JP2000221318A - Curing device for production of color filter and production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the occurrence of defects, such as cracking and chipping of a substrate by the warpage of the substrate and the expansion of a base material by heat by using electron beams in curing of patterned coating films in a curing device used for the curing of the patterned coating films. SOLUTION: A loader side conveyor 13 transports the substrate 10 accompanied by the coating films which are the objects to be irradiated to a loader side elevator 14 and transports the substrate 10 to the height of an electron beam irradiation chamber 12. Further, the substrate is fed into the electron beam irradiation chamber 12 by the conveyor 13 where the substrate is irradiated with the electron beams from an acceleration tube 11 in the electron beam irradiation chamber 12 and the curing of the coating films is thus executed. The substrate is transported through an unloader side elevator 15 to an unloader side conveyor 16. The electron beams are used without using high-temperature heating in curing the patterned coating films on the substrate 10 in the manner described above, by which the occurrence of defects, such as cracking and chipping of the substrate by the warpage of the substrate and the expansion of the base material by heat may be prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the manufacture of a color filter used for color separation of a solid-state image pickup device, color display of a liquid crystal display device, and the like. The present invention relates to an apparatus for curing a patterned coating film and a method for manufacturing a color filter.

[0002]

2. Description of the Related Art Hitherto, color filters have been widely used in liquid crystal display devices. This color filter is generally formed by arranging pixels of a plurality of colors such as red, green, and blue on a transparent substrate. In order to obtain an image with good contrast, a black matrix is formed between these pixels.

An example of a method for manufacturing this color filter will be described with reference to FIG. First, a transparent substrate such as glass (21)
A black matrix (22) serving as a light shielding layer is formed thereon. Next, a red photosensitive colored resin composition is applied on the black matrix (22) to form a coating film, which is exposed and developed through a photomask, and then cured by hot air to perform the red colored layer (23). ) Is formed.

For the second color, a green photosensitive colored resin composition is applied to form a coating film, which is exposed and developed through a photomask, and then cured by hot air to form a green colored layer (2).
4) is formed. The third color blue colored layer (25) is formed by the same process. Subsequently, for the purpose of physicochemical protection and flattening of the surface, a protective film layer (26) is formed, and finally a transparent electrode layer (27) is formed on the protective film layer to manufacture a color filter. .

As a method for curing a patterned coating film after development in forming the colored layer, a method of curing by high-temperature heating using a circulating clean oven is generally used. I have. However, in curing by high-temperature heating using a circulating clean oven, high-temperature heat is applied to the substrate, which causes defects such as substrate warpage and substrate cracking or chipping due to expansion of the substrate due to heat. There is a problem.

[0006] In the photosensitive colored resin composition,
Components such as a monomer and an initiator in the photosensitive colored resin composition volatilize as a sublimate by heating at a high temperature. Then, the volatilized component adheres to other portions on the substrate and becomes a residue. When the colored layers of the second and subsequent colors are formed, poor adhesion of the colored layers of the second and subsequent colors occurs, thereby lowering the yield of the color filter. Cause. In addition, when curing is performed using a circulating clean oven, tens of minutes to several hours of curing time are required, and several circulating clean ovens need to be installed, which hinders cost reduction. ing.

[0007]

DISCLOSURE OF THE INVENTION The present invention has been made to solve such problems, and an object of the present invention is to provide a photosensitive colored resin composition coated on a substrate. It is an object of the present invention to provide a curing apparatus that performs curing without using high-temperature heating for curing a patterned coating film after exposure to light through a photomask and development.

It is another object of the present invention to provide a method for manufacturing a color filter using a curing device that performs curing without using high-temperature heating in the production of a color filter.

[0009]

SUMMARY OF THE INVENTION The present invention relates to a method for producing a color filter using a photosensitive colored resin composition, which comprises applying a photomask to a coating film of the photosensitive colored resin composition applied on a substrate. A curing device used for curing a patterned coating film after exposure and development, wherein an electron beam is used for curing the patterned coating film. Device.

The present invention also provides a method for forming a coating film on a substrate using a photosensitive colored resin composition, and curing the patterned coating film after exposure and development through a photomask. In a method for manufacturing a color filter using a curing device using a method, a curing device having an acceleration voltage of 150 kV or less is used as the curing device, and the curing device is used in a range of 5 Mrad to 60 Mrad as an electron beam irradiation amount. This is a method for manufacturing a color filter.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing a basic configuration of one embodiment of a curing device for manufacturing a color filter according to the present invention. As shown in FIG. 1, the curing device for producing a color filter includes an accelerating tube (11), an electron beam irradiation chamber (12), a loader-side conveyor (13), a loader-side elevator (14), and an unloader-side elevator (15). ), And an unloader side conveyor (16).

The loader-side conveyor (13) transfers the substrate (10) to be irradiated to the loader-side elevator (14).
To the electron beam irradiation chamber (12).
0) is conveyed and then sent to the electron beam irradiation chamber (12) by a conveyor (not shown), and the electron beam irradiation chamber (12) irradiates the electron beam from the acceleration tube (11) to the unloader-side elevator. Convey to (15). Then, the substrate is transferred to the unloader-side conveyor (16) via the unloader-side elevator (15).

The electron beam irradiation chamber (12) is provided with a shield for shielding X-rays generated when the electron beam hits an object to ensure safety. 14) and the unloader-side elevator (15) are provided for disposing the accelerator tube (11) at a high position. By disposing the accelerator tube at a high position, the electron beam is attenuated and safely. It is considered.

The accelerating tube used is preferably one having an accelerating voltage of 150 kV or less, and the electron beam irradiation amount is 5 Mrad to 60
It is preferable to cure the patterned coating film in the range of Mrad. When the amount of electron beam irradiation is 5 Mrad or less, curing of the patterned coating film is insufficient, causing problems such as poor adhesion when forming the second and subsequent colors. Degradation is increased.

[0015]

<Example 1>"7059" manufactured by Corning Co., Ltd. was used as a transparent substrate, and a resist: Color Mosaic CRY7000 manufactured by Fuji Film Orin Co., Ltd. was applied thereon to a thickness of 1.5 μm using a spinner and dried. Do
Exposure is performed through a photomask with an exposure amount of about 200 mJ / cm ² by an ultra-high pressure mercury lamp of 3 KW, and an inorganic alkali developer is sprayed in a shower to remove unexposed portions of the colored photosensitive colored resin composition. Pure water rinsing was performed, and the resultant was put into a curing device using an electron beam according to the present invention.

As a curing device, an accelerating voltage of 12
0kV, current value 16mA, conveyor speed 1.6m
/ Min. An electron beam having an electron beam irradiation amount of 40 Mrad was irradiated in a curtain shape from above the transparent substrate to cure the coating of the photosensitive colored resin composition.

Next, the formation of the second color is performed by applying a color mosaic CGY7000 manufactured by Fuji Film Ohlin Co., Ltd. to a thickness of 1.5 μm on a transparent substrate on which the first color layer is formed, using a spinner, followed by drying. Exposure was performed through a photomask with an exposure amount of about 200 mJ / cm ² by an ultra-high pressure mercury lamp of 3 kW, and an inorganic alkali developer was sprayed in a shower form to remove unexposed portions of the photosensitive colored resin composition, Pure water rinsing was performed, and the resultant was put into a curing device using an electron beam according to the present invention to perform curing. The curing conditions were the same as for the first color.

Next, a color mosaic CBV7000 manufactured by Fuji Film Ohlin Co., Ltd. is applied to a thickness of 1.5 μm on a transparent substrate on which the first and second color layers are formed by a spinner, and dried. Then, exposure is performed through a photomask with an exposure amount of about 200 mJ / cm ² by a 3 kW ultra-high pressure mercury lamp, and an inorganic alkali developer is sprayed in a shower form to remove unexposed portions of the photosensitive colored resin composition. Then, the substrate was rinsed with pure water, and charged into a curing device using an electron beam according to the present invention to perform curing. The curing conditions were the same as for the first color. With the obtained color filter, a good color filter was obtained without any residue generated in the color filter.

Comparative Example 1 A circulating clean oven using high-temperature heating was used without using a curing device using an electron beam for curing. Other materials, devices, and conditions were the same as in Example 1 to produce a color filter. The obtained color filter had many residues from the coating film of the photosensitive colored resin composition, and the transmittance at a wavelength of 400 nm was reduced by about 30%.

<Comparative Example 2> In the curing apparatus of Example 1, the electron beam irradiation amount was 4 Mrad at a conveyor speed of 16 m / min. For other materials and conditions,
A color filter was manufactured in the same manner as in Example 1.
In the obtained color filter, the curing of the coating film of the photosensitive colored resin composition was insufficient, so that defects such as bleeding and color mixing occurred during the formation of the second and subsequent colors.

[0021]

According to the present invention, in the production of a color filter using a photosensitive colored resin composition, the photosensitive colored resin composition applied on a substrate is exposed to a coating film through a photomask and then developed. Since the curing device used for curing the patterned coating film is a curing device using an electron beam without using high-temperature heating, the substrate is warped, and the substrate is expanded due to heat expansion of the substrate. No defects such as cracking or chipping occur, and the volatile components adhere to other parts of the substrate and remain as residues, resulting in poor adhesion of the colored layers when forming the second and subsequent colored layers. There is no curing device for manufacturing color filters.

Further, according to the present invention, since the color filter is manufactured by using the above-described curing apparatus for manufacturing a color filter, defects such as cracking and chipping of the substrate do not occur, and the color layers of the second and subsequent colors are formed. A method of manufacturing a color filter that does not cause poor adhesion or the like.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing a basic configuration of one embodiment of a curing device for manufacturing a color filter according to the present invention.

FIG. 2 is an explanatory diagram illustrating a method for manufacturing a color filter.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... Substrate 11 ... Accelerator tube 12 ... Electron beam irradiation room 13 ... Loader side conveyor 14 ... Loader side elevator 15 ... Unloader side elevator 16 ... Unloader side conveyor 21 ... Transparent substrate 22 ... Black matrix 23 ... Red colored layer 24 ... Green colored layer 25 ... Blue colored layer 26 ... Protective film layer 27 ... Transparent electrode layer

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA45 BB02 BB14 BB42 BB46 2H091 FA02Y FB02 FC01 FC10 FC23 FC29 LA12 2H096 AA28 BA01 CA14 DA01 EA02 GA09 GB10 HA01 4E066 AA03 BA01 BC04 CB17 CB18

Claims (2)

[Claims] Claims: 1. A method for producing a color filter using a photosensitive colored resin composition, comprising exposing a coating film of the photosensitive colored resin composition applied on a substrate to a coating film through a photomask, and patterning the film after development. What is claimed is: 1. A curing apparatus for producing a color filter, comprising using an electron beam for curing the patterned coating film. 2. A curing method using a photosensitive colored resin composition on a substrate to form a coating film, and using an electron beam to cure the patterned coating film after exposure and development through a photomask. In a method of manufacturing a color filter using a ring device, an accelerating voltage of 150 kV is used as the curing device.
A method for manufacturing a color filter, comprising using the following curing device and using an electron beam irradiation amount in a range of 5 Mrad to 60 Mrad.