substrate stage 31. That is, a scanning drive system having a long stroke for moving the substrate stage 31 along the X direction which is the scanning direction, moving the substrate stage 31 by a minute amount along the Y direction, and rotating by a minute amount around the Z axis. A pair of alignment driving systems for causing the alignment is provided.
[0049]
In this manner, the mask 10 and the glass substrate 30 are synchronously moved along the X direction with respect to the projection optical system including a plurality of projection optical units by the operation of the scan drive system 14 on the mask stage side and the scan drive system on the substrate stage side. By doing so, the entire pattern area on the mask 10 can be transferred to the entire exposure area on the glass substrate 30. The shape and arrangement of the plurality of trapezoidal exposure regions and the shape and arrangement of the plurality of trapezoidal illumination regions are described in detail in, for example, JP-A-7-183212.
[0050]
FIG. 3 is a diagram illustrating a configuration of each projection optical unit according to the embodiment of the present invention. The illustrated projection optical unit PL includes a first imaging optical system K1 that forms a primary image of a mask pattern based on light from the mask 10, and an erect erect image (second image) of the mask pattern based on light from the primary image. (Second image) on the glass substrate 30. In the vicinity of the position where the primary image of the mask pattern is formed, a viewing area (illumination area) of the projection optical unit PL on the mask 10 and a projection area (exposure area) of the projection optical unit PL on the glass substrate 30 are defined. A field stop FS is provided.
[0051]
The first imaging optical system K <b> 1 is a first deflection obliquely arranged at an angle of 45 ° with respect to the mask surface (XY plane) so as to reflect light incident along the −Z direction from the mask 10 in the + X direction. The first reflecting surface P1r of the member (first deflecting member) is provided. The first imaging optical system K1 includes, in order from the first reflecting surface P1r side, a first refractive optical system G1P having a positive refractive power and a first concave reflecting mirror having a concave surface facing the first reflecting surface P1r side. M1. The first refractive optical system G1P and the first concave reflecting mirror M1 are arranged along the X direction, and constitute a first catadioptric optical system HK1 as a whole. Further, the first imaging optical system K1 has an angle of 45 ° with respect to the mask surface (XY plane) so that the light incident from the first catadioptric optical system HK1 along the -X direction is reflected in the -Z direction. And the second reflecting surface P2r of the second deflecting member (third deflecting member) obliquely provided.
[0052]
On the other hand, the second imaging optical system K2 is inclined at an angle of 45 ° with respect to the glass substrate surface (XY plane) so that light incident along the −Z direction from the second reflection surface P2r is reflected in the + X direction. The third reflecting surface P3r of the provided third deflecting member (fourth deflecting member) is provided. The second imaging optical system K2 includes, in order from the third reflecting surface P3r side, a second refractive optical system G2P having a positive refractive power and a second concave reflecting mirror having a concave surface facing the third reflecting surface P3r side. M2. The second refractive optical system G2P and the second concave reflecting mirror M2 are arranged along the X direction, and constitute a second catadioptric optical system HK2 as a whole. Further, the second imaging optical system K2 is 45 ° with respect to the glass substrate surface (XY plane surface) so as to reflect the light incident from the second catadioptric optical system HK2 along the −X direction in the −Z direction. The fourth reflection surface P4r of the fourth deflection member (second deflection member) inclined at an angle of?
[0053]
Further, a magnification adjusting member 44 is provided in an optical path between the fourth reflection surface P4r of the fourth deflecting member and the glass substrate 30. Further, in order to correct the image shift caused by the magnification adjustment by the magnification adjusting member 44, a wedge lens (second image shift correcting means) is provided in the optical path between the mask 10 and the first reflecting surface P1r of the first deflecting member. 40 and a plane-parallel plate (first image shift correcting means) 42 constituting an image shifter are provided. Here, the wedge lens 40 has a pair of wedge-shaped optical members in which the entrance surface and the exit surface are flat and both surfaces have a predetermined apex angle, and the focus for correcting the image forming position is provided. It constitutes a position correcting means. The plane-parallel plate 42 constitutes an image shifting means for correcting (shifting) the image forming position.
[0054]
As described above, the pattern formed on the mask 10 is illuminated with illumination light (exposure light) from an illumination optical system generally used in the art with almost uniform illuminance. Light traveling in the −Z direction from the mask pattern formed in each illumination area on the mask 10 is incident on the first reflection surface P1r via the wedge lens 40 and the parallel flat plate 42, and is incident on the first reflection surface P1r. The light is deflected by 90 ° by P1r and enters the first catadioptric optical system HK1 along the + X direction. The light incident on the first catadioptric optical system HK1 reaches the first concave reflecting mirror M1 via the first dioptric system G1P. The light reflected by the first concave reflecting mirror M1 again enters the second reflecting surface P2r along the -X direction via the first refractive optical system G1P. The light that has been deflected by 90 ° on the second reflection surface P2r and has traveled along the −Z direction forms a primary image of the mask pattern near the field stop FS. The lateral magnification of the primary image in the X direction is +1 times, and the lateral magnification in the Y direction is -1 times.
[0055]
The light that has traveled along the −Z direction from the primary image of the mask pattern is deflected by 90 ° by the third reflecting surface P3r, and enters the second catadioptric optical system HK2 along the + X direction. The light incident on the second catadioptric optical system HK2 reaches the second concave reflecting mirror M2 via the second refracting optical system G2P. The light reflected by the second concave reflecting mirror M2 again enters the fourth reflecting surface Pr4 along the -X direction via the second refractive optical system G2P. The light that has been deflected by 90 ° on the fourth reflection surface Pr4 and has traveled along the −Z direction forms a secondary image of the mask pattern on the corresponding exposure area on the glass substrate 30 via the magnification correction member 44. . Here, the lateral magnification in the X direction and the lateral magnification in the Y direction of the secondary image are both +1 times. That is, the mask pattern image formed on the glass substrate 30 via the projection optical unit PL is an equal-size erect image, and the projection optical unit PL forms an equal-size erect system.
[0056]
In the above-mentioned first catadioptric optical system HK1, the first concave reflecting mirror M1 is disposed at the rear focal position of the first dioptric system G1P, so that it is telecentric on the mask 10 side and the field stop FS side. . Also in the second catadioptric optical system HK2, since the second concave reflecting mirror M2 is disposed at the rear focal position of the second dioptric system G2P, the second catadioptric system HK2 is telecentric on the field stop FS side and the glass substrate 30 side. . As a result, the projection optical unit PL is a telecentric optical system on both sides (the mask 10 side and the glass substrate 30 side).
[0057]
As described above, the mask pattern image formed on the glass substrate 30 via the projection optical unit PL is an equal-sized erect image. Therefore, desired scanning exposure is performed by integrally moving the mask 10 held on the mask stage 11 and the glass substrate 30 held on the substrate stage 31 in the same direction (X direction). Can be.
[0058]
Next, the adjustment of the magnification of the projection optical unit PL, that is, the adjustment of the projection magnification from the mask 10 to the glass substrate 30 will be described. The projection optical system according to this embodiment is an upright erect image composed of a plurality of projection optical units PL, and a projection optical system of the same magnification. An error may occur in the magnification in the projection optical unit PL. In such a case, in order to make the magnification of each projection optical unit PL equal, the magnification is adjusted in each projection optical unit PL.
[0059]
Here, in FIG. 3, the optical axis of the first catadioptric optical system HK1 is represented by AX1, and the optical axis of the second catadioptric optical system HK2 is represented by AX2. Further, the light travels in the −Z direction from the center of the field of view on the mask 10 defined by the field stop FS, passes through the center of the field stop FS, and the center of the exposure area on the glass substrate 30 also defined by the field stop FS. Is indicated by the axis AXFC. As shown in FIG. 3, the visual field center axis AXFC is located between the mask 10 and the first reflecting surface P1r of the first deflecting member, the second reflecting surface P2r of the second deflecting member, and the third reflecting surface of the third deflecting member. P3r and in the optical path between the fourth reflection surface P4r of the fourth deflecting member and the glass substrate 30 along the Z direction.
[0060]
The axis AXFC is located between the first catadioptric optical system HK1 and the first reflecting surface P1r of the first deflecting member, between the first catadioptric optical system HK1 and the second reflecting surface P2r of the second deflecting member, The X direction in the optical path between the second catadioptric optical system HK2 and the third reflecting surface P3r of the third deflecting member and between the second catadioptric optical system HK2 and the fourth reflecting surface P4r of the fourth deflecting member. Extends along. Further, the axis AXFC is folded symmetrically with respect to the optical axis AX1 at the center of the reflecting surface of the first concave reflecting mirror M1 (that is, at the intersection with the optical axis AX1), and the center of the reflecting surface of the second concave reflecting mirror M2 (that is, (Intersection with the axis AX2), it is folded symmetrically with respect to the optical axis AX2.
[0061]
In the optical path between the fourth reflecting surface P4r and the glass substrate 30, the magnification adjusting member 44 is arranged such that the optical axis of the lens constituting the magnification adjusting member 44 and the optical axis of the lens constituting the projection optical unit PL (optical axes AX1 and AX1). The optical axes AX2) are arranged so as to coincide with each other. That is, the magnification adjusting member 44 is composed of a plano-concave lens, a biconvex lens, and a plano-concave lens arranged in order from the fourth reflection surface P4r along the optical axis AX1 and the optical axis AX2. One convex surface, the other convex surface of the biconvex lens, and the concave surface of the plano-concave lens face each other at a predetermined interval.
[0062]
The magnification of each projection optical unit PL is adjusted by changing the distance between the plano-concave lens, the biconvex lens, and the plano-concave lens constituting the magnification adjusting member 44. In each projection optical unit PL, since the optical axis of the lens constituting the projection optical unit PL and the optical axis of the lens constituting the magnification adjusting member 44 coincide with each other, a plano-concave lens constituting the magnification adjusting member 44, Even when the magnification is adjusted by changing the distance between the biconvex lens and the plano-concave lens, eccentric aberration does not occur. However, as shown in FIG. 4, since the center of the exposure area (exposure center) does not coincide with the optical axis of the lens constituting the magnification adjusting member 44, the plano-concave lens and the biconvex lens constituting the magnification adjusting member 44 In addition, when the magnification is adjusted by changing the distance between the plano-concave lenses, an image shift occurs.
[0063]
Accordingly, the image shift caused by the magnification adjustment by the magnification adjusting member 44 is corrected by the wedge lens 40 and the parallel flat plate 42 constituting the image shift correcting means. That is, the image shift in the direction perpendicular to the optical axis of the lens forming the projection optical unit PL is corrected by tilting the parallel plane plate (first image shift correcting means) 42, and the light of the lens forming the projection optical unit PL is corrected. The displacement of the image in the axial direction (the displacement of the focal position) is changed by relatively moving a pair of wedge-shaped optical members constituting the wedge lens (second image displacement correcting means) 40 to change the optical path length of the entire wedge lens 40. To compensate for this. The function of the parallel plane plate (first image shift correcting unit) 42 is disclosed in Japanese Patent Application Laid-Open No. 7-183212. The function of the wedge lens (second image shift correcting unit) 40 is disclosed in International Patent Publication WO00 / 19261.
[0064]
The control of the image plane shape (for example, the adjustment of the Petzval image plane, that is, the correction of the curvature of the image plane where the meridional image plane and the sagittal image plane are matched) using the magnification adjusting member 44 according to the present embodiment. Is also possible. That is, in this case, the magnification adjusting member 44 constitutes an image plane shape control member. 5A and 5B each show an example of the magnification adjusting member 44. The magnification adjusting member shown in FIG. 5B is a magnification adjusting member shown in FIG. 5A. Is changed to a biconvex lens having a large radius of curvature of the lens surface. By changing the curvature of the lens surface in this way, the control of the image forming surface, that is, the image forming surface can be curved.
[0065]
Although the radius of curvature of both lens surfaces of the biconvex lens is changed in the example shown in FIG. 5, the radius of curvature of one lens surface may be changed. Further, the imaging plane may be controlled by changing the radius of curvature of at least one of the plano-concave lens, the biconvex lens, and the plano-concave lens constituting the magnification adjusting member 44. When the radius of curvature of the lens surface is changed, the lens whose curvature radius is changed may be taken out of the magnification adjusting member 44 and returned to the magnification adjusting member 44 after processing. The lens for changing the radius of curvature is taken out of the magnification adjusting member 44, and another lens having a lens surface with a different radius of curvature (or a lens having the same radius of curvature and made of a glass material having a different refractive index) is mounted on the magnification adjusting member 44. May be returned.
[0066]
Further, in the above embodiment, the magnification adjusting member 44 is constituted by a plano-concave lens, a biconvex lens and a plano-concave lens, but the magnification adjusting member 44 may be constituted by a plano-convex lens, a biconcave lens and a plano-convex lens. Also in this case, the magnification can be adjusted by changing the distance between the plano-convex lens, the biconcave lens, and the plano-convex lens constituting the magnification adjusting member 44. In each projection optical unit PL, since the optical axis of the lens constituting the projection optical unit PL and the optical axis of the lens constituting the magnification adjusting member 44 coincide with each other, a plano-convex lens constituting the magnification adjusting member 44, Even when the magnification is adjusted by changing the distance between the biconcave lens and the plano-convex lens, eccentric aberration does not occur. However, since the center of the exposure area does not coincide with the optical axis of the lens constituting the magnification adjusting member 44, the magnification is changed by changing the distance between the plano-convex lens, the biconcave lens and the plano-convex lens constituting the magnification adjusting member 44. Image adjustment occurs when the adjustment is made. Accordingly, the image shift caused by the magnification adjustment by the magnification adjusting member 44 is corrected by the wedge lens 40 and the parallel flat plate 42 constituting the image shift correcting means.
[0067]
It is also possible to adjust the Petzval image plane using the magnification adjusting member 44 constituted by the plano-convex lens, the biconcave lens and the plano-convex lens. That is, it is also possible to control the image forming surface by changing at least one radius of curvature of the lens surfaces of the plano-convex lens, the biconcave lens, and the plano-convex lens constituting the magnification adjusting member 44.
[0068]
Further, in the above-described embodiment, the magnification adjusting member 44 is disposed in the optical path between the fourth reflection surface P4r of the fourth deflecting member and the glass substrate 30, but is not limited thereto. Various modifications are possible for the arrangement of the adjustment member.
[0069]
That is, in the above-described embodiment, the magnification adjustment member 44 is moved between the mask 10 and the first reflection surface P1r of the first deflection member in the optical path between the first reflection surface P1r of the first deflection member and the first reflection / refraction. In the optical path between the optical system HK1 and the optical path between the first catadioptric optical system HK1 and the second reflecting surface P2r of the second deflecting member, the second reflecting surface P2r of the second deflecting member and the third deflecting member. In the optical path between the third reflecting surface P3r and the third reflecting surface P3r of the third deflecting member and the second catadioptric optical system HK2, and in the optical path between the second catadioptric optical system HK2 and the fourth deflecting member. It may be provided in the optical path between the member and the fourth reflection surface P4r, in the optical path of the first catadioptric optical system HK1 or the second catadioptric optical system HK2 (imaging optical system).
[0070]
In the above-described embodiment, the magnification adjusting member 44 is in the optical path between the mask 10 and the first reflecting surface P1r of the first deflecting member or between the fourth reflecting surface P4r of the fourth deflecting member and the glass substrate 30. Since the magnification adjusting member 44 is disposed outside the image forming optical system when the optical path is disposed in the optical path of (1), the distance between the lenses constituting the magnification adjusting member 44 can be adjusted very easily. The magnification of the optical unit PL can be easily adjusted.
[0071]
When the magnification adjusting member 44 constitutes an image plane shape control member, since the image plane shape control member is disposed outside the imaging optical system, at least one lens constituting the image plane shape control member is provided. Can be exchanged very easily, and the shape of the image plane formed on the second substrate can be easily controlled.
[0072]
In the above-described embodiment, the wedge lens 40 and the parallel plane plate 42 are provided in the optical path between the mask 10 and the first reflection surface P1r of the first deflecting member. In the optical path between the first reflecting surface P1r and the first catadioptric optical system HK1, in the optical path between the first catadioptric optical system HK1 and the second reflecting surface P2r of the second deflecting member, In the optical path between the second reflecting surface P2r and the third reflecting surface P3r of the third deflecting member, in the optical path between the third reflecting surface P3r of the third deflecting member and the second catadioptric optical system HK2, Provided in the optical path between the two catadioptric optical system HK2 and the fourth reflecting surface P4r of the fourth deflecting member, in the optical path of the first catadioptric optical system HK1 or the second catadioptric optical system HK2 (imaging optical system). You may do so.
[0073]
In the above-described embodiment, the wedge lens 40 and the parallel plane plate 42 are in the optical path between the mask 10 and the first reflecting surface P1r of the first deflecting member, or between the fourth reflecting surface P4r of the fourth deflecting member and the glass substrate. If the wedge lens 40 and the parallel plane plate 42 are arranged in the optical path between the wedge lens 40 and the parallel plane plate 42, the image shift can be corrected very easily.
[0074]
Next, a method for manufacturing a micro device using the exposure apparatus according to the embodiment of the present invention in a lithography process will be described. In the exposure apparatus according to the embodiment of the present invention, a liquid crystal display element as a micro device can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate).
[0075]
FIG. 6 is a flowchart for explaining a method of manufacturing a liquid crystal display element as a micro device. In the pattern forming step S50 in FIG. 6, a so-called photolithography step of transferring and exposing a mask pattern onto a photosensitive substrate (a glass substrate coated with a resist) using the exposure apparatus of the present embodiment is performed. In this optical lithography process, a mask is illuminated using an illumination device, and an image of a pattern on the mask is projected onto a substrate by exposure and transfer using a projection optical system, and includes a large number of electrodes and the like on a glass substrate. A predetermined pattern is formed.
[0076]
That is, as shown in FIG. 2, the mask 10 is provided with three alignment marks MA1, MA2, and MA3. The glass substrate 30 is also provided with three alignment marks PA1, PA2, and PA3. Here, in the mask 10, the alignment marks MA1 and MA2 are arranged at intervals along the Y direction, and the alignment marks MA2 and MA3 are arranged at intervals along the X direction. Corresponding to this, in glass substrate 30, alignment marks PA1 and PA2 are arranged at intervals along the Y direction, and alignment marks PA2 and PA3 are arranged at intervals along the X direction. I have.
[0077]
As shown in FIG. 2, two alignment sensors A1 and A2 are arranged above the mask 10 (in the + Z direction) at intervals along the Y direction. Therefore, by aligning the X direction position and the Y direction position of mask 10 and glass substrate 30 with two alignment sensors A1 and A2, alignment sensors A1 and A2 detect the positions of alignment marks MA1 and MA2, respectively. , The positions of the alignment marks PA1 and PA2 are detected via the corresponding projection optical units PL. Next, by aligning the X direction position and the Y direction position of the mask 10 and the glass substrate 30 with respect to the alignment sensor A2, the alignment sensor A2 detects the positions of the alignment marks MA3 and PA3.
[0078]
Thus, the relative positional relationship between the mask 10 and the glass substrate 30 can be detected based on the position detection of each alignment mark. That is, it is possible to detect a positional deviation in the X direction, a positional deviation in the Y direction, and a positional deviation in the rotation direction around the Z axis between the mask 10 and the glass substrate 30. Then, based on the detected positional deviation information, the mask stage 11 and, consequently, the mask 10 are driven via the driving systems 14, 15 and 16, and the alignment between the mask 10 and the glass substrate 30 is performed. In this case, the positioning can be performed by driving the substrate stage 31 and, consequently, the glass substrate 30 using the driving system on the substrate stage 31 side. When the mask 10 and the glass substrate 30 are aligned with each other, the mask 10 and the glass substrate 30 are synchronously moved along the X direction, so that the entire pattern region of the mask 10 corresponds to the exposure region on the glass substrate 30. Transcribed throughout.
[0079]
Thereafter, the exposed substrate is subjected to a development process, an etching process, a reticle peeling process, and other processes to form a predetermined pattern on the substrate, and the process proceeds to the next color filter forming process S52.
[0080]
Next, in a color filter forming step S52, a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or three R, G, B Are formed in a horizontal scanning line direction to form a color filter. Then, after the color filter forming step S52, a cell assembling step S54 is performed. In the cell assembling step S54, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern forming step S50, the color filters obtained in the color filter forming step S52, and the like.
[0081]
In the cell assembling step S54, for example, a liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern forming step S50 and the color filter obtained in the color filter forming step S52, and a liquid crystal panel (liquid crystal cell) is formed. ) To manufacture. afterwards,
In the module assembling step S56, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete a liquid crystal display element. According to the above-described method for manufacturing a liquid crystal display device, a liquid crystal display device having an extremely fine circuit pattern can be obtained with high throughput.
[0082]
Next, the aberration occurring at the position (X, Y) in the exposure area in each projection optical unit PL of the present invention will be described. Table 1 shows the projection optical unit PL of the present invention, that is, the projection optical unit PL in which the optical axis of the lens forming the projection optical unit coincides with the optical axis of the lens forming the magnification correction member. 7 shows aberrations occurring at the position (X, Y) in the exposure area shown in FIG.
[0083]
[Table 1]

[0084]
Table 2 shows the aberrations generated at the position (X, Y) in the exposure area shown in FIG. 7 by decentering the optical axis of the lens constituting the magnification correction member to the center of the exposure area (exposure center). Is shown.
[0085]
[Table 2]

(Table 3) shows aberrations obtained by removing the aberrations shown in (Table 1) from the aberrations shown in (Table 2).
[0086]
[Table 3]

[0087]
In the aberration (Table 1) when the optical axis of the lens constituting the projection optical unit coincides with the optical axis of the lens constituting the magnification correcting member, both M (meridional) and S (sagittal) are projected. Since the rotation target component is generated substantially in the rotation target with respect to the optical axis of the optical system, this rotation target component is excluded from the aberration (Table 2) when the optical axis of the lens constituting the magnification correction member and the exposure center coincide. Thus, a rotationally asymmetric component can be extracted (Table 3).
[0088]
Since the aberrations (ΔM, ΔS) shown in Table 3 are almost uniform values over the entire exposure area, the aberration correction can be performed by changing the distance between the lenses constituting the magnification correction member. Can't do it. Therefore, in order to prevent such rotationally asymmetrical eccentric aberration from occurring, as shown in the present embodiment, the optical axis of the lens forming the projection optical unit and the optical axis of the lens forming the magnification correcting member coincide with each other. There is a need.
[0089]
Next, an embodiment of each projection optical unit PL of the present invention will be described. In the embodiment, i-line (λ = 365 nm), h-line (λ = 405 nm), and g-line (λ = 436 nm), which are reference wavelengths, are used as exposure wavelengths. (Table 4) lists values of specifications of each projection optical unit PL of the embodiment. In Table 4, surface numbers indicate the order of the surfaces from the mask side along the direction in which light rays travel along the axis AXFC from the mask surface, which is the object surface, to the glass substrate surface, which is the image surface, and r indicates the number of each surface. The radius of curvature is indicated by d, and the on-axis interval of each surface, that is, the surface interval is indicated. Table 5 shows the values of the specifications of each projection optical unit PL in which the magnification correction member is changed. Also in Table 5, surface numbers indicate the order of surfaces from the mask side along the direction in which light rays travel along the axis AXFC from the mask surface, which is the object surface, to the glass substrate surface, which is the image surface, and r indicates each surface. Indicates the radius of curvature of d, and d indicates the on-axis interval of each surface, that is, the surface interval.
[0090]
In Tables 4 and 5, the sign of the on-axis spacing d of each surface changes each time it is reflected. Therefore, the sign of the surface distance d is negative in the optical path from the first reflecting surface P1r to the first concave reflecting mirror M1, and negative in the optical path from the second reflecting surface P2r to the third reflecting surface P3r. It is negative in the optical path from the concave reflecting mirror M2 to the fourth reflecting surface P4r, and positive in the other optical paths. Then, in the optical path where the on-axis distance d between the surfaces is positive, the radius of curvature of the convex surface toward the light incident side is positive, and the radius of curvature of the concave surface is negative. Conversely, in the optical path where the on-axis spacing d of each surface is negative, the radius of curvature of the concave surface is positive and the radius of curvature of the convex surface is negative toward the light incident side. Further, in (Table 4) and (Table 5), n (i), n (h), and n (g) are i-line (λ = 365 nm), h-line (λ = 405 nm), and g-line (λ = 436 nm). ) Respectively. Note that the sign of the refractive index is negative in the optical path where the on-axis distance d between the surfaces is negative.
[0091]
[Table 4]

[0092]
[Table 5]

The lens data shown in (Table 4) is a case where the magnification correcting member is formed of a lens, and the lens data shown in (Table 5) is a case where the magnification correcting member is entirely formed of a parallel plane plate. Aberration is generated by changing the plane-parallel plate constituting the magnification correction member to a lens, and the concave mirror is moved in the optical axis direction to correct the generated aberration. That is, the concave mirror is moved by 60 μm in the optical axis direction. The distance between the magnification correcting member and the glass substrate is shortened by 111.9 μm.
[0093]
【The invention's effect】
According to the projection optical system of the present invention, since the optical axis of the lens constituting the projection optical unit and the optical axis of the lens constituting the magnification adjusting member are arranged to coincide with each other, the magnification is adjusted using the magnification adjusting member. Also in the case of performing the adjustment, the magnification can be adjusted without causing the eccentric aberration. Further, the image shift correcting means can correct the image shift caused by the magnification adjustment by the magnification adjusting member.
[0094]
Further, according to the projection optical system of the present invention, by changing the radius of curvature of at least one of the lens surfaces of the lens constituting the magnification adjusting member, the projection optical unit can be used to adjust the image plane formed on the second substrate. The shape can be controlled.
[0095]
According to the catadioptric projection optical system of the present invention, the image plane shape control member is provided in the optical path between the first substrate and the first deflecting member or between the second deflecting member and the second substrate. Are arranged in the optical path. That is, since the image plane shape control member is disposed outside the imaging optical system, at least one lens constituting the image plane shape control member can be replaced very easily, and the image plane shape control member is formed on the second substrate. It is possible to easily control the shape of the obtained image plane.
[0096]
According to the catadioptric projection optical system of the present invention, since the optical axis of the lens constituting the projection optical unit and the optical axis of the lens constituting the image plane shape control member are arranged so as to coincide with each other, Even when the image plane shape is controlled using the image plane shape control member, the image plane shape can be controlled without generating eccentric aberration.
[0097]
According to the catadioptric projection optical system of the present invention, by exchanging at least one of the lenses constituting the image plane shape control member, the image plane formed on the second substrate by the projection optical unit is replaced. Can be controlled.
[0098]
Further, according to the scanning projection exposure apparatus of the present invention, since the magnification adjustment of the projection optical system or the catadioptric projection optical system is well performed, the pattern formed on the first substrate is transferred to the second substrate. Projection exposure can be performed well on top.
[0099]
In addition, according to the exposure method of the present invention, since the magnification adjustment of the projection optical system or the catadioptric projection optical system is performed well, the pattern formed on the first substrate can be favorably placed on the second substrate. Can be exposed to light.
[Brief description of the drawings]
FIG. 1 is a perspective view showing an overall schematic configuration of a scanning exposure apparatus according to an embodiment of the present invention.
FIG. 2 is a perspective view showing an overall configuration of a scanning exposure apparatus, focusing on one of the projection optical units constituting the projection optical system according to the embodiment of the present invention.
FIG. 3 is a diagram showing a configuration of each projection optical unit according to the embodiment of the present invention.
FIG. 4 is a diagram for explaining an image shift occurring due to a magnification adjustment of each projection optical unit according to the embodiment of the present invention.
FIG. 5 is a diagram for explaining image plane control performed by the magnification adjusting member according to the embodiment of the present invention.
FIG. 6 is a flowchart of a method for manufacturing a liquid crystal display element as a micro device according to an embodiment of the present invention.
FIG. 7 is a diagram showing a position in an exposure area of the projection optical unit according to the embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 ... Mask, 11 ... Mask stage, 30 ... Glass substrate, 31 ... Substrate stage, 40 ... Wedge lens, 42 ... Parallel plane plate, 44 ... Magnification correction member, PL ... Projection optical unit, K1 ... 1st imaging optical system , K2: second imaging optical system, FS: field stop, HK1: first catadioptric optical system, HK2: second catadioptric optical system, G1P: first dioptric optical system, G2P: second dioptric optical system, M1 ... a first concave reflecting mirror, M2 ... a second concave reflecting mirror.

Claims (27)

A projection optical system having a plurality of projection optical units for forming an image of a pattern on a first substrate on a second substrate,
Each of the plurality of projection optical units includes a magnification adjusting member for adjusting a projection magnification,
The projection optical system, wherein the magnification adjusting member is arranged such that an optical axis of a lens constituting the projection optical unit coincides with an optical axis of a lens constituting the magnification adjusting member. 2. The projection optical system according to claim 1, further comprising an image shift correcting unit that corrects an image shift caused by a magnification correction by the magnification adjusting member. 3. The projection apparatus according to claim 2, wherein the image shift correcting unit includes a first image shift correcting unit that corrects an image shift in a direction orthogonal to an optical axis of a lens included in the projection optical unit. Optical system. The projection optical system according to claim 3, wherein the first image shift correcting unit is an image shifting unit including a plane-parallel plate. 3. The projection optical system according to claim 2, wherein the image shift correcting unit includes a second image shift correcting unit that corrects an image shift in a direction of an optical axis of a lens included in the projection optical unit. 4. The projection optical system according to claim 5, wherein the second image shift correcting unit is a focal position correcting unit including a wedge lens. 7. The projection optical system according to claim 1, wherein the magnification adjusting member includes at least two lenses, and performs magnification adjustment by changing a distance between the lenses. 8. system. The magnification adjusting member includes a first plano-concave lens, a biconvex lens, and a second plano-concave lens, and changes a radius of curvature of at least one of lens surfaces of the first plano-concave lens, the biconvex lens, and the second plano-concave lens. The projection optical system according to claim 7, wherein the shape of an image plane formed on the second substrate is controlled by the projection optical unit. 9. The shape of an image plane formed on the second substrate by the projection optical unit by changing a radius of curvature of at least one lens surface of the biconvex lens. Projection optics. The magnification adjusting member includes a first plano-convex lens, a biconcave lens, and a second plano-convex lens, and changes a radius of curvature of at least one lens surface of the first plano-convex lens, the biconcave lens, and the second plano-convex lens. The projection optical system according to claim 7, wherein the shape of an image plane formed on the second substrate is controlled by the projection optical unit. The shape of an image plane formed on the second substrate by the projection optical unit is controlled by changing a radius of curvature of at least one lens surface of the biconcave lens. Projection optics. Each of the plurality of projection optical units, an imaging optical system including a refractive optical system and a concave reflecting mirror, a first deflecting member for guiding light from the first substrate to the imaging optical system, A second deflecting member for guiding light passing through the imaging optical system to the second substrate,
The magnification adjusting member is provided in the optical path between the first substrate and the first deflecting member, in the optical path between the first deflecting member and the image forming optical system, and in the image forming optical system. The image forming apparatus according to claim 1, wherein the optical element is disposed in an optical path between the second deflecting member, an optical path between the second deflecting member and the second substrate, or an optical path of the imaging optical system. The projection optical system according to claim 1. The image misalignment correction unit may be arranged in an optical path between the first substrate and the first deflecting member, in an optical path between the first deflecting member and the imaging optical system, It is arranged in an optical path between the second deflecting member, in an optical path between the second deflecting member and the second substrate, or in an optical path of the imaging optical system. The projection optical system according to claim 12. A first catadioptric optical system including a first refractive optical system and a first concave reflecting mirror for condensing light from the pattern on the first substrate to form a primary image of the pattern; A second catadioptric system including a system and a second refractive optical system and a second concave reflecting mirror for condensing light from the primary image to form a secondary image of the pattern on the second substrate System, a third deflecting member for guiding light via the first catadioptric system to the primary image, and a fourth deflecting member for guiding light from the primary image to the second catadioptric system. Having a deflecting member,
The magnification adjusting member is provided in the optical path between the first substrate and the first deflecting member, in the optical path between the first deflecting member and the first catadioptric optical system, in the first catadioptric system. In the optical path between the optical system and the third deflecting member, in the optical path between the third deflecting member and the fourth deflecting member, the fourth deflecting member and the second catadioptric optical system In the optical path between the second catadioptric system and the second deflecting member, in the optical path between the second deflecting member and the second substrate, or in the imaging. 14. The projection optical system according to claim 12, wherein the projection optical system is provided in an optical path of the optical system. In a catadioptric projection optical system including a projection optical unit for forming a pattern of a first substrate on a second substrate,
The projection optical unit,
Imaging optics,
A first deflecting member for guiding light from the first substrate to the imaging optical system;
A second deflecting member for guiding light passing through the imaging optical system to the second substrate;
The projection optical unit is disposed in an optical path between the first substrate and the first deflecting member and in at least one optical path in an optical path between the second deflecting member and the second substrate. And an image plane shape control member for controlling the shape of the image plane formed on the second substrate. A plurality of projection optical units for forming an image of the pattern of the first substrate on the second substrate;
Each of the plurality of projection optical units, an imaging optical system including a refractive optical system and a concave reflecting mirror,
A first deflecting member for guiding light from the first substrate to the imaging optical system;
A second deflecting member for guiding light passing through the imaging optical system to the second substrate;
An image plane shape control member configured by at least two lenses and controlling a shape of an image plane formed on the second substrate by the projection optical unit;
The image plane shape control member is disposed in an optical path between the first substrate and the first deflecting member or in an optical path between the second deflecting member and the second substrate,
Catadioptric projection optics, wherein the shape of an image plane formed on the second substrate by the projection optical unit is controlled by exchanging at least one lens constituting the image plane shape control member. system. The image plane shape control member is arranged so that an optical axis of a lens constituting the projection optical unit coincides with an optical axis of a lens constituting the image plane shape control member. A catadioptric projection optical system according to claim 15. In an optical path between the first substrate and the first deflecting member or in an optical path between the second deflecting member and the second substrate, an image shift generated by the image plane shape control unit is controlled. The catadioptric projection optical system according to any one of claims 15 to 17, further comprising an image shift correcting unit that corrects. The image plane shape control member includes a first plano-concave lens, a biconvex lens, and a second plano-concave lens. By exchanging at least one of the first plano-concave lens, the biconvex lens, and the second plano-concave lens. The catadioptric projection optical system according to any one of claims 15 to 18, wherein the shape of an image plane formed on the second substrate is controlled by the projection optical unit. The image plane shape control member includes a first plano-convex lens, a biconcave lens, and a second plano-convex lens. By exchanging at least one of the first plano-convex lens, the biconcave lens, and the second plano-convex lens. The catadioptric projection optical system according to any one of claims 15 to 18, wherein the shape of an image plane formed on the second substrate is controlled by the projection optical unit. 21. The catadioptric projection optical system according to claim 15, wherein the image plane shape control member has a function as a magnification correcting unit. A first catadioptric optical system that includes a first refractive optical system and a first concave reflecting mirror, and forms a primary image of a pattern on the first substrate;
A second catadioptric optical system including a second refractive optical system and a second concave reflecting mirror, and condensing light from the primary image to form a secondary image of the pattern on the second substrate. The catadioptric projection optical system according to any one of claims 15 to 21, wherein: The catadioptric projection optical system according to any one of claims 15 to 22, wherein the image plane shape control member suppresses an image plane shape of the projection optical unit in an optical axis direction. A scanning projection exposure apparatus that moves a first substrate and a second substrate with respect to a projection optical system to project and expose a pattern formed on the first substrate onto the second substrate via the projection optical system.
A scanning projection exposure apparatus, wherein the projection optical system is configured by the projection optical system according to claim 1. A scanning projection exposure apparatus that moves a first substrate and a second substrate with respect to a projection optical system to project and expose a pattern formed on the first substrate onto the second substrate via the projection optical system.
A scanning projection exposure apparatus, wherein the projection optical system comprises the catadioptric projection optical system according to any one of claims 15 to 23. A first substrate and a second substrate are moved with respect to a projection optical system including a plurality of projection optical units, and a pattern formed on the first substrate is magnified on the second substrate via the projection optical system. In an exposure method of projecting and exposing,
An exposure method, comprising: performing a scanning exposure by moving the first substrate and the second substrate with respect to the projection optical system according to any one of claims 1 to 14. A first substrate and a second substrate are moved with respect to a projection optical system including a plurality of catadioptric projection optical units, and a pattern formed on the first substrate is transferred to the second substrate via the projection optical system. In the exposure method of projecting and exposing at the same magnification upward,
24. Exposure comprising a step of performing scanning exposure by moving the first substrate and the second substrate with respect to the catadioptric projection optical system according to any one of claims 15 to 23. Method.

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