JP2001152343A - Vaporizer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a vaporizer which can increase the feed quantity of a raw gas generated by vaporizing a raw liquid to be fed to a CVD apparatus. SOLUTION: The vaporizer comprises a vaporizing chamber 2 to vaporize the raw liquid 1, a nozzle 3 to atomize the raw liquid 1 and inject it into the vaporizing chamber 2, and an atomizing unit which adds the predetermined energy to raw liquid particles 4 ejected from the nozzle 3 and divides them into smaller ones for vaporization, a high frequency oscillating plate 5 e.g. is installed on the atomizing unit, a heater 21 is disposed around the vaporizer, and heaters 22 and 23 are disposed on the nozzle 3 so that the whole vaporizer, the raw liquid 1 and the nozzle 3 are heated to a highest temperature in a range where the raw liquid is not changed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a chemical vapor deposition (C) process.
The present invention relates to a vaporizer used for a film forming apparatus for forming various thin films on a semiconductor wafer by a VD) method, and particularly relates to a vaporizer for vaporizing a liquid material and supplying the liquid material to the film forming apparatus.

[0002]

2. Description of the Related Art Conventionally, in the manufacture of semiconductor devices, it is necessary to form a semiconductor film, an insulating film, a metal film, and the like on a wafer, and a CVD method is generally used as a film forming method. In this CVD method, a wafer to be processed is placed in an atmosphere of a source gas containing a material to be a film, and energy such as heat or light is applied to decompose the source gas to form various films on the wafer. Is the way. Raw materials used for film formation by the CVD method include those in a liquid state,
In this case, the liquid raw material is vaporized by a vaporizer to obtain a raw material gas.

In recent years, in order to reduce the cost of semiconductor devices, high throughput is required for a film forming apparatus using a CVD method, and an increase in the supply amount of a source gas obtained by evaporating a liquid source is also required for a vaporizer. Is required.

[0004] As a conventional example of such a vaporizer, there is, for example, a vaporizer as disclosed in JP-A-11-111644. FIG. 7 is a configuration diagram showing an example of this conventional vaporizer.

[0005] The conventional vaporizer shown in FIG.
Spherical vaporizing chamber 13 as a space for vaporizing
And a liquid raw material supply pipe 14 for supplying the liquid raw material 1 into the spherical vaporizing chamber 13, and atomizing by applying ultrasonic vibration to the liquid raw material 1 in the spherical vaporizing chamber 13 and supplied from the liquid raw material supply pipe 14. An ultrasonic atomizing element 15 to be made, a carrier gas supply pipe 17 connected to the spherical vaporizing chamber 13 and supplying a carrier gas 16 at a predetermined temperature for vaporizing the atomized liquid material 1 by heating by a swirling flow, Spherical vaporization chamber 1
3, a buffer tank 18 serving as a buffer for the source gas 20 which has vaporized the liquid source 1 and a source gas transport pipe 7 connected to the buffer tank 18 for transporting the source gas 20 to the CVD apparatus. Have been.

According to the conventional vaporizer shown in FIG.
The liquid raw material 1 supplied to the spherical vaporizing chamber 13 by the liquid raw material supply pipe 14 contacts the ultrasonic atomizing element 15 and is atomized by ultrasonic vibration. The carrier gas 16 at a predetermined temperature supplied into the spherical vaporizing chamber 13 by the carrier gas supply pipe 17 is swirled in the spherical vaporizing chamber 13 because the spherical vaporizing chamber 13 has a spherical shape. The liquid raw material 1 atomized by the ultrasonic atomizing element 15 is heated and vaporized by the swirling flow of the carrier gas 16.

As another example of a conventional vaporizer, a vaporizer as disclosed in Japanese Patent Application Laid-Open No. 7-94426 has been proposed. FIG. 8 is a configuration diagram showing another example of the conventional vaporizer.

[0008] The conventional vaporizer shown in FIG.
And a fourth nozzle 49 for injecting the liquid material 1 into the fourth vaporization chamber 48.
And a tapered thin tube provided on the outer periphery of the fourth nozzle 49 and serving as a flow path for introducing the dilution gas 50 into the fourth vaporization chamber 48, where the flow rate of the dilution gas 50 is maximized. And a transport pipe 41 for transporting the raw material gas 34 generated in the fourth vaporization chamber 48 to the CVD apparatus. I have.

According to the conventional vaporizer shown in FIG.
The liquid raw material 1 is supplied to the fourth vaporization chamber 4 by the fourth nozzle 49.
8 is injected. At this time, the dilution gas supply pipe 5
When the dilution gas 50 is introduced from 1, the liquid raw material 1 is atomized by the flow of the dilution gas 50 and vaporized.

[0010]

However, the conventional vaporizer shown in FIG. 7 only supplies the liquid raw material 1 to the ultrasonic atomizing element 15 and atomizes the liquid raw material 1 as it is. There is a problem that you can not.

That is, the liquid raw material 1 is an ultrasonic atomizing element 1
Atomization is carried out by the ultrasonic vibration applied by 5, and atomization of the raw material liquid by the ultrasonic vibration is performed from the surface of the liquid. Therefore, in order to increase the supply amount of the raw material gas, it is necessary to increase the supply amount of the liquid raw material 1. However, in the conventional vaporizer of FIG. 7, the liquid raw material 1 is supplied to the ultrasonic atomizer 15 as it is. Since the increase in the surface area is small with respect to the increase in the supply amount, the amount of atomization does not increase so much, and therefore the supply amount of the raw material gas does not increase so much.

Therefore, the only way to increase the supply amount of the raw material gas is to increase the output of the ultrasonic atomizing element 15 as the supply amount of the liquid raw material 1 increases. Due to restrictions on the apparatus, the conventional vaporizer shown in FIG. 7 cannot increase the supply amount of the source gas beyond a predetermined value.

In the conventional vaporizer shown in FIG. 7, the vaporization of the liquid raw material 1 is performed by heating the carrier gas 16 at a predetermined temperature by a swirling flow.
6 must be supplied in a predetermined amount or more. However, since the vaporization amount of the liquid raw material 1 is limited by the saturated vapor pressure,
There is a problem in that the use of the carrier gas reduces the partial pressure of the source gas and reduces the supply amount of the source gas.

On the other hand, the conventional vaporizer shown in FIG. 8 also has a problem that the supply amount of the source gas cannot be increased, as shown in FIG. This is because the amount of vaporization of the liquid raw material 1 is limited by the saturated vapor pressure in the vaporization chamber. In order to maximize the supply amount of the raw material gas, the concentration of the raw material gas 34 is set to a maximum value determined by the saturated vapor pressure. There is a need to.

However, there is a trade-off between the supply amount of the liquid raw material 1 ejected from the fourth nozzle 49 and the size of the obtained particles, and it is necessary to increase the nozzle diameter to increase the supply amount. And the size of the particles obtained is increased. The vaporization of the liquid takes place from the surface of the liquid,
At the time of vaporization, the temperature of the liquid decreases due to the heat of vaporization. Therefore, when the size of the particles increases, only the surface is vaporized and a part thereof remains without being vaporized. Therefore, the fourth nozzle 49
Even if the supply amount of the liquid raw material 1 to be injected from is increased, the concentration of the raw material gas 34 cannot reach the maximum value determined by the saturated vapor pressure.

Therefore, in the conventional vaporizer shown in FIG. 8, the particle diameter is reduced by the flow of the dilution gas 50 in order to completely vaporize the liquid raw material 1 injected from the fourth nozzle 49. As described above, the amount of vaporization of the liquid raw material 1 is limited by the saturated vapor pressure. However, when the diluent gas 50 is introduced, the partial pressure of the raw material gas 34 becomes small, so that the supply amount of the raw material gas becomes small.

An object of the present invention is to solve the above problems,
An object of the present invention is to provide a vaporizer capable of increasing a supply amount of a source gas.

[0018]

A vaporizer according to the present invention is a vaporizer for supplying a raw material gas generated by vaporizing a liquid raw material to a CVD apparatus, comprising a vaporizing chamber for vaporizing the liquid raw material. A nozzle that atomizes the liquid raw material and injects it into the vaporization chamber, and an atomization unit that applies predetermined energy to the liquid raw material particles injected from the nozzle and divides the liquid raw material particles into smaller particles for vaporization. Features.

Further, the atomizing section is constituted to include a high-frequency vibrating plate arranged opposite to the nozzle, wherein the atomization of the liquid raw material particles is performed by high-frequency vibration. The liquid source particles are configured to include two nozzles configured to convert the liquid source particles, which are disposed to face each other, into particles and eject the particles into the vaporization chamber, wherein the atomization of the liquid source particles is performed by collision of the liquid source particles, The vaporizer includes a plurality of heaters arranged around the apparatus, and heats the entire apparatus to the highest temperature in a range where the raw material does not change, so that heat of vaporization is taken when the liquid raw material is vaporized. It is characterized in that the amount of vaporization is reduced, and that dew condensation and liquefaction on the device wall are prevented, and the vaporizer is configured to include a plurality of heaters arranged around a nozzle, The charge and nozzle material is heated to a maximum temperature in a range that does not vary, the temperature until the liquid material is injected into the vaporization chamber, characterized in that to prevent the hardly vaporized decreases.

Further, the vaporizer of the present invention is a vaporizer for supplying a raw material gas generated by vaporizing a liquid raw material to a CVD apparatus, wherein a nozzle for atomizing the liquid raw material and injecting it into the vaporization chamber is provided. The vaporization chambers provided are arranged in a plurality of stages and connected to each other by conduits, so that the vaporization amount of the liquid raw material is gradually increased to a maximum value determined by a saturated vapor pressure.

Further, ultrasonic vibrating plates are arranged at the bottoms of a plurality of vaporizing chambers in the vaporizing apparatus, respectively, and ultrasonic vibration is applied to the unvaporized liquid raw material accumulated at the bottom of each vaporizing chamber to atomize again and vaporize. In addition, a heating plate is arranged at the bottom of each of a plurality of vaporization chambers in the vaporization apparatus, and the unvaporized liquid raw material collected at the bottom of each vaporization chamber is heated to the highest temperature within a range where the raw material does not change. It is characterized in that it is heated and vaporized, and at each bottom of the plurality of vaporization chambers in the vaporizer, a plurality of ultrasonic vibration plates and heating plates are alternately arranged in a plane, and the ultrasonic vibration plate is used. And vaporization by heating of a heating plate, and in the vaporization apparatus, the entirety of the plurality of stages is heated to a maximum temperature within a range where the raw material does not change. Heat with liquid When the raw material is vaporized, the amount of vaporization is reduced by deprivation of the heat of vaporization, and it is characterized by preventing dew condensation and liquefaction on the apparatus wall. In addition, the temperature of the liquid raw material is heated by a heater to the highest temperature in a range in which the raw material does not change, so that the temperature of the liquid raw material is prevented from lowering and becoming difficult to be vaporized before being injected into each vaporizing chamber.

[0022]

Next, an embodiment of the present invention will be described in detail with reference to the drawings. FIG. 1 is a configuration diagram showing a first embodiment of the present invention.

The vaporizer shown in FIG. 1 is provided with a vaporizing chamber 2 as a space for vaporizing the liquid raw material 1, a nozzle 3 for turning the liquid raw material 1 into particles and injecting the liquid raw material 1 into the vaporizing chamber 2, and facing the nozzle 3. A high-frequency vibration plate 5 for applying high-frequency vibration to the liquid raw material particles 4 ejected from the nozzle 3 to atomize the liquid raw material particles 4, a high-frequency vibration generator 6 for high-frequency vibration of the high-frequency vibration plate 5, and a liquid raw material 1 connected to the vaporization chamber 2 And a plurality of first heaters 21 arranged around the apparatus for heating the entire apparatus to a maximum temperature within a range in which the raw material does not change. A plurality of second heaters 22 for heating the liquid raw material 1 to the highest temperature in a range where the raw material does not change; and a plurality of third heaters 23 for heating the nozzle 3 to the highest temperature in a range where the raw material does not change. Consists of

Next, the operation of the vaporizer in the first embodiment will be described. First, as shown in FIG. 1, a liquid raw material 1 is formed into particles by a nozzle 3 and injected into a vaporization chamber 2 as liquid raw material particles 4. Next, the liquid raw material particles 4 ejected from the nozzle 3 come into contact with the high-frequency vibration plate 5 arranged to face the nozzle 3. At this time, the high-frequency vibration plate 5 is vibrating at a high frequency by the high-frequency vibration generator 6, and the high-frequency vibration is applied to the liquid raw material particles 4, whereby the liquid raw material particles 4 are divided into smaller fine particles and vaporized. The source gas 20 obtained by evaporating the liquid source 1 is transported to the CVD apparatus through the source gas transport pipe 7.

The nozzle referred to here is a one-fluid spray nozzle which pressurizes the liquid and ejects it from a minute restrictor to form the liquid into particles. For example, a nozzle commercially available from Ikeuchi Co., Ltd. Say. Similar nozzles are used in the embodiments described below.

Further, the liquid is vaporized from the surface of the liquid, but the vaporization heat lowers the temperature of the liquid at the time of vaporization, so that in the case of a liquid having a predetermined size or more, a part of the liquid is not vaporized. . In order to increase the supply amount of the raw material gas in the vaporizer, it is necessary to increase the supply amount of the liquid raw material 1. However, if the liquid raw material 1 is supplied as it is, a part of the liquid raw material 1 is vaporized for the above-described reason. It remains without being.

To solve this problem, the ratio of the total surface area to the total volume of the supplied liquid raw material 1 may be increased.
Specifically, the liquid raw material 1 may be made into fine particles having a diameter as small as possible. This is because when the liquid raw material 1 is atomized, the volume per particle decreases by the cube of the diameter, whereas the surface area decreases only by the square. Since the vaporization is performed on the surface of the liquid, the size of the total surface area including the surface area of each particle is important, and the surface area with respect to the volume can be increased by atomization.

Generally, spraying by a nozzle is used to atomize the liquid. However, in the case of atomization by a nozzle, the supply amount and the size of the obtained particles are in a trade-off relationship. Therefore, in order to increase the supply amount, it is necessary to increase the nozzle diameter, so that the obtained particle diameter also increases, and a part thereof remains without being vaporized. Further, even when two nozzles are arranged in parallel and vaporized, if the vaporization is performed in the same vaporization chamber, the particle diameter increases due to the contact between particles that do not vaporize and the surface area decreases, so that the vaporization amount does not increase so much.

In order to atomize the liquid, it suffices to give energy enough to break up and separate the particles. But,
The smaller the particle size, the greater the energy required to split the particles. Therefore, the present invention is characterized in that the atomization is divided into two stages, fine particles of a certain size are produced by the nozzle 3, and the fine particles are further applied with a predetermined energy to be divided into smaller particles and vaporized.

In the first embodiment, the liquid raw material particles 4
Is brought into contact with a high-frequency vibrating plate 5 and high-frequency vibration is applied to the liquid raw material particles 4 to divide the liquid raw material particles 4 into smaller fine particles, thereby increasing the total surface area to increase the amount of vaporization of the supplied liquid raw material 1.

Further, the entire apparatus is heated by a first heater 21 disposed around the apparatus, and when the liquid material 1 is vaporized, the amount of vaporization is reduced due to deprivation of vaporization heat. Prevents condensation and liquefaction on the wall. However, depending on the type of the liquid raw material 1, a change such as deposition of the material may occur even at a low temperature. Therefore, the heating temperature is set to the highest temperature in a range where the raw material does not change.

Further, the liquid raw material 1 and the nozzle 3 are also heated to the highest temperature in a range where the raw material does not change by the second heater 22 and the third heater 23, respectively, until they are injected into each vaporizing chamber. During this period, the temperature of the liquid raw material 1 is prevented from lowering and becoming less likely to evaporate. Note that, depending on the dew point of the liquid raw material 1 and the environmental temperature around the apparatus, the first, second, and third heaters 21, 22, and 23 may be changed to a temperature control unit capable of cooling.

A so-called carrier gas may be used to actively transport the vaporized liquid raw material 1. However, the amount of vaporization of the liquid raw material 1 is limited by the saturated vapor pressure, and by using a carrier gas,
Because the partial pressure of
When a carrier gas is used, the supply amount of the carrier gas is kept to a necessary minimum.

Next, a second embodiment of the present invention will be described. FIG. 2 is a configuration diagram showing the second embodiment. The vaporizing device shown in FIG. 2 includes a vaporizing chamber 2 as a space for vaporizing the liquid raw material 1, a first nozzle 8 that granulates the liquid raw material 1 and injects it into the vaporizing chamber 2, and a first nozzle 8
, And the liquid raw material 1 is turned into particles and vaporized.
And a second nozzle 9, which is jetted into the inside and collides with the liquid source particles 4 jetted from the first nozzle 8, and a source gas 20 connected to the vaporization chamber 2, which vaporizes the liquid source 1 and transports the source gas 20 to the CVD apparatus. A plurality of first heaters 21 arranged around the apparatus and heating the entire apparatus to the highest temperature in a range where the raw material does not change, and a highest temperature in a range where the liquid raw material 1 does not change And a plurality of third heaters 23 for heating the first nozzle 8 and the second nozzle 9 to the highest temperature in a range where the raw material does not change. I have.

In the first embodiment shown in FIG. 1, the liquid material particles 4 are atomized by high frequency vibration, whereas in the second embodiment, the liquid material particles 4 are atomized. It is characterized in that it is performed by collision of the liquid raw material particles 4 and the configuration and operation are the same as those of the first embodiment except for the part where the liquid raw material particles 4 are miniaturized. Only the operation of the part to be atomized according to the above embodiment will be described.

First, as shown in FIG. 2, the liquid material 1 is formed into particles by the first nozzle 8 and injected into the vaporization chamber 2. At this time, the second material disposed at the same time as the first nozzle 8 is disposed. The liquid raw material 1 is also atomized and injected into the vaporization chamber 2 from the nozzle 9. Then, since the two nozzles are arranged to face each other, the liquid raw material particles 4 ejected from the respective nozzles collide with each other at a predetermined speed, and the collision divides the liquid raw material particles 4 into smaller fine particles. .

Next, a third embodiment of the present invention will be described. FIG. 3 is a configuration diagram showing the third embodiment. The vaporizer shown in FIG. 3 includes a first vaporization chamber 32 as a space for vaporizing the liquid raw material 1, a first nozzle 33 for atomizing the liquid raw material 1 and injecting a predetermined amount into the first vaporization chamber 32. Source gas 34 generated in the first vaporization chamber 32
To the next stage, a second vaporization chamber 36 connected to the first conduit 35 as a space for increasing the concentration of the raw material gas 34, and the second vaporization by atomizing the liquid raw material 1. Room 3
A second nozzle 37 for injecting a predetermined amount smaller than the injection amount of the first nozzle 33 into the nozzle 6; and a second conduit for guiding the source gas 34 whose concentration has been increased in the second vaporization chamber 36 to the next stage. 38
A third vaporization chamber 39 as a space for increasing the concentration of the raw material gas 34 connected to the second conduit 38, and a second nozzle 37 inside the third vaporization chamber 39 by atomizing the liquid raw material 1. A third nozzle 40 for injecting a predetermined amount smaller than the injection amount.

Further, a transport pipe 41 for transporting the source gas 34 whose concentration has been further increased in the third vaporization chamber 39 to the CVD apparatus, and a maximum temperature within a range where the raw material does not change and which is arranged around the apparatus and where the raw material does not change. A plurality of first heaters 52, a plurality of second heaters 53 for heating to a maximum temperature in a range where the liquid raw material 1 does not change, and a first, second, and third heater.
A plurality of third heaters 5 for heating each of the nozzles 33, 37, and 40 to the highest temperature in a range where the raw material does not change.
4.

Next, the operation of the vaporizer in the third embodiment will be described with reference to FIG. First, the liquid raw material 1 is atomized by the first nozzle 33 and
Is injected into the vaporization chamber 32 of the raw material gas 3 and is vaporized.
It becomes 4. At this time, the vaporization amount of the liquid raw material 1 is limited by the saturated vapor pressure in the first vaporization chamber 32, and the raw material gas 3
4 does not exceed the value limited by the saturated vapor pressure. Therefore, in order to maximize the supply amount of the raw material gas 34 in which the liquid raw material 1 is vaporized, the concentration of the raw material gas 34 is set to the maximum value determined by the saturated vapor pressure. What should I do?

Therefore, in the third embodiment, the vaporization chamber is provided in multiple stages, and the concentration of the raw material gas 34 is made to gradually approach the maximum value determined by the saturated vapor pressure. That is, the source gas 34 generated in the first vaporization chamber 32 moves to the second vaporization chamber 36 through the first conduit 35. Further, the liquid material 1 atomized by the second nozzle 37 is injected into the second vaporization chamber 36, and is vaporized to increase the concentration of the raw material gas 34.

However, since the raw material gas 34 that has moved to the second vaporization chamber 36 has a predetermined concentration even if it does not reach the saturated vapor pressure, the vaporization amount in the second vaporization chamber 36 is It is smaller than the amount of vaporization in one vaporization chamber 32. Therefore, in order to reduce the speed at which the unvaporized liquid raw material 1 accumulates at the bottom of the second vaporization chamber 36, the amount of the liquid raw material 1 injected from the second nozzle 37 is made smaller than the amount injected from the first nozzle 33. Also reduce.

Further, the raw material gas 34 generated in the second vaporization chamber 36 passes through the second conduit 38 to the third vaporization chamber 3.
Go to 9. Further, the third vaporization chamber 39 has a third
The atomized liquid raw material 1 is ejected by the nozzle 40, and vaporization is performed to increase the concentration of the raw material gas 34.
However, the source gas 34 that has moved to the third vaporization chamber 39 is
The third vaporization chamber 39 has a higher concentration than the concentration of the source gas 34 generated in the first vaporization chamber 32.
Is smaller than the amount of vaporization in the second vaporization chamber 36. Therefore, in order to reduce the rate at which the unvaporized liquid material 1 accumulates at the bottom of the third vaporization chamber 39, the amount of the liquid material 1 ejected from the third nozzle 40 is smaller than the amount ejected from the second nozzle 37. Also keep it low.

With the above operation, the concentration of the raw material gas 34 is increased to near the maximum value determined by the saturated vapor pressure, and the raw material gas 34 having this concentration near the maximum value is transported by the transport pipe 41 to the CV.
Transported to D equipment.

Further, the entire apparatus is heated by a first heater 52 disposed around the apparatus, and when the liquid raw material 1 is vaporized, heat of vaporization is taken away, and the amount of vaporization is reduced. Prevent dew condensation and liquefaction. However, depending on the type of the liquid raw material 1, a change such as deposition of the material may occur even at a low temperature. Therefore, the heating temperature is set to the highest temperature in a range where the raw material does not change.

The liquid raw material 1 and the first, second, and third nozzles 33, 37, and 40 are also heated to the highest temperature in a range where the raw material does not change by the second heater 53 and the third heater 54, respectively. Heating is performed to prevent the temperature of the liquid raw material 1 from decreasing and becoming difficult to vaporize before being injected into each vaporization chamber. The number of vaporization chambers and nozzles for increasing the concentration of the source gas 34 stepwise need not be three in particular. The optimum number of stages may be determined based on the saturated vapor pressure of the liquid raw material 1, the injection amount of the nozzle, and the injection particle size.

In order to positively transport the vaporized liquid material 1, a so-called carrier gas may be used. However, the amount of vaporization of the liquid raw material 1 is limited by the saturated vapor pressure, and by using a carrier gas,
Because the partial pressure of
When a carrier gas is used, the supply amount of the carrier gas is kept to a necessary minimum.

Next, a fourth embodiment of the present invention will be described. FIG. 4 is a configuration diagram showing the fourth embodiment. The vaporizer shown in FIG. 4 includes first, second, and third components at the bottom of each vaporizer in the third embodiment shown in FIG.
The ultrasonic vibrating plates 42, 43, and 44 are arranged respectively, and ultrasonic vibration is applied to the unvaporized liquid raw material 31 accumulated at the bottom of each vaporizing chamber, and the liquid raw material 31 is again atomized and vaporized. Yes, first to third ultrasonic vibration plates 42 to 4
Since the configuration and operation of the third embodiment are the same as those of the third embodiment except for the fourth embodiment, only the operation of the first to third ultrasonic vibration plates 42 to 44 will be described below.

First, as described in the third embodiment, when the supply amount is large, the liquid raw material 1 injected from each nozzle is not entirely vaporized, and the unvaporized liquid raw material 31 that has not been vaporized is replaced with the first. 1, second and third vaporization chambers 32, 36,
It will collect at the bottom of 39. Therefore, in the fourth embodiment, as shown in FIG. 4, the un-evaporated liquid raw material 31 accumulated at the bottom of each vaporization chamber is subjected to ultrasonic vibration by the first to third ultrasonic vibration plates 42 to 44, respectively. Is added and the liquid raw material 1 is again atomized and vaporized, thereby increasing the speed at which the concentration of the raw material gas 34 is maximized.

Next, a fifth embodiment of the present invention will be described. FIG. 5 is a configuration diagram showing the fifth embodiment. The vaporizer shown in FIG. 5 is similar to the first to third ultrasonic vibrating plates 42 to 44 in the fourth embodiment shown in FIG.
Instead of the first, at the bottom of each vaporization chamber 32, 36, 39
The second and third heating plates 45, 46 and 47 are respectively disposed, and the unvaporized liquid raw material 31 accumulated at the bottom of each vaporization chamber is provided.
Is a vaporizer characterized by heating and vaporizing to the highest temperature in a range where the raw material does not change, except for the first to third heating plates 45 to 47, the fourth embodiment and the configuration, Since the operation is the same, the first to third heating plates 4 will be described below.
The operation of only 5 to 47 will be described.

First, in the fourth embodiment, the unvaporized liquid raw material 31 collected at the bottom of each vaporizing chamber is again subjected to ultrasonic vibration to be atomized again and vaporized, so that the concentration of the raw material gas 34 is maximized. However, in the fifth embodiment, as shown in FIG. 5, the unvaporized liquid raw material 31 accumulated at the bottom of each vaporization chamber is removed by the first to third heating plates. By heating and vaporizing by 45 to 47, the speed at which the concentration of the source gas 34 is maximized is increased. It should be noted that, depending on the type of the liquid raw material 1, a change such as deposition of the material occurs even at a low temperature.
The heating temperature of the third to fourth heating plates 45 to 47 is set to be the highest temperature in a range where the raw material does not change.

Next, a sixth embodiment of the present invention will be described. FIG. 6 is a configuration diagram showing the sixth embodiment. The vaporizer shown in FIG. 6 is similar to the first to third ultrasonic vibrating plates 42 to 44 in the fourth embodiment shown in FIG.
And the first to third parts in the fifth embodiment shown in FIG.
And heating plates 45 to 47 at the same time, and vaporization by re-atomization using the ultrasonic vibration plate in the fourth embodiment,
It is a vaporization apparatus characterized by using both of the vaporization by heating in the fifth embodiment and the first to third ultrasonic vibration plates 42 to 44 and the first to third heating plates 45.
47 are formed in a strip shape and a plurality of them are alternately arranged in the bottom plane. Since the operation is a combination of the fourth embodiment and the fifth embodiment,
No particular description is given.

The first to third ultrasonic vibrating plates 42 to 4
Regarding the arrangement of 4 and the first to third heating plates 45 to 47, a plurality of strips may be alternately arranged in a plane as in the present embodiment, or a plurality of alternately arranged concentrically. , And a plurality of them may be alternately arranged in a grid pattern.

The first to third ultrasonic vibration plates 42 to 4
4 and the first to third heating plates 45 to 47 are arranged so as to be stacked and heated through the first to third ultrasonic vibration plates 42 to 44 or the first to third heating plates 45 to 47. Ultrasonic vibration may be applied through the In short, the operation of applying ultrasonic vibration to the unvaporized liquid raw material 31 stored at the bottom of each vaporization chamber to atomize and vaporize again, and heating the unvaporized liquid raw material 31 stored at the bottom of each vaporization chamber to vaporize it. Any arrangement can be used as long as the arrangement can be used together with the operation.

[0054]

As described above, the vaporizing apparatus of the present invention uses a nozzle instead of atomizing a liquid raw material by an ultrasonic atomizing element and vaporizing the liquid raw material by a swirling flow of a carrier gas at a predetermined temperature. After atomizing the liquid raw material by applying predetermined energy and dividing it into smaller fine particles for vaporization, since the total surface area of the liquid raw material is increased, the amount of vaporization of the supplied liquid raw material is increased. There is an effect that the supply amount of the source gas can be increased.

In the vaporizer of the present invention, instead of performing the vaporization by atomizing the liquid raw material ejected from the nozzle by the flow of the diluent gas, the vaporization chamber and the nozzle are provided in multiple stages, and the concentration of the raw material gas is gradually increased. Since the maximum value is determined by the saturated vapor pressure, there is an effect that the supply amount of the source gas can be increased.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing a first embodiment of a vaporizer according to the present invention.

FIG. 2 is a configuration diagram showing a second embodiment of the vaporizer according to the present invention.

FIG. 3 is a configuration diagram showing a third embodiment of the vaporization device of the present invention.

FIG. 4 is a configuration diagram showing a fourth embodiment of the vaporization device of the present invention.

FIG. 5 is a configuration diagram showing a fifth embodiment of the vaporization device of the present invention.

FIG. 6 is a configuration diagram showing a sixth embodiment of the vaporization device of the present invention.

FIG. 7 is a configuration diagram illustrating an example of a conventional vaporizer.

FIG. 8 is a configuration diagram showing another example of a conventional vaporizer.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Liquid raw material 2 Vaporization chamber 3 Nozzle 4 Liquid raw material particle 5 High frequency vibration plate 6 High frequency vibration generator 7 Raw material gas transport pipe 8 First nozzle 9 Second nozzle 13 Spherical vaporization chamber 14 Liquid raw material supply pipe 15 Ultrasonic atomization Element 16 Carrier gas 17 Carrier gas supply pipe 18 Buffer tank 20 Source gas 21 First heater 22 Second heater 23 Third heater 31 Unvaporized liquid raw material 32 First vaporization chamber 33 First nozzle 34 Raw material gas 35 1st conduit 36 2nd vaporization room 37 2nd nozzle 38 2nd conduit 39 3rd vaporization room 40 3rd nozzle 41 transportation pipe 42 1st ultrasonic vibration plate 43 2nd ultrasonic vibration plate 44 third ultrasonic vibration plate 45 first heating plate 46 second heating plate 47 third heating plate 48 fourth vaporization chamber 49 fourth nozzle 50 dilution gas 51 dilution gas Supply pipe 52 first heater 53 second heater 54 third heater

Claims (11)

[Claims] 1. A vaporizer for vaporizing a liquid raw material and supplying a raw material gas generated by vaporizing the liquid raw material to a CVD apparatus, a vaporizing chamber for vaporizing the liquid raw material, and a nozzle for granulating the liquid raw material and injecting the liquid raw material into the vaporizing chamber. And an atomizing unit for applying predetermined energy to liquid raw material particles ejected from a nozzle to divide the liquid raw material particles into smaller fine particles and vaporize the fine particles. 2. The vaporizer according to claim 1, wherein the atomizing section includes a high-frequency vibrating plate disposed to face the nozzle, and performs the atomization of the liquid raw material particles by high-frequency vibration. apparatus. 3. The atomization section includes two nozzles for atomizing liquid raw materials disposed opposite to each other and injecting them into a vaporization chamber, and atomizes the liquid raw material particles between the liquid raw material particles. The vaporizer according to claim 1, wherein the vaporization is performed by collision. 4. The vaporization apparatus includes a plurality of heaters disposed around the apparatus, and heats the entire apparatus to the highest temperature in a range where the raw material does not change, so that the liquid raw material is vaporized. 2. The vaporizer according to claim 1, wherein a reduction in the amount of vaporization due to deprivation of vaporization heat, and dew condensation and liquefaction on the apparatus wall are prevented. 5. The vaporizer includes a plurality of heaters arranged around the nozzle, and heats the liquid raw material and the nozzle to the highest temperature in a range where the raw material does not change, so that the liquid raw material is heated in the vaporization chamber. 2. The vaporizing apparatus according to claim 1, wherein the temperature is prevented from being reduced by the time before the liquid is injected into the fuel cell. 6. A vaporizer for supplying a raw material gas generated by vaporizing a liquid raw material to a CVD apparatus, wherein the vaporization chambers each having a nozzle for atomizing the liquid raw material and jetting the liquid raw material into the vaporization chamber are provided in a plurality of stages. A vaporizer, wherein the vaporizers are arranged and connected by conduits, and a vaporization amount of the liquid raw material is gradually increased to a maximum value determined by a saturated vapor pressure. 7. An ultrasonic vibration plate is arranged at the bottom of each of a plurality of vaporization chambers in the vaporization apparatus, and ultrasonic vibration is applied to the unvaporized liquid raw material accumulated at the bottom of each vaporization chamber to atomize again to vaporize. The vaporizer according to claim 6, wherein the vaporization is performed. 8. A heating plate is arranged at the bottom of each of the plurality of vaporization chambers in the vaporizer, and heats the unvaporized liquid raw material collected at the bottom of each vaporization chamber to the highest temperature within a range where the raw material does not change. 7. The method of claim 6, further comprising:
A vaporizer as described. 9. A plurality of ultrasonic vibrating plates and heating plates are alternately arranged in a plane at each bottom of a plurality of vaporizing chambers in the vaporizing apparatus, and vaporization by re-atomization using the ultrasonic vibrating plate;
7. The vaporizer according to claim 6, wherein the vaporizer is heated by heating the heating plate. 10. In the vaporizer, the entire apparatus in a plurality of stages is heated by a heater to a maximum temperature within a range in which the raw material does not change, and a reduction in the amount of vaporization due to deprivation of heat of vaporization when the liquid raw material is vaporized; The vaporizer according to claim 6, wherein dew condensation and liquefaction on the apparatus wall are prevented. 11. In the vaporizer, the liquid raw material and each of the nozzles in a plurality of stages are heated by a heater to a maximum temperature within a range in which the raw material does not change, and the liquid raw material is jetted into each vaporizing chamber until the liquid raw material is injected into each vaporizing chamber. 7. The vaporizer according to claim 6, wherein the temperature is prevented from lowering to make it difficult to vaporize.