GB2293459B - Method for printing of a pattern of features - Google Patents

Method for printing of a pattern of features

Info

Publication number
GB2293459B
GB2293459B GB9419086A GB9419086A GB2293459B GB 2293459 B GB2293459 B GB 2293459B GB 9419086 A GB9419086 A GB 9419086A GB 9419086 A GB9419086 A GB 9419086A GB 2293459 B GB2293459 B GB 2293459B
Authority
GB
United Kingdom
Prior art keywords
printing
pattern
features
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9419086A
Other versions
GB2293459A (en
GB9419086D0 (en
Inventor
Francis Stace Murray Clube
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Holtronic Technologies Ltd
Original Assignee
Holtronic Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Holtronic Technologies Ltd filed Critical Holtronic Technologies Ltd
Priority to GB9419086A priority Critical patent/GB2293459B/en
Publication of GB9419086D0 publication Critical patent/GB9419086D0/en
Publication of GB2293459A publication Critical patent/GB2293459A/en
Application granted granted Critical
Publication of GB2293459B publication Critical patent/GB2293459B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB9419086A 1994-09-22 1994-09-22 Method for printing of a pattern of features Expired - Fee Related GB2293459B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9419086A GB2293459B (en) 1994-09-22 1994-09-22 Method for printing of a pattern of features

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9419086A GB2293459B (en) 1994-09-22 1994-09-22 Method for printing of a pattern of features

Publications (3)

Publication Number Publication Date
GB9419086D0 GB9419086D0 (en) 1994-11-09
GB2293459A GB2293459A (en) 1996-03-27
GB2293459B true GB2293459B (en) 1997-10-01

Family

ID=10761727

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9419086A Expired - Fee Related GB2293459B (en) 1994-09-22 1994-09-22 Method for printing of a pattern of features

Country Status (1)

Country Link
GB (1) GB2293459B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69432092D1 (en) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Device and method for changing the scale of a printed pattern
US7049617B2 (en) * 2001-07-26 2006-05-23 Seiko Epson Corporation Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing method
SE0104131D0 (en) * 2001-12-10 2001-12-10 Micronic Laser Systems Ab Improved method and apparatus for image formation

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1532655A (en) * 1974-11-19 1978-11-15 Philips Electronic Associated Making mask-patterns
GB2211957A (en) * 1987-10-31 1989-07-12 Gen Electric Co Plc Holographic projection printing
GB2267356A (en) * 1992-03-13 1993-12-01 Holtronic Technologies Ltd Manufacture of tir holograms for full-field lithography

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1532655A (en) * 1974-11-19 1978-11-15 Philips Electronic Associated Making mask-patterns
GB2211957A (en) * 1987-10-31 1989-07-12 Gen Electric Co Plc Holographic projection printing
GB2267356A (en) * 1992-03-13 1993-12-01 Holtronic Technologies Ltd Manufacture of tir holograms for full-field lithography

Also Published As

Publication number Publication date
GB2293459A (en) 1996-03-27
GB9419086D0 (en) 1994-11-09

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20020922