JP2000056265A - Optical isolator and its production - Google Patents
Optical isolator and its productionInfo
- Publication number
- JP2000056265A JP2000056265A JP10224122A JP22412298A JP2000056265A JP 2000056265 A JP2000056265 A JP 2000056265A JP 10224122 A JP10224122 A JP 10224122A JP 22412298 A JP22412298 A JP 22412298A JP 2000056265 A JP2000056265 A JP 2000056265A
- Authority
- JP
- Japan
- Prior art keywords
- polarizer
- analyzer
- faraday rotator
- optical isolator
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/09—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect
- G02F1/093—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect used as non-reciprocal devices, e.g. optical isolators, circulators
Landscapes
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光回路部品として
使用され、順方向には光を透過するが逆方向には透過し
ない光アイソレータおよびその製造方法に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical isolator which is used as an optical circuit component and transmits light in a forward direction but does not transmit light in a reverse direction, and a method of manufacturing the same.
【０００２】[0002]
【従来の技術】光通信システムで、半導体レーザーから
発した光はレンズを介して光ファイバ端面に投影され伝
送されるが、一部の光はレンズや光ファイバの端面で表
面反射して半導体レーザーまで戻り、ノイズとなってし
まう。この戻り光を除去するために光アイソレータが使
用される。光アイソレータは、偏光子、ファラデー回転
子および検光子により構成されている。2. Description of the Related Art In an optical communication system, light emitted from a semiconductor laser is projected onto an end face of an optical fiber via a lens and transmitted. Back up to noise. An optical isolator is used to remove this return light. The optical isolator includes a polarizer, a Faraday rotator, and an analyzer.
【０００３】例えば特開平６−７５１８９号公報には、
光学接着剤や樹脂を用いて偏光子、ファラデー回転子、
検光子を接着し一体化する光アイソレータが開示されて
いる。接着剤等で接着した光アイソレータは、耐湿性・
耐熱性が悪く、アウトガスを発生するため、光アイソレ
ータの光軸がずれたり、他の光学部品に悪影響を及ぼす
という問題があった。特開平８−１４６３５１号公報に
は、透光性の低融点ガラスで部材を接着した光アイソレ
ータが開示されている。低融点ガラスを用いた光アイソ
レータは、偏光子または検光子とファラデー回転子の屈
折率の相違による挿入損失を抑制するために施している
無反射コートが劣化し、また偏光子、検光子が偏光ガラ
スのときは、偏光ガラスが劣化するという弊害があっ
た。For example, JP-A-6-75189 discloses that
Polarizers, Faraday rotators, and optical adhesives and resins
An optical isolator in which an analyzer is bonded and integrated is disclosed. The optical isolator bonded with an adhesive etc.
Since heat resistance is poor and outgas is generated, there has been a problem that the optical axis of the optical isolator is shifted or adversely affects other optical components. Japanese Patent Application Laid-Open No. 8-146351 discloses an optical isolator in which members are bonded with a light-transmitting low-melting glass. In optical isolators using low-melting glass, the antireflection coating applied to suppress insertion loss due to the difference in the refractive index between the polarizer or analyzer and the Faraday rotator deteriorates, and the polarizer and analyzer become polarized. In the case of glass, there was a problem that the polarizing glass deteriorated.
【０００４】[0004]
【発明が解決しようとする課題】本発明は前記の課題を
解決するためなされたもので、光学接着剤、樹脂および
低融点ガラスを使用しなくても、強固な接合強度を有
し、良好な挿入損失、消光比を有しかつ光学面の劣化の
ない光学特性の優れた光アイソレータおよびその製造方
法を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and has a strong bonding strength without using an optical adhesive, a resin and a low melting point glass. It is an object of the present invention to provide an optical isolator having an insertion loss, an extinction ratio, and excellent optical characteristics without deterioration of an optical surface, and a method of manufacturing the same.
【０００５】[0005]
【課題を解決するための手段】前記の目的を達成するた
めになされた本発明の光アイソレータは、実施例に対応
する図１および図２に示すように、金属酸化物の薄膜２
１・２２・２３をコートしてあるファラデー回転子２の
両表面に、各々偏光子１および検光子３が接合され、フ
ァラデー回転子２の表面の薄膜２３を構成する金属元素
と、偏光子１および検光子３に含まれる金属元素とが、
相互作用して一体化されている。The optical isolator of the present invention, which has been made to achieve the above object, has a thin film 2 of metal oxide as shown in FIGS.
A polarizer 1 and an analyzer 3 are respectively joined to both surfaces of the Faraday rotator 2 coated with 1, 22, and 23, and a metal element constituting the thin film 23 on the surface of the Faraday rotator 2 and a polarizer 1 And the metal element contained in the analyzer 3
They interact and are integrated.
【０００６】光アイソレータは、ファラデー回転子２の
薄膜２３を構成する金属元素と、偏光子１および検光子
２に含まれる金属元素とが各々有している水酸基が、水
クラスターを介在して相互作用している。In the optical isolator, the hydroxyl groups of the metal elements forming the thin film 23 of the Faraday rotator 2 and the metal elements contained in the polarizer 1 and the analyzer 2 are mutually interposed via water clusters. Working.
【０００７】相互作用は、ファラデー回転子２の薄膜２
３の材質がＳｉＯ2、偏光子１の材質が成分としてＳｉＯ
2を含む偏光ガラスであると、以下のように推測され
る。これらの材質のＳｉに水が吸着されるとＳｉ−ＯＨ
基が生成する。図３に示すように、ファラデー回転子２
の薄膜２３のＳｉ−ＯＨ基が水クラスター４を介して偏
光子１のＳｉ−ＯＨ基に水素結合し、ファラデー回転子
２と偏光子１とは接合する。または図４に示すように、
ファラデー回転子２の薄膜２３のＳｉ−ＯＨ基と偏光子
１のＳｉ−ＯＨ基とが直接水素結合する。検光子３の偏
光ガラスも同様の水素結合を生ずる。[0007] The interaction is caused by the thin film 2 of the Faraday rotator 2.
3 is made of SiO 2 , and the polarizer 1 is made of SiO 2 as a component.
It is presumed that the polarizing glass contains 2 as follows. When water is adsorbed on Si of these materials, Si-OH
A group is formed. As shown in FIG. 3, the Faraday rotator 2
The Si—OH group of the thin film 23 is hydrogen-bonded to the Si—OH group of the polarizer 1 via the water cluster 4, and the Faraday rotator 2 and the polarizer 1 are joined. Or, as shown in FIG.
The Si—OH groups of the thin film 23 of the Faraday rotator 2 and the Si—OH groups of the polarizer 1 are directly hydrogen-bonded. The polarizing glass of the analyzer 3 also generates a similar hydrogen bond.
【０００８】偏光子１は偏光ガラスまたはルチルＹＶＯ
4単結晶からなる。その表面には、ＴｉＯ2、ＳｉＯ2の金
属酸化物から選ばれる単層または多層の薄膜１２、１３
からなる無反射コートを電子ビーム蒸着法により施して
もよい。検光子３も偏光子１と同様である。The polarizer 1 is made of polarizing glass or rutile YVO.
Consists of 4 single crystals. On its surface, single-layer or multilayer thin films 12, 13 selected from metal oxides of TiO 2 and SiO 2
May be applied by an electron beam evaporation method. The analyzer 3 is similar to the polarizer 1.
【０００９】ファラデー回転子２は、例えばガーネット
単結晶の磁気光学材料からなる。単結晶の両面の薄膜２
１・２２・２３は金属酸化物の単層または多層構造から
なる。この金属酸化物はＡｌ2Ｏ3、ＴｉＯ2、ＳｉＯ2から
選ばれることが好ましい。薄膜２１・２２・２３は、こ
れらの金属酸化物を、透過光が無反射となる厚さに、電
子ビーム法で蒸着されている。The Faraday rotator 2 is made of, for example, a garnet single crystal magneto-optical material. Thin film on both sides of single crystal 2
1, 22, and 23 have a single-layer or multilayer structure of a metal oxide. This metal oxide is preferably selected from Al 2 O 3 , TiO 2 , and SiO 2 . The thin films 21, 22, and 23 are formed by evaporating these metal oxides to a thickness at which transmitted light is not reflected by an electron beam method.
【００１０】本発明の光アイソレータの製造方法は、フ
ァラデー回転子２の両表面に金属酸化物の薄膜をコート
し、その両表面に各々偏光子１および検光子３を当接さ
せ、熱処理することにより薄膜２３を構成する金属元素
と偏光子１および検光子３に含まれる金属元素とを相互
作用させて一体化することを特徴とする。In the method of manufacturing an optical isolator according to the present invention, a metal oxide thin film is coated on both surfaces of a Faraday rotator 2, and a polarizer 1 and an analyzer 3 are respectively brought into contact with both surfaces and heat treatment is performed. Thus, the metal element constituting the thin film 23 and the metal element included in the polarizer 1 and the analyzer 3 are made to interact with each other to be integrated.
【００１１】この熱処理を行うことによって、ファラデ
ー回転子２の表面の薄膜２３を構成する金属元素と、偏
光子１および検光子３に含まれる金属元素とが相互作用
して一体化された光アイソレータが得られる。By performing this heat treatment, the metal element forming the thin film 23 on the surface of the Faraday rotator 2 and the metal element contained in the polarizer 1 and the analyzer 3 interact and are integrated into an optical isolator. Is obtained.
【００１２】この製造方法でファラデー回転子２に偏光
子１および検光子３を当接するにあたり、酸または水で
洗浄処理する。好ましくは塩酸−過酸化水素−純水の溶
液、硫酸−過酸化水素−純水の溶液、アンモニア−過酸
化水素−純水の溶液にて洗浄処理する。この洗浄処理に
よって、ファラデー回転子２の薄膜２３、偏光子１、検
光子３に含まれる金属元素に均一にＯＨ基がつくため、
相互作用し易くなる。When the polarizer 1 and the analyzer 3 are brought into contact with the Faraday rotator 2 in this manufacturing method, they are washed with an acid or water. Preferably, the cleaning treatment is performed with a solution of hydrochloric acid-hydrogen peroxide-pure water, a solution of sulfuric acid-hydrogen peroxide-pure water, or a solution of ammonia-hydrogen peroxide-pure water. As a result of this cleaning treatment, the metal element contained in the thin film 23 of the Faraday rotator 2, the polarizer 1, and the analyzer 3 is uniformly formed with an OH group.
It becomes easier to interact.
【００１３】ファラデー回転子２に偏光子１および検光
子３を当接後、熱処理するときの条件は２００〜３００
℃、特に好ましくは、２５０℃、２時間である。この条
件で得た光アイソレータは、接合強度１００ｇ／ｍｍ２
以上である。この温度より高温で熱処理すると接合面強
度は大きくなる。この理由は以下のように推察される。
偏光子１がＳｉＯ２を含む偏光ガラス、ファラデー回転
子２の薄膜２３がＳｉＯ２膜の場合、熱処理を２００℃
以下で行ったとき、Ｓｉ間の相互作用は図３に示すよう
な水素結合が主であり、偏光子１とファラデー回転子２
の薄膜２３との表面間の距離は０．７ｎｍである。それ
に対し、熱処理条件が７００℃以下の高温になるにつれ
図４に示すような水素結合が主となり、表面間の距離は
０．３５ｎｍとなる。After the polarizer 1 and the analyzer 3 are brought into contact with the Faraday rotator 2, the conditions for heat treatment are 200 to 300.
° C, particularly preferably 250 ° C for 2 hours. The optical isolator obtained under these conditions has a bonding strength of 100 g / mm 2
That is all. Heat treatment at a temperature higher than this temperature increases the bonding surface strength. The reason is presumed as follows.
When the polarizer 1 is a polarizing glass containing SiO 2 and the thin film 23 of the Faraday rotator 2 is a SiO 2 film, the heat treatment is performed at 200 ° C.
When performed below, the interaction between Si is mainly hydrogen bonding as shown in FIG. 3, and the polarizer 1 and the Faraday rotator 2
The distance between the surface and the thin film 23 is 0.7 nm. On the other hand, as the heat treatment condition becomes higher than 700 ° C., hydrogen bonding as shown in FIG. 4 becomes dominant, and the distance between the surfaces becomes 0.35 nm.
【００１４】このような表面間の距離より大きな表面の
マイクロラフネス、すなわち鏡面の全面にみられる数μ
ｍの厚さむらや数十μｍのそりは、表面が弾性変形する
ため、接合においては全く支障がない。The micro-roughness of the surface larger than the distance between the surfaces, that is, several μs observed over the entire mirror surface
An uneven thickness of m or a warpage of several tens of μm has no problem in joining because the surface is elastically deformed.
【００１５】本発明の熱処理条件で得た光アイソレータ
は挿入損失０．３ｄＢ以下、消光比３５ｄＢ以上の良好
な光学特性を有する。しかし、この熱処理条件以上では
高温になるにつれ材質ごとの熱膨張係数による歪みが増
大し、光アイソレータの消光比が小さくなってしまう。The optical isolator obtained under the heat treatment conditions of the present invention has good optical characteristics with an insertion loss of 0.3 dB or less and an extinction ratio of 35 dB or more. However, above the heat treatment conditions, as the temperature increases, the distortion due to the thermal expansion coefficient of each material increases, and the extinction ratio of the optical isolator decreases.
【００１６】[0016]
【発明の実施の形態】以下、本発明の実施例を図面によ
り詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【００１７】図１に示すように、本発明の光アイソレー
タは、偏光子１、ファラデー回転子２、検光子３が接合
されて一体化している。ファラデー回転子２は、ガーネ
ット単結晶からなる。その両面に、順にＡｌ2Ｏ3膜２
１、ＴｉＯ2膜２２、ＳｉＯ2膜２３が蒸着されている。
偏光子は、偏光ガラスからなり、ガラス成分にＳｉＯ2
を含む。偏光子１の片表面にはＴｉＯ2膜１２、ＳｉＯ2
膜１３が蒸着され、無反射コーティングとなっている。
検光子３も偏光子１と同様な構成である。As shown in FIG. 1, in the optical isolator of the present invention, a polarizer 1, a Faraday rotator 2, and an analyzer 3 are joined and integrated. The Faraday rotator 2 is made of a garnet single crystal. Al 2 O 3 film 2 on both sides in order
1. A TiO 2 film 22 and a SiO 2 film 23 are deposited.
The polarizer is made of a polarizing glass, and SiO 2 is used as a glass component.
including. On one surface of the polarizer 1, a TiO 2 film 12, SiO 2
A film 13 is deposited to form a non-reflective coating.
The analyzer 3 has the same configuration as the polarizer 1.
【００１８】このような光アイソレータは以下のように
製造される。まず、ファラデー回転子２と、偏光子１お
よび検光子３を塩酸−過酸化水素−純水の溶液、硫酸−
過酸化水素−純水の溶液、アンモニア−過酸化水素−純
水の溶液にて順に洗浄処理する。ファラデー回転子２の
一方の薄膜２３に偏光子１の薄膜１２、１３が形成され
ていない面を当接させ、ファラデー回転子２の反対側の
面に検光子３の薄膜３２、３３が形成されていない面を
当接させ、２５０℃、２時間の熱処理する。このような
処理によりファラデー回転子２の表面の薄膜２３を構成
するＳｉと、偏光子１および検光子３の材質に含まれる
Ｓｉとが相互作用することにより一体化する。Such an optical isolator is manufactured as follows. First, a Faraday rotator 2, a polarizer 1 and an analyzer 3 are combined with a solution of hydrochloric acid-hydrogen peroxide-pure water, sulfuric acid-
Washing treatment is performed sequentially with a solution of hydrogen peroxide-pure water and a solution of ammonia-hydrogen peroxide-pure water. The surface of the Faraday rotator 2 on which the thin films 12 and 13 of the polarizer 1 are not formed is brought into contact with one of the thin films 23, and the thin films 32 and 33 of the analyzer 3 are formed on the opposite surface of the Faraday rotator 2. The surfaces not contacted are heat-treated at 250 ° C. for 2 hours. By such processing, Si constituting the thin film 23 on the surface of the Faraday rotator 2 and Si contained in the materials of the polarizer 1 and the analyzer 3 interact to be integrated.
【００１９】以下に、本発明を適用する実施例と本発明
を適用外の比較例を示し、詳細に説明する。Hereinafter, examples to which the present invention is applied and comparative examples in which the present invention is not applied will be shown and described in detail.
【００２０】実施例１ ガーネット単結晶の表面を鏡面研磨加工で仕上げ、形状
１５ｍｍ×１５ｍｍ、厚さ０．５ｍｍに切断した。その
両面に電子ビーム蒸着で順に厚さ８０ｎｍのＡｌ2Ｏ
3膜、厚さ５０ｎｍのＴｉＯ2膜、厚さ７０ｎｍのＳｉＯ
2膜の３層を形成して、ファラデー回転子とした。Example 1 The surface of a garnet single crystal was finished by mirror polishing, and cut into a shape of 15 mm × 15 mm and a thickness of 0.5 mm. 80 nm thick Al 2 O in order on both surfaces by electron beam evaporation
3 film, 50 nm thick TiO 2 film, 70 nm thick SiO
A Faraday rotator was formed by forming three layers of two films.
【００２１】偏光ガラスの表面を鏡面研磨加工で仕上
げ、形状１５ｍｍ×１５ｍｍ、厚さ０．５ｍｍに切断し
た。その片面に電子ビーム蒸着で順に厚さ５０ｎｍのＴ
ｉＯ2膜、厚さ２６５ｎｍのＳｉＯ2膜の２層を形成し
て、偏光子および検光子とした。The surface of the polarizing glass was finished by mirror polishing and cut into a shape of 15 mm × 15 mm and a thickness of 0.5 mm. On one side, a 50 nm-thick T
Two layers of an iO 2 film and a 265 nm thick SiO 2 film were formed, and used as a polarizer and an analyzer.
【００２２】偏光子、ファラデー回転子、検光子を塩
酸：過酸化水素：純水が１：１：５の溶液、硫酸：過酸
化水素：純水が１：１：５の溶液、アンモニア：過酸化
水素：純水が１：１：５の溶液にて順番に５分間ずつ洗
浄処理した。A polarizer, a Faraday rotator, and an analyzer were prepared by using a 1: 1: 5 solution of hydrochloric acid: hydrogen peroxide: pure water, a 1: 1: 5 solution of sulfuric acid: hydrogen peroxide: pure water, and ammonia: peroxide. Washing treatment was carried out sequentially for 5 minutes with a solution of hydrogen oxide: pure water of 1: 1: 5.
【００２３】ファラデー回転子の両表面に、偏光子およ
び検光子の無反射コートしていない面を当接させ、室温
で消光比が最大となるように光軸を調整した。このもの
を２５０℃で２時間熱処理を行った後、放冷して一体化
した。これを切断して形状２ｍｍ×２ｍｍの光アイソレ
ータを試作した。Both surfaces of the Faraday rotator were brought into contact with the non-reflection coated surfaces of the polarizer and the analyzer, and the optical axis was adjusted so that the extinction ratio was maximized at room temperature. This was heat-treated at 250 ° C. for 2 hours, and then allowed to cool to be integrated. This was cut to produce an optical isolator having a shape of 2 mm × 2 mm.
【００２４】試作した光アイソレータの接合強度は１３
６ｇ／ｍｍ２であった。挿入損失は０．１９ｄＢ、消光
比は３７．７ｄＢであった。挿入損失と消光比は、波長
１．３１μｍで測定した。さらに接合界面と垂直の方向
から光学顕微鏡で４００倍にて接合界面の状態を観察し
たところ全ての試料で面内は全て一様に観察された。The bonding strength of the prototype optical isolator is 13
It was 6 g / mm 2 . The insertion loss was 0.19 dB and the extinction ratio was 37.7 dB. The insertion loss and the extinction ratio were measured at a wavelength of 1.31 μm. Furthermore, when the state of the bonding interface was observed at 400 times with an optical microscope from the direction perpendicular to the bonding interface, all of the samples were uniformly observed in the plane.
【００２５】実施例２ 偏光子および検光子にルチル単結晶を用いたこと以外
は、実施例１と同様にして光アイソレータを試作した。
接合強度は１２１ｇ／ｍｍ２であった。挿入損失は０．
２５ｄＢ、消光比は３５．９ｄＢであった。Example 2 An optical isolator was prototyped in the same manner as in Example 1 except that a rutile single crystal was used for the polarizer and the analyzer.
The bonding strength was 121 g / mm 2 . The insertion loss is 0.
The extinction ratio was 35.9 dB and 25 dB.
【００２６】比較例１ 洗浄処理はアセトン、純水で５分間行い、熱処理条件は
２００、３００、４００℃各２時間の３条件であること
を変えた以外は実施例１と同様にして、３種類の光アイ
ソレータを試作した。３種類はいずれも接合強度は２８
〜３３ｇ／ｍｍ ２しかなく十分な接合強度を得ることが
できなかった。挿入損失は０．１８〜０．１９ｄＢ、消
光比は４２．２〜４３．３ｄＢであった。Comparative Example 1 The cleaning treatment was performed with acetone and pure water for 5 minutes.
200, 300, and 400 ° C for 2 hours each
3 in the same manner as in Example 1 except that
A prototype of a solator was manufactured. All three types have a joint strength of 28
~ 33g / mm 2To obtain sufficient bonding strength
could not. The insertion loss is 0.18 to 0.19 dB,
The light ratio was 42.2 to 43.3 dB.
【００２７】比較例２ 熱処理温度が１００℃であること以外は実施例１と同様
にして、光アイソレータを試作した。接合強度は２８ｇ
／ｍｍ２しかなく十分な結合強度は得られなかった。Comparative Example 2 An optical isolator was prototyped in the same manner as in Example 1 except that the heat treatment temperature was 100 ° C. 28g bonding strength
/ Mm 2 and sufficient bonding strength could not be obtained.
【００２８】比較例３ 実施例１で準備した洗浄処理済みの偏光子、ファラデー
回転子、検光子を透光性低融点ガラスで接着した。低融
点ガラスは、波長１．３１μｍでの屈折率が１．５１で
ある。３５０℃、２時間の熱処理を行い接着固定し、光
アイソレータを試作した。接合強度は６２０ｇ／ｍｍ２
と強固な接合強度を有していた。しかし挿入損失１．８
ｄＢ、消光比３０．６ｄＢであった。光学顕微鏡４００
倍にて観察したところ接合界面の荒れが観察された。Comparative Example 3 The cleaned polarizer, Faraday rotator, and analyzer prepared in Example 1 were bonded with a light-transmitting low-melting glass. The low-melting glass has a refractive index of 1.51 at a wavelength of 1.31 μm. A heat treatment was performed at 350 ° C. for 2 hours to fix and bond the optical isolator. Bonding strength is 620 g / mm 2
And strong bonding strength. However, the insertion loss is 1.8.
The extinction ratio was 30.6 dB. Optical microscope 400
When observed at a magnification of 2, the roughness of the bonding interface was observed.
【００２９】この結果、本発明の光アイソレータは、本
発明を適用外の光アイソレータに比べ、接合強度、挿入
損失および消光比が良好で、光学面の劣化がない。As a result, the optical isolator of the present invention has better bonding strength, insertion loss, and extinction ratio than optical isolators to which the present invention is not applied, and does not deteriorate the optical surface.
【００３０】[0030]
【発明の効果】以上、詳細に説明したように、本発明の
光アイソレータは、強固な接合強度を有し、光学面の劣
化が少なく、良好な挿入損失、消光比を有し光学特性が
優れている。本発明の製造方法によれば、ホルダを必要
とせず、光学接着剤、樹脂および低融点ガラスを使用し
ないため、工程数が少なく、低コストで信頼性の高い光
アイソレータを提供することが可能になる。As described in detail above, the optical isolator of the present invention has a strong bonding strength, little deterioration of the optical surface, a good insertion loss, an excellent extinction ratio, and excellent optical characteristics. ing. ADVANTAGE OF THE INVENTION According to the manufacturing method of this invention, since a holder is not required and an optical adhesive, a resin, and a low-melting glass are not used, it is possible to provide a highly reliable optical isolator at a low cost with a small number of steps. Become.
【図１】本発明を適用する本発明の実施例の斜視図であ
る。FIG. 1 is a perspective view of an embodiment of the present invention to which the present invention is applied.
【図２】本発明を適用する本発明の実施例の部分拡大図
である。FIG. 2 is a partially enlarged view of an embodiment of the present invention to which the present invention is applied.
【図３】水素結合の結合状態を説明する図である。FIG. 3 is a diagram illustrating a bonding state of a hydrogen bond.
【図４】同じく水素結合の結合状態を説明する図であ
る。FIG. 4 is a diagram illustrating a bonding state of a hydrogen bond.
１は偏光子、２はファラデー回転子、３は検光子、４は
水クラスター、１２、２２、３２はＴｉＯ2膜、１３、
２３、３３はＳｉＯ2膜、２１はＡｌ2Ｏ3膜である。1 is a polarizer, 2 is a Faraday rotator, 3 is an analyzer, 4 is a water cluster, 12, 22, and 32 are TiO 2 films, 13,
23 and 33 are SiO 2 films and 21 is an Al 2 O 3 film.
Claims (7)
ァラデー回転子の両表面に、各々偏光子および検光子が
接合され、該ファラデー回転子の表面の該薄膜を構成す
る金属元素と、該偏光子および該検光子に含まれる金属
元素とが相互作用して一体化されていることを特徴とす
る光アイソレータ。A polarizer and an analyzer are bonded to both surfaces of a Faraday rotator coated with a thin film of a metal oxide, and a metal element constituting the thin film on the surface of the Faraday rotator; An optical isolator, wherein a polarizer and a metal element contained in the analyzer interact and are integrated.
る金属元素と、該偏光子および該検光子に含まれる金属
元素とが各々有している水酸基が、水クラスターを介在
して相互作用していることを特徴とする請求項１に記載
の光アイソレータ。2. A metal element constituting the thin film of the Faraday rotator and a hydroxyl group of each of the metal elements contained in the polarizer and the analyzer interact with each other via a water cluster. The optical isolator according to claim 1, wherein
またはルチル単結晶からなり、該ファラデー回転子の該
薄膜が金属酸化物の単層または多層構造からなることを
特徴とする請求項１に記載の光アイソレータ。3. The method according to claim 1, wherein the polarizer and the analyzer are made of a polarizing glass or a rutile single crystal, and the thin film of the Faraday rotator is made of a metal oxide single layer or a multilayer structure. An optical isolator as described.
ＳｉＯ2から選ばれることを特徴とする請求項３に記載
の光アイソレータ。4. The method according to claim 1, wherein the metal oxide is Al 2 O 3 , TiO 2 ,
The optical isolator of claim 3, characterized in that it is selected of SiO 2.
物の薄膜をコートし、その両表面に各々偏光子および検
光子を当接させ、熱処理することにより該薄膜を構成す
る金属元素と該偏光子および該検光子に含まれる金属元
素とを相互作用させて一体化することを特徴とする光ア
イソレータの製造方法。5. A metal oxide thin film is coated on both surfaces of a Faraday rotator, a polarizer and an analyzer are brought into contact with both surfaces, and heat treatment is performed. A method for producing an optical isolator, comprising: integrating a probe and a metal element contained in the analyzer by interacting with each other.
該検光子を当接するにあたり、酸または水で処理するこ
とを特徴とする請求項５に記載の光アイソレータの製造
方法。6. The method for manufacturing an optical isolator according to claim 5, wherein the polarizer and the analyzer are brought into contact with the Faraday rotator with an acid or water.
ことを特徴とする請求項５に記載の光アイソレータの製
造方法。7. The method according to claim 5, wherein the heat treatment is performed at 200 to 300 ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22412298A JP3862867B2 (en) | 1998-08-07 | 1998-08-07 | Optical isolator and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22412298A JP3862867B2 (en) | 1998-08-07 | 1998-08-07 | Optical isolator and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000056265A true JP2000056265A (en) | 2000-02-25 |
| JP3862867B2 JP3862867B2 (en) | 2006-12-27 |
Family
ID=16808895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22412298A Expired - Fee Related JP3862867B2 (en) | 1998-08-07 | 1998-08-07 | Optical isolator and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3862867B2 (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003084232A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003084234A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003084255A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and method of manufacturing the same |
| JP2003084233A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical isolator and its manufacturing method |
| JP2003086417A (en) * | 2001-09-12 | 2003-03-20 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method therefor |
| WO2003093896A1 (en) | 2002-05-02 | 2003-11-13 | Corning Incorporated | Optical isolators and methods of manufacturing using direct bonding |
| EP1443357A1 (en) * | 2003-01-29 | 2004-08-04 | Kyocera Corporation | An optical isolator element, a method for producing such an element, and an optical isolator using such an element |
| US6791748B2 (en) | 2002-05-02 | 2004-09-14 | Corning Incorporated | Optical isolators and methods of manufacture |
| US6806990B2 (en) | 2001-11-22 | 2004-10-19 | Shin-Etsu Chemical Co., Ltd. | Optical device and method for producing optical device |
| US6814833B2 (en) | 2001-10-26 | 2004-11-09 | Corning Incorporated | Direct bonding of articles containing silicon |
| US6836602B2 (en) | 2001-10-26 | 2004-12-28 | Corning Incorporated | Direct bonding of optical components |
| DE10134157B4 (en) * | 2001-07-13 | 2005-11-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ultra-precise surface device and method for its manufacture |
| JP2009117707A (en) * | 2007-11-08 | 2009-05-28 | Mitsubishi Heavy Ind Ltd | Device, and manufacturing method of device |
-
1998
- 1998-08-07 JP JP22412298A patent/JP3862867B2/en not_active Expired - Fee Related
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10134157B4 (en) * | 2001-07-13 | 2005-11-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ultra-precise surface device and method for its manufacture |
| JP2003084232A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003084234A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003084255A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and method of manufacturing the same |
| JP2003084233A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical isolator and its manufacturing method |
| JP2003086417A (en) * | 2001-09-12 | 2003-03-20 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method therefor |
| US6949164B2 (en) | 2001-10-26 | 2005-09-27 | Corning Incorporated | Direct bonding of articles containing silicon |
| US6814833B2 (en) | 2001-10-26 | 2004-11-09 | Corning Incorporated | Direct bonding of articles containing silicon |
| US6836602B2 (en) | 2001-10-26 | 2004-12-28 | Corning Incorporated | Direct bonding of optical components |
| US6806990B2 (en) | 2001-11-22 | 2004-10-19 | Shin-Etsu Chemical Co., Ltd. | Optical device and method for producing optical device |
| US6791748B2 (en) | 2002-05-02 | 2004-09-14 | Corning Incorporated | Optical isolators and methods of manufacture |
| JP2005524864A (en) * | 2002-05-02 | 2005-08-18 | コーニング インコーポレイテッド | Optical isolator and fabrication method using direct bonding |
| US6950235B2 (en) | 2002-05-02 | 2005-09-27 | Corning Incorporated | Optical isolators and methods of manufacture |
| WO2003093896A1 (en) | 2002-05-02 | 2003-11-13 | Corning Incorporated | Optical isolators and methods of manufacturing using direct bonding |
| EP1443357A1 (en) * | 2003-01-29 | 2004-08-04 | Kyocera Corporation | An optical isolator element, a method for producing such an element, and an optical isolator using such an element |
| US7253956B2 (en) | 2003-01-29 | 2007-08-07 | Kyocera Corporation | Optical isolator element, a method for producing such an element, and an optical isolator using such an element |
| JP2009117707A (en) * | 2007-11-08 | 2009-05-28 | Mitsubishi Heavy Ind Ltd | Device, and manufacturing method of device |
| US8936998B2 (en) | 2007-11-08 | 2015-01-20 | Mitsubishi Heavy Industries, Ltd. | Manufcaturing method for room-temperature substrate bonding |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3862867B2 (en) | 2006-12-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2000056265A (en) | Optical isolator and its production | |
| US6950235B2 (en) | Optical isolators and methods of manufacture | |
| US5546486A (en) | Optical fiber end for application in an optical isolator and a method of manufacture thereof | |
| US6535655B1 (en) | Fiberoptic polarizer and method of making the same | |
| US6791748B2 (en) | Optical isolators and methods of manufacture | |
| US20050255324A1 (en) | Composite substrate material and process for producing the same | |
| US20090294051A1 (en) | Optical contacting enabled by thin film dielectric interface | |
| JP2002321947A (en) | Optical device and method for producing the same | |
| JP2002311403A (en) | Faraday rotator | |
| JPH08146351A (en) | Element for optical isolator and its production | |
| US20030124328A1 (en) | Optical device and method for producing optical device | |
| JP2004102218A (en) | Optical isolator element, its manufacturing method, and optical isolator using the same | |
| JP2000249983A (en) | Production of optical non-reciprocal device | |
| JPS62297369A (en) | Production of optical element | |
| JP3554140B2 (en) | Optical isolator element and method of manufacturing the same | |
| JPH0542379B2 (en) | ||
| JP2003207744A (en) | Method of manufacturing optical device, and optical device | |
| JP2641238B2 (en) | Polarizer | |
| JP4903326B2 (en) | Optical device and method for manufacturing optical device | |
| JP3582913B2 (en) | Manufacturing method of optical isolator | |
| JPH0517525B2 (en) | ||
| JPS63379A (en) | Manufacture of optical element | |
| JP2003084255A (en) | Optical device and method of manufacturing the same | |
| JPH0337601A (en) | Polarizing prism | |
| JP2003270436A (en) | Method for manufacturing optical device, and optical device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20031210 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20050825 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050906 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051107 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051129 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060127 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060220 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060516 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060718 |
|
| A911 | Transfer of reconsideration by examiner before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20060726 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060904 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060927 |
|
| R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091006 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121006 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151006 Year of fee payment: 9 |
|
| LAPS | Cancellation because of no payment of annual fees |