GB9419086D0 - Method for the printing of a pattern of features - Google Patents
Method for the printing of a pattern of featuresInfo
- Publication number
- GB9419086D0 GB9419086D0 GB9419086A GB9419086A GB9419086D0 GB 9419086 D0 GB9419086 D0 GB 9419086D0 GB 9419086 A GB9419086 A GB 9419086A GB 9419086 A GB9419086 A GB 9419086A GB 9419086 D0 GB9419086 D0 GB 9419086D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- printing
- pattern
- features
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9419086A GB2293459B (en) | 1994-09-22 | 1994-09-22 | Method for printing of a pattern of features |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9419086A GB2293459B (en) | 1994-09-22 | 1994-09-22 | Method for printing of a pattern of features |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9419086D0 true GB9419086D0 (en) | 1994-11-09 |
GB2293459A GB2293459A (en) | 1996-03-27 |
GB2293459B GB2293459B (en) | 1997-10-01 |
Family
ID=10761727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9419086A Expired - Fee Related GB2293459B (en) | 1994-09-22 | 1994-09-22 | Method for printing of a pattern of features |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2293459B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0627666B1 (en) * | 1993-05-24 | 2003-02-05 | Holtronic Technologies Plc | Apparatus and method for changing the scale of a printed pattern |
US7049617B2 (en) * | 2001-07-26 | 2006-05-23 | Seiko Epson Corporation | Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing method |
SE0104131D0 (en) * | 2001-12-10 | 2001-12-10 | Micronic Laser Systems Ab | Improved method and apparatus for image formation |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2454750C3 (en) * | 1974-11-19 | 1982-03-18 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Method and arrangement for the production of image patterns for masks of integrated circuits by means of aberration-free pixels of point holograms |
GB2211957B (en) * | 1987-10-31 | 1991-12-18 | Gen Electric Co Plc | Optical projection printing |
GB2267356B (en) * | 1992-03-13 | 1995-12-06 | Holtronic Technologies Ltd | Manufacture of high accuracy T1R holograms for full-field lithography processes |
-
1994
- 1994-09-22 GB GB9419086A patent/GB2293459B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
GB2293459B (en) | 1997-10-01 |
GB2293459A (en) | 1996-03-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20020922 |