ITMI20020097A0 - Diffrattometro e metodo per svolgere analisi diffrattrometriche - Google Patents

Diffrattometro e metodo per svolgere analisi diffrattrometriche

Info

Publication number
ITMI20020097A0
ITMI20020097A0 IT2002MI000097A ITMI20020097A ITMI20020097A0 IT MI20020097 A0 ITMI20020097 A0 IT MI20020097A0 IT 2002MI000097 A IT2002MI000097 A IT 2002MI000097A IT MI20020097 A ITMI20020097 A IT MI20020097A IT MI20020097 A0 ITMI20020097 A0 IT MI20020097A0
Authority
IT
Italy
Prior art keywords
diffractrometric
diffractometer
analyses
carrying
out diffractrometric
Prior art date
Application number
IT2002MI000097A
Other languages
English (en)
Inventor
Giovanni Berti
Original Assignee
Consorzio Pisa Ricerche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consorzio Pisa Ricerche filed Critical Consorzio Pisa Ricerche
Priority to IT2002MI000097A priority Critical patent/ITMI20020097A1/it
Publication of ITMI20020097A0 publication Critical patent/ITMI20020097A0/it
Priority to PCT/EP2003/000546 priority patent/WO2003060498A1/en
Priority to US10/502,101 priority patent/US7260178B2/en
Priority to SI200331829T priority patent/SI1470413T1/sl
Priority to CN03802523XA priority patent/CN1620602B/zh
Priority to DE60332002T priority patent/DE60332002D1/de
Priority to KR1020047011210A priority patent/KR100990592B1/ko
Priority to EP03702480A priority patent/EP1470413B1/en
Priority to AT03702480T priority patent/ATE463737T1/de
Priority to CA002473782A priority patent/CA2473782A1/en
Priority to PT03702480T priority patent/PT1470413E/pt
Priority to AU2003205636A priority patent/AU2003205636B2/en
Priority to RU2004125649/28A priority patent/RU2314517C2/ru
Priority to ES03702480T priority patent/ES2345542T3/es
Priority to JP2003560544A priority patent/JP2005515435A/ja
Publication of ITMI20020097A1 publication Critical patent/ITMI20020097A1/it
Priority to IL163082A priority patent/IL163082A/en
Priority to ZA200406268A priority patent/ZA200406268B/xx
Priority to BG108850A priority patent/BG108850A/xx
Priority to YUP-739/04A priority patent/RS50427B/sr
Priority to HK05102377.4A priority patent/HK1070133A1/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
IT2002MI000097A 2002-01-21 2002-01-21 Diffrattometro e metodo per svolgere analisi diffrattrometriche ITMI20020097A1 (it)

Priority Applications (20)

Application Number Priority Date Filing Date Title
IT2002MI000097A ITMI20020097A1 (it) 2002-01-21 2002-01-21 Diffrattometro e metodo per svolgere analisi diffrattrometriche
JP2003560544A JP2005515435A (ja) 2002-01-21 2003-01-21 回折計及び回折分析方法
AT03702480T ATE463737T1 (de) 2002-01-21 2003-01-21 Diffraktometer und methode zur diffraktionsanalyse
PT03702480T PT1470413E (pt) 2002-01-21 2003-01-21 Difractómetro e método de análise da difracção
SI200331829T SI1470413T1 (sl) 2002-01-21 2003-01-21 Difraktometer in metoda za difrakcijske analize
CN03802523XA CN1620602B (zh) 2002-01-21 2003-01-21 用于衍射分析的衍射仪及方法
DE60332002T DE60332002D1 (de) 2002-01-21 2003-01-21 Diffraktometer und methode zur diffraktionsanalyse
KR1020047011210A KR100990592B1 (ko) 2002-01-21 2003-01-21 회절 분석기 및 회절 분석 방법
EP03702480A EP1470413B1 (en) 2002-01-21 2003-01-21 Diffractometer and method for diffraction analysis
PCT/EP2003/000546 WO2003060498A1 (en) 2002-01-21 2003-01-21 Diffractometer and method for diffraction analysis
CA002473782A CA2473782A1 (en) 2002-01-21 2003-01-21 Diffractometer and method for diffraction analysis
US10/502,101 US7260178B2 (en) 2002-01-21 2003-01-21 Diffractometer and method for diffraction analysis
AU2003205636A AU2003205636B2 (en) 2002-01-21 2003-01-21 Diffractometer and method for diffraction analysis
RU2004125649/28A RU2314517C2 (ru) 2002-01-21 2003-01-21 Дифрактометр и способ дифракционного анализа
ES03702480T ES2345542T3 (es) 2002-01-21 2003-01-21 Difractometro y procedimiento para analisis por difraccion.
IL163082A IL163082A (en) 2002-01-21 2004-07-18 Diffractometer and method of diffraction analysis
ZA200406268A ZA200406268B (en) 2002-01-21 2004-08-05 Diffractometer and method for diffraction analysis
BG108850A BG108850A (en) 2002-01-21 2004-08-19 Diffractometer and method for diffraction analysis
YUP-739/04A RS50427B (sr) 2002-01-21 2004-08-20 Difraktometar i postupak za difrakcionu analizu
HK05102377.4A HK1070133A1 (en) 2002-01-21 2005-03-18 Diffractometer and method for diffraction analysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2002MI000097A ITMI20020097A1 (it) 2002-01-21 2002-01-21 Diffrattometro e metodo per svolgere analisi diffrattrometriche

Publications (2)

Publication Number Publication Date
ITMI20020097A0 true ITMI20020097A0 (it) 2002-01-21
ITMI20020097A1 ITMI20020097A1 (it) 2003-07-21

Family

ID=11448930

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2002MI000097A ITMI20020097A1 (it) 2002-01-21 2002-01-21 Diffrattometro e metodo per svolgere analisi diffrattrometriche

Country Status (20)

Country Link
US (1) US7260178B2 (it)
EP (1) EP1470413B1 (it)
JP (1) JP2005515435A (it)
KR (1) KR100990592B1 (it)
CN (1) CN1620602B (it)
AT (1) ATE463737T1 (it)
AU (1) AU2003205636B2 (it)
BG (1) BG108850A (it)
CA (1) CA2473782A1 (it)
DE (1) DE60332002D1 (it)
ES (1) ES2345542T3 (it)
HK (1) HK1070133A1 (it)
IL (1) IL163082A (it)
IT (1) ITMI20020097A1 (it)
PT (1) PT1470413E (it)
RS (1) RS50427B (it)
RU (1) RU2314517C2 (it)
SI (1) SI1470413T1 (it)
WO (1) WO2003060498A1 (it)
ZA (1) ZA200406268B (it)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005010512A1 (en) * 2003-07-22 2005-02-03 X-Ray Optical Systems, Inc. Method and system for x-ray diffraction measurements using an aligned source and detector rotating around a sample surface
FI20041538A (fi) * 2004-11-29 2006-05-30 Stresstech Oy Goniometri
ITFI20050016A1 (it) * 2005-02-02 2006-08-03 Giovanni Berti Diffrattometro a centro variabile
ITFI20050137A1 (it) 2005-06-20 2006-12-21 Giovanni Berti Apparecchiatura mobile per irragiamento e rilevazione di radiazioni
CN102221516B (zh) * 2011-03-17 2013-09-04 中国科学院化学研究所 中子反射谱仪单色器的调节装置和用其调整单色器的方法
DE102011117713B4 (de) 2011-07-28 2014-02-27 Alfred-Wegener-Institut Helmholtz-Zentrum für Polar- und Meeresforschung Transportables Goniospektrometer mit konstantem Observationszentrum
US9613728B2 (en) * 2013-03-15 2017-04-04 Proto Manufacturing Ltd. X-ray diffraction apparatus and method
CN104914121A (zh) * 2015-06-12 2015-09-16 朱彦婷 工程化单晶体取向的测量方法及装置
JP6394513B2 (ja) * 2015-06-18 2018-09-26 新東工業株式会社 残留応力測定装置及び残留応力測定方法
CN105223216B (zh) * 2015-09-23 2018-03-30 北京科技大学 一种基于x射线衍射的材料微结构在线检测系统
CN107153075B (zh) * 2016-03-03 2019-12-20 核工业北京地质研究院 一种用于微区物相鉴定的x射线粉晶衍射方法
CN108414553B (zh) * 2017-12-15 2021-03-23 苏州新材料研究所有限公司 一种动态测量片状材料晶体织构的系统、设备及方法
CN108801184A (zh) * 2018-07-23 2018-11-13 安徽创谱仪器科技有限公司 用于薄片晶体的二维定向误差精密测量系统
RU2734684C1 (ru) * 2020-04-28 2020-10-21 Евгений Николаевич Болгов Устройство для рентгенографического контроля сварных швов стенки резервуара
CN111474198A (zh) * 2020-04-29 2020-07-31 西安交通大学 基于x光的电缆结晶检测装置
JP7485872B2 (ja) * 2021-03-22 2024-05-17 株式会社リガク 放射線測定装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2843749A (en) * 1955-08-18 1958-07-15 United States Steel Corp System for measuring x-radiation
JPS5116984A (en) * 1974-08-02 1976-02-10 Hitachi Ltd X senoryokusokuteisochi
NL7803026A (nl) * 1978-03-21 1979-09-25 Philips Nv Instelmechanisme.
US4199678A (en) * 1979-01-31 1980-04-22 U.S. Philips Corporation Asymmetric texture sensitive X-ray powder diffractometer
JPS5588148U (it) * 1979-12-06 1980-06-18
FR2589347B1 (fr) * 1985-11-05 1987-12-18 Philips Massiot Mat Medic Statif d'exploration isocentrique
GB2198920B (en) * 1986-12-18 1990-11-14 Univ Moskovsk Apparatus for x-ray studies of crystalline matter
FR2632177A1 (fr) * 1988-06-03 1989-12-08 Gen Electric Cgr Statif de radiologie isocentrique a quatre axes de rotation
US5014293A (en) * 1989-10-04 1991-05-07 Imatron, Inc. Computerized tomographic x-ray scanner system and gantry assembly
JPH05107203A (ja) * 1991-10-15 1993-04-27 Jeol Ltd Ｘ線試料表面状態評価装置
US5359640A (en) * 1993-08-10 1994-10-25 Siemens Industrial Automation, Inc. X-ray micro diffractometer sample positioner
CN2236652Y (zh) * 1996-02-17 1996-10-02 中国航天工业总公司 一种x射线衍射仪
JPH10160688A (ja) * 1996-12-04 1998-06-19 Rigaku Corp 単結晶インゴットのｘ線トポグラフィー方法および装置
US6064717A (en) * 1997-11-21 2000-05-16 Rigaku/Usa, Inc. Unrestricted motion apparatus and method for x-ray diffraction analysis
US7016457B1 (en) * 1998-12-31 2006-03-21 General Electric Company Multimode imaging system for generating high quality images

Also Published As

Publication number Publication date
ZA200406268B (en) 2006-06-28
ES2345542T3 (es) 2010-09-27
SI1470413T1 (sl) 2011-05-31
RU2314517C2 (ru) 2008-01-10
KR100990592B1 (ko) 2010-10-29
ATE463737T1 (de) 2010-04-15
CN1620602A (zh) 2005-05-25
PT1470413E (pt) 2010-10-08
ITMI20020097A1 (it) 2003-07-21
AU2003205636B2 (en) 2008-06-26
US7260178B2 (en) 2007-08-21
AU2003205636A1 (en) 2003-07-30
RU2004125649A (ru) 2005-05-10
CA2473782A1 (en) 2003-07-24
DE60332002D1 (de) 2010-05-20
EP1470413A1 (en) 2004-10-27
WO2003060498A1 (en) 2003-07-24
YU73904A (sh) 2006-08-17
IL163082A (en) 2009-11-18
HK1070133A1 (en) 2005-06-10
US20050141667A1 (en) 2005-06-30
JP2005515435A (ja) 2005-05-26
KR20040089115A (ko) 2004-10-20
CN1620602B (zh) 2010-11-03
RS50427B (sr) 2009-12-31
BG108850A (en) 2005-04-30
EP1470413B1 (en) 2010-04-07

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