JPH08146351A - Element for optical isolator and its production - Google Patents
Element for optical isolator and its productionInfo
- Publication number
- JPH08146351A JPH08146351A JP28633894A JP28633894A JPH08146351A JP H08146351 A JPH08146351 A JP H08146351A JP 28633894 A JP28633894 A JP 28633894A JP 28633894 A JP28633894 A JP 28633894A JP H08146351 A JPH08146351 A JP H08146351A
- Authority
- JP
- Japan
- Prior art keywords
- low melting
- optical isolator
- optical
- polarizers
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/09—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect
- G02F1/093—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect used as non-reciprocal devices, e.g. optical isolators, circulators
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光源から出射された光
を各種光学素子や光ファイバに導入した際に生じる戻り
光を除去するために用いられる光アイソレータ用素子及
びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical isolator element used for removing return light generated when light emitted from a light source is introduced into various optical elements or optical fibers, and a method of manufacturing the same. is there.
【０００２】[0002]
【従来技術】従来、レーザー光源等の光源から出射した
光は、各種光学素子や光ファイバに入射されるが、入射
光の一部は各種光学素子や光ファイバの端面や内部で反
射されたり散乱されたりする。この反射や散乱した光の
一部は、戻り光として光源に戻ろうとするが、この戻り
光を防止するために光アイソレータが用いられる。2. Description of the Related Art Conventionally, light emitted from a light source such as a laser light source is incident on various optical elements or optical fibers, but a part of the incident light is reflected or scattered by the end faces or inside of various optical elements or optical fibers. It is done. Some of the reflected or scattered light tries to return to the light source as return light, and an optical isolator is used to prevent this return light.
【０００３】従来、この種の光アイソレータは、２枚の
偏光子の間に平板状のファラデ回転子を設置し、これら
３つの部品を筒状の磁石内に部品ホルダを介して収納す
ることにより構成されていた。通常、ファラデ回転子は
飽和磁界内において所定の波長の光の偏光面を４５°回
転する厚みに構成され、また２つの偏光子はそれぞれの
透過偏光方向が４５°回転方向にずれるように回転調整
されて構成されている。Conventionally, in this type of optical isolator, a flat Faraday rotator is installed between two polarizers, and these three components are housed in a cylindrical magnet via a component holder. Was configured. Normally, the Faraday rotator is configured to have a thickness that rotates the polarization plane of light of a predetermined wavelength by 45 ° in a saturation magnetic field, and the two polarizers are rotationally adjusted so that their transmission polarization directions are shifted by 45 °. Is configured.
【０００４】このような構成の光アイソレータは、ファ
ラデ回転子と２つの偏光子が別部品で各素子にホルダが
必要であり、そのため部品点数が多くなり組立工数が多
くなるばかりか、各部品間の光学上の調整作業が煩雑で
ある。In the optical isolator having such a structure, the Faraday rotator and the two polarizers are separate parts, and a holder is required for each element. Therefore, not only the number of parts is increased and the number of assembling steps is increased, but also between the parts. The optical adjustment work of is complicated.
【０００５】このため、平板状のファラデ回転子の両面
にそれぞれ平板状の偏光子を直接接着した構成の光アイ
ソレータ用素子を、筒状の磁石内中央部に配置した光ア
イソレータも提案されている。Therefore, there is also proposed an optical isolator in which an element for an optical isolator having a structure in which a plate-shaped polarizer is directly adhered to both surfaces of a plate-shaped Faraday rotator is arranged in a central portion of a cylindrical magnet. .
【０００６】図３の構成概略図は、この種の従来の光ア
イソレータを示す図である。図３に示すように、光アイ
ソレータ１０はファラデ回転子１２、偏光子１３、１
３’を光透過性が良く屈折率が制御されている光学接着
剤１４で接着した光アイソレータ用素子１１と筒状の磁
石１５とからなる。この光アイソレータ用素子１１を作
製する場合には、大型の偏光子基板とファラデ回転子基
板を交互に接着して、接着完了後にこれをカットして多
数個の光アイソレータ用素子を得るといった方法を用い
ることにより、作業性や生産量を高くし、さらに部品点
数を削減することができる。The schematic diagram of FIG. 3 shows a conventional optical isolator of this type. As shown in FIG. 3, the optical isolator 10 includes a Faraday rotator 12, a polarizer 13, and 1.
3'is composed of an optical isolator element 11 and a cylindrical magnet 15 which are adhered to each other by an optical adhesive 14 having a high light transmittance and a controlled refractive index. In the case of manufacturing the optical isolator element 11, a method of obtaining a large number of optical isolator elements by alternately adhering a large-sized polarizer substrate and a Faraday rotator substrate and cutting the same after completion of the adhering By using it, workability and production amount can be increased, and the number of parts can be reduced.
【０００７】[0007]
【発明が解決しようとする課題】しかし、上述のように
ファラデ回転子１２の両面に板状の偏光子１３、１３’
を光学接着剤１４により接着して一体化した光アイソレ
ータ用素子１１においては、以下のような問題点があっ
た。However, as described above, plate-shaped polarizers 13 and 13 'are provided on both sides of the Faraday rotator 12.
The optical isolator element 11 in which the above is adhered and integrated by the optical adhesive 14 has the following problems.
【０００８】（１）光学面を光学接着剤で固定している
ため耐湿性が劣り、特に高温高湿条件下での使用が制限
される。(1) Since the optical surface is fixed with an optical adhesive, the moisture resistance is poor, and its use is restricted especially under high temperature and high humidity conditions.
【０００９】（２）光学面を光学接着剤で固定している
ため、長時間あるいは高出力のレーザ光中の使用では接
着層の変質の可能性があり、信頼性に問題がある。(2) Since the optical surface is fixed with an optical adhesive, the adhesive layer may be deteriorated when used for a long time or in a high-power laser beam, and there is a problem in reliability.
【００１０】（３）光学接着剤から発生するガスにより
他の部品に悪影響を及ぼす可能性がある。(3) The gas generated from the optical adhesive may adversely affect other parts.
【００１１】[0011]
【課題を解決するための手段】本発明は、上記問題点に
鑑みてなされたものであり、１又は２以上の平板状のフ
ァラデ回転子と２以上の平板状の偏光子を透光性の低融
点ガラス層を介して積層して、前記低融点ガラス層の溶
融固着により一体化した光アイソレータ用素子としたも
のである。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and has one or more flat plate Faraday rotators and two or more flat plate polarizers that are transparent. An element for an optical isolator is obtained by laminating via a low melting point glass layer and integrating by melting and fixing the low melting point glass layer.
【００１２】また、１又は２以上の平板状のファラデ回
転子と２以上の平板状の偏光子を積層してなる光アイソ
レータ用素子を以下の（１）乃至（４）の工程により製
造したものである。An element for an optical isolator, which is formed by laminating one or more flat plate Faraday rotators and two or more flat plate polarizers, is manufactured by the following steps (1) to (4). Is.
【００１３】（１）１又は２以上の平板状のファラデ回
転子基板と、２以上の平板状の偏光子基板を透光性の低
融点ガラス層を介して積層する工程、あるいは、あらか
じめ透光性の低融点ガラス層と溶融固着されているもの
を含む１又は２以上の平板状のファラデ回転子基板及び
２以上の平板状の偏光子基板を透光性の低融点ガラス層
を介するように積層する工程、（２）各偏光子基板の透
過偏光方向あるいは分離偏光方向が相対的に光軸を中心
に所定角度回転した位置となるように調整する工程、
（３）前記低融点ガラス層を溶融固着する工程、（４）
前記工程（３）により一体となった積層基板を所望のサ
イズにカッティングして、光アイソレータ用素子を１又
は複数個切り出す工程。(1) A step of laminating one or more flat Faraday rotator substrates and two or more flat polarizer substrates with a low-melting glass layer having a light-transmitting property, or light-transmitting in advance. Of one or more flat Farade rotator substrates and two or more flat plate-shaped polarizer substrates including those fused and fixed to a low melting point glass layer having high transparency through a transparent low melting point glass layer. A step of laminating, (2) a step of adjusting so that the transmission polarization direction or the separation polarization direction of each polarizer substrate is relatively rotated by a predetermined angle around the optical axis,
(3) A step of melting and fixing the low melting point glass layer, (4)
A step of cutting the laminated substrate integrated in the step (3) into a desired size and cutting out one or more optical isolator elements.
【００１４】[0014]
【作用】本発明によれば、接着層として透光性の低融点
ガラスを使用することにより、耐湿性、耐光性に優れ、
ガスの発生がない信頼性の高い光アイソレータ用素子と
なる。また、光アイソレータ用素子を一体化させること
により、光学調整の作業性が良く、部品点数、組立工数
が少なくなる。According to the present invention, by using a light-transmissive low melting point glass as an adhesive layer, excellent moisture resistance and light resistance can be obtained.
It becomes a highly reliable optical isolator element that does not generate gas. Further, by integrating the optical isolator element, the workability of optical adjustment is improved, and the number of parts and the number of assembly steps are reduced.
【００１５】[0015]
【実施例】以下、図面を用いて本発明の実施例を説明す
る。図１は、本発明の光アイソレータ用素子の実施例を
示す斜視概略図である。図１に示すように、光アイソレ
ータ用素子１は、平板状のファラデ回転子２の両面にそ
れぞれ平板状の偏光子３、３’を低融点ガラス層４、
４’を介して積層された構成となっている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic perspective view showing an embodiment of the optical isolator element of the present invention. As shown in FIG. 1, the optical isolator element 1 includes flat plate-shaped polarizers 3 and 3'on both surfaces of a flat plate-shaped Faraday rotator 2 and a low melting point glass layer 4, respectively.
It has a structure of being laminated via 4 '.
【００１６】ファラデ回転子２は、例えばビスマス置換
ガーネット結晶等であればよく、その厚みは、ファラデ
回転子２に光軸Ｌ方向の飽和磁界を印可した場合にファ
ラデ回転子２に入射する光の偏光面が４５゜光軸まわり
に回転するのに必要な厚みに構成されている。The Faraday rotator 2 may be, for example, a bismuth-substituted garnet crystal or the like, and the thickness of the Faraday rotator 2 is the same as that of light incident on the Farade rotator 2 when a saturation magnetic field in the optical axis L direction is applied to the Farade rotator 2. It has a thickness required for the plane of polarization to rotate about the optical axis of 45 °.
【００１７】２枚の偏光子３、３’は、光軸Ｌ方向に入
射する光の１方向の偏光成分を吸収する機能を有する吸
収型偏光子、あるいは光軸Ｌ方向に入射する光の１方向
の偏光成分を分離または合成する複屈折性偏光子で構成
される。例えば、ファラデ回転子２が入射する光の偏光
面を４５゜光軸まわりに回転させるもので、偏光子３、
３’として吸収型偏光子を用いた場合、偏光子３’の透
過偏光方向を偏光子３の透過偏光方向に対して４５゜光
軸まわりにずらした構成とすればよい。The two polarizers 3 and 3'are absorption type polarizers having a function of absorbing a polarization component in one direction of light incident in the optical axis L direction, or 1 of light incident in the optical axis L direction. It is composed of a birefringent polarizer that separates or synthesizes polarized components of directions. For example, the Faraday rotator 2 rotates the plane of polarization of incident light by 45 ° around the optical axis.
When an absorption type polarizer 3'is used, the transmission polarization direction of the polarizer 3'may be shifted by 45 ° with respect to the transmission polarization direction of the polarizer 3 about the optical axis.
【００１８】低融点ガラス層４、４’は、使用する光の
波長に対して透光性が高く、融点が３００Ｃ゜〜４００
Ｃ°程度のガラス材により構成されることが好ましい。
低融点ガラス層４、４’の熱膨張係数は、ファラデ回転
子２および偏光子３、３’の熱膨張係数のほぼ中間の値
を有することが望ましい。例えば、ファラデ回転子２と
偏光子３、３’の熱膨張係数がそれぞれ０．１×１０-5
Ｋ-1、０．６５×１０-5Ｋ-1の場合、低融点ガラス層４
の熱膨張係数は０．１×１０-5〜０．６５×１０-5Ｋ-1
の範囲で選択することにより、ファラデ回転子２と偏光
子３、３’の熱膨張係数の差を吸収でき、熱による歪
み、破損を少なくすることができる。The low-melting-point glass layers 4 and 4'have a high light-transmitting property with respect to the wavelength of light used and have a melting point of 300 ° C to 400 °.
It is preferably composed of a glass material having a C degree of approximately.
It is desirable that the low-melting-point glass layers 4 and 4 ′ have a coefficient of thermal expansion approximately in the middle of the coefficients of thermal expansion of the Faraday rotator 2 and the polarizers 3 and 3 ′. For example, the thermal expansion coefficients of the Faraday rotator 2 and the polarizers 3 and 3 ′ are each 0.1 × 10 −5.
In the case of K −1 , 0.65 × 10 −5 K −1 , the low melting point glass layer 4
Has a thermal expansion coefficient of 0.1 × 10 -5 to 0.65 × 10 -5 K -1
By selecting within the range, it is possible to absorb the difference in the thermal expansion coefficient between the Faraday rotator 2 and the polarizers 3 and 3 ', and it is possible to reduce distortion and damage due to heat.
【００１９】なお、この光アイソレータ用素子１を円形
に加工し、筒状の永久磁石内に挿入すれば、光アイソレ
ータとして機能するが、本実施例では筒状の永久磁石及
び光アイソレータ用素子１を保持するホルダ等の構成は
省略する。If the optical isolator element 1 is processed into a circular shape and inserted into a cylindrical permanent magnet, it functions as an optical isolator. In this embodiment, however, the cylindrical permanent magnet and optical isolator element 1 are used. The structure of a holder for holding the is omitted.
【００２０】このように、低融点ガラス層４、４’によ
り、光アイソレータ用素子１の各構成部品（ファラデ回
転子２と偏光子３、３’）を固着して一体化させたの
で、耐湿性に優れ、長時間あるいは高出力のレーザ光中
の使用にも耐え、ガスが発生しない光アイソレータ用素
子１となり、しかも光学調整が容易にでき、部品点数・
組立工数が少ない光アイソレータ用素子１となる。As described above, the low melting point glass layers 4 and 4'fix the respective components (Farade rotator 2 and polarizers 3 and 3 ') of the optical isolator element 1 so as to be integrated with each other. It is an element 1 for optical isolators that has excellent properties, withstands use for a long time or in a high-power laser beam, and does not generate gas. Moreover, optical adjustment can be easily performed.
The optical isolator element 1 has a small number of assembling steps.
【００２１】図２は、本発明にかかる光アイソレータ用
素子１の製造手順を示す図である。FIG. 2 is a view showing a manufacturing procedure of the optical isolator element 1 according to the present invention.
【００２２】まず、図２（ａ）に示すように、大型の２
枚の偏光子基板６、６’と、この２枚の偏光子基板６、
６’と同一形状の１枚のファラデ回転子基板５と、２枚
の透光性の低融点ガラスプレート７、７’を用意する。
ここで、低融点ガラスプレート７、７’の厚みは損失低
減と作業性の点から１００μｍ以下が望ましい。なお、
図２（ａ）（ｂ）には、円型の偏光子基板６、６’とフ
ァラデ回転子基板５とを示したが、円型以外でもよく、
例えば正方型であってもよい。First, as shown in FIG.
The two polarizer substrates 6 and 6 ′, and the two polarizer substrates 6 and
One Faraday rotator substrate 5 having the same shape as 6'and two translucent low melting glass plates 7 and 7'are prepared.
Here, the thickness of the low melting point glass plates 7 and 7'is preferably 100 μm or less from the viewpoint of loss reduction and workability. In addition,
2 (a) and 2 (b) show the circular polarizer substrates 6 and 6'and the Faraday rotator substrate 5, other than the circular one,
For example, it may be a square type.
【００２３】次に、偏光子基板６、６’の間にファラデ
回転子基板５を配置して、更に両偏光子基板６、６’と
ファラデ回転子基板５の間に低融点ガラスプレート７、
７’を配置する。ここで、低融点ガラスプレート７、
７’の一方の面を予めファラデ回転子５あるいは偏光子
６、６’の光学面に溶融固着しておいてもよい。Next, the Faraday rotator substrate 5 is disposed between the polarizer substrates 6 and 6 ', and the low melting point glass plate 7 is further interposed between both the polarizer substrates 6 and 6'and the Farade rotator substrate 5.
Place 7 '. Here, the low melting point glass plate 7,
One surface of 7'may be melted and fixed to the optical surfaces of the Faraday rotator 5 or the polarizers 6 and 6'in advance.
【００２４】次に、光軸Ｌ方向に使用する波長のレーザ
光を当てて、偏光子基板６、６’の透過偏光方向が光軸
Ｌを中心に４５°相互に回転した位置となるように調整
した後、高温炉内で低融点ガラスプレート７、７’を溶
融させ、図２（ｂ）に示すように、偏光子基板６、６’
とファラデ回転子基板５とを一体化する。Next, a laser beam having a wavelength to be used is applied in the direction of the optical axis L so that the transmission polarization directions of the polarizer substrates 6 and 6'are rotated by 45 ° about the optical axis L. After the adjustment, the low-melting-point glass plates 7 and 7'are melted in a high-temperature furnace, and as shown in FIG.
And the Faraday rotator substrate 5 are integrated.
【００２５】なお、偏光子基板６、６’とファラデ回転
子基板５には予め反射防止コートを施しておくことが望
ましい。これは、各基板と低融点ガラス層及び空気層の
屈折率の違いにより生じるフレネル反射を防止するため
である。It is desirable that the polarizer substrates 6 and 6'and the Faraday rotator substrate 5 be coated in advance with antireflection coating. This is to prevent Fresnel reflection caused by the difference in refractive index between each substrate, the low melting point glass layer and the air layer.
【００２６】次に、この一体化された基板を、図２
（ｃ）に示すように、図１に示す光アイソレータ用素子
１のサイズに多数個カッティングして図１に示すような
形状の特性が均一な光アイソレータ用素子を多数個切り
出す。Next, this integrated substrate is shown in FIG.
As shown in FIG. 1C, a large number of optical isolator elements 1 shown in FIG. 1 are cut to cut out a large number of optical isolator elements having uniform characteristics as shown in FIG.
【００２７】このような製造方法により、光アイソレー
タ用素子１を短時間で同時に多数個製造することができ
る。With this manufacturing method, a large number of optical isolator elements 1 can be manufactured simultaneously in a short time.
【００２８】本実施例では、プレート状の低融点ガラス
を用いたが、本発明はこれに限ることなく、透光性であ
れば粉末状その他の低融点ガラスを用いても良い。In the present embodiment, the plate-shaped low melting point glass was used, but the present invention is not limited to this, and powdery or other low melting point glass may be used as long as it is translucent.
【００２９】また、上記いずれの実施例も偏光子が２
枚、ファラデ回転子が１枚である光アイソレータ用素子
１の構成を用いたが、本発明はこれに限ることなく、さ
らに多数の偏光子、ファラデ回転子を用いた光アイソレ
ータ用素子であっても、上記実施例と同様の効果を得る
ことができる。In each of the above embodiments, the polarizer is 2
Although the structure of the optical isolator element 1 having one Farade rotator is used, the present invention is not limited to this, and an optical isolator element using a larger number of polarizers and Farade rotators is provided. Also, it is possible to obtain the same effect as that of the above embodiment.
【００３０】[0030]
【発明の効果】以上詳細に説明したように、本発明にか
かる光アイソレータ用素子及びその製造方法によれば、
以下のような優れた効果を有する。As described in detail above, according to the optical isolator element and the method of manufacturing the same of the present invention,
It has the following excellent effects.
【００３１】（１）透光性の低融点ガラスによって各構
成部品の光学面を固着させたので、光学接着剤の場合に
生じるアウトガスが発生せず、かつ高信頼性、高耐光性
が実現する。(1) Since the optical surface of each component is fixed by the light-transmitting low melting point glass, outgas generated in the case of the optical adhesive is not generated, and high reliability and high light resistance are realized. .
【００３２】（２）各構成部品が一体化しているため、
光アイソレータを構成するホルダ等の部品点数を削減す
ることができ、光アイソレータの小型化が実現する。(2) Since each component is integrated,
It is possible to reduce the number of parts such as a holder that constitutes the optical isolator, and it is possible to reduce the size of the optical isolator.
【００３３】（３）光アイソレータ用素子の製造方法に
おいては、１度の光学調整で複数個の光アイソレータ用
素子を作製することができ、組立工数の削減が可能とな
る。(3) In the method for manufacturing an optical isolator element, a plurality of optical isolator elements can be manufactured by one optical adjustment, and the number of assembling steps can be reduced.
【図１】本発明にかかる光アイソレータ用素子の１実施
例を示す斜視概略図である。FIG. 1 is a schematic perspective view showing one embodiment of an optical isolator element according to the present invention.
【図２】本発明にかかる光アイソレータ用素子の製造手
順を示す図である。FIG. 2 is a diagram showing a manufacturing procedure of an optical isolator element according to the present invention.
【図３】従来の光アイソレータを示す構成概略図であ
る。FIG. 3 is a schematic configuration diagram showing a conventional optical isolator.
１、１１：光アイソレータ用素子 ２、１２：ファラデ回転子 ３、３’、１３、１３’：偏光子 ４、４’：低融点ガラス層 ５：ファラデ回転子基板 ６、６’：偏光子基板 ７、７’：低融点ガラスプレート １０：光アイソレータ １４：光学接着剤 １５：磁石 1, 11: Element for optical isolator 2, 12: Farade rotator 3, 3 ', 13, 13': Polarizer 4, 4 ': Low melting point glass layer 5: Farade rotator substrate 6, 6': Polarizer substrate 7, 7 ': Low melting point glass plate 10: Optical isolator 14: Optical adhesive 15: Magnet
Claims (2)
２以上の平板状の偏光子を透光性の低融点ガラス層を介
して積層して、前記低融点ガラス層の溶融固着により一
体化したことを特徴とする光アイソレータ用素子。1. One or more flat plate Faraday rotators and two or more flat plate polarizers are laminated via a light-transmitting low melting glass layer, and the low melting glass layer is melted and fixed. Optical isolator element characterized by being integrated.
２以上の平板状の偏光子を積層してなる光アイソレータ
用素子において、以下の（１）乃至（４）の工程により
行うことを特徴とする光アイソレータ用素子の製造方
法。 （１）１又は２以上の平板状のファラデ回転子基板と、
２以上の平板状の偏光子基板を透光性の低融点ガラス層
を介して積層する工程、あるいは、あらかじめ透光性の
低融点ガラス層と溶融固着したものを含む１又は２以上
の平板状のファラデ回転子基板及び２以上の平板状の偏
光子基板を透光性の低融点ガラス層を介するように積層
する工程、（２）各偏光子基板の透過偏光方向あるいは
分離偏光方向が相対的に光軸を中心に所定角度回転した
位置となるように調整する工程、（３）前記低融点ガラ
ス層を溶融固着する工程、（４）前記工程（３）により
一体となった積層基板を所望のサイズにカッティングし
て、光アイソレータ用素子を１又は複数個切り出す工
程。2. An optical isolator element comprising one or more flat plate Faraday rotators and two or more flat plate polarizers, which are performed by the following steps (1) to (4). And a method for manufacturing an optical isolator element. (1) one or more flat Faraday rotator substrates,
A step of laminating two or more flat plate-like polarizer substrates via a light-transmitting low melting point glass layer, or one or more flat plate-like ones including those which are melt-fixed in advance to the light-transmitting low melting point glass layer Laminating the Faraday rotator substrate and two or more flat plate-like polarizer substrates with a light-transmitting low melting point glass layer in between, (2) the transmission polarization direction or the separation polarization direction of each polarizer substrate is relatively A step of adjusting so as to be a position rotated by a predetermined angle about the optical axis, (3) a step of melting and fixing the low melting point glass layer, (4) a laminated substrate integrated by the step (3) is desired. The step of cutting into one size and cutting out one or more optical isolator elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28633894A JPH08146351A (en) | 1994-11-21 | 1994-11-21 | Element for optical isolator and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28633894A JPH08146351A (en) | 1994-11-21 | 1994-11-21 | Element for optical isolator and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08146351A true JPH08146351A (en) | 1996-06-07 |
Family
ID=17703098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28633894A Pending JPH08146351A (en) | 1994-11-21 | 1994-11-21 | Element for optical isolator and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08146351A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003084232A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003084234A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003086417A (en) * | 2001-09-12 | 2003-03-20 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method therefor |
| WO2003093896A1 (en) | 2002-05-02 | 2003-11-13 | Corning Incorporated | Optical isolators and methods of manufacturing using direct bonding |
| EP1443357A1 (en) * | 2003-01-29 | 2004-08-04 | Kyocera Corporation | An optical isolator element, a method for producing such an element, and an optical isolator using such an element |
| US6791748B2 (en) | 2002-05-02 | 2004-09-14 | Corning Incorporated | Optical isolators and methods of manufacture |
| US6814833B2 (en) | 2001-10-26 | 2004-11-09 | Corning Incorporated | Direct bonding of articles containing silicon |
-
1994
- 1994-11-21 JP JP28633894A patent/JPH08146351A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003084232A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003084234A (en) * | 2001-09-12 | 2003-03-19 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method for the optical device |
| JP2003086417A (en) * | 2001-09-12 | 2003-03-20 | Shin Etsu Chem Co Ltd | Optical device and manufacturing method therefor |
| US6814833B2 (en) | 2001-10-26 | 2004-11-09 | Corning Incorporated | Direct bonding of articles containing silicon |
| US6949164B2 (en) | 2001-10-26 | 2005-09-27 | Corning Incorporated | Direct bonding of articles containing silicon |
| WO2003093896A1 (en) | 2002-05-02 | 2003-11-13 | Corning Incorporated | Optical isolators and methods of manufacturing using direct bonding |
| US6791748B2 (en) | 2002-05-02 | 2004-09-14 | Corning Incorporated | Optical isolators and methods of manufacture |
| US6950235B2 (en) | 2002-05-02 | 2005-09-27 | Corning Incorporated | Optical isolators and methods of manufacture |
| EP1443357A1 (en) * | 2003-01-29 | 2004-08-04 | Kyocera Corporation | An optical isolator element, a method for producing such an element, and an optical isolator using such an element |
| US7253956B2 (en) | 2003-01-29 | 2007-08-07 | Kyocera Corporation | Optical isolator element, a method for producing such an element, and an optical isolator using such an element |
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