JP2000159887A - Polyimide film and its production - Google Patents

Polyimide film and its production

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Publication number
JP2000159887A
JP2000159887A JP10341382A JP34138298A JP2000159887A JP 2000159887 A JP2000159887 A JP 2000159887A JP 10341382 A JP10341382 A JP 10341382A JP 34138298 A JP34138298 A JP 34138298A JP 2000159887 A JP2000159887 A JP 2000159887A
Authority
JP
Japan
Prior art keywords
dianhydride
mol
polyimide film
added
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10341382A
Other languages
Japanese (ja)
Other versions
JP3676099B2 (en
Inventor
Koichiro Tanaka
康一郎 田中
Hitoshi Nojiri
仁志 野尻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
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Publication of JP2000159887A publication Critical patent/JP2000159887A/en
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Publication of JP3676099B2 publication Critical patent/JP3676099B2/en
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Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an excellent polyimide film having high modulus of elasticity, high storage elastic modulus, high extensibility, low coefficient of linear expansion comparable to that of a copper foil, and low coefficient of expansion on absorption of moisture. SOLUTION: The polyimide film is produced from a polyamic acid obtained by reacting p-phenylenebis(trimellitic acid monoester anhydride), oxydiphthalic acid dianhydride, p-phenylenediamine, 4,4'-diaminodiphenyl ether and at least one acid dianhydride selected from the group consisting of pyromellitic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride and 3,3',4,4'- biphenyltetracarboxylic dianhydride in an organic solvent.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、金属、特に銅との
張り合わせ製品において、低反り、高寸法安定性を与え
得る、物性バランスに優れたポリイミドフィルムに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide film having a good balance of physical properties and capable of providing low warpage and high dimensional stability in a product bonded to a metal, particularly copper.

【0002】[0002]

【従来の技術】ポリイミドフィルムは、耐熱性、絶縁
性、耐溶剤性、および耐低温性等を備えており、コンピ
ュータ並びにIC制御の電気・電子機器部品材料として
広く用いられている。
2. Description of the Related Art Polyimide films have heat resistance, insulation, solvent resistance, low-temperature resistance and the like, and are widely used as components for computers and IC-controlled electric and electronic devices.

【0003】近年、コンピュータ並びにIC制御の電気
・電子機器の小型化・薄型化に伴い、配線基板類やIC
パッケージ材料も小型化・薄型化が求められるようにな
っている。このため、これらに施される配線パターンも
細密になり、フレキシブル配線板やTAB用キャリアテ
ープ等に用いられるポリイミドフィルムについても加熱
や引張り、さらには吸湿による寸法変化が小さいことが
必要になる。さらに、材料の薄型化に伴い、積層体全体
の「こし」を保ち、加工工程を安定にする必要もある。
In recent years, with the miniaturization and thinning of computers and electric / electronic devices controlled by ICs, wiring boards and ICs have been developed.
Packaging materials are also required to be smaller and thinner. For this reason, the wiring patterns to be applied thereto become finer, and it is necessary that polyimide films used for flexible wiring boards, TAB carrier tapes, and the like have small dimensional changes due to heating, pulling, and moisture absorption. Further, as the thickness of the material is reduced, it is necessary to maintain the “strain” of the entire laminate and to stabilize the processing steps.

【0004】このような必要性を満たす為、ポリイミド
フィルムは、線膨張係数が小さく、弾性率および貯蔵弾
性率が高く、吸湿膨張係数が低いことが望まれる。
In order to satisfy such a need, it is desired that the polyimide film has a small linear expansion coefficient, a high elastic modulus and a high storage elastic modulus, and a low moisture absorption expansion coefficient.

【0005】ただし、フレキシブル配線板やICパッケ
ージの製造の際、ポリイミドフィルムと銅箔とを張り合
わせて加工するため、フィルム線膨張係数に関しては、
銅の線膨張係数と大きく異なることは好ましくない。す
なわち、ポリイミドフィルムと銅箔の線膨張係数が大き
く異なると、張り合わせ品に反りが生じ、加工がしにく
くなり、その結果、全体的な寸法精度や歩留まりが低下
するからである。したがって、銅箔との線膨張係数の差
が小さいものが好ましい。
However, when a flexible wiring board or an IC package is manufactured, a polyimide film and a copper foil are laminated and processed.
It is not preferable that the coefficient of linear expansion differs greatly from the coefficient of linear expansion of copper. That is, if the linear expansion coefficient of the polyimide film is significantly different from that of the copper foil, the bonded product is warped, making it difficult to process, and as a result, the overall dimensional accuracy and yield are reduced. Therefore, those having a small difference in linear expansion coefficient from the copper foil are preferable.

【0006】上記特性を有するポリイミドフィルムを得
るため種々の試みがなされている。まず、ポリイミドフ
ィルムの高弾性率化のためには、剛直な構造のモノマー
即ち直線性の高いモノマーを用いれば良いことは広く知
られている。ところが、直線性の高いモノマーを多量用
いればフィルムの線膨張係数は低くなりすぎて、銅箔と
の張り合わせの用途には適さなくなる。
Various attempts have been made to obtain a polyimide film having the above characteristics. First, it is widely known that a monomer having a rigid structure, that is, a monomer having high linearity may be used to increase the modulus of elasticity of a polyimide film. However, if a large amount of a monomer having high linearity is used, the coefficient of linear expansion of the film becomes too low, which makes the film unsuitable for use in laminating with a copper foil.

【0007】比較的高い弾性率を実現しながらも線膨張
係数を下げ過ぎないために、比較的剛直な構造を有する
モノマーを用いて、化学的イミド化剤を用いず熱キュア
法で製造し、面方向の配向を甘くするという方法を取る
例もある。しかし、熱キュア法は化学的キュア法に比べ
必要な加熱時間が長く、生産性に劣るという不利があ
る。
In order to realize a relatively high elastic modulus and not to lower the coefficient of linear expansion too much, a monomer having a relatively rigid structure is produced by a thermal curing method without using a chemical imidizing agent, There is an example in which a method of making the orientation in the plane direction sweet is adopted. However, the heat curing method has disadvantages in that the required heating time is longer than that of the chemical curing method and productivity is poor.

【0008】さらに、剛直で直線性の高いモノマーを用
いると、一般的にはフィルムの柔軟性は損なわれ、フレ
キシブル配線板等としての利点の一つである折り曲げ可
能という点に、難が生じる可能性がある。
Further, when a rigid and highly linear monomer is used, the flexibility of the film is generally impaired, and there is a possibility that it is difficult to bend, which is one of the advantages of a flexible wiring board or the like. There is.

【0009】半導体パッケージ用途等では、半導体の信
頼性の観点から、特に吸水率ができるだけ低いことが求
められ、寸法安定性の観点から、吸湿膨張係数も低いこ
とが求められる。
For applications such as semiconductor packages, it is required that the water absorption is as low as possible from the viewpoint of reliability of the semiconductor, and that the coefficient of hygroscopic expansion is also low from the viewpoint of dimensional stability.

【0010】吸水率や吸湿膨張係数を下げるには、分子
構造中のイミド基量を減らすことが有効である。この
為、屈曲基を主鎖中に複数含む長鎖のモノマーが使用さ
れることが多い。しかし、この結果、弾性率の低下や線
膨張係数の過度な増大を招き、寸法安定性が犠牲にな
る。極端な場合は、例えば200℃以下の低温にTgを
有するような熱可塑性を示すようになり、ベースフィル
ムとして用いるには適さなくなる。また、このような直
線性で長いモノマーを用いると、分子鎖のパッキングが
難しくなり、十分な靭性を発現することができず、場合
によってはフィルム化すること自体が困難になる等の問
題があった。
In order to reduce the water absorption and the coefficient of expansion due to moisture absorption, it is effective to reduce the amount of imide groups in the molecular structure. For this reason, a long-chain monomer containing a plurality of bending groups in the main chain is often used. However, this results in a decrease in elastic modulus and an excessive increase in linear expansion coefficient, and sacrifices dimensional stability. In an extreme case, the polymer exhibits a thermoplastic property having a Tg at a low temperature of, for example, 200 ° C. or less, and is not suitable for use as a base film. In addition, when such a linear monomer having a long length is used, there is a problem that packing of a molecular chain becomes difficult, sufficient toughness cannot be exhibited, and in some cases, it becomes difficult to form a film itself. Was.

【0011】また、一般に粘弾性体(ポリイミドフィル
ムも含まれる)の貯蔵弾性率の値は、Tgを越える温度
領域において、常温での貯蔵弾性率の値よりも低くなる
(1桁、場合によっては2〜3桁程度低くなる)ことが
知られており、フィルム作製に通常使用する温度(例え
ば300℃以上400℃以下)における貯蔵弾性率が極
端に小さい場合、フィルム作製の温度領域において極端
にフィルムがたるむことなどにより、たるみの無い平坦
なフィルムを作製すること自体が困難になる場合があ
る。
In general, the value of the storage modulus of a viscoelastic body (including a polyimide film) is lower than the value of the storage modulus at room temperature in the temperature range exceeding Tg (one digit, in some cases, in some cases). It is known that the storage elastic modulus at a temperature usually used for producing a film (for example, 300 ° C. or more and 400 ° C. or less) is extremely small. In some cases, it becomes difficult to produce a flat film without sag due to sagging or the like.

【0012】上述のように、ポリイミドフィルムの特性
として要求される、高弾性率、高貯蔵弾性率、低線膨張
係数、低吸水性の特性をすべて実現させるには、これら
の特性以外にもフィルムの加工性等考慮すべき点が多
く、いずれかの特性を満足させようとすると、他の特性
が犠牲になる等の問題があり、複数の良い特性をすべて
併せ持つポリイミドフィルムを得ることは特に困難な状
況であった。
As described above, in order to realize all of the characteristics required of the polyimide film such as a high elastic modulus, a high storage elastic modulus, a low linear expansion coefficient, and a low water absorption, in addition to these characteristics, There are many points to be considered such as workability of the material, and if one of the properties is to be satisfied, there is a problem that other properties are sacrificed, and it is particularly difficult to obtain a polyimide film having all of a plurality of good properties. It was a situation.

【0013】[0013]

【発明が解決しようとする課題】そこで、本発明者ら
は、上記の問題点を解決し、高弾性率、高貯蔵弾性率、
銅に近い線膨張係数、十分な靱性、低吸水率および低吸
湿膨張係数の諸特性をすべて兼ね備える、細配線のフレ
キシブルプリント基板やTABフィルムに適したポリイ
ミドフィルムを製造することに関し、鋭意検討を行った
結果、本発明に到ったのである。
SUMMARY OF THE INVENTION The present inventors have solved the above problems and have developed a high elastic modulus, a high storage elastic modulus,
We are diligently examining the manufacture of polyimide films suitable for fine-printed flexible printed circuit boards and TAB films, which have all the characteristics of linear expansion coefficient close to copper, sufficient toughness, low water absorption coefficient and low moisture absorption expansion coefficient. As a result, the present invention has been achieved.

【0014】[0014]

【課題を解決するための手段】本発明者らは前述の要求
に鑑み、特定の組成のポリイミドフィルムにおいて、特
異的に諸特性バランスを高度に実現し制御し得るポリイ
ミドフィルム及びその製造方法を見出した。
DISCLOSURE OF THE INVENTION In view of the above-mentioned requirements, the present inventors have found a polyimide film having a specific composition and a method capable of specifically achieving and controlling a high balance of various properties, and a method for producing the same. Was.

【0015】本発明にかかるポリイミドフィルムの要旨
とするところは、p−フェニレンビス(トリメリット酸
モノエステル無水物)、オキシジフタル酸二無水物、
(ピロメリット酸二無水物、3,3’,4,4’−ベン
ゾフェノンテトラカルボン酸二無水物、3,3’,4,
4’−ビフェニルテトラカルボン酸二無水物からなる群
から選択される1つ)、p−フェニレンジアミン、およ
び4,4' −ジアミノジフェニルエーテルとを有機溶剤
中で反応させて得られるポリアミド酸から製造されるこ
とを内容とする。
The gist of the polyimide film of the present invention is p-phenylenebis (trimellitic acid monoester anhydride), oxydiphthalic dianhydride,
(Pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, 3,3 ′, 4
One selected from the group consisting of 4'-biphenyltetracarboxylic dianhydride), p-phenylenediamine, and 4,4'-diaminodiphenyl ether in an organic solvent. The contents shall be.

【0016】前記ポリイミドフィルムにおいて、上記p
−フェニレンビス(トリメリット酸モノエステル無水
物)が、全酸二無水物に対して1〜90モル%であり、
オキシジフタル酸二無水物が、全酸二無水物に対して8
モル%〜85モル%であり、(ピロメリット酸二無水
物、3,3’,4,4’−ベンゾフェノンテトラカルボ
ン酸二無水物、3,3’,4,4’−ビフェニルテトラ
カルボン酸二無水物からなる群から選択される1つ)
が、全酸二無水物に対して2〜14モル%であり、p−
フェニレンジアミンが、全ジアミンに対して25〜90
モル%であり、4,4' −ジアミノジフェニルエーテル
が、全ジアミンに対して10〜75モル%であることを
内容とする。
In the polyimide film, the above p
-Phenylene bis (trimellitic acid monoester anhydride) is 1 to 90 mol% based on the total acid dianhydride;
Oxydiphthalic dianhydride is 8 to the total acid dianhydride
Mol% to 85 mol% (pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride). One selected from the group consisting of anhydrides)
Is 2 to 14 mol% based on the total acid dianhydride, and p-
Phenylenediamine is used in an amount of 25 to 90 based on the total diamine.
Mol%, and the content of 4,4′-diaminodiphenyl ether is 10 to 75 mol% based on the total diamine.

【0017】係るポリイミドフィルムにおいて、100
℃から200℃の間の平均線膨張係数が15〜30pp
m、引張弾性率が4.5〜8.5GPa、破断時伸び率
が20%以上、吸湿膨張係数が10ppm以下、Tgが
200℃以上、300℃以上400℃以下の温度におけ
る貯蔵弾性率が200MPa以上であることを内容とす
る。
In such a polyimide film, 100
The average linear expansion coefficient between ℃ and 200 ℃ is 15-30pp
m, tensile elastic modulus is 4.5 to 8.5 GPa, elongation at break is 20% or more, coefficient of hygroscopic expansion is 10 ppm or less, Tg is 200 ° C or more, and storage elastic modulus at a temperature of 300 ° C or more and 400 ° C or less is 200 MPa. The content is as described above.

【0018】本発明のポリイミドフィルムの製造方法の
要旨とするところは、4,4' −ジアミノジフェニルエ
ーテルを有機溶剤中に溶解させ、(ピロメリット酸二無
水物、3,3’,4,4’−ベンゾフェノンテトラカル
ボン酸二無水物、3,3’,4,4’−ビフェニルテト
ラカルボン酸二無水物からなる群から選択される1つ)
を加え、続いてp−フェニレンジアミンを加え、該有機
溶剤溶液にp−フェニレンビス(トリメリット酸モノエ
ステル無水物)を加え、続いてオキシジフタル酸二無水
物を加えて得られたポリアミド酸重合体を、脱水閉環し
て、ポリイミドフィルムを得ることを内容とする。
The gist of the method for producing a polyimide film of the present invention is to dissolve 4,4′-diaminodiphenyl ether in an organic solvent, and prepare a solution of (pyromellitic dianhydride, 3,3 ′, 4,4 ′). Benzophenone tetracarboxylic dianhydride, one selected from the group consisting of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride)
, Followed by p-phenylenediamine, and p-phenylenebis (trimellitic acid monoester anhydride) to the organic solvent solution, followed by oxydiphthalic dianhydride to obtain a polyamic acid polymer. Is subjected to dehydration and ring closure to obtain a polyimide film.

【0019】本発明のポリイミドフィルムの製造方法の
他の要旨とするところは、p−フェニレンジアミンを有
機溶剤中に溶解させ、(ピロメリット酸二無水物、3,
3’,4,4’−ベンゾフェノンテトラカルボン酸二無
水物、3,3’,4,4’−ビフェニルテトラカルボン
酸二無水物からなる群から選択される1つ)を加え、続
いて、p−フェニレンビス(トリメリット酸モノエステ
ル無水物)を加え、該有機溶剤溶液に4,4' −ジアミ
ノジフェニルエーテルを加え、続いてオキシジフタル酸
二無水物を加えて得られたポリアミド酸重合体を、酸無
水物と三級アミンとを用いて脱水閉環し、ポリイミドフ
ィルムを得ることを内容とする。
Another aspect of the method for producing a polyimide film of the present invention is that p-phenylenediamine is dissolved in an organic solvent and (pyromellitic dianhydride, 3,
3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, one selected from the group consisting of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride), followed by p -Phenylenebis (trimellitic acid monoester anhydride) was added, 4,4'-diaminodiphenyl ether was added to the organic solvent solution, and then oxydiphthalic dianhydride was added to obtain a polyamic acid polymer. It is intended to obtain a polyimide film by dehydration and ring closure using an anhydride and a tertiary amine.

【0020】[0020]

【発明の実施の形態】以下、本発明にかかるポリイミド
フィルムについて、その実施の形態の1例に基づき説明
する。なお、本発明の用語「モノマー」とは、単量体の
ジアミンあるいはテトラカルボン酸二無水物のいずれか
をいう。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a polyimide film according to the present invention will be described based on an example of an embodiment. In addition, the term "monomer" in the present invention refers to either a diamine or a tetracarboxylic dianhydride of a monomer.

【0021】本発明にかかるポリイミドフィルムは、当
業者に公知のポリアミド酸合成法により調製されたポリ
アミド酸から、製造され得る。好ましくは、本発明のポ
リイミドフィルムの製造方法では、上記脱水閉環が、酸
無水物と第三級アミンとのイミド化剤の存在下で行われ
得る。
The polyimide film according to the present invention can be produced from a polyamic acid prepared by a polyamic acid synthesis method known to those skilled in the art. Preferably, in the method for producing a polyimide film of the present invention, the dehydration ring closure may be performed in the presence of an imidating agent between an acid anhydride and a tertiary amine.

【0022】本発明において、ポリアミド酸を合成する
為には、酸二無水物として、特に、以下の構造式を持つ
p−フェニレンビス(トリメリット酸モノエステル無水
物)(以下、TMHQという)
In the present invention, in order to synthesize a polyamic acid, in particular, p-phenylenebis (trimellitic acid monoester anhydride) having the following structural formula (hereinafter referred to as TMHQ) is used as an acid dianhydride.

【0023】[0023]

【化1】 Embedded image

【0024】および以下の構造式を持つオキシジフタル
酸二無水物(以下、ODPAという)
And oxydiphthalic dianhydride having the following structural formula (hereinafter referred to as ODPA)

【0025】[0025]

【化2】 Embedded image

【0026】および以下の構造式を持つピロメリット酸
二無水物(以下、PMDAという)
And pyromellitic dianhydride having the following structural formula (hereinafter referred to as PMDA)

【0027】[0027]

【化3】 Embedded image

【0028】および以下の構造式を持つ3,3’,4,
4’−ベンゾフェノンテトラカルボン酸二無水物(以
下、BTDAという)
And 3,3 ', 4 having the following structural formula:
4'-benzophenonetetracarboxylic dianhydride (hereinafter referred to as BTDA)

【0029】[0029]

【化4】 Embedded image

【0030】および以下の構造式を持つ3,3’,4,
4’−ビフェニルテトラカルボン酸二無水物(以下、B
PDAという)
And 3,3 ′, 4 having the following structural formula:
4'-biphenyltetracarboxylic dianhydride (hereinafter referred to as B
PDA)

【0031】[0031]

【化5】 Embedded image

【0032】ジアミンとして、以下の構造式を持つp−
フェニレンジアミン(以下、PDAという)
As a diamine, p- having the following structural formula
Phenylenediamine (hereinafter referred to as PDA)

【0033】[0033]

【化6】 Embedded image

【0034】および以下の構造式を持つ4,4’−ジア
ミノジフェニルエーテル(以下、ODAという)
And 4,4'-diaminodiphenyl ether having the following structural formula (hereinafter referred to as ODA)

【0035】[0035]

【化7】 Embedded image

【0036】を用いる。上記のモノマーを有機溶剤に溶
解し、重合反応させて本発明にかかるポリイミドフィル
ムを製造するために用い得るポリアミド酸を得る。
Is used. The above monomers are dissolved in an organic solvent and polymerized to obtain a polyamic acid that can be used for producing the polyimide film according to the present invention.

【0037】以下TMHQは、PDAとの組み合わせに
おいて、棒状構造をとり、フィルムの高弾性が顕現さ
れ、主鎖構造上エステル結合のため熱的にはやや柔軟で
あることから、例えばピロメリット酸のみを用いた場合
等に比べて線膨張係数が極端に下がることがなくなる。
また、エステル結合がイミド環の分極を緩和し、吸水率
を下げ吸水膨張率を下げる効果も有する。
In the following, TMHQ has a rod-like structure in combination with PDA, exhibits high elasticity of the film, and is somewhat thermally thermally flexible due to ester bond in the main chain structure. In this case, the coefficient of linear expansion does not significantly decrease as compared with the case where.
The ester bond also has the effect of relaxing the polarization of the imide ring, lowering the water absorption and lowering the water expansion.

【0038】ところが、TMHQは、PDAとの組み合
わせでは、構造的に硬すぎ、線膨張係数も依然低く、ま
た靭性が不十分である。ジアミノジフェニルエーテルを
共重合することによっても、依然一定以上の弾性率を得
ようとすると線膨張係数は下がりすぎ、また靭性も不十
分である。
However, TMHQ, when combined with PDA, is structurally too hard, still has a low coefficient of linear expansion, and has insufficient toughness. Even when the diaminodiphenyl ether is copolymerized, the linear expansion coefficient is too low and the toughness is insufficient when still trying to obtain a certain or more elastic modulus.

【0039】ODPAを用いて、PDAとジアミノジフ
ェニルエーテルとを重合させ、適度に高い弾性率と銅と
の組み合わせにおいて不都合のない適度な線膨張係数、
また十分な靭性等を実現させ得る。ただし、ODPAだ
けでは吸水率そのものはさほど下がらず、吸湿特性を下
げてかつ諸特性を好ましく保つにはTMHQをさらに共
重合する、本発明の構成は、非常に有効である。
Using ODPA, PDA and diaminodiphenyl ether are polymerized, and a moderately high coefficient of linear expansion which is not inconvenient in combination with a moderately high elastic modulus and copper;
Also, sufficient toughness and the like can be realized. However, the structure of the present invention, in which TMHQ is further copolymerized to lower moisture absorption properties and maintain various properties favorably, is very effective because ODPA alone does not significantly reduce the water absorption rate itself.

【0040】さらに、(PMDA、BTDA、BPDA
からなる群から選択される1つ)を共重合させることに
より、ODPAおよびTMHQの組み合わせで実現でき
る好ましい他の特性を保持したまま、かつ、300℃以
上400℃以下の温度における200MPa以上という
高い貯蔵弾性率を新たに付与することができる、本発明
の構成は、非常に有効である。
Further, (PMDA, BTDA, BPDA
(1) selected from the group consisting of), while maintaining other favorable properties that can be realized by the combination of ODPA and TMHQ, and having a high storage of 200 MPa or more at a temperature of 300 to 400 ° C. The configuration of the present invention, which can newly provide an elastic modulus, is very effective.

【0041】本発明の重合工程で用いられる有機溶剤
は、当業者に公知の種々の溶剤を用い得る。例えば、ポ
リアミド酸に対して高い溶解性を有する高極性溶剤を用
いることが好ましいが、これらの高極性溶剤に貧溶剤を
添加することも可能である。高極性溶剤の例としては、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド等のアミド類、N−メチル−2−ピロリドン等
のピロリドン類、フェノール、p−クロロフェノール、
o−クロロフェノール等のフェノール類等が挙げられ
る。貧溶剤の例としては、トルエン、テトラヒドロフラ
ン、アセトン、メチルエチルケトン、メタノール、エタ
ノール等が挙げられる。これらの溶剤を混合して、適当
に溶解度パラメータを調整することにより、溶解性を高
めることもできる。
As the organic solvent used in the polymerization step of the present invention, various solvents known to those skilled in the art can be used. For example, it is preferable to use a highly polar solvent having high solubility in polyamic acid, but it is also possible to add a poor solvent to these highly polar solvents. Examples of highly polar solvents include:
Amides such as N, N-dimethylformamide, N, N-dimethylacetamide, pyrrolidones such as N-methyl-2-pyrrolidone, phenol, p-chlorophenol,
Examples include phenols such as o-chlorophenol. Examples of poor solvents include toluene, tetrahydrofuran, acetone, methyl ethyl ketone, methanol, ethanol and the like. By mixing these solvents and adjusting the solubility parameter appropriately, the solubility can be enhanced.

【0042】上記酸二無水物及びジアミンの添加量は、
上記p−フェニレンビス(トリメリット酸モノエステル
無水物)が、全酸二無水物に対して0より多く90モル
%以下の範囲、好ましくは1〜90モル%であり、オキ
シジフタル酸二無水物が、全酸二無水物に対して9以上
85モル%未満、好ましくは、8〜85モル%であり、
(ピロメリット酸二無水物、3,3’,4,4’−ベン
ゾフェノンテトラカルボン酸二無水物、3,3’,4,
4’−ビフェニルテトラカルボン酸二無水物からなる群
から選択される1つ)が、全酸二無水物に対して1より
多く15モル%以下の範囲、好ましくは2〜14モル%
であり、p−フェニレンジアミンが、全ジアミンに対し
て25〜90モル%であり、4、4' −ジアミノジフェ
ニルエーテルが、全ジアミンに対して10〜75モル%
である。
The addition amount of the above acid dianhydride and diamine is as follows:
The above-mentioned p-phenylenebis (trimellitic acid monoester anhydride) is in the range of more than 0 to 90 mol%, preferably 1 to 90 mol%, based on the total acid dianhydride, and oxydiphthalic dianhydride is 9 to less than 85 mol%, preferably 8 to 85 mol%, based on the total acid dianhydride;
(Pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, 3,3 ′, 4
One selected from the group consisting of 4′-biphenyltetracarboxylic dianhydride) is in the range of more than 1 to 15 mol%, preferably 2 to 14 mol%, based on the total acid dianhydride
And p-phenylenediamine is 25 to 90 mol% based on the total diamine, and 4,4′-diaminodiphenyl ether is 10 to 75 mol% based on the total diamine.
It is.

【0043】ポリアミド酸の合成のための各モノマーの
添加順序は特に限定されず、様々な方法が可能である。
溶剤に、全ジアミンを溶解し、これにテトラカルボン酸
二無水物を徐々に加えておおむね当量として粘度を調整
しつつ、さらに残りのテトラカルボン酸二無水物をその
ままあるいは適当な溶剤に溶解して加えて、当量比を等
しくさせることが一般的に行われているが、これに限定
されない。
The order of addition of each monomer for synthesizing polyamic acid is not particularly limited, and various methods are possible.
In a solvent, dissolve all the diamines, gradually add tetracarboxylic dianhydride to this to adjust the viscosity as an approximately equivalent, and further dissolve the remaining tetracarboxylic dianhydride as it is or in an appropriate solvent. In addition, it is common practice to make equivalence ratios equal, but not limited to this.

【0044】これらの添加順序によっては、フィルムの
特性を微妙に制御することも可能である。
Depending on the order of addition, the properties of the film can be finely controlled.

【0045】具体的には、ODAとPDAを溶剤中に溶
解し、これに対して、(PMDA,BTDA,BPDA
からなる群から選択される1つ)を加え、引き続きTM
HQを加え、その後ODPAを加える方法;あるいは、
同様に2種のジアミンを溶剤に溶解しておき、これに対
して、(PMDA,BTDA,BPDAからなる群から
選択される1つ)を加え、引き続きこれにODPA、T
MHQの順に酸二水物を順次加える方法;または、同様
に2種のジアミンを溶解しておき、これに3種の酸二無
水物の混合物を加える方法;2種のジアミンのうちどち
らか一方を溶剤に溶解しておき、これに3種の酸二無水
物から選択される1種を加えて、その後にもう1種のジ
アミンを加え、さらにその後もう2種の酸二無水物を加
える方法、等を上げることができる。
Specifically, ODA and PDA are dissolved in a solvent, and (PMDA, BTDA, BPDA
One selected from the group consisting of
A method of adding HQ followed by ODPA;
Similarly, two kinds of diamines are dissolved in a solvent, and (one selected from the group consisting of PMDA, BTDA, and BPDA) is added thereto, followed by ODPA and T
A method of sequentially adding acid dihydrate in the order of MHQ; or a method of dissolving two diamines in the same manner and adding a mixture of three acid dianhydrides thereto; one of the two diamines Is dissolved in a solvent, and one kind selected from three kinds of acid dianhydrides is added thereto, then another kind of diamine is added, and then another two kinds of acid dianhydrides are added. , Etc. can be raised.

【0046】1種のジアミンを複数のステップに分けて
添加すると、さらにバリエーションは多くなり、これら
により種々の特性のさらなる微妙な調整が可能である。
特にODAを有機溶剤中に溶解させ、これに、(PMD
A,BTDA,BPDAからなる群から選択される1
つ)を加え、引き続きPDAを加え、これにTMHQを
加え、続いてODPAを加えるという手順によって合成
されたポリアミド酸を用いた場合は、上記のODAとP
DAを入れ替えた順序を採用した場合よりも得られるポ
リイミドフィルムが高いTgを示し、好ましい。
When one kind of diamine is added in a plurality of steps, the variations are further increased, and these allow finer adjustment of various properties.
Particularly, ODA is dissolved in an organic solvent, and (PMD
A selected from the group consisting of A, BTDA, and BPDA
), Followed by PDA, followed by TMHQ, followed by ODPA.
The polyimide film obtained has a higher Tg than the case where the order in which DA is exchanged is adopted, and is thus preferable.

【0047】何れの場合もジアミン化合物のモル量の合
計と酸二無水物化合物のモル量の合計は、ほぼ同一とな
るように用いる。
In each case, the total molar amount of the diamine compound and the total molar amount of the acid dianhydride compound are used so as to be substantially the same.

【0048】ここで、「ほぼ同一」としたのは、完全に
同一であると重合度が過度に上がりすぎ、その結果溶液
粘度が過度に上昇して取り扱いにくくなるからである。
具体的には、ジアミン化合物モル量合計と、酸二無水物
化合物モル量合計の比率は、0.95〜1.05、好ま
しくは0.98〜1.02の範囲であり、1:1でない
ことが特に好ましい。
The reason why the term "substantially the same" is used here is that if they are completely the same, the degree of polymerization is excessively increased, and as a result, the solution viscosity is excessively increased and the handling becomes difficult.
Specifically, the ratio of the total molar amount of the diamine compound to the total molar amount of the acid dianhydride compound is in the range of 0.95 to 1.05, preferably 0.98 to 1.02, and is not 1: 1. Is particularly preferred.

【0049】それぞれのモノマーの添加割合は、特に限
定されないが、好ましくは全酸二無水物中、TMHQ
は、0モル%より多く90モル%以下であり、ODPA
は、9モル%以上85モル%未満であり、(PMDA,
BTDA,BPDAからなる群から選択される1つ)
は、1モル%以上15モル%未満であり、全ジアミン
中、PDAは、25モル%以上90モル%以下であり、
ODAは、10モル%以上75モル%以下である。
The addition ratio of each monomer is not particularly limited, but preferably, TMHQ
Is more than 0 mol% and 90 mol% or less, and ODPA
Is not less than 9 mol% and less than 85 mol%, (PMDA,
One selected from the group consisting of BTDA and BPDA)
Is not less than 1 mol% and less than 15 mol%, and PDA is not less than 25 mol% and not more than 90 mol% in all diamines;
ODA is 10 mol% or more and 75 mol% or less.

【0050】特に好ましくは、全酸二無水物中、TMH
Qは、1モル%以上90モル%以下であり、ODPA
は、8モル%以上85モル%以下であり、(PMDA,
BTDA,BPDAからなる群から選択される1つ)
は、2モル%以上14モル%以下である。
Particularly preferably, TMH in all acid dianhydrides is used.
Q is 1 mol% or more and 90 mol% or less, and ODPA
Is not less than 8 mol% and not more than 85 mol%, (PMDA,
One selected from the group consisting of BTDA and BPDA)
Is from 2 mol% to 14 mol%.

【0051】最も好ましくは、全酸二無水物中、TMH
Qは、5モル%以上50モル%以下であり、ODPA
は、47モル%以上81モル%以下であり、(PMD
A,BTDA,BPDAからなる群から選択される1
つ)は、3モル%以上14モル%以下であり、全ジアミ
ン中、PDAは、50モル%以上90モル%以下であ
り、ODAは、10モル%以上50モル%以下である。
Most preferably, TMH in all acid dianhydrides
Q is 5 mol% or more and 50 mol% or less, and ODPA
Is not less than 47 mol% and not more than 81 mol%, and (PMD
A selected from the group consisting of A, BTDA, and BPDA
Is 3 mol% or more and 14 mol% or less, PDA is 50 mol% or more and 90 mol% or less, and ODA is 10 mol% or more and 50 mol% or less in all diamines.

【0052】これらの5種のモノマー以外のジアミンの
モノマー成分を少量(ジアミン全体の10モル%以下の
量)加え、得られるポリイミドフィルムの特性の微妙な
調整をすることも可能である。使用するモノマーにもよ
るが、概ねこの量以下の共重合であれば、吸湿特性・熱
特性・機械特性を好ましいレベルに保つことができる。
少量用いるジアミンのモノマーとしては、ジメチルベン
ジジン、2,2' −ビス(4−アミノフェノキシフェニ
ル)プロパン、4,4' −ビス(4−アミノフェノキ
シ)ビフェニル、またこれらのフッ素等ハロゲン置換体
等を例示することができる。
By adding a small amount of a diamine monomer component (an amount of 10 mol% or less of the entire diamine) other than these five types of monomers, it is possible to finely adjust the characteristics of the obtained polyimide film. Although it depends on the monomer used, if the copolymerization is approximately equal to or less than this amount, the moisture absorption properties, thermal properties, and mechanical properties can be maintained at preferable levels.
Examples of the diamine monomer used in a small amount include dimethylbenzidine, 2,2′-bis (4-aminophenoxyphenyl) propane, 4,4′-bis (4-aminophenoxy) biphenyl, and halogen-substituted products such as fluorine. Examples can be given.

【0053】重合反応は、一般的にポリアミド酸の重合
反応に用いられる温度であれば、特に限定されないが、
60℃以下が好ましく、40℃以下で行うことがより好
ましい。高温度になると、酸無水物基の開環反応が生じ
易く、ポリアミド酸の生成反応を阻害することがある。
The polymerization reaction is not particularly limited as long as it is a temperature generally used for a polyamic acid polymerization reaction.
The temperature is preferably 60 ° C. or lower, more preferably 40 ° C. or lower. When the temperature is high, a ring opening reaction of the acid anhydride group is likely to occur, which may inhibit the polyamic acid generation reaction.

【0054】重合反応は、窒素あるいはアルゴン等の不
活性ガス中で行わせることが好ましいが、その他の条件
下でも行い得る。
The polymerization reaction is preferably carried out in an inert gas such as nitrogen or argon, but may be carried out under other conditions.

【0055】ポリアミド酸の溶液中の濃度は、5〜30
wt%、さらには10〜25wt%が好ましい。これよ
り低いと溶剤が増え、フィルム製造後の乾燥に時間がか
かり、これより高い濃度の場合、粘度が上昇して加工が
困難となる場合がある。
The concentration of the polyamic acid in the solution is 5 to 30.
wt%, more preferably 10 to 25 wt%. If the concentration is lower than this, the solvent increases, and it takes time to dry the film after production. If the concentration is higher than this, the viscosity may increase and processing may be difficult.

【0056】ポリアミド酸溶液の粘度は、フィルム加工
できる粘度であれば特に限定されないが、22℃で約1
00〜10000ポイズ程度、好ましくは、500〜6
000ポイズである。粘度が低過ぎるとフィルムの特性
に悪影響を与え、加工の際に厚みを安定化することも難
しい。一方、粘度が高過ぎる場合、溶液の攪拌が困難と
なり、フィルム状に加工する際に強い力が必要となり、
不都合である。
The viscosity of the polyamic acid solution is not particularly limited as long as it can process a film.
About 00 to 10000 poise, preferably 500 to 6 poise
000 poise. If the viscosity is too low, the properties of the film are adversely affected, and it is also difficult to stabilize the thickness during processing. On the other hand, if the viscosity is too high, stirring of the solution becomes difficult, and a strong force is required when processing into a film,
It is inconvenient.

【0057】得られたポリアミド酸の溶液を、フィルム
状に形成し、ポリアミド酸をイミド化してポリイミドフ
ィルムを得ることができる。一般的には、このイミド化
は、加熱により脱水する熱的方法および脱水剤あるいは
イミド化触媒を用いる化学的方法とがある。このうちの
いずれの方法を用いてもよく、化学的方法と熱的方法を
併用することもできる。脱水剤と触媒を添加して加熱、
乾燥する化学的方法によれば、熱的方法よりも効率がよ
く、優れた特性がフィルムに付与され得る。脱水剤ある
いはイミド化触媒を用いない場合でも、本願発明の5種
のモノマーを用いるならば製造工程で延伸工程を入れる
等の方法により、同等の特性を実現することも可能であ
るが、生産性の面から、化学的方法が好ましい。
The resulting polyamic acid solution is formed into a film, and the polyamic acid is imidized to obtain a polyimide film. In general, the imidation includes a thermal method of dehydration by heating and a chemical method using a dehydrating agent or an imidization catalyst. Any of these methods may be used, and a chemical method and a thermal method may be used in combination. Add dehydrating agent and catalyst and heat,
The chemical method of drying is more efficient than the thermal method and can impart excellent properties to the film. Even when a dehydrating agent or an imidization catalyst is not used, if the five monomers of the present invention are used, it is possible to achieve the same characteristics by a method such as inserting a stretching step in the production process. In view of this, a chemical method is preferable.

【0058】本発明に用いられる脱水剤は、例えば、無
水酢酸等の脂肪族酸無水物、芳香族酸無水物などであ
る。また、イミド化に用いられる触媒は、ピリジン、α
−ピコリン、β−ピコリン、γ−ピコリン、トリメチル
アミン、ジメチルアニリン、トリエチルアミン、イソキ
ノリンなどの第3級アミンなどである。
The dehydrating agent used in the present invention is, for example, an aliphatic acid anhydride such as acetic anhydride, an aromatic acid anhydride and the like. The catalyst used for imidization is pyridine, α
And tertiary amines such as picoline, β-picoline, γ-picoline, trimethylamine, dimethylaniline, triethylamine and isoquinoline.

【0059】例えば、以下にイミド化の化学的方法の例
を挙げるが、本発明はこれに限定されない。すなわち、
得られたポリアミド酸溶液に化学量論以上の脱水剤と触
媒量の第3級アミンとを加えた溶液を、支持板やPET
等の有機化合物製のフィルム、ドラム、あるいはエンド
レスベルト状に流延又は塗布して膜状とし、その膜を1
50℃以下の温度で約5分〜90分間乾燥し、自己支持
性のポリアミド酸重合体の塗膜を得る。次にこれを支持
体より引き剥がして端部を固定する。その後、100℃
〜500℃程度まで徐々に加熱することによりイミド化
させ、冷却後これより取り外してポリイミドフィルムを
得る。
For example, examples of chemical methods for imidization are shown below, but the present invention is not limited to these. That is,
A solution obtained by adding a stoichiometric or more dehydrating agent and a catalytic amount of a tertiary amine to the obtained polyamic acid solution is applied to a support plate or PET.
Or a film made of an organic compound, such as a film, a drum, or an endless belt, which is cast or coated into a film.
It is dried at a temperature of 50 ° C. or less for about 5 to 90 minutes to obtain a self-supporting polyamic acid polymer coating film. Next, this is peeled off from the support to fix the end. Then 100 ° C
It is imidized by gradually heating it to about 500 ° C., and after cooling, it is removed from it to obtain a polyimide film.

【0060】熱的方法によるイミド化の例は、上記の化
学的イミド化法と同様の工程が挙げられるが、これに限
定されない。すなわち、ポリアミド酸溶液を支持板やP
ET等の有機化合物製のフィルム、ドラムあるいはエン
ドレスベルト等の支持体上に流延または塗布して膜状と
し、加熱処理し得る。
Examples of the imidization by a thermal method include, but are not limited to, the same steps as in the chemical imidization method described above. That is, the polyamic acid solution is added to the support plate or P
The film may be cast or coated on a support such as a film, a drum or an endless belt made of an organic compound such as ET, and may be subjected to a heat treatment.

【0061】フィルムの製造に際しては、さらに、熱劣
化防止剤を加えて焼成時のフィルムの劣化を防止し得
る。その他の添加剤を加えて、フィルム製造時における
フィルムの劣化等を防止することもできる。熱劣化防止
剤としては、トリフェニルフォスフェイト等のリン酸系
の劣化防止剤、置換基を有する又は置換基を有さないベ
ンゾフェノン等が挙げられる。その他の添加剤として
は、金属単体、有機金属化合物、またはガラス系のフィ
ラー類等が挙げられる。
In the production of the film, a thermal deterioration inhibitor may be further added to prevent the film from deteriorating during firing. Other additives can be added to prevent the film from deteriorating during the production of the film. Examples of the thermal degradation inhibitor include phosphoric acid-based degradation inhibitors such as triphenyl phosphate, and benzophenones having or not having a substituent. Other additives include simple metals, organometallic compounds, and glass-based fillers.

【0062】上記のようにして製造される本発明にかか
るポリイミドフィルムは、一定の耐熱性、接着性等を有
しつつ、高弾性率、高貯蔵弾性率、高破断時伸び率、低
線膨張係数、低吸湿膨張係数、それぞれの特性を有する
バランスのよいポリイミドフィルムである。
The polyimide film according to the present invention produced as described above has a high modulus of elasticity, a high modulus of storage, a high elongation at break, and a low linear expansion while having a certain heat resistance and adhesiveness. It is a well-balanced polyimide film having a coefficient, a low hygroscopic expansion coefficient, and each characteristic.

【0063】具体的には、本発明にかかるポリイミドフ
ィルムは、100℃以上200℃以下の平均線膨張係数
が15〜30ppm、引張弾性率が4.5〜8.5GP
a、破断時伸び率が20%以上、吸湿膨張係数が10p
pm以下、Tgが200℃以上、300℃以上400℃
以下の温度における貯蔵弾性率が200MPa以上であ
る特性を顕現することができる。
Specifically, the polyimide film according to the present invention has an average linear expansion coefficient of 100 to 200 ° C. of 15 to 30 ppm and a tensile modulus of 4.5 to 8.5 GP.
a, elongation at break is 20% or more, and coefficient of hygroscopic expansion is 10p
pm or less, Tg is 200 ° C or more, 300 ° C or more and 400 ° C
The characteristic that the storage elastic modulus at the following temperature is 200 MPa or more can be exhibited.

【0064】ここで、本発明にかかるポリイミドフィル
ムの特性は、以下のように測定したものである。すなわ
ち、引張弾性率及び破断時伸び率とは、それぞれAST
M−D882に準じた測定値をいう。平均線膨脹係数
は、セイコー電子工業株式会社製TMA120Cを用い
て、窒素の存在下、1分間に10℃の割合で温度を上昇
させて、100℃〜200℃の時の値を測定して求め
る。吸湿膨脹係数は、ポリイミドフィルムがたるまない
ように最低限の加重をかけた状態(5mm×20mmの
サンプルに対して、約3g)で、湿度を30RH%に調
湿し完全に飽和するまで吸湿させて寸法を計測し、その
後湿度を90RH%に調湿し同様に飽和吸湿させた後寸
法を計測し、両者の結果から相対湿度差1%あたりの寸
法変化率を求める。ガラス転移温度(Tg)は、動的粘
弾性測定装置(セイコー電子工業株式会社製DMS20
0)を用いて引張モードで、3℃/分の割合で昇温させ
ながら測定する。
Here, the characteristics of the polyimide film according to the present invention are measured as follows. That is, the tensile modulus and the elongation at break are respectively AST
It refers to a measured value according to M-D882. The average linear expansion coefficient is obtained by measuring the value at a temperature of 100 ° C. to 200 ° C. using TMA120C manufactured by Seiko Denshi Kogyo Co., Ltd., at a rate of 10 ° C. per minute in the presence of nitrogen. . The coefficient of hygroscopic expansion is adjusted under the condition that a minimum load is applied so that the polyimide film does not sag (approximately 3 g for a sample of 5 mm × 20 mm). The dimensions are measured, then the humidity is adjusted to 90 RH%, and after the saturated moisture absorption, the dimensions are measured, and the dimensional change rate per 1% relative humidity difference is determined from both results. The glass transition temperature (Tg) was measured using a dynamic viscoelasticity measuring device (DMS20 manufactured by Seiko Instruments Inc.).
Measurement is carried out in the tensile mode using 0) while the temperature is raised at a rate of 3 ° C./min.

【0065】[0065]

【実施例】以下に実施例により本発明をより具体的に説
明するが、本発明はこれら実施例によって限定されるも
のではない。
EXAMPLES The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

【0066】(実施例1)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド780g中に、33.4g(総ジ
アミン中の約37.5mol%)のODAを溶解し、
3.9g(総酸二無水物中の約4mol%)のPMDA
を溶解し、30.0g(総ジアミン中の約62.5mo
l%)のPDAを溶解し、これにTMHQ63.1g
(総酸二無水物中の約31mol%)を徐々に加えて良
く攪拌し反応させ、続いてODPA89.6g(総酸二
無水物中の約65mol%)を徐々に加え、23℃での
測定で約2500ポイズのポリアミド酸溶液を得た。
Example 1 33.4 g (approximately 37.5 mol% of the total diamine) of ODA was dissolved in 780 g of dimethylacetamide in an ice bath in a nitrogen atmosphere.
3.9 g (about 4 mol% in total acid dianhydride) of PMDA
Was dissolved in 30.0 g (about 62.5 mol of the total diamine).
1%) of PDA was dissolved therein, and 63.1 g of TMHQ was added thereto.
(About 31 mol% in the total acid dianhydride) is gradually added, and the mixture is stirred and reacted well. Subsequently, 89.6 g of ODPA (about 65 mol% in the total acid dianhydride) is gradually added, and the measurement is performed at 23 ° C. This gave a polyamic acid solution of about 2500 poise.

【0067】このポリアミド酸溶液100gを0℃程度
に冷却し、これに13.5gの無水酢酸と4.1gのイ
ソキノリンを加えて、均一に攪拌しこれを、SUS板上
に焼成後50μm になるような所定の厚みにキャスト
し、125℃で5分熱風乾燥した。その後SUS板より
フィルムを引き剥がし、これを4片を固定した状態で1
70℃で1.5分、250℃で1.5分、350℃で3
分、430℃で3分加熱乾燥し、ポリイミドフィルムを
得た。このフィルムの引張弾性率、破断時伸び率、線膨
張係数、吸湿膨張係数、Tg、350℃での貯蔵弾性率
を測定した結果を表1に示す。
100 g of this polyamic acid solution was cooled to about 0 ° C., and 13.5 g of acetic anhydride and 4.1 g of isoquinoline were added thereto, and the mixture was stirred uniformly and fired on a SUS plate to a thickness of 50 μm. It was cast to a predetermined thickness as described above and dried with hot air at 125 ° C. for 5 minutes. Thereafter, the film was peeled off from the SUS plate, and this was fixed in a state where four pieces were fixed.
1.5 minutes at 70 ° C, 1.5 minutes at 250 ° C, 3 at 350 ° C
For 3 minutes at 430 ° C. to obtain a polyimide film. Table 1 shows the results of measuring the tensile modulus, elongation at break, linear expansion coefficient, coefficient of hygroscopic expansion, Tg, and storage modulus at 350 ° C. of this film.

【0068】(実施例2)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド780g中に、33.6g(総ジ
アミン中の約37.5mol%)のODAを溶解し、
7.8g(総酸二無水物中の約8mol%)のPMDA
を溶解し、30.3g(総ジアミン中の約62.5mo
l%)のPDAを溶解し、これにTMHQ63.6g
(総酸二無水物中の約31mol%)を徐々に加えて良
く攪拌し反応させ、続いてODPA84.7g(総酸二
無水物中の約61mol%)を徐々に加え、23℃での
測定で約2500ポイズのポリアミド酸溶液を得た。
Example 2 33.6 g (approximately 37.5 mol% of the total diamine) of ODA was dissolved in 780 g of dimethylacetamide in an ice bath in a nitrogen atmosphere.
7.8 g (about 8 mol% in total acid dianhydride) of PMDA
Was dissolved in 30.3 g (about 62.5 mol of the total diamine).
1%) of PDA was dissolved therein, and 63.6 g of TMHQ was added thereto.
(About 31 mol% in the total acid dianhydride) was gradually added, and the mixture was stirred well and reacted. Subsequently, 84.7 g of ODPA (about 61 mol% in the total acid dianhydride) was gradually added, and the measurement was performed at 23 ° C. This gave a polyamic acid solution of about 2500 poise.

【0069】このポリアミド酸溶液を実施例1と同様の
方法で加工し、ポリイミドフィルムとした。実施例1と
同様に、特性試験を行った。その結果を表1に示す。
This polyamic acid solution was processed in the same manner as in Example 1 to obtain a polyimide film. A characteristic test was performed in the same manner as in Example 1. Table 1 shows the results.

【0070】(実施例3)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド780g中に、33.9g(総ジ
アミン中の約37.5mol%)のODAを溶解し、1
1.8g(総酸二無水物中の約12mol%)のPMD
Aを溶解し、30.5g(総ジアミン中の約62.5m
ol%)のPDAを溶解し、これにTMHQ64.1g
(総酸二無水物中の約31mol%)を徐々に加えて良
く攪拌し反応させ、続いてODPA79.8g(総酸二
無水物中の約57mol%)を徐々に加え、23℃での
測定で約2500ポイズのポリアミド酸溶液を得た。
Example 3 33.9 g (approximately 37.5 mol% of the total diamine) of ODA was dissolved in 780 g of dimethylacetamide in an ice bath in a nitrogen-substituted atmosphere.
1.8 g of PMD (about 12 mol% in total acid dianhydride)
A in 30.5 g (about 62.5 m in total diamine)
ol%) of PDA, and 64.1 g of TMHQ was added thereto.
(Approximately 31 mol% in the total acid dianhydride) was gradually added, and the mixture was stirred and reacted well. Subsequently, 79.8 g of ODPA (approximately 57 mol% in the total acid dianhydride) was gradually added, and the measurement was performed at 23 ° C. This gave a polyamic acid solution of about 2500 poise.

【0071】このポリアミド酸溶液を実施例1と同様の
方法で加工し、ポリイミドフィルムとした。実施例1と
同様に、特性試験を行った。その結果を表1に示す。
This polyamic acid solution was processed in the same manner as in Example 1 to obtain a polyimide film. A characteristic test was performed in the same manner as in Example 1. Table 1 shows the results.

【0072】(実施例4)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド780g中に、33.1g(総ジ
アミン中の約37.5mol%)のODAを溶解し、
7.1g(総酸二無水物中の約5mol%)のBTDA
を溶解し、29.8g(総ジアミン中の約62.5mo
l%)のPDAを溶解し、これにTMHQ62.6g
(総酸二無水物中の約31mol%)を徐々に加えて良
く攪拌し反応させ、続いてODPA87.5g(総酸二
無水物中の約64mol%)を徐々に加え、23℃での
測定で約2500ポイズのポリアミド酸溶液を得た。
Example 4 33.1 g (approximately 37.5 mol% of the total diamine) of ODA was dissolved in 780 g of dimethylacetamide in an ice bath in a nitrogen-substituted atmosphere.
7.1 g (about 5 mol% in total acid dianhydride) of BTDA
Was dissolved and 29.8 g (about 62.5 mo in total diamine) was dissolved.
1%) of PDA, and 62.6 g of TMHQ was added thereto.
(Approximately 31 mol% in total acid dianhydride) is added slowly, and the mixture is stirred well to cause a reaction. Subsequently, 87.5 g of ODPA (approximately 64 mol% in total acid dianhydride) is gradually added, and measurement is performed at 23 ° C. This gave a polyamic acid solution of about 2500 poise.

【0073】このポリアミド酸溶液を実施例1と同様の
方法で加工し、ポリイミドフィルムとした。実施例1と
同様に、特性試験を行った。その結果を表1に示す。
This polyamic acid solution was processed in the same manner as in Example 1 to obtain a polyimide film. A characteristic test was performed in the same manner as in Example 1. Table 1 shows the results.

【0074】(実施例5)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド780g中に、33.0g(総ジ
アミン中の約37.5mol%)のODAを溶解し、1
7.7g(総酸二無水物中の約12.5mol%)のB
TDAを溶解し、29.7g(総ジアミン中の約62.
5mol%)のPDAを溶解し、これにTMHQ62.
5g(総酸二無水物中の約31mol%)を徐々に加え
て良く攪拌し反応させ、続いてODPA77.1g(総
酸二無水物中の約56.5mol%)を徐々に加え、2
3℃での測定で約2500ポイズのポリアミド酸溶液を
得た。
Example 5 33.0 g (approximately 37.5 mol% of the total diamine) of ODA was dissolved in 780 g of dimethylacetamide in an ice bath in a nitrogen-substituted atmosphere.
7.7 g (about 12.5 mol% in total dianhydride) of B
The TDA was dissolved and 29.7 g (approximately 62.
5 mol%) of PDA was dissolved therein, and TMHQ62.
5 g (approximately 31 mol% in the total acid dianhydride) is gradually added, and the mixture is stirred well and reacted. Then, 77.1 g of ODPA (approximately 56.5 mol% in the total acid dianhydride) is gradually added, and
As a result of measurement at 3 ° C., a polyamic acid solution of about 2500 poise was obtained.

【0075】このポリアミド酸溶液を実施例1と同様の
方法で加工し、ポリイミドフィルムとした。実施例1と
同様に、特性試験を行った。その結果を表1に示す。
This polyamic acid solution was processed in the same manner as in Example 1 to obtain a polyimide film. A characteristic test was performed in the same manner as in Example 1. Table 1 shows the results.

【0076】(実施例6)ODAとPDAの添加順序を
逆にした以外はすべて実施例5と同様の方法で重合を行
い、同様の方法でポリイミドフィルムを作製し、特性試
験を行った。その結果を表1に示す。
(Example 6) Polymerization was carried out in the same manner as in Example 5 except that the order of addition of ODA and PDA was reversed, and a polyimide film was produced in the same manner and subjected to a property test. Table 1 shows the results.

【0077】[0077]

【表1】 [Table 1]

【0078】(実施例7)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド780g中に、29.7g(総ジ
アミン中の約62.5mol%)のPDAを溶解し、1
7.7g(総酸二無水物中の約12.5mol%)のB
TDAを溶解し、これにTMHQ62.5g(総酸二無
水物中の約31mol%)を徐々に加えてよく攪拌反応
させ、33、0g(総ジアミン中の約37.5mol
%)のODAを溶解し、続いてODPA77.1g(総
酸二無水物中の約56.5mol%)を徐々に加え、2
3℃での測定で約2500ポイズのポリアミド酸溶液を
得た。このポリアミド酸溶液を実施例1と同様の方法で
加工し、ポリイミドフィルムとした。実施例1と同様
に、特性試験を行った。その結果を表1に示す。
Example 7 29.7 g (approximately 62.5 mol% of the total diamine) of PDA was dissolved in 780 g of dimethylacetamide in an ice bath in a nitrogen atmosphere.
7.7 g (about 12.5 mol% in total dianhydride) of B
TDA was dissolved, 62.5 g of TMHQ (about 31 mol% in the total acid dianhydride) was gradually added thereto, and the mixture was thoroughly stirred and reacted, and 33.0 g (about 37.5 mol in the total diamine).
%) Of ODA, followed by slow addition of 77.1 g of ODPA (about 56.5 mol% in total acid dianhydride).
As a result of measurement at 3 ° C., a polyamic acid solution of about 2500 poise was obtained. This polyamic acid solution was processed in the same manner as in Example 1 to obtain a polyimide film. A characteristic test was performed in the same manner as in Example 1. Table 1 shows the results.

【0079】(比較例1〜4)実施例と同様の方法で、
ジメチルアセトアミド中にジアミン成分を全て溶解した
後酸二無水物を加える方法で、溶液中の総固形分濃度2
0%、および粘度2500ポイズになるように重合反応
をおこなった。各成分とそのモル%は表2に示してい
る。実施例と同様にこれらのポリアミド酸溶液を用いて
ポリイミドフィルムを得て、その特性を測定した結果を
表2に示す。
(Comparative Examples 1 to 4) In the same manner as in Examples,
A method in which all diamine components are dissolved in dimethylacetamide, and then an acid dianhydride is added.
The polymerization reaction was carried out so as to obtain 0% and a viscosity of 2500 poise. Table 2 shows the components and their mol%. A polyimide film was obtained using these polyamic acid solutions in the same manner as in the examples, and the properties were measured. Table 2 shows the results.

【0080】[0080]

【表2】 [Table 2]

【0081】[0081]

【発明の効果】本発明のポリイミドフィルムはこれまで
のベース用ポリイミドフィルムに無い優れた吸湿特性、
特に低い吸湿膨張を有し、なおかつ高弾性、高貯蔵弾性
率でありながら銅の線膨張係数を下回ることなく、従っ
て銅張の基板やTAB用テープとして用いた場合に極め
て優れた反り特性を発現できる。本発明のポリイミドフ
ィルムは、柔軟性・耐熱性にも優れ、ベースポリイミド
フィルムとして必要な特性を損なわないため、益々細密
化する電子機器に対応することができる。
As described above, the polyimide film of the present invention has excellent moisture absorbing properties which are not found in the conventional base polyimide film,
In particular, it has low hygroscopic expansion, high elasticity and high storage elasticity, but does not fall below the coefficient of linear expansion of copper. Therefore, when used as a copper-clad substrate or TAB tape, it exhibits extremely excellent warpage characteristics. it can. The polyimide film of the present invention is excellent in flexibility and heat resistance and does not impair the characteristics required as a base polyimide film, so that it can be used for electronic devices that are increasingly miniaturized.

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Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 p−フェニレンビス(トリメリット酸モ
ノエステル無水物)と、オキシジフタル酸二無水物と、
p−フェニレンジアミンと、4,4' −ジアミノジフェ
ニルエーテルと、および(ピロメリット酸二無水物、
3,3’,4,4’−ベンゾフェノンテトラカルボン酸
二無水物、3,3’,4,4’−ビフェニルテトラカル
ボン酸二無水物からなる群から選択される1つ)で構成
される5種のモノマーを有機溶剤中で反応させて得られ
るポリアミド酸から製造されることを特徴とするポリイ
ミドフィルム。
1. p-phenylenebis (trimellitic acid monoester anhydride) and oxydiphthalic dianhydride;
p-phenylenediamine, 4,4′-diaminodiphenyl ether, and (pyromellitic dianhydride,
3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride and one selected from the group consisting of 3,3', 4,4'-biphenyltetracarboxylic dianhydride) A polyimide film produced from a polyamic acid obtained by reacting various kinds of monomers in an organic solvent.
【請求項2】 前記ポリアミド酸から製造されるポリイ
ミドフィルムにおいて、前記モノマーの添加量が、p−
フェニレンビス(トリメリット酸モノエステル無水物)
が、全酸二無水物に対して1〜90モル%であり、オキ
シジフタル酸二無水物が、全酸二無水物に対して8〜8
5モル%であり、(ピロメリット酸二無水物、3,
3’,4,4’−ベンゾフェノンテトラカルボン酸二無
水物、3,3’,4,4’−ビフェニルテトラカルボン
酸二無水物からなる群から選択される1つ)が、全酸二
無水物に対して2〜14モル%であり、p−フェニレン
ジアミンが、全ジアミンに対して25〜90モル%であ
り、4,4' −ジアミノジフェニルエーテルが、全ジア
ミンに対して10〜75モル%であることを特徴とする
請求項1に記載のポリイミドフィルム。
2. In a polyimide film produced from the polyamic acid, the amount of the monomer added is p-
Phenylene bis (trimellitic acid monoester anhydride)
Is 1 to 90 mol% based on the total acid dianhydride, and oxydiphthalic dianhydride is 8 to 8 mol% based on the total acid dianhydride.
5 mol%, (pyromellitic dianhydride, 3,
3 ′, 4,4′-benzophenonetetracarboxylic dianhydride and one selected from the group consisting of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride) are all acid dianhydrides 2 to 14 mol%, based on the total diamine, 25 to 90 mol% of p-phenylenediamine, and 10 to 75 mol% of 4,4′-diaminodiphenylether relative to the total diamine. The polyimide film according to claim 1, wherein:
【請求項3】 請求項1または請求項2に記載されるポ
リイミドフィルムであって、100℃以上200℃以下
の平均線膨張係数が15〜30ppm、引張弾性率が
4.5〜8.5GPa、破断時伸び率が20%以上、吸
湿膨張係数が10ppm以下、Tgが200℃以上、3
00℃以上400℃以下の温度における貯蔵弾性率が2
00MPa以上であることを特徴とするポリイミドフィ
ルム。
3. The polyimide film according to claim 1, which has an average linear expansion coefficient of 100 to 200 ° C. of 15 to 30 ppm, a tensile modulus of 4.5 to 8.5 GPa, Elongation at break of 20% or more, coefficient of hygroscopic expansion of 10 ppm or less, Tg of 200 ° C. or more, 3
The storage elastic modulus at a temperature between 00 ° C and 400 ° C is 2
A polyimide film having a pressure of at least 00 MPa.
【請求項4】 4,4' −ジアミノジフェニルエーテル
を有機溶剤中に溶解させ、(ピロメリット酸二無水物、
3,3’,4,4’−ベンゾフェノンテトラカルボン酸
二無水物、3,3’,4,4’−ビフェニルテトラカル
ボン酸二無水物からなる群から選択される1つ)を加
え、続いてp−フェニレンジアミンを加え、該有機溶剤
溶液にp−フェニレンビス(トリメリット酸モノエステ
ル無水物)を加え、続いてオキシジフタル酸二無水物を
加えて得られたポリアミド酸重合体を、酸無水物と第三
級アミンとを用いて脱水閉環し、ポリイミドフィルムを
得ることを特徴とするポリイミドフィルムの製造方法。
4. A method of dissolving 4,4′-diaminodiphenyl ether in an organic solvent, wherein (pyromellitic dianhydride,
3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride, one selected from the group consisting of 3,3', 4,4'-biphenyltetracarboxylic dianhydride), followed by p-Phenylenediamine was added, p-phenylenebis (trimellitic acid monoester anhydride) was added to the organic solvent solution, and then oxydiphthalic dianhydride was added to obtain a polyamic acid polymer. And a tertiary amine to obtain a polyimide film by dehydration and ring closure.
【請求項5】p−フェニレンジアミンを有機溶剤中に溶
解させ、(ピロメリット酸二無水物、3,3’,4,
4’−ベンゾフェノンテトラカルボン酸二無水物、3,
3’,4,4’−ビフェニルテトラカルボン酸二無水物
からなる群から選択される1つ)を加え、続いて、p−
フェニレンビス(トリメリット酸モノエステル無水物)
を加え、該有機溶剤溶液に4,4' −ジアミノジフェニ
ルエーテルを加え、続いてオキシジフタル酸二無水物を
加えて得られたポリアミド酸重合体を、酸無水物と第三
級アミンとを用いて脱水閉環し、ポリイミドフィルムを
得ることを特徴とするポリイミドフィルムの製造方法。
5. A method of dissolving p-phenylenediamine in an organic solvent, wherein (pyromellitic dianhydride, 3,3 ′, 4,
4'-benzophenonetetracarboxylic dianhydride, 3,
One selected from the group consisting of 3 ′, 4,4′-biphenyltetracarboxylic dianhydride), followed by p-
Phenylene bis (trimellitic acid monoester anhydride)
, And 4,4′-diaminodiphenyl ether are added to the organic solvent solution, and then oxydiphthalic dianhydride is added. The resulting polyamic acid polymer is dehydrated using an acid anhydride and a tertiary amine. A method for producing a polyimide film, comprising closing a ring to obtain a polyimide film.
JP34138298A 1998-12-01 1998-12-01 Polyimide film and method for producing the same Expired - Lifetime JP3676099B2 (en)

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